CN108179380B - Mask plate - Google Patents

Mask plate Download PDF

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Publication number
CN108179380B
CN108179380B CN201810188271.2A CN201810188271A CN108179380B CN 108179380 B CN108179380 B CN 108179380B CN 201810188271 A CN201810188271 A CN 201810188271A CN 108179380 B CN108179380 B CN 108179380B
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China
Prior art keywords
area
identification area
bar
block
mark
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CN201810188271.2A
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Chinese (zh)
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CN108179380A (en
Inventor
丁渭渭
徐鹏
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BOE Technology Group Co Ltd
Chengdu BOE Optoelectronics Technology Co Ltd
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BOE Technology Group Co Ltd
Chengdu BOE Optoelectronics Technology Co Ltd
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Application filed by BOE Technology Group Co Ltd, Chengdu BOE Optoelectronics Technology Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to CN201810188271.2A priority Critical patent/CN108179380B/en
Publication of CN108179380A publication Critical patent/CN108179380A/en
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation

Abstract

The invention discloses a mask, which comprises a mask body, wherein the mask body is provided with: a gripping area; an arc identification area located inside the grip area; a welding area located inside the arc identification area; the bar block identification area is positioned on the inner side of the circular arc identification area; and an effective display area located inside the bar identification area; wherein, set up the stress balance groove in circular arc identification area and the strip sign area, can enough guarantee that effective display area atress is even opening net and welding process, can also guarantee that welding area is comparatively flat, not take place the fold, the suit mask version coating by vaporization effect of making is better, and it is bad to avoid showing that the product appears the colour mixture after the coating by vaporization.

Description

Mask plate
Technical Field
The present disclosure relates to vapor deposition technology, and more particularly to a mask.
Background
An OLED (Organic Light-Emitting Diode) is a device structure which is widely used, and it uses the combination of electrons and holes to form excitons to generate Light emission, and can obtain different Light-Emitting brightness by adjusting the magnitude of driving current. This light emission manner is different from a conventional TFT-LCD (thin film transistor) manner, and has a significant advantage. The method specifically comprises the following steps:
1. the structure is simple, self-luminescence can be realized, and a backlight source is not needed, so that the thickness of a screen can be reduced;
2. the pulse type driving is adopted, so that the response time is short and the speed is high;
3. the viewing angle is close to 180 degrees, and the LCD screen is wider than the LCD screen;
4. low power consumption, since the OLED does not require a color film, the power consumption depends on the image to be displayed;
5. the contrast is high, and a pure black picture can be displayed;
6. the display panel has good temperature adaptability, namely, the display panel can keep good display effect in a wider temperature range.
At present, although the vacuum evaporation method inevitably wastes a lot of materials, the obtained device has long service life and moderate process complexity, and is still a conventional method for preparing an OLED device. In this manufacturing method, FMM (Fine Metal Mask, as shown in fig. 1) is a necessary article for ensuring the deposition of the organic light emitting material to the designed position, and generally comprises a grip region 100, an effective display region 400, a stress balance mark region 200, and a soldering region 300. The effective display area 400 is an actual evaporation area, and in order to ensure the evaporation effect, it is necessary to ensure that the stress of the effective display area 400 is uniform during the screen opening and welding process, and the welding area 300 cannot be wrinkled. The stress balance mark region 200 is used to relieve stress and reduce the influence of the stretching force on the effective display region 400. The grip area 100 and the welding area 300 are used to grip the FMM and weld the FMM to the metal frame as a nested mask for evaporation.
The existing stress balance mark area 200 is in a strip shape (stress balance grooves are formed in the stress balance area), the design structure is simple, the stress relieving effect is poor, the stress is uneven easily in the effective display area 400, wrinkles easily occur in the welding area 300, and poor color mixing of a display product can be caused. As the glass utilization increases (i.e., the area of the active display area 400 increases), the area available for designing the stress balance indicating area decreases, and the disadvantage increases.
Disclosure of Invention
In order to solve at least one of the technical problems, the invention provides the mask, an effective display area is uniformly stressed in the process of screen stretching and welding, the welding area cannot be wrinkled, the manufactured nested mask is good in evaporation effect, and poor color mixing of a display product after evaporation is avoided.
The mask provided by the embodiment of the invention comprises a plate body, wherein the plate body is provided with: a gripping area; a circular arc identification area located inside the gripping area; the welding area is positioned on the inner side of the circular arc identification area; the bar block identification area is positioned on the inner side of the circular arc identification area; and an effective display area located inside the bar identification area; stress balance grooves are formed in the arc identification area and the bar block identification area.
Optionally, the concave curved surface of the circular arc identification area faces outwards.
Optionally, the bar identification area includes: the block-shaped identification area is positioned on the inner side of the circular arc identification area; and the strip-shaped identification area is positioned on the inner side of the block-shaped identification area.
Optionally, the block mark region includes a plurality of block mark frames arranged in a row or a plurality of rows, and the stress balance groove is formed in each block mark frame.
Optionally, the strip-shaped identification area includes a transverse strip-shaped identification frame, and the stress balance groove is formed in the strip-shaped identification frame.
Optionally, the welding region is located between the block-shaped mark region and the strip-shaped mark region.
Optionally, the circular arc identification area includes a semicircular marking frame, and the stress balance groove is formed in the semicircular marking frame.
Optionally, the arc identification area and the bar identification area are determined by simulation analysis.
Optionally, the stress balance groove is a through groove or a blind hole groove, and the stress balance groove is hexagonal, square, circular or grid.
Optionally, a distance between the left end of the bar mark area and the left edge of the plate body and a distance between the right end of the bar mark area and the right edge of the plate body are not greater than 1 mm.
Compared with the prior art, the mask provided by the invention has the advantages that the arc identification area and the bar identification area are arranged on the mask body, the stress balance grooves are formed in the arc identification area and the bar identification area, the stress uniformity of the effective display area can be ensured in the screen stretching and welding processes, the welding area can be ensured to be relatively flat and not to generate wrinkles, the evaporation effect of the manufactured nested mask is good, and the phenomenon that a display product is poor in color mixing after evaporation is avoided.
Additional features and advantages of the disclosure will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by the practice of the disclosure. The objectives and other advantages of the invention will be realized and attained by the structure particularly pointed out in the written description and claims hereof as well as the appended drawings.
Drawings
The accompanying drawings are included to provide a further understanding of the embodiments herein and are incorporated in and constitute a part of this specification, illustrate embodiments herein and are not to be construed as limiting the embodiments herein.
FIG. 1 is a schematic structural diagram of a mask according to the related art;
FIG. 2 is a schematic view of a partial structure of a mask according to an embodiment of the present invention;
FIG. 3 is a schematic cross-sectional view of a partial structure of an embodiment of a stress balance trench in the reticle shown in FIG. 2;
FIG. 4 is a schematic cross-sectional partial structure view of another embodiment of a stress balance trench in the reticle shown in FIG. 2;
FIG. 5 is a schematic view of a partial structure of one embodiment of a stress balance groove in the mask shown in FIG. 2;
FIG. 6 is a schematic view of a partial structure of another embodiment of a stress balance groove in the mask shown in FIG. 2;
FIG. 7 is a schematic view of a partial structure of another embodiment of a stress balance groove in the reticle shown in FIG. 2;
FIG. 8 is a schematic view of a partial structure of a stress balance groove in the mask shown in FIG. 2 according to still another embodiment.
Wherein, the correspondence between the reference numbers and the part names in fig. 2 to 8 is:
1, 11 gripping areas, 12 arc marking areas, 13 welding areas, 14 effective display areas, 15 stress balance grooves, 16 strip marking areas and 17 block marking areas.
Detailed Description
To make the objects, technical solutions and advantages of the present invention more apparent, the embodiments of the present invention will be described in detail below with reference to the accompanying drawings. It should be noted that the embodiments and features of the embodiments in the present application may be arbitrarily combined with each other without conflict.
In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present disclosure, however, the present disclosure may be practiced otherwise than as specifically described herein, and thus the scope of the present disclosure is not limited by the specific embodiments disclosed below.
Reticles according to some embodiments herein are described below with reference to the figures.
The mask provided by the embodiment of the invention, as shown in fig. 2, comprises a plate body 1, wherein the plate body 1 is provided with: a grip region 11; a circular arc identification area 12 located inside the grip area 11; a welding area 13 located inside the circular arc identification area 12; a bar mark area located inside the arc mark area 12; and an active display area 14 located inside the bar identification area; stress balance grooves 15 are formed in the arc mark area 12 and the bar block mark area.
This mask, it has circular arc identification area 12 and bar sign region to have on its version body 1, and stress balance groove 15 is seted up on circular arc identification area 12 and bar sign region, can enough guarantee that effective display area 14 atress is even in a net and welding process, can also guarantee that welding area 13 is comparatively flat, not take place the fold, and the suit mask coating evaporation plating effect of making is better, and it is bad to show that the colour mixture appears in the product after avoiding the evaporation plating.
The mask is a metal mask, and molecules of the organic material evaporated by heating are deposited on the anode of the display backplane through the openings of the effective display area 14 during evaporation.
Wherein the grip area 11, the circular arc marking area 12, the welding area 13, and the bar marking area are symmetrically disposed up and down with respect to the effective display area 14.
Optionally, the concave surface of the circular arc identification area 12 faces outwards (i.e. the opening faces outwards), and the radius and position of the concave surface are determined through simulation analysis and can be adjusted.
Specifically, the circular arc identification area 12 is a semicircular marking frame, and the stress balance groove 15 is formed in the semicircular marking frame.
Optionally, the bar identification area includes: a block-shaped mark region 17 located inside the circular arc mark region 12; and a bar-shaped identification area 16 located inside the block-shaped identification area 17.
Specifically, the block identification region 17 includes a plurality of block identification frames arranged transversely at intervals, the plurality of block identification frames are arranged in one or more rows (such as one row, two rows or three rows), any row includes one or more block identification frames, the length, width and mutual spacing of the block identification frames are determined through simulation analysis, and the stress balance grooves 15 are formed in the block identification frames.
Specifically, the strip-shaped mark area 16 includes a transverse strip-shaped mark frame, and the stress balance groove 15 is formed in the strip-shaped mark frame.
Furthermore, the welding area 13 is located between the block-shaped identification area 17 and the strip-shaped identification area 16, the stress balance effect of the welding area 13 is good, and wrinkles are less prone to occurring after the net is stretched and welded.
Alternatively, the stress balance groove 15 is a through groove formed by full-through etching (as shown in fig. 3) or a blind hole groove formed by half-through etching (as shown in fig. 4), and the stress balance groove 15 has a hexagonal shape (as shown in fig. 5), a square shape (as shown in fig. 6), a circular shape (as shown in fig. 7), or a grid bar shape (as shown in fig. 8), which can all achieve the purpose of the present application, and the purpose of the present application does not depart from the design concept of the present invention, and therefore, the present application is not described herein again, and all of the present application shall fall within the protection scope of the present application.
Furthermore, the distance between the left end of the bar mark area and the left edge of the plate body 1 and the distance between the right end of the bar mark area and the right edge of the plate body 1 are not more than 1mm, and the preferable design is about 0.5 mm.
In summary, the mask provided by the invention has the advantages that the arc identification area and the bar identification area are arranged on the mask body, the stress balance grooves are formed in the arc identification area and the bar identification area, the uniform stress of the effective display area can be ensured in the screen stretching and welding processes, the welding area can be ensured to be flat and not to wrinkle, the evaporation effect of the manufactured nested mask is good, and the phenomenon of poor color mixing of a display product after evaporation is avoided.
In the description herein, the terms "mounted," "connected," "fixed," and the like are to be construed broadly, e.g., "connected" may be a fixed connection, a removable connection, or an integral connection; may be directly connected or indirectly connected through an intermediate. The specific meaning of the above terms herein can be understood by those of ordinary skill in the art as appropriate.
In the description of the specification, reference to the term "one embodiment," "some embodiments," "a specific embodiment," or the like, means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example herein. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
Although the embodiments disclosed herein are described above, the descriptions are only for the convenience of understanding the embodiments and are not intended to limit the disclosure. It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the disclosure, and that the scope of the disclosure herein may be limited only by the appended claims.

Claims (8)

1. A mask plate comprises a plate body, and is characterized in that the plate body is provided with:
a gripping area;
a circular arc identification area located inside the gripping area;
the welding area is positioned on the inner side of the circular arc identification area;
the bar block identification area is positioned on the inner side of the circular arc identification area; and
an active display area located inside the bar identification area;
stress balance grooves are formed in the arc identification area and the bar block identification area;
the bar identification area includes: the block-shaped identification area is positioned on the inner side of the circular arc identification area; and a strip-shaped identification area located on the inner side of the block-shaped identification area;
the welding area is located between the block-shaped mark area and the strip-shaped mark area.
2. The reticle of claim 1, wherein the concave curved surface of the circular arc identification area faces outward.
3. The mask according to claim 1, wherein the block mark region comprises a plurality of block mark frames arranged transversely, the plurality of block mark frames are arranged in a plurality of rows, the length of the plurality of block mark frames is different, the interval between two adjacent block mark frames in each row is arranged in a staggered manner in the row direction, and the stress balance groove is formed in each block mark frame.
4. The mask according to claim 1, wherein the bar-shaped mark region comprises a transverse bar-shaped mark frame, and the stress balance groove is formed in the bar-shaped mark frame.
5. The mask according to claim 1, wherein the circular arc identification area comprises a semicircular marking frame, and the stress balance groove is formed in the semicircular marking frame.
6. The reticle of any one of claims 1 to 5, wherein the arc identification area and the bar identification area are determined by simulation analysis.
7. The mask according to any one of claims 1 to 5, wherein the stress balance grooves are through grooves or blind grooves, and the stress balance grooves are hexagonal, square, circular or grid-like.
8. The mask according to any one of claims 1 to 5, wherein a distance between a left end of the bar mark region and a left edge of the plate body and a distance between a right end of the bar mark region and a right edge of the plate body are not greater than 1 mm.
CN201810188271.2A 2018-03-07 2018-03-07 Mask plate Active CN108179380B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810188271.2A CN108179380B (en) 2018-03-07 2018-03-07 Mask plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201810188271.2A CN108179380B (en) 2018-03-07 2018-03-07 Mask plate

Publications (2)

Publication Number Publication Date
CN108179380A CN108179380A (en) 2018-06-19
CN108179380B true CN108179380B (en) 2020-05-12

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110423983B (en) * 2019-08-30 2021-11-16 京东方科技集团股份有限公司 Mask plate
CN111926291A (en) * 2020-08-31 2020-11-13 合肥维信诺科技有限公司 Mask plate and mask plate assembly
CN112281113B (en) * 2020-10-28 2022-10-18 京东方科技集团股份有限公司 Mask plate and mask plate assembly
CN112662994B (en) * 2020-12-04 2023-04-25 合肥维信诺科技有限公司 Mask and preparation method thereof

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103911583B (en) * 2012-12-29 2016-04-27 上海天马微电子有限公司 AMOLED metal mask plate
TWI480399B (en) * 2013-07-09 2015-04-11 Metal mask
CN204803392U (en) * 2015-07-27 2015-11-25 昆山国显光电有限公司 Accurate mask plate
CN105568218A (en) * 2016-01-11 2016-05-11 友达光电股份有限公司 Shielding cover assembly
CN105803389B (en) * 2016-05-18 2019-01-22 京东方科技集团股份有限公司 Mask plate and preparation method thereof

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