CN108335967A - A kind of flexible multi-layered nested structure preparation method based on solvable intermediate transfer layer - Google Patents
A kind of flexible multi-layered nested structure preparation method based on solvable intermediate transfer layer Download PDFInfo
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- CN108335967A CN108335967A CN201711482223.6A CN201711482223A CN108335967A CN 108335967 A CN108335967 A CN 108335967A CN 201711482223 A CN201711482223 A CN 201711482223A CN 108335967 A CN108335967 A CN 108335967A
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- 238000012546 transfer Methods 0.000 title claims abstract description 22
- 238000002360 preparation method Methods 0.000 title claims abstract description 17
- 239000000463 material Substances 0.000 claims abstract description 25
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 19
- 239000010703 silicon Substances 0.000 claims abstract description 19
- 239000000758 substrate Substances 0.000 claims abstract description 19
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 18
- 239000002086 nanomaterial Substances 0.000 claims abstract description 8
- 239000004205 dimethyl polysiloxane Substances 0.000 claims description 35
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 claims description 35
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 claims description 35
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims description 35
- 235000013870 dimethyl polysiloxane Nutrition 0.000 claims description 33
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 16
- 238000003756 stirring Methods 0.000 claims description 10
- 238000001291 vacuum drying Methods 0.000 claims description 8
- 239000007788 liquid Substances 0.000 claims description 7
- 229920000642 polymer Polymers 0.000 claims description 7
- 235000019441 ethanol Nutrition 0.000 claims description 6
- 238000007790 scraping Methods 0.000 claims description 6
- IDGUHHHQCWSQLU-UHFFFAOYSA-N ethanol;hydrate Chemical compound O.CCO IDGUHHHQCWSQLU-UHFFFAOYSA-N 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims description 3
- -1 poly dimethyl oxygen alkane Chemical class 0.000 claims description 3
- 239000000843 powder Substances 0.000 claims description 3
- 239000000741 silica gel Substances 0.000 claims description 3
- 229910002027 silica gel Inorganic materials 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 abstract description 51
- 229920002451 polyvinyl alcohol Polymers 0.000 abstract description 51
- 238000000034 method Methods 0.000 abstract description 14
- 150000001875 compounds Chemical group 0.000 abstract description 11
- 238000005516 engineering process Methods 0.000 abstract description 8
- 238000000059 patterning Methods 0.000 abstract description 6
- 230000003362 replicative effect Effects 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000011160 research Methods 0.000 description 2
- 239000002390 adhesive tape Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 125000005909 ethyl alcohol group Chemical group 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 230000003075 superhydrophobic effect Effects 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Micromachines (AREA)
Abstract
The present invention discloses a kind of flexible multi-layered nested structure preparation method based on solvable intermediate transfer layer, belongs to MEMS technology field.The present invention proposes a kind of process being based on the solvable intermediate transfer layer of polyvinyl alcohol (PVA), complete across scale micro-nano structure pattern transfer, it establishes and soluble PVA intermediate transfers layer is prepared with silicon substrate original stencil, then in the process route for replicating flexible complicated multilayer micro-nano compound structure with PVA intermediate transfer layers.This method is realizing the preparation completed while the transfer from the positive figure of hard to flexible positive figure across scale flexible material, to reduce the complicated technology for preparing hard negative patterning in conventional procedure, and to realize that the preparation of more complicated structural flexibility material provides technical foundation.
Description
Technical field
The present invention relates to one kind based in MEMS technology (micromechanics electronic technology) more particularly to a kind of micro-nano electronic technology
Micro-nano flexible structure preparation method.
Background technology
Micro-nano functional structure based on flexible material has important in medicine, the fields such as Surface Science and micronano optical
Application value.This flexible material with micro-nano functional structure is super-hydrophobic in cell screening, the fields such as opto-electronic device
Extensive research is carried out.
When required flexible material its micro-nano structure is sufficiently complex, such as three layers of micro-nano compound structure, if using traditional
Process：1. directly preparing this flexible material in the way of pouring by hard negative norm plate.The key of this mode
It is to prepare hard negative norm plate, and the corresponding hard negative norm plate of three layers of micro-nano compound structure flexible material will be three layers a kind of
The structure of trough of belt in slot, this structure is difficult processing, therefore be cannot achieve.2. using the flexible manufacturing technique repeatedly shifted, with
The positive figure of hard is template.This mode there is from the positive figure of hard to soft negative patterning again to the cycle of the positive figure of hard,
The hard material with positive figure is can only obtain using the positive figure of hard as template, therefore cannot achieve.3. utilizing the side of coining
Formula imprints the flexible material for providing three layers of micro-nano compound structure.This mode can cause to imprint because of the limitation of inherent parameters
The micro-nano compound structure gone out loses, to prepare conformal flexible material.Therefore, the application of this flexible material
Receive certain limitation.
Entitled with Patent No. CN106268991A《A kind of production method of PDMS micro-fluidic chips》And Patent No.
CN107186298A is entitled《A kind of groove array electrochemical machining system and method based on PDMS templates》For a series of of representative
The preparation of its PDMS structure is to pour completion under vacuum with hard negative patterning material pattern in patent.Therefore, it is necessary to make
PDMS structures can be just obtained for hard negative patterning material pattern is gone out.When required flexible material its structure is originally sufficiently complex,
It is often difficult to out hard negative patterning material pattern, this preparation method is just restricted.
It is entitled with patent publication No. CN106799830A《A kind of polymer surfaces micro-structure hot pressing of plasmaassisted
Impression method》It is entitled with Patent No. CN104281004A《A kind of method that pressure sintering prepares PDMS seals》For the patent of representative,
Can the flexible material with micro-nano structure be printed off in micro-meter scale and nanoscale pushing respectively.However, coining micro-meter scale is soft
The parameter of property material and the parameter of imprint nano scale flexible material are inconsistent.It, can not which results in when being imprinted across scale
Micron scale construction and nanostructure are taken into account, to necessarily cause the loss of micro-nano functional structure.
Therefore, the present invention proposes a kind of flexible multi-layered nested structure preparation method based on solvable intermediate transfer layer, specifically
Be a kind of process being based on the solvable intermediate transfer layer of polyvinyl alcohol (PVA), complete across scale micro-nano structure pattern transfer,
It establishes and soluble PVA intermediate transfers layer is prepared with silicon substrate original stencil, then flexible complicated more with the duplication of PVA intermediate transfer layers
The process route of layer micro-nano compound structure, can provide effective means for scientific research or industrialized production.
Invention content
The present invention proposes a kind of flexible multi-layered nested structure preparation method based on solvable intermediate transfer layer, its main feature is that
It realizes the preparation completed while the transfer from the positive figure of hard to flexible positive figure across scale flexible material, is passed to reduce
The complicated technology of hard negative patterning is prepared during system, and to realize that the preparation of more complicated structural flexibility material provides technology base
Plinth.
The technical scheme is that：A kind of flexible multi-layered nested structure preparation method based on solvable intermediate transfer layer,
Include the following steps：
Step 1：PVA powder is added in absolute ethyl alcohol, stirring is allowed to disperse.
Step 2：In 75 DEG C -80 DEG C of water-bath, suspended PVA and ethanol solution are mixed with water, is used in combination and stirs
Device stirring is mixed, until obtaining clarifying sticky PVA solution.
Step 3：Passivated silicon substrate template is placed in container, prepared PVA solution is slowly then poured into container
In, extra PVA solution is scraped off with scraping blade, its liquid level is made to be flushed with container port, to control the thickness of PVA film.
Step 4：To prevent film warpage, first container is placed in vacuum drying chamber and is toasted, then is drawn off at normal temperatures
It stands until forming softer PVA film.
Step 5：PVA film and silicon substrate template are taken out together, slowly rolled up PVA film from one end using silica gel idler wheel
It rises, is allowed to be detached from silicon substrate template；At this point, the structure on silicon substrate is transferred on PVA film.
Step 6：After completing step 5, PVA film is gently removed from idler wheel immediately, by PVA film structureless one
Container bottom is fixed in face, then it is stood in room temperature and is allowed to further fix.
Step 7：It is stirred after poly dimethyl oxygen alkane (PDMS) performed polymer is mixed in proportion with curing agent, it is then dry in vacuum
Vacuum outgas in dry case.
Step 8：PDMS is poured into container 6, extra PDMS is scraped off with scraping blade, its liquid level is made to be flushed with container port,
To control the thickness of PDMS material.
Step 9：Container 6 is placed in vacuum drying chamber, baking is allowed to be shaped to PDMS film.
Step 10：PDMS film and PVA film polymer are taken out from container, the ethyl alcohol for then placing it in heat is water-soluble
In liquid, until PVA film is dissolved in ethanol water, then PDMS fexible films is taken out and are dried up, obtain having micro-nano structure
PDMS fexible films.
The beneficial effects of the invention are as follows：
1. in order to reach " preparation of flexible complexity multilayer micro-nano compound structure " this most important technical purpose, provide
It is a kind of " soluble PVA intermediate transfers layer to be prepared with silicon substrate original stencil, flexible complexity is then being replicated with PVA intermediate transfer layers
The one-piece pattern of multilayer micro-nano compound structure ".Since the intensity of silicon materials and PVA materials differs larger, complicated multilayer is micro-
Compound silicon structure of receiving is transferred to when demoulded on PVA materials, just can guarantee silicon substrate complexity multilayer micro-nano compound structure
It is not damaged, while PVA can be demoulded smoothly.To prepare flexible positive graphic structure by the positive graphics template of hard, break through
The limitation on the manufacture road of conventional flex technique.
2. during " replicating flexible complicated multilayer micro-nano compound structure with PVA intermediate transfer layers ", PVA film is existed
It is directly dissolved in ethanol solution, the process of PVA and PDMS demouldings is eliminated, to reduce figure during pattern transfer
Loss, realize the conformal preparation of flexible complicated multilayer micro-nano compound structure.
Description of the drawings
Fig. 1 is the schematic diagram for pouring PVA in silicon substrate template in PVA pours container
Fig. 2 is the schematic diagram for being detached from PVA film and silicon substrate template using idler wheel
Fig. 3 is the schematic diagram for pouring PDMS on PVA film in PDMS pours container
In figure：1-PVA solution, 2- silicon substrate templates, 3-PVA pour container, 4- idler wheels, and 5-PDMS, 6-PDMS pour container
Specific implementation method
Case study on implementation：
A kind of flexible multi-layered nested structure preparation method based on solvable intermediate transfer layer is given in the present embodiment, including
Following steps：
Step 1：The PVA powder of 3.5g is added in 35ml absolute ethyl alcohols, stirring always is allowed to keep dispersity.
Step 2：In 80 DEG C of water-bath, suspended PVA and ethanol solution are mixed with 60ml water, stirring is used in combination
Device stirs 5min, obtains clarifying sticky PVA solution.
Step 3：Passivated silicon substrate template 2 is placed in PVA to pour in container, then slowly by prepared PVA solution
It pours into container, extra PVA solution is scraped off with scraping blade, its liquid level is made to be flushed with container port, obtain 200 micron thickness
PVA film, as shown in Figure 1.
Step 4：To prevent film warpage, PVA is first poured into container it is placed in vacuum drying chamber at 60 DEG C and toast 4h, then
It is drawn off standing 9h 100 microns of thick PVA films of formation at normal temperatures.
Step 5：PVA film and silicon substrate template are taken out together, slowly rolled up PVA film from one end using silica gel idler wheel 4
It rises, is allowed to be detached from silicon substrate template；At this point, the structure on silicon substrate is transferred on PVA film.As shown in Figure 2.
Step 6：After completing step 5, PVA film is gently removed from idler wheel 4 immediately, using double faced adhesive tape by PVA film
The upper structureless PDMS that is fixed on one side pours container bottom, then it is stood 2h in room temperature.
Step 7：Stir 3min after 7ml poly dimethyl oxygen alkane (PDMS) performed polymers are mixed with 0.7ml curing agent, then in
In vacuum drying chamber under conditions of vacuum degree is less than 0.1bar vacuum outgas 20min.
Step 8：PDMS is poured into PDMS to pour in container, extra PDMS is scraped off with scraping blade, makes its liquid level and container end
Mouth flushes, and obtains the PDMS material of 200 micron thickness, as shown in Figure 3.
Step 9：PDMS is poured container to be placed in vacuum drying chamber, 4h, PDMS moldings are toasted at 80 DEG C.
Step 10：Polymer is poured from PDMS in container and is taken out, then places it in 80 DEG C of ethanol water, stirs
PVA film is dissolved in ethanol water after mixing 30min, then PDMS fexible films are taken out, and drying obtains having micro-nano structure
PDMS fexible films.
Claims (1)
1. a kind of flexible multi-layered nested structure preparation method based on solvable intermediate transfer layer, which is characterized in that including walking as follows
Suddenly：
Step 1：PVA powder is added in absolute ethyl alcohol, stirring is allowed to disperse；
Step 2：In 75 DEG C -80 DEG C of water-bath, suspended PVA and ethanol solution are mixed with water, blender is used in combination
Stirring, until obtaining clarifying sticky PVA solution；
Step 3：Passivated silicon substrate template is placed in container, is then slowly poured into prepared PVA solution in container, is used
Scraping blade scrapes off extra PVA solution, its liquid level is made to be flushed with container port, to control the thickness of PVA film；
Step 4：To prevent film warpage, first container is placed in vacuum drying chamber and is toasted, then is drawn off standing at normal temperatures
Until forming softer PVA film；
Step 5：PVA film and silicon substrate template are taken out together, slowly PVA film is rolled from one end using silica gel idler wheel, is made
With silicon substrate template be detached from；At this point, the structure on silicon substrate is transferred on PVA film；
Step 6：After completing step 5, PVA film is gently removed from idler wheel immediately, structureless one side on PVA film is consolidated
Due to container bottom, then it is stood in room temperature and is allowed to further fix；
Step 7：It is stirred after poly dimethyl oxygen alkane (PDMS) performed polymer is mixed in proportion with curing agent, then in vacuum drying chamber
Middle vacuum outgas；
Step 8：PDMS is poured into container 6, extra PDMS is scraped off with scraping blade, its liquid level is made to be flushed with container port, with control
The thickness of PDMS material processed；
Step 9：Container 6 is placed in vacuum drying chamber, baking is allowed to be shaped to PDMS film；
Step 10：PDMS film and PVA film polymer are taken out from container, then place it in the ethanol water of heat
In, until PVA film is dissolved in ethanol water, then PDMS fexible films are taken out and are dried up, obtains the PDMS for having micro-nano structure
Fexible film.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711482223.6A CN108335967A (en) | 2017-12-29 | 2017-12-29 | A kind of flexible multi-layered nested structure preparation method based on solvable intermediate transfer layer |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201711482223.6A CN108335967A (en) | 2017-12-29 | 2017-12-29 | A kind of flexible multi-layered nested structure preparation method based on solvable intermediate transfer layer |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030219992A1 (en) * | 2002-05-22 | 2003-11-27 | Schaper Charles Daniel | Replication and transfer of microstructures and nanostructures |
| CN102114682A (en) * | 2010-12-31 | 2011-07-06 | 山东理工大学 | Method for copying epidermis appearance of scaly organism by using copying template made of polyvinyl alcohol |
| CN104626433A (en) * | 2013-11-08 | 2015-05-20 | 纳米新能源（唐山）有限责任公司 | Polydimethylsiloxane membrane, preparation method thereof, and friction electric generator using same |
| CN104844814A (en) * | 2015-05-29 | 2015-08-19 | 北京化工大学 | Microneedle template and preparation method thereof |
-
2017
- 2017-12-29 CN CN201711482223.6A patent/CN108335967A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030219992A1 (en) * | 2002-05-22 | 2003-11-27 | Schaper Charles Daniel | Replication and transfer of microstructures and nanostructures |
| CN102114682A (en) * | 2010-12-31 | 2011-07-06 | 山东理工大学 | Method for copying epidermis appearance of scaly organism by using copying template made of polyvinyl alcohol |
| CN104626433A (en) * | 2013-11-08 | 2015-05-20 | 纳米新能源（唐山）有限责任公司 | Polydimethylsiloxane membrane, preparation method thereof, and friction electric generator using same |
| CN104844814A (en) * | 2015-05-29 | 2015-08-19 | 北京化工大学 | Microneedle template and preparation method thereof |
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Application publication date: 20180727 |