CN108257996A - Pixel unit and its manufacturing method and imaging device - Google Patents
Pixel unit and its manufacturing method and imaging device Download PDFInfo
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- CN108257996A CN108257996A CN201810052213.7A CN201810052213A CN108257996A CN 108257996 A CN108257996 A CN 108257996A CN 201810052213 A CN201810052213 A CN 201810052213A CN 108257996 A CN108257996 A CN 108257996A
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14603—Special geometry or disposition of pixel-elements, address-lines or gate-electrodes
- H01L27/14605—Structural or functional details relating to the position of the pixel elements, e.g. smaller pixel elements in the center of the imager compared to pixel elements at the periphery
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14609—Pixel-elements with integrated switching, control, storage or amplification elements
- H01L27/14612—Pixel-elements with integrated switching, control, storage or amplification elements involving a transistor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Solid State Image Pick-Up Elements (AREA)
Abstract
This disclosure relates to pixel unit and its manufacturing method and imaging device.Pixel unit can include substrate, including the first part for photoelectric device and for the second part of the transistor coupled with the photoelectric device.First part has first surface at substrate surface, and first part includes the first doped region.Second part includes：Channel formation region, adjacent with the first doped region, the conduction type of channel formation region is with the conduction type of the first doped region on the contrary, and second doped region adjacent with channel formation region.Pixel unit further includes：Cover in substrate and at least at least part of adjusting insulating layer of first surface；And the adjusting electrode layer at least at least part of first surface, it adjusts insulating layer and is inserted between.
Description
Technical field
This disclosure relates to pixel unit and its manufacturing method and imaging device.
Background technology
Imaging sensor can be used for radiating (for example, light radiation, including but not limited to visible ray, infrared ray, ultraviolet light
Deng) sensed, so as to generate corresponding electronic signal.It is widely used in digital camera and other electro-optical devices
In.
In imaging sensor, (particularly in cmos image sensor (CIS) product, dark current is a main performance ginseng
Number.And dark current occurs mainly in silicon face, is caused by defect, dangling bonds, dislocation or metal contamination.
Prevent the major way that surface dark current occurs from forming pinned photodiode using the doping of p type impurity at present
(PPD, pinned photo diode) silicon face is isolated with the key light electric diode (PD) under PPD.But doping
It is unfavorable that mode plays the role of, i.e., ion implanting can cause to generate depletion layer, which can reduce the full-well capacity (full of PD
well capacity)。
It is, therefore, desirable to provide a kind of new technology is above-mentioned of the prior art one or more to solve the problems, such as.
Invention content
One purpose of some embodiments of the present disclosure is to provide a kind of novel technology, with while dark current is inhibited
The influence to full-well capacity is reduced, so as to provide image quality.
Another purpose of embodiment of the disclosure is to provide a kind of novel pixel unit and its manufacturing method and packet
Imaging device containing the pixel unit.
According to one aspect of the disclosure, a kind of pixel unit is provided, including：
Substrate, including be used for photoelectric device first part and for coupled with the photoelectric device the second of transistor
Part, wherein
The first part has first surface at the substrate surface, and the first part includes the first doping
Area；
The second part includes：
Channel formation region, adjacent with first doped region, the conduction type of the channel formation region is mixed with described first
The conduction type in miscellaneous area on the contrary, and
Second doped region adjacent with channel formation region；
Cover in the substrate and at least at least part of adjusting insulating layer of the first surface；And
Adjusting electrode layer at least on described at least part of the first surface, the adjusting insulating layer are inserted into
In between.
According to the disclosure on the other hand, provide a kind of imaging device, include according to it is recited above and below general
The pixel unit for any embodiment being described in more detail.
According to the disclosure on the other hand, a kind of method for manufacturing pixel unit is provided, including：Substrate is provided, it is described
Substrate include for formed wherein transistor raceway groove channel formation region and for form photoelectric device wherein the
One region；It forms gate structure over the substrate and dummy gate structure, the gate structure is included in the channel formation region
On the first insulating layer and the grid on first insulating layer, the dummy gate structure be included in firstth area
Second insulating layer at least part of the upper surface in domain and the dummy grid on the second insulating layer；In substrate
Upper formation third insulating layer, the third insulating layer is at least so that the upper surface of the dummy grid is exposed；The dummy grid is removed,
To form at least part of opening for exposing the second insulating layer；；And conductive material layer is formed, to be opened described in filling
Mouthful.
According to the disclosure on the other hand, a kind of method for manufacturing pixel unit is provided, including：
Substrate is provided, the substrate includes：
For the first part of photoelectric device, wherein the first part has first surface at the substrate surface,
And the first part includes the first doped region；
Second part for the transistor coupled with the photoelectric device, the second part include：
Channel formation region, adjacent with first doped region, the conduction type of the channel formation region is mixed with described first
The conduction type in miscellaneous area on the contrary, and
Second doped region adjacent with channel formation region；And
Gate structure on the channel formation region；And
On substrate formed third insulating layer, the third insulating layer have so that the first area upper surface extremely
The opening that a few part is exposed；
Formed adjust insulating layer, it is described adjust insulation at least cover layer by layer the first area upper surface it is described at least
A part；And
Conductive material layer is formed on the adjusting insulating layer, to fill the opening.
In accordance with an embodiment of the present disclosure, the electronic barrier of adjustable silicon face can also be provided, reduce electronics in silicon table
Face carries out energy level transition so as to form the occurrence probability of dark current, so as to further suppress dark current, improves picture quality.Separately
It outside, in accordance with an embodiment of the present disclosure, can also be for example by being served as a contrast adjusting electrode offer current potential (such as negative potential)
Bottom surface forms charge inducing (for example, hole), so as to further reduce dark current, provides image quality.
By referring to the drawings to the detailed description of the exemplary embodiment of the disclosure, the other feature of the disclosure and its
Advantage will become apparent.
Description of the drawings
The attached drawing of a part for constitution instruction describes embodiment of the disclosure, and is used to solve together with the description
Release the principle of the disclosure.
With reference to attached drawing, according to following detailed description, the disclosure can be more clearly understood, wherein：
The schematic sectional view of the pixel unit according to an embodiment of the present disclosure is shown respectively in Figure 1A and 1B；
The schematic sectional view of the pixel unit according to an embodiment of the present disclosure is shown respectively in Fig. 2A and 2B；
Fig. 3 shows the example flow diagram of the manufacturing method of the pixel unit according to an embodiment of the present disclosure；
Fig. 4 A to 4G show the schematic sectional view of pixel unit corresponding with the part steps of method shown in Fig. 3；
Fig. 5 shows the example flow diagram of the manufacturing method of the pixel unit according to the disclosure another embodiment；
Fig. 6 A to 6E show the schematic sectional view of pixel unit corresponding with the part steps of method shown in fig. 5；
Fig. 7 A-7D show schematically cutting for the corresponding pixel unit of the part steps of manufacturing method according to another embodiment
Face figure；
Fig. 8 A-8F show the schematic of the corresponding pixel unit of the part steps of manufacturing method according to another embodiment
Sectional view；And
Fig. 9 A to 9H are shown according to the corresponding pixel unit of part steps of the manufacturing method of an embodiment of the present disclosure
Schematic sectional view.
Note that in embodiments described below, same reference numeral is used in conjunction between different attached drawings sometimes
Come the part for representing same section or there is identical function, and omit its repeated explanation.In the present specification, using similar mark
Number and letter represent similar terms, therefore, once being defined in a certain Xiang Yi attached drawing, then do not needed in subsequent attached drawing pair
It is further discussed.
In order to make it easy to understand, position, size and range of each structure shown in attached drawing etc. etc. does not indicate that reality sometimes
Position, size and range etc..Therefore, disclosed invention is not limited to position, size and range disclosed in attached drawing etc. etc..
Specific embodiment
The various exemplary embodiments of the disclosure are described in detail now with reference to attached drawing.It should be noted that：It is unless in addition specific
Illustrate, component and the positioned opposite of step, numerical expression and the numerical value otherwise illustrated in these embodiments is unlimited to make this public affairs
The range opened.In addition, technology, method and apparatus known to person of ordinary skill in the relevant may be not discussed in detail,
But in the appropriate case, the technology, method and apparatus should be considered as authorizing part of specification.
Word "front", "rear", " top ", " bottom " in specification and claim, " on ", " under " etc., if deposited
If, it is not necessarily used to describe constant relative position for descriptive purposes.It should be appreciated that the word used in this way
Language is interchangeable in appropriate circumstances so that embodiment of the disclosure described herein, for example, can in this institute
Those of description show or other are orientated in other different orientations and operate.
The arbitrary realization method of this exemplary description be not necessarily to be interpreted it is more preferred than other realization methods or
Advantageous.Moreover, the disclosure is not gone out by given in above-mentioned technical field, background technology, invention content or specific embodiment
Theory that is any stated or being implied limited.
As used in this, word " substantially " mean comprising by design or manufacture the defects of, device or element appearance
Arbitrary small variation caused by difference, environment influence and/or other factors.Word " substantially " also allows by ghost effect, makes an uproar
Caused by sound and the other practical Considerations being likely to be present in practical realization method with perfect or ideal situation
Between difference.
Foregoing description can indicate to be " connected " or " coupling " element together or node or feature.As used herein
, unless explicitly stated otherwise, " connection " means an element/node/feature with another element/node/feature in electricity
Above, it is directly connected mechanically, in logic or in other ways (or direct communication).Similarly, unless explicitly stated otherwise,
" coupling " mean an element/node/feature can with another element/node/feature in a manner of direct or be indirect in machine
On tool, electrically, in logic or in other ways link to allow to interact, even if the two features may not direct
Connection is also such.That is, " coupling " is intended to encompass the direct connection and connection indirectly of element or other feature, including profit
With the connection of one or more intermediary elements.
In addition, just to the purpose of reference, can also be described below it is middle use certain term, and thus not anticipate
Figure limits.For example, unless clearly indicated by the context, be otherwise related to the word " first " of structure or element, " second " and it is other this
Class number word does not imply order or sequence.
It should also be understood that one word of "comprises/comprising" as used herein, illustrates that there are pointed feature, entirety, steps
Suddenly, operation, unit and/or component, but it is not excluded that in the presence of or increase one or more of the other feature, entirety, step, behaviour
Work, unit and/or component and/or combination thereof.
In the disclosure, therefore term " offer " " it is right to provide certain from broadly by covering obtain object all modes
As " including but not limited to " purchase ", " preparation/manufacture ", " arrangement/setting ", " installation/assembling ", and/or " order " object etc..
It is not to this public affairs it should also be understood that being merely illustrative below to the description of at least one exemplary embodiment
It opens and its application or any restrictions that use.
The schematic sectional view of the pixel unit according to an embodiment of the present disclosure is shown respectively in Figure 1A and 1B.Such as from following
Explanation it will be apparent that, pixel unit can include photoelectric device (for example, photodiode) and with photoelectric device coupling
The transistor connect.
As shown in Figure 1A, pixel unit 100A can include substrate 101.Substrate 101 can be included for photoelectric device
First part 103 and for the second part 105 of the transistor coupled with photoelectric device.First part 103 and second part 105
Multiple portions (or subdivision) can respectively be included, indicated in a manner of 103 or 105 additional characters.
The example of the material of substrate 101 can include but is not limited to unitary semi-conducting material (such as, silicon or germanium etc.), chemical combination
Object semi-conducting material (such as silicon carbide, SiGe, GaAs, gallium phosphide, indium phosphide, indium arsenide and/or indium antimonide) or combination.
Substrate 101 is not particularly limited, as long as it is suitable for forming the device (example for sensing radiation (for example, light) wherein
Such as, photodiode).
First part 103 can include the first doped region 1031.First part 103 has the at the surface of substrate 101
One surface 1039 (Fig. 4 A).As described further below, in various embodiments, first part can have others
Or the subdivision substituted.In a specific example, the conduction type of substrate can be the first conduction type (for example, p-type),
And the conduction type of the first doped region can be the conduction type (for example, N-type) opposite with the first conduction type；The reality of the disclosure
It is without being limited thereto to apply example.
Second part 105 can include channel formation region 1051.Transistor at work, will be formed in channel formation region
Raceway groove.Channel formation region 1051 is adjacent with the first doped region 1031.The conduction type of channel formation region 1051 could be provided as with
The conduction type of first doped region is opposite.
Second part 105 further includes second doped region 1052 adjacent with channel formation region 1051.Second doped region 1052
Conduction type can be identical with the first doped region 1031.Here, the second doped region 1052 can be used for forming floating diode
(Floating Diode, FD), for example, with well region 113.
Here, the first doped region can be as one in the source area and drain region of the transistor.Second doped region
It can be as another in the source area and drain region of the transistor.
Pixel unit 100A is additionally included in the substrate and at least covers at least part of of the first surface
Adjust insulating layer.
In one implementation, the first layer 110 that insulating layer can be included on first surface is adjusted.First layer
110 can by being formed as the dielectric substance of non-high-g value, such as, but not limited to, the oxide of silicon, the nitride of silicon or
Nitrogen oxides of silicon etc..
In some implementations, the second layer 109 that insulating layer can also be included on first layer 110 is adjusted.Second
Layer 109 can be formed by high-g value, preferably be formed by the high-g value comprising metallic element.The height for including metallic element
The example of k materials includes but is not limited to：Hafnium oxide (HfO), aluminium oxide (AlxOy), hafnium aluminum oxide (HfAlO) etc..By high k materials
The second layer that material is formed can be Chong Die at least part of the first surface 1039.
Although the high-g value (also referred to as high K medium) comprising metallic element has been enumerated here as suitable for adjusting insulation
The material of layer, it is to be understood that the present invention is not limited thereto, as long as used can be advantageously for adjusting the material of insulating layer
It adjusts the surface potential of substrate and/or improves surface state etc..In addition, when considering the material for adjusting insulating layer, also
It need to consider its manufacturing process with pixel unit (and other interlock circuits, component, element, device (if any) etc.)
Compatibility.It should also be noted that, " high-g value " is the essential term of related field, usually, refer to that dielectric constant is higher than
The medium of the dielectric constant of silica.Herein, term " high-g value " has the common meaning under related field.
Insulating layer is adjusted by being formed on described first surface in substrate or part thereof, it can be to the first surface
(in other words, to adjusting the interface between insulating layer and substrate (first part)) is adjusted, such as adjusts the table of substrate surface
Face potential and/or improvement surface state etc..Therefore, the movement of free charge is can be reduced, and substrate surface generation can be reduced
Free charge, so as to reduce dark current.
Pixel unit 100A can also include adjusting electrode layer 111.Electrode layer 111 is adjusted at least in the first surface
On described at least part, the adjusting insulating layer is inserted in described at least part of the first surface and the adjusting
Between electrode layer 111.Adjusting electrode layer 111 can be by appropriate conductive material (such as, the polysilicon of doping or metal etc.) shape
Into.Apply appropriate current potential (such as negative potential) by exchanging section electrode layer, can further reduce dark current.
In addition, as shown in Figure 1A, first part 103 can also be included in the third doped region under the first doped region 1031
1033.The conduction type of first doped region 1031 is identical with the conduction type of the third doped region 1033.In some realization sides
In formula, the first doped region 1031 can be such as N+ types, and third doped region 1033 may, for example, be N-type.
Pixel unit 100A can also be included in the gate structure on channel formation region 1051.As shown in Figure 1A, grid
Structure can include：Gate insulating layer 106 on the channel formation region 1051；On the gate insulating layer 106
Grid 108；And the spacer 107 for grid.Similarly, spacer 107 can include one or more layers, such as can be with
Isolated area 1073 including spacer 1071 and outside, as shown in Figure 1A.In addition, although spacer 107 is shown as here
On gate insulating layer 106 or insulating layer 121, however, the present invention is not limited thereto.
In some embodiments, first layer 110 and gate insulating layer 106 can utilize identical material and technique simultaneously
Or it does not simultaneously form.The present disclosure is not limited thereto, and in other embodiments, the two can be by different materials and different process shape
Into.
In example shown in figure 1A and 1B, grid 108 can include gate electrode 1081 and in gate electrode 1081 and grid
Buffer layer 1083 between pole insulating layer 109 and spacer 107.In such an example, gate electrode 1081 can be metal, example
Such as copper.It can not also there are the buffer layers in other examples, such as shown in Figure 2 B, in gate structure.For grid (or
Gate electrode) material can include such as metal, doping polysilicon.
In addition, Figure 1A also schematically shows pixel isolation 115, pixel well region 113 and SUB doped regions 117.Pixel
Isolation 115 can be used for a pixel (for example, red (R), green (G), blue (B) pixel) with one other pixel being isolated.Optionally,
Pixel well region can be provided, to provide the well region for the constituent element (for example, transistor) for being used to form pixel.It is alternatively possible to
SUB doped regions 117 are provided for for example, being connected to photodiode (one end) with reference to status (for example, ground).
Figure 1B shows the schematic sectional view of the pixel unit 100B according to the disclosure another embodiment.Pixel unit
The difference of 100B and pixel unit 100A shown in figure 1A essentially consists in adjusting insulating layer.Pixel unit 100B and pixel list
Component identical first 100A is labeled with identical reference numeral, above can be with regard to the explanation of the same parts of pixel unit 100A
The component of pixel unit 100B is equally applicable to, therefore here no longer to its repeated explanation.
As shown in Figure 1B, the first layer 110 that insulating layer can be included on first surface is adjusted.First layer 110 can be with
By being formed as the dielectric substance of non-high-g value, such as, but not limited to, the nitrogen of the oxide of silicon, the nitride of silicon or silicon
Oxide etc..Adjust the second layer 109 that insulating layer can also be included on first layer 110.The second layer 109 can be included in
Bottom part on one layer 110 and the sidewall sections upwardly extended in bottom part both sides from bottom part.
Pixel unit 100B can also include third insulating layer 119.Third insulating layer 119 can cover the surface of substrate.
Although in fig. ib, third insulating layer 119 is also depicted as a part for covering first surface, however the disclosure is not limited to
This.In the case where first layer 110 covers entire first surface, third insulating layer 119 can not be contacted with first surface.Third
Insulating layer 119 can include opening (see the 406 of Fig. 4 D).Third insulating layer 119 can include opening (see the 406 of Fig. 4 D).Root
According to different embodiments, opening 406 can expose the upper surface of dummy grid 403, and allow to remove dummy grid to expose the
One layer 110 at least part 4061 (see Fig. 4 D).The second layer (potential barrier insulating layer) 109 can be formed in the side wall of opening 406
In described at least part 4061 of the first layer.Potential barrier insulating layer 109 can be formed by the high-g value comprising metal.
Adjusting electrode layer 111 can be formed on the potential barrier insulating layer 109, to fill the opening, as shown in Fig. 2 B and 4G.
The spacer 107 for being located at open outer side can also be included by adjusting insulating layer.In one example, spacer 107 can
With the side wall spacer 1073 for including offset spacer 1071 He being disposed offset from the outside of spacer.According to different embodiments, first
Layer 110 can be included in the part under spacer 107.The spacer associatedly set with insulation sides 110 or insulating layer 109 can be with
It is referred to as pseudo- spacer.In the embodiments illustrated in the figures, third insulating film 119 is arranged on the outside of pseudo- spacer.Insulating film 119
It can be formed on a surface of the substrate.It in certain embodiments, can be with being isolated for dummy grid for the spacer of grid
Object is folded.
The schematic sectional view of the pixel unit according to the disclosure another embodiment is shown respectively in Fig. 2A and 2B.
The difference lies in mix by pixel unit 100B shown in the structure and Figure 1B of pixel unit 200A shown in Fig. 2A
The configuration in miscellaneous area.Component identical with pixel unit 100A and 100B pixel unit 200A is labeled with identical reference numeral,
The explanation with regard to the same parts of pixel unit 100A and 100B can be equally applicable to the component of pixel unit 200A above, therefore
Here no longer to its repeated explanation.
As shown in Figure 2 A, first part 103 can include the first doped region 1031.First part 103 is in the table of substrate 101
There is first surface 1039 (for example, seeing Fig. 4 A) at face.In a specific example, the conduction type of substrate can be led for first
Electric type (for example, p-type), and the conduction type of the first doped region can be the conduction type (example opposite with the first conduction type
Such as, N-type)；Embodiment of the disclosure is without being limited thereto.
As shown in Figure 2 A, first part 103 can also include：Third doped region under the first doped region 1031
1033 and the 4th doped region 1035 on the first doped region 1031.The conduction type of first doped region and the third
The conduction type of doped region is identical, but opposite with the conduction type of the 4th doped region.It will be understood by those skilled in the art that described
Three doped regions can form photodiode (PD, also referred to as depth PD) with the substrate residing for it or well region.Preferably, the first doping
Area and third doped region are adjacent to each other.And first doped region and the 4th doped region can also form photodiode
(also referred to as pinned photodiode (PPD).Substrate (for example, silicon substrate) surface and PD can be carried out by providing the 4th doped region
Isolation the defects of so as to reduce substrate surface and the influence of surface state etc., reduces dark current.
In some implementations, first part 103 can also include the 5th doped region 1037.5th doped region 1037
On the first doped region 1031, and between the 4th doped region 1035 and channel formation region 1051.5th doped region 1037 with
The 4th doped region conduction type is identical, but doping concentration can be different.
Here conveniently mention, since PD (or knot of PD) is often arranged to (be with or without PPD far from substrate surface
In the case of can be so), therefore in the art, often schematically PD can be shown as to leave substrate surface, such as
Shown in Fig. 2 B.In addition, in the art, often schematically it can indicate the second doped region 1052 with FD and its formed
Diode, also as shown in Figure 2 B.Such simple schematic diagram can't influence those skilled in the art to disclosed in such figure
Technology understanding.
Fig. 2 B schematically show the simple sectional view of the pixel unit 200B according to the disclosure another embodiment.Pixel
Structure formed in the substrate of unit 200B can be formed in the substrate with pixel unit 100A, 100B or 200A structure
It is essentially identical；Therefore, their description is omitted here, and in order to the letter of diagram will be clear that only schematically illustrate PD therein and
FD。
In the embodiment shown in Fig. 2 B, insulating layer is included on the surface (first surface) of first part the is adjusted
One layer 110.First layer 110 can be formed by the dielectric substance of non-high-g value.In one embodiment, insulating layer is adjusted also
The high-k material layer formed on the first layer can be included in, the high-g value includes metallic element.In some realization sides
In formula, first layer 110 can cover the surface of substrate and the surface of gate structure.In the example shown in Fig. 2 B, first layer 110
It is flattened so that expose at the top of grid 108.
Pixel unit 200B is additionally included in the insulating layer 119 of substrate.It could be formed with opening in insulating layer 119
(see the 600 of Fig. 6 B).Opening 600 can expose at least part 6001 of first surface 1039 (see Fig. 6 B).Adjust insulating layer
Can include first layer 110 and with potential barrier insulating layer 109.The side wall and described the of opening 600 can be formed in by adjusting insulating layer
In at least part 6001 on one surface.In other words, as shown in Figure 2 B, first layer 110 can have described the
Bottom part on at least part 6001 on one surface and the sidewall sections upwardly extended from the bottom part.
The second layer 109 can have the bottom part abutted with the bottom part of first layer 110 and be upwardly extended from the bottom part
Sidewall sections.Potential barrier insulating layer 109 can be formed by the high-g value comprising metal.It adjusts electrode layer 111 and is formed in the gesture
It builds on insulating layer, to fill the opening.
Compared with the pixel unit shown in Figure 1B and Fig. 2A, pixel unit 200B does not include position as figs. ib and fig. 2 a
In the spacer 107 of open outer side.
The gate structure for including grid 108 is also shown in Fig. 2 B.The gate structure in Figure 1A, 1B and 2A is retouched above
The content stated can be equally applicable to this.
Fig. 3 shows the example flow diagram of the manufacturing method of the pixel unit according to an embodiment of the present disclosure.Fig. 4 A to 4G
The schematic sectional view of pixel unit corresponding with the part steps of method shown in Fig. 3 is shown.With reference to Fig. 3 and Fig. 4 A extremely
4G is illustrated.
As shown in figure 3, in step S310, substrate 101 is provided.Substrate 101 can include forming transistor wherein
Raceway groove channel formation region 1051 and first area 103 for forming photoelectric device wherein, as shown in Figure 4 A.
In step S320, gate structure and dummy gate structure are formed on the substrate 101, as shown in Figure 4 B.The grid knot
Structure can be included in the first insulating layer 106 on channel formation region 1051 and the grid 108 on the first insulating layer.Institute
State second insulating layer 401 on at least part for the upper surface that dummy gate structure can be included in first area 103 and
Dummy grid 403 on second insulating layer.Here, dummy grid 403 can be formed by being such as, but not limited to polysilicon.The grid
Pole structure further includes the first spacer 107 for the grid, and the dummy gate structure is further included for the dummy grid
Second spacer 107.Second spacer is in the outside of the opening, as shown in Figure 4 B.
Various doped regions as shown in Figure 1A and 1B etc. are also shown in Fig. 4 B.The person skilled in the art will easily understand,
Some in these doped regions can be formed, such as well region 113, pixel isolation before gate structure and dummy gate structure is formed
115 etc..Other in these doped regions can be formed after gate structure and dummy gate structure is formed, for example, first mixes
Miscellaneous area 1031, the second doped region 1052, third doped region 1033, SUB doped regions 117 etc..The present disclosure is not limited thereto.Due to being formed
These doped regions are not that the present invention is of interest, therefore is no longer further inquired into regard to the details of technology here.This field
Technical staff can be readily appreciated that based on disclosure herein using known to being suitble to or the technology or technique of following exploitation
To form these doped regions.
Fig. 3 is returned to, in step S330, forms third insulating layer 119 on substrate.The third insulating layer can be configured
It is at least to expose the upper surface of the dummy grid.Here, third insulating layer 119 is configured such that the grid 108 and institute
The upper surface for stating dummy grid 403 is exposed, as shown in Figure 4 C.
In step S340, the dummy grid 403 is removed, to form at least one that exposes the second insulating layer 401 under it
Divide 4061 opening 406.It in the specific implementation, can be in third insulating layer 119 and gate structure and dummy gate structure at one
Exposing surface on form patterned mask (for example, hard mask or photoresist (PR)) 405, as shown in Figure 4 D；
And be etched, to remove dummy grid 403, so as to form the opening 406.Later, mask can be removed；It is alternatively, suitable
When, mask (such as hard mask) can also be retained.
In step S350, optionally, high-k material layer 407 is formed.The high-k material layer at least covers the opening 406
Described at least part 4061 of side wall and the second insulating layer 401, as shown in Figure 4 E.High-k material layer 407 can be by wrapping
High-g value containing metallic element is formed.
Preferably, the technological process depending on manufacture pixel unit, can be set the forming step of high-k material layer 407
It before high-temperature step, such as is arranged on before the annealing steps for activator impurity, to avoid the metallic element in high-g value
Diffusion.In some cases, it is contemplated that pixel unit and necessary logic unit, it can for the annealing steps of activator impurity
It can be carried out under about 1000 degrees Celsius or higher temperature.It should be understood that it is restricted that this, which is not,.For example, using quick
In the case of thermal annealing (RTA), the diffusion of the metallic element in high-g value may be acceptable.
In some implementations, method can also include step S360, in this step, the shape in high-k material layer 407
Into conductive material 409, to fill the opening 406, as illustrated in figure 4f.
In addition, method can also include step S370, in this step, planarization process is carried out, so that in described
The high-k material layer and conductive material in opening are retained, as shown in Figure 4 G.Retain the high k materials in said opening
The bed of material and conductive material form aforementioned potential barrier insulating layer 109 and adjust electrode layer 111.
In one implementation, the method can also include：It is formed before third insulating layer 119 on substrate,
The first doped region 1031 is formed in first area 103.First doped region 1031 is adjacent with channel formation region 1051, but conduction type
On the contrary.
In one implementation, the method can also include：It is formed before third insulating layer 119 on substrate,
The second doped region 1052 is formed in substrate 101.Second doped region 1052 is adjacent with channel formation region 1051, but conduction type phase
Instead.
In one implementation, the method can also include：It is formed before third insulating layer 119 on substrate,
Third doped region 1033 is formed in first area 103.Third doped region is under the first doped region, conduction type and the first doping
Area is identical.
In one implementation, the gate structure further includes the first spacer 107 for the grid, the puppet
Gate structure further includes the second spacer 107 for the dummy grid.Second spacer is in the outside of the opening, such as
Shown in Fig. 4 D.
Fig. 5 shows the example flow diagram of the manufacturing method of the pixel unit according to the disclosure another embodiment.Fig. 6 A are extremely
6E schematically shows the simple sectional view (letter with Fig. 2 B of pixel unit corresponding with the part steps of method shown in fig. 5
Slightly sectional view is similar).It is illustrated with reference to Fig. 5 and Fig. 6 A to 6E.
As shown in figure 5, in step S510, substrate 101 is provided.As shown in Figure 6A, substrate 101 can be included for phototube
The first part of part (for example, PD) and for the second part of the transistor coupled with photoelectric device.In Fig. 6 A in Fig. 2 B
Similarly illustrate the simple sectional view of substrate 101.Similarly, the embodiment shown in Figure 1A, 1B and 2A and other implementations
Similar structures or layout in example in substrate may be suitable for this.Fig. 6 A also schematically show optional 4th doped region
1035。
It will be understood, therefore, that although being not explicitly shown in Fig. 6 A-6E, go out as shown in the aforementioned drawings and illustrate, it can be with
Obtain the following contents.For example, first part can have first surface at substrate surface.First part can mix including first
Miscellaneous area.Second part can include：Channel formation region, the conduction type of channel formation region and first adjacent with the first doped region
The conduction type of doped region is on the contrary, and second doped region adjacent with channel formation region.
The substrate can also be included in the gate structure on channel formation region, as shown in Figure 6A.According to some implementations
Example, the gate structure can be included in the first insulating layer 106 on channel formation region 1051 and the first insulating layer it
On grid 108.The gate structure can also include the spacer for grid.
In step S520, patterned third insulating layer 119 is formed on substrate, and the third insulating layer has so that institute
The opening 600 that described at least part 6001 of the upper surface of first area is exposed is stated, as shown in Figure 6B.That is, third
Insulating layer 119 is in the outside of opening 600.
In step S530, formed and adjust insulating layer 601.The side for adjusting insulating layer 601 and at least covering the opening 600
Described at least part 6001 of the upper surface of wall and the first area, as shown in Figure 6 C.In some implementations, it adjusts
Saving insulating layer 601 can be by including one or more layers insulating materials.For example, adjusting insulating layer 601 can include by non-high-g value
The layer that is formed of insulating materials and the layer that is formed by the high-g value comprising metallic element.It is described in the example shown in Fig. 6 C
Adjust the upper surface that insulating layer 601 also covers the exposing of third insulating layer 119 and gate structure.
In some implementations, method can also include step S540, in this step, on insulating layer 601 is adjusted
Conductive material 605 is formed, to fill the opening 600, as shown in Figure 6 D.
In addition, method can also include step S550, in this step, planarization process is carried out, so that in described
The adjusting insulating layer and conductive material in opening are retained, as illustrated in fig. 6e.Retain the adjusting in said opening
Insulating layer and conductive material form aforementioned potential barrier insulating layer 109 and adjust electrode layer 111.
In some implementations, the first part can also be included in the third doped region under the first doped region,
Wherein, the conduction type of first doped region is identical with the conduction type of the third doped region.
In some implementations, the method can also include：In the first part, the 4th doped region is formed,
4th doped region is on the first doped region.The conduction type of first doped region can be with the 4th doped region
Conduction type is opposite.
In some implementations, the method can also include：The 5th doped region is formed in the first part.Institute
Stating the 5th doped region can be located on first doped region and between the 4th doped region and the channel formation region.
5th doped region is identical with the 4th doped region conduction type, but doping concentration can be different.
Fig. 7 A-7D show the part steps of the manufacturing method of the pixel unit according to one variant embodiment of the disclosure
The simple sectional view of corresponding pixel unit.
As shown in Figure 7 A, substrate 101 is provided.Structure shown in Fig. 7 A can be as shown in Fig. 6 A, therefore here
Its detailed description is omitted.
Then, as shown in Figure 7 B, patterned third insulating layer 119 is formed on substrate.The third insulating layer has
So that the opening 600 that described at least part 6001 of the upper surface of the first area is exposed.
Later, as seen in figure 7 c, it is formed and adjusts insulating layer 601.Adjust the upper table that insulating layer 601 covers the first area
At least part 6001 in face.In some implementations, adjusting insulating layer 601 can be by the oxide shape of such as silicon
Into, such as can be formed for example, by any appropriate technique such as thermal oxide.
Later, as illustrated in fig. 7d, conductive material 605 is formed on insulating layer 601 is adjusted, to fill the opening 600.
Similarly, method can also include carrying out planarization process, so that the adjusting in the opening is exhausted
Edge layer and conductive material are retained.
It above can similarly or suitably with regard to the described contents of Fig. 6 A to 6E (including material, technique, step etc.)
Applied to this, therefore it is omitted here to its repeated explanation.
Fig. 8 A-8F show the part steps of the manufacturing method of the pixel unit according to the another variant embodiment of the disclosure
The simple sectional view of corresponding pixel unit.
As shown in Figure 8 A, substrate 101 is provided.Structure shown in Fig. 8 A can be as shown in Fig. 6 A, therefore here
Its detailed description is omitted.
Then, as shown in Figure 8 B, patterned third insulating layer 119 is formed on substrate.The third insulating layer has
So that the opening 600 that described at least part 6001 of the upper surface of the first area is exposed.
Later, as shown in Figure 8 C, the first insulating layer 601 is formed.First insulating layer 601 covers the upper table of the first area
At least part 6001 in face.In some implementations, the first insulating layer 601 can be by the oxide shape of such as silicon
Into, such as can be formed for example, by any appropriate technique such as thermal oxide.
Later, as in fig. 8d, second insulating layer 603 is formed.Second insulating layer 603 can be by the height comprising metallic element
K materials are formed.Second insulating layer 603 can be formed for example, by techniques such as PVD or sputterings.Second insulating layer 603 can be by shape
As on the surface not covered by the first insulating layer at least covering the first insulating layer 601 and opening 600.Second insulating layer 603
Can have the bottom part abutted with the first insulating layer 601 and the sidewall sections upwardly extended from bottom part.Such as Fig. 8 D
Shown, second insulating layer 603 can be with the upper surface of structure shown in coverage diagram 8C.
Later, as illustrated in fig. 8e, conductive material 605 is formed in second insulating layer 603, to fill the opening 600.This
In, the first insulating layer 601 and second insulating layer 603 can collectively form adjusting insulating layer.
Similarly, method can also include carrying out planarization process, so that the adjusting in the opening is exhausted
Edge layer and conductive material are retained.
It above can be similary (including material, technique, step etc.) with regard to Fig. 6 A to the described contents of 6E and Fig. 7 A-7D
Ground is adaptively applied to this, therefore be omitted here to its repeated explanation.
Fig. 9 A to 9H show the corresponding pixel unit of part steps of the manufacturing method according to the disclosure another embodiment
Schematic sectional view.
As shown in Figure 9 A, substrate 101 is provided.Substrate 101 can be included for the ditch of the raceway groove of formation transistor wherein
Road formation area 1051 and the first area 103 for forming photoelectric device wherein.First area 103 can be mixed including first
Miscellaneous area 1031 and third doped region 1033.Substrate 101 can also include well region 113, pixel isolation 115 etc..
Then, as shown in Figure 9 B, gate structure and dummy gate structure are formed on the substrate 101.The gate structure can be with
It is included in the first insulating layer 106 on channel formation region 1051 and the grid 108 on the first insulating layer.The puppet grid
Pole structure can be included in second insulating layer 401 at least part of the upper surface of first area 103 and second
Dummy grid 403 on insulating layer 401.Here, dummy grid 403 can be formed by being such as, but not limited to polysilicon.The grid
Structure further includes the first spacer 107 for the grid, and the dummy gate structure is further included for the of the dummy grid
Two spacers 107.Second spacer is in the outside of the opening, as shown in Figure 9 B.
Later, as shown in Figure 9 C, it can be injected, it is for example one or more of following to be formed：Second doped region
1052nd, the 4th doped region 1035, the 5th doped region 1037, SUB doped regions 117 etc..However, the present disclosure is not limited thereto.At other
Realization method in, these doped regions can be formed in different steps.
Later, patterned third insulating layer 119 can be formed on substrate.The third insulating layer can be configured as
At least expose the upper surface of the dummy grid.Here, third insulating layer 119, which can have, causes the upper of the dummy grid 403
The opening that surface is exposed, as shown in fig. 9d.
Later, the dummy grid 403 is removed, to form the opening of at least part 4061 for exposing the second insulating layer
406, as shown in fig. 9e.At one in the specific implementation, dummy grid 403 can be removed using dry method or wet etching, so as to
Form the opening 406.
Later, high-k material layer 407 is formed.The high-k material layer 407 at least covers side wall and the institute of the opening 406
Described at least part 4061 of the upper surface of first area is stated, as shown in fig. 9f.High-k material layer 407 can be by including metal
The high-g value of element is formed.
In some implementations, method can also include：Conductive material 409 is formed in high-k material layer 407, to fill out
The opening 406 is filled, as shown in fig. 9g.
In addition, method can also include：Planarization process is carried out, so that the high k materials in the opening 406
The bed of material and conductive material are retained, as shown in Fig. 9 H.The high-k material layer and conductive material retained in said opening is formed
Aforementioned potential barrier insulating layer 109 and adjust electrode layer 111.
In one implementation, the gate structure further includes the first spacer 107 for the grid, the puppet
Gate structure further includes the second spacer 107 for the dummy grid.Second spacer is in the outside of the opening, such as
Shown in Fig. 7 B-7D.
In one implementation, the method can also include：It is formed before third insulating layer 119 on substrate,
Third doped region 1033 and the 4th doped region 1035 are formed in first area 103.Third doped region can the first doped region it
Under, and the 4th doped region can be on the first doped region.The conduction type of first doped region can be led with third doped region
Electric type is identical, but opposite with the conduction type of the 4th doped region.Third doped region can be with the substrate residing for it or well region shape
Into photodiode.First doped region and the 4th doped region can form photodiode.
In one implementation, the method can also include：It is formed before third insulating layer 119 on substrate,
The 5th doped region 103 is formed in the first area 103, the 5th doped region is on first doped region and described
Between 4th doped region and the channel formation region.5th doped region is identical with the 4th doped region conduction type, but
Doping concentration can be different.
It should also be understood that the disclosure be contemplated that it is following.
A kind of 1. pixel unit of project, including：Substrate, including be used for photoelectric device first part and for the light
The second part of the transistor of electrical part coupling, wherein the first part has first surface at the substrate surface, and
And the first part includes the first doped region；The second part includes：Channel formation region, with the first doped region phase
Neighbour, the conduction type of the conduction type of the channel formation region and first doped region on the contrary, and with channel formation region phase
The second adjacent doped region；Cover in the substrate and at least at least part of adjusting insulating layer of the first surface；
And the adjusting electrode layer at least on described at least part of the first surface, the adjusting insulating layer are inserted in two
Between person.
Pixel unit of the project 2. as described in project 1, wherein the adjusting insulating layer includes：On the first surface
First layer, the first layer formed by the dielectric substance of non-high-g value；And the second layer on the first layer,
The second insulating layer is formed by the high-g value comprising metallic element.
Pixel unit of the project 3. as described in project 1 or 2, wherein the first part further includes：The first doped region it
Under third doped region, wherein, the conduction type of first doped region is identical with the conduction type of the third doped region.
Pixel unit of the project 4. as described in project 1 or 2, wherein the first part further includes：The first doped region it
Under third doped region and the 4th doped region on the first doped region, wherein, the conduction type of first doped region
It is identical with the conduction type of the third doped region but opposite with the conduction type of the 4th doped region.
Pixel unit of the project 5. as described in project 4, the first part further include：5th doped region, described first
On doped region and between the 4th doped region and the channel formation region, wherein the 5th doped region and the described 4th
Doped region conduction type is identical.
Pixel unit of the project 6. as described in project 2, further includes：Opening, the opening expose the institute of the first surface
At least part is stated, wherein the first layer is formed in the side wall of the opening and described at least part of the first surface
On；The second layer is formed on the first layer；And wherein, the adjusting electrode layer is formed on the second layer,
To fill the opening.
Pixel unit of the project 7. as described in project 2, further includes：Opening, the opening expose the first layer at least
A part, wherein the second layer is formed on the side wall of the opening and described at least part of the first layer；And
Wherein, the adjusting electrode layer is formed on the second layer, to fill the opening.
Pixel unit of the project 8. as described in project 6 or 7, further includes：In the third insulating film of the open outer side；Or
In the spacer in the outside of the opening and the third insulating film on the outside of the spacer.
Pixel unit of the project 9. as described in project 1, wherein the pixel unit is additionally included on channel formation region
Gate structure, the gate structure include：Gate insulating layer on the channel forming layer, the gate insulating layer it
On grid and the spacer for grid.
Pixel unit of the project 10. as described in project 1, wherein：Source electrode of first doped region as the transistor
One in area and drain region, and second doped region is as another in the source area and drain region of the transistor
It is a.
11. a kind of imaging device of project, including the pixel unit as described in any one of project 1-10.
A kind of method for manufacturing pixel unit of project 12., including：Substrate is provided, the substrate is included for shape wherein
First area into the channel formation region of the raceway groove of transistor and for forming photoelectric device wherein；Shape over the substrate
Into gate structure and dummy gate structure, the gate structure be included in the first insulating layer on the channel formation region and
Grid on first insulating layer, the dummy gate structure are included at least part of the upper surface of the first area
On second insulating layer and the dummy grid on the second insulating layer；Third insulating layer is formed on substrate, it is described
Third insulating layer is at least so that the upper surface of the dummy grid is exposed；The dummy grid is removed, exposes described second absolutely to be formed
At least part of opening of edge layer；And conductive material layer is formed, to fill the opening.
Method of the project 13. as described in project 12, further includes：High-k material layer is formed, the high-k material layer at least covers
Described at least part of the side wall of the opening and the second insulating layer, wherein the conductive material layer be formed in it is described
On high-k material layer.
Method of the project 14. as described in project 12, further includes：It is formed before third insulating layer on substrate, described the
The first doped region is formed in one region, wherein, first doped region is adjacent with the channel formation region, but conduction type phase
Instead.
Method of the project 15. as described in project 12, further includes：It is formed before third insulating layer on substrate, in the lining
The second doped region is formed in bottom, wherein, second doped region is adjacent with the channel formation region, but conduction type is opposite.
Method of the project 16. as described in project 12, further includes：It is formed before third insulating layer on substrate, described the
Third doped region is formed in one region, wherein, the third doped region is under first doped region, conduction type and first
Doped region is identical.
Method of the project 17. as described in project 12, further includes：It is formed before third insulating layer on substrate, described the
Third doped region and the 4th doped region are formed in one region, wherein, third doped region is under the first doped region, and the 4th doping
Area on the first doped region, wherein, the conduction type of the conduction type of first doped region and the third doped region
It is identical but opposite with the conduction type of the 4th doped region.
Method of the project 18. as described in project 17, further includes：It is formed before third insulating layer on substrate, described the
Form the 5th doped region in one region, the 5th doped region on first doped region and in the 4th doped region and
Between the channel formation region, wherein, the 5th doped region is identical with the 4th doped region conduction type.
Such as 12 the method for project of project 19., further includes：Planarization process is carried out, so that in the opening
The high-k material layer and conductive material layer are retained.
Method of the project 20. as described in project 12, wherein the gate structure further include for the grid first every
From object, the dummy gate structure further includes the second spacer for the dummy grid, and wherein described second spacer exists
The outside of the opening.
Method of the project 21. as described in project 12, wherein：First doped region as the transistor source area and
One in drain region, and second doped region is as another in the source area and drain region of the transistor.
A kind of method for manufacturing pixel unit of project 22., including：Substrate is provided, the substrate includes：For photoelectric device
First part, wherein the first part has first surface at the substrate surface, and the first part includes
First doped region；Second part for the transistor coupled with the photoelectric device, the second part include：Raceway groove is formed
Area, the conduction type phase of the conduction type of the channel formation region and first doped region adjacent with first doped region
Instead and second doped region adjacent with channel formation region；And the gate structure on the channel formation region；And
Third insulating layer is formed on substrate, the third insulating layer has at least part dew so that the upper surface of the first area
The opening gone out；Formed adjust insulating layer, it is described adjust insulation at least cover layer by layer the first area upper surface it is described to
A few part；And conductive material layer is formed on the adjusting insulating layer, to fill the opening.
Method of the project 23. as described in project 22 forms the adjusting insulating layer and includes：Upper table in the first area
First layer is formed on at least part in face, the first layer is formed by the dielectric substance of non-high-g value；And
Form the second layer on the first layer, the second layer covers not covered by the first layer for the first layer and the opening
The side surface of lid, the second layer are formed by the high-g value comprising metallic element.
Method of the project 24. as described in project 22 forms the adjusting insulating layer and includes：Formation first layer, described first
Layer at least covers described at least part of the side wall of the opening and the upper surface of the first area, and the first layer is by non-
The dielectric substance of high-g value is formed；And the second layer is formed on the first layer, the second layer is by including metal member
The high-g value of element is formed.
Method of the project 25. as described in project 23 and 24, further includes：Planarization process is carried out, so that being opened in described
The second layer and conductive material layer in mouthful are retained.
Method of the project 26. as described in project 22, wherein：The first part is additionally included under the first doped region
Three doped regions, the conduction type of first doped region are identical with the conduction type of the third doped region.
Method of the project 27. as described in project 26, further includes：In the first part, the 4th doped region is formed, it is described
4th doped region on the first doped region, wherein, the conduction type of first doped region and leading for the 4th doped region
Electric type is on the contrary, and wherein, first doped region and the 4th doped region form photodiode.
Pixel unit of the project 28. as described in project 27, further includes：The 5th doped region is formed in the first part,
5th doped region on first doped region and between the 4th doped region and the channel formation region, wherein
5th doped region is identical with the 4th doped region conduction type.
Method of the project 29. as described in project 22, wherein the gate structure further include for the grid first every
From object, the dummy gate structure further includes the second spacer for the dummy grid, and wherein described second spacer exists
The outside of the opening.
Method of the project 30. as described in project 22, wherein：First doped region as the transistor source area and
One in drain region, and second doped region is as another in the source area and drain region of the transistor.
It should be appreciated by those skilled in the art that in the above-described embodiments description operation (or step) between boundary only
It is illustrative.Multiple operations can be combined into single operation, and single operation can be distributed in additional operation, and is operated
It can at least partially overlappingly perform in time.Moreover, alternative embodiment can include multiple examples of specific operation, and
And operation order can be changed in other various embodiments.But others are changed, variations and alternatives are equally possible.
Therefore, the specification and drawings should be counted as illustrative and not restrictive.
Although some specific embodiments of the disclosure are described in detail by example, the skill of this field
Art personnel it should be understood that above example merely to illustrating rather than in order to limit the scope of the present disclosure.It is disclosed herein
Each embodiment can in any combination, without departing from spirit and scope of the present disclosure.It is to be appreciated by one skilled in the art that can be with
A variety of modifications are carried out to embodiment without departing from the scope and spirit of the disclosure.The scope of the present disclosure is limited by appended claims
It is fixed.
Claims (10)
1. a kind of pixel unit, which is characterized in that including：
Substrate, including being used for the first part of photoelectric device and for coupled with the photoelectric device the second of transistor
Point, wherein
The first part has first surface at the substrate surface, and the first part includes the first doped region；
The second part includes：
Channel formation region, the conduction type of the channel formation region and first doped region adjacent with first doped region
Conduction type on the contrary, and
Second doped region adjacent with channel formation region；
Cover in the substrate and at least at least part of adjusting insulating layer of the first surface；And
Adjusting electrode layer at least on described at least part of the first surface, the adjusting insulating layer are inserted in two
Between person.
2. pixel unit as described in claim 1, which is characterized in that wherein described adjusting insulating layer includes：
First layer on the first surface, the first layer are formed by the dielectric substance of non-high-g value；And
The second layer on the first layer, the second insulating layer are formed by the high-g value comprising metallic element.
3. pixel unit as claimed in claim 1 or 2, which is characterized in that wherein described first part further includes：
Third doped region under the first doped region,
Wherein, the conduction type of first doped region is identical with the conduction type of the third doped region.
4. pixel unit as claimed in claim 1 or 2, which is characterized in that wherein described first part further includes：
Third doped region under the first doped region and
The 4th doped region on the first doped region,
Wherein, the conduction type of first doped region is identical with the conduction type of the third doped region, but is adulterated with the 4th
The conduction type in area is opposite.
5. pixel unit as claimed in claim 4, which is characterized in that the first part further includes：
5th doped region, on first doped region and between the 4th doped region and the channel formation region,
Wherein described 5th doped region is identical with the 4th doped region conduction type.
6. pixel unit as claimed in claim 2, which is characterized in that further include：Opening, the opening expose first table
At least part in face, wherein
The first layer is formed on the side wall of the opening and described at least part of the first surface；
The second layer is formed on the first layer；And
Wherein, the adjusting electrode layer is formed on the second layer, to fill the opening.
7. pixel unit as claimed in claim 2, which is characterized in that further include：
Opening, the opening expose at least part of the first layer, wherein
The second layer is formed on the side wall of the opening and described at least part of the first layer；And
Wherein, the adjusting electrode layer is formed on the second layer, to fill the opening.
8. pixel unit as claimed in claims 6 or 7, which is characterized in that further include：
In the third insulating film of the open outer side；Or
In the spacer in the outside of the opening and the third insulating film on the outside of the spacer.
9. pixel unit as described in claim 1, which is characterized in that wherein described pixel unit is additionally included in channel formation region
On gate structure, the gate structure includes：
Gate insulating layer on the channel forming layer,
Grid on the gate insulating layer and
For the spacer of grid.
10. pixel unit as described in claim 1, which is characterized in that wherein：
First doped region as one in the source area and drain region of the transistor, and
Second doped region is as another in the source area and drain region of the transistor.
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| CN201711283968X | 2017-12-07 | ||
| CN201711283968 | 2017-12-07 |
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| CN108257996A true CN108257996A (en) | 2018-07-06 |
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Cited By (1)
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