CN108321664B - Open-loop flowing heat-dissipation alkali metal vapor laser gain generator - Google Patents
Open-loop flowing heat-dissipation alkali metal vapor laser gain generator Download PDFInfo
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- CN108321664B CN108321664B CN201810239291.8A CN201810239291A CN108321664B CN 108321664 B CN108321664 B CN 108321664B CN 201810239291 A CN201810239291 A CN 201810239291A CN 108321664 B CN108321664 B CN 108321664B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/031—Metal vapour lasers, e.g. metal vapour generation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/041—Arrangements for thermal management for gas lasers
Abstract
The invention discloses an open-loop flowing heat dissipation alkali metal vapor laser gain generator which comprises a buffer gas storage source, a gas pressure and flow control device, a gas purification device, a gas heating device, a vacuum obtaining and detecting device, a mixing chamber and a laser chamber, wherein the buffer gas storage source is connected with the gas pressure and flow control device; the buffer gas in the buffer gas storage source flows through the gas purification device for purification at required air pressure and flow rate after being regulated by the gas pressure and flow rate control device, and the purified gas is uniformly mixed with the saturated vapor of the alkali metal atoms in the mixing chamber and then flows into the laser chamber; the gas is used to control the temperature within the laser cavity, and the gas exiting the laser cavity and carrying the waste heat is vented to atmosphere or to other gas storage chambers. The invention has the advantages of simple system structure, easy realization of uniform heating and precise temperature control, and the like.
Description
Technical Field
The invention mainly relates to the technical field of lasers, in particular to an open-loop flowing heat dissipation alkali metal vapor laser gain generator.
Background
A semiconductor pumped alkali metal vapor laser (DPAL) is an optically pumped gas laser that uses saturated vapor of alkali metal atoms as a gain medium and utilizes outer valence electron level transition to realize laser action. The laser combines the advantages of high power output of a semiconductor laser and flowing heat dissipation of a gas medium, has the characteristics of full electric operation, light weight, compactness, high quantum efficiency, good atmospheric transmission characteristic and the like, has high power calibration and amplification capacity, and has potential application value in the fields of laser energy transmission, aerospace, military and the like. One of the core technologies of high-power DPAL is to realize uniform and fast flow heat dissipation of a gas-phase gain medium, i.e., a mixed gas of alkali metal saturated vapor and buffer gas such as helium, in a laser gain region to maintain high-power continuous operation of a laser. At present, DPAL gain generators all use a closed loop circulating flow structure: the russian nuclear technology center realized closed-loop circulating-flow DPAL devices (Quantum electron.42, 2012, 95-98) in 2012, and the regs technologies and military officials in 2013 (US Patent, US 2014/0023100) and 2015 (opt. commun., 354, 2015, 256-258) realized closed-loop circulating-flow DPAL gain generators, respectively.
The closed-loop circulating flow DPAL gain generator has advantages in realizing miniaturization of a laser system, but has a plurality of technical difficulties and limitations: firstly, alkali metal atoms have extremely strong chemical reaction activity and corrosivity, the alkali metal atoms in a system can be consumed through chemical reaction due to the existence of trace water, oxygen, organic oil gas and the like, various non-metal sealing materials such as rubber rings, polytetrafluoroethylene and the like cannot be used due to the strong corrosivity of the alkali metal atoms, extremely harsh engineering and technological requirements are provided for the realization of a power device-a gas circulating pump in a closed-loop circulating system, a corrosion-resistant material needs to be adopted and the power device works in a completely closed and oil-free running mode, and particularly, an oil-free friction bearing needs to be adopted for a pump body impeller rotor, so that the continuous running life of the system can be greatly influenced; secondly, the saturated vapor pressure of the alkali metal (namely, the concentration of alkali metal atoms) is determined by the temperature of a cold spot in a circulating system, so that the gas circulating pump with an internal structure is difficult to realize uniform heating, and the available concentration of the alkali metal atoms of the system is influenced by the existence of the cold spot in the pump body; for a closed-loop circulating flow structure, a refrigeration measure is needed to restore the gas gain medium which is subjected to temperature rise in a laser gain area to the working temperature of the gas gain medium, so that extra energy supply is needed, and the total energy consumption of the system is increased; fourthly, under the condition of high buffer air pressure, such as helium filled in 10-20atm and the like, the power which can be provided by the gas circulating pump is limited by many factors such as air resistance, bearing endurable rotating speed and the like, and the flow rate of the power cannot meet the requirement of an actual power system.
Disclosure of Invention
The technical problem to be solved by the invention is as follows: aiming at the technical problems in the prior art, the invention provides the open-loop flowing heat dissipation alkali metal vapor laser gain generator which is simple in system structure and easy to realize uniform heating and precise temperature control.
In order to solve the technical problems, the invention adopts the following technical scheme:
an open-loop flowing heat dissipation alkali metal vapor laser gain generator comprises a buffer gas storage source, a gas pressure and flow control device, a gas purification device, a gas heating device, a vacuum obtaining and detecting device, a mixing chamber and a laser chamber; the buffer gas in the buffer gas storage source flows through the gas purification device at the required gas pressure and flow rate for purification after being regulated by the gas pressure and flow rate control device, and the purified gas is uniformly mixed with the saturated vapor of the alkali metal atoms in the mixing chamber and then flows into the laser chamber; the gas is used to control the temperature within the laser chamber, and the gas flowing out of the laser chamber and carrying the waste heat is vented to atmosphere or to other gas storage chambers.
As a further improvement of the invention: the alkali metal element is one or more of lithium, sodium, potassium, rubidium and cesium.
As a further improvement of the invention: the buffer gas is one of helium, neon, argon, krypton and xenon; or a mixed gas of one of helium, neon, argon, krypton and xenon with a hydrocarbon gas such as one of methane or ethane.
As a further improvement of the invention: the gas pressure and flow control device comprises one-stage or multi-stage pressure adjusting devices and one-stage or multi-stage flow adjusting devices, the one-stage or multi-stage pressure adjusting devices are used for adjusting the gas pressure in the buffer gas storage source to the gas pressure required by the operation of the laser, and the one-stage or multi-stage flow adjusting devices are used for adjusting the gas flow rate to the flow rate required by the operation of the laser.
As a further improvement of the invention: gas pressure and flow control device include pressure regulating valve, gaseous mass flow meter and first check valve, the pressure regulating valve is used for adjusting export gas pressure according to laser working gas pressure demand, gaseous mass flow meter is used for adjusting gas flow according to laser working gas velocity of flow demand, first check valve is used for guaranteeing gaseous one-way flow in order to prevent to have the alkali metal vapour backward flow damage part of high corrosivity.
As a further improvement of the invention: the gas heating device is used for heating the buffer gas flowing into the room temperature to the working temperature of the laser.
As a further improvement of the invention: the gas heating device is a porous lotus-shaped structure and conducts and heats gas by increasing the contact surface area of the heating medium and the gas.
As a further improvement of the invention: the laser chamber comprises a gas flow pipeline structure and a laser window, and the laser window is made of sapphire or quartz materials.
As a further improvement of the invention: the gas purification device comprises a first stop valve, a gas purification column and a second stop valve, wherein the first stop valve and the second stop valve are used for controlling the on-off of gas flow, and the gas purification column is used for further purifying gas so as to avoid chemical reaction between impurity gas and alkali metal vapor.
As a further improvement of the invention: the vacuum obtaining and detecting device comprises a third stop valve, a vacuum gauge, a fourth stop valve and a flange interface, wherein the vacuum gauge is used for detecting the vacuum degree of the system, and the flange interface is used for being connected with a vacuum pump to pre-vacuumize the system.
Compared with the prior art, the invention has the advantages that:
1. the open-loop flowing heat dissipation alkali metal vapor laser gain generator is simple in structure, avoids the adoption of a gas circulating pump with a complex inner structure, is easy to realize in engineering, and is more stable and reliable in system performance.
2. The open-loop flowing heat dissipation alkali metal vapor laser gain generator is convenient for uniformly heating and precisely controlling the temperature of a system, does not have low-temperature cold spots in the system, and is convenient for quantitatively controlling the concentration of alkali metal atoms.
3. The open-loop flowing heat dissipation alkali metal vapor laser gain generator discharges gas carrying waste heat after the laser working process to atmosphere, does not need additional refrigeration to cool the gas for recycling, and saves the overall energy consumption of the system.
4. The open-loop flowing heat dissipation alkali metal vapor laser gain generator is convenient to realize flexible gas pressure and flow control, is easy to realize high-speed airflow, and meets the flowing heat dissipation requirement of a high-power alkali metal vapor laser.
5. The open-loop flowing heat dissipation alkali metal vapor laser gain generator does not need to adopt a gas circulating pump, has simple system structure, is easy to realize uniform heating and precise temperature control so as to quantitatively generate the required alkali metal atom concentration, can directly discharge the gas passing through the gain region to the atmosphere without extra refrigeration so as to increase the energy consumption of the system, and is easy to realize high-speed airflow in the laser gain region so as to meet the heat dissipation requirement of a high-power laser system.
Drawings
FIG. 1 is a schematic diagram of the open-loop flow heat dissipation alkali metal vapor laser gain generator.
Fig. 2 is a schematic flow chart of the operation of an open-loop flowing heat-dissipating alkali metal vapor laser gain generator in a specific application example.
Illustration of the drawings:
1. a buffer gas storage source; 2. a pressure regulating valve; 3. a gas mass flow meter; 4. a first one-way valve; 5. a first stop valve; 6. a gas purification column; 7. a second stop valve; 8. a third stop valve; 9. a vacuum gauge; 10. a fourth stop valve; 11. a flange interface; 12. a gas heating device; 13. a mixing chamber; 14. a laser chamber; 15. a fifth stop valve; 16. a second one-way valve.
Detailed Description
The invention will be described in further detail below with reference to the drawings and specific examples.
The open-loop flowing heat dissipation alkali metal vapor laser gain generator comprises a buffer gas storage source 1, a gas pressure and flow control device, a gas purification device, a gas heating device, a vacuum obtaining and detecting device, a mixing chamber 13 and a laser chamber 14; buffer gas in the buffer gas storage source 1 is regulated by a gas pressure and flow control device and then flows through a gas purification device at required air pressure and flow for purification, the purified gas is uniformly mixed with alkali metal atom saturated vapor in a mixing chamber 13 and then flows into a laser chamber 14, laser output is generated under the external semiconductor laser pumping, waste heat is generated due to the loss of alkali metal atom quantum in the laser working process, the temperature rise of working gas in the laser chamber 14 is controlled within a reasonable range due to the existence of airflow so as to ensure the efficient and continuous output of laser, and the gas flowing out of the laser chamber 14 and carrying the waste heat is discharged to the atmosphere.
As shown in fig. 1, an example of a specific application of the present invention is in a typical rubidium metal vapor laser, and the buffer gas is helium, but the present invention is equally applicable to lithium, sodium, potassium, and cesium vapor lasers, which include:
a buffer gas storage source 1, wherein the gas storage pressure is generally less than or equal to 15 MPa; the buffer gas reservoir source 1 employs a helium gas reservoir source in this example.
The gas pressure and flow control device comprises a pressure regulating valve 2, a gas mass flowmeter 3 and a first one-way valve 4, wherein the pressure regulating valve 2 is used for regulating outlet gas pressure according to laser working gas pressure requirements (generally within the range of 1-20 atm), the gas mass flowmeter 3 is used for regulating gas flow according to the laser working gas flow speed requirements, and the first one-way valve 4 is used for ensuring gas to flow in a one-way mode so as to prevent backflow of highly corrosive alkali metal vapor from damaging the pressure regulating valve 2 and the gas mass flowmeter 3;
the gas purification device comprises a first stop valve 5, a gas purification column 6 and a second stop valve 7, wherein the first stop valve 5 and the second stop valve 7 are used for controlling the on-off of gas flow, and since impurity gas can be introduced into the pressure regulating valve 2 and the gas mass flowmeter 3, the helium gas needs to be further purified by the gas purification column 6 until the content of the impurity is less than or equal to 5ppm so as to avoid the chemical reaction between the impurity gas and alkali metal vapor;
the vacuum obtaining and detecting device comprises a third stop valve 8, a vacuum gauge 9, a fourth stop valve 10 and a flange interface 11;
the vacuum gauge 9 is used for detecting the vacuum degree of the system, and the flange interface 11 is used for connecting with a vacuum pump to pre-vacuumize the system;
a gas heating device 12 for heating the gas flowing at room temperature to the temperature required by the laser operation (generally in the range of 100-;
the mixing chamber 13 is a mixing chamber of buffer gas and alkali metal vapor, and is used for introducing alkali metal saturated vapor and uniformly mixing the alkali metal saturated vapor with inflow helium to form a laser working medium;
a laser chamber 14 for generating an alkali metal vapor laser;
a fifth stop valve 15 for controlling the on-off of the system and the atmosphere;
a second one-way valve 16 for preventing atmospheric backflow.
It is understood that in other embodiments, the alkali metal element may be one or more of lithium, sodium, potassium, rubidium and cesium according to actual needs, and it is within the scope of the present invention.
It is understood that in the specific application example, the buffer gas may be one of helium, neon, argon, krypton and xenon; or a mixture of one of helium, neon, argon, krypton and xenon with a hydrocarbon gas such as one of methane or ethane, should be within the scope of the present invention.
In a specific application example, the gas pressure and flow control device comprises one or more stages of pressure adjusting devices for adjusting the gas pressure in the buffer gas storage source 1 to the gas pressure required by the operation of the laser, and one or more stages of flow adjusting devices for adjusting the gas flow rate to the flow rate required by the operation of the laser.
In a specific application example, the gas purification device is used for deeply removing impurity components contained in the buffer gas, and comprises a water vapor removal function, an oxygen removal function and a gas removal function for other gases capable of chemically reacting with alkali metal elements.
In the embodiment where the gas heating device is used to heat the buffer gas flowing at room temperature to the operating temperature of the laser, the gas heating device may be a porous lotus-shaped structure, which can heat the gas by conduction through increasing the contact surface area between the heating medium and the gas, or other heating structures with increased contact surface area between the heating medium and the gas, and shall be within the scope of the present invention.
In a specific example of an application, the laser chamber 14 includes a gas flow conduit structure and a laser window, which is a sapphire or quartz material.
In a particular application, the gas exiting the laser chamber 14 and carrying the waste heat may be vented to the atmosphere or to other gas storage chambers.
Referring to fig. 2, in a specific application example, the operation flow of the present invention is as follows:
firstly, opening a third stop valve 8 and a fourth stop valve 10, closing a second stop valve 7 and a fifth stop valve 15, connecting a flange interface 11 to a vacuum pump unit, and pre-vacuumizing a closed cavity, wherein the closed cavity contains the second stop valve 7, the third stop valve 8, a vacuum gauge 9, the fourth stop valve 10, the flange interface 11, a gas heating device 12, a mixing cavity 13 and a laser cavity 14. The vacuum degree is measured by a vacuum gauge 9 until the vacuum degree reaches less than or equal to 8 multiplied by 10-4Pa, the vacuum degree can meet the requirement that rubidium metal vapor with high chemical activity stably exists, at the moment, vacuumizing is stopped, and the third stop valve 8 and the fourth stop valve 10 are closed;
heating a gas heating device 12, a mixing chamber 13 of buffer gas and alkali metal steam and a laser chamber 14 to reach the working temperature of a laser, and introducing rubidium metal saturated steam by using the mixing chamber 13 of the buffer gas and the alkali metal steam; the outlet pressure (> 1 atm) of the pressure regulating valve 2 is set according to the pressure required by laser work, and the flow numerical value of the gas mass flowmeter 3 is set according to the flow speed required by the laser work; opening the first stop valve 5 and the second stop valve 7, and opening the valve of the buffer gas storage source 1, wherein helium gas is filled in a cavity formed by the closed cavity, the gas heating device 12, the mixing cavity 13 and the laser cavity 14 and is in a static state;
and opening a fifth stop valve 15 for connecting the system and the atmosphere, wherein the outlet pressure of the pressure regulating valve 2 is higher than the external atmospheric pressure, at the moment, helium in the gas cylinder is purified by sequentially passing through the gas purification column 6 at preset pressure and flow rate, the purified helium is heated to the laser working temperature by the gas heating device 12, the purified helium flows through the mixing chamber 13 and is uniformly mixed with rubidium metal saturated steam to form a laser working medium, the laser working medium finally flows through the laser chamber 14 and is output by laser under an external semiconductor laser pump, and the gas flowing out of the laser chamber 14 flows into the atmosphere through the fifth stop valve 15 and the second one-way valve 16 and is discharged.
The above is only a preferred embodiment of the present invention, and the protection scope of the present invention is not limited to the above-mentioned embodiments, and all technical solutions belonging to the idea of the present invention belong to the protection scope of the present invention. It should be noted that modifications and embellishments within the scope of the invention may be made by those skilled in the art without departing from the principle of the invention.
Claims (10)
1. An open-loop flowing heat dissipation alkali metal vapor laser gain generator is characterized by comprising a buffer gas storage source (1), a gas pressure and flow control device, a gas purification device, a gas heating device, a vacuum obtaining and detecting device, a mixing chamber (13) and a laser chamber (14); the buffer gas in the buffer gas storage source (1) is regulated by a gas pressure and flow control device, then flows through a gas purification device at required gas pressure and flow for purification, and the purified gas is uniformly mixed with saturated vapor of alkali metal atoms in a mixing chamber (13) and then flows into a laser chamber (14); the gas is used to control the temperature within the laser chamber (14), and the gas exiting the laser chamber (14) and carrying waste heat is vented to atmosphere or to other gas storage chambers.
2. The open-loop flow heat sinking alkali metal vapor laser gain generator of claim 1, wherein the alkali metal element is one or more of lithium, sodium, potassium, rubidium, and cesium.
3. The open-loop flowing heat dissipating alkali metal vapor laser gain generator of claim 1, wherein the buffer gas is one of helium, neon, argon, krypton, and xenon; or a mixed gas of one of helium, neon, argon, krypton and xenon with a hydrocarbon gas such as one of methane or ethane.
4. An open-loop flowing heat-dissipating alkali metal vapor laser gain generator according to claim 1, 2 or 3, characterized in that the gas pressure and flow control means comprises one or more stages of pressure regulating means for regulating the gas pressure in the buffer gas storage source (1) to the gas pressure required for the laser operation and one or more stages of flow regulating means for regulating the gas flow rate to the flow rate required for the laser operation.
5. An open loop flowing heat dissipating alkali metal vapor laser gain generator as claimed in claim 4 wherein the gas pressure and flow control means comprises a pressure regulating valve (2), a gas mass flow meter (3) and a first one-way valve (4), the pressure regulating valve (2) is used to regulate the outlet gas pressure according to the laser working gas pressure requirement, the gas mass flow meter (3) is used to regulate the gas flow according to the laser working gas flow rate requirement, the first one-way valve (4) is used to ensure the gas one-way flow to prevent the alkali metal vapor with high corrosiveness from flowing back and damaging the components.
6. An open loop flowing heat dissipating alkali metal vapor laser gain generator as claimed in claim 1 or 2 or 3 wherein said gas heating means is used to heat the room temperature down-flowing buffer gas to the laser operating temperature.
7. The open-loop flowing heat-dissipating alkali metal vapor laser gain generator according to claim 6, wherein said gas heating means is a porous lotus-shaped structure for conductively heating the gas by increasing the surface area of the heating medium in contact with the gas.
8. An open loop flowing heat dissipating alkali metal vapor laser gain generator as claimed in claim 1 or 2 or 3 wherein the laser chamber (14) comprises a gas flow duct structure and a laser window, the laser window being of sapphire or quartz material.
9. An open-loop flowing heat-dissipating alkali metal vapor laser gain generator according to claim 1, 2 or 3, characterized in that the gas purification device comprises a first stop valve (5), a gas purification column (6) and a second stop valve (7), the first stop valve (5) and the second stop valve (7) are used for controlling the on-off of the gas flow, and the gas purification column (6) is used for further purifying the gas to avoid the chemical reaction of the impurity gas and the alkali metal vapor.
10. An open-loop flowing heat dissipation alkali metal vapor laser gain generator according to claim 1, 2 or 3, characterized in that the vacuum obtaining and detecting device comprises a third cut-off valve (8), a vacuum gauge (9), a fourth cut-off valve (10) and a flange interface (11), wherein the vacuum gauge (9) is used for detecting the system vacuum degree, and the flange interface (11) is used for connecting with a vacuum pump to pre-vacuumize the system.
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| CN109462134A (en) * | 2018-12-25 | 2019-03-12 | 中国科学院长春光学精密机械与物理研究所 | A kind of miniature laser chamber and gas laser |
| CN110006492A (en) * | 2019-03-26 | 2019-07-12 | 北京科益虹源光电技术有限公司 | A kind of gas collecting monitoring method and system for excimer laser |
| CN111431017B (en) * | 2020-02-17 | 2023-10-20 | 蓝科微电子(深圳)有限公司 | Terahertz laser based on single automatic temperature-regulating low-temperature heat source |
| CN115483596B (en) * | 2022-10-24 | 2023-10-20 | 中国航天三江集团有限公司 | Laser based on alkali metal vapor and buffer gas filling and application thereof |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ES2186765T3 (en) * | 1996-01-03 | 2003-05-16 | Commissariat Energie Atomique | LASER DEVICE OF METAL STEAM. |
| CN102035132A (en) * | 2009-09-28 | 2011-04-27 | 中国科学院电子学研究所 | Hot capacity gas laser |
| CN103633535A (en) * | 2013-05-03 | 2014-03-12 | 中国科学院电子学研究所 | Alkali metal steam chamber and assembling and manufacturing method thereof |
| CN105552693A (en) * | 2016-02-22 | 2016-05-04 | 中国科学院电子学研究所 | DPAL laser with local bidirectional alternative flowing gain medium |
| CN105846290A (en) * | 2016-06-22 | 2016-08-10 | 中国科学院光电研究院 | Quasi-molecule laser high-purity working gas distribution system and method |
| CN106025774A (en) * | 2016-07-28 | 2016-10-12 | 中国科学院电子学研究所 | Gain medium self-flow vapor chamber and DPAL device |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2610457A1 (en) * | 1987-02-04 | 1988-08-05 | Deutsche Forsch Luft Raumfahrt | HE-NE DISCHARGE TUBE |
| CN101436745B (en) * | 2007-11-14 | 2010-09-29 | 中国科学院大连化学物理研究所 | Sodium atom chemistry laser of visible waveband |
| US9048617B2 (en) * | 2012-07-11 | 2015-06-02 | Logos Technologies, Llc | Metal vapor circulating system |
| CN103928823A (en) * | 2014-03-28 | 2014-07-16 | 中国科学院长春光学精密机械与物理研究所 | Intracavity heat pipe type alkali metal steam laser |
| CN106911055B (en) * | 2017-03-16 | 2019-05-21 | 清华大学 | A kind of four-wave mixing mercury vapour pond using tubular type constant temperature oven and cooling collar |
-
2018
- 2018-03-22 CN CN201810239291.8A patent/CN108321664B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ES2186765T3 (en) * | 1996-01-03 | 2003-05-16 | Commissariat Energie Atomique | LASER DEVICE OF METAL STEAM. |
| CN102035132A (en) * | 2009-09-28 | 2011-04-27 | 中国科学院电子学研究所 | Hot capacity gas laser |
| CN103633535A (en) * | 2013-05-03 | 2014-03-12 | 中国科学院电子学研究所 | Alkali metal steam chamber and assembling and manufacturing method thereof |
| CN105552693A (en) * | 2016-02-22 | 2016-05-04 | 中国科学院电子学研究所 | DPAL laser with local bidirectional alternative flowing gain medium |
| CN105846290A (en) * | 2016-06-22 | 2016-08-10 | 中国科学院光电研究院 | Quasi-molecule laser high-purity working gas distribution system and method |
| CN106025774A (en) * | 2016-07-28 | 2016-10-12 | 中国科学院电子学研究所 | Gain medium self-flow vapor chamber and DPAL device |
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