CN108246235A - 一种光气气相法连续生产hdi的喷嘴 - Google Patents

一种光气气相法连续生产hdi的喷嘴 Download PDF

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Publication number
CN108246235A
CN108246235A CN201611270951.6A CN201611270951A CN108246235A CN 108246235 A CN108246235 A CN 108246235A CN 201611270951 A CN201611270951 A CN 201611270951A CN 108246235 A CN108246235 A CN 108246235A
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China
Prior art keywords
nozzle
spray
road
spray road
vent
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CN201611270951.6A
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姚振华
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Chongqing Changfeng Biotechnology Co Ltd
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Chongqing Changfeng Biotechnology Co Ltd
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Priority to CN201611270951.6A priority Critical patent/CN108246235A/zh
Publication of CN108246235A publication Critical patent/CN108246235A/zh
Pending legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/26Nozzle-type reactors, i.e. the distribution of the initial reactants within the reactor is effected by their introduction or injection through nozzles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/14Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with multiple outlet openings; with strainers in or outside the outlet opening
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C263/00Preparation of derivatives of isocyanic acid
    • C07C263/10Preparation of derivatives of isocyanic acid by reaction of amines with carbonyl halides, e.g. with phosgene

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

本发明提出了一种光气气相法连续生产HDI的喷嘴,包括从内到外依次设置的第一喷道、第二喷道及第三喷道,三个喷道的前后各自设有喷嘴喷口和喷嘴入口,所述第一喷道的喷嘴喷口用于喷射己二胺,所述第二喷道的喷嘴喷口用于喷射氮气,所述第三喷道的喷嘴喷口用于喷射光气。本发明利用氮气保护喷嘴,使喷嘴运行过程中不发生堵塞,保证反应能快速稳定进行,持续时间长,能够工业化生产。

Description

一种光气气相法连续生产HDI的喷嘴
技术领域
本发明涉及化工领域,特别是指一种光气气相法连续生产HDI的喷嘴。
背景技术
光气气相法制备HDI其核心是反应器,其中喷嘴又是反应器的重中之重,如何确保生产过程中喷嘴不堵塞实现连续运行是保证生产能否长时间运行的关键点。
发明内容
有鉴于此,本发明提出了一种光气气相法连续生产HDI的喷嘴,解决喷嘴容易堵塞,不能长时间运行的问题。
为解决上述技术问题,本发明采用以下技术方案予以实现:
一种光气气相法连续生产HDI的喷嘴,包括从内到外依次设置的第一喷道、第二喷道及第三喷道,三个喷道的前后各自设有喷嘴喷口和喷嘴入口,所述第一喷道的喷嘴喷口用于喷射己二胺,所述第二喷道的喷嘴喷口用于喷射氮气,所述第三喷道的喷嘴喷口用于喷射光气,第二喷道的喷嘴喷射的氮气用于对喷嘴进行保护,同时稀释己二胺,避免己二胺与光气生产盐类物质或者聚合体附在喷嘴出口及周边,防止喷嘴被堵塞,延长喷嘴运行时间。
作为优选地,所述第一喷道和第二喷道都具有缩小段,所述第三喷道具有扩大段,喷嘴整体外径大小不变。
与现有技术相比,本发明具有的有益效果为:本发明利用氮气保护喷嘴,使喷嘴运行过程中不发生堵塞,保证反应能快速稳定进行,持续时间长,能够工业化生产。
附图说明
图1为本发明优选实施例的结构示意图;
图2为本发明优选实施例的喷嘴的喷口端正视示意图。
具体实施方式
为让本领域的技术人员更加清晰直观的了解本发明,下面将结合附图,对本发明作进一步的说明。
如图1-2所示为本发明的优选实施例。
一种光气气相法连续生产HDI的喷嘴,包括从内到外依次设置的第一喷道1、第二喷道2及第三喷道3,三个喷道的前后各自设有喷嘴喷口和喷嘴入口,第一喷道1的喷嘴喷口用于喷射己二胺,第二喷道2的喷嘴喷口用于喷射氮气,第三喷道3的喷嘴喷口用于喷射光气,第二喷道2的喷嘴喷射的氮气用于对喷嘴进行保护,同时稀释己二胺,避免己二胺与光气生产盐类物质或者聚合体附在喷嘴出口及周边,防止喷嘴被堵塞,延长喷嘴运行时间。
具体地,本实施例中,第一喷道1和第二喷道2都具有缩小段,第三喷道3具有扩大段,喷嘴整体外径大小不变。
以上所述仅为本发明的较佳实施例而已,并不用以限制本发明,凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。

Claims (2)

1.一种光气气相法连续生产HDI的喷嘴,其特征在于,包括从内到外依次设置的第一喷道、第二喷道及第三喷道,三个喷道的前后各自设有喷嘴喷口和喷嘴入口,所述第一喷道的喷嘴喷口用于喷射己二胺,所述第二喷道的喷嘴喷口用于喷射氮气,所述第三喷道的喷嘴喷口用于喷射光气。
2.根据权利要求1所述的喷嘴,其特征在于,所述第一喷道和第二喷道都具有缩小段,所述第三喷道具有扩大段,喷嘴整体外径大小不变。
CN201611270951.6A 2016-12-29 2016-12-29 一种光气气相法连续生产hdi的喷嘴 Pending CN108246235A (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201611270951.6A CN108246235A (zh) 2016-12-29 2016-12-29 一种光气气相法连续生产hdi的喷嘴

Applications Claiming Priority (1)

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CN201611270951.6A CN108246235A (zh) 2016-12-29 2016-12-29 一种光气气相法连续生产hdi的喷嘴

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CN108246235A true CN108246235A (zh) 2018-07-06

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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6513736B1 (en) * 1996-07-08 2003-02-04 Corning Incorporated Gas-assisted atomizing device and methods of making gas-assisted atomizing devices
CN1425647A (zh) * 2001-12-14 2003-06-25 拜尔公司 (聚)异氰酸酯气相制备的改良方法
CN101063052A (zh) * 2006-04-24 2007-10-31 通用电气公司 煤浆喷射器及其使用方法
CN101357316A (zh) * 2008-09-09 2009-02-04 宁波万华聚氨酯有限公司 一种三膜并流反应器及利用该反应器制备异氰酸酯的方法
CN101583594A (zh) * 2006-11-07 2009-11-18 巴斯夫欧洲公司 生产异氰酸酯的方法
US20100130772A1 (en) * 2005-04-08 2010-05-27 Huntsman International Llc Spiral mixer nozzle and method for mixing two or more fluids and process for manufacturing isocyanates
WO2014091011A1 (en) * 2012-12-14 2014-06-19 Basf Se A method of toluene diamine (tda) phosgenation in the gaseous phase in a specifically constructed reactor

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6513736B1 (en) * 1996-07-08 2003-02-04 Corning Incorporated Gas-assisted atomizing device and methods of making gas-assisted atomizing devices
CN1425647A (zh) * 2001-12-14 2003-06-25 拜尔公司 (聚)异氰酸酯气相制备的改良方法
US20100130772A1 (en) * 2005-04-08 2010-05-27 Huntsman International Llc Spiral mixer nozzle and method for mixing two or more fluids and process for manufacturing isocyanates
CN101063052A (zh) * 2006-04-24 2007-10-31 通用电气公司 煤浆喷射器及其使用方法
CN101583594A (zh) * 2006-11-07 2009-11-18 巴斯夫欧洲公司 生产异氰酸酯的方法
CN101357316A (zh) * 2008-09-09 2009-02-04 宁波万华聚氨酯有限公司 一种三膜并流反应器及利用该反应器制备异氰酸酯的方法
WO2014091011A1 (en) * 2012-12-14 2014-06-19 Basf Se A method of toluene diamine (tda) phosgenation in the gaseous phase in a specifically constructed reactor

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Application publication date: 20180706