CN108120409A - Film thickness measurement device and film thickness measuring method - Google Patents

Film thickness measurement device and film thickness measuring method Download PDF

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Publication number
CN108120409A
CN108120409A CN201711421791.5A CN201711421791A CN108120409A CN 108120409 A CN108120409 A CN 108120409A CN 201711421791 A CN201711421791 A CN 201711421791A CN 108120409 A CN108120409 A CN 108120409A
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Prior art keywords
probe
vitta
thickness
probes
spacing
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CN201711421791.5A
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CN108120409B (en
Inventor
年婷
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Wuhan China Star Optoelectronics Technology Co Ltd
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Wuhan China Star Optoelectronics Technology Co Ltd
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B21/00Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
    • G01B21/02Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
    • G01B21/08Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness for measuring thickness

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • A Measuring Device Byusing Mechanical Method (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)

Abstract

The invention discloses a kind of film thickness measuring method, including:Set the spacing between two first probes;Measure the thickness of vitta respectively using two first probes;Determine whether that first probe falls in the interval between two vittas, and when wherein one first probe falls in the interval between two vittas, using the thickness of another the first probe measurement as the actual (real) thickness of vitta.The invention also discloses a kind of film thickness measurement devices.The present invention is when the thickness to vitta measures, the different parts of film layer are detected respectively using more probes, and pass through the spacing that probe is set in advance, so that without purposely removing the privileged site for making probe alignment vitta before being detected to thicknesses of layers, inaccurate situation is measured caused by can shifting to avoid the point position of probe, improves work efficiency and ensure that measurement accuracy.

Description

Film thickness measurement device and film thickness measuring method
Technical field
The present invention relates to display technology field more particularly to a kind of film thickness measurement device and film thickness measuring methods.
Background technology
At present in the production of liquid crystal panel, be broadly divided into Array (array substrate) processing procedure, CF (color membrane substrates) processing procedure, Four Cell (liquid crystal cell) processing procedure, Module (module) processing procedure parts form.The part of CF processing procedures predominantly makes colored substrate, Color is assigned to the display that we are seen.
It needs to measure its film thickness after color membrane substrates shaping, main measurement board to be used is SP (surface Profile, i.e. surface profile) board, its main function is that the film thickness of product is monitored, and principle is utilized certain Under pressure, probe slides the electric signal of the difference in height generation of generation to measure film thickness on the vitta film of pixel.But It is since its precision is relatively low, i.e., when the measurement position of probe is located at by the black matrix between the two neighboring vitta, during measurement The point position of probe can shift and slide into black matrix, cause measurement inaccurate, therefore be difficult to meet existing demand, particularly For 4K high definition panels, substantially can not auto-measuring, the mode measured manually can only be taken, this does not only result in the waste of manpower, It has been greatly reduced measurement efficiency.
The content of the invention
In view of the shortcomings of the prior art, the present invention provides a kind of film thickness measurement device and film thickness measuring methods, can To realize the auto-measuring of film thickness, unnecessary probe position fixing process is avoided, improves measurement efficiency.
In order to realize above-mentioned purpose, present invention employs following technical solutions:
A kind of film thickness measuring method is measured using at least two first probes, including:
The spacing between two first probes is set, meets the spacing between two first probes:D≠m* L+n*B, wherein, D is the spacing between two first probes, and L is the length of vitta, and B is along the length direction of vitta Two neighboring vitta between spacing, m, n be natural number;
Measure the thickness of vitta, the mistake of the thickness of the first probe measurement vitta respectively using two first probes Journey includes:
Two first probes are close towards vitta respectively and vertically penetrate vitta;
It calculates the first probe contact vitta and penetrates the displacement of the first probe described in two moment of vitta, institute's rheme Shifting amount as measures the thickness of the vitta drawn;
Determine whether that first probe falls in the interval between two vittas, and first spy wherein When pin is fallen in the interval between two vittas, using the thickness of another the first probe measurement as the actual thickness of vitta Degree.
As one of which embodiment, the spacing between two first probes meets:D=(M+0.5) * L+B, In, M is natural number.
As one of which embodiment, the film thickness measuring method further includes:When two first probes all not When falling in the interval between two vittas, two thickness of vitta for drawing will be measured and carried out respectively with predetermined thickness range pair Than using the thickness closer to predetermined thickness range as the actual (real) thickness of vitta.
As one of which embodiment, first probe includes pressure sensor and displacement sensor, described the During the thickness of one probe measurement vitta, described first is judged by the pressure jump situation for comparing the pressure sensor Probe contacts vitta and penetrates two moment of vitta, and the displacement difference between described two moment that displacement sensor is obtained Thickness as the vitta that measurement is drawn.
As one of which embodiment, at least second probe it is identical with first probe structure and with it is described First probe separation is set, and the spacing between second probe and adjacent first probe meets:D ' ≠ m*L+n*B, Spacing of the D ' between second probe and adjacent first probe.
Another object of the present invention is to provide a kind of film thickness measurement device, the microscope carrier and at least including being used to place vitta Two first probes with pressure sensor and displacement sensor, first probe are arranged on above the microscope carrier and can directions Moved with away from the microscope carrier, for during being inserted into and penetrating vitta according to the pressure jump signal of pressure sensor and The displacement signal of displacement sensor draws the thickness of vitta;Spacing between at least two first probes meets:D≠m*L+ N*B, wherein, D is the spacing between two first probes, and L is the length of vitta, and B is along the length direction of vitta Spacing between two neighboring vitta, m, n are natural number.
As one of which embodiment, the spacing between two first probes meets:D=(M+0.5) * L+B, In, M is natural number.
As one of which embodiment, the film thickness measurement device further includes adjusting mechanism, and the adjusting mechanism is used Spacing between adjacent two first probes are adjusted.
As one of which embodiment, the length of the vitta is 20~60 μm.
As one of which embodiment, the film thickness measurement device further includes at least second probe, and described Two probes are identical with first probe structure and set with first probe separation, second probe with it is adjacent described Spacing between first probe meets:D ' ≠ m*L+n*B, D ' are between second probe and adjacent first probe Spacing.
The present invention respectively examines the different parts of film layer using more probes when the thickness to vitta is measured It surveys, and passes through the spacing that probe is set in advance so that without purposely going to make probe pair before being detected to thicknesses of layers The privileged site of quasi- vitta measures inaccurate situation caused by can shifting to avoid the point position of probe, improves work Efficiency simultaneously ensure that measurement accuracy.
Description of the drawings
Fig. 1 is the film thickness measuring position view of the embodiment of the present invention;
Fig. 2 is the position view of the probe of the embodiment of the present invention;
Fig. 3 is the film thickness measuring method schematic diagram of the embodiment of the present invention.
Specific embodiment
In order to make the purpose , technical scheme and advantage of the present invention be clearer, with reference to the accompanying drawings and embodiments, it is right The present invention is further described.It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, and do not have to It is of the invention in limiting.
Refering to Fig. 1 and Fig. 2, the film thickness measuring method of the embodiment of the present invention is surveyed using at least two first probes 20 Amount, the film thickness measuring method mainly include:
Spacing between two S01, setting first probes 20, meets the space D between two first probes 20:D≠ M*L+n*B, wherein, L is the length of vitta 1, and B is along the spacing between the two neighboring vitta on the length direction of vitta, m, n For natural number;Here, it is only necessary to which two first probes 20, which ensure that always, has first probe 20 not to be offset to two In black matrix between a vitta, therefore, the spacing of other the first probes 20 can arbitrarily be set, it is, of course, preferable to all Spacing between one probe 20 meets the requirement of above formula;
S02, the thickness for measuring vitta 1 respectively using two first probes 20, the thickness of the first probe 20 measurement vitta 1 Process includes:
Two first probes 20 are close towards vitta 1 respectively and vertically penetrate vitta 1;
It calculates the first probe 20 contact vitta 1 and penetrates the displacement of 1 two the first probes of moment 20 of vitta, displacement is To measure the thickness of the vitta 1 drawn;
S03, determine whether that the first probe 20 falls in the interval between two vittas 1, when wherein first probe 20 when falling in the interval between two vittas 1, performs following step S04:With the thickness of another the first probe 20 measurement Actual (real) thickness as vitta 1;When two first probes 20 are not all fallen in the spacing between two vittas 1, perform following Step S05:Two thickness for measuring the vitta 1 drawn are compared respectively with predetermined thickness range, with closer predetermined Actual (real) thickness of the thickness of thickness range as vitta 1.
With reference to Fig. 3, since the spacing between two first probes 20 is just pre-set before detection so that at least There is first probe 20 in the black matrix 2 neither between two neighboring vitta 1, it is also not close on any one 1 side of vitta The region of black matrix 2, it may therefore be assured that at least one probe can detect actual film thickness.In two probes all 2 corresponding region of black matrix not between vitta 1, also not near black matrix when, two probes are all not in that a position is inclined It moves, at this point, actual (real) thickness of the application using the measurement thickness closer to predetermined thickness range as vitta 1, testing result are more smart Really.In the prior art, the longer vitta of length often may be only available for using the detection mode of Single probe, and setting in this way It puts, the length for the vitta 1 that the detection mode of the present embodiment is applicable in can cover 20~60 μm, can cover smaller vitta size, It is suitable for the higher display panel of resolution ratio, accuracy of detection also higher.
Compare preferred embodiment as one of which, the spacing between two first probes 20 meets:D=M+0.5* L+B, wherein, M is natural number, as shown in Figures 2 and 3, when wherein first probe 20 is located at 2 side (Fig. 1 center lines b institutes of black matrix Show position) when, in addition first probe 20 is located at the close intermediate position (position shown in Fig. 1 center lines a) of vitta 1, the portion The testing result of position is closer to the actual (real) thickness of vitta 1.
Specifically, the first probe 20 includes pressure sensor and displacement sensor, in the thickness of the first probe 20 measurement vitta 1 During degree, the first probe 20 contact vitta 1 is judged by the pressure jump situation of reduced pressure sensor and penetrates vitta 1 Two moment, and the displacement difference between two moment that displacement sensor is obtained is as measuring the thickness of vitta 1 that draws.
In addition, the quantity of probe can be not limited in two, for example, at least one second spy by the first probe 20 Pin, the second probe is identical with 20 structure of the first probe and is arranged at intervals with the first probe 20, and the second probe is visited with adjacent first Space D ' between pin 20 meets:D ' ≠ m*L+n*B.That is the first probe 20, the linear cloth of the length direction of the second probe along vitta 1 It puts, when the quantity of probe is more than two, the testing result of the more probes away from black matrix 2 can be compared, selected Closest to actual (real) thickness of the measurement thickness as vitta 1 of predetermined thickness range.It alternatively, can also be to these away from black matrix 2 The testing result of probe average, using the average value as the actual (real) thickness of vitta 1.
Correspondingly, the present invention mainly includes placing vitta 1 for detecting the film thickness measurement device of vitta thickness Microscope carrier 10, two there are the first probes 20 and adjusting mechanism of pressure sensor and displacement sensor, the first probe 20 is arranged on The top of microscope carrier 10 can simultaneously be moved toward and away from microscope carrier 10, for during being inserted into and penetrating vitta 1 according to pressure sensing The pressure jump signal of device and the displacement signal of displacement sensor draw the thickness of vitta 1;Adjusting mechanism is used to adjust adjacent two Spacing between the first probe of root 20.To adapt to the vitta 1 of different length.Wherein, the space D between two first probes 20 expires Foot:D ≠ m*L+n*B, it is highly preferred that the space D meets:D=(M+0.5) * L+B, wherein, M is natural number.
For example, when probe is not in contact with vitta, the reading of pressure sensor is 0, when the moment of probe contact vitta, pressure The reading of sensor is undergone mutation, and during probe continues piercing, the reading of pressure sensor remains at certain In the range of, when probe continue to be pierced into and when penetrating the bottom surface of vitta, the reading of pressure sensor die-off and be mutated again or because after Continue and be pierced into and arriving on microscope carrier 10 causes reading to increase and be mutated, die-offed by reading probe in first time abruptly increase and for the first time The displacement readings variable quantity of displacement sensor in journey, you can obtain probe and penetrate the displacement that vitta is moved, vitta is detected with this Thickness.
Further, film thickness measurement device further includes at least second probe, 20 structure of the second probe and the first probe Identical and be arranged at intervals with the first probe 20, the spacing between the second probe and the first adjacent probe 20 meets:D ' ≠ m*L+ Spacing of n*B, the D ' between the second probe and the first adjacent probe 20.First probe 20, length of second probe along vitta 1 Dimension linear is arranged, when the quantity of probe is more than two, can be carried out the testing result of the more probes away from black matrix 2 Actual (real) thickness of the measurement thickness closest to predetermined thickness range as vitta 1 is selected in comparison.It alternatively, can also be remote to these The testing result of probe from black matrix 2 is averaged, using the average value as the actual (real) thickness of vitta 1.
The present invention respectively examines the different parts of film layer using more probes when the thickness to vitta is measured It surveys, and passes through the spacing that probe is set in advance so that without purposely going to make probe pair before being detected to thicknesses of layers The privileged site of quasi- vitta measures inaccurate situation caused by can shifting to avoid the point position of probe, improves work Efficiency simultaneously ensure that measurement accuracy.
The above is only the specific embodiment of the application, it is noted that for the ordinary skill people of the art For member, on the premise of the application principle is not departed from, several improvements and modifications can also be made, these improvements and modifications also should It is considered as the protection domain of the application.

Claims (10)

  1. A kind of 1. film thickness measuring method, which is characterized in that it is measured using at least two first probes (20), including:
    The spacing between two first probes (20) is set, meets the spacing between two first probes (20):D ≠ m*L+n*B, wherein, D is the spacing between two first probes (20), and L is the length of vitta (1), and B is along vitta The spacing between two neighboring vitta on length direction, m, n are natural number;
    Measure the thickness of vitta (1), the first probe (20) measurement vitta (1) respectively using two first probes (20) The process of thickness include:
    Two first probes (20) are close towards vitta (1) respectively and vertically penetrate vitta (1);
    It calculates the first probe (20) contact vitta (1) and penetrates the position of the first probe (20) described in (1) two moment of vitta Shifting amount, the displacement as measure the thickness of the vitta (1) drawn;
    Determine whether that first probe (20) falls in the interval between two vittas (1), and one described wherein When one probe (20) is fallen in the interval between two vittas (1), made with the thickness of another the first probe (20) measurement For the actual (real) thickness of vitta (1).
  2. 2. film thickness measuring method according to claim 1, which is characterized in that between two first probes (20) Away from satisfaction:D=(M+0.5) * L+B, wherein, M is natural number.
  3. 3. film thickness measuring method according to claim 1, which is characterized in that further include:When two first probes (20) when all not falling in the interval between two vittas (1), two thickness of the vitta (1) drawn will be measured respectively with making a reservation for Thickness range is compared, using the thickness closer to predetermined thickness range as the actual (real) thickness of vitta (1).
  4. 4. film thickness measuring method according to claim 1, which is characterized in that first probe (20) includes pressure sensing Device and displacement sensor during the thickness of first probe (20) measurement vitta (1), are passed by comparing the pressure The pressure jump situation of sensor judges that first probe (20) contacts vitta (1) and penetrates two moment of vitta (1), and will The thickness for the vitta (1) that displacement difference between described two moment that displacement sensor obtains is drawn as measurement.
  5. 5. according to any film thickness measuring methods of claim 1-4, which is characterized in that at least second probe and institute It is identical and be arranged at intervals with first probe (20) to state the first probe (20) structure, second probe and adjacent described the Spacing between one probe (20) meets:D ' ≠ m*L+n*B, D ' are second probe and adjacent first probe (20) Between spacing.
  6. 6. a kind of film thickness measurement device, which is characterized in that microscope carrier (10) and at least two including being used to place vitta (1) have The first probe (20) of pressure sensor and displacement sensor, first probe (20) are arranged on above the microscope carrier (10) and can It is moved toward and away from the microscope carrier (10), for the pressure according to pressure sensor during being inserted into and penetrating vitta (1) The displacement signal of power jump signal and displacement sensor draws the thickness of vitta (1);At least two first probes (20) it Between spacing meet:D ≠ m*L+n*B, wherein, D is the spacing between two first probes (20), and L is the length of vitta (1) Degree, B are along the spacing between the two neighboring vitta on the length direction of vitta, and m, n are natural number.
  7. 7. film thickness measurement device according to claim 6, which is characterized in that between two first probes (20) Away from satisfaction:D=(M+0.5) * L+B, wherein, M is natural number.
  8. 8. film thickness measurement device according to claim 6, which is characterized in that further include adjusting mechanism, the adjusting mechanism For adjusting the spacing between adjacent two first probes (20).
  9. 9. film thickness measurement device according to claim 6, which is characterized in that the length of the vitta (1) is 20~60 μm.
  10. 10. according to any film thickness measurement devices of claim 6-9, which is characterized in that further include at least one second spy Pin, second probe is identical with the first probe (20) structure and is arranged at intervals with first probe (20), described the Spacing between two probes and adjacent first probe (20) meets:D ' ≠ m*L+n*B, D ' are second probe and phase Spacing between adjacent first probe (20).
CN201711421791.5A 2017-12-25 2017-12-25 Film thickness measuring apparatus and film thickness measuring method Active CN108120409B (en)

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Cited By (2)

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Publication number Priority date Publication date Assignee Title
CN109751961A (en) * 2019-01-07 2019-05-14 成都中电熊猫显示科技有限公司 A kind of the point automatic adjusting method and thicknesses of layers measuring device of film thickness measuring instrument
CN117990028A (en) * 2024-02-03 2024-05-07 广东天泰工程检测有限公司 Method and system for detecting pile bottom sediment thickness of concrete filling foundation pile

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109751961A (en) * 2019-01-07 2019-05-14 成都中电熊猫显示科技有限公司 A kind of the point automatic adjusting method and thicknesses of layers measuring device of film thickness measuring instrument
CN117990028A (en) * 2024-02-03 2024-05-07 广东天泰工程检测有限公司 Method and system for detecting pile bottom sediment thickness of concrete filling foundation pile

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