CN108414794B - Method for manufacturing atomic force microscope probe with nanoscale spherical tip - Google Patents
Method for manufacturing atomic force microscope probe with nanoscale spherical tip Download PDFInfo
- Publication number
- CN108414794B CN108414794B CN201810069867.0A CN201810069867A CN108414794B CN 108414794 B CN108414794 B CN 108414794B CN 201810069867 A CN201810069867 A CN 201810069867A CN 108414794 B CN108414794 B CN 108414794B
- Authority
- CN
- China
- Prior art keywords
- spherical tip
- cantilever
- micro
- particle
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
- G01Q70/16—Probe manufacture
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
- B81C1/00111—Tips, pillars, i.e. raised structures
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Radiology & Medical Imaging (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Measuring Leads Or Probes (AREA)
Abstract
The invention relates to a method for manufacturing an atomic force microscope probe with a nanoscale spherical tip, which comprises the following steps: s1, taking a micro-cantilever, manufacturing a bulge on the surface of the micro-cantilever, and taking one surface of the bulge, which is far away from the micro-cantilever, as a substrate; or, taking a micro-cantilever and taking the surface of the micro-cantilever as a substrate; s2, positioning a particle injection position on the substrate; s3, injecting a high-energy particle beam into the particle injection position within a set area according to the size of the spherical tip to be manufactured, and enabling the particle injection position to bulge to form the spherical tip. The invention has the advantages of high forming speed, high yield, low cost, suitability for industrialization, good controllability of the diameter of the spherical tip and difficult falling.
Description
Technical Field
The invention belongs to the field of atomic force microscopes, and particularly relates to a method for manufacturing an atomic force microscope probe with a nanoscale spherical tip.
Background
The atomic force microscope is an important microscope for accurately measuring the surface morphology of a sample, and has important applications in material surface morphology characterization, biological sample measurement and nanoscale processing. The atomic force microscope probe is a core component of an atomic force microscope, and is generally composed of a micro cantilever (micro cantilever) and a tip (tip) located at a free moving end of the micro cantilever. In order to measure surface forces (especially biological samples) more accurately, reduce interference and damage to the samples, it is necessary to fabricate an afm probe with a spherical tip.
The existing atomic force microscope probe is coated on the surface of a needle tip to form a spherical tip (as shown in figure 1, used for measuring surface pits with a large aspect ratio) or is directly adhered with nano spherical particles (as shown in figure 2, used for measuring surface pits with a small aspect ratio) on a micro-cantilever.
The atomic force microscope probe with the spherical tip is formed by coating a film on the surface of the needle tip, the spherical tip is not ideal in shape and is not ideal in spherical shape, meanwhile, the size range of the spherical tip which can be manufactured is limited, the spherical tip is not spherical when exceeding the size range, and the size control difficulty is high.
The atomic force microscope probe of the nanometer spherical particles is directly bonded on the micro-cantilever beam, and the spherical particles are manually bonded, so that the time consumption is long, the yield is low, the cost is high, and the nanometer spherical particles are easy to fall off; the alignment precision can only reach the micron level when the device is operated under an optical microscope, and the alignment precision is low; spherical particles that can be made are also typically on the micron scale, which is difficult to achieve below 1 micron.
Disclosure of Invention
The invention aims to solve the technical problem of providing a method for manufacturing an atomic force microscope probe with a nanoscale spherical tip, which has the advantages of high forming speed, high yield, low cost, suitability for industrialization, good controllability of the diameter of the spherical tip and difficult falling-off.
The technical scheme for solving the technical problems is as follows: a method for manufacturing an atomic force microscope probe with a nanoscale spherical tip comprises the following steps:
s1, taking a micro-cantilever, arranging a bulge on the surface of the micro-cantilever, and taking one surface of the bulge, which is far away from the micro-cantilever, as a substrate; or, taking a micro-cantilever and taking the surface of the micro-cantilever as a substrate;
s2, positioning a particle injection position on the substrate;
s3, injecting a high-energy particle beam into the particle injection position within a set area according to the size of the spherical tip to be manufactured, and enabling the particle injection position to bulge to form the spherical tip.
The invention has the beneficial effects that: compared with coating and bonding, the method utilizes the high-energy particle beams to inject the substrate, changes the material form of the particle injection position to form the spherical tip, the obtained spherical tip is equivalent to shape extension performed on the basis of the substrate, and the injection time of the high-energy particle beams is very short and only needs from a few seconds to a few minutes, so that the spherical tip is high in forming speed, high in yield, low in cost and suitable for industrialization, the diameter of the spherical tip is good in controllability and not prone to falling off, the spherical tip with the diameter scale of tens of nanometers to a few micrometers can be manufactured by controlling the injection dosage of the high-energy particle beams, and the measurement accuracy of the spherical tip atomic force microscope is improved.
Further, in S2, the particle implantation position is located after imaging by particle scanning the substrate.
The beneficial effect of adopting the further technical scheme is that: the positioning accuracy of the particle injection position can be controlled within 50 nanometers, and the positioning accuracy is high, so that the spherical tip can be formed in the middle of the substrate, and distortion and errors caused by non-central forming are avoided.
Further, in S2, the particle injection position is obtained by calibrating the position of the high-energy particle beam with the position of optical microscope imaging or atomic force microscope imaging, and then positioning by optical microscope imaging or atomic force microscope imaging.
The beneficial effect of adopting the further technical scheme is that: the positioning accuracy of the particle injection position can be controlled within 50 nanometers, and the positioning accuracy is high, so that the spherical tip can be formed in the middle of the substrate, and distortion and errors caused by non-central forming are avoided.
Further, in S3, the high-energy particle beam is formed by focusing a particle beam after applying a high voltage of 1KeV to 10MeV to the particles.
The beneficial effect of adopting the further technical scheme is that: ensuring the spherical tip to be quickly and stably molded.
Further, the particle is any one of an electron, an ion, a neutron, a proton, an X-ray, and a photon, but is not limited to any of the foregoing particles.
The beneficial effect of adopting the further technical scheme is that: ensuring that the ball tip structure is reliable.
Further, the injection amount of the high-energy particle beams is controlled by a timing switch valve.
The beneficial effect of adopting the further technical scheme is that: ensuring the stable and reliable implantation dosage control of the high-energy particle beam.
Further, the high-energy particle beam passing through the timing switch valve is focused again by the particle beam and then injected into the particle injection position.
The beneficial effect of adopting the further technical scheme is that: ensuring that the high-energy particle beam is intensively injected into the particle injection position, thereby ensuring that the spherical tip morphology is regular.
Drawings
In order to more clearly illustrate the detailed description of the invention or the technical solutions in the prior art, the drawings that are needed in the detailed description of the invention or the prior art will be briefly described below. Throughout the drawings, like elements or portions are generally identified by like reference numerals. In the drawings, elements or portions are not necessarily drawn to scale.
FIG. 1 is a diagram of a process of coating an atomic force microscope probe to form a spherical tip;
FIG. 2 is a diagram of a process of bonding an atomic force microscope probe to form a spherical tip;
FIG. 3 is a diagram illustrating a process of forming a spherical tip according to example 1;
FIG. 4 is an effect view of the spherical tip formed in example 1;
FIG. 5 is an enlarged view of portion A of FIG. 4;
FIG. 6 is a diagram showing a process of forming a spherical tip according to example 2;
FIG. 7 is a graph of helium ion implant dose versus spherical tip diameter for examples 1 and 2;
reference numerals:
1-micro cantilever beam; 2-a high energy particle beam; 3-a spherical tip; 4-bulge;
Detailed Description
Embodiments of the present invention will be described in detail below with reference to the accompanying drawings. The following examples are only for illustrating the technical solutions of the present invention more clearly, and therefore are only examples, and the protection scope of the present invention is not limited thereby.
Example 1
As shown in fig. 3, 4 and 5, a method for fabricating an afm probe having a nano-scale spherical tip 3 includes the steps of:
s1, taking a micro-cantilever 1, arranging a bulge on the surface of the micro-cantilever 1, and taking one surface of the bulge, which is far away from the micro-cantilever 1, as a substrate;
s2, positioning a particle injection position on the substrate through particle scanning substrate imaging;
s3, applying a high voltage of 1 KeV-10 MeV to the helium ions, and then focusing the particle beam to form a high-energy particle beam 2, wherein the high-energy particle beam 2 is quantitatively injected into the particle injection position within an area range with a diameter of 250 nm by controlling a timing switch valve according to the size of the spherical tip 3 to be manufactured, and the particle injection position is raised to form the spherical tip 3 (as shown in fig. 7, the helium ion injection dose is in a linear relationship with the diameter of the spherical tip 3).
In this embodiment, the high-energy particle beam 2 passing through the timing switch valve is focused again by the particle beam and then injected into the particle injection position.
Example 2
As shown in fig. 6, a method for fabricating an afm probe with a nano-scale spherical tip 3 includes the following steps:
s1, taking a micro-cantilever 1, and taking the surface of the micro-cantilever 1 as a substrate;
s2, positioning a particle injection position on the substrate by calibrating the position of the high-energy particle beam 2 and the position imaged by an optical microscope or the position imaged by an atomic force microscope, and then imaging by the optical microscope or the atomic force microscope;
s3, applying a high voltage of 1 KeV-10 MeV to the particles, and focusing the particle beam to form a high-energy particle beam 2, wherein the high-energy particle beam 2 is quantitatively injected into the particle injection position within an area range of 250 nm in diameter by controlling a timing switch valve according to the size of the spherical tip 3, and the particle injection position is raised to form the spherical tip 3 (as shown in fig. 7, the helium ion injection dose is in a linear relationship with the diameter of the spherical tip 3).
In this embodiment, the high-energy particle beam 2 passing through the timing switch valve is focused again by the particle beam and then injected into the particle injection position.
Compared with coating and bonding, the high-energy particle beams 2 are injected into the substrate in the embodiments 1 and 2, the material form of the particle injection position is changed to form the spherical tip 3, the obtained spherical tip 3 is equivalent to shape extension on the basis of the substrate, and the injection time of the high-energy particle beams 2 only needs a few seconds, so that the spherical tip 3 is high in forming speed, high in yield, low in cost and suitable for industrialization, the diameter of the spherical tip 3 is good in controllability and not easy to fall off, the spherical tip 3 with the diameter scale of tens of nanometers to several micrometers can be manufactured by controlling the injection dosage of the high-energy particle beams 2, and the measurement accuracy of the atomic force microscope of the spherical tip 3 is improved.
Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; while the invention has been described in detail and with reference to the foregoing embodiments, it will be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; such modifications and substitutions do not depart from the spirit and scope of the present invention, and they should be construed as being included in the following claims and description.
Claims (4)
1. A method for manufacturing an atomic force microscope probe with a nano-scale spherical tip (3) is characterized by comprising the following steps:
s1, taking a micro cantilever (1), arranging a bulge on the surface of the micro cantilever (1), and taking one surface of the bulge, which is far away from the micro cantilever (1), as a substrate; or, taking a micro-cantilever (1), and taking the surface of the micro-cantilever (1) as a substrate;
s2, positioning a particle injection position on the substrate;
s3, injecting a high-energy particle beam (2) into the particle injection position within a set area range according to the size of the spherical tip (3) to be manufactured, and enabling the particle injection position to bulge to form the spherical tip (3);
in S3, the high-energy particle beam (2) is formed by particle plus 1KeV to 10MeV high voltage and focused, the injection amount of the high-energy particle beam (2) is controlled by a time switch valve, and the high-energy particle beam (2) passing through the time switch valve is again focused and injected into the particle injection position.
2. A method of fabricating an afm probe with a nano-scale spherical tip (3) according to claim 1, characterized in that: in S2, the particle implantation position is located after imaging by particle scanning of the substrate.
3. A method of fabricating an afm probe with a nano-scale spherical tip (3) according to claim 1, characterized in that: in S2, the particle injection position is obtained by calibrating the position of the high-energy particle beam (2) with the position of optical microscope imaging or atomic force microscope imaging, and then positioning by optical microscope imaging or atomic force microscope imaging.
4. A method of fabricating an afm probe with a nano-scale spherical tip (3) according to claim 1, characterized in that: the particles are any one of electrons, ions, neutrons, protons, X-rays and photons.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810069867.0A CN108414794B (en) | 2018-01-24 | 2018-01-24 | Method for manufacturing atomic force microscope probe with nanoscale spherical tip |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810069867.0A CN108414794B (en) | 2018-01-24 | 2018-01-24 | Method for manufacturing atomic force microscope probe with nanoscale spherical tip |
Publications (2)
Publication Number | Publication Date |
---|---|
CN108414794A CN108414794A (en) | 2018-08-17 |
CN108414794B true CN108414794B (en) | 2021-02-02 |
Family
ID=63126524
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201810069867.0A Active CN108414794B (en) | 2018-01-24 | 2018-01-24 | Method for manufacturing atomic force microscope probe with nanoscale spherical tip |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN108414794B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110333372A (en) * | 2019-07-18 | 2019-10-15 | 中国科学院宁波材料技术与工程研究所 | A kind of magnetic scanning microscope probe and preparation method thereof |
CN112098681B (en) * | 2020-09-08 | 2021-10-01 | 浙江大学 | Method for accurately regulating and controlling inclination angle of atomic force microscope needle tip |
WO2022051886A1 (en) * | 2020-09-08 | 2022-03-17 | 浙江大学 | Method for accurately regulating tip inclination angle of atomic force microscope |
CN113267649B (en) * | 2021-04-29 | 2023-03-17 | 大连海事大学 | Preparation method of long-arm probe of atomic force microscope |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100679619B1 (en) * | 2004-07-29 | 2007-02-06 | 한국표준과학연구원 | A method for fabricating a spm nanoneedle probe and a critical dimension spm nanoneedle probe using ion beam and a spm nanneedle probe and a cd-spm nanoneedle probe thereby |
US7572300B2 (en) * | 2006-03-23 | 2009-08-11 | International Business Machines Corporation | Monolithic high aspect ratio nano-size scanning probe microscope (SPM) tip formed by nanowire growth |
CN103176283B (en) * | 2013-03-29 | 2014-11-26 | 南开大学 | Micro-medium cone and nanometal grating-compounded optical probe |
CN105344387A (en) * | 2015-09-11 | 2016-02-24 | 北京大学 | Nano mesh thin film microfluidic device design based on focused ion beam and MEMS machining method |
CN206671365U (en) * | 2017-02-24 | 2017-11-24 | 金华职业技术学院 | A kind of sample for being used to prepare atomic-force microscope needle-tip |
CN107500245B (en) * | 2017-08-22 | 2020-02-21 | 中国科学院上海应用物理研究所 | Three-dimensional micro-nano machining method |
-
2018
- 2018-01-24 CN CN201810069867.0A patent/CN108414794B/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN108414794A (en) | 2018-08-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN108414794B (en) | Method for manufacturing atomic force microscope probe with nanoscale spherical tip | |
CN106198489B (en) | A kind of molecule knot optical near-field microscopic system and its building method | |
Mayer et al. | Field emission characteristics of the scanning tunneling microscope for nanolithography | |
CN109920713B (en) | Maskless doping-on-demand ion implantation equipment and method | |
US20110111178A1 (en) | Structures having an adjusted mechanical property | |
CN112098681B (en) | Method for accurately regulating and controlling inclination angle of atomic force microscope needle tip | |
Watt et al. | Whole cell structural imaging at 20 nanometre resolutions using MeV ions | |
JP2004301548A (en) | Electric characteristic evaluating apparatus | |
Andany et al. | An atomic force microscope integrated with a helium ion microscope for correlative nanoscale characterization | |
Wang et al. | Effects of discrete energy levels on single-electron tunneling in coupled metal particles | |
CN113049853A (en) | Method for preparing tilting AFM probe tip with size and tilt angle controllable and ultra-large height-to-width ratio | |
CN101607692A (en) | Utilize focused beam to make the method for high accuracy nano-pore and nanohole array | |
Kojima et al. | Sub-50 nm resolution surface electron emission lithography using nano-Si ballistic electron emitter | |
CN114335335A (en) | Method for adjusting gap distance in metal tunneling junction | |
Möhrke et al. | Single shot Kerr magnetometer for observing real-time domain wall motion in permalloy nanowires | |
Schindler et al. | New electrochemical cell for in situ tunneling microscopy, cyclovoltammetry, and optical measurements | |
Wang et al. | Charge trapping behavior visualization of dumbbell-shaped DSFXPY via electrical force microscopy | |
CN110542768A (en) | method for processing micro-cantilever probe for measuring ultralow friction coefficient | |
WO2022051886A1 (en) | Method for accurately regulating tip inclination angle of atomic force microscope | |
CN204945318U (en) | Measure the device of silicon nano-pillar photoelectric characteristic | |
Zhao | Electron Emission Deposition Coefficient of Physical Vapor Deposition Using Nanometer-Indentation Method | |
CN114964590B (en) | Electron microscopic analysis method for tritide nano-scale micro-region stress distribution | |
KR101027397B1 (en) | Method of fabricating tungsten cfe used in a microcolumn for an inspection in the electric and electron devices | |
CN106443078A (en) | Scanning electronic microscope in-situ detection device and scanning electronic microscope system | |
Dutta et al. | Electron-beam direct writing using RD2000N for fabrication of nanodevices |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |