CN108260269A - Low temperature plasma generating device and gas handling system - Google Patents
Low temperature plasma generating device and gas handling system Download PDFInfo
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- CN108260269A CN108260269A CN201711417887.4A CN201711417887A CN108260269A CN 108260269 A CN108260269 A CN 108260269A CN 201711417887 A CN201711417887 A CN 201711417887A CN 108260269 A CN108260269 A CN 108260269A
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
- B01D53/323—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 by electrostatic effects or by high-voltage electric fields
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/76—Gas phase processes, e.g. by using aerosols
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2251/00—Reactants
- B01D2251/10—Oxidants
- B01D2251/104—Ozone
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/818—Employing electrical discharges or the generation of a plasma
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- Health & Medical Sciences (AREA)
- Biomedical Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Treating Waste Gases (AREA)
Abstract
The application provides a kind of low temperature plasma generating device and gas handling system.Low temperature plasma generating device, including：It is at least one that the columnar discharge electrode element formed is combined by metal and medium；At least another identical discharge electrode element being placed in parallel or column or palisade metal；The discharge electrode element is connected to high-frequency and high-voltage power supply, and discharge to the discharge electrode element being placed in parallel or to column or palisade metal, with to generating reaction of low temperature plasma by the gas in the gap between the discharge electrode element and another identical discharge electrode element or between column or palisade metal ground.By the scheme of the application, sufficiently large reaction of low temperature plasma gap is provided, so as to which the strong oxidizers such as efficient generation ozone are to clear up the harmful substance in gas, and the multiple effect killed is played to harmful substance in gas.
Description
Technical field
This application involves field of gas treatment more particularly to a kind of plasma generators and gas handling system.
Background technology
In order to remove harmful organic contamination atmosphere in air, bad smell, pathogenic microorganisms, existing domestic air purification
Device is usually using physical methods such as strainer filtering, activated carbon adsorptions.But in air gaseous contamination composition organic molecule its
Microscopic dimensions are nanometer scale, can not be filtered out by flow of ambient air amount strainer, and strainer is not only easily blocked by particulate matter,
The cenobium sticked thereon becomes pollution source again, and activated carbon adsorption is easy to accumulation saturation failure, needs frequently to replace
Increase cost.
In addition, also having using photocatalyst form, the surface of titanium dioxide is applied by the ultraviolet component irradiation in light source,
A small amount of hydroxyl radical free radical is generated based on catalytic action excitation.Because UV energy account for energy of light source ratio it is minimum excitation hydroxyl
The amount of base free radical is very little and the coating of titanium dioxide limited area that is contacted with pending gas, therefore it has in logic
Effect, practical function are actually limited
Also have using negative oxygen ion form, generated using the electronics of high direct voltage tip electric field discharge excitation ionization a small amount of
Negative oxygen ion, but the intensity of DC electric field is handed over compared to dielectric barrier discharge (Dielectric Barrier Discharge, DBD)
The intensity of galvanic electricity field is wanted more than weak an order of magnitude, and DC electric field intensity and the curvature of discharging surface are inversely proportional, tip
Area very little causes highfield range very little, and therefore, the negative oxygen ion of generation is very rare, can not export higher electric energy effect in
By processing gas, treatment effeciency is extremely low.
Ozone and hydroxyl radical free radical are extremely strong oxidants, can interrupt the strand of noxious pollutant in air, clear up,
The harmful microorganisms such as germ, virus, fungi are killed, but there is presently no effectively applied.
Invention content
In view of this, the application proposes a kind of low temperature plasma generating device and gas handling system, by by metal and
The low temperature plasma generating device of columnar dicsharge electrode member composition that medium combines, can be to being provided by the gas in its gap
More roomy throughput and stronger more balanced plasma excitation electric field, so that efficient generate the strong oxidizers such as ozone to disappear
Solve the harmful substance in gas.
According to the one side of the application, a kind of low temperature plasma generating device is provided, including：
It is at least one that the columnar discharge electrode element formed is combined by metal and medium；
At least another identical discharge electrode element being placed in parallel or column or palisade metal；
The discharge electrode element is connected to high-frequency and high-voltage power supply, and to the discharge electrode element being placed in parallel or
Discharge column or palisade metal, with to by the discharge electrode element and another identical discharge electrode element it
Between or the gas in gap between column or palisade metal ground generate reaction of low temperature plasma.
Further, the column is cylindric or tubulose；
Or
The discharge electrode element is obtained to form metal layer in its inner wall by medium tube；
Or
The discharge electrode element is obtained to be formed on its surface dielectric layer by metal bar or pipe；
Or
The discharge electrode element staggered relatively is obtained to be formed on its surface dielectric layer by metal electrode frame,
In, the metal electrode frame is included at least two metal bars or the pipe that both ends insulating supporting is fixed and is arranged in parallel, by
At least two metal bars or pipe surface form dielectric layer and obtain at least two discharge electrode elements staggered relatively.
According to the another aspect of the application, provide a kind of gas handling system, including low temperature as described above etc. from
Sub- generating means is arranged in the gas treatment channel of the system, and working gas occurs by the low-temperature plasma
Device generates reaction of low temperature plasma.
Further, the working gas passes through the discharge electrode element and another identical discharge electrode element
Between or the gas in gap between column or palisade metal ground generate reaction of low temperature plasma to generate ozone.
Further, ozone reaction chamber, through the plasma generator, treated described in the working gas entrance
It is reacted in ozone reaction chamber；
And/or
In the resolution catalytic domain of exit setting, trim process is carried out to previously processed working gas；
And/or
Water fog generator is used to generate water mist, is generated with bringing the plasma generator by the working gas
Hydroxyl radical free radical；
And/or
Stop layer is filtered, the air inlet side of the low temperature plasma generating device is arranged on, to prevent via the low temperature
The ozone that plasma generator generates inversely is diffused into exterior；
And/or
High-frequency and high-voltage power supply provides equipment, for generating the high-frequency high-voltage needed for the low temperature plasma generating device
Source.
Further, closed cavity is further included, for accommodating the device work of the system, the cavity ground connection.
A kind of low temperature plasma generating device and gas handling system are proposed according to the application, by by metal and medium knot
The low temperature plasma generating device of the columnar dicsharge electrode member composition of conjunction can provide the gas by its gap more roomy
Throughput and stronger more balanced plasma excitation electric field, so as to which efficient generation ozone etc. strong oxidizers are to clear up gas
In harmful substance, thus not only by the strong oxidizers such as ozone eliminate gas in harmful substance, also pass through high electric field low temperature
Plasma bombardment decomposes the harmful substance in gas, and the multiple effect killed is played to harmful substance in gas.
Above description is only the general introduction of technical scheme, in order to better understand the technological means of the application,
And can be implemented in accordance with the contents of the specification, below with the preferred embodiment of the application and coordinate attached drawing be described in detail as after.
Description of the drawings
The attached drawing for forming the part of the present invention is used to provide further understanding of the present invention, schematic reality of the invention
Example and its explanation are applied for explaining the present invention, is not constituted improper limitations of the present invention.In the accompanying drawings：
Fig. 1 shows a kind of schematic diagram of an embodiment of gas handling system of the application；
Fig. 2 shows a kind of schematic diagrames of an embodiment of gas handling system of the application；
Fig. 3 shows a kind of schematic diagram of an embodiment of gas handling system of the application；
Fig. 4 to 6 shows the schematic diagram of three kinds of embodiments of the discharge electrode element of the application；
Fig. 7 to 8 shows the schematic diagram of two kinds of embodiments of the discharge electrode component discharges structure of the application；
Fig. 9 shows the schematic diagram of the embodiment of the discharging structure between multiple discharge electrode elements of the application.
Specific embodiment
Fig. 1 shows a kind of schematic diagram of an embodiment of gas handling system of the application.
It discharges, has obtained net as shown in the figure, working gas 1 becomes clean gas 3 after the processing of gas handling system 2
Change.
Gas handling system 2 is for example including low temperature plasma generating device 21, ozone reaction chamber 22 and/or resolution catalytic domain
23。
When pending working gas 1 such as containing harmful components (such as formaldehyde, benzene, harmful microorganism, organic pollution),
The air of oxygen and moisture cycles through the gas passage of gas handling system 2, in this channel, by low-temperature plasma
The bombardment of 21 highfield low-temperature plasma of generating means, the harmful components in gas are decomposed by bombardment, account for gas such as 20% with
On oxygen ozone is synthesized by strong electric field ionization；The pollutant component degraded by plasma bombardment leaves plasma generator
After 21, continue in ozone reaction chamber 22, with the two phase reaction of gas phase and liquid phase, continue further to locate remaining harmful components
Reason, such as decomposition, resolution and/or mineralising；The residual activities ingredient such as ozone in the tail gas then formed, is resolved catalytic domain 23 such as
The resolution of room temperature catalytic bed becomes oxygen, carbon dioxide and moisture etc. and is discharged to the interior space, moves in circles successively, work of constantly degrading
Formaldehyde harmful components in gas such as room air achieve the purpose that carry out effective and safe purification to gas.
The standard oxidizing potential 2.07 of ozone, hydroxyl radical free radical standard oxidizing potential 2.7 are greens most strong in nature
Extremely strong oxidant, the significantly larger than daily common disinfectant of oxychloride agent, hydrogen peroxide, permanganic acid etc..Especially hydroxyl from
By the chemical combination key that can interrupt almost all organic molecules by force of the oxidisability of base, it is allowed to (toxicity) function that loses activity.It comes
Oxygen and moisture in the air under forceful electric power field action, and reaction product itself only oxygen, water and carbon dioxide, institute
To be important green advanced oxidation processes.
Working gas usually contains oxygen, water and carbon dioxide, in the low temperature plasma generating device 21 Jing Guo the application
After effect, the substances such as ozone or hydroxyl radical free radical may be generated, to kill harmful dirt in working gas by chemical reaction
Contaminate object.The concentration of chemical reaction and time are the premises of reaction efficiency, although some reaction time are nanoseconds,
When reactive material complicated component, the necessary of certain reaction time is kept.Though hydroxyl radical free radical oxidisability it is superpower itself
Service life is very short.Leaving reaction condition will disappear, and the half-life period of ozone is relatively long, can continue resolution reaction, because
This is provided with corresponding ozone reaction chamber 22 persistently to kill the noxious pollutant in working gas.It is to be appreciated that according to conjunction
Into the occasion of reaction, subsidiary conditions can be increased in ozone reaction chamber 22 to kill more thoroughly, the subsidiary conditions for example add
Add catalyst, injection other materials ingredient or plus/minus temperature etc..
Ozone is extremely strong oxidant, can interrupt the strand of noxious pollutant in air, clear up, by germ, disease
The harmful microorganisms such as poison, fungi are killed, but also harmful simultaneously, therefore currently without being effectively utilized, and
Indoor use there are no reaching effectively resolution to kill concentration, just alreadys exceed the indoor ozone safe concentration standard of country's permission
.In this application, the generation efficiency of ozone is improved by low temperature plasma generating device 21, is disappeared by clearing up catalytic domain 23
Gas cleaning and safety that the residual activities ingredient such as ozone in tail gas causes discharge are solved.
Resolution 23 purpose of catalytic domain is the remaining active constituent that will participate in reaction, mainly ozone, passes through catalyst
Catalysis reaction is reduced into the innocuous substances such as oxygen gas and water, carbon dioxide.Ozone high energy itself and it is unstable, it is aerial partly to decline
Phase less than a few houres, can be cleared up with moment by being heated to 260 degree, can slowly be cleared up, be passed through by activated carbon adsorption fixation
Aoxidizing copper-based catalysts can be cleared up with 150 degree of moments, can be cleared up by adding activated carbon and corresponding formula with room temperature.Resolution catalysis
Catalyst can be set in area 23, and catalyst needs to be fixed on the carrier (such as catalytic bed) with large specific surface area so as to have
Work is imitated, general as carrier material has aluminum oxide ceramic honeycomb ceramics, metal aluminum foil honeycomb ceramics and ceramic particle
(" bed " of traditional metal screen frame) surface.
Further, Fig. 2 shows a kind of schematic diagrames of an embodiment of gas handling system of the application.
It is stupider according to the harmful components in the primitive component of pending gas and processing intensity requirement, such as object gas
Gu such as bioxin etc, ozone all feels that the inadequate speed of dynamics is too slow, therefore can be injected in plasma generator leading portion
Moisture subconstiuent, hydrone in plasma generator, directly to be excited to generate hydroxyl radical free radical with highfield, with hydroxyl free
The velocity stage of the nanosecond of base non-selectivity clears up it.
As shown in the figure, in order to enhance gas purifying effect, water is increased in the gas passage of the gas handling system 2
Fog generator 24, water fog generator 24 are arranged on the air inlet side of low temperature plasma generating device 21, for generating water mist.As increasing
The water mist of rival's section, the plasma generating region of the formation of plasma generator 21 is entered with pending working gas, and water mist exists
Hydrone is ionized a variety of autoreactions such as the negative hydroxyl of generation under the action of highfield, forms free radical activity particle such as hydroxyl free
Basal granule, part ozone molecule also dissolves in the presence that wherein oxidation hydrone continues to free radical, in addition, the high surface of water mist
Product is conducive to and organic pollution haptoreaction.It, can according to resolution technological requirement when adding moisture by water fog generator 24
To select the addition manner of moisture, because existing form is influenced and restriction moisture by temperature, air pressure in an atmosphere, Ke Yitong
Ultrasonic humidifying, heating evaporation and spraying water spray are crossed, to meet the requirement of resolution technique.
The free radical activities particle such as hydroxyl radical free radical is oxidant more stronger than ozone, can decompose presently found one
Organic matter is cut, but its service life is extremely short, is detached from its formation condition and disappears immediately.In the application, filled by low-temperature plasma
After putting the free mafic active particle of 21 generations, in the environment of this formation condition is not departed from, you can in plasma generator
21 and/or ozone reaction chamber 22 in reacted immediately with the harmful substance in working gas, so as to greatly improve gas
The treatment effeciency and effect of purification.
Further, Fig. 3 shows a kind of schematic diagram of an embodiment of gas handling system of the application.
As shown in the figure, working gas is sent into the gas passage of gas handling system by pressure fan 26, sent out in low-temperature plasma
The nearly gas side of generating apparatus 21 can also set filtering stop layer 25, to prevent what is generated via low temperature plasma generating device 21
Ozone is inversely diffused into exterior, and secondary pollution is caused to extraneous air.High-frequency and high-voltage power supply provides equipment 27 for generating
High-frequency and high-voltage power supply needed for low temperature plasma generating device 21 for example, by being converted to alternating current, forms high-frequency and high-voltage,
Such as frequency 3 to 50kHz, the alternating current of voltage 5 to 50kV, the application is by practice, it is preferred to use the electricity of 1500V to 30000V
Pressure, the effect reached are preferable.High-frequency and high-voltage power supply needs the capacitive load with low-temperature plasma generator to match, and is operated in humorous
Operating mode of shaking is best, and resonant frequency is usually chosen to more than superaudio wave band, avoids sound wave being caused to interfere human ear.In addition, because
Low temperature plasma generating device is operated in high-frequency and high-voltage operating mode, for the safety used indoors, needs to be fixed on the knot of ground connection
In structure cavity.If cavity is metal material, high-voltage safety can be ensured by being directly grounded.Therefore, at the gas of the application
Reason system preferably further includes closed cavity, is sent out for accommodating the device work of the system including foregoing low-temperature plasma
Generating apparatus, ozone reaction chamber, resolution catalytic domain, water fog generator, pressure fan, filtering stop layer, high-frequency and high-voltage power supply offer are set
Standby to wait institute's device work in need being isolated from the outside, cavity is grounded.By building the cavity of a closing, the work of tape handling
The cavity that gas circulation is closed by this, high voltagehigh frequency highfield and ozone, free radical particle are closed in this ground connection
Cavity in, the Electrical Safety of guarantee, and secondary pollution will not be caused to extraneous air.Further, if cavity is non-gold
Belong to the structure of material, such as the structures such as plastics, glass, it is necessary to carry out metalized, can simply attach one side glue
Then aluminium foil, stainless steel foil are grounded.In order to improve the anti-Strong oxdiative ability of aluminium foil layer, need to do low-temperature oxidation, differential of the arc oxygen
The oxidative deactivation processing of change.On the one hand ensure that high-pressure section is wrapped in inside ground electrode in this way, prevent personnel's high pressure electric leakage electric shock
Danger, and electromagnetic wave shielding can be played the role of, prevent electrical equipment around high-frequency electric wave diffusion couple from generating interference.
In the gas handling system of the application, high frequency electric field, low-temperature plasma, ozone, the synthesis of free radical are compound
Reagentia can improve the completeness that harmful organic contamination ingredient in air is eliminated.
The low temperature plasma generating device of the application mentioned above, preferably includes：It is at least one by metal and medium
With reference to the columnar discharge electrode element of formation；At least another identical discharge electrode element being placed in parallel or column or
Palisade metal；The discharge electrode element is connected to high-frequency and high-voltage power supply, and to the discharge electrode element being placed in parallel,
Or discharge column or palisade metal, with to passing through the discharge electrode element and another identical discharge electrode element
Between or the gas in gap between column or palisade metal ground generate reaction of low temperature plasma.Column recited above,
Can be solid column or hollow column i.e. tubulose.
That is, the working gas of gas handling system described above, across two columnar dicsharge electrode members or
Highfield gap between person's columnar dicsharge electrode member and tubulose or column or palisade metal ground, the harmful components quilt in gas
Bombardment is decomposed, and the oxygen in gas synthesizes ozone by strong electric field ionization, and hydrone is ionized a variety of autoreactions such as the negative hydroxyl of generation,
Form free radical activity particle such as hydroxyl radical free radical particle.Due between columnar electrode, columnar electrode and pipe or column or palisade
The contact area in opposite gap is big between metal ground, and electric field strength is uniform so that the formation efficiency of ozone and harmful gas
The bombardment decomposition of body is greatly improved.Gap between columnar electrode can be under the premise of electric field strength be ensured, as possible
Widen to increase gas throughput, while columnar electrode element very easily can further increase gas by increasing length wise
Body throughput.
It is possible to further form grid by multiple tracks columnar electrode, increase can be facilitated to arrange as needed, be dredged with forming
The close multiple tracks Low Temperature Plasma Treating reactor not waited, to adapt to needed for the different condition of different processing gas ingredients.
Further, the column can be square pillar, rectangle column, cylindric, irregular section column
Deng..For cylindric, the grid-like low temperature plasma generating device that is made of columnar electrode is formed by cylindrical curvature
Non-uniform electric field, therebetween most narrow section part form the heavy curtain that is formed by high field together, can cause it is all by
Gas molecule is all bombarded and exhaustive.
As it can be seen that gaseous target of this plasma generator structure of the application especially suitable for low concentration reactive material
Processing during big throughput.
Fig. 4 to 6 shows the schematic diagram of three kinds of embodiments of the discharge electrode element of the application.
As shown in figure 4, discharge electrode element is obtained to form metal layer in its inner wall by medium tube.Medium tube is, for example,
The tubing such as glass, ceramics, enamel, inner wall help key by chemical deposition, electrocondution slurry coating, sintering, vacuum sputtering, direct or field
Close or ward off weldering such as ultrasonic wave ward off weldering mode form metal layer, so as to form the discharge electrode that metal is combined with medium-tight
Element.If medium tube internal metallization using chemical deposition, is typically chosen silver-colored (silver mirror reaction), nickel-phosphorus alloy or copper.
If using vacuum sputtering, do not restricted.If using conductive coating, silver powder, copper powder are generally added using based binder, more
Multi-purpose graphite powder and grapheme material are mixing cured.Weldering is warded off generally using tin-base soft solder.Direct Bonding or field help bonding general
Using copper foil aluminum foil metal material.
As shown in figure 5, discharge electrode element is obtained to be formed on its surface dielectric layer by metal bar or pipe.Metal bar or
The material of pipe is chosen as stainless steel such as 304 stainless steels, aluminium, magnesium through peroxidating such as differential arc oxidation or Passivation Treatment or
Magnesium alloy.Metal oxygen is formed in the surface oxidation of metal bar or pipe such as low temperature differential arc oxidation, gloss firing or enamel spray sintering etc.
Compound such as ceramic insulating layer, so as to form the discharge electrode element that metal is combined with medium-tight.
As described in Figure 6, discharge electrode element staggered relatively is obtained to be formed on its surface dielectric layer by metal electrode frame
It arrives, wherein, the metal electrode frame includes at least 2 metal bars or the pipe that are arranged in parallel, and the both ends of the metal bar or pipe are adopted
It is fixed with using the insulating supporting such as tetrafluoroethene structural member, glass rolled-up stock or ceramic compacting sintering part.By described
At least two metal bars or pipe surface form dielectric layer and obtain at least two discharge electrode elements staggered relatively.Metal
Stick, pipe form metal electrode frame, then on its surface through the means shape such as peroxidating, gloss firing or spraying by the methods of punching press or cast
Into dielectric, so as to form the discharge electrode element that metal is combined with medium-tight.
Further, in order to which the working gas in These gases processing system is made adequately to be handled, within the system,
The installation of low temperature plasma generating device, in making columnar electrode element substantially horizontal with gas passage, so as to enable working gas
Enough across two discharge electrode elements of low-temperature ion generating means or discharge electrode elements and column or palisade gold
Gap between possession generates ozone with high efficiency, preferably generally vertically passes through the ventilatory capacity for realizing bigger..
Fig. 7 to 8 shows the schematic diagram of two kinds of embodiments of the discharge electrode component discharges structure of the application.
As shown in fig. 7, at least two discharge electrode elements being arranged in parallel are connected respectively to high-frequency and high-voltage power supply, at two
It discharges between the discharge electrode element being arranged in parallel.
As shown in figure 8, discharge electrode element and column or palisade metal be connected respectively to high-frequency and high-voltage power supply, discharging
It discharges between electrode member and column or palisade metal ground.
Fig. 9 shows the schematic diagram of the embodiment of the discharging structure between multiple discharge electrode elements of the application.
As shown in the figure, when there is multilayer discharge electrode element, electrode member is connected respectively to high-frequency and high-voltage power supply two-by-two,
It discharges each other.
Above to the low temperature plasma generating device of the application and gas handling system, pass through what is combined by metal and medium
The low temperature plasma generating device of columnar dicsharge electrode member composition can provide the gas by its gap more roomy lead to
Excessive and stronger more balanced plasma excitation electric field, so that efficient generate the strong oxidizers such as ozone to clear up in gas
Harmful substance, thus not only by the strong oxidizers such as ozone eliminate gas in harmful substance, also by high electric field low temperature etc. from
The harmful substance in gas is decomposed in son bombardment, and the multiple effect killed is played to harmful substance in gas.
In addition, reaction gas is when by the gas treatment channel of relative closure, sequentially by low-temperature plasma device and
Ozone reaction chamber, tail gas resolution area, complete chemical digesting reaction all processes, last harmless emission.The channel-type of relative closure
Reaction system solves harmful item that plasma high-concentrated ozone etc. needed for the killing resolution of harmful components in gas reacts by force
Part and indoor people occupy the contradiction of security context.
It should be noted that in the absence of conflict, the feature in embodiment and embodiment in the present invention can phase
Mutually combination.
The above described is only a preferred embodiment of the present invention, not make limitation in any form to the present invention, according to
According to any simple modification, equivalent change and modification that the technical spirit of the present invention makees above example, this hair is still fallen within
In the range of bright technical solution.
Claims (6)
1. a kind of low temperature plasma generating device, which is characterized in that including：
It is at least one that the columnar discharge electrode element formed is combined by metal and medium；
At least another identical discharge electrode element being placed in parallel or column or palisade metal；
The discharge electrode element is connected to high-frequency and high-voltage power supply, and to the discharge electrode element being placed in parallel or to column
Discharge to shape or palisade metal, with to by between the discharge electrode element and another identical discharge electrode element,
Or the gas in the gap between column or palisade metal ground generates reaction of low temperature plasma.
2. low temperature plasma generating device as described in claim 1, it is characterised in that：
The column is cylindric or tubulose；
Or
The discharge electrode element is obtained to form metal layer in its inner wall by medium tube；
Or
The discharge electrode element is obtained to be formed on its surface dielectric layer by metal bar or pipe；
Or
The discharge electrode element staggered relatively is obtained to be formed on its surface dielectric layer by metal electrode frame, wherein, institute
State metal electrode frame and be included at least two metal bars or pipe that both ends insulating supporting is fixed and is arranged in parallel, by it is described extremely
Few two metal bars or pipe surface form dielectric layer and obtain at least two discharge electrode elements staggered relatively.
3. a kind of gas handling system, which is characterized in that sent out including such as claim 1 to 2 any one of them low-temperature plasma
Generating apparatus is arranged in the gas treatment channel of the system, and working gas passes through the low temperature plasma generating device
Generate reaction of low temperature plasma.
4. system as claimed in claim 3, it is characterised in that：
The working gas is across the discharge electrode element and another identical discharge electrode element or and column
Or the gas in the gap between palisade metal ground generates reaction of low temperature plasma to generate ozone.
5. system as claimed in claim 3, which is characterized in that further include：
Ozone reaction chamber, through the plasma generator treated the working gas enter in the ozone reaction chamber into
Row reaction；
And/or
In the resolution catalytic domain of exit setting, trim process is carried out to previously processed working gas；
And/or
Water fog generator is used to generate water mist, and hydroxyl is generated to bring the plasma generator by the working gas
Free radical；
And/or
Filter stop layer, be arranged on the air inlet side of the low temperature plasma generating device, with prevent via described low temperature etc. from
The ozone that sub- generating means generates inversely is diffused into exterior；
And/or
High-frequency and high-voltage power supply provides equipment, for generating the high-frequency and high-voltage power supply needed for the low temperature plasma generating device.
6. such as claim 3 to 5 any one of them system, it is characterised in that：
Closed cavity is further included, for accommodating the device work of the system, the cavity ground connection.
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| CN201711417887.4A CN108260269A (en) | 2017-12-25 | 2017-12-25 | Low temperature plasma generating device and gas handling system |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111804129A (en) * | 2020-06-10 | 2020-10-23 | 三维天工（北京）科技有限公司 | Low-temperature plasma inactivation device for gas treatment |
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