CN108219063A - A kind of novel antifog resin of UV photocurings and its preparation method and application - Google Patents

A kind of novel antifog resin of UV photocurings and its preparation method and application Download PDF

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CN108219063A
CN108219063A CN201711477012.3A CN201711477012A CN108219063A CN 108219063 A CN108219063 A CN 108219063A CN 201711477012 A CN201711477012 A CN 201711477012A CN 108219063 A CN108219063 A CN 108219063A
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photocurings
mixed solution
resin
antifog resin
antifog
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CN108219063B (en
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庞来兴
张慧艳
刘焕彬
李志云
谢平
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Guangzhou Bossin Polymerization Materials Co Ltd
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Guangzhou Bossin Polymerization Materials Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/52Amides or imides
    • C08F220/54Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/14Esterification
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04Homopolymers or copolymers of esters
    • C09D133/14Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen

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  • Organic Chemistry (AREA)
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Abstract

The present invention relates to a kind of novel antifog resins of UV photocurings and its preparation method and application, and the structural formula of the antifog resin of UV photocurings is as follows:;Wherein, the value range that the value range that the value range of x is 1~6, y is 2~8, z is 9~16;R1For C1~C13One or more of alkyl group;The molecular weight of the antifog resin of UV photocurings is 1500~3200.There is preferable anti-fog performance, hardness and adhesive force using the photocureable coating that the novel antifog resin of UV photocurings provided by the invention is prepared as raw material.The antifog resin of UV photocurings provided by the invention and photoinitiator, auxiliary agent etc. dissolve each other, manufactured UV photocurings anti-fog coating under the irradiation of UV lamp can film-forming, membrane body has the characteristics that transparency height, good film-forming property, compatibility be good, good toughness.

Description

A kind of novel antifog resin of UV photocurings and its preparation method and application
Technical field
The present invention relates to technical field of polymer materials, and in particular, to a kind of antifog resin of novel UV photocurings and its Preparation method and application.
Background technology
Water vapour in air condenses into subtle water droplet in glass or transparent plastic surface, and water droplet constantly gathers on surface It is opaque that collection makes these transparent materials thicken, and the production and life of people is influenced, so preventing the generation of fog from producing With become particularly important in life.Antifog processing method mainly has electrothermal way and uses anti-fog coating method.Electrothermic fog prevention method is Mix electric heater unit on antifog equipment is needed, increase equipment surface temperature by heating, fog rapid evaporation without Mist layer can be formed, the method good antifogging effect antifog so as to achieve the purpose that, but construction is complicated of high cost, and cannot be in glasses It is used in the small type mobile devices such as piece;The use of anti-fog coating method is to coat one layer of anti-fog coating in substrate surface, the method is convenient Fast, it is at low cost, it is one of following antifog Main way.
UV photocureable coating products are various, different properties, but have relative to other traditional coatings that curing rate is fast, film The features such as quality is high, and energy expenditure is low, excellent combination property.Zoromba etc. is prepared for a kind of polyurethane acrylate paint, uses Isophorone is reacted again with HEA with the urethane acrylate anti-fog coating of poly ethyldiol modified preparation, can be applied to organic glass The substrate surfaces such as glass, polyethylene terephthalate, makrolon, anti-fog performance is excellent, since polyethylene glycol structures therein make it It is flexible good but bad to the adhesive force of ground.Zhao Ziqian gathers using photosensitive acrylic ester oligomer as matrix and HEA, AM, TPGDA It closes, adds in photoinitiator auxiliary agent etc., be prepared for a kind of photocuring anti-fog coating, the study found that its film anti-fog performance is excellent, In TPGDA(Tri (propylene glycol) diacrylate)Make its have to ground good adhesive force but cure after paint film hardness not Height, not damage resistant and friction.Fumio Tanabiki in 9084982 B2 of foreign patent US have invented one kind with metering system Sour methyl esters is copolymerized to obtain solvent type acrylic resin, anti-fog coating anti-fog performance prepared by the method with N,N-DMAA It is good, glossiness is high, film forming is uniform, but antifog service life it is shorter, with the poor adhesive force of ground, compatibility is bad, easily goes out Existing cut is also possible to will appear phenomena such as coming off, and it is clean and tidy with appearance to influence anti-fog effect.
Therefore, there is an urgent need for researching and developing, a kind of strong adhesive force, anti-fog performance be good, the antifog resin of UV photocurings with high hardness.
Invention content
It is an object of the invention to overcome the deficiencies of the prior art and provide a kind of novel antifog resin of UV photocurings, with this The photocureable coating that the novel antifog resin of UV photocurings that invention provides is prepared for raw material has preferable anti-fog performance, hard Degree and adhesive force.
Another object of the present invention is to provide the preparation method of the above-mentioned novel antifog resin of UV photocurings.
Another object of the present invention is to provide the above-mentioned novel antifog resin of UV photocurings in UV photocuring anti-fog coatings Application.
Another object of the present invention is to provide a kind of UV photocurings anti-fog coating.
To achieve the above object, the present invention adopts the following technical scheme that:
A kind of novel antifog resin of UV photocurings, the structural formula of the antifog resin of UV photocurings are as follows:
Wherein, the value range that the value range that the value range of x is 1~6, y is 2~8, z is 9~16;R1For C1~C13Alkane One or more of base group;The molecular weight of the antifog resin of UV photocurings is 1500~3200.
The present invention introduces epoxy group and double using acrylic monomer and N,N-DMAA as the main chain of polymer Key can form antifog film under ultraviolet light in substrate surface, and other than with anti-fog performance, this film and base material are also preferable Compatibility and mechanical performance.Contain double bond in UV light-cured resins provided by the invention, under the irradiation of UV lamp, can draw with light Hair agent reaction and then film-forming, glass or other polymer surfaces are attached to, achieved the effect that antifog.What is formed is anti- Mist film has the characteristics that transparency height, good toughness, good with the compatibility of material.In addition, UV photocurings provided by the invention are antifog Resin also has many advantages, such as that solidification rate is fast, good film-forming property, good toughness, can be applied to anti-fog coating.
Preferably, the value range that the value range that the value range of x is 2~5, y is 3~7, z is 10~15.
Preferably, R1 C1~C12One or more of alkyl.
Preferably, the molecular weight of the antifog resin of UV photocurings is 1800~3000.
The present invention protects the preparation method of the above-mentioned novel antifog resin of UV photocurings simultaneously, and the method is as follows:
S1:Catalyst and propylene glycol monomethyl ether are hybridly prepared into mixed solution 1, triphenylphosphine and propylene glycol monomethyl ether are mixed Mixed solution 2 is configured to, by glyceral methacrylate, N,N-DMAA, acrylic ester monomer, propylene glycol list Methyl ether is hybridly prepared into mixed solution 3, and acrylic monomer and propylene glycol monomethyl ether are mixedly configured into mixed solution 4, spare;
S2:The mixed solution 1 of part and mixed solution 3 are mixed, are warming up to 88~92 DEG C and is flowed after keeping the temperature 25~35min plus is surplus Remaining mixed solution then in 88~92 DEG C of 2~3h of insulation reaction, obtains ternary prepolymer;
S3:Mixed solution 2 and mixed solution 4 are added in ternary prepolymer obtained by S2, is warming up to 101~105 DEG C of 5~6h of heat preservation Afterwards, acid value is monitored, when acid value < 0.5mgKOH/g, is discharged up to the novel antifog resin of UV photocurings;
Wherein, the catalyst is azodiisobutyronitrile and/or benzoyl peroxide.
Reaction process is as follows:
The ternary high polymer copolymer that preparation method provided by the invention is prepared has good hydrophilic property, good toughness, stability The advantages that good, using the ternary prepolymer as base-material, the UV light that superperformance can be prepared with acrylic monomer, catalyst reaction is consolidated Chemoprevention mist resin.
Preferably, in S1, the acrylic ester monomer is methyl methacrylate, butyl methacrylate or methyl-prop One or more of olefin(e) acid lauryl etc.;In S3, the acrylic monomer is acrylic acid.
Preferably, in S1, the mass ratio of the catalyst and propylene glycol monomethyl ether is 1:10~1:3.
Preferably, in S1, the glyceral methacrylate, N,N-DMAA, acrylic ester monomer Molar ratio is 2~5:3~7:10~15.
Preferably, in S3, the temperature after heating is 105 DEG C, keeps the temperature 4h.
The present invention protects application of the above-mentioned novel antifog resin of UV photocurings in UV photocuring anti-fog coatings simultaneously.
The present invention also protects a kind of UV photocurings anti-fog coating, and the above-mentioned novel antifog tree of UV photocurings is included in the coating Fat and photoinitiator.
The antifog resin of UV photocurings provided by the invention and photoinitiator, auxiliary agent etc. dissolve each other, and manufactured UV photocurings are antifog Coating under the irradiation of UV lamp can film-forming, membrane body has the spies such as transparency height, good film-forming property, the good, good toughness of compatibility Point.
Compared with prior art, the present invention has the advantages that:
Contain double bond in UV light-cured resins provided by the invention, under the irradiation of UV lamp, can be reacted with photoinitiator and then Film-forming is attached to glass or other polymer surfaces, achievees the effect that antifog.The antifog film of formation has transparency The features such as compatibility of height, good toughness and material is good.The antifog resin of UV photocurings provided by the invention and photoinitiator, auxiliary agent Etc. dissolving each other, manufactured UV photocurings anti-fog coating under the irradiation of UV lamp can film-forming, membrane body has that transparency is high, film forming The features such as property is good, compatibility is good, good toughness.
Description of the drawings
Fig. 1 is the preparation flow figure of UV photocurings anti-fog coating provided by the invention.
Specific embodiment
Further illustrated the present invention below in conjunction with specific embodiments and the drawings, but embodiment the present invention is not done it is any The restriction of form.Unless stated otherwise, the reagent of the invention used, method and apparatus is the art conventional reagent, methods And equipment.
Unless stated otherwise, agents useful for same and material of the present invention are purchased in market.
A kind of 1 antifog resin 1 of UV photocurings of embodiment
A kind of novel antifog resin of UV photocurings, the molecular weight of the antifog resin is about 1800, the antifog tree of UV photocurings The structural formula of fat is as follows:
The preparation method of the above-mentioned antifog resin of UV photocurings is as follows:
S1:It is in right amount mixed solution 1 to prepare 8.92%wt benzoyl peroxides-propylene glycol monomethyl ether solution respectively, 5.66%wt's Triphenylphosphine-propylene glycol monomethyl ether solution is in right amount mixed solution 2, and molar ratio is glyceral methacrylate:Methacrylic acid Methyl esters:N, N- dimethacrylamide=3:2:12 16.0%wt propylene glycol monomethyl ethers solution is in right amount mixed solution 3,15.6% The acrylic acid of wt-propylene glycol monomethyl ether solution is in right amount mixed solution 4, spare.
S2:The mixed solution 1 of part and mixed solution 3 are mixed, are warming up to 90 DEG C and keeps the temperature 30min, while flows plus remains Remaining mixed solution 1 and mixed solution 3, time for adding 80min, after stream adds, 90 DEG C of heat preservations, soaking time 3h obtains ternary Prepolymer;
S3:Mixed solution 2, mixed solution 4 are added in ternary prepolymer obtained by S2, after being warming up to 102 DEG C of heat preservation 6h, monitoring acid Value when acid value < 0.5mgKOH/g, discharges up to the novel antifog resin of UV photocurings.
A kind of 2 antifog resin 2 of UV photocurings of embodiment
A kind of novel antifog resin of UV photocurings, the molecular weight of the antifog resin is about 2500, the antifog tree of UV photocurings The structural formula of fat is as follows:
The preparation method of the above-mentioned antifog resin of UV photocurings is as follows:
S1:It is in right amount mixed solution 1 to prepare 8.95%wt benzoyl peroxides-propylene glycol monomethyl ether solution respectively, 5.47%wt's Triphenylphosphine-propylene glycol monomethyl ether solution is in right amount mixed solution 2, and molar ratio is glyceral methacrylate:Methacrylic acid Methyl esters:N, N- dimethacrylamide=5:5:11 15.98%wt propylene glycol monomethyl ethers solution is in right amount mixed solution 3,16.4% The acrylic acid of wt-propylene glycol monomethyl ether solution is in right amount mixed solution 4, spare.
S2:The mixed solution 1 of part and mixed solution 3 are mixed, are warming up to 90 DEG C and keeps the temperature 30min, while flows plus remains Remaining mixed solution 1 and mixed solution 3, time for adding 80min, after stream adds, 90 DEG C of heat preservations, soaking time 3h obtains ternary Prepolymer;
S3:Mixed solution 2, mixed solution 4 are added in ternary prepolymer obtained by S2, after being warming up to 102 DEG C of heat preservation 6h, monitoring acid Value when acid value < 0.5mgKOH/g, discharges up to the novel antifog resin of UV photocurings.
A kind of 3 antifog resin 3 of UV photocurings of embodiment
A kind of novel antifog resin of UV photocurings, the molecular weight of the antifog resin is about 3000, the antifog tree of UV photocurings The structural formula of fat is as follows:
The preparation method of the above-mentioned antifog resin of UV photocurings is as follows:
S1:It is in right amount mixed solution 1 to prepare 9.05%wt benzoyl peroxides-propylene glycol monomethyl ether solution respectively, 5.39%wt's Triphenylphosphine-propylene glycol monomethyl ether solution is in right amount mixed solution 2, and molar ratio is glyceral methacrylate:Methacrylic acid Methyl esters:N, N- dimethacrylamide:=7:2:15 15.2%wt propylene glycol monomethyl ethers solution is in right amount mixed solution 3,16.4% The acrylic acid of wt-propylene glycol monomethyl ether solution is in right amount mixed solution 4, spare.
S2:The mixed solution 1 of part and mixed solution 3 are mixed, are warming up to 90 DEG C and keeps the temperature 30min, while flows plus remains Remaining mixed solution 1 and mixed solution 3, time for adding 80min, after stream adds, 90 DEG C of heat preservations, soaking time 3h obtains ternary Prepolymer;
S3:Mixed solution 2, mixed solution 4 are added in ternary prepolymer obtained by S2, after being warming up to 102 DEG C of heat preservation 6h, monitoring acid Value when acid value < 0.5mgKOH/g, discharges up to the novel antifog resin of UV photocurings.
A kind of 4 antifog resin 4 of UV photocurings of embodiment
A kind of novel antifog resin of UV photocurings, the molecular weight of the antifog resin is about 2700, the antifog tree of UV photocurings The structural formula of fat is as follows:
The preparation method of the above-mentioned antifog resin of UV photocurings is as follows:
S1:It is in right amount mixed solution 1 to prepare 10.3%wt benzoyl peroxides-propylene glycol monomethyl ether solution respectively, the three of 6.3%wt Phenylphosphine-propylene glycol monomethyl ether solution is in right amount mixed solution 2, and molar ratio is glyceral methacrylate:The methacrylic acid moon Osmanthus ester:N, N- dimethacrylamide=7:3:10 82.34%wt propylene glycol monomethyl ethers solution is in right amount mixed solution 3,23.0% The acrylic acid of wt-propylene glycol monomethyl ether solution is in right amount mixed solution 4, spare.
S2:The mixed solution 1 of part and mixed solution 3 are mixed, are warming up to 90 DEG C and keeps the temperature 30min, while flows plus remains Remaining mixed solution 1 and mixed solution 3, time for adding 80min, after stream adds, 90 DEG C of heat preservations, soaking time 3h obtains ternary Prepolymer;
S3:Mixed solution 2, mixed solution 4 are added in ternary prepolymer obtained by S2, after being warming up to 102 DEG C of heat preservation 6h, monitoring acid Value when acid value < 0.5mgKOH/g, discharges up to the novel antifog resin of UV photocurings.
A kind of non-UV curing anti foggings resin 5 of comparative example 1
The non-antifog resins of UV are different in the film-forming mechanism of substrate surface from the antifog resin of UV photocurings, anti-fog performance, hard Degree, adhesive force, transparency, flexibility etc. can all have differences, this comparative example compares itself and UV using the antifog resins of non-UV as control The performance difference of the antifog resin of photocuring.
A kind of non-UV curing anti foggings resin, the molecular weight of the antifog resin is about 2000.The antifog resins of non-UV Structural formula is as follows:
The preparation method of above-mentioned non-UV curing anti foggings resin is as follows:
S1:It is in right amount mixed solution 1 to prepare 8.29%wt benzoyl peroxides-propylene glycol monomethyl ether solution respectively, and molar ratio is first Base methyl acrylate:N, N- dimethacrylamide=1:1 16.0%wt propylene glycol monomethyl ethers solution is mixed solution 3 in right amount;
S2:The mixed solution 1 of part and mixed solution 3 are mixed, are warming up to 90 DEG C and keeps the temperature 30min, at the same flow plus it is remaining Mixed solution 1 and mixed solution 3, time for adding 80min, after stream adds, 90 DEG C of heat preservations, soaking time 3h discharges up to non- UV curing anti fogging resins.
Performance test
The antifog resin of UV photocurings that Examples 1 to 4 is prepared is mixed with UV photocuring anti-fog coatings with photoinitiator. The mass ratio of the UV light-cured resins and photoinitiator is 100:4, the photoinitiator is 1- hydroxycyclohexyl phenyl ketones (184).The photocuring anti-fog coating being prepared is tested for the property, the non-UV curing anti foggings being prepared with comparative example 1 Resin 5 is as control.Test method is as follows, and test result see the table below 1.
(1)Anti-fog performance
Test method refers to the hot mist method of water-bath in the anti-fog properties test method of GB/T 31726-2015 plastic films.
Anti-fog performance:D grades-film surface has part water droplet;The preferable transparencies of D/E-, film surface have a small amount of water droplet.
(2)Hardness
Test method refers to standard GB/T/T 6739-1996《Hardness of film pencil measuring method》:It is measured using testing machine method.
(3)Compatibility(Adhesive force)
Test method refers to standard GB/T/T9286-1998《The cross cut test of paint and varnish paint film》.0 grade:Cut edge It completes smoothly, none lattice comes off;1 grade:Have a little coating shedding in notch infall, but cross-cut area is impacted cannot be bright It is aobvious to be more than 5%;2 grades:There is coating shedding in notch infall/or along notching edge, impacted cross-cut area is significantly greater than 5%, but 15% cannot be significantly greater than;3 grades:Coating is partly or entirely come off with big fragment along cut edge and/or in grid difference It is partly or entirely peeled off on position, impacted cross-cut area is significantly greater than 15%, but cannot be significantly greater than 35%;4%:It applies Layer is peeled off along the big fragment in cut edge, and impacted cross-cut area is significantly greater than 35%, but cannot be significantly greater than 65%;5 grades: Peeling degree is more than 4 grades.The rank of adhesive force is higher, better to the attachment of ground, and higher with the compatibility of ground, paint film is more not It easily peels off, service life is longer.
(4)Transparency
Test method refers to standard GB/T/T1721-2008《Varnish, edible vegetable oil and diluent appearance and diapha nometry》.Make Transparency value is measured with transparency meter, the transparency levels of sample are judged according to numerical value.It is transparent:Measured value 82~ 100;It is micro- muddy:Measured value 52~81;It is muddy:Below measured value 51.
(5)Flexibility
Test method refers to standard GB/T/T1731-1993《Paint film flexibility measuring method》Regulation uses mandrel rod analyzer, survey It is to be bent the tinplate of japanning on the mandrel rod of different-diameter during examination, with the minimum axis that paint film is not caused to destroy after its bending The diameter of stick(mm)To represent;The diameter of axis be respectively 2mm, 3mm, 4mm, 5mm, 6mm, 8mm, 10mm, 12mm, 16mm, 20mm, 25mm and 32mm, measured diameter is smaller, and toughness is better.
The performance test of resin that 1 Examples 1 to 4 of table and comparative example 1 are prepared
Test result:The antifog resin of UV photocurings is compared with non-UV solidified resins, the antifog resin hardness higher of UV photocurings, to base More preferably, flexibility is more preferable for the compatibility of material.
Above-described specific embodiment has carried out the purpose of the present invention, technical solution and advantageous effect further It is described in detail, it should be understood that the foregoing is merely the specific embodiment of the present invention, is not intended to limit the present invention Protection domain, all within the spirits and principles of the present invention, any modification, equivalent substitution, improvement and etc. done should all include Within protection scope of the present invention.

Claims (10)

1. a kind of novel antifog resin of UV photocurings, which is characterized in that the structural formula of the antifog resin of UV photocurings is as follows:
Wherein, the value range that the value range that the value range of x is 1~6, y is 2~8, z is 9~16;R1For C1~C13Alkyl One or more of group;The molecular weight of the antifog resin of UV photocurings is 1500~3200.
2. the novel antifog resin of UV photocurings according to claim 1, which is characterized in that the value range of x is 2~5, y's The value range that value range is 3~7, z is 10~15.
3. the novel antifog resin of UV photocurings according to claim 1, which is characterized in that R1For C1~C12In alkyl group It is one or more of.
4. the novel antifog resin of UV photocurings according to claim 1, which is characterized in that the antifog resin of UV photocurings Molecular weight is 1800~3000.
5. the preparation method of any novel antifog resin of UV photocurings of Claims 1 to 4, which is characterized in that the method It is as follows:
S1:Catalyst and propylene glycol monomethyl ether are hybridly prepared into mixed solution 1, triphenylphosphine and propylene glycol monomethyl ether are mixed Mixed solution 2 is configured to, by glyceral methacrylate, N,N-DMAA, acrylic ester monomer, propylene glycol list Methyl ether is hybridly prepared into mixed solution 3, and acrylic monomer and propylene glycol monomethyl ether are mixedly configured into mixed solution 4, spare;
S2:The mixed solution 1 of part and mixed solution 3 are mixed, are warming up to 88~92 DEG C and is flowed after keeping the temperature 25~35min plus is surplus Remaining mixed solution then in 88~92 DEG C of 2~3h of insulation reaction, obtains ternary prepolymer;
S3:Mixed solution 2 and mixed solution 4 are added in ternary prepolymer obtained by S2, is warming up to 101~105 DEG C of 5~6h of heat preservation Afterwards, acid value is monitored, when acid value < 0.5mgKOH/g, is discharged up to the novel antifog resin of UV photocurings;
Wherein, the catalyst is azodiisobutyronitrile and/or benzoyl peroxide.
6. preparation method according to claim 5, which is characterized in that in S1, the acrylic ester monomer is metering system One or more of sour methyl esters, butyl methacrylate or lauryl methacrylate;The acrylic monomer is propylene Acid and/or methacrylic acid.
7. preparation method according to claim 5, which is characterized in that in S1, the matter of the catalyst and propylene glycol monomethyl ether Amount is than being 1:10~1:3.
8. preparation method according to claim 5, which is characterized in that in S1, the glyceral methacrylate, N, N- diformazans Base acrylamide, acrylic ester monomer molar ratio be 2~5:3~7:10~15.
9. application of any novel antifog resin of UV photocurings of Claims 1 to 4 in UV photocuring anti-fog coatings.
10. a kind of UV photocurings anti-fog coating, which is characterized in that any described novel comprising Claims 1 to 4 in the coating The antifog resin of UV photocurings and photoinitiator.
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CN102924662A (en) * 2012-06-21 2013-02-13 江南大学 Anti-fog type ultraviolet light curing polyacrylate copolymer preparation method
CN103339191A (en) * 2010-12-22 2013-10-02 大赛璐-氰特株式会社 Water-absorbable resin composition and laminate produced using same
CN104212293A (en) * 2014-08-27 2014-12-17 深圳市安品有机硅材料有限公司 Waterborne acrylic acid antifogging coating and preparation method thereof
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