CN108085748A - A kind of corrosive liquid of monocrystalline silicon - Google Patents

A kind of corrosive liquid of monocrystalline silicon Download PDF

Info

Publication number
CN108085748A
CN108085748A CN201711278220.0A CN201711278220A CN108085748A CN 108085748 A CN108085748 A CN 108085748A CN 201711278220 A CN201711278220 A CN 201711278220A CN 108085748 A CN108085748 A CN 108085748A
Authority
CN
China
Prior art keywords
monocrystalline silicon
corrosive liquid
silicon
present
deionized water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
CN201711278220.0A
Other languages
Chinese (zh)
Inventor
王世榕
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nantong Haixin Mdt Infotech Ltd
Original Assignee
Nantong Haixin Mdt Infotech Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nantong Haixin Mdt Infotech Ltd filed Critical Nantong Haixin Mdt Infotech Ltd
Priority to CN201711278220.0A priority Critical patent/CN108085748A/en
Publication of CN108085748A publication Critical patent/CN108085748A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/06Silicon
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00After-treatment of single crystals or homogeneous polycrystalline material with defined structure
    • C30B33/08Etching
    • C30B33/10Etching in solutions or melts

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Detergent Compositions (AREA)

Abstract

The present invention discloses a kind of corrosive liquid of monocrystalline silicon, according to the mass fraction including following components:0.4 part of xenon difluoride, 0.5 part of ammonium fluoride and 100 parts of deionized water.The corrosive liquid of the monocrystalline silicon is suitable for corrosion monocrystalline silicon or monocrystalline silicon and polysilicon layer in silicon dioxide substrates, and the corrosion rate of the corrosive liquid is fast, can reduce the toxicity in processing procedure.

Description

A kind of corrosive liquid of monocrystalline silicon
Technical field
The present invention relates to the technical field of fine chemistry industry, more particularly to a kind of corrosive liquid of monocrystalline silicon.
Background technology
The corrosive liquid of monocrystalline silicon is needed for corroding the monocrystalline silicon and polysilicon layer in monocrystalline silicon or silicon dioxide substrates, right The corrosive nature requirement of corrosive liquid is higher.Therefore, it is badly in need of developing the corrosive liquid of the fast monocrystalline silicon of a corrosion rate.
The content of the invention
The object of the present invention is to provide a kind of corrosive liquid of monocrystalline silicon, solve one in above-mentioned prior art problem or It is multiple.
The present invention provides a kind of corrosive liquid of monocrystalline silicon, according to the mass fraction including following components:0.4 part of bifluoride Xenon, 0.5 part of ammonium fluoride and 100 parts of deionized water.
Specific embodiment
Following case study on implementation, is described in more detail the present invention.
Case study on implementation:
A kind of corrosive liquid of monocrystalline silicon, according to the mass fraction including following components:0.4 part of xenon difluoride, 0.5 part of fluorine Change ammonium and 100 parts of deionized water.
The corrosive liquid of the monocrystalline silicon of the case study on implementation of the present invention is suitable for the list in corrosion monocrystalline silicon or silicon dioxide substrates Crystal silicon and polysilicon layer, the corrosion rate of the corrosive liquid is fast, can reduce the toxicity in processing procedure.
Presented above is only the preferred embodiment of the present invention, it is noted that those skilled in the art, not On the premise of departing from the invention design, various modifications and improvements can be made, these also should be regarded as the protection model of invention Within enclosing.

Claims (1)

1. a kind of corrosive liquid of monocrystalline silicon, which is characterized in that according to the mass fraction including following components:0.4 part of xenon difluoride, 0.5 part of ammonium fluoride and 100 parts of deionized water.
CN201711278220.0A 2017-12-06 2017-12-06 A kind of corrosive liquid of monocrystalline silicon Withdrawn CN108085748A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201711278220.0A CN108085748A (en) 2017-12-06 2017-12-06 A kind of corrosive liquid of monocrystalline silicon

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201711278220.0A CN108085748A (en) 2017-12-06 2017-12-06 A kind of corrosive liquid of monocrystalline silicon

Publications (1)

Publication Number Publication Date
CN108085748A true CN108085748A (en) 2018-05-29

Family

ID=62174496

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201711278220.0A Withdrawn CN108085748A (en) 2017-12-06 2017-12-06 A kind of corrosive liquid of monocrystalline silicon

Country Status (1)

Country Link
CN (1) CN108085748A (en)

Similar Documents

Publication Publication Date Title
JP5685204B2 (en) Etching solution for copper / titanium multilayer thin film
CN104445971A (en) Etching solution
CN104480469B (en) A kind of TFT copper-molybdenums stacked film etchant and engraving method
JPWO2009066624A1 (en) Method for etching glass substrate
CN108220963B (en) Etching solution composition for multilayer film, etching method and manufacturing method of array substrate
TW201534694A (en) Etchant composition for metal membranes containing phosphorous acid
US20160145149A1 (en) Etch rate enhancement at low temperatures
TWI444488B (en) Etchant compositions for metal laminated films having titanium and aluminum layer
CN107446712A (en) A kind of ceramic filtering plate cleaning agent
TW201600645A (en) Etching solution composition for metal layer and manufacturing method of an array substrate for liquid crystal display using the same
CN108893741A (en) A kind of floride-free copper-molybdenum etching solution applied to thin film transistor line
JP4225548B2 (en) Etching solution composition and etching method
CN106929853A (en) Etching solution composition and etching method using same
CN108085748A (en) A kind of corrosive liquid of monocrystalline silicon
TWI662155B (en) Etching solution composition for metal layer and manufacturing method of an array substrate for liquid crystal display using the same
TW201600644A (en) Etching solution composition for metal layer and manufacturing method of an array substrate for liquid crystal display using the same
KR20150050948A (en) Etchant composition for Cu/Mo alloy film
CN106087066A (en) A kind of method improving quartz crystal slice surface roughness
CN110846663A (en) Etching solution composition and method for forming metal circuit
CN103021817A (en) Method of cleaning after wet etching
CN107059021A (en) A kind of special cleaning agent for stainless steel equipment
WO2018226513A1 (en) Methods of etching glass articles
KR101713598B1 (en) Cleaning composition for removing silicon based scale
TW201627473A (en) Etching solution composition for indium oxide layer and method for manufacturing array substrate for liquid crystal display device using the same
SG10201805523YA (en) Liquid mixture and method for etching a substrate using the liquid mixture

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
WW01 Invention patent application withdrawn after publication
WW01 Invention patent application withdrawn after publication

Application publication date: 20180529