CN108281344A - A kind of high detection efficient, low noise microchannel plate and preparation method thereof - Google Patents
A kind of high detection efficient, low noise microchannel plate and preparation method thereof Download PDFInfo
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- CN108281344A CN108281344A CN201711399274.2A CN201711399274A CN108281344A CN 108281344 A CN108281344 A CN 108281344A CN 201711399274 A CN201711399274 A CN 201711399274A CN 108281344 A CN108281344 A CN 108281344A
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- film
- microchannel plate
- quartz glass
- microwell array
- input electrode
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J43/00—Secondary-emission tubes; Electron-multiplier tubes
- H01J43/04—Electron multipliers
- H01J43/06—Electrode arrangements
- H01J43/18—Electrode arrangements using essentially more than one dynode
- H01J43/24—Dynodes having potential gradient along their surfaces
- H01J43/246—Microchannel plates [MCP]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/12—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes
- H01J9/125—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes of secondary emission electrodes
Abstract
The present invention relates to a kind of high detection efficients, low noise microchannel plate and preparation method thereof.Wherein, the microchannel plate includes quartz glass microwell array, input electrode, output electrode and ion feedback preventing film, wherein has been sequentially depositing conductive layer and emission layer on the hole wall of the quartz glass microwell array；The ion feedback preventing film is located at input electrode side, and the ion feedback preventing film is graphene film.The present invention is using graphene film layer as ion feedback preventing film, wherein and graphene film layer can accomplish Ethylmercurichlorendimide grade, while preventing ion feedback phenomenon, improve the detection efficient of microchannel plate, meanwhile, improve the gain performance of microchannel plate.
Description
Technical field
The present invention relates to microchannel plates, more particularly to a kind of high detection efficient, low noise microchannel plate and its preparation side
Method.
Background technology
Microchannel plate (Microchannel Plate, MCP) is a kind of millions of micron order glazing channel composition
Sheet type electron multiplication array, it is small with its, light-weight, room and time resolving power is high the advantages that, in lll night vision, grain
It is used widely in the fields such as sub- detection, medical consultations.The U.S. succeeded in developing in earlier 1970s first it is micro- logical
Guidance tape then succeeded in developing for two generations, surpasses the microchannel plates such as two generations, three generations in succession after decades of development.
When microchannel plate works, incident electron enters in microchannel plate, by multiple electron multiplication, in going out for microchannel plate
Highdensity electron cloud is formed at mouthful, at this moment, electron cloud can generate ionization (such as N with the residual gas inside microchannel plate2、H2、
CO2、H2O and CO etc.), cause the cation between plate to be moved to negative direction under electric field action, reversely bombards photocathode, in this way
Photocathode will be damaged, generate interference signal, reduced the service life and signal-to-noise ratio, here it is ion feedback phenomenons, adopt at present
It includes mainly Al to inhibit the feedback of cation, common material with ion feedback preventing film2O3And SiO2, thickness is at several nanometers to several
Ten nanometers.Their appearance not only protects photocathode, but also improves signal-to-noise ratio, but simultaneously also can stop portions signal source excitation
The electronics of photocathode transmitting, makes detection efficient reduce 10%-20%, and dead zone voltage reaches 150V.
Invention content
It is a primary object of the present invention to provide a kind of high detection efficient, low noise microchannel plate and preparation method thereof, institute
Technical problems to be solved are that graphene ion feedback preventing film can effectively stop cation, meanwhile, thickness can be accomplished Ethylmercurichlorendimide
Grade keeps higher transmitance to electronics, significantly improves the detection efficient of microchannel plate, reduces dead zone voltage.
The object of the invention to solve the technical problems is realized using following technical scheme.
A kind of microchannel plate proposed according to the present invention, including, quartz glass microwell array, input electrode, output electrode
And ion feedback preventing film, wherein be sequentially depositing conductive layer and emission layer on the hole wall of the quartz glass microwell array；Institute
The ion feedback preventing film stated is located at input electrode side, and the ion feedback preventing film is graphene film.
The object of the invention to solve the technical problems also can be used following technical measures and further realize.
Preferably, a kind of microchannel plate above-mentioned, wherein the thickness of the graphene film is 0.34-50nm.
Preferably, a kind of microchannel plate above-mentioned, wherein the input electrode or output electrode is gold or platinum；Alternatively,
The thickness of the input electrode or output electrode is 100-500nm.
Preferably, a kind of microchannel plate above-mentioned, wherein the conductive layer is ZnO, thickness 20-150nm；Alternatively,
The emission layer is Al2O3Or SiO2, thickness 3-30nm.
The object of the invention to solve the technical problems is also realized using technical solution below.
A kind of preparation method of the microchannel plate proposed according to the present invention, including, obtain quartz glass microwell array；Institute
It is sequentially depositing conductive layer and emission layer on the hole wall for the quartz glass microwell array stated；There is the stone of conductive layer and emission layer in deposition
The both ends of English glass microporous array are coated with input electrode and output electrode respectively；It is organic in input electrode one end attachment
Film；It is coated with copper film on the organic film；The pyrolysis organic film makes the copper film to remove the organic film
Stay in the input electrode end；Deposit graphene film；The dissolving copper film, drying obtain being attached with the micro- of graphene film
Channel plate.
The object of the invention to solve the technical problems also can be used following technical measures and further realize.
Preferably, the preparation method of a kind of microchannel plate above-mentioned, wherein the adherence method of the organic film includes, it will
Film forming matter, solvent, cosolvent, plasticizer are configured to organic coating solution, appropriate amount of deionized water are put into glassware, then put
Enter organic coating solution, obtains mixed solution；By the input electrode end of the quartz glass microwell array after cleaning, drying from
Slowly organic film is set to be adsorbed on the input electrode end close to the mixed solution above, baking removes moisture, makes to have
Machine film adhesion-tight.
Preferably, the preparation method of a kind of microchannel plate above-mentioned uses wherein the plating method of the copper film includes
The quartz glass microwell array for being attached with organic film is fixed on pedestal by vacuum coating equipment, will by organic film towards evaporation source
Copper foil is placed on tungsten heater, controls vacuum degree, heating evaporation source is coated with copper film.
Preferably, the preparation method of a kind of microchannel plate above-mentioned, wherein the method for pyrolysis of the organic film includes, it will
The quartz glass microwell array for being coated with copper film is put into vacuum chamber, and heating makes organic film be decomposed into gas.
Preferably, the preparation method of a kind of microchannel plate above-mentioned, wherein the deposition method of the graphene film includes,
Graphene film is deposited on the copper film using chemical vapour deposition technique, the air source of the chemical vapour deposition technique is methane
And hydrogen, auxiliary gas are argon gas.
Preferably, the preparation method of a kind of microchannel plate above-mentioned, wherein the dissolving method of the copper film includes that will sink
Product has the quartz glass microwell array of graphene film to immerse in etching solution, and copper film is dissolved, and removes.
By above-mentioned technical proposal, a kind of high detection efficient, low noise microchannel plate and its preparation side proposed by the present invention
Method at least has following advantages：
1, a kind of microchannel plate provided by the invention, detection efficient are high.
The present invention is to lead to its detection efficient to the blocking of signal source electronics based on existing ion feedback preventing film of microchannel plate
The phenomenon that reduction, proposes.The present invention, by quartz glass microwell array technique and atom layer deposition process, chemical vapor deposition method
It is combined, in quartz glass microwell array conduit wall deposit functional layers (i.e. conductive layer and emission layer), improves microchannel plate
Gain performance generates a layer graphene film at input electrode end, can effectively stop cation, meanwhile, it can be by graphene layer
Thickness accomplish Ethylmercurichlorendimide grade, higher transmitance is kept to electronics, significantly improves the detection efficient of microchannel plate, reduces dead zone
Voltage.Graphene ion feedback preventing film provided by the invention makes detection efficient reduce and is less than 5%, and dead zone voltage is less than 50V.
2, a kind of high detection efficient provided by the invention, the preparation method of low noise microchannel plate can be applied to prepare various
The microchannel plate of specification.
Above description is only the general introduction of technical solution of the present invention, in order to better understand the technical means of the present invention,
And can be implemented in accordance with the contents of the specification, it is described in detail as after with presently preferred embodiments of the present invention below.
Specific implementation mode
It is of the invention to reach the technological means and effect that predetermined goal of the invention is taken further to illustrate, below in conjunction with
Preferred embodiment, to propose according to the present invention a kind of high detection efficient, low noise microchannel plate and preparation method thereof, it is specific
Embodiment, structure, feature and its effect are described in detail as after.In the following description, different " embodiment " or " implementation
What example " referred to is not necessarily the same embodiment.In addition, the special characteristic, structure or feature in one or more embodiments can be by any
Suitable form combines.
The present invention provides a kind of microchannel plates.
Microchannel plate provided by the invention includes that quartz glass microwell array, input electrode, output electrode and anti-ion are anti-
Present film, wherein be sequentially depositing conductive layer and emission layer on the hole wall of the quartz glass microwell array；The anti-ion
Feedback film is located at input electrode side, and the ion feedback preventing film is graphene film.
Active ergosphere is deposited on the hole wall of the quartz glass microwell array of microchannel plate provided by the invention, specifically, institute
It has been sequentially depositing conductive layer and emission layer on the hole wall stated, has improved the gain performance of microchannel plate.And it is provided by the invention micro-
The input electrode side of channel plate is provided with graphene film, and the graphene film is provided as ion feedback preventing film, the present invention
The thickness of graphene film can accomplish Ethylmercurichlorendimide grade, higher transmitance is kept to electronics, while preventing ion feedback phenomenon,
The detection efficient of microchannel plate is significantly improved, dead zone voltage is reduced, is more suitable for practical application.
Further, the input electrode or output electrode of microchannel plate provided by the invention are gold or platinum, alternatively, described
The thickness of input electrode or output electrode is 300nm.Further, the conductive layer of microchannel plate provided by the invention is ZnO, thick
Degree is 70nm；The emission layer is Al2O3, thickness 6nm.
Invention also provides a kind of preparation methods of microchannel plate, including, obtain quartz glass microwell array；Institute
It is sequentially depositing conductive layer and emission layer on the hole wall for the quartz glass microwell array stated；There is the stone of conductive layer and emission layer in deposition
The both ends of English glass microporous array are coated with input electrode and output electrode respectively；It is organic in input electrode one end attachment
Film；It is coated with copper film on the organic film；The pyrolysis organic film makes the copper film to remove the organic film
Stay in the input electrode end；Deposit graphene film；The dissolving copper film, drying obtain being attached with the micro- of graphene film
Channel plate.
Wherein, the preparation method of quartz glass microwell array is that the quartz glass tube of large scale precision truing is passed through drawing
Silk stove is drawn into tubule, and tubule, which is carried out six side's close packed arrays, forms a stick, and a stick is further drawn through fiber drawing furnace
Primary silk is made, primary silk is arranged in positive 12 side shape cylinder, microwell array blank is drawn into through fiber drawing furnace again after housing quartz ampoule
Stick, microwell array blank stick are processed to obtain the quartz glass microwell array of certain size by subsequent mechanical.
Preferably, conductive layer and hair are sequentially depositing on the inner wall of quartz glass microwell array using Atomic layer deposition method
Layer is penetrated, to improve the gain performance of microchannel plate.
Preferably, it is coated at the both ends of the quartz glass microwell array of deposit functional layers by electronic vacuum evaporating coating machine
Electrode, electrode material are gold or platinum, and no film microchannel plate is made.
Preferably, ion feedback preventing film is prepared using chemical vapour deposition technique.
1) organic coating solution is configured to by film forming matter, solvent, cosolvent, plasticizer etc. by a certain percentage；In vierics
It is put into appropriate amount of deionized water in ware, is put into organic solution and forms organic film；MCP input terminals after cleaning, drying is slow from above
Close to organic film, makes organic film absorption low-temperature bake on the input face, remove moisture, organic film is made firmly to be attached to.Institute
The film forming matter stated is more preferably nitrocellulose [C6H7O2(ONO2)3], the solvent is more preferably acetic acid fourth
Fat [CH3COOCH3CH3], the cosolvent is more preferably ethyl alcohol [C2H5OH], the plasticizer is more preferably
Tributylphosphate [(C4H9O)3PO3]。
2) use vacuum coating equipment, the microchannel plate that will be covered with machine film is fixed on pedestal, organic film towards evaporation source,
The copper foil cleaned is placed on tungsten heater.When vacuum degree reaches for the moment, electrified regulation evaporation source is coated with copper film.Herein
Vacuum degree be preferably 1 × 10-4The thickness of Pa, copper film are preferably 5-10nm.
3) microchannel plate after vacuum vapor plating is put into vacuum chamber, heating makes organic film be broken down into CO, CO2、
NO2、H2The gases such as O are extracted, and copper film is made to stay in microchannel plate input terminal.
4) a layer graphene film is deposited on Cu films using chemical vapor deposition method, air source is methane and hydrogen, auxiliary
Gas is argon gas.
5) sample after chemical vapor deposition is immersed in etching solution, Cu films is dissolved and are removed, are then dried, finally
So that graphene film is stayed in microchannel plate input terminal and forms ion feedback preventing film.Etching solution herein is preferably the chlorination of 1mol/L
Iron (FeCl3) solution.
Embodiment
Present embodiments provide a kind of high detection efficient, the preparation method of low noise microchannel plate.
(1) quartz glass tube of outer diameter 36mm, wall thickness 3mm are drawn into the tubule of outer diameter 1.44mm, wire drawing with fiber drawing furnace
1600~1900 DEG C of furnace temperature；It, will by 1.44mm tubules close packed array at stick of hexagonal prism shape of opposite side size 30mm
Stick is drawn into the primary silk of opposite side 0.5mm, 1600~1900 DEG C of wire drawing furnace temperature through fiber drawing furnace；Primary silk is tightly packed
It is arranged in the positive 12 side shape of opposite side size 45mm, the quartz ampoule of housing outer diameter 62.5mm forms secondary stick, by secondary stick through wire drawing
Stove is drawn into the microwell array blank stick of outer diameter 25mm, 1800~2100 DEG C of wire drawing furnace temperature；Blank stick adds by subsequent mechanical
Work is prepared into quartz glass microwell array.
(2) layer of ZnO is deposited as conductive using technique for atomic layer deposition first on quartz glass microwell array hole wall
Layer, air source are diethyl zinc (DEZ) and water, deposition thickness 70nm；Then one layer of Al is deposited2O3As secondary electron emission layer, gas
Source is trimethyl aluminium (TMA) and water, deposition thickness 6nm.
(3) vacuum coating equipment is used to be coated with electrode at no film microchannel plate both ends, membrane material is Au or Pt, vacuum degree 5 × 10- 4Pa, thicknesses of layers 300nm, deposition rate 0.4nm/s.
(4) nitrocellulose [C is used6H7O2(ONO2)3] it is used as film forming matter, ethyl acetate [CH3COOCH3CH3] conduct
Solvent, ethyl alcohol [C2H5OH] it is used as cosolvent, tributylphosphate [(C4H9O)3PO3] as plasticizer it is configured to organic coating solution；
It is put into appropriate amount of deionized water in glassware, is put into organic coating solution and is formed with machine film；By the MCP after cleaning, drying from above
Slowly close to organic film, make organic film absorption on the input face, then through low-temperature bake, removes moisture；It, will using vacuum coating equipment
The microchannel plate of covering organic film is fixed on pedestal, and organic film is placed on tungsten filament heating towards evaporation source, by the copper foil cleaned
On device, in vacuum degree 1 × 10-4When Pa, electrified regulation evaporation source starts plated film, 5~10nm of thicknesses of layers；By vacuum evaporation coating
Microchannel plate after film is put into vacuum chamber, and pressure 10 is evacuated to vacuum pump-3Pa carries out height hereinafter, being heated to 350 DEG C~400 DEG C
Temperature baking, 1~3h of time, organic film are broken down into CO, CO2、NO2、H2The gases such as O are extracted；It is set using chemical vapor deposition
It is standby, reative cell vacuum is evacuated to 10-4Pa is passed through air source methane and hydrogen, auxiliary gases argon, in Cu hereinafter, 1000 DEG C of temperature
A layer graphene film is deposited on film；Above-mentioned sample is immersed in the iron chloride (FeCl of 1mol/L3) in solution, 15min is kept, it will
The dissolving removal of Cu films.
In the above-described embodiments, it all emphasizes particularly on different fields to the description of each embodiment, there is no the portion being described in detail in some embodiment
Point, it may refer to the associated description of other embodiment.
It is understood that the correlated characteristic in above-mentioned apparatus can be referred to mutually.In addition, in above-described embodiment " the
One ", " second " etc. is and not represent the quality of each embodiment for distinguishing each embodiment.
In the instructions provided here, numerous specific details are set forth.It is to be appreciated, however, that the implementation of the present invention
Example can be put into practice without these specific details.In some instances, well known structure and skill is not been shown in detail
Art, so as not to obscure the understanding of this description.
Heretofore described numberical range includes numerical value all within the scope of this, and includes any two within the scope of this
The value range of numerical value composition.The different numerical value of the same index occurred in all embodiments of the invention can form in any combination
Value range.
Technical characteristic in the claims in the present invention and/or specification can be combined, and a combination thereof mode is not limited to weigh
The combination that profit is obtained in requiring by adduction relationship.It is combined by the technical characteristic in claim and/or specification
The technical solution and protection scope of the present invention arrived.
The above described is only a preferred embodiment of the present invention, be not intended to limit the present invention in any form, according to
According to the technical spirit of the present invention to any simple modification, equivalent change and modification made by above example, this hair is still fallen within
In the range of bright technical solution.
Claims (10)
1. a kind of microchannel plate, it is characterised in that：Including,
Quartz glass microwell array, input electrode, output electrode and ion feedback preventing film, wherein
It is sequentially depositing conductive layer and emission layer on the hole wall of the quartz glass microwell array；
The ion feedback preventing film is located at input electrode side, and the ion feedback preventing film is graphene film.
2. a kind of microchannel plate according to claim 1, it is characterised in that：
The thickness of the graphene film is 0.34-50nm.
3. a kind of microchannel plate according to claim 1, it is characterised in that：
The input electrode or output electrode is gold or platinum；Alternatively,
The thickness of the input electrode or output electrode is 100-500nm.
4. a kind of microchannel plate according to claim 1, it is characterised in that：
The conductive layer is ZnO, thickness 20-150nm；Alternatively,
The emission layer is Al2O3Or SiO2, thickness 3-30nm.
5. a kind of preparation method of microchannel plate, it is characterised in that：Including,
Obtain quartz glass microwell array；
It is sequentially depositing conductive layer and emission layer on the hole wall of the quartz glass microwell array；
There are the both ends of the quartz glass microwell array of conductive layer and emission layer to be coated with input electrode and output electrode respectively in deposition；
Adhere to organic film in described input electrode one end；It is coated with copper film on the organic film；The pyrolysis organic film,
To remove the organic film, the copper film is made to stay in the input electrode end；Deposit graphene film；The dissolving copper
Film, drying, obtains the microchannel plate for being attached with graphene film.
6. a kind of preparation method of microchannel plate according to claim 5, it is characterised in that：
The adherence method of the organic film includes that film forming matter, solvent, cosolvent, plasticizer are configured to organic coating solution,
It is put into appropriate amount of deionized water in glassware, places into organic coating solution, obtains mixed solution；After cleaning, drying
Quartz glass microwell array input electrode end it is described from slowly close to the mixed solution being adsorbed on, organic film above
Input electrode end, baking, remove moisture, make organic film adhesion-tight.
7. a kind of preparation method of microchannel plate according to claim 5, it is characterised in that：
The plating method of the copper film includes that, using vacuum coating equipment, will be attached with the quartz glass microwell array of organic film
It is fixed on pedestal, by organic film towards evaporation source, copper foil is placed on tungsten heater, control vacuum degree, heating evaporation source,
It is coated with copper film.
8. a kind of preparation method of microchannel plate according to claim 5, it is characterised in that：
The method for pyrolysis of the organic film includes that the quartz glass microwell array for being coated with copper film is put into vacuum chamber, heating,
Organic film is set to be decomposed into gas.
9. a kind of preparation method of microchannel plate according to claim 5, it is characterised in that：
The deposition method of the graphene film includes depositing graphene on the copper film using chemical vapour deposition technique
The air source of film, the chemical vapour deposition technique is methane and hydrogen, and auxiliary gas is argon gas.
10. a kind of preparation method of microchannel plate according to claim 5, it is characterised in that：
The dissolving method of the copper film includes having the quartz glass microwell array of graphene film to immerse etching solution deposition
In, copper film is dissolved, is removed.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110010431A (en) * | 2019-04-08 | 2019-07-12 | 西安工业大学 | A kind of preparation method of the microchannel plate with ion feedback preventing film |
| RU2758498C1 (en) * | 2021-04-18 | 2021-10-29 | Общество с ограниченной ответственностью «КАТОД» | Microchanal plate |
| RU2780041C1 (en) * | 2021-08-31 | 2022-09-19 | Общество с ограниченной ответственностью «КАТОД» | Microchannel plate |
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| CN1202536A (en) * | 1997-10-10 | 1998-12-23 | 中国科学院西安光学精密机械研究所 | Method for producing ion feedback preventing film of microchannel plate |
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| CN110010431B (en) * | 2019-04-08 | 2020-07-03 | 西安工业大学 | Preparation method of microchannel plate with ion feedback prevention film |
| RU2758498C1 (en) * | 2021-04-18 | 2021-10-29 | Общество с ограниченной ответственностью «КАТОД» | Microchanal plate |
| RU2780041C1 (en) * | 2021-08-31 | 2022-09-19 | Общество с ограниченной ответственностью «КАТОД» | Microchannel plate |
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