CN108345175A - A kind of preparation method of photoresist, photoresist and optical filter - Google Patents
A kind of preparation method of photoresist, photoresist and optical filter Download PDFInfo
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- CN108345175A CN108345175A CN201810121751.7A CN201810121751A CN108345175A CN 108345175 A CN108345175 A CN 108345175A CN 201810121751 A CN201810121751 A CN 201810121751A CN 108345175 A CN108345175 A CN 108345175A
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- pigment
- photoresist
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- preparation
- pigment solution
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
Abstract
This application discloses a kind of preparation method of photoresist, which includes：Prepare pigment solution；Silane coupling agent is added in pigment solution, polycondensation reaction is hydrolyzed, so that the surface of pigment coats siloxane polymer, and reactive group is formed on the surface of siloxane polymer；The pigment solution after polycondensation reaction and dispersant will be hydrolyzed, carries out decentralized processing；Pigment solution after decentralized processing is mixed with photoreactive monomer, resin to obtain photoresist；Wherein, reactive group is combined when carrying out decentralized processing with dispersant, or when being mixed with photoreactive monomer or resin-bonded.There is stability using the photoresist that above-mentioned preparation method is prepared, the generation of pore and Superficial Foreign Body can be effectively reduced.
Description
Technical field
This application involves photoresist preparation process field, more particularly to a kind of preparation method of photoresist, photoresist and
Optical filter.
Background technology
The stability of photoresist determines its stability in processing procedure, and then determines the performance of filter coating.If pigment
Or the dispersion of dyestuff is unstable or particle size is uneven, is easy to cause it and occurs pigment agglomerates in hot processing procedure together
Phenomenon forms pore, and then influences the contrast of filter coating；Or in UV wash phases, due to point of UV photo damage pigment
It dissipates, causes pigment to be precipitated and recrystallized on surface, form foreign matter, influence the color of color filter film, and then influence the color of LCD
Domain.
Invention content
The application provides a kind of preparation method of photoresist, photoresist and optical filter, is easy with solving existing photoresist
The problems such as generation pore and Superficial Foreign Body, stability is poor.
In order to solve the above technical problems, this application provides a kind of preparation methods of photoresist, wherein preparation method packet
It includes：Prepare pigment solution；Silane coupling agent is added in pigment solution, polycondensation reaction is hydrolyzed, so that pigment
Surface coats siloxane polymer, and forms reactive group on the surface of siloxane polymer；After polycondensation reaction being hydrolyzed
Pigment solution and dispersant, carry out decentralized processing；By after decentralized processing pigment solution and photoreactive monomer, resin into
Row mixing is to obtain photoresist；Wherein, reactive group is combined when carrying out decentralized processing with dispersant, or when being mixed
With photoreactive monomer or resin-bonded.
In order to solve the above technical problems, present invention also provides a kind of photoresists, wherein photoresist includes surface coated Si
Pigment, dispersant, photoreactive monomer and the resin of oxygen polymer, pigment by the reactive group on silicon-oxygen polymer surface with point
Powder, photoreactive monomer or resin-bonded.
In order to solve the above technical problems, present invention also provides a kind of optical filters, wherein optical filter is by above-mentioned photoresist
It is prepared.
In application scheme, pigment solution is prepared；Silane coupling agent is added in pigment solution, polycondensation is hydrolyzed
Reaction so that the surface of pigment coats siloxane polymer, and forms reactive group on the surface of siloxane polymer；It will be into
Pigment solution after row hydrolysis condensation reaction and dispersant carry out decentralized processing；By after decentralized processing pigment solution with
Photoreactive monomer, resin are mixed to obtain the photoresist；Wherein, reactive group is when carrying out decentralized processing and dispersant
In conjunction with, or when being mixed with photoreactive monomer or resin-bonded.The photoresist being prepared using above-mentioned preparation method
With stability, the generation of pore and Superficial Foreign Body can be effectively reduced.
Description of the drawings
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technology description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
Some embodiments of invention for those of ordinary skill in the art without creative efforts, can be with
Obtain other attached drawings according to these attached drawings.
Fig. 1 is the flow diagram of one embodiment of preparation method of the application photoresist；
Fig. 2 be the application photoresist one embodiment of preparation method in surface of pigments modify method schematic diagram；
Fig. 3 be the application photoresist one embodiment of preparation method in surface of pigments modification after group distribution schematic diagram；
Fig. 4 is the process schematic of the hydrolysis condensation reaction of siloxanes.
Specific implementation mode
Below in conjunction with the attached drawing in the embodiment of the present application, technical solutions in the embodiments of the present application carries out clear, complete
Site preparation describes.It is understood that specific embodiment described herein is only used for explaining the application, rather than the limit to the application
It is fixed.It also should be noted that illustrating only for ease of description, in attached drawing and the relevant part of the application and not all knot
Structure.Based on the embodiment in the application, those of ordinary skill in the art are obtained without creative efforts
Every other embodiment, shall fall in the protection scope of this application.
Referring to Fig. 1, Fig. 1 is the flow diagram of one embodiment of preparation method of the application photoresist.Specific preparation side
Method is as follows：
S101：Prepare pigment solution.
In this step, pigment is handled using polyelectrolyte, to obtain pigment solution, wherein in pigment solution
Pigment surface carry positive charge.Specifically, first by pigment and PSS, i.e. kayexalate and deionized water mixing is ground
Mill so that the surface of pigments in pigment solution carries negative electrical charge, is then rinsed, is centrifuged with deionized water, obtains surface band
There is the pigment sediment of negative electrical charge.Then, pigment sediment of the surface with negative electrical charge is dissolved in containing PDDA, i.e. polydiene
In the aqueous solution of diallyidimethylammonium chloride so that the surface of pigments in pigment solution carries positive charge, then uses deionized water
It is rinsed, centrifuges, obtain the pigment sediment that surface carries positive charge.Surface obtained above is carried to the pigment of positive charge
Sediment is dissolved in alcohol water blend, obtains pigment solution.Wherein, in the present embodiment using titanium cyanines system pigment,
In other embodiment same operation can also be carried out to other type pigment.
S102：Silane coupling agent is added in pigment solution, polycondensation reaction is hydrolyzed, so that the surface cladding of pigment
Siloxane polymer, and form reactive group on the surface of siloxane polymer.
In this step, certain density ammonia solution and certain density silicon is added in the pigment solution obtained toward step S101
Alkane coupling agent.Wherein, silane coupling agent is reacted 10~30 hours under room temperature environment and is modified surface of pigments, i.e., in room temperature
Polycondensation reaction is hydrolyzed in lower silane coupling agent so that surface of pigments coats a strata silicone resin；And certain density ammonia
Solution gives the hydrolysis condensation reaction of silane coupling agent to provide a kind of reaction environment in the present embodiment.Specifically, toward pigment solution
The concentration range of the ammonia solution of addition is 0.05g/L~0.5g/L, is in the present embodiment 0.15g/L；And the silane being added is even
A concentration of 0.01mol/L~the 0.05mol/L for joining agent, is in the present embodiment 0.03mol/L；The concentration of water is 1~10mol/
L is in the present embodiment 7mol/L.
The preparation process of above-mentioned steps specifically sees Fig. 2, and Fig. 2 is in one embodiment of preparation method of the application photoresist
The method schematic diagram of surface of pigments modification.Wherein pigment 21 obtains surface band after PSS, PDDA and deionized water fully react
The pigment of positive charge, be then added into the alcohol water blend of pigment certain density ammonia solution with it is certain density silane coupled
Agent so that surface of pigments forms one layer of silicone resin 22 and forms reactive group 23.The type of reactive group 23 depends on adding
Enter different silane monomers.
Wherein, in the present embodiment, the type of reactive group includes unsaturated bond, hydroxyl group and amino group.To face
Group after material surface is modified is distributed referring specifically to Fig. 3.Wherein, 31 surface of pigment includes one layer of 32 He of silicone resin
Different reactive groups specifically includes unsaturated bond 33, hydroxyl group 34 and amino group 35.Specific reaction is as follows：By silicon
The hydrolysis condensation reaction of alkane so that the polyorganosiloxane resin surface for being coated on pigment/dye surface carries amino or hydroxyl, can be with
It is reacted with the carboxyl in dispersion resin, improves the stability of pigment/dye.In the present embodiment, the ammonia in silane monomer
Base can be hydramine, can also be single or multiple amino；Likewise, the hydroxyl in silane monomer can make it is single or more
A hydroxyl, does not limit herein.
Wherein, the hydrolysis condensation reaction of siloxanes can be specifically the process of the hydrolysis condensation reaction of siloxanes refering to Fig. 4
Schematic diagram.Further, due to containing C=C groups in the silane coupling agent photoreactive monomer of addition, in the poly- of surface of pigments covering
Silicone surface also just contains C=C, and C=C here can be participated in aftermentioned photopolymerization reaction, be further increased
The stability of pigment.
S103：The pigment solution after polycondensation reaction and dispersant will be hydrolyzed, carries out decentralized processing.
In this step, pigment that surface modification is crossed and dispersion resin, dispersant etc. are mixed, it is evenly dispersed to form anti-face
Expect dispersion liquid.In the process, reactive group combined with dispersant or in following process polymerisations with photoreactive monomer knot
It closes.
S104：Pigment solution after decentralized processing is mixed with photoreactive monomer, resin to obtain photoresist.
In this step, it is mixed in pigment solution photoreactive monomer being added after decentralized processing, is added to tree after mixing
It in the solvent solution of fat, stirs evenly, is then added and starts agent, additive etc., form photoresist, wherein mixed sequence can
To carry out adjustment appropriate as needed, specific restriction is not done herein.
Photoreactive monomer and the specific reaction process of pigment are as follows：By being modified in the monomer of silane hydrolyzate polycondensation,
Can make surface of pigments carry unsaturated bond, in photopolymerization reaction with photoreactive monomer, or the resin with unsaturated bond
Reaction is participated in together, and pigment is fixed in polymer network structure, the precipitation and reunion of pigment are prevented.It can also be in silane water
The monomer for solving polycondensation modifies hydroxyl, and the resin in dispersion resin and photoresist generally all contains the carboxyl of indefinite quantity, can be with
By the esterification of carboxyl and hydroxyl, pigment is fixed on resin, promotes the stability of pigment.It can also be in silane hydrolyzate
Pigment is fixed on resin by the monomer modification amino of polycondensation by the dehydration of carboxyl and amino, promotes the stabilization of pigment
Property.
The stability protocol for the photoresist that the application proposes, is applicable not only to the colored photoresist of UV photocurings, is also suitable
In heat cure, it is seen that the colored photoresist and black matrix" photoresist of photocuring.
The stability protocol for the photoresist that the application proposes is applicable not only to the most common pigment dispersion of current LCD industries
The photoresist of method is equally applicable to the photoresist that inkjet printing uses.
The present embodiment, by the method for hydrolytie polycondensation in surface of pigments modification reaction group, in the dispersion process of pigment,
It can be combined together by the active force of chemical bond with dispersion resin, promote the dispersion stabilization of pigments or dyes, it is poly- in light
It closes and pigment is fixed in the network of polymer in reaction, to prevent the aggregation and precipitation of pigment, solve from the root cause small black
The problem of point and Superficial Foreign Body.
Present invention also provides a kind of photoresists, can be prepared by above-mentioned preparation method, and photoresist includes surface cladding
Pigment, dispersant and the photoreactive monomer of silicon-oxygen polymer, reactive group and dispersion of the pigment by silicon-oxygen polymer surface
Agent or photoreactive monomer combine.
Present invention also provides a kind of optical filter, which can be prepared by above-mentioned photoresist.In the present embodiment
In, optical filter can be colored filter, and the performance of colored filter depends primarily on the performance of color filter film.Colorized optical filtering
Film (Color filter, CF) is the critical component that liquid crystal display (LCD) realizes colorization, and action principle utilizes optical filtering
Mode generates red (R), green (G), blue (B) three primary colors, then three primary colors are mixed in different proportions and generate various colors, makes
LCD shows colour.The performance quality of color filter film directly influences the performances such as color saturation and the color contrast of LCD.
Color filter film can be used the modes such as pigment dispersion method, decoration method and ink-jet method and prepare, and the raw material of wherein most critical are colored
Photoresist.Colored photoresist mainly include photoreactive monomer (monomer), resin (polymer), pigment (pigment) or
Dyestuff (dye), photoinitiator (photo initiator), solvent (solvent), the components such as additive (additive)；Wherein
Monomer is the main component of polymerisation, and resin plays the role of disperseing pigment and monomer, and photoinitiator is used for causing monomer
Polymerisation.Illustrate the formation mechenism of color filter film by taking the colored photoresist of photopolymerization reaction as an example：In the irradiation of UV light
Under, photoinitiator is inspired free radical, causes the polymerisation of monomer, forms the polymer of high molecular weight, the polymer
It is not easy to be dissolved by the developing, in developing process be retained；And the place that do not irradiated by UV light, since resin has one
Fixed acid value, is dissolved in developer solution, and the components such as monomer ＆ pigment are rinsed out；By the effect of mask, desired figure can be obtained
Shape；Colored photoresist by coating, prebake conditions, exposure, development, after toast etc. the stages, the color filter film that can be needed,
And the characteristic of color filter film and colored photoresist and process parameter are closely related.
Mode the above is only the implementation of the present invention is not intended to limit the scope of the invention, every to utilize this
Equivalent structure or equivalent flow shift made by description of the invention and accompanying drawing content, it is relevant to be applied directly or indirectly in other
Technical field is included within the scope of the present invention.
Claims (10)
1. a kind of preparation method of photoresist, which is characterized in that the method includes：
Prepare pigment solution；
Silane coupling agent is added in the pigment solution, polycondensation reaction is hydrolyzed, so that the surface cladding of the pigment
Siloxane polymer, and form reactive group on the surface of the siloxane polymer；
The pigment solution after polycondensation reaction and dispersant will be hydrolyzed, carries out decentralized processing；
Pigment solution after decentralized processing is mixed with photoreactive monomer, resin to obtain the photoresist；
Wherein, the reactive group is combined when carrying out decentralized processing with the dispersant, or when being mixed with it is described
Photoreactive monomer or the resin-bonded.
2. preparation method according to claim 1, which is characterized in that it is described to prepare pigment solution, including：
Pigment is handled using polyelectrolyte, to obtain pigment solution, the surface of pigment is with just in the pigment solution
Charge.
3. preparation method according to claim 2, which is characterized in that it is described that pigment is handled using polyelectrolyte,
Including：
Pigment is mixed with PSS and deionized water, surface is enabled the pigment to and carries negative electrical charge；
Then by pigment dissolved of the surface with negative electrical charge in PDDA solution so that the surface of pigments carries positive charge.
4. preparation method according to claim 1, which is characterized in that described that the pigment solution is added in silane coupling agent
In, including：
It is added in the pigment solution after ammonia solution and silane coupling agent are mixed.
5. preparation method according to claim 4, which is characterized in that a concentration of 0.05g/L~0.5g/ of the ammonia solution
L, a concentration of 0.01mol/L~0.05mol/L of the silane coupling agent.
6. preparation method according to claim 1, which is characterized in that described that the pigment solution is added in silane coupling agent
In, polycondensation reaction is hydrolyzed, including：
Silane coupling agent is added in the pigment solution, polycondensation reaction is hydrolyzed at normal temperatures 10~30 hours.
7. preparation method according to claim 1, which is characterized in that the reactive group includes unsaturated bond, hydroxyl base
Group or amino group.
8. preparation method according to claim 1, which is characterized in that the pigment solution by after decentralized processing and light are anti-
Monomer, resin is answered to be mixed to obtain the photoresist, including：
Pigment solution after decentralized processing is mixed with photoreactive monomer, resin, beginning agent, additive and solvent to obtain
To the photoresist.
9. a kind of photoresist, which is characterized in that the photoresist includes pigment, dispersant, the light of surface cladding silicon-oxygen polymer
Reaction monomers and resin, the reactive group and the dispersant, the light that the pigment passes through the silicon-oxygen polymer surface
Reaction monomers or the resin-bonded.
10. a kind of optical filter, which is characterized in that the optical filter is made by the photoresist described in claim 9.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810121751.7A CN108345175A (en) | 2018-02-06 | 2018-02-06 | A kind of preparation method of photoresist, photoresist and optical filter |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810121751.7A CN108345175A (en) | 2018-02-06 | 2018-02-06 | A kind of preparation method of photoresist, photoresist and optical filter |
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Citations (6)
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| CN101979445A (en) * | 2009-04-07 | 2011-02-23 | 精工爱普生株式会社 | Water-resistant aluminum pigment, its dispersion and method for producing the dispersion |
| CN102791806A (en) * | 2010-01-28 | 2012-11-21 | 新加坡科技研究局 | A nano-composite |
| CN104470992A (en) * | 2012-05-09 | 2015-03-25 | 太阳化学公司 | Surface modified pigment particles, method of preparation and application thereof |
| CN104969126A (en) * | 2013-02-14 | 2015-10-07 | 东丽株式会社 | Negative-type photosensitive coloring composition, cured film, light-shielding pattern for touch panel, and touch panel manufacturing method |
| CN106336582A (en) * | 2016-08-29 | 2017-01-18 | 武汉金牛经济发展有限公司 | Color master batch with high color fastness to light and preparing method |
| CN107207885A (en) * | 2015-02-03 | 2017-09-26 | 巴斯夫涂料有限公司 | The method for forming the passivation graining paste for aqueous finish paint coating composition |
-
2018
- 2018-02-06 CN CN201810121751.7A patent/CN108345175A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101979445A (en) * | 2009-04-07 | 2011-02-23 | 精工爱普生株式会社 | Water-resistant aluminum pigment, its dispersion and method for producing the dispersion |
| CN102791806A (en) * | 2010-01-28 | 2012-11-21 | 新加坡科技研究局 | A nano-composite |
| CN104470992A (en) * | 2012-05-09 | 2015-03-25 | 太阳化学公司 | Surface modified pigment particles, method of preparation and application thereof |
| CN104969126A (en) * | 2013-02-14 | 2015-10-07 | 东丽株式会社 | Negative-type photosensitive coloring composition, cured film, light-shielding pattern for touch panel, and touch panel manufacturing method |
| CN107207885A (en) * | 2015-02-03 | 2017-09-26 | 巴斯夫涂料有限公司 | The method for forming the passivation graining paste for aqueous finish paint coating composition |
| CN106336582A (en) * | 2016-08-29 | 2017-01-18 | 武汉金牛经济发展有限公司 | Color master batch with high color fastness to light and preparing method |
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Application publication date: 20180731 |
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