CN108220888B - 适用于脉冲激光镀膜的加热装置及其脉冲激光镀膜装置 - Google Patents
适用于脉冲激光镀膜的加热装置及其脉冲激光镀膜装置 Download PDFInfo
- Publication number
- CN108220888B CN108220888B CN201711451137.9A CN201711451137A CN108220888B CN 108220888 B CN108220888 B CN 108220888B CN 201711451137 A CN201711451137 A CN 201711451137A CN 108220888 B CN108220888 B CN 108220888B
- Authority
- CN
- China
- Prior art keywords
- target
- heating
- coating
- pulse laser
- distance adjusting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (8)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711451137.9A CN108220888B (zh) | 2017-12-27 | 2017-12-27 | 适用于脉冲激光镀膜的加热装置及其脉冲激光镀膜装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711451137.9A CN108220888B (zh) | 2017-12-27 | 2017-12-27 | 适用于脉冲激光镀膜的加热装置及其脉冲激光镀膜装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN108220888A CN108220888A (zh) | 2018-06-29 |
CN108220888B true CN108220888B (zh) | 2019-12-27 |
Family
ID=62649314
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201711451137.9A Active CN108220888B (zh) | 2017-12-27 | 2017-12-27 | 适用于脉冲激光镀膜的加热装置及其脉冲激光镀膜装置 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN108220888B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021204390A1 (en) * | 2020-04-09 | 2021-10-14 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Thermal laser evaporation system and method of providing a thermal laser beam at a source |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108977791B (zh) * | 2018-07-24 | 2020-03-27 | 电子科技大学 | 一种用于高温下卷绕沉积薄膜的通电加热装置 |
CN110055491B (zh) * | 2019-05-14 | 2021-07-06 | 淮安亮谷光电科技有限公司 | 全镀金的高反射红外线加热空心管的制备方法 |
CN118028745A (zh) * | 2023-07-27 | 2024-05-14 | 上海超导科技股份有限公司 | 用于离子束辅助沉积镀膜装置的走带系统 |
CN116904956A (zh) * | 2023-07-27 | 2023-10-20 | 上海超导科技股份有限公司 | 卷对卷磁控溅射镀膜装置 |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6066836A (en) * | 1996-09-23 | 2000-05-23 | Applied Materials, Inc. | High temperature resistive heater for a process chamber |
JP2009231712A (ja) * | 2008-03-25 | 2009-10-08 | Sumitomo Heavy Ind Ltd | レーザ加工方法及び半導体装置 |
CN201545909U (zh) * | 2009-09-30 | 2010-08-11 | 北京有色金属研究总院 | 连续的脉冲激光镀膜装置 |
EP1181707B1 (en) * | 1999-06-11 | 2010-09-01 | Applied Biosystems, LLC | Maldi ion source with a pulse of gas, apparatus and method for determining molecular weight of labile molecules |
CN101942642A (zh) * | 2006-04-17 | 2011-01-12 | Imra美国公司 | P型半导体氧化锌薄膜,其制备方法,和使用透明基片的脉冲激光沉积方法 |
CN102031491A (zh) * | 2009-09-30 | 2011-04-27 | 北京有色金属研究总院 | 一种连续的脉冲激光镀膜装置 |
CN102560378A (zh) * | 2010-12-21 | 2012-07-11 | 北京有色金属研究总院 | 一种提高连续制备ybco带材临界电流的方法 |
CN103276366A (zh) * | 2013-05-20 | 2013-09-04 | 上海超导科技股份有限公司 | 适合于卷对卷连续化带材制备工艺的箱式加热器 |
CN204618912U (zh) * | 2015-04-10 | 2015-09-09 | 天津宇林昊科技有限公司 | 一种有机肥杀菌处理装置 |
US9158008B2 (en) * | 2011-05-05 | 2015-10-13 | Ut-Battelle, Llc | High spatial resolution particle detectors |
CN106987808A (zh) * | 2017-05-15 | 2017-07-28 | 成都西沃克真空科技有限公司 | 一种镀膜机用基片加热装置 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050005846A1 (en) * | 2003-06-23 | 2005-01-13 | Venkat Selvamanickam | High throughput continuous pulsed laser deposition process and apparatus |
-
2017
- 2017-12-27 CN CN201711451137.9A patent/CN108220888B/zh active Active
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6066836A (en) * | 1996-09-23 | 2000-05-23 | Applied Materials, Inc. | High temperature resistive heater for a process chamber |
EP1181707B1 (en) * | 1999-06-11 | 2010-09-01 | Applied Biosystems, LLC | Maldi ion source with a pulse of gas, apparatus and method for determining molecular weight of labile molecules |
CN101942642A (zh) * | 2006-04-17 | 2011-01-12 | Imra美国公司 | P型半导体氧化锌薄膜,其制备方法,和使用透明基片的脉冲激光沉积方法 |
JP2009231712A (ja) * | 2008-03-25 | 2009-10-08 | Sumitomo Heavy Ind Ltd | レーザ加工方法及び半導体装置 |
CN201545909U (zh) * | 2009-09-30 | 2010-08-11 | 北京有色金属研究总院 | 连续的脉冲激光镀膜装置 |
CN102031491A (zh) * | 2009-09-30 | 2011-04-27 | 北京有色金属研究总院 | 一种连续的脉冲激光镀膜装置 |
CN102560378A (zh) * | 2010-12-21 | 2012-07-11 | 北京有色金属研究总院 | 一种提高连续制备ybco带材临界电流的方法 |
US9158008B2 (en) * | 2011-05-05 | 2015-10-13 | Ut-Battelle, Llc | High spatial resolution particle detectors |
CN103276366A (zh) * | 2013-05-20 | 2013-09-04 | 上海超导科技股份有限公司 | 适合于卷对卷连续化带材制备工艺的箱式加热器 |
CN204618912U (zh) * | 2015-04-10 | 2015-09-09 | 天津宇林昊科技有限公司 | 一种有机肥杀菌处理装置 |
CN106987808A (zh) * | 2017-05-15 | 2017-07-28 | 成都西沃克真空科技有限公司 | 一种镀膜机用基片加热装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021204390A1 (en) * | 2020-04-09 | 2021-10-14 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Thermal laser evaporation system and method of providing a thermal laser beam at a source |
Also Published As
Publication number | Publication date |
---|---|
CN108220888A (zh) | 2018-06-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN108179386B (zh) | 脉冲激光镀膜装置 | |
CN108220888B (zh) | 适用于脉冲激光镀膜的加热装置及其脉冲激光镀膜装置 | |
US7501145B2 (en) | High throughput continuous pulsed laser deposition process | |
CN108277461B (zh) | 适用于脉冲激光镀膜的防污装置及其脉冲激光镀膜装置 | |
Okunev et al. | Amorphous state and pulsed laser deposition of YBa2Cu3O7− δ thin films | |
EP0731189B1 (en) | Apparatus and method for depositing films on substrate via on-axis laser ablation | |
CN108277457B (zh) | 适用于脉冲激光镀膜的光路装置及其脉冲激光镀膜装置 | |
Kaneko et al. | Floating zone furnace equipped with a high power laser of 1 kW composed of five smart beams | |
US10741649B2 (en) | High mobility doped metal oxide thin films and reactive physical vapor deposition methods of fabricating the same | |
Izumi et al. | Superconductivity and crystallinity of Ba2Y1Cu3O7− δ thin films prepared by pulsed laser deposition with substrate bias voltage | |
US5281575A (en) | Laser ablation method for forming oxide superconducting films | |
JP5544271B2 (ja) | 酸化物超電導体薄膜の成膜方法および成膜装置 | |
KR100834114B1 (ko) | 2축 배향성을 갖는 금속 선재를 제조하기 위한아이비에이디 시스템 | |
JP2011146234A (ja) | 酸化物超電導膜の製造方法 | |
JP3465041B2 (ja) | Yag第5高調波パルスレーザ蒸着による薄膜の作製方法およびその装置 | |
Manabe et al. | Distribution of inductive J/sub c/in two-dimensional large-size YBCO films prepared by fluorine-free MOD on CeO/sub 2/-buffered sapphire | |
Kaidashev et al. | Shadowed Off-Axis Pulsed Laser Deposition of YBa2Cu3O7− x Thin Films | |
JP3522402B2 (ja) | 酸化物超電導導体の製造方法及び製造装置 | |
Auyeung et al. | In situ pulsed laser deposition of large-area ceramic and multilayer films for applications in industry | |
Song et al. | The Effect of Laser Energy and Target–Substrate Distance on the Quality of CeO 2 Seed Layer Deposited by PLD | |
JP5658891B2 (ja) | 酸化物超電導膜の製造方法 | |
Christen | PULSED LASER DEPOSITION OF YBa2 Cu3O7-8 FOR COATED CONDUCTOR APPLICATIONS: CURRENT STATUS AND COST ISSUES | |
Porokhov et al. | The physical basis of the fabrication of the third generation of high-temperature superconducting wires on quartz substrates | |
Chiu et al. | Preparation of metal oxide thin film by pulsed laser deposition | |
De Silva | Application of solid-state laser to preparation of oxide superconductor films: texture analysis and critical-current performance for wire processing |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
CB03 | Change of inventor or designer information | ||
CB03 | Change of inventor or designer information |
Inventor after: Zhu Jiamin Inventor after: Zhao Yue Inventor after: Chen Sikan Inventor after: Gao Zhonghe Inventor after: Chen Yongchun Inventor after: Chen Minghui Inventor after: Chang Tongxu Inventor after: Yao Linpeng Inventor before: Zhu Jiamin Inventor before: Zhao Yue Inventor before: Chen Sikan Inventor before: Gao Zhonghe Inventor before: Chen Yongchun Inventor before: Chen Minghui Inventor before: Chang Tongxu Inventor before: Yao Linpeng Inventor before: Wu Xiang |
|
GR01 | Patent grant | ||
GR01 | Patent grant |