CN1081803C - Method for manufacturing liquid crystal display element - Google Patents
Method for manufacturing liquid crystal display element Download PDFInfo
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- CN1081803C CN1081803C CN 95116174 CN95116174A CN1081803C CN 1081803 C CN1081803 C CN 1081803C CN 95116174 CN95116174 CN 95116174 CN 95116174 A CN95116174 A CN 95116174A CN 1081803 C CN1081803 C CN 1081803C
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- black
- resin
- nesa coating
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Abstract
The present invention provides a method capable of easily and inexpensively producing a liquid crystal display element of a color display of a simple matrix system with which the color display of the brightness and color tone equiv. to those of a mosaic type.
Description
The present invention relates to form with pixel unit on the manufacture method of the liquid crystal display cells of simple matrix mode, the particularly color-bar when the colour of this element shows the method for light shield layer.
The liquid crystal display cells of simple matrix mode has two kinds of TN mode and STN modes, no matter all being the transparency electrode that forms respectively, any mode is strip on 2 transparency carriers, and the electrode of each strip by enclosed therebetween liquid crystal form the formation intersect vertically (as with a side as " OK ", then another to make things convenient for be " row ").By signal voltage being added on a side the strip shaped electric poles, scanning voltage is added on the opposing party's the strip shaped electric poles, drive the liquid crystal that is in signal voltage and scanning voltage sync section.When carrying out the colour demonstration, just use color filter.Usually, as the position of inserting color filter, be between transparency carrier and the transparency electrode.That is, at first on transparency carrier, form color filter, transparency electrode is set thereon again.
Particularly under the situation of STN mode, transparency electrode must form on level and smooth fully face.Therefore on colour filter, be provided with in order to realize the outer protective film of smoothing.
Generally the look as color filter disposes, mosaic, stripe shape, triangular form, 4 configuration of pixels types are arranged, under the situation of the simple matrix mode of TN, STN, be the look configuration (bar by red, green, blue three looks constitutes, and each vitta is separated by the light shield layer of black) of stripe shape.
The configuration of the look of stripe shape shows accessible to literal, figure etc., but then compares relatively poor aspect tone, the vividness with mosaic etc. when display image.For making the close of image quality and mosaic, to each vitta of red, green, blue, when each pixel unit adds light shield layer, with light shield layer with each pixel fringing.Like this, under the situation of mosaic, each pixel of red, green, blue is arranged with the black fringing, on the contrary, though the configuration of color is with red, red, red or green, green, green different, but do not change with the situation that the black fringing constitutes color with each pixel, compare, can improve picture quality significantly with the colored demonstration of existing stripe shape.But the color filter of stripe shape look configuration during fabrication, for each bar, it is very miscellaneous on operation to insert light shield layer to each pixel unit, and itself and counter electrode (being scan electrode this moment) are fitted like a glove on the position, needs the operation of high precision such as mask alignment.
In addition, if can light shield layer be set with substrate opposing substrates one side that is provided with color filter, then operation will be much simpler than directly insert light shield layer in vitta.This is because formed between each bar of nesa coating of strip as long as light shield layer is set to as scan electrode.At this moment,, usually painted photoresist is applied on the nesa coating, behind mask exposure, developing procedure, removes unwanted resin and get final product for light shield layer is set between bar.In any case but all must carry out mask alignment this moment; Like this, not only operation bothers, and qualification rate reduces, and cost also increases.
The present invention is motion in order to address these problems, purpose is to provide a kind of manufacture method of simple color liquid crystal display device, by between each bar, light shield layer being set, and light shield layer is joined in each pixel of color-bar as the nesa coating of the established strip of scan electrode.
The present invention is characterised in that and comprises following each operation: the operation that forms nesa coating on a side transparency carrier face; behind the diaphragm of the painted eurymeric of coating on the above-mentioned nesa coating, by exposure; develop and form the operation of above-mentioned electrically conducting transparent film figure; after forming pattern, do not peel off said protection film and further be coated with the operation of diaphragm of the minus of black; by above-mentioned transparency carrier the diaphragm of above-mentioned minus is carried out back-exposure; develop and residual eurymeric diaphragm is peeled off on forming the operation of black protective film between the above-mentioned nesa coating that forms pattern and carrying out the above-mentioned nesa coating that forms pattern operation (the 1st kind of method).
In addition, another feature of the present invention is to comprise following operation: the operation that forms nesa coating on a side transparency carrier face; passing through exposure behind the coating eurymeric diaphragm on the above-mentioned nesa coating; develop and form the operation of above-mentioned electrically conducting transparent film figure; form the resin of not peeling off said protection film behind the pattern and further inciting somebody to action black and be injected into operation between the above-mentioned diaphragm; by making above-mentioned hardening of resin in the operation that forms black bar between the above-mentioned nesa coating that forms pattern with carry out operation (the 2nd kind of method) that the diaphragm that remains on the above-mentioned nesa coating that forms pattern is peeled off.As above-mentioned resin, use the material that contains ray hardening resin or thermosetting resin herein.
In the 1st kind of method, the diaphragm during as the making scan electrode uses the diaphragm of eurymeric, and is in advance that this diaphragm is painted, the etching work procedure of the exposure of this diaphragm of process, development, nesa coating, the pattern of formation scan electrode.Afterwards, coating is colored as the minus diaphragm of black, and by exposing (back-exposure), develop from transparency carrier one side, making the scan electrode that has formed pattern is as light shield layer after the diaphragm sclerosis that exists between strip electrode.Afterwards, will on electrode, remove by residual eurymeric diaphragm.Like this, just, can not carry out mask alignment etc. and on the color-bar when the colour of the liquid crystal display cells of simple matrix mode shows with pixel unit by fairly simple method formation light shield layer.
In addition, the eurymeric diaphragm that exists on the scan electrode that has formed pattern is not peeled off till the light shield layer (secret note) that preferably forms in being formed on follow-up operation and above remaining in.Because when forming black bar, can be used as auxiliary (a kind of framed) and use.Like this, just, can not use the method for troubles such as mask alignment and between adjacent strip electrode, form black bar reliably.
In addition, when carrying out back-exposure by transparency carrier, because the influencing light and can not fully arrive minus diaphragm on the scan electrode of the painted eurymeric diaphragm below it, so this minus diaphragm can not fully harden.Thereby, if in developing procedure, utilize solubleness poor of negative diaphragm, only remove the minus diaphragm on the scan electrode, then can only keep the minus diaphragm that exists between strip electrode, promptly become the part of light shield layer.
In the 2nd kind of method, the diaphragm during as the making scan electrode uses eurymeric diaphragm (different with the 1st kind of method, this eurymeric diaphragm there is no need painted in advance), forms the pattern of scan electrode through overexposure, development, etching work procedure.At this moment, even the eurymeric diaphragm that exists on the scan electrode does not produce dissolving through these operations yet or peels off.Afterwards, between above-mentioned eurymeric diaphragm, inject the resin (material that contains ray hardening resin or thermosetting resin) that is colored as black, adjust injecting height and make itself and this diaphragm become same plane.Afterwards, above-mentioned resin is hardened, the black bar between adjacent strip electrode forms the resin bed as light shield layer.At last, remove diaphragm residual on strip electrode, only be retained in the light shield layer that forms between strip electrode by peeling off.Like this, just, can not carry out mask alignment etc. and on the vitta when the colour of the liquid crystal display cells of simple matrix mode shows with pixel unit by fairly simple method formation light shield layer.
According to the method, do not need to carry out back-exposure and development.Need utilize light (blanket exposure) or heat that black bar formation material (being colored as the resin of black) is hardened and replace.In addition, in strip electrode forms operation, the eurymeric diaphragm that till secret note forms, does not also exist on the peel strip electrode, its reason is identical with the former method.
The form that carries out an invention (embodiment 1)
Below, the 1st kind of manufacture method of the color display element of the present invention of utilizing operation shown in Figure 1 is described.
At first, the glass substrate 1 that the preparation surface smoothness is high forms ITO film 2 thereon.In the present embodiment, using the substrate of commercially available band ITO film, is the ito substrate with surface resistance of 20 Ω/.On a face of this substrate, be coated with the photonasty diaphragm 3 of painted eurymeric.As diaphragm, use with the composition of novolac resin as material of main part, colored pigments is dissolved in wherein, or outstanding turbid in wherein using.As colored pigments, what can be used for generally that shading uses is just passable, can use combinations such as carbon black, black pigment, black dyess, contain material of pigment such as blueness, redness, yellow or dyestuff etc.The actual photonasty diaphragm 3 that uses composed as follows:
Novolac resin 20 weight portions
C.I. black pigment 74 weight portions
C.I. blue pigment 15.6 5 weight portions
C.I. red pigment 177 2 weight portions
C.I. yellow uitramarine 139 1 weight portions
This photonasty diaphragm 3 of coating (Fig. 1 (a) on substrate 1.Coating thickness is 2.0 μ m).Then, the substrate that this is coated with diaphragm uses mask 4 to carry out mask exposure (Fig. 1 (b)).After the development, residual diaphragm is carried out thermmohardening (Fig. 1 (c)) under 130 ℃-170 ℃.At this moment, if the temperature of thermmohardening is lower than 130 ℃, then solvent can not fully volatilize, and therefore, it is insufficient to harden, if be higher than 170 ℃, then sclerosis excessively is difficult to peel off in subsequent handling.Utilize corrosion to remove (Fig. 1 (d)) the ITO film 2 of not protected film cover part.Like this, just become scan electrode by the part of the ITO film 2 that resin covered residual on the substrate.)。Coating thereon is colored as negative-type photosensitive diaphragm 5 (Fig. 1 (e) of black.Use rotation to apply.Coating thickness is 2.0 μ m from glass substrate.)。Use the acrylic compounds material as diaphragm, use and the material that coloured material is identical and composition is also identical as the eurymeric diaphragm as colored pigments.Specifically composed as follows:
Methacrylic acid/methylmethacrylate copolymer 6 weight portions
Tetramethylol methane tetraacrylate 4 weight portions
Diethyl thia ketone 1.2 weight portions
Michler's ketone 1.2 weight portions
2 (O-chlorphenyls)-4,5-diphenyl-imidazole base dipolymer
0.2 weight portion
Ethylene glycol monomethyl ether ethyl ester 20 weight portions
C.I. black pigment 74 weight portions
C.I. blue pigment 15.6 5 weight portions
C.I. red pigment 177 2 weight portions
C.I. yellow uitramarine 139 1 weight portions
Afterwards, exposing from glass one side of substrate is back-exposure (Fig. 1 (f)).The minus diaphragm that directly contacts with glass absorbs luminous energy and hardens; because colored pigments influences seeing through of light; light can not fully arrive the minus diaphragm that the diaphragm that is positioned at eurymeric is the part on the eurymeric diaphragm residual on the ITO film 2; thereby; can not make the minus diaphragm produce sclerosis, even produce also insufficient.Therefore, when developing, utilize the difference of solubleness, remove the minus diaphragm on the scan electrode 2, just can only stay the diaphragm between bar.In addition, the diaphragm on the scan electrode is all removed, just can between the scan electrode 2 of adjacency, be formed black bar b (Fig. 1 (g) as light shield layer by peeling off and remove remaining eurymeric diaphragm.The thickness of layer is 2.0 μ m.)。
The resistivity of the light shield layer b that forms between the scan electrode 2 of adjacency must be enough big.Therefore, must consider to use the alap carbon of electric conductivity, black pigment etc., perhaps use the low pigment more than 2 kinds of electric conductivity, the combination of pigment, and the general electric conductivity of these materials be higher.(embodiment 2)
The following describes the 2nd kind of method (with reference to Fig. 2)
Except that using with the novolac resin that do not contain colored pigments as the material of main body as the positive light sensitivity diaphragm 3, with the embodiment 1 the same scan electrode (Fig. 2 (d)) that forms.Coating thereon is colored as thermosetting resin 5 (Fig. 2 (e) of black.Use spin coating method.)。For thermosetting resin, use thermmohardening type epoxy resin, pigment is dissolved in wherein or hang turbid in wherein back use.It is just passable that colored pigments generally can be used for shading, can use the combination of carbon black, black pigment, black dyes etc., and contain the material of pigment such as indigo plant, red, Huang or dyestuff.In fact use the solid formation that aniline black byestuffs is dissolved in thermmohardening type epoxy resin to be divided into solution in 10% PMA (the propylene glycol list ethylether ethyl ester) solution.In addition, the points for attention for colored pigments are identical with the 1st kind of method.
Final coating thickness is adjusted into makes diaphragm and coated face become same plane.Therefore, be coating,, make injecting height consistent more definite with the protection face not equal to be between the paddy between diaphragm, to inject resin.In the present embodiment, after being rotated coating, the resin of removing on the diaphragm makes surface elevation unanimity (Fig. 2 (f)).Afterwards, carry out the sclerosis of thermosetting resin, and the diaphragm on the scan electrode is all removed, between the scan electrode of adjacency, form black bar b (Fig. 2 (g)) as light shield layer (thickness of layer is 1.5 μ m) by peeling off and remove the eurymeric diaphragm.In the present embodiment, use thermosetting resin, but consider that from purport of the present invention necessity is not defined in this as resin.Also can use the light-hardening resin (the sclerosis means are not utilization heat but utilize light) of UV hardening resin class.Can obtain and use the identical effect of situation of thermosetting resin.
It more than is the manufacture method of substrate of scan electrode one side of liquid crystal display cells of the present invention.The substrate of signal electrode one side uses and the identical substrate of previous mode.Therefore, the manufacture method of the substrate of signal electrode one side is identical with previous method.Previous color filter is arranged on signal electrode one side.That is, on transparency carrier, form the color filter of strip, be formed on the structure that adds light shield layer between each color-bar of red (R), green (G), blue (B).After on color filter, being formed for the protective film of real surface smoothing, form the signal electrode of ITO.
Figure 3 shows that the sectional view of the display panels that the colour that uses the substrate utilize scan electrode one side that method of the present invention makes to make shows.In fact must on each electrode base board, form one deck oriented film again, carry out directional process.In addition, under the situation of STN mode, be provided as amending unit or compensate film that color correct is used thereon.Below, the structure of the each several part of the display panels of key diagram 3.11 expression driver elements, 12 expression amending units.13,23 is that polaroid, 14 is the black bar as light shield layer for revising with liquid crystal, 15 for driving with liquid crystal, 16.17 is that transparent transparency electrode, 20 as scan electrode is for being oriented film as the transparency electrode of signal electrode, 18 and 19.21 for level with outer protective film, 22 be color filter, 24 for the back of the body illuminator.
Fig. 4 is the pattern of expression from the colour of seeing the previously demonstration of the liquid crystal display cells of such manufacturing.As seen from the figure, different with the pattern of the vitta of previous STN mode, for each bar, utilize light shield layer to carry out fringing with pixel unit.By utilizing this light shield layer to carry out fringing, can obtain than previous distincter tone.
From embodiment as can be known, the invention is characterized in, utilize in the past colour is shown that the substrate of scan electrode one side that not have contribution realizes the fringing that utilizes light shield layer formation by pixel unit shown in Figure 4.Usually, if between the scan electrode of adjacency, form light shield layer, thus behind pattern formation scan electrode, must carry out operations such as diaphragm coating, mask alignment and formation pattern with initial formation ITO.In the method for the invention, be diaphragm (eurymeric diaphragm) when not removing the pattern of initial formation scan electrode; And still keeping the light shield layer that is used to form the back.Particularly, be exactly in advance the eurymeric diaphragm to be carried out paintedly in the 1st method, the color filter that hinders light transmission during as the light stiffening of the minus diaphragm that is used to form light shield layer uses.When carrying out back-exposure; this painted eurymeric diaphragm becomes color filter on the minus diaphragm that is coated with on the eurymeric diaphragm residual on the scan electrode; the light that is used to expose can not fully arrive, thereby can not utilize this exposure and harden (even produce sclerosis, its hardenability is also extremely weak).Therefore, in the developing procedure below, sclerosis takes place and residual in the minus diaphragm that only exists between the scan electrode of adjacency, and the minus diaphragm on the above-mentioned scan electrode then is removed.That is, eurymeric diaphragm residual on above-mentioned scan electrode plays the mask effect, therefore, does not use the method for troubles such as mask calibration just can produce light shield layer.In addition, in the 2nd method, do not need to carry out back-exposure and development operation.But must make ray hardening resin or thermosetting resin take place sclerosis operation (the former: light-blanket exposure, the latter: heat).Like this; owing in the 2nd kind of method, do not carry out development operation; so; residual eurymeric diaphragm (needn't contain colored pigments) just can play to inject as the resin that forms light shield layer the model frame (not needing methods such as mask alignment, identical with the 1st kind of method) of usefulness on above-mentioned scan electrode.
In addition, by suitably being chosen in the thickness of eurymeric diaphragm residual on the scan electrode, can adjust the thickness of light shield layer.That is,, then omit eurymeric diaphragm thin or that equate than its thickness, just can be used as the auxiliary use when forming black bar by coating if wait method to extrapolate in advance by experiment as the needed thickness of light shield layer.In addition, in the 1st kind of method, the amount of the colored pigments of eurymeric diaphragm is injected in the control of the coating thickness of the eurymeric diaphragm that utilization is extrapolated in advance.This also has effect to the thickness of controlling high-precision light shield layer.
In addition, be to form previous color filter in signal electrode one side in an embodiment, and light shield layer of the present invention be located at scan electrode one side of counter electrode according to common method.But the effect of the effect of signal electrode one side and scan electrode one side is not absolute.Also color filter can be located at scan electrode one side and form light shield layer of the present invention in signal electrode one side.Therefore needn't be limited to the scan electrode side fully as the substrate that forms light shield layer of the present invention.
The method according to this invention forms light shield layer with pixel unit on the vitta in the time of can utilizing the colour of the liquid crystal display cells of fairly simple method simple matrix mode formerly to show.Like this, just can obtain the vividness that can be equal to mutually with mosaic and the colour of tone cheaply and show, therefore,, can be described as a fabulous manufacture method for the color liquid crystal display device of simple matrix mode.
In addition; according to the inventive method, when forming the pattern of scan electrode, residual eurymeric diaphragm can be used as the auxiliary use that forms black bar on scan electrode; so, can not use the method for troubles such as mask alignment and between the scan electrode of adjacency, form black bar reliably.
The simple declaration of accompanying drawing
The sectional view of the 1st kind of manufacture method that Fig. 1 forms for the light shield layer of representing by process sequence of the present invention.
The sectional view of the 2nd kind of manufacture method that Fig. 2 forms for the light shield layer of representing by process sequence of the present invention.
Fig. 3 is the sectional view that utilizes liquid crystal display cells of the present invention.
Fig. 4 is an example of color display pattern.(explanation of symbol)
1 (transparent) substrate
The 2ITO film
3 positive light sensitivity diaphragms
4 masks
5a negative-type photosensitive diaphragm
The 5b thermosetting resin
11 driver elements
12 amending units 14 are revised with liquid crystal 15 drivings and are carried on the back illuminator bs black bar R red bar or pixel G green bar or pixel B blue bar or pixel as light shield layer as the transparency electrode 20 of scan electrode as transparency electrode 22 color filters 24 of signal electrode as the black bar 17 of light shield layer with liquid crystal 16
Claims (3)
1. the manufacture method of the liquid crystal display cells that shows of the colour of simple matrix mode; it is characterized in that comprising following each operation: the operation that on a side transparency carrier face, forms nesa coating; after being coated with painted eurymeric diaphragm on the above-mentioned nesa coating, by exposure; develop and form the operation of above-mentioned electrically conducting transparent film figure; do not peel off the said protection film that formed pattern and further coating be colored as the operation of the minus diaphragm of black; by above-mentioned transparency carrier above-mentioned minus diaphragm is carried out back-exposure; thereby develop form the operation of black bar between the above-mentioned nesa coating that forms pattern and carry out with in above-mentioned formation the operation that residual eurymeric diaphragm is peeled off on the nesa coating of pattern.
2. the manufacture method of the liquid crystal display cells that shows of the colour of simple matrix mode; it is characterized in that comprising following each operation: the operation that on a side transparency carrier face, forms nesa coating; behind coating eurymeric diaphragm on the above-mentioned nesa coating, by exposure; develop and form the operation of above-mentioned electrically conducting transparent film figure; do not peel off the said protection film that formed pattern and further between said protection film, inject the operation of the resin that is colored as black; by above-mentioned resin is hardened in the operation of the above-mentioned intermembranous formation black bar of electrically conducting transparent that has formed pattern with the operation that residual said protection film is peeled off on carrying out the above-mentioned nesa coating that forms pattern.
In the claim 2 record method, it is characterized in that: the above-mentioned resin that is colored as black is the material that contains ray hardening resin or thermosetting resin.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP252285/94 | 1994-10-18 | ||
| JP252286/94 | 1994-10-18 | ||
| JP25228694 | 1994-10-18 | ||
| JP25228594 | 1994-10-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1130765A CN1130765A (en) | 1996-09-11 |
| CN1081803C true CN1081803C (en) | 2002-03-27 |
Family
ID=26540640
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 95116174 Expired - Lifetime CN1081803C (en) | 1994-10-18 | 1995-10-17 | Method for manufacturing liquid crystal display element |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN1081803C (en) |
| TW (1) | TW347478B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100801151B1 (en) * | 2001-10-04 | 2008-02-05 | 엘지.필립스 엘시디 주식회사 | Black matrix of color filter substrate for liquid crystal display |
| CN100354663C (en) * | 2004-07-02 | 2007-12-12 | 华生科技股份有限公司 | Method for producing color filter |
| CN108681166B (en) * | 2018-05-16 | 2021-01-26 | 京东方科技集团股份有限公司 | Preparation method of substrate for display, substrate for display and display device |
-
1995
- 1995-10-11 TW TW084110633A patent/TW347478B/en not_active IP Right Cessation
- 1995-10-17 CN CN 95116174 patent/CN1081803C/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| TW347478B (en) | 1998-12-11 |
| CN1130765A (en) | 1996-09-11 |
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