CN108250676A - A kind of phosphorous active ester and its halogen-free composition and copper clad foil substrate - Google Patents
A kind of phosphorous active ester and its halogen-free composition and copper clad foil substrate Download PDFInfo
- Publication number
- CN108250676A CN108250676A CN201611240101.1A CN201611240101A CN108250676A CN 108250676 A CN108250676 A CN 108250676A CN 201611240101 A CN201611240101 A CN 201611240101A CN 108250676 A CN108250676 A CN 108250676A
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- CN
- China
- Prior art keywords
- resin
- halogen
- weight
- component
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 150000002148 esters Chemical class 0.000 title claims abstract description 31
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 title claims abstract description 25
- 239000000203 mixture Substances 0.000 title claims description 40
- 239000011888 foil Substances 0.000 title description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title description 4
- 239000010949 copper Substances 0.000 title description 2
- 229910052802 copper Inorganic materials 0.000 title description 2
- 239000000758 substrate Substances 0.000 title description 2
- 229920005989 resin Polymers 0.000 claims abstract description 39
- 239000011347 resin Substances 0.000 claims abstract description 39
- 239000011342 resin composition Substances 0.000 claims abstract description 24
- 229920001187 thermosetting polymer Polymers 0.000 claims abstract description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 29
- 239000003822 epoxy resin Substances 0.000 claims description 25
- 229920000647 polyepoxide Polymers 0.000 claims description 25
- 239000003063 flame retardant Substances 0.000 claims description 21
- 239000000945 filler Substances 0.000 claims description 17
- 239000000654 additive Substances 0.000 claims description 16
- 239000000843 powder Substances 0.000 claims description 15
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical group CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 claims description 14
- 230000000996 additive effect Effects 0.000 claims description 14
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 12
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 12
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims description 12
- -1 phenolic aldehyde Chemical class 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 11
- 239000000377 silicon dioxide Substances 0.000 claims description 11
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 10
- 239000011574 phosphorus Substances 0.000 claims description 9
- 229910052698 phosphorus Inorganic materials 0.000 claims description 9
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 8
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 claims description 7
- ZSTLPJLUQNQBDQ-UHFFFAOYSA-N azanylidyne(dihydroxy)-$l^{5}-phosphane Chemical compound OP(O)#N ZSTLPJLUQNQBDQ-UHFFFAOYSA-N 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 7
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 claims description 6
- 239000004305 biphenyl Substances 0.000 claims description 6
- 235000010290 biphenyl Nutrition 0.000 claims description 6
- 239000004843 novolac epoxy resin Substances 0.000 claims description 6
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims description 5
- 239000004695 Polyether sulfone Substances 0.000 claims description 5
- 239000002253 acid Substances 0.000 claims description 5
- 239000005011 phenolic resin Substances 0.000 claims description 5
- 229920001568 phenolic resin Polymers 0.000 claims description 5
- 229920006393 polyether sulfone Polymers 0.000 claims description 5
- 239000012779 reinforcing material Substances 0.000 claims description 5
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 claims description 4
- 229910017083 AlN Inorganic materials 0.000 claims description 4
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 claims description 4
- 229910052582 BN Inorganic materials 0.000 claims description 4
- 229930185605 Bisphenol Natural products 0.000 claims description 4
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 4
- 239000004734 Polyphenylene sulfide Substances 0.000 claims description 4
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 claims description 4
- 229910021502 aluminium hydroxide Inorganic materials 0.000 claims description 4
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 claims description 4
- 229910002113 barium titanate Inorganic materials 0.000 claims description 4
- 239000003365 glass fiber Substances 0.000 claims description 4
- 239000010445 mica Substances 0.000 claims description 4
- 229910052618 mica group Inorganic materials 0.000 claims description 4
- 238000006116 polymerization reaction Methods 0.000 claims description 4
- 229920000069 polyphenylene sulfide Polymers 0.000 claims description 4
- 239000010453 quartz Substances 0.000 claims description 4
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 4
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 4
- 229910052712 strontium Inorganic materials 0.000 claims description 4
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 claims description 4
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 claims description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 3
- 239000004593 Epoxy Substances 0.000 claims description 3
- 229920006387 Vinylite Polymers 0.000 claims description 3
- YUWBVKYVJWNVLE-UHFFFAOYSA-N [N].[P] Chemical compound [N].[P] YUWBVKYVJWNVLE-UHFFFAOYSA-N 0.000 claims description 3
- 229910052791 calcium Inorganic materials 0.000 claims description 3
- 239000011575 calcium Substances 0.000 claims description 3
- 229910000019 calcium carbonate Inorganic materials 0.000 claims description 3
- 239000004643 cyanate ester Substances 0.000 claims description 3
- FPAFDBFIGPHWGO-UHFFFAOYSA-N dioxosilane;oxomagnesium;hydrate Chemical compound O.[Mg]=O.[Mg]=O.[Mg]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O FPAFDBFIGPHWGO-UHFFFAOYSA-N 0.000 claims description 3
- 239000005350 fused silica glass Substances 0.000 claims description 3
- 239000011256 inorganic filler Substances 0.000 claims description 3
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 3
- 150000004780 naphthols Chemical class 0.000 claims description 3
- 229920003192 poly(bis maleimide) Polymers 0.000 claims description 3
- HECLRDQVFMWTQS-UHFFFAOYSA-N Dicyclopentadiene Chemical compound C1C2C3CC=CC3C1C=C2 HECLRDQVFMWTQS-UHFFFAOYSA-N 0.000 claims description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 2
- 239000004642 Polyimide Substances 0.000 claims description 2
- 150000002118 epoxides Chemical class 0.000 claims description 2
- 125000004185 ester group Chemical group 0.000 claims description 2
- 229920002903 fire-safe polymer Polymers 0.000 claims description 2
- 239000012766 organic filler Substances 0.000 claims description 2
- 229920000620 organic polymer Polymers 0.000 claims description 2
- 229920001721 polyimide Polymers 0.000 claims description 2
- 229920005749 polyurethane resin Polymers 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 229920006337 unsaturated polyester resin Polymers 0.000 claims description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims 3
- 150000002460 imidazoles Chemical class 0.000 claims 1
- 229920003986 novolac Polymers 0.000 claims 1
- 150000004893 oxazines Chemical class 0.000 claims 1
- VDGJOQCBCPGFFD-UHFFFAOYSA-N oxygen(2-) silicon(4+) titanium(4+) Chemical compound [Si+4].[O-2].[O-2].[Ti+4] VDGJOQCBCPGFFD-UHFFFAOYSA-N 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 15
- 230000000052 comparative effect Effects 0.000 description 14
- 239000007788 liquid Substances 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 8
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 8
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- 239000004744 fabric Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 238000000926 separation method Methods 0.000 description 6
- 235000012239 silicon dioxide Nutrition 0.000 description 6
- 230000003068 static effect Effects 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- 239000003292 glue Substances 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 238000000113 differential scanning calorimetry Methods 0.000 description 4
- 125000005842 heteroatom Chemical group 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 229960000549 4-dimethylaminophenol Drugs 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229940043265 methyl isobutyl ketone Drugs 0.000 description 3
- 235000011121 sodium hydroxide Nutrition 0.000 description 3
- 238000007711 solidification Methods 0.000 description 3
- 230000008023 solidification Effects 0.000 description 3
- 238000005292 vacuum distillation Methods 0.000 description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- CMLFRMDBDNHMRA-UHFFFAOYSA-N 2h-1,2-benzoxazine Chemical compound C1=CC=C2C=CNOC2=C1 CMLFRMDBDNHMRA-UHFFFAOYSA-N 0.000 description 2
- UADBQCGSEHKIBH-UHFFFAOYSA-N 3-phenoxy-2,4-dihydro-1h-1,3,5,2,4,6-triazatriphosphinine Chemical compound P1N=PNPN1OC1=CC=CC=C1 UADBQCGSEHKIBH-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- DWSWCPPGLRSPIT-UHFFFAOYSA-N benzo[c][2,1]benzoxaphosphinin-6-ium 6-oxide Chemical compound C1=CC=C2[P+](=O)OC3=CC=CC=C3C2=C1 DWSWCPPGLRSPIT-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 235000012241 calcium silicate Nutrition 0.000 description 2
- 235000013339 cereals Nutrition 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate Chemical compound [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- SEULWJSKCVACTH-UHFFFAOYSA-N 1-phenylimidazole Chemical compound C1=NC=CN1C1=CC=CC=C1 SEULWJSKCVACTH-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- KMRIWYPVRWEWRG-UHFFFAOYSA-N 2-(6-oxobenzo[c][2,1]benzoxaphosphinin-6-yl)benzene-1,4-diol Chemical compound OC1=CC=C(O)C(P2(=O)C3=CC=CC=C3C3=CC=CC=C3O2)=C1 KMRIWYPVRWEWRG-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical class CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- XCZKKZXWDBOGPA-UHFFFAOYSA-N 2-phenylbenzene-1,4-diol Chemical group OC1=CC=C(O)C(C=2C=CC=CC=2)=C1 XCZKKZXWDBOGPA-UHFFFAOYSA-N 0.000 description 1
- RLQZIECDMISZHS-UHFFFAOYSA-N 2-phenylcyclohexa-2,5-diene-1,4-dione Chemical compound O=C1C=CC(=O)C(C=2C=CC=CC=2)=C1 RLQZIECDMISZHS-UHFFFAOYSA-N 0.000 description 1
- 241001120493 Arene Species 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- MHABMANUFPZXEB-UHFFFAOYSA-N O-demethyl-aloesaponarin I Natural products O=C1C2=CC=CC(O)=C2C(=O)C2=C1C=C(O)C(C(O)=O)=C2C MHABMANUFPZXEB-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- AHZMUXQJTGRNHT-UHFFFAOYSA-N [4-[2-(4-cyanatophenyl)propan-2-yl]phenyl] cyanate Chemical compound C=1C=C(OC#N)C=CC=1C(C)(C)C1=CC=C(OC#N)C=C1 AHZMUXQJTGRNHT-UHFFFAOYSA-N 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000005030 aluminium foil Substances 0.000 description 1
- 150000003927 aminopyridines Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 150000003851 azoles Chemical class 0.000 description 1
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical group C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 1
- GMGLYSIINJPYLI-UHFFFAOYSA-N butan-2-one;propan-2-one Chemical compound CC(C)=O.CCC(C)=O GMGLYSIINJPYLI-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- IMHDGJOMLMDPJN-UHFFFAOYSA-N dihydroxybiphenyl Natural products OC1=CC=CC=C1C1=CC=CC=C1O IMHDGJOMLMDPJN-UHFFFAOYSA-N 0.000 description 1
- 229940113088 dimethylacetamide Drugs 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 235000013312 flour Nutrition 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 238000005213 imbibition Methods 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000002467 phosphate group Chemical class [H]OP(=O)(O[H])O[*] 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920006389 polyphenyl polymer Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000000979 retarding effect Effects 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- DXZMANYCMVCPIM-UHFFFAOYSA-L zinc;diethylphosphinate Chemical group [Zn+2].CCP([O-])(=O)CC.CCP([O-])(=O)CC DXZMANYCMVCPIM-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
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- C08J5/241—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres
- C08J5/244—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres using glass fibres
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- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
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- B32B17/02—Layered products essentially comprising sheet glass, or glass, slag, or like fibres in the form of fibres or filaments
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- B32B5/24—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed one layer being a fibrous or filamentary layer
- B32B5/26—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed one layer being a fibrous or filamentary layer another layer next to it also being fibrous or filamentary
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- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6564—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms
- C07F9/6581—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus and nitrogen atoms with or without oxygen or sulfur atoms, as ring hetero atoms
- C07F9/65812—Cyclic phosphazenes [P=N-]n, n>=3
- C07F9/65815—Cyclic phosphazenes [P=N-]n, n>=3 n = 3
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- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
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- C08G63/68—Polyesters containing atoms other than carbon, hydrogen and oxygen
- C08G63/692—Polyesters containing atoms other than carbon, hydrogen and oxygen containing phosphorus
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- C08J5/249—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs characterised by the additives used in the prepolymer mixture
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- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
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- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
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- H05K1/0366—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement reinforced, e.g. by fibres, fabrics
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/0373—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement containing additives, e.g. fillers
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- B32B2307/30—Properties of the layers or laminate having particular thermal properties
- B32B2307/306—Resistant to heat
- B32B2307/3065—Flame resistant or retardant, fire resistant or retardant
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Abstract
The present invention provides a kind of phosphorous active ester and its halogen-free resin composition and use its prepreg and laminate.The halogen-free resin composition includes:(A) thermosetting resin;(B) phosphorous active ester resin.Using prepreg and laminate made of this halogen-free resin composition, there is low dielectric loss factor and can realize halogen-free flameproof.
Description
Technical field
The invention belongs to copper-clad plate technical fields, and in particular to a kind of phosphorous active ester and its halogen-free resin composition and
Use its prepreg, laminate and printed circuit board.
Background technology
Direction with electronic component towards small-size light-weight slimming, high performance, multifunction is developed, and brings therewith
Be high frequency, high speed signal transmission.This requires dielectric constant and the dielectric loss ratio of electronic material are relatively low, these and material
Structure it is related, and low-k, low dielectric loss tangent resin generally have in structure:Big free volume, it is low can pole
Change, low water absorption, low-k structure there are the features such as.In addition, on July 1st, 2006, two parts of environmental protection instructions of European Union
《It is instructed about electric/electronic device is scrapped》With《Restriction on the Use of Certain Hazardous Substances in Electrical and Electronic Equipment》Just
Formula is implemented, and the hot spot for being developed into industry of halogen-free flameproof copper-clad laminate, each copper-clad laminate producer all releases one after another
The halogen-free flameproof copper-clad laminate of oneself.
Phosphorus-containing compound is introduced in the resin matrix of copper-clad plate, becomes the main technological route of copper-clad plate halogen-free flameproof.
Phosphorus flame retardant widely used on copper-clad plate field is broadly divided into two kinds of response type and addition type at present.Response type is mainly
DOPO class compounds, based on phosphorous epoxy resin, phosphorus containing phenolic resin, phosphorus content is between 2~10%.However, practical should
With middle discovery, DOPO classes compound has larger water absorption rate and poor dielectric properties and the plank humidity resistance poor.Addition type
Predominantly phosphonitrile and phosphonate ester compound, the flame retarding efficiency of additive flame retardant is relatively low, and needing to add more amount could reach
To flame-retardancy requirements.It is easy to migrate to plank in laminate process simultaneously because of its relatively low fusing point (generally below 150 DEG C)
Surface influences plate property.
Invention content
The problem of for prior art, the purpose of the present invention is to provide a kind of novel phosphorous active ester, and is drawn
Enter in thermosetting resin, be prepared into halogen-free resin composition and use its prepreg and laminate, carried using it anti-
Answering property group and specific thermosetting resin etc., which react, does not generate secondary hydroxyl, can meet high speed baseplate material low-dielectric loss
The requirement of the factor can meet halogen-free flameproof requirement again, make it possible that high-frequency high-speed baseplate material is non-halogen.
To achieve these goals, the present invention adopts the following technical scheme that:
One of the objects of the present invention is to provide a kind of phosphorous active esters, and it includes the components of the structure as shown in formula (I):
Wherein, R is
R1ForR3For
R2For
M, n represent average degree of polymerization, m, n be 0~3.5 between arbitrary number, such as 0.25,0.5,1,1.2,1.8,
2.05th, 2.8,3 or 3.5, and m ≠ 0, n ≠ 0.
Specifically, phosphorous active ester of the present invention may be used such as lower structure:
The second object of the present invention is to provide a kind of halogen-free resin composition, and it includes following components:
(A) thermosetting resin;
(B) phosphorous active ester resin;
The phosphorous active ester resin has the structure as shown in formula (I):
Wherein, R is
R1ForR3For
R2For
M, n represent average degree of polymerization, m, n be 0~3.5 between arbitrary number, such as 0.25,0.5,1,1.2,1.8,
2.05th, 2.8,3 or 3.5, and m ≠ 0, n ≠ 0.
The concrete structure formula as described in one of the object of the invention may be used in the phosphorous active ester resin.
The present invention is reacted by introducing phosphor-containing structure active ester in thermosetting resin using active ester and epoxy resin etc.
Secondary hydroxyl is not generated;Halogen-free flameproof requirement can be met and improve system electrical property (reducing dielectric loss factor), make it
Realize the non-halogen of high-frequency high-speed baseplate material.
According to the present invention, the thermosetting resin is epoxy resin, benzoxazine colophony, cyanate ester resin, unsaturated poly-
Ester resin, vinylite, bimaleimide resin, BT resins, phenolic resin, polyurethane resin, Thermocurable polyimide,
In aryl ethane resin or furane resins any one or at least two mixture, wherein typical but non-limiting mixed
Closing object is:Epoxy resin and benzoxazine colophony, cyanate ester resin and unsaturated polyester resin, vinylite and span carry out acyl
Imide resin.
In the present invention, the epoxy resin is bisphenol A type epoxy resin, bisphenol f type epoxy resin, dicyclopentadiene epoxy
In resin, biphenyl epoxy resin or naphthols epoxy resin any one or at least two mixture, wherein typical but non-
Restricted mixture is:Bisphenol A type epoxy resin and bisphenol f type epoxy resin, bisphenol F type epoxy tree and dicyclopentadiene ring
Oxygen resin, biphenyl epoxy resin and naphthols epoxy resin.
Preferably, the epoxy resin is biphenyl novolac epoxy resin or/and DCPD novolac epoxy resins, is had both heat-resisting
Property, dielectric properties and low water imbibition.
In the present invention, the ester group equivalent proportion of the epoxide equivalent of the epoxy resin and phosphorous active ester resin is 1:(0.9~
, such as 1 1.1):0.9、1:0.95、1:1、1:1.05 or 1:Specific point value between 1.1 and above-mentioned numerical value, as space is limited and
For it is concise the considerations of, the present invention specific point value that no longer range described in exclusive list includes, preferably 1:(0.95~1.05).
In the present invention, the halogen-free resin composition can also include component (C) curing accelerator, make resin solidification simultaneously
Accelerate resin solidification speed.
Preferably, by the sum of component (A) and component (B) additive amount in terms of 100 parts by weight, the addition of the curing accelerator
Measure as 0.05~1 parts by weight, for example, 0.05 parts by weight, 0.08 parts by weight, 0.1 parts by weight, 0.15 parts by weight, 0.2 parts by weight,
0.25 parts by weight, 0.3 parts by weight, 0.35 parts by weight, 0.4 parts by weight, 0.45 parts by weight, 0.5 parts by weight, 0.55 weight, 0.6 weight
Part, 0.65 parts by weight, 0.7 parts by weight, 0.75 parts by weight, 0.8 parts by weight, 0.85 parts by weight, 0.9 parts by weight or 1 parts by weight are measured,
And the specific point value between above-mentioned numerical value, as space is limited and for it is concise the considerations of, model no longer described in exclusive list of the invention
Enclose including specific point value.
Preferably, the curing accelerator is 4-dimethylaminopyridine, 2-methylimidazole, 2- methyl 4- ethyl imidazol(e)s or 2-
In phenylimidazole any one or at least two mixture, wherein typical but non-limiting mixture is:4- diformazans
Aminopyridine and 2-methylimidazole, 2-methylimidazole and 2- methyl 4- ethyl imidazol(e)s, 2- methyl 4- ethyl imidazol(e)s and 2- phenyl miaows
Azoles.
In the present invention, the halogen-free resin composition can also include component (D) fire-retardant compound, the anti-flammability chemical combination
Object is halogen-free flame retardants.
Preferably, by the sum of additive amount of component (A), component (B) and component (C) in terms of 100 parts by weight, the anti-flammability
The additive amount of compound is 0~50 parts by weight, such as 1 parts by weight, 5 parts by weight, 10 parts by weight, 15 parts by weight, 25 parts by weight, 30
Specific point value between parts by weight, 35 parts by weight, 40 parts by weight, 45 parts by weight or 50 parts by weight and above-mentioned numerical value, is limited to a piece
Width and for it is concise the considerations of, the present invention specific point value that no longer range described in exclusive list includes.
Preferably, the flame retardant type compound is phosphorus containing phenolic resin, phosphorous bismaleimide, phosphinic acids salt, virtue
It is any one in base phosphate type compound, nitrogen phosphorus expanding fire retardant, phosphonitrile type fire retardant or organic polymer fire retardant
Kind or at least two mixture, wherein typical but non-limiting mixture is:Phosphorus containing phenolic resin and phosphorous span come
Acid imide, phosphorous bismaleimide and phosphinic acids salt, nitrogen phosphorus expanding fire retardant and phosphonitrile type fire retardant.
Preferably, the halogen-free resin composition is also comprising component (E) filler, and the filler is organic or/and inorganic fill out
Material, is mainly used to adjust some physical property effects of composition, such as reduces coefficient of thermal expansion (CTE), reduces water absorption rate, improves heat
Conductance etc..
Preferably, by the sum of additive amount of component (A), component (B), component (C) and component (D) in terms of 100 parts by weight, institute
The additive amount of filler is stated as 0~100 parts by weight, preferably 0~50 parts by weight.The additive amount of the filler be, for example, 0.5 parts by weight,
1 parts by weight, 5 parts by weight, 10 parts by weight, 15 parts by weight, 20 parts by weight, 25 parts by weight, 30 parts by weight, 35 parts by weight, 40 weight
Part, 45 parts by weight, 50 parts by weight, 55 parts by weight, 60 parts by weight, 65 parts by weight, 70 parts by weight, 75 parts by weight, 80 parts by weight, 85
Specific point value between parts by weight, 90 parts by weight, 95 parts by weight or 100 parts by weight and above-mentioned numerical value, as space is limited and for
The considerations of concise, the present invention specific point value that no longer range described in exclusive list includes.
Preferably, the inorganic filler is fused silica, powdered quartz, spherical silica, hollow two
Silica, aluminium hydroxide, aluminium oxide, talcum powder, aluminium nitride, boron nitride, silicon carbide, barium sulfate, barium titanate, strontium titanates, carbonic acid
In calcium, calcium silicates, mica or glass fiber powder any one or at least two mixture.The mixture for example melts
The mixture of the mixture of silica and powdered quartz, spherical silica and hollow silicon dioxide, aluminium hydroxide
With the mixture of aluminium oxide, the mixture of talcum powder and aluminium nitride, the mixture of boron nitride and silicon carbide, barium sulfate and barium titanate
Mixture, the mixture of strontium titanates and calcium carbonate, the mixture of calcium silicates, mica and glass fiber powder, fused silica,
The mixture of powdered quartz and spherical silica, the mixture of hollow silicon dioxide, aluminium hydroxide and aluminium oxide are sliding
The mixture of mountain flour, aluminium nitride and boron nitride, the mixture of silicon carbide, barium sulfate and barium titanate, strontium titanates, calcium carbonate, silicic acid
The mixture of calcium, mica and glass fiber powder.
Preferably, the organic filler is any one in polytetrafluorethylepowder powder, polyphenylene sulfide or polyether sulfone powder
Kind or at least two mixture.The mixture of the mixture such as polytetrafluorethylepowder powder and polyphenylene sulfide, polyether sulfone
The mixture of the mixture of powder and polytetrafluorethylepowder powder, polyphenylene sulfide and polyether sulfone powder, polytetrafluorethylepowder powder, polyphenyl
The mixture of thioether and polyether sulfone powder.
Preferably, the filler is silica, and angle value is 1~15 μm in the grain size of filler, in the grain size of preferred filler
Angle value is 1~10 μm.
"comprising" of the present invention, it is intended that it can also include other components, these other components in addition to the component
Assign the halogen-free resin composition different characteristics.In addition to this, "comprising" of the present invention may be replaced by closing
" for " of formula or " by ... form ".
For example, the halogen-free resin composition can also contain various additives, as concrete example, antioxygen can be enumerated
Agent, heat stabilizer, antistatic agent, ultra-violet absorber, pigment, colorant or lubricant etc..These various additives can be single
It solely uses, two kinds or two or more can also be used in mixed way.
The preparation method of the halogen-free resin composition of the present invention is ordinary skill in the art means, and specific method is:
First solid content is put into, then adds in liquid solvent, is stirred to solid content after being completely dissolved, adds liquid resin and promotion
Agent continues to stir evenly.
As the solvent in the present invention, there is no particular limitation, as concrete example, can enumerate methanol, ethyl alcohol, butanol
Wait alcohols, the ethers such as ethyl cellosolve, butyl cellosolve, ethylene glycol monomethyl ether, carbitol, butyl carbitol, acetone, butanone, first
The ketones such as methyl ethyl ketone methyl ketone, cyclohexanone;The arenes such as toluene, dimethylbenzene;The esters such as ethyl acetate, ethoxyethyl acetate
Class;The nitrogen-containing solvents such as N,N-dimethylformamide, DMAC N,N' dimethyl acetamide.More than solvent can be used alone, also can be two kinds
Or it two or more is used in mixed way.It is preferred that the ketones such as acetone, butanone, methyl ethyl ketone, cyclohexanone.The additive amount of the solvent by
Those skilled in the art select according to oneself experience so that resin adhesive liquid reaches the viscosity for being suitble to use.
The third object of the present invention is to provide a kind of prepreg, including reinforcing material and by adhering to after infiltrating drying
Halogen-free resin composition as described above thereon.
Illustrative reinforcing material such as adhesive-bonded fabric or/and other fabrics, for example, natural fiber, organic synthetic fibers and
Inorfil.
Using fabrics or organic fabrics such as glue infiltration reinforcing material such as glass cloth, the reinforcing material infiltrated is existed
Heat drying can obtain prepreg in 5~10 minutes in 155 DEG C of baking oven.
The fourth object of the present invention is to provide a kind of laminate, including an at least prepreg as described above.
The present invention laminate include by be heated and pressurizeed, make prepreg more than a piece of or two panels to be bonded together and
Manufactured laminate and the metal foil being bonded in more than laminate one or both sides.The laminate is in hot press
Curing is made, and solidification temperature is 150~250 DEG C, and solidifying pressure is 10~60kg/cm2.The metal foil for copper foil, nickel foil,
Aluminium foil and SUS foils etc., material is unlimited.
The fifth object of the present invention is to provide a kind of printed circuit board, including at least one preimpregnation as described above
Material.
Compared with prior art, the present invention has the advantages that:
(1) it by introducing the active ester of novel phosphorus-containing structure in thermosetting resin, is reacted using itself and epoxy resin etc.
Secondary hydroxyl is not generated, can meet halogen-free flameproof requirement, can be improved system electrical property (reducing dielectric loss factor) yet, be made height
Frequency high speed baseplate material is non-halogen to be possibly realized;
(2) it is laminated using the prepreg, laminate and clad with metal foil that the halogen-free resin composition is made in the present invention
Plate, has the advantages that low dielectric loss factor, and Df values are realized halogen-free flameproof between 0.0077~0.0099, reached
UL94V-0。
Specific embodiment
The technical solution further illustrated the present invention below by specific embodiment.
As described below is the specific embodiment of the embodiment of the present invention, it is noted that for the common skill of the art
For art personnel, under the premise of principle of the embodiment of the present invention is not departed from, several improvements and modifications can also be made, these improvement
The protection domain of the embodiment of the present invention is also considered as with retouching.
Divide multiple embodiments that the embodiment of the present invention is further detailed below.The embodiment of the present invention be not limited to
Under specific embodiment.Do not changing in the scope of the claims, can suitably change implementation.
Synthesis example 1
160g (0.5mol) is added in the flask for being equipped with thermometer, dropping funel, condenser pipe, fractionating column, blender
10- (2,5- dihydroxy phenyls) -10- hydrogen -9- oxa- -10- phospho hetero phenanthrene -10- oxides (ODOPB) and 360g hydroxyl phenoxy groups
Three phosphonitrile of ring (wherein dihydroxy content is more than 60%) and 816g methyl iso-butyl ketone (MIBK)s (MIBK), put nitrogen is depressurized in system
It changes, makes its dissolving.Then put into 182.7g (0.9mol) paraphthaloyl chloride, react 2h, in system temperature control 60 DEG C with
Under;Then, 114g (1.2mol) phenol, the reaction was continued 1h are added in into system;Under logical condition of nitrogen gas, it is slowly added dropwise 189g's
20% sodium hydrate aqueous solution;Continue stirring 1 hour under this condition.After reaction, static liquid separation removes water layer.It is reacting
Water is put into the MIBK phases of object dissolving, is stirred, static liquid separation, removes water layer.Aforesaid operations are repeated until the pH of water layer reaches
To 7.0 or so.Then moisture is sloughed by decanter, MIBK is sloughed in then vacuum distillation, obtains phosphorous active ester Resin A 1.
Synthesis example 2
185g10- (2,5- are added in the flask for being equipped with thermometer, dropping funel, condenser pipe, fractionating column, blender
Dihydroxy naphthalene) -10- hydrogen -9- oxa- -10- phospho hetero phenanthrene -10- oxides and 360g hydroxyls phenoxy cyclotriphosphazene (wherein two
60%) hydroxy radical content is more than with 816g methyl iso-butyl ketone (MIBK)s (MIBK), nitrogen displacement will be depressurized in system, makes its dissolving.Then
182.7g (0.9mol) paraphthaloyl chloride is put into, reacts 2h, temperature control is below 60 DEG C in system;Then, into system
Add in 114g (1.2mol) phenol, the reaction was continued 1h;Under logical condition of nitrogen gas, 20% sodium hydroxide that 189g is slowly added dropwise is water-soluble
Liquid;Continue stirring 1 hour under this condition.After reaction, static liquid separation removes water layer.In the MIBK phases of reactant dissolving
Water is put into, is stirred, static liquid separation, removes water layer.Aforesaid operations are repeated until the pH of water layer reaches 7.0 or so.Then lead to
It crosses decanter and sloughs moisture, MIBK is sloughed in then vacuum distillation, obtains phosphorous active ester Resin A 2.
Synthesis example 3
DOPO and Phenylbenzoquinone by addition reaction or product, recrystallized in ethoxy ethanol, obtain 10- (2,5-
Dihydroxybiphenyl base) -10- hydrogen -9- oxa- -10- phospho hetero phenanthrene -10- oxides.
190g10- (2,5- are added in the flask for being equipped with thermometer, dropping funel, condenser pipe, fractionating column, blender
Dihydroxybiphenyl base) -10- hydrogen -9- oxa- -10- phospho hetero phenanthrene -10- oxides, 360g hydroxyls phenoxy cyclotriphosphazene (its
60%) middle dihydroxy content is more than with 816g methyl iso-butyl ketone (MIBK)s (MIBK), nitrogen displacement will be depressurized in system, makes its dissolving.
Then, 182.7g (0.9mol) paraphthaloyl chloride is put into, reacts 2h, temperature control is below 60 DEG C in system;Then, Xiang Ti
114g (1.2mol) phenol, the reaction was continued 1h are added in system;Under logical condition of nitrogen gas, the 20% sodium hydroxide water of 189g is slowly added dropwise
Solution;Continue stirring 1 hour under this condition.After reaction, static liquid separation removes water layer.In the MIBK phases of reactant dissolving
Middle input water, is stirred, static liquid separation, removes water layer.Aforesaid operations are repeated until the PH of water layer reaches 7.0 or so.Then
Moisture is sloughed by decanter, MIBK is sloughed in then vacuum distillation, obtains phosphorous active ester Resin A 3.
In table all in terms of solid component parts by weight, the material that wherein table 1 is enumerated is specific as follows:
627:Bisphenol A-type novolac epoxy resin (U.S.'s Hexion trade names)
7200-3H:Dicyclopentadiene type novolac epoxy resin (Japanese DIC trade names)
NC-3000H:Biphenyl type novolac epoxy resin (the Japanization pharmacist name of an article)
HP8000:Dicyclopentadiene type active ester (Japanese DIC trade names)
CE-01PS:Bisphenol A cyanate ester (Yangzhou apocalypse trade name)
Filler:Ball-shaped silicon micro powder DQ1040 (Jiangsu joins auspicious trade name)
Fire retardant:Phosphonitrile fire retardant SPB100 (big tomb commodity chemical name)
A1:Phosphor-containing structure active ester described in synthesis example 1
A2:Phosphor-containing structure active ester described in synthesis example 2
A3:Phosphor-containing structure active ester described in synthesis example 3
DMAP:4-dimethylaminopyridine, accelerating agent (wide honor commodity chemical name)
Embodiment 1
A container is taken, adds in the 627 of 60 parts by weight, equivalent A1 active esters is added in and continues to stir, add in suitable curing
Accelerating agent 4-dimethylaminopyridine continues to stir evenly, and is finally made of solvent adjustment liquid solid content to 60%~80%
Glue.Impregnate above-mentioned glue with glass fabric, glue.Above-mentioned glue is impregnated, and control to appropriate with glass fabric
Thickness, then drying remove solvent and obtain prepreg.It is superimposed with each other using the prepreg obtained by several, in its both sides point
A copper foil is not covered, puts curing in hot press into and the epoxy resin copper-clad plate lamination plate is made.Physical data such as 1 institute of table
Show.
Implementation column 2~10
Manufacture craft and embodiment 1 are identical, and formula composition and its physical index are as shown in table 1~2.
Comparative example 1~6
Manufacture craft is same as Example 1, and formula composition and its physical index are as shown in table 2.
Table 1
Substance | Embodiment 1 | Embodiment 2 | Embodiment 3 | Embodiment 4 | Embodiment 5 | Embodiment 6 | Embodiment 7 | Embodiment 8 |
627 | 60 | |||||||
7200-3H | 60 | |||||||
NC-3000H | 60 | 60 | 60 | 60 | 60 | 60 | ||
A1 | 1eq | 1eq | 1eq | 0.9eq | 1.1eq | 1eq | ||
A2 | 1eq | |||||||
A3 | 1eq | |||||||
CE-01PS | ||||||||
Filler | 20 | |||||||
DMAP | 0.05 | 0.06 | 0.07 | 0.08 | 0.08 | 0.08 | 0.07 | 0.07 |
Tg(DSC)/℃ | 180 | 177 | 167 | 168 | 165 | 168 | 168 | 170 |
Dk(10GHz) | 3.97 | 3.86 | 3.96 | 3.96 | 3.95 | 3.95 | 3.96 | 4.03 |
Df(10GHz) | 0.0099 | 0.0094 | 0.0090 | 0.0090 | 0.0089 | 0.0089 | 0.0089 | 0.0087 |
Flame-retarding characteristic | V-0 | V-0 | V-0 | V-0 | V-0 | V-0 | V-0 | V-0 |
Table 2
Substance | Embodiment 9 | Embodiment 10 | Comparative example 1 | Comparative example 2 | Comparative example 3 | Comparative example 4 | Comparative example 5 | Comparative example 6 |
NC-3000H | 60 | 60 | 60 | 60 | 60 | 60 | 60 | 60 |
A1 | 20 | 20 | ||||||
A2 | ||||||||
A3 | ||||||||
HP8000 | 1eq | 1eq | 1eq | 20 | 20 | 20 | ||
CE-01PS | 20 | 20 | 20 | 20 | 20 | |||
Filler | 20 | 20 | 20 | |||||
Fire retardant | 15 | 15 | 15 | 15 | ||||
DMAP | 0.05 | 0.05 | 0.07 | 0.08 | 0.08 | 0.08 | 0.08 | 0.08 |
Tg(DSC)/℃ | 188 | 192 | 155 | 148 | 150 | 182 | 175 | 178 |
Dk(10GHz) | 3.96 | 4.03 | 3.95 | 3.96 | 4.02 | 4.02 | 4.08 | 4.06 |
Df(10GHz) | 0.0079 | 0.0077 | 0.0095 | 0.0010 | 0.0098 | 0.0086 | 0.0089 | 0.0087 |
Flame-retarding characteristic | V-0 | V-0 | V-2 | V-0 | V-0 | V-2 | V-0 | V-0 |
The test method of more than characteristic is as follows:
(1) glass transition temperature (Tg):According to differential scanning calorimetry (DSC), according to IPC-TM-6502.4.25 institutes
Defined DSC method is measured.
(2) dielectric constant and dielectric loss factor:Method according to IPC-TM-650 2.5.5.9 defineds is tested,
Test frequency is 10GHz.
(3) anti-flammability:It is carried out according to 94 standard methods of UL.
Physical Property Analysis:
By Examples 1 to 10 in table 1~2 it is found that introducing phosphorous active ester curing agent after, contain P element and N element and sky
Between the larger chemical constitution of free volume, P element therein meets UL94V-0 grades of flame-retardancy requirements with N element by synergistic effect,
And the free volume of bigger makes system be respectively provided with relatively low dielectric loss factor and disclosure satisfy that UL94V-0 grades of flame-retardancy requirements.
By the comparative example 1 of table 2 it is found that after introducing dicyclopentadiene type active curing agent, there is system relatively low dielectric to damage
The factor is consumed, but the flame-retardancy requirements of UL94 cannot be met, and dicyclopentadiene type active ester curing agent and phosphonitrile are added in comparative example 2
Although can meet UL94 flame-retardancy requirements after fire retardant, dielectric loss factor is increased slightly.And from embodiment 3~7 it is found that opposite
In comparative example 1 and comparative example 2, since the cooperative flame retardant effect of the P in structure and N makes it meet UL94V-0 grades of flame-retardancy requirements
While due to introducing the big chemical constitution of space free volume, make system with lower dielectric loss factor and with higher
Glass transition temperature.
By embodiment 8 in table 1 it is found that after silica filler is introduced, system has lower dielectric loss factor, and
Meet UL94V-0 grades of flame-retardancy requirements.
By embodiment 9 in table 2 and embodiment 10 it is found that after cyanate and filler is introduced, the dielectric loss factor of system
It further reduces, down to 0.0077, and meets UL94V-0 grades of flame-retardancy requirements.
By the comparative example 4 of table 2 it is found that the dielectric loss factor of system can be reduced by introducing cyanate, but still can not meet
UL94V-0 grades of flame-retardancy requirements;By comparative example 5 and comparative example 6 it is found that flame retardant property can be improved, but dielectric is damaged by introducing fire retardant
The consumption factor increased, even if by reducing the dielectric loss factor of system after adding filler but remaining above embodiment 9 and implementation
The dielectric loss factor of 10 system of example.
As described above, compared with general laminate, the circuit base material of halogen-free composition of the invention has low Jie
Matter fissipation factor and it can realize halogen-free flameproof.
The above, only presently preferred embodiments of the present invention, for those of ordinary skill in the art, can basis
Technical scheme of the present invention and technical concept make other various corresponding changes and deformation, and all these changes and deformation are all
The range of the claims in the present invention should be belonged to.
Applicant states that the present invention illustrates the method detailed of the present invention, but not office of the invention by above-described embodiment
It is limited to above-mentioned method detailed, that is, does not mean that the present invention has to rely on above-mentioned method detailed and could implement.Technical field
Technical staff it will be clearly understood that any improvement in the present invention, equivalence replacement and auxiliary element to each raw material of product of the present invention
Addition, selection of concrete mode etc., all fall within protection scope of the present invention and the open scope.
Claims (9)
1. a kind of phosphorous active ester, which is characterized in that it includes the components of the structure as shown in formula (I):
Wherein, R is
R1ForR3For
R2For
M, n represent average degree of polymerization, and m, n are the arbitrary number between 0~3.5, and m ≠ 0, n ≠ 0.
2. a kind of halogen-free resin composition, which is characterized in that the halogen-free resin composition includes following component:
(A) thermosetting resin;
(B) phosphorous active ester resin;
The phosphorous active ester resin has the structure as shown in formula (I):
Wherein, R is
R1ForR3For
R2For
M, n represent average degree of polymerization, and m, n are the arbitrary number between 0~3.5, and m ≠ 0, n ≠ 0.
3. halogen-free resin composition as claimed in claim 2, which is characterized in that the thermosetting resin is epoxy resin, benzene
Bing oxazines resin, cyanate ester resin, unsaturated polyester resin, vinylite, bimaleimide resin, BT resins, phenolic aldehyde
Any one in resin, polyurethane resin, Thermocurable polyimide, aryl ethane resin or furane resins or at least two
Mixture;
Preferably, the epoxy resin for bisphenol A type epoxy resin, bisphenol f type epoxy resin, DCPD-containing epoxy resin,
In biphenyl epoxy resin or naphthols epoxy resin any one or at least two mixture, preferably biphenyl epoxy novolac
Resin or/and dicyclopentadiene novolac epoxy resin;
Preferably, the ester group equivalent proportion of the epoxide equivalent of the epoxy resin and phosphorous active ester resin is 1:(0.9~1.1),
It is preferred that 1:(0.95~1.05).
4. halogen-free resin composition as claimed in claim 2 or claim 3, which is characterized in that the halogen-free resin composition also includes
Component (C) curing accelerator;
Preferably, by the sum of component (A) and component (B) additive amount in terms of 100 parts by weight, the additive amount of the curing accelerator is
0.05~1 parts by weight;
Preferably, the curing accelerator is 4-dimethylaminopyridine, 2-methylimidazole, 2- methyl 4- ethyl imidazol(e)s or 2- phenyl
In imidazoles any one or at least two mixture.
5. the halogen-free resin composition as described in one of claim 2-4, which is characterized in that the halogen-free resin composition also wraps
Containing component (D) fire-retardant compound;
Preferably, by the sum of additive amount of component (A), component (B) and component (C) in terms of 100 parts by weight, the anti-flammability chemical combination
The additive amount of object is 0~50 parts by weight;
Preferably, the fire-retardant compound is phosphorus containing phenolic resin, phosphorous bismaleimide, phosphinic acids salt, aryl phosphorus
In acid esters type compound, nitrogen phosphorus expanding fire retardant, phosphonitrile type fire retardant or organic polymer fire retardant any one or
The mixture of person at least two.
6. the halogen-free resin composition as described in one of claim 2-5, which is characterized in that the halogen-free resin composition also wraps
Containing component (E) filler;
Preferably, the filler is organic or/and inorganic filler;
Preferably, it is described to fill out by the sum of additive amount of component (A), component (B), component (C) and component (D) in terms of 100 parts by weight
The additive amount of material be 0~100 parts by weight, preferably 0~50 parts by weight;
Preferably, the inorganic filler is fused silica, powdered quartz, spherical silica, hollow titanium dioxide
Silicon, aluminium hydroxide, aluminium oxide, talcum powder, aluminium nitride, boron nitride, silicon carbide, barium sulfate, barium titanate, strontium titanates, calcium carbonate, silicon
In sour calcium, mica or glass fiber powder any one or at least two mixture;
Preferably, the organic filler for any one in polytetrafluorethylepowder powder, polyphenylene sulfide or polyether sulfone powder or
At least two mixture;
Preferably, the filler is silica, and angle value is 1~15 μm, preferably 1~10 μm in the grain size of filler.
7. a kind of prepreg, including reinforcing material and by be impregnated with it is dry after adhere to thereon such as one of claim 2-6 institutes
The halogen-free resin composition stated.
8. a kind of laminate, including an at least prepreg as claimed in claim 7.
9. a kind of printed circuit board, including an at least prepreg as claimed in claim 7.
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CN201611240101.1A CN108250676B (en) | 2016-12-28 | 2016-12-28 | A kind of phosphorous active ester and its halogen-free composition and copper clad foil substrate |
JP2019504744A JP2019531262A (en) | 2016-12-28 | 2017-05-24 | Phosphorus-containing active ester, non-halogen composition thereof, and copper-clad laminate |
PCT/CN2017/085673 WO2018120614A1 (en) | 2016-12-28 | 2017-05-24 | Phosphorus-containing active ester, halogen-free composition and copper-clad foil substrate thereof |
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CN110181903A (en) * | 2019-06-06 | 2019-08-30 | 江门建滔电子发展有限公司 | A kind of high-frequency high-speed copper-clad plate and preparation method thereof |
CN113214461A (en) * | 2020-01-15 | 2021-08-06 | 苏州生益科技有限公司 | Active ester resin and resin composition thereof |
CN113717493A (en) * | 2021-09-09 | 2021-11-30 | 明光瑞智电子科技有限公司 | Halogen-free low-expansion-coefficient resin composition for copper-clad plate |
Families Citing this family (3)
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JP6830586B1 (en) * | 2020-07-22 | 2021-02-17 | 株式会社伏見製薬所 | Cyclic phosphazene compound having an oxaphosphorin ring-containing structure |
CN113234103B (en) * | 2021-05-28 | 2023-07-25 | 青岛大学 | Phosphazene flame retardant, preparation method and application thereof |
KR102574707B1 (en) * | 2022-12-06 | 2023-09-06 | 주식회사 신아티앤씨 | Epoxy resin containg Phosphorus |
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JP2012251133A (en) * | 2011-05-10 | 2012-12-20 | Ajinomoto Co Inc | Resin composition |
CN105153234A (en) * | 2014-06-13 | 2015-12-16 | 广东生益科技股份有限公司 | Phenoxy cyclotriphosphazene active ester, halogen free resin composition and application thereof |
CN105392817A (en) * | 2013-06-10 | 2016-03-09 | Dic株式会社 | Active ester resin containing phosphorus atom, epoxy resin composition and cured product thereof, prepreg, circuit board, and build-up film |
-
2016
- 2016-12-28 CN CN201611240101.1A patent/CN108250676B/en active Active
-
2017
- 2017-05-24 JP JP2019504744A patent/JP2019531262A/en not_active Withdrawn
- 2017-05-24 WO PCT/CN2017/085673 patent/WO2018120614A1/en active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012251133A (en) * | 2011-05-10 | 2012-12-20 | Ajinomoto Co Inc | Resin composition |
CN105392817A (en) * | 2013-06-10 | 2016-03-09 | Dic株式会社 | Active ester resin containing phosphorus atom, epoxy resin composition and cured product thereof, prepreg, circuit board, and build-up film |
CN105153234A (en) * | 2014-06-13 | 2015-12-16 | 广东生益科技股份有限公司 | Phenoxy cyclotriphosphazene active ester, halogen free resin composition and application thereof |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN110181903A (en) * | 2019-06-06 | 2019-08-30 | 江门建滔电子发展有限公司 | A kind of high-frequency high-speed copper-clad plate and preparation method thereof |
CN113214461A (en) * | 2020-01-15 | 2021-08-06 | 苏州生益科技有限公司 | Active ester resin and resin composition thereof |
CN113717493A (en) * | 2021-09-09 | 2021-11-30 | 明光瑞智电子科技有限公司 | Halogen-free low-expansion-coefficient resin composition for copper-clad plate |
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CN108250676B (en) | 2019-08-27 |
JP2019531262A (en) | 2019-10-31 |
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