CN108286048A - A kind of intelligent substrate wet etching processing unit being used to prepare graphene - Google Patents
A kind of intelligent substrate wet etching processing unit being used to prepare graphene Download PDFInfo
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- CN108286048A CN108286048A CN201810182263.7A CN201810182263A CN108286048A CN 108286048 A CN108286048 A CN 108286048A CN 201810182263 A CN201810182263 A CN 201810182263A CN 108286048 A CN108286048 A CN 108286048A
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- wet etching
- etching processing
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G3/00—Apparatus for cleaning or pickling metallic material
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- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
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- Organic Chemistry (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The present invention relates to a kind of intelligent substrate wet etching processing units being used to prepare graphene,Including pedestal,Liquid supplying device,Cleaning box,Sealing plate,Clamping device,Nozzle,Mobile mechanism,Controller and exhaust gear,Mobile mechanism includes first motor,Buffer stopper,First drive shaft,Sliding block,Fixed link and wobble component,Exhaust gear includes into tracheae,Handle box,Charge pipe,Feeding box and exhaust pipe,Charging component is equipped in Feeding box,Liquid supplying device includes pillar,Liquid cartridge,First water pipe,Second water pipe,Third water pipe and water pump,The intelligent substrate wet etching processing unit for being used to prepare graphene drives nozzle to move to carrying out flush clean everywhere in substrate by mobile mechanism,Remove the impurity of substrate surface,Graphene uniform is distributed in substrate surface when gas phase reaction being made to deposit,Moreover,The nitrogen dioxide that cleaning generates is absorbed by exhaust gear,Prevent exhaust gas from endangering operating personnel,Further improve the practicability of equipment.
Description
Technical field
The present invention relates to new material production equipment field, more particularly to a kind of intelligent substrate being used to prepare graphene is wet
Method corrosion treatment device.
Background technology
Graphene is a kind of honeycomb flat film formed in a specific way by carbon atom, and being a kind of, there are one atomic layers
The quasi- two-dimensional material of thickness does monoatomic layer graphite so being called.The common power production method of graphene is mechanical glass at present
Glass method, oxidation-reduction method, silicon carbide epitaxial growth method etc., film production method are chemical vapour deposition technique (CVD), wherein CVD
Method can prepare the graphene of high quality large area, meet the requirement of prepare with scale high-quality graphene.
CVD method is when preparing graphene, usually using copper as substrate, is passed through carbonaceous gas in consersion unit, such as：Nytron
Object, carbon resolve into the surface that carbon atom is deposited on copper at high temperature, and shape graphene makes graphene by slight chemical etching
Film and the isolated graphene film of copper.But since many impurity, impurity effect graphene are often contained in the surface of copper
Distribution on copper sheet surface leads to the discontinuous either plurality of layers of graphene obtained, and different batches copper surface nature is not
Together so that the preparation of graphene has nonrepeatability, and so as to cause being difficult to, obtained large-sized graphene being evenly distributed is thin
Film.
Invention content
The technical problem to be solved by the present invention is to：For overcome the deficiencies in the prior art, it provides one kind and being used to prepare graphite
The intelligent substrate wet etching processing unit of alkene.
The technical solution adopted by the present invention to solve the technical problems is：A kind of intelligent substrate being used to prepare graphene
Wet etching processing unit, including pedestal, liquid supplying device, cleaning box, sealing plate, clamping device, nozzle, mobile mechanism, control
Device and exhaust gear, the liquid supplying device, cleaning box and exhaust gear are successively set on the top of pedestal, and the controller is fixed
In the top of pedestal, PLC is equipped in the controller, the sealing plate is located at the top of cleaning box, the mobile mechanism and folder
The lower section that mechanism is arranged at sealing plate is held, the mobile mechanism is sequentially connected with nozzle, and the nozzle is connect with liquid supplying device；
The mobile mechanism includes first motor, buffer stopper, the first drive shaft, sliding block, fixed link and wobble component, described
First motor and fixed link are each attached to the lower section of sealing plate, and the fixed link is located at the one of the separate clamping device of first motor
Side, the first motor are electrically connected with PLC, and the top of the first motor and the first drive shaft is sequentially connected, the buffer stopper
Positioned at the bottom end of the first drive shaft, the buffer stopper is fixedly connected with fixed link, and the sliding block is set in the first drive shaft and consolidates
In fixed pole, the sliding block be equipped with the junction of the first drive shaft and the matched screw thread of the first drive shaft, the wobble component
Positioned at the side of the close clamping device of sliding block；
The exhaust gear includes into tracheae, handle box, charge pipe, Feeding box and exhaust pipe, and the handle box is fixed on
The top of pedestal, it is described enter tracheae one end be connected to cleaning box, it is described enter tracheae the other end be located at the bottom in handle box,
The exhaust pipe be located at handle box far from the side for entering tracheae, the Feeding box is fixed on the upper of handle box by charge pipe
Side, the Feeding box are connected to by charge pipe with handle box, and the top of the Feeding box is equipped with cover board, is equipped in the Feeding box
Feed component.
Preferably, in order to provide concentrated nitric acid solution to nozzle, the liquid supplying device includes pillar, liquid cartridge, the first water
Pipe, the second water pipe, third water pipe and water pump, the liquid cartridge are fixed on the top of pedestal, the top of the liquid cartridge by pillar
End is equipped with liquid injection pipe, and the bottom end of the liquid cartridge is equipped with drainpipe, and the drainpipe is equipped with drain valve, the bottom of the liquid cartridge
End is connected to by the first water pipe with nozzle, and the water pump is fixed on the top of sealing plate, and the water pump is electrically connected with PLC, described
Water pump is connected to by third water pipe with liquid cartridge, and the top of second water pipe is connected to water pump, the bottom end of second water pipe
Bottom in cleaning box.
Preferably, for the ease of the PH of reaction solution in detection concentrated nitric acid solution and handle box, the bottom of the liquid cartridge
Portion is counted equipped with the first PH, and the bottom in the handle box is counted equipped with the 2nd PH, and the first PH meters and the 2nd PH meters are electric with PLC
Connection.
Preferably, in order to realize that the swing of nozzle, the wobble component include supporting plate, the second motor, driving wheel, fixation
Axis and circular frame, the supporting plate are fixed on sliding block, and second motor is fixed on the top of supporting plate, second motor with
PLC is electrically connected, and second motor is sequentially connected with driving wheel, and the fixing axle is fixed on the separate circle centre position of driving wheel, institute
It states fixing axle to be located in circular frame, one end of the circular frame is hinged with supporting plate, and the other end and the nozzle of the circular frame are fixed
Connection.
Preferably, in order to add basic agent in handle box, the charging component includes third motor, half tooth
Wheel, frame, charging bar, charging block and two racks, the third motor are fixed on the inner wall of Feeding box, the third motor
It is electrically connected with PLC, the third motor is connect with half gear drive, and two racks are separately fixed at the inner wall of the both sides of frame
On, half gear is located between two racks, and the half wheel and rack engagement, the charging block is fixed on by the bar that feeds
The lower section of frame.
Preferably, in order to which the block that ensures to feed can block charge pipe, the both sides of the frame are equipped with slip ring and sliding rail, institute
The shape for stating sliding rail is U-shaped, and the both ends of the sliding rail are fixed on the inner wall of Feeding box, and the slip ring is set on sliding rail, institute
Slip ring is stated to be fixed on frame.
Preferably, in order to make the solution in handle box fully absorb the nitrogen dioxide of rinse substrate generation, the processing
Several extension components are equipped in box, the extension component is evenly distributed in handle box from top to down, and the extension component includes
Two baffles, on the inner wall for the both sides that two baffles are separately fixed at handle box, two baffles are staggered.
Preferably, in order to make basic agent be substantially dissolved in the reaction solution in handle box, also set in the handle box
There are the 5th motor, the 5th drive shaft and two mixing components, the 5th motor is fixed on the top in handle box, and the described 5th
Motor is electrically connected with PLC, and the 5th motor and the 5th drive shaft are sequentially connected, and two mixing components are located at the 5th driving
The both sides of axis, the mixing component include several agitating plates, and the quantity of the agitating plate is equal with the quantity of component is extended, described
Agitating plate is corresponded with component is extended, and the agitating plate is between two baffles.
Preferably, in order to realize that the clamping of substrate, the clamping device include the 4th motor, turntable and two clamping groups
Part, the 4th motor are fixed on the lower section of sealing plate, and the 4th motor is electrically connected with PLC, the 4th motor and turntable
It is sequentially connected, two clamp assemblies are located at the both sides of the lower section of turntable, and the clamp assemblies include fixed block, spring and tight
Gu block, the fixed block is fixed on the lower section of turntable, and the fastening block is located at the side in the center of circle of the close turntable of fixed block, institute
It states fastening block to connect with fixed block by spring, the spring is in compressive state.
Preferably, in order to fix the moving direction of fastening block, the top of the fastening block is equipped with sliding shoe, the turntable
It is equipped with dovetail groove, the sliding shoe is slidably connected with dovetail groove.
The invention has the advantages that the intelligent substrate wet etching processing unit for being used to prepare graphene passes through shifting
Motivation structure drives nozzle movement to carrying out flush clean everywhere in substrate, removes the impurity of substrate surface, gas phase reaction is made to deposit
When graphene uniform be distributed in substrate surface, compared with existing mobile mechanism, the sphere of action of the mobile mechanism is wide, ensure that
The clean range of nozzle moreover absorbs the nitrogen dioxide that cleaning generates by exhaust gear, prevents exhaust gas from endangering operator
Member, compared with existing exhaust gear, which adds basic agent in time by the component that feeds, and equipment is made to have exhaust gas
There is constant absorption ability, further improves the practicability of equipment.
Description of the drawings
Present invention will be further explained below with reference to the attached drawings and examples.
Fig. 1 is the structural schematic diagram of the intelligent substrate wet etching processing unit for being used to prepare graphene of the present invention；
Fig. 2 is the knot of the mobile mechanism of the intelligent substrate wet etching processing unit for being used to prepare graphene of the present invention
Structure schematic diagram；
Fig. 3 is the knot of the wobble component of the intelligent substrate wet etching processing unit for being used to prepare graphene of the present invention
Structure schematic diagram；
Fig. 4 is the knot of the charging component of the intelligent substrate wet etching processing unit for being used to prepare graphene of the present invention
Structure schematic diagram；
Fig. 5 is the knot of the clamping device of the intelligent substrate wet etching processing unit for being used to prepare graphene of the present invention
Structure schematic diagram；
In figure：1. pedestal, 2. cleaning box, 3. sealing plates, 4. nozzles, 5. controllers, 6. first motors, 7. buffer stoppers, 8.
First drive shaft, 9. sliding blocks, 10. fixed links, 11. enter tracheae, 12. handle boxes, 13. charge pipes, 14. Feeding boxs, 15. exhausts
Pipe, 16. pillars, 17. liquid cartridges, 18. first water pipes, 19. second water pipes, 20. third water pipes, 21. water pumps, 22. the oneth PH meters,
23. the 2nd PH is counted, 24. supporting plates, 25. second motors, 26. driving wheels, 27. fixing axles, 28. circular frames, 29. third motors, and 30.
Half gear, 31. frames, 32. charging bars, 33. charging blocks, 34. racks, 35. slip rings, 36. sliding rails, 37. baffles, 38. the 5th electricity
Machine, 39. the 5th drive shafts, 40. agitating plates, 41. the 4th motors, 42. turntables, 43. fixed blocks, 44. springs, 45. fastening blocks,
46. sliding shoe, 47. dovetail grooves.
Specific implementation mode
In conjunction with the accompanying drawings, the present invention is further explained in detail.These attached drawings are simplified schematic diagram, only with
Illustration illustrates the basic structure of the present invention, therefore it only shows the composition relevant to the invention.
As shown in Figure 1, a kind of intelligent substrate wet etching processing unit being used to prepare graphene, including pedestal 1, confession
Liquid mechanism, cleaning box 2, sealing plate 3, clamping device, nozzle 4, mobile mechanism, controller 5 and exhaust gear, the flow feeder
Structure, cleaning box 2 and exhaust gear are successively set on the top of pedestal 1, and the controller 5 is fixed on the top of pedestal 1, the control
It is equipped with PLC in device 5 processed, the sealing plate 3 is located at the top of cleaning box 2, and the mobile mechanism and clamping device are arranged at close
The lower section of sealing plate 3, the mobile mechanism are sequentially connected with nozzle 4, and the nozzle 4 is connect with liquid supplying device；
The substrate wet processing equipment clamps substrate in use, opening sealing plate 3 using clamping device, then will sealing
Plate 3 is placed on the top of cleaning box 2, and by operator, the mobile mechanism of 3 lower section of control sealing plate drives nozzle 4 to move, simultaneously
Liquid supplying device improves concentrated nitric acid solution to nozzle 4, and nozzle 4 is made to carry out flush clean to the surface of substrate, removal copper sheet surface
Impurity, concentrated nitric acid generate nitrogen dioxide gas after being reacted with copper sheet, nitrogen dioxide endangers operating personnel in order to prevent, pass through exhaust
Mechanism carries out absorption processing to nitrogen dioxide, makes equipment that safe and harmless gas be discharged.
As shown in Fig. 2, the mobile mechanism includes first motor 6, buffer stopper 7, the first drive shaft 8, sliding block 9, fixed link
10 and wobble component, the first motor 6 and fixed link 10 are each attached to the lower section of sealing plate 3, and the fixed link 10 is located at the
The side of the separate clamping device of one motor 6, the first motor 6 are electrically connected with PLC, and the first motor 6 and first drives
The top of axis 8 is sequentially connected, and the buffer stopper 7 is located at the bottom end of the first drive shaft 8, and the buffer stopper 7 is fixed with fixed link 10
Connection, the sliding block 9 are set in the first drive shaft 8 and fixed link 10, the junction with the first drive shaft 8 of the sliding block 9
Equipped with 8 matched screw thread of the first drive shaft, the wobble component is located at the side of the close clamping device of sliding block 9；
PLC controls first motor 6 and starts, and drives the rotation of the first drive shaft 8, the first drive shaft 8 is made to exist by threaded function
On sliding block 9, to drive swing mechanism and nozzle 4 to be moved in the vertical direction, make different height of the nozzle 4 to substrate
Position carries out flush clean, while swing mechanism drives nozzle 4 to swing back and forth, and makes difference of the nozzle 4 to the sustained height of substrate
It is rinsed at position, ensure that flushing range, to remove the impurity of substrate surface.
As shown in Figure 1, the exhaust gear includes into tracheae 11, handle box 12, charge pipe 13, Feeding box 14 and exhaust pipe
15, the handle box 12 is fixed on the top of pedestal 1, it is described enter tracheae 11 one end be connected to cleaning box 2, it is described enter tracheae 11
The other end be located at the bottom in handle box 12, the exhaust pipe 15 be located at handle box 12 far from the side for entering tracheae 11, institute
The top that Feeding box 14 is fixed on handle box 12 by charge pipe 13 is stated, the Feeding box 14 passes through charge pipe 13 and handle box 12
The top of connection, the Feeding box 14 is equipped with cover board, and charging component is equipped in the Feeding box 14.
When the nitrogen dioxide gas that exhaust gear processing generates, nitrogen dioxide waste gas is passed through handle box 12 by entering tracheae 11
With the alkaline solution in handle box 12 neutralization reaction occurs for interior bottom, exhaust gas, realizes that the absorption to exhaust gas is handled, with exhaust gas
Increase, the alkalinity of solution dies down, and the charging component in Feeding box 14 adds alkali in the handle box 12 by charge pipe 13 at this time
Property medicament, make solution restore alkalinity, convenient for constant absorption generate nitrogen dioxide waste gas.
As shown in Figure 1, the liquid supplying device includes pillar 16, liquid cartridge 17, the first water pipe 18, the second water pipe 19, third
Water pipe 20 and water pump 21, the liquid cartridge 17 are fixed on the top of pedestal 1 by pillar 16, and the top of the liquid cartridge 17 is equipped with
The bottom end of liquid injection pipe, the liquid cartridge 17 is equipped with drainpipe, and the drainpipe is equipped with drain valve, the bottom end of the liquid cartridge 17
It is connected to nozzle 4 by the first water pipe 18, the water pump 21 is fixed on the top of sealing plate 3, and the water pump 21 and PLC is electrically connected
It connects, the water pump 21 is connected to by third water pipe 20 with liquid cartridge 17, and the top of second water pipe 19 is connected to water pump 21, institute
The bottom end for stating the second water pipe 19 is located at bottom in cleaning box 2.
In liquid supplying device, support liquid cartridge 17 is fixed using pillar 16, can be added in liquid cartridge 17 by liquid injection pipe dense
Salpeter solution after substrate cleans, opens drainpipe, the concentrated nitric acid solution outflow in liquid cartridge 17.In cleaning process, utilize
First water pipe 18 makes in the concentrated nitric acid injection nozzle 4 in liquid cartridge 17, and PLC controls water pump 21 and runs, and is taken out by the second water pipe 19
The solution in cleaning box 2 is taken, so that concentrated nitric acid solution is passed through third water pipe 20 and is back in liquid cartridge 17, to reduce concentrated nitric acid
Consumption.
Preferably, for the ease of the PH of reaction solution in detection concentrated nitric acid solution and handle box 12, the liquid cartridge 17
Bottom be equipped with the first PH and count 22, the bottom in the handle box 12 is equipped with the 2nd PH and counts 23, the first PH meters 22 and second
PH meters 23 are electrically connected with PLC.Using the PH of the concentrated nitric acid in 22 detection liquid cartridge 17 of the first PH meters, and pH value is fed back to
PLC indicates that concentrated nitric acid concentration is too low when pH value is excessive, and PLC controls the display screen on controller 5 and prompts operating personnel at this time
Concentrated nitric acid is added, to ensure the concentrated nitric acid concentration in liquid cartridge 17, similarly, is counted using the 2nd PH anti-in 23 detection process boxes 12
The PH for answering liquid indicates that reaction solution is biased to neutral, the charging component of PLC controls at this time addition in handle box 12 when pH value is too small
Basic agent.
As shown in figure 3, the wobble component includes supporting plate 24, the second motor 25, driving wheel 26, fixing axle 27 and circular frame
28, the supporting plate 24 is fixed on sliding block 9, and second motor 25 is fixed on the top of supporting plate 24, second motor 25 with
PLC is electrically connected, and second motor 25 is sequentially connected with driving wheel 26, and the fixing axle 27 is fixed on the separate circle of driving wheel 26
At the heart, the fixing axle 27 is located in circular frame 28, and one end of the circular frame 28 and supporting plate 24 are hinged, the circular frame 28
The other end is fixedly connected with nozzle 4.
Supporting plate 24 drives driving wheel 26 to rotate same to support the second motor 25, PLC to control the operation of the second motor 25
When, the fixing axle 27 of 26 top of driving wheel drives circular frame 28 to swing back and forth, to realize the oscillating function of nozzle 4.
As shown in figure 4, the charging component includes third motor 29, half gear 30, frame 31, charging bar 32, charging block
33 and two racks 34, the third motor 29 be fixed on the inner wall of Feeding box 14, the third motor 29 and PLC is electrically connected
It connecing, 29 and half gear 30 of the third motor is sequentially connected, on the inner wall for the both sides that two racks 34 are separately fixed at frame 31,
Half gear 30 is located between two racks 34, and half gear 30 is engaged with rack 34, and the charging block 33 passes through charging
Bar 32 is fixed on the lower section of frame 31.
PLC controls third motor 29 and starts, and drives the rotation of half gear 30, half gear 30 is made to act on two racks 34 successively
On, so that two racks 34 is taken turns doing the opposite movement in direction, realizes the reciprocating movement of frame 31 in the vertical direction, Jin Ertong
Crossing charging bar 32 drives charging block 33 to be moved back and forth in vertical direction, and when the block 33 that feeds blocks charge pipe 13, Feeding box 14 is not
Basic agent is added into handle box 12 again, when the block 33 that feeds moves up, the basic agent in Feeding box 14 passes through charging
Pipe 13 is moved downward in handle box 12, and reaction solution is made to restore alkalinity.
Preferably, in order to which the block 33 that ensures to feed can block charge pipe 13, the both sides of the frame 31 are equipped with slip ring 35
Shape with sliding rail 36, the sliding rail 36 is U-shaped, and the both ends of the sliding rail 36 are fixed on the inner wall of Feeding box 14, the cunning
Ring 35 is set on sliding rail 36, and the slip ring 35 is fixed on frame 31.Slip ring 35 moves on the fixed sliding rail in position 36, from
And the moving direction of frame 31 is secured, and then make the movement of 33 held stationary of charging block, so that charging block 33 is accurately blocked up
Firmly charge pipe 13.
Preferably, in order to make the solution in handle box 12 fully absorb the nitrogen dioxide of rinse substrate generation, the place
It manages and is equipped with several extension components in box 12, the extension component is evenly distributed on from top to down in handle box 12, the extension group
Part includes two baffles 37, and on the inner wall for the both sides that two baffles 37 are separately fixed at handle box 12, two baffles 37 are staggeredly set
It sets.Flow trace of the exhaust gas being passed through in handle box 12 in reaction solution is extended using baffle 37, is fully inhaled convenient for reaction solution
Receive nitrogen dioxide.
As shown in Figure 1, the 5th motor 38, the 5th drive shaft 39 and two mixing components are additionally provided in the handle box 12,
5th motor 38 is fixed on the top in handle box 12, and the 5th motor 38 is electrically connected with PLC, the 5th motor 38
It is sequentially connected with the 5th drive shaft 39, two mixing components are located at the both sides of the 5th drive shaft 39, the mixing component packet
Several agitating plates 40 are included, the quantity of the agitating plate 40 is equal with the quantity of component is extended, the agitating plate 40 and extension component
It corresponds, the agitating plate 40 is located between two baffles 37.
PLC controls the operation of the 5th motor 38, drives the rotation of the 5th drive shaft 39, agitating plate 40 is made to rotate, stir reaction solution,
It is substantially dissolved in reaction solution convenient for basic agent.
As shown in figure 5, the clamping device includes the 4th motor 41, turntable 42 and two clamp assemblies, the 4th electricity
Machine 41 is fixed on the lower section of sealing plate 3, and the 4th motor 41 is electrically connected with PLC, and the 4th motor 41 is driven with turntable 42
Connection, two clamp assemblies are located at the both sides of the lower section of turntable 42, and the clamp assemblies include fixed block 43,44 and of spring
Fastening block 45, the fixed block 43 are fixed on the lower section of turntable 42, and the fastening block 45 is located at the close turntable 42 of fixed block 43
The center of circle side, the fastening block 45 connect by spring 44 with fixed block 43, and the spring 44 is in compressive state.
Using the spring 44 compressed in clamp assemblies, fastening block 45 is made to be tightly abutted against the surface of substrate, when the one of substrate
After the completion of the cleaning of face, PLC controls the rotation of the 4th motor 41, drives turntable 42 to rotate 180 °, is washed away to the another side of substrate
Cleaning.
Preferably, in order to fix the moving direction of fastening block 45, the top of the fastening block 45 is equipped with sliding shoe 46, institute
It states turntable 42 and is equipped with dovetail groove 47, the sliding shoe 46 is slidably connected with dovetail groove 47.Sliding shoe 46 is put down in dovetail groove 47
Steady sliding, to secure the moving direction of fastening block 45.
The substrate wet etch processor is run using first motor 6, drives supporting plate 24 while vertical direction moves, by
Wobble component drives nozzle 4 to swing back and forth, and makes nozzle 4 to carrying out flush clean everywhere in substrate, removes the impurity on surface, favorably
When gas phase reaction deposits, graphene uniform is distributed in the surface of substrate, moreover, is inhaled by the reaction solution in handle box 12
The nitrogen dioxide that rinse substrate generates is received, basic agent is added in time using charging component, prevents exhaust gas volatilization to operating personnel
Harm is generated, the practicability of equipment is further improved.
Compared with prior art, which passes through moving machine
Structure drives the movement of nozzle 4 to carrying out flush clean everywhere in substrate, removes the impurity of substrate surface, stone when gas phase reaction being made to deposit
Black alkene is evenly distributed on substrate surface, and compared with existing mobile mechanism, the sphere of action of the mobile mechanism is wide, ensure that nozzle
4 clean range moreover absorbs the nitrogen dioxide that cleaning generates by exhaust gear, prevents exhaust gas from endangering operating personnel,
Compared with existing exhaust gear, which adds basic agent in time by the component that feeds, and equipment is made to have exhaust gas
Constant absorption ability further improves the practicability of equipment.
It is enlightenment with above-mentioned desirable embodiment according to the present invention, through the above description, relevant staff is complete
Various changes and amendments can be carried out without departing from the scope of the technological thought of the present invention' entirely.The technology of this invention
Property range is not limited to the contents of the specification, it is necessary to determine its technical scope according to right.
Claims (10)
1. a kind of intelligent substrate wet etching processing unit being used to prepare graphene, which is characterized in that including pedestal (1),
Liquid supplying device, cleaning box (2), sealing plate (3), clamping device, nozzle (4), mobile mechanism, controller (5) and exhaust gear, institute
The top that liquid supplying device, cleaning box (2) and exhaust gear are successively set on pedestal (1) is stated, the controller (5) is fixed on pedestal
(1) top, the controller (5) is interior to be equipped with PLC, and the sealing plate (3) is located at the top of cleaning box (2), the moving machine
Structure and clamping device are arranged at the lower section of sealing plate (3), and the mobile mechanism is sequentially connected with nozzle (4), the nozzle (4)
It is connect with liquid supplying device；
The mobile mechanism include first motor (6), buffer stopper (7), the first drive shaft (8), sliding block (9), fixed link (10) and
Wobble component, the first motor (6) and fixed link (10) are each attached to the lower section of sealing plate (3), fixed link (10) position
In the side of the separate clamping device of first motor (6), the first motor (6) is electrically connected with PLC, the first motor (6)
It is sequentially connected with the top of the first drive shaft (8), the buffer stopper (7) is located at the bottom end of the first drive shaft (8), the buffer stopper
(7) it is fixedly connected with fixed link (10), the sliding block (9) is set in the first drive shaft (8) and fixed link (10), the sliding block
(9) with the junction of the first drive shaft (8) be equipped with the first drive shaft (8) matched screw thread, the wobble component, which is located at, to be slided
The side of the close clamping device of block (9)；
The exhaust gear include into tracheae (11), handle box (12), charge pipe (13), Feeding box (14) and exhaust pipe (15),
The handle box (12) is fixed on the top of pedestal (1), it is described enter tracheae (11) one end be connected to cleaning box (2), it is described enter
The other end of tracheae (11) is located at the bottom in handle box (12), the exhaust pipe (15) be located at handle box (12) far from entering gas
The side of (11) is managed, the Feeding box (14) is fixed on the top of handle box (12), the Feeding box by charge pipe (13)
(14) it is connected to handle box (12) by charge pipe (13), the top of the Feeding box (14) is equipped with cover board, the Feeding box
(14) charging component is equipped in.
2. the intelligent substrate wet etching processing unit as described in claim 1 for being used to prepare graphene, which is characterized in that
The liquid supplying device include pillar (16), liquid cartridge (17), the first water pipe (18), the second water pipe (19), third water pipe (20) and
Water pump (21), the liquid cartridge (17) are fixed on the top of pedestal (1) by pillar (16), and the top of the liquid cartridge (17) is set
There are liquid injection pipe, the bottom end of the liquid cartridge (17) to be equipped with drainpipe, the drainpipe is equipped with drain valve, the liquid cartridge (17)
Bottom end be connected to nozzle (4) by the first water pipe (18), the water pump (21) is fixed on the top of sealing plate (3), the water
Pump (21) is electrically connected with PLC, and the water pump (21) is connected to by third water pipe (20) with liquid cartridge (17), second water pipe
(19) top is connected to water pump (21), and the bottom end of second water pipe (19) is located at the bottom in cleaning box (2).
3. the intelligent substrate wet etching processing unit as claimed in claim 2 for being used to prepare graphene, which is characterized in that
The bottom of the liquid cartridge (17) is equipped with the first PH and counts (22), and the bottom in the handle box (12) is equipped with the 2nd PH and counts (23),
The first PH meters (22) and the 2nd PH meters (23) are electrically connected with PLC.
4. the intelligent substrate wet etching processing unit as described in claim 1 for being used to prepare graphene, which is characterized in that
The wobble component includes supporting plate (24), the second motor (25), driving wheel (26), fixing axle (27) and circular frame (28), described
Supporting plate (24) is fixed on sliding block (9), and second motor (25) is fixed on the top of supporting plate (24), second motor (25)
It is electrically connected with PLC, second motor (25) is sequentially connected with driving wheel (26), and the fixing axle (27) is fixed on driving wheel
(26) separate circle centre position, the fixing axle (27) are located in circular frame (28), one end of the circular frame (28) and supporting plate
(24) hinged, the other end of the circular frame (28) is fixedly connected with nozzle (4).
5. the intelligent substrate wet etching processing unit as described in claim 1 for being used to prepare graphene, which is characterized in that
The charging component includes third motor (29), half gear (30), frame (31), charging bar (32), feed block (33) and two
Rack (34), the third motor (29) are fixed on the inner wall of Feeding box (14), and the third motor (29) is electrically connected with PLC
It connects, the third motor (29) is sequentially connected with half gear (30), and two racks (34) are separately fixed at the both sides of frame (31)
Inner wall on, half gear (30) is located between two racks (34), and half gear (30) is engaged with rack (34), described
Charging block (33) is fixed on the lower section of frame (31) by the bar (32) that feeds.
6. the intelligent substrate wet etching processing unit as claimed in claim 5 for being used to prepare graphene, which is characterized in that
The both sides of the frame (31) are equipped with slip ring (35) and sliding rail (36), and the shape of the sliding rail (36) is U-shaped, the sliding rail (36)
Both ends be fixed on the inner wall of Feeding box (14), the slip ring (35) is set on sliding rail (36), and the slip ring (35) is fixed
On frame (31).
7. the intelligent substrate wet etching processing unit as described in claim 1 for being used to prepare graphene, which is characterized in that
Several extension components are equipped in the handle box (12), the extension component is evenly distributed on from top to down in handle box (12),
The extension component includes two baffles (37), on the inner wall for the both sides that two baffles (37) are separately fixed at handle box (12),
Two baffles (37) are staggered.
8. the intelligent substrate wet etching processing unit as claimed in claim 7 for being used to prepare graphene, which is characterized in that
It is additionally provided with the 5th motor (38), the 5th drive shaft (39) and two mixing components, the 5th motor in the handle box (12)
(38) it is fixed on the top in handle box (12), the 5th motor (38) is electrically connected with PLC, the 5th motor (38) and the
Five drive shafts (39) are sequentially connected, and two mixing components are located at the both sides of the 5th drive shaft (39), the mixing component packet
Include several agitating plates (40), the quantity of the agitating plate (40) is equal with the quantity of component is extended, the agitating plate (40) with prolong
Long component corresponds, and the agitating plate (40) is located between two baffles (37).
9. the intelligent substrate wet etching processing unit as described in claim 1 for being used to prepare graphene, which is characterized in that
The clamping device includes the 4th motor (41), turntable (42) and two clamp assemblies, and the 4th motor (41) is fixed on close
The lower section of sealing plate (3), the 4th motor (41) are electrically connected with PLC, and the 4th motor (41) is sequentially connected with turntable (42),
Two clamp assemblies are located at the both sides of the lower section of turntable (42), and the clamp assemblies include fixed block (43), spring (44)
With fastening block (45), the fixed block (43) is fixed on the lower section of turntable (42), and the fastening block (45) is located at fixed block (43)
Close turntable (42) the center of circle side, the fastening block (45) connect by spring (44) with fixed block (43), the bullet
Spring (44) is in compressive state.
10. the intelligent substrate wet etching processing unit as described in claim 1 for being used to prepare graphene, feature exist
In the top of the fastening block (45) is equipped with sliding shoe (46), and the turntable (42) is equipped with dovetail groove (47), the sliding shoe
(46) it is slidably connected with dovetail groove (47).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810182263.7A CN108286048A (en) | 2018-03-06 | 2018-03-06 | A kind of intelligent substrate wet etching processing unit being used to prepare graphene |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810182263.7A CN108286048A (en) | 2018-03-06 | 2018-03-06 | A kind of intelligent substrate wet etching processing unit being used to prepare graphene |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108286048A true CN108286048A (en) | 2018-07-17 |
Family
ID=62833545
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810182263.7A Withdrawn CN108286048A (en) | 2018-03-06 | 2018-03-06 | A kind of intelligent substrate wet etching processing unit being used to prepare graphene |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108286048A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109680282A (en) * | 2018-12-14 | 2019-04-26 | 中国科学院上海应用物理研究所 | A method of inhibiting molten salt system galvanic corrosion |
| CN113735104A (en) * | 2021-10-29 | 2021-12-03 | 张家港市东大工业技术研究院 | Graphene film etching device |
-
2018
- 2018-03-06 CN CN201810182263.7A patent/CN108286048A/en not_active Withdrawn
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109680282A (en) * | 2018-12-14 | 2019-04-26 | 中国科学院上海应用物理研究所 | A method of inhibiting molten salt system galvanic corrosion |
| CN113735104A (en) * | 2021-10-29 | 2021-12-03 | 张家港市东大工业技术研究院 | Graphene film etching device |
| CN113735104B (en) * | 2021-10-29 | 2021-12-28 | 张家港市东大工业技术研究院 | Graphene film etching device |
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Application publication date: 20180717 |