CN108254946A - Display device and its manufacturing method and manufacturing device - Google Patents
Display device and its manufacturing method and manufacturing device Download PDFInfo
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- CN108254946A CN108254946A CN201710887131.XA CN201710887131A CN108254946A CN 108254946 A CN108254946 A CN 108254946A CN 201710887131 A CN201710887131 A CN 201710887131A CN 108254946 A CN108254946 A CN 108254946A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1306—Details
- G02F1/1309—Repairing; Testing
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133519—Overcoatings
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133302—Rigid substrates, e.g. inorganic substrates
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- Crystallography & Structural Chemistry (AREA)
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- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
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- Laser Beam Processing (AREA)
- Optical Filters (AREA)
Abstract
The display device that a kind of reduction that can inhibit the display quality caused by fleck defect is provided and its manufacturing method and manufacturing device of the invention.Display device (LCD) has：1st glass substrate (SUB1), 2nd glass substrate (SUB2) opposed with the 1st glass substrate and positioned at display surface side, in the inside of at least one of the 1st glass substrate and the 2nd glass substrate, with the dim light portion (1) that fleck defect portion (133) is covered from display surface side, from display surface side, dim light portion is in an end (B) in dim light portion, transmitance with the visible ray linear through portion (7) higher than other regions (1g) in dim light portion, dim light portion is in the section of the thickness direction orthogonal with the long side direction of linear through portion, it is multiple dyed layers (2 1, 2 2) continuous and bending broken line shapes, and, through portion is located at the bent end (47) of broken line.
Description
Technical field
The present invention relates to display device and its manufacturing methods and manufacturing device.
Background technology
Among various display devices, such as liquid crystal display device between pixel electrode and common electrode by will generate
Electric field is applied to makes liquid crystal drive by the liquid crystal layer of a pair of of substrate clamping, so as to adjust pixel electrode and common electrode is penetrated
Between the amount of light in region perform image display.
In the past, such as in liquid crystal display device, it is known that so-called higher than desirable brightness of the display brightness of pixel
Fleck defect (also referred to as picture element flaw.) the problem of.Fleck defect for example due in the manufacturing process of liquid crystal display device,
Foreign matter is mixed between a pair of of substrate, since the foreign matter causes the orientation multilated of liquid crystal or pixel electrode to use electric pole short circuit together
And it generates.
Such as the method for correcting fleck defect is disclosed in patent document 1.In the method for patent document 1, to glass base
Intralamellar part irradiates laser, forms the dyed layer of planar so that the region of covering generation fleck defect, makes bright spot in dyed layer
Light transit dose reduce.
Citation
Patent document
Patent document 1：JP Tetsukai 2015-175857 bulletins
But in the prior art, exist and become by the Surface scan of laser come final scanner section when forming dyed layer
It is thin, light leakage is generated, bad based on fleck defect cannot be by abundant modified situation.
Invention content
The present invention in view of the actual conditions and propose, a kind of display product that can inhibit caused by fleck defect are provided
The display device and its manufacturing method and manufacturing device of the reduction of matter.
In order to realize the purpose, the display device involved by one embodiment of the present invention has：
1st glass substrate；With
2nd glass substrate, it is opposed with the 1st glass substrate and positioned at display surface side,
The display device is in the inside of at least one of the 1st glass substrate and the 2nd glass substrate, tool
There is from the display surface side and cover the dim light portion in fleck defect portion,
From the display surface side, the dim light portion is in an end in the dim light portion, the transmission with visible ray
The rate linear through portion higher than other regions in the dim light portion,
The dim light portion is multiple in the section of the orthogonal thickness direction of the long side direction of the through portion with the threadiness
Dyed layer is continuous and the broken line shape of bending, also, the through portion is located at the bent end of the broken line.
In order to realize the purpose, it is described aobvious in the manufacturing method of the display device involved by other manner of the invention
Showing device has：1st glass substrate and the 2nd glass substrate opposed with the 1st glass substrate and positioned at display surface side,
The manufacturing method of the display device includes：
To the 1st glass substrate or the 2nd glass substrate irradiation laser so that covering fleck defect portion, makes laser
It is condensed to the process of the inside of at least one of the 1st glass substrate and the 2nd glass substrate；
By the way that the laser is made to be relatively moved with the display device, thus from the display surface side, by covering
The 1st layer of dyed layer for stating the dim light portion in fleck defect portion is formed as the work of planar from scanning starting position to scan end position
Sequence；With
Next, by the way that the laser is made to be relatively moved with the display device, thus from the display surface side,
Start to scan using the scan end position of the 1st layer of dyed layer as scanning starting position, to scan end position
Until the 2nd layer of dyed layer in the dim light portion be formed as into planar, the 1st layer of dyed layer and the 2nd layer of dyed layer are from institute
Display surface side observation is stated to be overlappingly configured as the 1st layer of dyed layer described in the section of the thickness direction in the 2nd glass substrate
Continuous and bending broken line shape is formed with the 2nd layer of dyed layer, so as to form the process in the dim light portion,
The wavelength of the illuminated laser is more than 100nm and 10 μm hereinafter, arteries and veins in the process for irradiating the laser
Rush width be more than 1 femtosecond and 100 picoseconds hereinafter, pulse energy be more than 0.1 μ J and 1mJ hereinafter, also, by NA be 0.1 with
It is upper and less than 0.95 lens light gathering.
In order to realize the purpose, the manufacturing device of the display device involved by another way of the invention, manufacture are aobvious
Showing device, the display device have：1st glass substrate and opposed with the 1st glass substrate and positioned at display surface side
2nd glass substrate,
The manufacturing device of the display device has：
Laser irradiation device, to the 1st glass substrate or the 2nd glass substrate irradiation laser so that covering
Fleck defect portion；
Lens make from the laser focusing that the laser irradiation device irradiates to the 1st glass substrate and described
The inside of at least one of the 2nd glass substrate；
Display device holding meanss keep the display device；With
Driving device, by making the laser from the laser irradiation device with keeping filling by the display device
The display device relative movement kept is put, so as to which from the display surface side, the fleck defect portion will be covered
The 1st layer of dyed layer in dim light portion is formed as planar from scanning starting position to scan end position, next, described by making
Laser is relatively moved with the display device, thus from the display surface side, it will be described in described 1st layer of dyed layer
Scan end position starts to scan as scanning starting position, by the 2nd layer of the dim light portion until scan end position
Dyed layer is formed as planar, and the 1st layer of dyed layer and the 2nd layer of dyed layer are from the display surface side by overlappingly
The 1st layer of dyed layer described in the section in the thickness direction of the 2nd glass substrate is configured to be formed with the 2nd layer of dyed layer
Continuous and bending broken line shape, so as to form the dim light portion,
The wavelength of the laser irradiated from the laser irradiation device is for more than 100nm and 10 μm hereinafter, pulse width
For it is more than 1 femtosecond and 100 picoseconds hereinafter, pulse energy be more than 0.1 μ J and 1mJ hereinafter, also, by NA be more than 0.1 and
Less than 0.95 lens light gathering.
As described above, the display device involved by mode according to the present invention and its manufacturing method and manufacture fill
It puts, as the dim light portion, in the section of the orthogonal thickness direction of the long side direction of the through portion with the threadiness, multiple
Chromatograph forms continuous and bending broken line shape, and the through portion is made to be located at the bent end of the broken line, thus adjacent
The final scanner section of the dyed layer of the lower layer side of chromatograph is covered by the initial scanner section of the dyed layer of its upper layer side, can
The colored portion of light color is not formed.As a result, it is possible to provide a kind of reduction for inhibiting the display quality caused by fleck defect
Display device.
Description of the drawings
Fig. 1 is the vertical view for the overall structure for representing the liquid crystal display device LCD in embodiments of the present invention 1.
Fig. 2 is the vertical view of the composition for the part for representing the display panel in embodiments of the present invention 1.
Fig. 3 be the liquid crystal display device LCD in embodiments of the present invention 1 at the A1- A2 lines of Fig. 2 cut off cut
The end view drawing in disconnected portion.
Fig. 4 is the sectional view for an example for schematically showing the fleck defect in embodiments of the present invention 1.
Fig. 5 is the sectional view of the composition for the pixel for representing to have the dim light portion in embodiments of the present invention 1.
Fig. 6 is the composition and focus of optical system when representing the inside glass processing in embodiments of the present invention 1
The schematic diagram of neighbouring state.
Fig. 7 be for embodiments of the present invention 1 illustrate to inside glass carry out straight line processing when state
Figure.
Process flow chart when Fig. 8 is the carry out planar processing for being illustrated to embodiments of the present invention 1.
Fig. 9 is the state diagram of planar dyed layer for being illustrated to embodiments of the present invention 1.
Figure 10 is the figure of the sectional view and cross sectional photograph relative to the comparative example of embodiments of the present invention 1.
Figure 11 A are schematic diagrames when 2 layers are formed in the comparative example relative to embodiments of the present invention 1.
Figure 11 B are schematic diagrames when 2 layers are formed in the comparative example relative to embodiments of the present invention 1.
Figure 12 is sectional view when 2 layers are formed in embodiments of the present invention 1.
Symbol description-
AF alignment films
BM black matrix
CF colour filters
CIT common electrodes
CONT contact holes
DL data lines
DM drain electrodes
DP display panels
F focal points
GB, GB1, GB2 glass substrate
GSN insulating films
GL gate lines
LC liquid crystal layers
LCD liquid crystal display devices
OC protective layers
PAS insulating films
PIT pixel electrodes
POL1, POL2 polarization plates
SEM semiconductor layers
SM source electrodes
SUB1 TFT substrates
SUB2 CF substrates
UPAS insulating films
1 dim light portion
Other regions in 1g dim lights portion
2 dyed layers
The 1st layer of dyed layer of 2-1
The 2nd layer of dyed layer of 2-2
The 3rd layer of dyed layer of 2-3
2a painted areas
3 void layers
3a void areas
4th, 4a laser
5 lens
The colored portion of 6 heavy colours
7 through portions (colored portion 7 of linear light color)
The shallower region of 8 colorings
33 foreign matters
34 backlight light
40 linear cutter trades
42nd, 43,44 arrow
46 broken lines
One vertex (bent end) of 47 2 layers of broken line
94 laser irradiation devices
95 glass substrate holding meanss
96 driving devices
101 dim light portions
Other regions in 101g dim lights portion
133 fleck defect portions
P spacing
S scanning beginnings portion
E ends of scan portion
Specific embodiment
Hereinafter, with reference to attached drawing, embodiments of the present invention will be described.
In the following embodiments, liquid crystal display device is schematically illustrated, but display device according to the present invention and unlimited
Due to liquid crystal display device, such as can also be organic EL display device or plasma display device etc..
(embodiment 1)
Fig. 1 is the liquid crystal display dress for an example for being denoted as the display device involved by embodiments of the present invention 1
Put the vertical view of the overall structure of LCD.
Liquid crystal display device LCD is included：Show that the display panel DP of image, the display panel of driving display panel DP are used
Driving circuit (data line drive circuit 30, gate line drive circuit 31) controls the display panel control circuit with driving circuit
(not shown) and the backlight 134 to being irradiated from the backlight light of the lateral display panel DP irradiation lights in the back side.
Fig. 2 is the vertical view of the composition for the part for representing display panel DP.Fig. 3 is cut off at the A1-A2 lines of Fig. 2
Cutting portion end view drawing.In addition, in Fig. 2 and Fig. 3, a pixel P among display panel DP is represented.
As shown in figure 3, display panel DP is included：The thin film transistor base plate SUB1 of back side is configured in (hereinafter, claiming
For TFT substrate SUB1.), be configured in display surface side and the filter substrate SUB2 opposed with TFT substrate SUB1 (hereinafter, claiming
For CF substrates SUB2.) and the liquid crystal layer LC that is held between TFT substrate SUB1 and CF substrate SUB2.Thin film transistor (TFT)
Substrate SUB1 plays a role as an example of the 1st substrate.An examples of the filter substrate SUB2 as the 2nd substrate
And it plays a role.
In TFT substrate SUB1, form the multiple data line DL extended in a column direction and extend in the row direction more
A gate lines G L is formed about thin film transistor (TFT) TFT in multiple data line DL and multiple respective cross parts of gate lines G L.This
Outside, a pixel P is defined as by 2 data lines DL and adjacent 2 adjacent gate lines G L rectangular areas surrounded.Picture
Plain P by rectangular is configured multiple in TFT substrate SUB1.
In pixel P, the pixel electricity formed such as (or translucency) conductive film transparent by tin indium oxide (ITO) is formed
Pole (display electrode) PIT.As shown in Fig. 2, pixel electrode PIT has opening portion 32 (such as slit), be formed as striated.
Thin film transistor (TFT) TFT forms the semiconductor layer SEM being made of non-crystalline silicon (aSi) on gate insulating film GSN (with reference to Fig. 3),
Drain electrode DM and source electrode SM is formed on semiconductor layer SEM (with reference to Fig. 2).Drain electrode DM is electrically connected with data line DL.
Source electrode SM and pixel electrode PIT is electrically connected to each other via contact hole CONT.
The lit-par-lit structure for forming each portion of pixel P is not limited to the composition of Fig. 3, can apply well known composition.Such as
In composition shown in Fig. 3, in TFT substrate SUB1, gate lines G L (with reference to Fig. 2), and shape are formed on the 1st glass substrate GB1
Into gate insulating film GSN so that covering gate line GL.In addition, forming data line DL on gate insulating film GSN, and formed
Insulating film PAS is so that covering data line DL.In addition, common electrode CIT (display electrode) is formed on insulating film PAS,
And upper insulating film UPAS is formed so that covering common electrode CIT.Further, picture is formed on upper insulating film UPAS
Plain electrode PIT, and alignment films AF is formed so that covering pixel electrode PIT.In the back side of the 1st glass substrate GB1, formed
Polarization plates POL1 (the 1st polarization plates).
In addition, in CF substrates SUB2, in the 2nd glass substrate GB2 (lower face side of the 2nd glass substrate GB2 of Fig. 3)
Upper formation black matrix BM (example of light shielding part) and colour filter CF (for example, red portion, green portion, blue portion) (light transmission
One example in portion), and protective layer OC is formed so that covering black matrix BM and colour filter CF.In the 2nd glass substrate
The display surface side of GB2 forms polarization plates POL2 (the 2nd polarization plates).2nd glass substrate GB2 and the 1st glass substrate GB1 as a result,
It is opposed and positioned at display surface side, and liquid crystal layer LC is configured between the 1st glass substrate GB1 and the 2nd glass substrate GB2.
Shown composition according to fig. 3, liquid crystal display device LCD have so-called IPS (In Plane Switching, face
Interior switching) mode composition, but it's not limited to that by the liquid crystal display device LCD involved by embodiment 1.
Next, the driving method to liquid crystal display device LCD simply illustrates.It is defeated from gate line drive circuit 31
The grid voltage of the scanning gone out is provided to gate lines G L, the data electricity of the image exported from data line drive circuit 30
Pressure is provided to data line DL.If provide gate-on voltage, the semiconductor layer SEM of thin film transistor (TFT) TFT to gate lines G L
As low resistance, the data voltage of data line DL is supplied to be provided to pixel electrode PIT via source electrode SM.In addition,
Common electrode CIT is provided to from the shared voltage of common electrode drive circuit output (not shown).Pixel electrode PIT as a result,
Electric field (driving electric field) is generated between common electrode CIT, by the electric field, liquid crystal layer LC is driven, and image is shown.
Here, liquid crystal display device LCD is brighter than desirable there may be the display brightness of pixel in its manufacturing process
Spend high fleck defect (picture element flaw).It is represented in Fig. 4 an example in the case that pixel P is fleck defect portion 133.
It in Fig. 4, illustrates in the manufacturing process of liquid crystal display device LCD, is mixed between TFT substrate SUB1 and CF substrate SUB2
The situation of the foreign matters such as organic matter or metal 33.Pixel P shown in Fig. 4, since foreign matter (tramp material) 33 leads to liquid crystal
Multilated is orientated, therefore generates the light leakage of backlight light 34, becomes the fleck defect portion 133 there are fleck defect.
In the liquid crystal display device LCD involved by embodiment 1, there is the composition for inhibiting the fleck defect.
Specifically, as shown in figure 5, the inside of the 2nd glass substrate GB2 in CF substrates SUB2, forms the transmission for making backlight light 34
The reduced dim light portion 1 of amount.Dim light portion 1 arranges in the face direction (in-plane) parallel with the surface of panel, from the 2nd glass
During the display surface side observation of substrate GB2, be formed as covering and hide the fleck defect portion 133 based on foreign matter 33.That is,
The inside of at least one of 1st glass substrate GB1 and the 2nd glass substrate GB2, is configured from display surface side and covers bright
The dim light portion 1 in point defect portion 133.In dim light portion 1, color and GB2 points of the 1st glass substrate GB1 and the 2nd glass substrate are formed
Not different dyed layer 2, the void layer 3 that multiple i.e. most gaps are formed under dyed layer 2.In addition, it is as described below,
In the case of forming dyed layer 2 by multiple layers, can also overlap multiple dyed layers on void layer 3.
Fig. 6 is the composition and focus of the optical system of the manufacturing device of display device when representing inside glass processing
The schematic diagram of state near (focal point) F.
The manufacturing device of display device is configured to have：Laser irradiation device 94, lens 5 keep filling as display device
The glass substrate holding meanss 95 of an example put make laser irradiation as an example of laser relative movement device
The driving device 96 that device 94 is moved relative to glass substrate holding meanss 95.
It is preferred that the wavelength of laser 4 irradiated from laser irradiation device 94 is more than the 100nm and 10 through the wavelength of glass
μm hereinafter, pulse width is more than 1 femtosecond and 100 picoseconds hereinafter, pulse energy is more than 0.1 μ J and 1mJ is hereinafter, frequency is
More than 10Hz and below 10MHz.
Lens 5 are the lens that NA is more than 0.1 and less than 0.95, it is possible to have aberration correction function.
Laser 4a represents the laser through optically focused after lens 5, is incident on the 2nd kept by glass substrate holding meanss 95
In glass substrate GB2, in desirable working depth L by optically focused.
By micro- by painted areas 2a and comprising a diameter of less than more than 1nm and 50 μm near the focal point F of optically focused
The void area 3a in small hole (gap) is formed.
In addition, relatively move laser 4,4a and the 2nd glass substrate GB2, and can be with drive by driving device 96
Dynamic device 96 linkedly irradiates/stops laser 4 in desirable position, the control system of 4a is configured to be built in laser photograph
Injection device 94.
Next, action is illustrated.
Relative to the 2nd glass substrate GB2 kept by glass substrate holding meanss 95, laser irradiation device 94 passes through drive
Dynamic device 96 after being moved to desirable position, irradiates laser 4 to the 2nd glass substrate GB2, makes by the laser of 5 optically focused of lens
4a is incident in the 2nd glass substrate GB2, in the inside optically focused of the 2nd glass substrate GB2.Here, make in laser 4 and laser 4a
Laser is known as the laser of ultra-short pulse laser, therefore peak value output is very high, and in focal point F, energy density is non-
Chang Gao.Therefore, near focal point F, glass distillation and gasification after solidify, so as to formed more than diameter 1nm and 50 μm with
Under small hole (gap).In the 2nd glass substrate GB2 than focal point F closer to the surface of the 2nd glass substrate GB2
Region, glass melting, the heat transfer around generated when the laser and processing spread caused by the gap of focal point F
It influences, is colored as dark brown or black and forms painted areas 2a.The coloring for thinking painted areas 2a is due to being formed in glass
It is referred to as the oxygen defect at non-crosslinked oxygen vacancies center and generates.
Make the position relative rectilinear movement of laser 4a and the 2nd glass substrate GB2, carry out linearly scanning or planar and sweep
It retouches, increases painted areas 2a and void area 3a, so as to form the 1 (reference of dim light portion being made of dyed layer 2 and void layer 3
Fig. 5).Scattered from the backlight light 34 of the back side illuminaton of glass substrate GB by void layer 3, further by dyed layer 2 absorb so as to
It by dim light, is projected by the light of dim light on the surface of the 2nd glass substrate GB2, therefore can inhibit aobvious caused by fleck defect
Show the reduction of quality.
Dim light portion 1 is formed and straight to the progress of the inside glass of the 2nd glass substrate GB2 to represent by photo in Fig. 7
State diagram when line is processed.Fig. 7 (a) is the figure from the direction vertical with liquid crystal display panel.In linear cutter trade 40
Peripheral portion forms the colored portion 6 of heavy colour, and the colored portion 7 of light color is formed in the central portion of linear cutter trade 40.Fig. 7 (b) tables
The sectional view of the A3-A4 lines of diagram 7 (a).Understand that the back side in the 2nd glass substrate GB2 forms void area 3a, than sky
3a more surface sides in gap region form the colored portion 6 of heavy colour and the colored portion 7 of light color (that is, the transmitance of visible ray is higher than around it
Through portion).
Here, the processing method and the relationship of the position of the colored portion 7 of light color of straight line processing are illustrated.
In Fig. 8, as the dim light portion 101 involved by comparative example, when representing to carry out straight line processing to 1 level shape dyed layer 2
Process flow, the state diagram of the 1 level shape dyed layer 2 in dim light portion 101 is represented in Fig. 9.Implement the 1st article by using laser
Straight line is processed, so as to obtain the colored portion 6 in peripheral portion with thick linear heavy colour and in central portion with carefully straight
The linear cutter trade 40 of the colored portion 7 of linear light color (with reference to Fig. 8 (a)).In addition, in the attached drawing after Fig. 8, it is
It is readily appreciated that, dyed layer 2 is represented as needed by cross-hauling.
Next, Fig. 8 (b) expressions make its glass surface with the 2nd glass substrate GB2 be moved parallel to spacing P after (for example,
In Fig. 8, after moving it up spacing P) state when carrying out the processing of the 2nd article of straight line.For example, spacing P can be 0.1~200
It is set between μm.In Fig. 8 (b), in order to illustrate and surround by a dotted line around each linear cutter trade 40, but actually
Boundary is not different.Due to scanning the cutter trade 40 of 2, the spacing of scanning room is set as P to be processed, because
The colored portion 6 of the heavy colour of the peripheral portion of this planar dyed layer 2 expands, the 1st article of light colored portion 7 due to the 2nd article of scanning,
It is covered and disappeared by the colored portion 6 of the heavy colour of the 2nd article of peripheral portion, the colored portion 7 of the 2nd article of light color is only in final scanning
Portion remains.
By move it spacing P and repeatedly straight line process operation until the 3rd article of later the N article (N be more than 4 it is whole
Number.), the coloring of the heavy colour of planar that the colored portion 6 so as to obtain through the heavy colour of peripheral portion expands and be connected to be formed
Portion 6 (with reference to Fig. 8 (c)).Here, the face of planar dyed layer 2 integrally by dense colours, but only final scanner section (that is,
The scanner section of topmost in Fig. 8 (c)) the linear light colored portion 7 of residual.In Fig. 8, in order to illustrate coming by a dotted line
It surrounds around each linear cutter trade 40, but represents to eliminate the situation of dotted line in Fig. 9 (a), represent practical in Fig. 9 (b)
Cutter trade 40.As shown in Fig. 9 (a), the dyed layer 2 for forming the planar of the part in dim light portion 101 is seen from display surface side
Examine, in the end in dim light portion 101 (that is, upper end of Fig. 9 (a)), have the transmitance of visible ray than dim light portion 101 other
The linear through portion (light colored portion 7) of region 101g high.In the state diagram of Fig. 9 (b) similarly, in dim light
The end (that is, upper end of Fig. 9 (b)) in portion 101 forms the colored portion 7 of linear light color.In addition, Fig. 9 is from display surface side
Observe the figure in dim light portion 101.
Expression makes the schematic diagram of state that the section of the A5-A6 lines of Fig. 9 (b) rotates clockwise 90 degree, figure in Figure 10 (a)
10 (b) represents its photo.The section of A5-A6 lines in Fig. 9 (b) is (that is, the coloring of light color with the linear through portion
Portion 7) the orthogonal thickness direction of long side direction section.In final scanner section, the colored portion 7 of linear light color remains,
The generation light leakage from this.This is because when scanning ultra-short pulse laser, be temporarily forming non-crosslinked oxygen vacancies center and from
Ultra-short pulse laser is irradiated on the region of dense coloring, when the colored portion 6 of heavy colour melts, in the central portion linearly processed,
Laser intensity is stronger, therefore the construction at non-crosslinked oxygen vacancies center disintegrates and decolourizes, and forms linear through portion (that is, light color
Colored portion 7).By being repeatedly scanned with, the position of decoloration is also coloured again by the colored portion of heavy colour 6, but in section, only finally
Scan position keep the shallower region 8 of coloring (that is, colored portion 7 of light color linear in plane) residual of decoloration, from
Light leakage occurs at this.In addition, the colored portion 7 in linear light color colours shallower region 8, gap easily condenses, it is believed that
This is also the reason of backlight light of liquid crystal display panel easily propagates through.At this point, the position (that is, colored portion 6 of heavy colour) of dense coloring
Visible light transmittance be more than 0% and 50% hereinafter, but light leakage position (that is, on colored portion 7 light in plane, section
The shallower region 8 of color) visible light transmittance a height of more than 60%.
Figure 11 A and Figure 11 B are to form in dim light portion 101 in the different position of the thickness direction of the 2nd glass substrate GB2
There is the schematic diagram of 2 layers of comparative example.
The direction of arrow 42 shown in Figure 11 A (a-1) represents the spacing direction of the linear scanning based on laser, represents 2 layers
Spacing direction all be identical direction.Figure 11 A (a-2) represent to go forward side by side according to the linear scanning of each spacing P laser repeatedly
Cuing open at the A7-A8 lines when layer of row face processing detaches certain distance in the thickness direction of the 2nd glass substrate GB2 and forms 2 layers
The state that view is rotated by 90 ° in the clockwise direction.Arrow 43 shown in Figure 11 A (a-2) between being in the same manner as Figure 11 A (a-1)
Away from direction.In addition, Figure 11 A (a-1) and Figure 11 B (b-1) are the figures from display surface side, paper longitudinal direction is the back side
Side.In this scanning, since 2 layers are all given to implement face processing by the spacing in identical direction, shallower area is coloured
Domain 8 is Chong Die with final scanner section, and light leakage cannot be reduced.
On the other hand, the 1st layer of the expression of arrow 44 of Figure 11 B (b-1) is opposite with the 2nd layer of spacing direction.Figure 11 B (b-2)
Represent the section of A9-A10 lines.Colour the heavy colour that the light leakage caused by shallower region 8 passes through its upper strata colored portion 6 and
The colored portion 6 of the heavy colour of lower floor and reduce, but have 2 positions due to colouring shallower region 8, dim light portion 101 is whole
Light leakage cannot be substantially reduced.
In processing method described above, it is impossible to inhibit based on the influence for colouring shallower region 8, it is impossible to inhibit aobvious
Show the reduction of quality.
For this purpose, the dim light portion 1 involved by present embodiment 1, from display surface side, the end B in the dim light portion 1 has
There is linear through portion (coloring shallower region of the transmitance than other regions 1g high in the dim light portion 1 of visible ray
8), the dim light portion 1 is in the thickness side orthogonal with the long side direction of the linear through portion (the shallower region 8 of coloring)
To section be 2 dyed layers 2 are continuous and bending is V shape broken line shape, also, the through portion (the shallower area of coloring
Domain 8) positioned at the bent end 47 of the broken line 46.
Hereinafter, by an example table of the formation pattern in the dim light portion 1 involved by embodiments of the present invention 1 in Figure 12
It is shown as sectional view.
Figure 12 (a) be section observe and as bending for V shape broken line 46 state form 2 layers of dyed layer 2
(2-1,2-2) is used as sectional view during dim light portion 1.That is, the section of broken line 46 is formed as into 2 layers of 2 (2- of dyed layer
1st, 2-2) one vertex of formation (that is, the vertex of the right end of Figure 12 (a), in other words, bent end) 47.Point S is the 1st layer of coloring
The starting position (that is, initial scanner section) of the initial scan-side of layer 2-1, point E are that the 2nd layer of the final of dyed layer 2-2 is swept
Retouch the end position (that is, final scanner section) of side.There are following features：In the bent end 47 as B portions, by the 1st layer
The initial scanner section of the final scanner section of chromatograph 2-1 and the 2nd layer of dyed layer 2-2 are set as the scanning at same position, so as to
The final scanner section of 1st layer of dyed layer 2-1 is covered by the initial scanner section of the 2nd layer of dyed layer 2-2, so as to not formed
The shallower region 8 of color.
That is, first, it, will from display surface side by relatively moving 4 and the 2nd glass substrate GB2 of laser
The 1st layer of dyed layer 2-1 in the dim light portion 1 in covering fleck defect portion 133 is formed from scanning starting position S to scan end position B
For planar.Next, by relatively moving 4 and the 2nd glass substrate GB2 of laser, from display surface side, with the 1st layer of coloring
The scan end position B of layer 2-1 starts to scan as scanning starting position, until scan end position E, by dim light portion 1
2nd layer of dyed layer 2-2 is formed as planar, is overlappingly configured to form dim light portion 1 from display surface side, so that the 2nd
The section of the thickness direction of glass substrate GB2, the 1st layer of dyed layer 2-1 and the 2nd layer of dyed layer 2-2 form continuous and bending folding
The shape of line 46.
In addition, due to when being formed for the 2nd layer, if being overlapped in the depth identical with the 1st layer of dyed layer 2-1, covering the 1st
Layer dyed layer 2-1, it is almost the same colour saturation, therefore not can help to transmitance reduction.Therefore, the 2nd layer of dyed layer 2-2 is pressed
Working depth is made to change the dyed layer 2-2 to be formed as inclined direction according to every 1 time scanning.In the 2nd layer of dyed layer 2-2 most
Whole scanner section residual colours shallower region 8.But by the 1st layer of dyed layer 2-1, transmitance is alleviated, in face,
It colours shallower region 8 and only forms 1 position, therefore the light leakage of dyed layer entirety can be inhibited.
Cuing open in the case that it is 3 layers to increase the coloring number of plies is represented as the variation of present embodiment 1, in Figure 12 (b)
View.That is, broken line 46 is formed so that 3 layers of dyed layer 2 (2-1,2-2,2-3) form 2 vertex 47.Point S is the 1st
The starting position of the initial scan-side of layer dyed layer 2-1, point E are the stop bits of the final scan-side of the 3rd layer of dyed layer 2-3
It puts.By the way that the final scanner section of the 1st layer of dyed layer 2-1 and the initial scanner section of the 2nd layer of dyed layer 2-2 are set as same
Scanning at position sets the final scanner section of the 2nd layer of dyed layer 2-2 and the initial scanner section of the 3rd layer of dyed layer 2-3
For the scanning at same position, so as in the final scanner section of the 1st layer of dyed layer 2-1 and the 2nd layer of dyed layer 2-2 most
Whole scanner section is not formed respectively colours shallower region 8, only in 1 position of the final scanner section of the 3rd layer of dyed layer 2-3
It puts to be formed and colours shallower region 8.Thereby, it is possible to be reduced matchingly with the transmitance based on 3 layers of formation, inhibit dyed layer
Whole light leakage.In this way, by forming broken line by 3 layers or more of dyed layer 2, that is, dim light portion 1 is formed as to have 2 or more
Vertex 47, so as to more prevent the reduction of display quality.
It is, for example, 60 by the distance between the 1st layer of dyed layer 2-1 and the 3rd layer of dyed layer 2-3 in present embodiment 1
~100 μm or so, the 1st layer not be overlapped with the 3rd layer dyed layer 2-1,2-3 and void layer 3, so as to efficiently improve
Concentration.The distance between 1st layer of dyed layer 2-1 and the 3rd layer of dyed layer 2-3 is not limited to the above, as long as can be with 5 μ
More than m, glass thickness below distance set, just have and improve the effect of colour saturation.
Shape when overlooking dim light portion 1 is illustrated but it is also possible to be round, oval, fillet with quadrangle
Polygonal shape more than polygon, avette or triangle.Wherein, by the way that the flat shape of dyed layer 2 is formed as round
Shape can mitigate the stress generated in corner, inhibit corner light leakage.The size in dim light portion 1 is also based on Pixel Dimensions or from glass
The distance that the back side of glass substrate GB is risen is the size of 10 μm or more and less than 500 μm.3rd layer of dyed layer 2-3 is formed in than
1 layer of dyed layer 2-1 is closer to 10 μm of surface of glass substrate GB or more and less than 200 μm of distance, the 2nd layer of dyed layer 2-2
It is formed in the form of the 1st layer of dyed layer 2-1 is connect with the 3rd layer of dyed layer 2-3.
Specifically with the 1st layer of dyed layer 2-1 and the 3rd layer of dyed layer 2-3 relative to glass surface parallel (being set as horizontal), general
Inclined form is formed 2nd layer of dyed layer 2-2 ramp-likely.1st layer of dyed layer 2-1, the 2nd layer of dyed layer 2-2 and the 3rd layer of coloring
The shape or angle that layer 2-3 can use can be selected arbitrarily, but due to following reasons, as undermost 1st layer of dyed layer
2-1 is preferably set to horizontal.
When forming lowest level, need to prevent from causing to be in due to the laser not penetrated by absorption near focal point F
The CF layers damage of the lower surface of 2nd glass substrate GB2.Therefore, make the following table of the 1st layer of dyed layer 2-1 and the 2nd glass substrate GB2
Face is formed spaced at a distance.On the other hand, the reason is that, if the 1st layer of dyed layer 2-1 is formed in the 2nd glass substrate
Top in GB2 then cannot carry out shading by dyed layer 2-1 come the light of the inclined direction to the scattering light based on foreign matter,
Therefore light leakage is generated.In conclusion the 1st layer of dyed layer 2-1 needs are not having the depth of damage to the CF layers of the 2nd glass substrate GB2
Degree, is formed in most deep position, and as shown in Figure 12 (a) and (b), the 1st layer of dyed layer 2-1 preferably is set as horizontal
Chromatograph 2.
In addition, in present embodiment 1, the 1st layer of dyed layer 2-1, the 2nd layer of dyed layer 2- are formed from deeper position
2nd, if the 3rd layer of dyed layer 2-3 this is because form the 1st layer of dyed layer 2-1 in shallower position, forms the 2nd layer of dyed layer
Durings 2-2 etc., laser is absorbed or is scattered by the 1st layer of dyed layer 2-1, in order to form required work(after the 2nd layer of dyed layer 2-2
Rate and energy cannot be provided to the dyed layer forming position in the 2nd glass substrate GB2.That is, it is preferred that through portion
(the shallower region 8 of coloring) is located at the coloring near the position of display surface side among the multiple dyed layers 2 for forming broken line 46
Layer 2.In addition, the number of plies about dyed layer 2 and the thickness as long as glass can make its increase as long as allowing.
In addition, the back side in each dyed layer 2 is respectively formed void layer 3.By these void layers 3, can inhibit to leak
Light.
According to the embodiment 1, at least one of the 1st glass substrate GB1 and the 2nd glass substrate GB2
There is multilayer the dim light portion 1 in fleck defect portion 133 is covered from display surface side in portion, as the dim light portion, with institute
The section of the orthogonal thickness direction of long side direction of linear through portion is stated, forms that multiple dyed layers are continuous and the broken line of bending
Shape, by the way that the through portion is made to be located at the bent end of the broken line, so as to the dyed layer of the lower layer side of adjacent dyed layer
Final scanner section colored portion so as to not form light color is covered by the initial scanner section of its upper layer side.Change speech
It, is formed as in the thickness direction overlapping of glass substrate and the final scanner section of adjacent dyed layer 2 with initial scanner section
Same scan position.With this configuration, so as to the final scanner section quilt of the dyed layer 2 of the lower layer side of adjacent dyed layer 2
The initial scanner section covering of the dyed layer 2 of its upper layer side, can not form and colour shallower region 8, bright spot can be inhibited to lack
The reduction of display quality caused by falling into.
In embodiments of the present invention 1, it is illustrated to the processing in the state of polarization plates POL2 is not present, but
By using the laser 4 of the polarized light state through POL2, can also be obtained for the liquid crystal display panel for attaching polarization plates POL2
Identical result and effect.
In addition, laser is irradiated, but dyed layer 2 is formed by the backside illuminated from panel and in GB1 from the table side of panel,
So as to can also weaken the backlight light for being irradiated to foreign matter.
In addition, by by the arbitrary embodiment or variation among the various embodiments either variation
It is appropriately combined, respectively possessed effect can be played.Furthermore it is possible to carry out embodiment combination with one another or implementation
Example combination with one another either the combination of embodiment and embodiment and can also carry out different embodiments or embodiment
Among feature combination with one another.
Industrial availability
Display device and its manufacturing method and manufacturing device involved by the mode of the present invention can inhibit bright spot to lack
The reduction of display quality caused by falling into, particularly shows the liquid crystal display or organic EL panel that are built-in with display device
Show that device is useful, the display device and its system of the display for requiring high brightness/fine/image quality uniformity can be used in extensively
Make method and manufacturing device etc. and electrical equipment or device with display device.
Claims (6)
1. a kind of display device, has：
1st glass substrate；With
2nd glass substrate, it is opposed with the 1st glass substrate and positioned at display surface side,
The display device has from institute in the inside of at least one of the 1st glass substrate and the 2nd glass substrate
The dim light portion that display surface side is observed and covers fleck defect portion is stated,
From the display surface side, the dim light portion is in an end in the dim light portion, the transmitance ratio with visible ray
The high linear through portion in other regions in the dim light portion,
The dim light portion is multiple dyed layers in the section of the orthogonal thickness direction of the long side direction of the through portion with the threadiness
Continuous and bending broken line shape, also, the through portion is located at the bent end of the broken line.
2. display device according to claim 1, wherein,
Under overlook observation, the dim light portion be created as circle, ellipse, the polygon of fillet, avette or triangle with
On polygonal shape part.
3. display device according to claim 1, wherein,
The broken line has the vertex of 2 or more.
4. the display device according to any one of claims 1 to 3, wherein,
The through portion is located among the multiple dyed layer positioned at the dyed layer near the position of the display surface side.
5. a kind of manufacturing method of display device, the display device have：1st glass substrate and with the 1st glass substrate
2nd glass substrate opposed and positioned at display surface side,
The manufacturing method of the display device includes：
To the 1st glass substrate or the 2nd glass substrate irradiation laser so that covering fleck defect portion, gathers laser
Light is to the 1st glass substrate and the process of the inside of at least one of the 2nd glass substrate；
By the way that the laser is made to be relatively moved with the display device, from the display surface side, the bright spot will be covered and lacked
The process that the 1st layer of dyed layer in the dim light portion of concave portion is formed as planar from scanning starting position to scan end position；With
Next, by the way that the laser is made to be relatively moved with the display device, from the display surface side, by the described 1st
The scan end position of layer dyed layer starts to scan as scanning starting position, until scan end position by described in
The 2nd layer of dyed layer in dim light portion is formed as planar, the 1st layer of dyed layer and the 2nd layer of dyed layer from the display surface side
Observation is overlappingly configured as the 1st layer of dyed layer described in the section of the thickness direction in the 2nd glass substrate and described 2nd layer
Dyed layer forms continuous and bending broken line shape, so as to form the process in the dim light portion,
The wavelength of the illuminated laser is more than 100nm and 10 μm hereinafter, pulse is wide in the process for irradiating the laser
Spend for it is more than 1 femtosecond and 100 picoseconds hereinafter, pulse energy be more than 0.1 μ J and 1mJ hereinafter, also, by NA be more than 0.1 and
Less than 0.95 lens light gathering.
6. a kind of manufacturing device of display device, manufactures display device, the display device has：1st glass substrate and with
1st glass substrate is opposed and is located at the 2nd glass substrate of display surface side,
The manufacturing device of the display device has：
Laser irradiation device, to the 1st glass substrate or the 2nd glass substrate irradiation laser so that covering bright spot lacks
Concave portion；
Lens make from the laser focusing that the laser irradiation device irradiates to the 1st glass substrate and the 2nd glass
The inside of at least one of glass substrate；
Display device holding meanss keep the display device；With
Driving device, by making the laser from the laser irradiation device with being protected by the display device holding meanss
The display device relative movement held, from the display surface side, will cover the 1st of the dim light portion in the fleck defect portion
Layer dyed layer is formed as planar from scanning starting position to scan end position, next, by the way that the laser is made to be shown with described
Showing device relatively moves, and from the display surface side, the scan end position using described 1st layer of dyed layer is as sweeping
Starting position is retouched to start to scan, the 2nd layer of dyed layer in the dim light portion is formed as into planar until scan end position, institute
The 1st layer of dyed layer is stated to be overlappingly configured from the display surface side as in the 2nd glass base with the 2nd layer of dyed layer
1st layer of dyed layer described in the section of the thickness direction of plate forms continuous and bending broken line shape with the 2nd layer of dyed layer, from
And the dim light portion is formed,
The wavelength of the laser irradiated from the laser irradiation device is more than 100nm and 10 μm hereinafter, pulse width is 1 winged
Second or more and 100 picoseconds hereinafter, pulse energy is more than 0.1 μ J and 1mJ is hereinafter, also, be more than 0.1 and less than 0.95 by NA
Lens light gathering.
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| JP2016255760A JP6362013B2 (en) | 2016-12-28 | 2016-12-28 | Display device, manufacturing method thereof, and manufacturing apparatus |
| JP2016-255760 | 2016-12-28 |
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| Publication number | Publication date |
|---|---|
| JP6362013B2 (en) | 2018-07-25 |
| JP2018106124A (en) | 2018-07-05 |
| CN108254946B (en) | 2022-03-15 |
| KR20180077007A (en) | 2018-07-06 |
| KR102368452B1 (en) | 2022-02-28 |
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