CN108389642A - Dimension X-ray multilayer film waveguiding structure and preparation method thereof - Google Patents
Dimension X-ray multilayer film waveguiding structure and preparation method thereof Download PDFInfo
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- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
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Abstract
The present invention relates to precison optical component technical fields,A kind of specifically dimension X-ray multilayer film waveguiding structure and preparation method thereof,Waveguiding structure includes substrate,Top-side substrate,And the molybdenum being equipped between substrate and top-side substrate/carbon non-periodic multilayer,Molybdenum/carbon non-periodic multilayer is made of the molybdenum film layer and carbon thin film layer being alternately equipped with,Molybdenum/carbon non-periodic multilayer is equipped with gap relative to the surface of top-side substrate side,And molybdenum/carbon non-periodic multilayer is separated into first wave conducting shell and second waveguide layer by the gap,The present invention is compared with the existing technology,Multiple conductting layers in multilayer film can either be utilized to promote the input aperture of X-ray,Also the length and etching length of first wave conducting shell and second waveguide layer can be utilized,Change bifocal size,Reduce ambient noise,Further promote the focusing performance of X-ray waveguide focus,This further extensive use for being designed as expanding X-ray multilayer film waveguide,Provide effective method.
Description
Technical field
The present invention relates to precison optical component technical field, a kind of specifically dimension X-ray multilayer film waveguiding structure
And preparation method thereof.
Background technology
The performance of nano grade biological structure and to connect each other be the emphasis studied in life science, leads in life science
In the research of domain, the function and cluster energy of biological molecule have been achieved for larger progress, but nano grade biological structure
Three-dimensional imaging but develop it is relatively slow, main reason is that the limitation of 3 Dimension Image Technique.Nanoscale structures are imaged now, institute
The analysis method of use mainly has scanning electron microscope analysis, tem study and fluorescence analysis.First two point
Analysis method can be good at showing two-dimentional biological structure, but simultaneously can cause irreversible wound to Initial experiments sample
Evil, thus in the research to biological structure, the method that can utilize fluorescence analysis demarcates sample using isotope.But
It is the particularity due to fluorescence analysis method, is of limited application.On this basis, educational circles finds x-ray imaging method energy
Problem more than enough effective solutions.Irreversible damage, but also X will not only cause sample using x-ray imaging method
The penetration power of ray is strong, under the conditions of corresponding, can carry out three-dimensional imaging to different samples so that it is widely used.
In x-ray imaging system, waveguide has the function of coupling and filter to X-ray as important component, to visit
Sample forms the preferable X radiographic sources of coupling.Early in 1974, Spiller and Segmueller were successfully prepared first
A X-ray resonance coupling waveguide（E. Spiller, A. Segmueller, Applied Physics Letter, 24
(1974), 60-61）.But experimental result is undesirable, due to the coupling light that is emitted from waveguide by surface reflection and thoroughly
The strong influence for penetrating light makes its coupling effect decline.Strong coupling light in order to obtain, T. Salditt are coupled using front end
Method prepares and prepares carbon film in germanium substrate, and another germanium is used in combination to be fixed on another side, is formed and is protected to carbon-coating.Both sides are utilized in this way
Germanium substrate can effectively block reflected light（T. Salditt, S.P. Krueger, C. Fuhse and C. Baehtz,
Physical Review Letters, 100 (2008), 184801-1-4）, at 19.5 keV, the hot spot near field is big
It is small at 25 nanometers, transmissivity is only in 2.5 E-5.The reason is that X-ray has a large amount of loss in waveguiding structure, thus transmit
Rate is relatively low.Thus, the resolution ratio of the transmissivity and hot spot that improve waveguide becomes the emphasis of research waveguide performance, in this regard, some grind
The person of studying carefully has found that waveguide performance can be improved by effectively optimizing waveguiding structure under study for action.
For example, forming waveguide using membrane structure.T. Salditt is prepared for molybdenum/carbon/molybdenum trilamellar membrane in germanium substrate,
Spot size is reduced to 15 nanometers at 19.5 keV, transmissivity increases to 0.081（T. Salditt, S.P. Krueger,
C. Fuhse and C. Baehtz, Physical Review Letters, 100 (2008), 184801-1-4）.I.
R. Prudnikov is using two periodic multilayer films as wall, wherein forming the air gap as conductting layer.When X-ray couples
After entering waveguide, Bragg effect caused by multi-layer film structure can efficiently reduce loss when x-ray transmission, by excellent
The size and multi-layer film structure for changing the air gap, can obtain strongest emergent light (I. R. Prudnikov, Applied
Crystallography, 38(2005), 595-602).The result shows that reduction X-ray using membrane structure effectively
Loss, can effectively improve waveguide performance.
Therefore, it is necessary on the basis of existing technology, devise a kind of damage that can either be reduced during x-ray transmission
The waveguiding structure and preparation method thereof for the case where losing, and focal beam spot can be changed.
Invention content
It is an object of the invention to solve the deficiencies in the prior art, provide a kind of dimension X-ray multilayer film waveguiding structure and
Preparation method improves the focusing performance of existing waveguide.
To achieve the goals above, a kind of dimension X-ray multilayer film waveguiding structure is designed, the waveguiding structure includes base
The molybdenum being equipped between bottom, top-side substrate and substrate and top-side substrate/carbon non-periodic multilayer, the molybdenum/carbon are aperiodic more
Tunic is made of the molybdenum film layer and carbon thin film layer being alternately equipped with, and the carbon thin film layer is as conductting layer, the molybdenum film
Layer is used as wall, the molybdenum/carbon non-periodic multilayer to be equipped with gap relative to the surface of top-side substrate side, and described
Gap the molybdenum/carbon non-periodic multilayer is separated into the first wave conducting shell that length is L1 and the second waveguide that length is L2
Layer, by controlling the length Lc in the gap and length L2 of second waveguide layer, to realize the property regulation of focal beam spot.
The dimension X-ray multilayer film waveguiding structure of the present invention also has following preferred technical solution：
Length L1=280 micron of the first wave conducting shell, length L2=140 ~ 560 micron of the second waveguide layer,
Length Lc=225 micron of gap.
Length L2=140 ~ 560 of length L1=280 micron of the first wave conducting shell, the second waveguide layer are micro-
Rice, length Lc=945 micron in gap.
Total film layer number of the molybdenum/carbon non-periodic multilayer is 15 layers, and overall thickness is 452 ~ 468 nanometers.
In the molybdenum/carbon non-periodic multilayer, the first layer film is the molybdenum film layer that thickness is 50.0 nanometers, the second layer
Film is the carbon thin film layer that thickness is 4.0 nanometers, and third layer film is the molybdenum film layer that thickness is 56.0 nanometers, the 4th layer thin
Film is the carbon thin film layer that thickness is 6.2 nanometers, and layer 5 film is the molybdenum film layer that thickness is 53.8 nanometers, layer 6 film
It is the carbon thin film layer that thickness is 7.6 nanometers, layer 7 film is the molybdenum film layer that thickness is 52.4 nanometers, and the 8th layer film is
The carbon thin film layer that thickness is 8.0 nanometers, the 9th layer film are the molybdenum film layers that thickness is 52.4 nanometers, and the tenth layer film is thick
Degree is 7.6 nanometers of carbon thin film layer, and eleventh floor film is the molybdenum film layer that thickness is 53.8 nanometers, and Floor 12 film is
The carbon thin film layer that thickness is 6.2 nanometers, the tenth three-layer thin-film are the molybdenum film layer that thickness is 56.0 nanometers, the tenth four-level membrane
It is the carbon thin film layer that thickness is 4.0 nanometers, the 15th layer film is the molybdenum film layer that thickness is 50.0 nanometers.
The molybdenum film layer is made of purity of 99.999% Molybdenum metal materials industry, and the carbon thin film layer is by purity
99.999% carbon material is made.
The present invention also designs a kind of preparation method of dimension X-ray multilayer film waveguiding structure, and the preparation method includes：
Gap is etched on the surface relative to top-side substrate side, and makes the gap in the molybdenum/carbon non-periodic multilayer
The molybdenum/carbon non-periodic multilayer is separated into the first wave conducting shell that length is L1 and the second waveguide layer that length is L2, is led to
The length Lc in the control gap and length L2 of second waveguide layer is crossed, to realize the property regulation of focal beam spot.
The preparation method of the dimension X-ray multilayer film waveguiding structure of the present invention also has following preferred technical solution：
The method for determining the length Lc in the gap is as follows：The setting X-ray multilayer film waveguide work is in 19.9 keV
Under energy, by, in the solution of waveguide entrance Helmholtz equation, obtaining the pass of propagation constant β and conductting layer thickness d to X-ray
It is formula,, wherein k0 is vacuum medium wave moving vector, and n1 is the refractive index of carbon film layer, and ξ is the last of the twelve Earthly Branches
This formula is unfolded using Taylor's formula for the characteristic value of Mu Huozi equations, obtains a small amount of Δ d of thickness and a small amount of Δ β of propagation constant
Between relationship：
WhereinFor waveguide parameter, n1 is carbon film layer refractive index, and n2 is molybdenum thin-film refractive index, β 0
For the propagation parameter of carbon thin film layer in an intermediate position in the molybdenum/carbon non-periodic multilayer, d0 is that the molybdenum/carbon is non-
The thickness of carbon thin film layer in an intermediate position in periodic multilayer film, ξ 0 are in being in the molybdenum/carbon non-periodic multilayer
Between position carbon thin film layer formulation character value.
Since the phase of waveguide is directly proportional to propagation constant β and the length l of waveguide, and then obtain by changing different carbon films
Layer thickness come influence X-ray outgoing phase method, by the length of the L1 of initial setting, and then obtain first wave conducting shell
The position of exit focus and spot size, and according to not bright Hough diffraction effect, determine etching length Lc：
。
The molybdenum/carbon non-periodic multilayer is made by the following method：Using DC magnetron sputtering method in substrate according to
Secondary alternating is coated with several molybdenum film layers and carbon thin film layer to form the molybdenum/carbon non-periodic multilayer.
The method for etching gap is specific as follows：
Step A carries out deep processing, in the upper table of the molybdenum/carbon non-periodic multilayer to the molybdenum/carbon non-periodic multilayer
Face is coated with anti-electron beam film.
Step B etches fixed width Lc using electron beam lithography on anti-electron beam film.
Step C etches corresponding width Lc to form gap using ion beam etching on molybdenum/carbon non-periodic multilayer
And first wave conducting shell and second waveguide layer.
Step D, by the anti-electron beam thin film removing of molybdenum/carbon non-periodic multilayer upper surface.
Molybdenum/carbon non-periodic multilayer upper surface and top-side substrate are carried out high temperature adhesives by step E.
The present invention compared with the existing technology, using phase focusing method, multi-layer film structure and electron beam lithography, has obtained one kind
One-dimensional novel X-ray multilayer film waveguiding structure, it can either utilize multiple conductting layers in multilayer film（Carbon thin film layer）Promote X
The input aperture of ray can also utilize the length and etching length of first wave conducting shell and second waveguide layer, change bifocal big
Small, reduction ambient noise further promotes the focusing performance of X-ray waveguide focus, this to be designed as expanding X-ray multilayer film wave
The further extensive use led, provides effective method, the advantage is that：
1. the present invention has apparent advantage compared with existing one-dimensional X ray multilayers film waveguide.Common X-ray multilayer film
Waveguide forms the light beam that can form different levels near field, based on preparation and processing technology, can focal property be reduced, high
Rank light beam can seriously affect the energy of focus.Furthermore the focal length of X-ray multilayer film waveguide is shorter（Hundreds of microns）It can not be effectively
Carry out near field measurement.But the waveguiding structure of the present invention utilizes the object of same sample based on the homologous physics calibration principle of one
Reason structure calibrates focal position, gap is arranged on molybdenum/carbon non-periodic multilayer according to focal position, to form first wave guide
Structure and second waveguide structure effectively increase focus signal-to-noise ratio while ensureing transmissivity, in practical applications, can
Near field measurement is effectively performed, ensures the concentration of focus point X-ray intensity.
2. the present invention has apparent advantage compared with one-dimensional single channel X-ray waveguide.Multilayer film X rays waveguide with it is same
The single channel X-ray waveguide of equal thickness is compared, and multi-layer film structure can effectively increase the input aperture of X-ray, effectively
The loss of X-ray total reflection is reduced, last identical waveguiding structure forms near field focus, generates preferable coupling light.
3. design philosophy proposed by the present invention introduces phase focusing method and physics standardization, to X-ray multilayer film waveguide junction
Structure is focused so that and this X-ray multilayer film waveguiding structure has the advantages such as larger input aperture, higher transmissivity,
Physical arrangement adjustment exit focus size is effectively utilized, is the further near field research and development to X-ray multilayer film waveguide, carries
A kind of novel method has been supplied, the multilayer film waveguide of more high-transmission rate is gone out for Future Design, is laid a good foundation.
Description of the drawings
Fig. 1 is the structure two-dimensional structure schematic diagram of molybdenum of the present invention/carbon non-periodic multilayer in an embodiment.
Fig. 2 is that the aperiodic X-ray multilayer film waveguide of molybdenum/carbon of the present invention prepares schematic diagram in an embodiment.
Fig. 3 .1 are the aperiodic X-ray multilayer film waveguide of molybdenum/carbon of the present invention and Traditional x-ray multilayer film in an embodiment
The comparison figure a of waveguide.
Fig. 3 .2 are the aperiodic X-ray multilayer film waveguide of molybdenum/carbon of the present invention and Traditional x-ray multilayer film in an embodiment
The comparison figure b of waveguide.
Fig. 4 is the near field transmission simulation drawing of Traditional x-ray multilayer film waveguide.
Fig. 5 .1 are the near field transmission figure a of waveguiding structure of the present invention in embodiment 1.
Fig. 5 .2 are the near field transmission figure b of waveguiding structure of the present invention in embodiment 1.
Fig. 5 .3 are the near field transmission figure c of waveguiding structure of the present invention in embodiment 1.
Fig. 6 .1 are the near field transmission figure a of waveguiding structure of the present invention in embodiment 2.
Fig. 6 .2 are the near field transmission figure b of waveguiding structure of the present invention in embodiment 2.
Fig. 6 .3 are the near field transmission figure c of waveguiding structure of the present invention in embodiment 2.
In figure：1. 2. first layer film layer of substrate, 3. second layer film layer, 4. third layer film layer 5. the 4th
The 8th layer film layer of 8. layer 7 film layer 9. of layer film layer 6. layer 5 film layer, 7. layer 6 film layer
10. 13. Floor 12 film layer of the tenth 12. eleventh floor film layer of layer film layer of the 9th layer film layer 11.
14. 17. top-side substrate 18. of the tenth the 15th layer film layer of four-level membrane layer 16. of the tenth three-layer thin-film layer 15.
It pushes up in 19. second waveguide structure of first wave guide structure, 20. 21. molybdenums of basal region/carbon non-periodic multilayer region 22.
23. waveguiding structure region of portion's substrate region, 24. level-one focus, 25. two level focus, 26. near-field region.
Specific implementation mode
The invention will be further described below in conjunction with the accompanying drawings, and the structure of this waveguide and the principle of method are to this profession
It is very clearly for people.It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, it is not used to
Limit the present invention.
Present embodiment is to dimension X-ray multilayer film waveguide（multilayer waveguide array, WGA）Structure
Following design is carried out, which includes substrate, molybdenum/carbon non-periodic multilayer and top-side substrate, wherein molybdenum/carbon non-week
Phase multilayer film is that molybdenum film layer, carbon thin film layer are alternately deposited on substrate surface as the agent structure of multilayer film waveguide, and carbon is thin
Film layer is as conductting layer（guiding layer）, molybdenum film layer is as protective layer（cladding layer）, wherein molybdenum film layer
It is alternately deposited on substrate surface with carbon thin film layer.The substrate and top-side substrate is germanium substrate.
The roughness of the substrate is：0 nanometer<Roughness of the substrate<0.5 nanometer.
The molybdenum/carbon non-periodic multilayer, total film layer number is at 15 layers, and overall thickness is 452 ~ 468 nanometers, according to described
Design requirement alternating deposit molybdenum described in germanium substrate is the Molybdenum metal materials industry that purity is 99.999%；The carbon is purity
It is 99.999% carbon material.
It refers to the first layer film on the surface of the substrate that the molybdenum film layer and C film, which are alternately deposited on substrate surface,
It is molybdenum aluminum film layer, the second layer film is carbon thin film layer, and third layer film is molybdenum film layer, and four-level membrane is carbon thin film layer,
Layer 5 film is molybdenum film layer, and so on, until last layer（15th layer）Film is molybdenum film layer.
The preparation of above-mentioned molybdenum/carbon non-periodic multilayer is made using magnetically controlled DC sputtering technology（Wang Fengli, Wang Zhanshan,
Zhang Zhong, Wu Wenjuan, Wang Hongchang, Zhang Shumin, Qin Shuji, Chen Lingyan, 13（2005）28-33 ）,（Xu's Yao, Wang Zhanshan, Xu Jing,
Crowd, Wang Hongchang, Zhu Jingtao, Wang Fengli, Wang Bei, Qin Shuji, Chen Lingyan, 15（2007）1838-1843）.By molybdenum film layer and carbon
Film is alternately deposited in germanium substrate, obtains molybdenum/carbon non-periodic multilayer sample.
After obtained molybdenum/carbon non-periodic multilayer deep processing, the preparation of X-ray multilayer film waveguide is carried out.Steps are as follows,
See that obtained multilayer membrane sample is carried out deep processing, anti-electron beam film is coated in sample thin film by attached drawing 2, step A；Step B,
Utilize electron beam lithography（E-beam）, fixed width Lc is etched in specific position；Step C, utilizes ion beam etching
（Reactive Ion Etching）Corresponding width is etched on sample；Step D, by the anti-electron beam thin film removing in surface
（Mask Removal）；Step E, benefit tunic sample surfaces carry out high temperature adhesives with germanium substrate（Wafer Bonding）.Gained
To waveguiding structure and the comparison diagram of traditional waveguide can be found in .1 traditional waveguides of Fig. 3 .1 and Fig. 3 .2, Fig. 3, Fig. 3 .2 are
The waveguiding structure of the present invention.
It is as follows to waveguide outgoing phase and the solution of the relationship of single conducting layer thickness, set this X-ray multilayer film waveguide
It is operated under 19.9 keV energy, the computational methods propagated in single channel according to X-ray（C. Fuhse, T. Salditt,
Physica B, 357 (2005) 57-60）, by, in the solution of waveguide entrance Helmholtz equation, being propagated X-ray
Constant（propagation constant）β and conductting layer（guiding layer）The relation formula of thickness d,, wherein k0 is vacuum medium wave moving vector, and n1 is the refractive index of carbon film layer, and ξ is Helmholtz
The characteristic value of equation.This formula is unfolded using Taylor's formula, obtains the pass between a small amount of Δ d of thickness and a small amount of Δ β of propagation constant
System：
WhereinFor waveguide parameter, n1 is carbon film layer refractive index, and n2 is molybdenum thin-film refractive index, this implementation
In mode, the molybdenum/carbon non-periodic multilayer includes 15 layers in total, and middle layer, i.e., the 8th layer are carbon thin film layer, and β 0 is
The propagation parameter of 8th tunic carbon thin film layer, d0 are the thickness of the 8th tunic carbon thin film layer, and ξ 0 is the 8th tunic carbon thin film layer
Formulation character value.
Since the phase phase and propagation constant β and the length l of waveguide of waveguide are directly proportional, and then obtain by changing not
The method of the phase of X-ray outgoing is influenced with the thickness of carbon film layer.In present embodiment, initial setting first wave guide structure
Length L1=280 micron of WAG1, and then obtain position and the spot size of first wave guide structure WAG1 exit focus.Using not
Bright Hough diffraction effect determines etching length Lc.
。
Different etching length Lc and L2 are adjusted using the method, and then the length for obtaining working as first wave guide structure WGA1 is
At 280 microns, level-one focal position determines that etching length Lc is 225 microns at 225 microns, and then by etching shape
At second waveguide structure WGA2, and 140 ~ 560 microns of L2 length is adjusted, forms good focus；Its two level focal position is 945
Micron also can determine that etching length Lc is 945 microns, and then form second waveguide structure WGA2 by etching, and adjust L2 long
Degree 140 ~ 560 microns, form good focus, by the following examples 1 and embodiment 2 illustrate.
Embodiment 1
First to the solution of waveguide outgoing phase and the relationship of single conducting layer thickness.Set this X-ray multilayer film waveguide work
Under 19.9 keV energy, the computational methods propagated in single channel according to X-ray（C. Fuhse, T. Salditt,
Physica B, 357 (2005) 57-60）, by, in the solution of waveguide entrance Helmholtz equation, being passed to X-ray
Broadcast constant（propagation constant）β and conductting layer（guiding layer）The relation formula of thickness d,, wherein k0 is vacuum medium wave moving vector, and n1 is the refractive index of carbon film layer, and ξ is Helmholtz side
The characteristic value of journey.This formula is unfolded using Taylor's formula, obtains the relationship between a small amount of Δ d of thickness and a small amount of Δ β of propagation constant.
WhereinFor waveguide parameter, n1 is carbon film layer refractive index, and n2 is molybdenum thin-film refractive index, and β 0 is
The propagation parameter of 8th tunic carbon film layer, d0 are the thickness of the 8th tunic carbon film layer, and ξ 0 is that the equation of the 8th tunic carbon film layer is special
Value indicative.
Since the phase phase and propagation constant β and the length l of waveguide of waveguide are directly proportional, and then obtain by changing not
The method of the phase of X-ray outgoing is influenced with the thickness of carbon film layer.
Then it utilizes the method to adjust different carbon layers having thicknesses, generates out of phase, enable outgoing light near field focus.
When designing multilayer film waveguide, by the 8th tunic（Carbon thin film layer）Centered on film layer, thickness is maintained at 8.0 nanometers, and determines it
Phase change is 0.Using the formula of obtained phase and carbon thin film layer thickness, change carbon thin film layer thickness, reduces layer 6 film
It is 7.6 nanometers with the tenth layer of carbon film thickness, and changes layer 7 molybdenum film layer and the 9th layer of molybdenum film layer thickness is 52.4 to receive
Rice.The purpose is to ensure that one layer of molybdenum film layer and one layer of carbon thin film layer overall thickness are 60.0 nanometers, facilitates and controlled in practical preparation
Thicknesses of layers and precision.And then the 4th layer of carbon thin film layer and Floor 12 carbon thin film layer thickness are reduced as 6.2 nanometers with this, and
It is 53.8 nanometers to change layer 5 molybdenum film layer and eleventh floor molybdenum film layer thickness.Reduce second layer carbon thin film layer and the 14th
Layer carbon thin film layer thickness is 4.0 nanometers, and changes third layer molybdenum film layer and the 13rd layer of molybdenum film layer thickness is 56.0 to receive
Rice, it is 50.0 nanometers finally to keep first layer molybdenum film layer and the 15th layer of molybdenum film layer thickness, the protection as outer layer channel
Layer, as shown in Fig. 1.And Finite Element Difference Method is utilized, it calculates in the case where 19.9keV WGA length is 280 microns, x
The field distribution situation of ray in a vacuum, as shown in Fig. 4.The position of level-one focus is calculated at 225 microns, practical transmitance
It is 0.1367, focus signal-to-noise ratio I_r is 2.18, with（Q. Zhong, M. Osterhoff, M.W.Wen, Z. S.Wang,
and T. Salditt. X-ray waveguide arrays: tailored near-fields by multi-
beaminterference.X-ray Spectrometry, 46(2), 107–115 (2017)）Acquired results are similar, in turn
Determine that etching length is 225 microns.
Followed by the preparation of molybdenum/carbon non-periodic multilayer, aperiodic multilayer is prepared using magnetically controlled DC sputtering technology
Membrane sample（Wang Fengli, Wang Zhanshan, Zhang Zhong, Wu Wenjuan, Wang Hongchang, Zhang Shumin, Qin Shuji, Chen Lingyan, 13（2005）28-33
）,（Xu's Yao, Wang Zhanshan, Xu Jing, Zhang Zhong, Wang Hongchang, Zhu Jingtao, Wang Fengli, Wang Bei, Qin Shuji, Chen Lingyan, optical precision work
Journey, 15（2007）1838-1843）.It refers in substrate surface that molybdenum film layer and carbon thin film layer, which are alternately deposited on substrate surface,
On, the first layer film is molybdenum aluminum film layer, and the second layer film is carbon thin film layer, and third layer film is molybdenum film layer, the 4th layer thin
Film is carbon thin film layer, and layer 5 film is molybdenum film layer, and so on, until last layer（15th layer）Film is molybdenum film
Layer.
After completing to the deep processing of molybdenum/carbon non-periodic multilayer, the preparation of X-ray multilayer film waveguide is carried out.Step is such as
Under, see that obtained multilayer membrane sample is carried out deep processing, anti-electron beam film is coated in sample thin film by attached drawing 2, step A；Step
B utilizes electron beam lithography（E-beam）, fixed width Lc is etched in specific position；Step C, utilizes ion beam etching
（Reactive Ion Etching）Corresponding width is etched on sample；Step D, by the anti-electron beam thin film removing in surface
（Mask Removal）；Step E, benefit tunic sample surfaces carry out high temperature adhesives with germanium substrate（Wafer Bonding）.
Based on the above method, simulation calculates the aperiodic X-ray multilayer film waveguiding structure of molybdenum/carbon, is 19.9 in work capacity
Near field transmission figure when keV.Simulation electric field being carried out using finite difference calculus to transmit, the sample of simulation goes out near field generates focusing, and two
Grade focus is separating out at 225 microns of mouth, thus etches length and be set as 225 microns, and then adjusts second waveguide structure WGA2's
Length, as can be seen that when the length of second waveguide structure WGA2 is 140 microns from attached drawing 5.1, actual transmission is
0.0347, spot size is 47 nm, and focus signal-to-noise ratio I_r is 26.87；As can be seen that working as second waveguide knot from attached drawing 5.2
When the length of structure WGA2 is 280 microns, actual transmission 0.0169, spot size is 47 nm, and focus signal-to-noise ratio I_r is
32.95；As can be seen that when the length of second waveguide structure WGA2 is 560 microns from attached drawing 5.3, actual transmission is
0.0041, spot size is 47 nm, and focus signal-to-noise ratio I_r is 30.66.
Although its result ratio is in germanium substrate, the actual transmission 0.0117 of traditional molybdenum/carbon non-periodic multilayer of preparation
It is low, but its focus signal-to-noise ratio（26.87~32.95）It is apparently higher than the 2.18 of traditional molybdenum/carbon non-periodic multilayer（Q. Zhong,
M. Osterhoff, M.W.Wen, Z. S.Wang, and T. Salditt. X-ray waveguide arrays:
tailored near-fields by multi-beaminterference.X-ray Spectrometry, 46(2),
107–115 (2017)）.Although actual result disagrees in notional result, pass through（Q. Zhong, M.
Osterhoff, M.W.Wen, Z. S.Wang, and T. Salditt. X-ray waveguide arrays:
tailored near-fields by multi-beaminterference.X-ray Spectrometry, 46(2),
107–115 (2017)）The case where theoretical error of the verification of article, Finite Element Difference Method is smaller, theoretical modeling can react real
The case where occurring when prepared by border, is based on such situation, it can be seen that passes through effectively theoretical modeling, electron beam lithography and accurate
Plated film, can obtain the aperiodic X-ray multilayer film waveguide of the high molybdenum/carbon of focus signal-to-noise ratio, and this experimental result has been simulated very
It is satisfactory.It theoretically demonstrates this of this patent proposition and utilizes phase focusing method and physics standardization, by X-ray focusing
Design near field is feasible.It is provided for the one-dimensional multilayer film waveguide and two-dimentional multilayer film waveguide of Future Development higher performance
Important thought.
Embodiment 2
First to the solution of waveguide outgoing phase and the relationship of single conducting layer thickness.Set this X-ray multilayer film waveguide work
Under 19.9 keV energy, the computational methods propagated in single channel according to X-ray（C. Fuhse, T. Salditt,
Physica B, 357 (2005) 57-60）, by, in the solution of waveguide entrance Helmholtz equation, being passed to X-ray
Broadcast constant（propagation constant）β and conductting layer（guiding layer）The relation formula of thickness d,, wherein k0 is vacuum medium wave moving vector, and n1 is the refractive index of carbon film layer, and ξ is Helmholtz
The characteristic value of equation.This formula is unfolded using Taylor's formula, obtains the pass between a small amount of Δ d of thickness and a small amount of Δ β of propagation constant
System.
WhereinFor waveguide parameter, n1 is carbon film layer refractive index, and n2 is molybdenum thin-film refractive index, and β 0 is
The propagation parameter of 8th tunic carbon film layer, d0 are the thickness of the 8th tunic carbon film layer, and ξ 0 is that the equation of the 8th tunic carbon film layer is special
Value indicative.
Since the phase phase and propagation constant β and the length l of waveguide of waveguide are directly proportional, and then obtain by changing not
The method of the phase of X-ray outgoing is influenced with the thickness of carbon film layer.
Then it utilizes the method to adjust different carbon layers having thicknesses, generates out of phase, enable outgoing light near field focus.
When designing multilayer film waveguide, by the 8th tunic（Carbon thin film layer）Centered on film layer, thickness is maintained at 8.0 nanometers, and determines it
Phase change is 0.Using the formula of obtained phase and carbon film layer thickness, change carbon film layer thickness, reduces layer 6 C film
Layer and the tenth layer of carbon thin film layer thickness are 7.6 nanometers, and change layer 7 molybdenum film layer and the 9th layer of molybdenum film layer thickness is
52.4 nanometers.The purpose is to ensure that one layer of molybdenum film layer and one layer of carbon thin film layer overall thickness are 60.0 nanometers, facilitate practical preparation
Middle control thicknesses of layers and precision.And then the 4th layer of carbon thin film layer and Floor 12 carbon thin film layer thickness are reduced with this and received for 6.2
Rice, and it is 53.8 nanometers to change layer 5 molybdenum film layer and eleventh floor molybdenum film layer thickness.Reduce second layer carbon thin film layer and
14th layer of carbon thin film layer thickness is 4.0 nanometers, and changes third layer molybdenum film layer and the 13rd layer of molybdenum film layer thickness is
56.0 nanometers, it is 50.0 nanometers finally to keep first layer molybdenum film layer and the 15th layer of molybdenum film layer thickness, as outer layer channel
Protective layer, as shown in Fig. 1.And Finite Element Difference Method is utilized, it calculates in 19.9keV, the feelings that WGA length is 280 microns
Under condition, the field distribution situation of x-ray in a vacuum, as shown in Fig. 4.The position of calculating two level focus is practical at 945 microns
Transmitance is 0.0907, focus signal-to-noise ratio（I_r）It is 10.72, and then determines that etching length is 945 microns.
Followed by the preparation of the aperiodic X-ray multilayer membrane sample of molybdenum/carbon, prepared using magnetically controlled DC sputtering technology non-
Periodic multilayer film sample（Wang Fengli, Wang Zhanshan, Zhang Zhong, Wu Wenjuan, Wang Hongchang, Zhang Shumin, Qin Shuji, Chen Lingyan, 13
（2005）28-33 ）,（Xu's Yao, Wang Zhanshan, Xu Jing, Zhang Zhong, Wang Hongchang, Zhu Jingtao, Wang Fengli, Wang Bei, Qin Shuji, Chen Lingyan,
Optical precision engineering, 15（2007）1838-1843）.Molybdenum film layer and C film are alternately deposited on substrate surface refer to
On substrate surface, the first layer film is molybdenum aluminum film layer, and the second layer film is carbon thin film layer, and third layer film is molybdenum film layer,
Four-level membrane is carbon thin film layer, and layer 5 film is molybdenum film layer, and so on, until last layer（15th layer）Film
It is molybdenum film layer.
After obtained molybdenum/carbon non-periodic multilayer deep processing, the preparation of X-ray multilayer film waveguide is carried out.Steps are as follows,
See that obtained multilayer membrane sample is carried out deep processing, anti-electron beam film is coated in sample thin film by attached drawing 2, step A；Step B,
Utilize electron beam lithography（E-beam）, fixed width Lc is etched in specific position；Step C, utilizes ion beam etching
（Reactive Ion Etching）Corresponding width is etched on sample；Step D, by the anti-electron beam thin film removing in surface
（Mask Removal）；Step E, benefit tunic sample surfaces carry out high temperature adhesives with germanium substrate（Wafer Bonding）.
Based on the above method, simulation calculates the aperiodic X-ray multilayer film waveguide of molybdenum/carbon when work capacity is 19.9 keV
Near field transmission figure.Simulation electric field is carried out using finite difference calculus to transmit, the sample of simulation goes out to generate focusing, two level focus near field
It is separating out at 945 microns of mouth, thus is etching length and be set as 945 microns, and then adjusting the length of second waveguide structure WGA2, from
In attached drawing 6.1 as can be seen that when the length of second waveguide structure WGA2 is 140 microns, actual transmission 0.0196, light
Spot size is 45 nm, and focus signal-to-noise ratio I_r is 24.61；As can be seen that working as the length of second waveguide structure WGA2 from attached drawing 6.2
When degree is 280 microns, actual transmission 0.0032, spot size is 60 nm, and focus signal-to-noise ratio I_r is 16.72；From attached
In Fig. 6 .3 as can be seen that when the length of second waveguide structure WGA2 is 560 microns, actual transmission 0.00129, light
Spot size is 75 nm, and focus signal-to-noise ratio I_r is 15.74.
Although its result ratio is in germanium substrate, the actual transmission 0.0117 of traditional molybdenum/carbon non-periodic multilayer of preparation
It is low, but its focus signal-to-noise ratio（15.74~24.61）It is apparently higher than traditional molybdenum/carbon non-periodic multilayer 10.72.
It is proved by embodiment 1 and embodiment 2, novel Mo of the invention/carbon non-periodic multilayer waveguiding structure can incite somebody to action
Focus is maintained at 45 nanometers, and can effectively promote focus signal-to-noise ratio.It is calculated as can be seen that embodiment 1 and reality by simulating
The focus signal-to-noise ratio for applying example 2 is promoted obviously, is demonstrated this of this patent proposition and is utilized phase focusing method and physics standardization, will
Design of the X-ray focusing near field is feasible.One-dimensional multilayer film waveguide for Future Development higher performance and two-dimentional multilayer
Film waveguide provides important thought.
Claims (10)
1. a kind of dimension X-ray multilayer film waveguiding structure, it is characterised in that the waveguiding structure include substrate, top-side substrate,
And the molybdenum being equipped between substrate and top-side substrate/carbon non-periodic multilayer, the molybdenum/carbon non-periodic multilayer is by alternately setting
Some molybdenum film layers and carbon thin film layer are constituted, the carbon thin film layer as conductting layer, the molybdenum film layer as wall,
The molybdenum/carbon non-periodic multilayer is equipped with gap relative to the surface of top-side substrate side, and the gap will be described
Molybdenum/carbon non-periodic multilayer be separated into the first wave conducting shell that length is L1 and the second waveguide layer that length is L2, pass through control
The length Lc in the gap and length L2 of second waveguide layer, to realize the property regulation of focal beam spot.
2. dimension X-ray multilayer film waveguiding structure as described in claim 1, it is characterised in that the length of the first wave conducting shell
Spend L1=280 micron, length L2=140 ~ 560 micron of the second waveguide layer, length Lc=225 micron in gap.
3. dimension X-ray multilayer film waveguiding structure as described in claim 1, it is characterised in that：The first wave conducting shell
Length L1=280 micron, length L2=140 ~ 560 micron of the second waveguide layer, length Lc=945 micron in gap.
4. dimension X-ray multilayer film waveguiding structure as described in claim 1, it is characterised in that the molybdenum/carbon is aperiodic more
Total film layer number of tunic is 15 layers, and overall thickness is 452 ~ 468 nanometers.
5. dimension X-ray multilayer film waveguiding structure as claimed in claim 4, it is characterised in that the molybdenum/carbon is aperiodic more
In tunic, the first layer film is the molybdenum film layer that thickness is 50.0 nanometers, and the second layer film is the C film that thickness is 4.0 nanometers
Layer, third layer film are the molybdenum film layers that thickness is 56.0 nanometers, and four-level membrane is the carbon thin film layer that thickness is 6.2 nanometers,
Layer 5 film is the molybdenum film layer that thickness is 53.8 nanometers, and layer 6 film is the carbon thin film layer that thickness is 7.6 nanometers, the
It is 52.4 nanometers of molybdenum film layer that seven layer films, which are thickness, and the 8th layer film is the carbon thin film layer that thickness is 8.0 nanometers, the 9th
It is 52.4 nanometers of molybdenum film layer that layer film, which is thickness, and the tenth layer film is the carbon thin film layer that thickness is 7.6 nanometers, the 11st
It is 53.8 nanometers of molybdenum film layer that layer film, which is thickness, and Floor 12 film is the carbon thin film layer that thickness is 6.2 nanometers, the tenth
Three-layer thin-film is the molybdenum film layer that thickness is 56.0 nanometers, and the tenth four-level membrane is the carbon thin film layer that thickness is 4.0 nanometers, the
15 layer films are the molybdenum film layers that thickness is 50.0 nanometers.
6. dimension X-ray multilayer film waveguiding structure as described in claim 1, it is characterised in that the molybdenum film layer is by purity
It is made of 99.999% Molybdenum metal materials industry, the carbon thin film layer is made of purity of 99.999% carbon material.
7. a kind of preparation method of dimension X-ray multilayer film waveguiding structure as described in claim 1-6 is any, it is characterised in that
The preparation method includes：It is etched on the surface relative to top-side substrate side in the molybdenum/carbon non-periodic multilayer
Gap, and make the gap that the molybdenum/carbon non-periodic multilayer to be separated into first wave conducting shell and length that length is L1
For the second waveguide layer of L2, by controlling the length Lc in the gap and length L2 of second waveguide layer, to realize focusing light
The property regulation of spot.
8. the preparation method of dimension X-ray multilayer film waveguiding structure as claimed in claim 7, it is characterised in that described in determining
The method of the length Lc in gap is as follows：The setting X-ray multilayer film waveguide work is under 19.9 keV energy, by X
Ray obtains the relation formula of propagation constant β and conductting layer thickness d in the solution of waveguide entrance Helmholtz equation,, wherein k0 is vacuum medium wave moving vector, and n1 is the refractive index of carbon film layer, and ξ is Helmholtz side
This formula is unfolded using Taylor's formula for the characteristic value of journey, obtains the relationship between a small amount of Δ d of thickness and a small amount of Δ β of propagation constant：
WhereinFor waveguide parameter, n1 is carbon film layer refractive index, and n2 is molybdenum thin-film refractive index, and β 0 is
The propagation parameter of carbon thin film layer in an intermediate position in the molybdenum/carbon non-periodic multilayer, d0 are molybdenum/carbon non-week
The thickness of carbon thin film layer in an intermediate position in phase multilayer film, ξ 0 are in the molybdenum/carbon non-periodic multilayer in centre
The formulation character value of the carbon thin film layer of position；
Since the phase of waveguide is directly proportional to propagation constant β and the length l of waveguide, and then obtain by changing different carbon film layers
Thickness come influence X-ray outgoing phase method, by the length of the L1 of initial setting, so obtain first wave conducting shell be emitted
The position of focus and spot size, and according to not bright Hough diffraction effect, determine etching length Lc：
。
9. the preparation method of dimension X-ray multilayer film waveguiding structure as claimed in claim 7, it is characterised in that utilize DC magnetic
It is aperiodic more to form the molybdenum/carbon that control sputtering method is alternately coated with several molybdenum film layers and carbon thin film layer successively in substrate
Tunic.
10. the preparation method of dimension X-ray multilayer film waveguiding structure as claimed in claim 7, it is characterised in that between etching
The method of gap is specific as follows：
Step A carries out deep processing, in the upper table of the molybdenum/carbon non-periodic multilayer to the molybdenum/carbon non-periodic multilayer
Face is coated with anti-electron beam film；
Step B etches fixed width Lc using electron beam lithography on anti-electron beam film；
Step C etches corresponding width Lc to form gap and using ion beam etching on molybdenum/carbon non-periodic multilayer
One ducting layer and second waveguide layer；
Step D, by the anti-electron beam thin film removing of molybdenum/carbon non-periodic multilayer upper surface；
Molybdenum/carbon non-periodic multilayer upper surface and top-side substrate are carried out high temperature adhesives by step E.
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| CN111628263A (en) * | 2020-06-04 | 2020-09-04 | 上海航天电子通讯设备研究所 | LCP-based multi-layer rectangular three-dimensional micro waveguide manufacturing method and micro waveguide |
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