CN108098610A - A kind of formula and preparation method of seamless polishing abrading block - Google Patents
A kind of formula and preparation method of seamless polishing abrading block Download PDFInfo
- Publication number
- CN108098610A CN108098610A CN201711376005.4A CN201711376005A CN108098610A CN 108098610 A CN108098610 A CN 108098610A CN 201711376005 A CN201711376005 A CN 201711376005A CN 108098610 A CN108098610 A CN 108098610A
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- CN
- China
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- parts
- mesh
- granularity
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- abrading block
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
- B24D18/0009—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for using moulds or presses
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
The present invention provides formula and the preparation side of a kind of seamless polishing abrading block, and the formula of seamless polishing abrading block provided by the invention includes following substance, 10 parts of diamond in parts by mass；9 parts of aluminium oxide；14 parts of zinc oxide；8 parts of barium monoxide；41 parts of phenolic aldehyde bonding agent；7 parts of rubber modifier；1 part of reagent grade-lubricant；10 parts of nanoscale glazing agent.The difference of the polishing effect of the product obtained using the present invention and other similar products is that polishing effect is good, and polished surface does not grind print, and without water ripples, clear crystalistic sense is very strong；During polishing, for pressure that need not be very big with regard to the good effect that can dish out, power consumption is low, and 40 percent electricity can be saved in original basis.And the product glazing that the present invention obtains is fast, can dish out good effect in a short time, significantly shorten the labor intensity of worker.
Description
Technical field
The present invention provides a kind of formula and preparation method of seamless polishing abrading block.
Background technology
Polishing machine is a kind of machine being processed to metal product, can carry out edging polishing to product.Through overground
The product surface smoother that head polishing comes out is clean bright.The frosted layer and assembly parts of the polishing abrading block of existing product polishing machine
Between in succession together, if when polish abrading block work when run into product surface occur it is uneven, due to frosted layer and assembly parts
Between there is no a buffer layer, frosted layer can be smooth by the rough surface polishing of product.This can cause product surface projection portion
Fancy glaze and overglaze skim so that the pattern of product is imperfect.
The content of the invention
It is a primary object of the present invention to provide a kind of formula and preparation method of seamless polishing abrading block, obtained using the present invention
The difference of the polishing effect of the product obtained and other similar products is that polishing effect is good, and polished surface does not grind print, does not have
Water ripples, clear crystalistic sense are very strong；During polishing, pressure that need not be very big is with regard to the good effect that can dish out, and power consumption is low, in former base
40 percent electricity can be saved on plinth.And the product glazing that the present invention obtains is fast, can dish out in a short time very well
Effect, significantly shorten the labor intensity of worker.
The technical solution adopted by the present invention is：A kind of formula of seamless polishing abrading block, includes following object in parts by mass
Matter,
10 parts of diamond；
9 parts of aluminium oxide；
14 parts of zinc oxide；
8 parts of barium monoxide；
41 parts of phenolic aldehyde bonding agent；
7 parts of rubber modifier；
1 part of reagent grade-lubricant；
10 parts of nanoscale glazing agent.
The granularity of above-mentioned diamond is 8000 mesh, and the granularity of above-mentioned aluminium oxide is 6000 mesh, and the granularity of above-mentioned zinc oxide is
800 mesh, above-mentioned phenolic aldehyde bonding agent granularity are 400 mesh, and the granularity of above-mentioned barium monoxide is 500 mesh, above-mentioned phenolic aldehyde bonding agent granularity 400
Mesh, above-mentioned rubber modifier granularity are 325 mesh.
A kind of preparation method of seamless polishing abrading block, comprises the following steps, step 1, first by the diamond and oxygen in formula
Change aluminium mixing, sieved with molecular sieve filtration, the uniformity for reaching recipe requirements is for use；
Step 2, zinc oxide, barium monoxide phenolic aldehyde bonding agent, rubber modifier, reagent grade-lubricant, nanoscale glazing agent, by with
The ratio of side weighs accurately respectively, is subsequently poured into material mixing bucket and is stirred, the uniformity of stirring is observed, after syncretism is uniform
It is for use to stop stirring.
The ready material of step 1 is poured into charging basket by step 3 respectively, is stopped after stirring 6 hours on transit mixer
It is only for use.
Step 4 Step 3: the ready material of step 4 is put into the mold being already prepared to, presses 16 on press
Minute, the demoulding, cutting edge, secondary curing, stickup, packaging and storage.
Beneficial effects of the present invention are：It is provided by the invention it is seamless polishing abrading block formula, in parts by mass include with
Lower substance, 10 parts of diamond；9 parts of aluminium oxide；14 parts of zinc oxide；8 parts of barium monoxide；41 parts of phenolic aldehyde bonding agent；Rubber modifier 7
Part；1 part of reagent grade-lubricant；10 parts of nanoscale glazing agent.It is same using the polishing effect and others of the product of the invention obtained
The difference of class product is that polishing effect is good, and polished surface does not grind print, and without water ripples, clear crystalistic sense is very strong；During polishing,
For pressure that need not be very big with regard to the good effect that can dish out, power consumption is low, and 40 percent electricity can be saved in original basis.
And the product glazing that the present invention obtains is fast, can dish out good effect in a short time, significantly shorten the work of worker
Intensity.
Specific embodiment
It is a kind of preferable specific embodiment of the present invention below, a kind of formula of seamless polishing abrading block, by mass parts
Meter includes following substance,
10 parts of diamond；
9 parts of aluminium oxide；
14 parts of zinc oxide；
8 parts of barium monoxide；
41 parts of phenolic aldehyde bonding agent；
7 parts of rubber modifier；
1 part of reagent grade-lubricant；
10 parts of nanoscale glazing agent.
Further, the granularity of above-mentioned diamond is 8000 mesh, and the granularity of above-mentioned aluminium oxide is 6000 mesh, above-mentioned zinc oxide
Granularity is 800 mesh, and above-mentioned phenolic aldehyde bonding agent granularity is 400 mesh, and the granularity of above-mentioned barium monoxide is 500 mesh, above-mentioned phenolic aldehyde bonding agent
400 mesh of granularity, above-mentioned rubber modifier granularity are 325 mesh.
A kind of preparation method of seamless polishing abrading block, comprises the following steps, step 1, first by the diamond and oxygen in formula
Change aluminium mixing, sieved with molecular sieve filtration, the uniformity for reaching recipe requirements is for use；
Step 2, zinc oxide, barium monoxide phenolic aldehyde bonding agent, rubber modifier, reagent grade-lubricant, nanoscale glazing agent, by with
The ratio of side weighs accurately respectively, is subsequently poured into material mixing bucket and is stirred, the uniformity of stirring is observed, after syncretism is uniform
It is for use to stop stirring.
The ready material of step 1 is poured into charging basket by step 3 respectively, is stopped after stirring 6 hours on transit mixer
It is only for use.
Step 4 Step 3: the ready material of step 4 is put into the mold being already prepared to, presses 16 on press
Minute, the demoulding, cutting edge, secondary curing, stickup, packaging and storage.
The difference of the polishing effect of the product obtained using the present invention and other similar products is that polishing effect is good, is thrown
Optical surface does not grind print, and without water ripples, clear crystalistic sense is very strong；During polishing, pressure that need not be very big is with regard to that can dish out very well
Effect, power consumption is low, and 40 percent electricity can be saved in original basis.And the product glazing that the present invention obtains is fast, it can
With good effect of dishing out in a short time, the labor intensity of worker is significantly shortened.
The embodiment of the present invention is intended merely to the design concept of the displaying present invention, and protection scope of the present invention should not limit to
In this embodiment.
It can be seen from the above description that the purpose of design of the present invention can effectively be implemented.The part exhibition of embodiment
Show the purpose of the present invention and implement function and structure theme, and including other equivalent substitutions.
Therefore, the claims of the present invention include other equivalent implementations, and the specific scope of claims are incorporated herein by reference.
Claims (3)
1. a kind of formula of seamless polishing abrading block, it is characterised in that：It includes following substance in parts by mass,
10 parts of diamond；
9 parts of aluminium oxide；
14 parts of zinc oxide；
8 parts of barium monoxide；
41 parts of phenolic aldehyde bonding agent；
7 parts of rubber modifier；
1 part of reagent grade-lubricant；
10 parts of nanoscale glazing agent.
2. a kind of formula of seamless polishing abrading block as described in claim 1, the granularity of above-mentioned diamond is 8000 mesh, above-mentioned oxygen
Change the granularity of aluminium as 6000 mesh, the granularity of above-mentioned zinc oxide is 800 mesh, and above-mentioned phenolic aldehyde bonding agent granularity is 400 mesh, above-mentioned oxidation
The granularity of barium is 500 mesh, and above-mentioned 400 mesh of phenolic aldehyde bonding agent granularity, above-mentioned rubber modifier granularity is 325 mesh.
3. a kind of preparation method of seamless polishing abrading block, it is characterised in that：Comprise the following steps, step 1, first by claim 1
Diamond and aluminium oxide mixing in formula, are sieved, the uniformity for reaching recipe requirements is for use with molecular sieve filtration；
Step 2, zinc oxide, barium monoxide phenolic aldehyde bonding agent, rubber modifier, reagent grade-lubricant, nanoscale glazing agent, by with
The ratio of side weighs accurately respectively, is subsequently poured into material mixing bucket and is stirred, the uniformity of stirring is observed, after syncretism is uniform
It is for use to stop stirring；
The ready material of step 1 is poured into charging basket by step 3 respectively, stops treating after stirring 6 hours on transit mixer
With；
Step 4 Step 3: the ready material of step 4 is put into the mold being already prepared to, presses 16 points on press
Clock, the demoulding, cutting edge, secondary curing are pasted, packaging and storage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711376005.4A CN108098610A (en) | 2017-12-19 | 2017-12-19 | A kind of formula and preparation method of seamless polishing abrading block |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711376005.4A CN108098610A (en) | 2017-12-19 | 2017-12-19 | A kind of formula and preparation method of seamless polishing abrading block |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108098610A true CN108098610A (en) | 2018-06-01 |
Family
ID=62210307
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711376005.4A Pending CN108098610A (en) | 2017-12-19 | 2017-12-19 | A kind of formula and preparation method of seamless polishing abrading block |
Country Status (1)
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| CN (1) | CN108098610A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109551353A (en) * | 2018-12-12 | 2019-04-02 | 蓝思科技（长沙）有限公司 | A kind of polishing frotton and its polishing process |
Citations (5)
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|---|---|---|---|---|
| US5989114A (en) * | 1997-10-21 | 1999-11-23 | Unova Ip Corp. | Composite grinding and buffing disc with flexible rim |
| CN101851488A (en) * | 2009-03-31 | 2010-10-06 | 三河市科大博德粉末有限公司 | Ceramic bond diamond grinding block and manufacturing method thereof |
| CN102153718A (en) * | 2011-01-10 | 2011-08-17 | 河南工业大学 | Heat-resistant phenolic resin and application thereof in production of super-hard material resin mold |
| CN102501186A (en) * | 2011-11-02 | 2012-06-20 | 广东奔朗新材料股份有限公司 | Wear-resistant diamond polishing grinder and production method thereof |
| CN102975131A (en) * | 2012-12-20 | 2013-03-20 | 郑州新安华砂轮有限公司 | Stone wheel and manufacturing method thereof |
-
2017
- 2017-12-19 CN CN201711376005.4A patent/CN108098610A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5989114A (en) * | 1997-10-21 | 1999-11-23 | Unova Ip Corp. | Composite grinding and buffing disc with flexible rim |
| CN101851488A (en) * | 2009-03-31 | 2010-10-06 | 三河市科大博德粉末有限公司 | Ceramic bond diamond grinding block and manufacturing method thereof |
| CN102153718A (en) * | 2011-01-10 | 2011-08-17 | 河南工业大学 | Heat-resistant phenolic resin and application thereof in production of super-hard material resin mold |
| CN102501186A (en) * | 2011-11-02 | 2012-06-20 | 广东奔朗新材料股份有限公司 | Wear-resistant diamond polishing grinder and production method thereof |
| CN102975131A (en) * | 2012-12-20 | 2013-03-20 | 郑州新安华砂轮有限公司 | Stone wheel and manufacturing method thereof |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109551353A (en) * | 2018-12-12 | 2019-04-02 | 蓝思科技（长沙）有限公司 | A kind of polishing frotton and its polishing process |
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Application publication date: 20180601 |