CN108081726A - A kind of antistatic protection film and application thereof - Google Patents
A kind of antistatic protection film and application thereof Download PDFInfo
- Publication number
- CN108081726A CN108081726A CN201810111482.6A CN201810111482A CN108081726A CN 108081726 A CN108081726 A CN 108081726A CN 201810111482 A CN201810111482 A CN 201810111482A CN 108081726 A CN108081726 A CN 108081726A
- Authority
- CN
- China
- Prior art keywords
- antistatic
- layer
- line
- base material
- resistivity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000004224 protection Effects 0.000 title claims abstract description 67
- 239000000463 material Substances 0.000 claims abstract description 64
- 239000000758 substrate Substances 0.000 claims abstract description 42
- 229920000123 polythiophene Polymers 0.000 claims description 57
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 26
- 229910002804 graphite Inorganic materials 0.000 claims description 12
- 239000010439 graphite Substances 0.000 claims description 12
- 239000006230 acetylene black Substances 0.000 claims description 9
- 229920000767 polyaniline Polymers 0.000 claims description 9
- 229920000128 polypyrrole Polymers 0.000 claims description 9
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 claims description 8
- 239000003273 ketjen black Substances 0.000 claims description 8
- 229920002545 silicone oil Polymers 0.000 claims description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- 229920002125 Sokalan® Polymers 0.000 claims description 7
- ZHPNWZCWUUJAJC-UHFFFAOYSA-N fluorosilicon Chemical compound [Si]F ZHPNWZCWUUJAJC-UHFFFAOYSA-N 0.000 claims description 7
- 239000004584 polyacrylic acid Substances 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 claims description 6
- 239000002216 antistatic agent Substances 0.000 claims description 6
- 229920002635 polyurethane Polymers 0.000 claims description 6
- 239000004814 polyurethane Substances 0.000 claims description 6
- -1 neopelex Chemical compound 0.000 claims description 4
- 229930192474 thiophene Natural products 0.000 claims description 4
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 claims description 3
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 claims description 3
- RZYKUPXRYIOEME-UHFFFAOYSA-N CCCCCCCCCCCC[S] Chemical compound CCCCCCCCCCCC[S] RZYKUPXRYIOEME-UHFFFAOYSA-N 0.000 claims 1
- ZDQYSKICYIVCPN-UHFFFAOYSA-L sodium succinate (anhydrous) Chemical compound [Na+].[Na+].[O-]C(=O)CCC([O-])=O ZDQYSKICYIVCPN-UHFFFAOYSA-L 0.000 claims 1
- 239000010410 layer Substances 0.000 description 109
- 229920000139 polyethylene terephthalate Polymers 0.000 description 38
- 239000005020 polyethylene terephthalate Substances 0.000 description 38
- 230000000052 comparative effect Effects 0.000 description 11
- 239000006185 dispersion Substances 0.000 description 10
- 230000001681 protective effect Effects 0.000 description 8
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- QXNVGIXVLWOKEQ-UHFFFAOYSA-N Disodium Chemical compound [Na][Na] QXNVGIXVLWOKEQ-UHFFFAOYSA-N 0.000 description 5
- 239000002041 carbon nanotube Substances 0.000 description 5
- 229910021393 carbon nanotube Inorganic materials 0.000 description 5
- 230000002265 prevention Effects 0.000 description 5
- MJJJJEUEZVGFLW-UHFFFAOYSA-N 2-dodecyl-2-sulfobutanedioic acid Chemical compound CCCCCCCCCCCCC(S(O)(=O)=O)(C(O)=O)CC(O)=O MJJJJEUEZVGFLW-UHFFFAOYSA-N 0.000 description 4
- 238000009825 accumulation Methods 0.000 description 4
- 230000005611 electricity Effects 0.000 description 4
- 238000010276 construction Methods 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- MKYBYDHXWVHEJW-UHFFFAOYSA-N N-[1-oxo-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propan-2-yl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(C(C)NC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 MKYBYDHXWVHEJW-UHFFFAOYSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- RSWGJHLUYNHPMX-UHFFFAOYSA-N 1,4a-dimethyl-7-propan-2-yl-2,3,4,4b,5,6,10,10a-octahydrophenanthrene-1-carboxylic acid Chemical compound C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 235000019082 Osmanthus Nutrition 0.000 description 1
- 241000333181 Osmanthus Species 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical compound OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- HRHBQGBPZWNGHV-UHFFFAOYSA-N azane;bromomethane Chemical compound N.BrC HRHBQGBPZWNGHV-UHFFFAOYSA-N 0.000 description 1
- 229940077388 benzenesulfonate Drugs 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002322 conducting polymer Substances 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 230000021615 conjugation Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000002688 persistence Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 230000010148 water-pollination Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/28—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
- B32B27/308—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising acrylic (co)polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/40—Layered products comprising a layer of synthetic resin comprising polyurethanes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B33/00—Layered products characterised by particular properties or particular surface features, e.g. particular surface coatings; Layered products designed for particular purposes not covered by another single class
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/06—Interconnection of layers permitting easy separation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/10—Interconnection of layers at least one layer having inter-reactive properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
- B32B9/005—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising one layer of ceramic material, e.g. porcelain, ceramic tile
- B32B9/007—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising one layer of ceramic material, e.g. porcelain, ceramic tile comprising carbon, e.g. graphite, composite carbon
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
- B32B9/04—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B9/045—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/20—Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
- B32B2307/21—Anti-static
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2553/00—Packaging equipment or accessories not otherwise provided for
Landscapes
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Laminated Bodies (AREA)
Abstract
The present invention relates to a kind of antistatic protection films; the antistatic protection film includes bottom and uses layer; the bottom is included by the sequentially connected the first base material layer (12) in release glue-line (13) one side and the first antistatic backing (11); it is described to include by the release glue-line (13) with bonding glue-line (23) being connected by sequentially connected second substrate layer (22) of bonding glue-line (23) and the second antistatic backing (21), the bottom and using layer using layer;The resistivity of the antistatic protection film is low, and it is small to tear off voltage, while high-temp resisting high-humidity resisting performance is good.
Description
Technical field
The invention belongs to field of membrane science, are related to a kind of protective film more particularly to a kind of antistatic protection film.
Background technology
At present, the glass substrate surface of some electronic products during carrying and use, is easily subject to some chemicals
The polishing scratch of the contact staining or nail of matter etc. scratches, it usually needs protective film is attached on its surface to be allowed to from damage and dirt
Dye.
Protective film of the prior art generally uses PET (polyethylene terephthalate) material as base material, then applies
It is prepared by upper coating material.Since the resistivity of PET material is up to 1010-1020Ω cm, easily put aside electrostatic.When this kind of protection
Film in use, easy absorption dust and impurity, while also holds and easy to produce static electricity electronic part material is caused on electronic product
Damage, and it is unfavorable for health.
203198346 U of CN disclose a kind of electrostatic prevention film, and the electrostatic prevention film includes surface layer and internal layer, the surface layer
Basosexine, interlayer and interior base are additionally provided between internal layer, it is characterized in that the internal layer is polythiophene dispersions layer or carbon
Nanotube disperses liquid layer.The thickness of the polythiophene dispersions layer or carbon nano tube dispersion liquid layer be U, 0 μm<U<μm.It is described outer
Base is PET, and the thickness of the PET is W, 12 μm<W<30μm.The interior base be PE, CPP or CPE, the thickness of the interior base
It spends for M, 20 μm<M.The interlayer is Al layers, and the thickness in the interlayer is N, N>40 angstroms.The utility model provides anti-quiet
Electrolemma internal layer is polythiophene dispersions layer or carbon nano tube dispersion liquid, is directly connect with protected electronic component or collector surface
It touches, polythiophene dispersions layer or carbon nano tube dispersion liquid can not first bonded on the surface, although while polythiophene point
Dispersion liquid layer or carbon nano tube dispersion liquid are conductive, can disperse electrostatic, but still be rested in scattered electrostatic implementation
Electronic component or collector surface, and since most inside, the electrostatic that this layer is in electrostatic prevention film can not dissipate, it substantially will not be quiet
Electrodispersion, in electrostatic accumulation to a certain extent or when electrostatic charge is excessive can not play the role of permanent antistatic.
104419337 A of CN disclose two-sided antistatic protection films of a kind of PET and preparation method thereof, the PET antistatics
Protective film is made of PET base material, pressure-sensitive adhesive layer, release film and antistatic backing, and the one side of PET base material is antistatic process layer, separately
It is fitted on one side with release film by pressure-sensitive adhesive layer, antistatic particle is contained in the pressure-sensitive adhesive layer.The invention bilayer prevent it is quiet
The principle of electricity is base material one side antistatic backing, and antistatic particle is added in another layer of pressure sensitive adhesive to resist electrostatic, substantially
The protective film includes antistatic backing, substrate layer and pressure-sensitive adhesive layer using layer, and it is still release layer to use layer and the isolation in the external world,
Due to the high resistance of release layer, pressure-sensitive adhesive layer surface can be made to continue electrostatic, even if wherein containing antistatic particle, due to its both sides
For high-resistance release layer and substrate layer, electrostatic can not dissipate, and electrostatic savings problem is not well solved still.
Therefore, it is high for prior art protection film resistivity, easily put aside electrostatic, while the antistatic efficiency of electrostatic prevention film
Low, the problem of service life is short, it is particularly significant to study a kind of new antistatic protection film.
The content of the invention
It is high for protection film resistivity in the prior art, easily put aside electrostatic, while the antistatic effect of electrostatic prevention film
The problem of rate is low, and service life is short, the present invention provide a kind of antistatic protection film, and the antistatic protection film anti-static effect is bright
Aobvious, antistatic long lifespan, it is small to tear off voltage, and anti-static effect influences from environment temperature and humidity.
For this purpose, the present invention uses following technical scheme:
It is an object of the present invention to provide a kind of antistatic protection film, the antistatic protection film includes bottom and use
Layer, the bottom is included by the sequentially connected substrate layer in release glue-line one side and antistatic backing, described to be included using layer by bonding
The sequentially connected substrate layer of glue-line and antistatic backing, the bottom are connected with using layer by the release glue-line with bonding glue-line
It connects.
As currently preferred technical solution, second substrate layer and the first base material layer are PET base material layer, institute
It states and contains polythiophene in PET base material layer.
As currently preferred technical solution, polythiophene and the mass ratio of PET base material described in second substrate layer
For (0.1~5):100, such as 0.1:100、0.2:100、0.5:100、1:100、2:100、3:100、4:100 or 5:100 etc., but
It is not limited in cited numerical value, other the unrequited numerical value included in the numberical range are equally applicable, further excellent
It elects as (1~3):100.
Polythiophene is adulterated in PET base material, since the thiophene polymeric that polythiophene is armaticity obtains, and is also contained in PET
Phenyl ring, therefore the two has good compatibility.And after adding in conducting polymer polythiophene, one side polythiophene can be led in itself
Electricity, while the activity of electronics in PET molecules is improved by conjugation, reduce the resistivity of PET base material;On the other hand,
In the presence of having electrostatic in PET base material layer, polythiophene can avoid the accumulation because of electrostatic in time by electrostatic dispersion, and make portion
Subregion overtension and the problem of damage electronic component.
Meanwhile when the addition of polythiophene and the mass ratio of PET base material are less than 0.1:When 100, polythiophene content is too low, no
The resistivity that PET base material layer can effectively be reduced transfers electrostatic simultaneously;And when the addition of polythiophene and the mass ratio of PET base material are big
In 5:When 100, since polythiophene has water solubility in itself, although the addition of increase polythiophene can further reduce PET bases
The resistivity of material layer, but the hydrophilic nmature on pet layer surface can increase, service life in wet condition declines.
Preferably, the thickness of second substrate layer be 9~50 μm, such as 9 μm, 10 μm, 12 μm, 15 μm, 20 μm, 25 μm,
30 μm, 35 μm, 40 μm, 45 μm or 50 μm etc., it is not limited to cited numerical value, included in the numberical range other not
The numerical value enumerated is equally applicable.
Preferably, the resistivity of second substrate layer is 106~1011Ω cm, such as 106Ω·cm、107Ω·cm、
108Ω·cm、109Ω·cm、1010Ω cm or 1011Ω cm etc., it is not limited to cited numerical value, the numerical value model
Other the unrequited numerical value included in enclosing are equally applicable.
As currently preferred technical solution, polythiophene and the mass ratio of PET base material described in the first base material layer
For (0.1~5):100, such as 0.1:100、0.2:100、0.5:100、1:100、2:100、3:100、4:100 or 5:100 etc., but
It is not limited in cited numerical value, other the unrequited numerical value included in the numberical range are equally applicable, further excellent
It elects as (1~3):100.
Preferably, the thickness of the first base material layer be 9~50 μm, such as 9 μm, 10 μm, 12 μm, 15 μm, 20 μm, 25 μm,
30 μm, 35 μm, 40 μm, 45 μm or 50 μm etc., it is not limited to cited numerical value, included in the numberical range other not
The numerical value enumerated is equally applicable.
Preferably, the resistivity of the first base material layer is 106~1011Ω cm, such as 106Ω·cm、107Ω·cm、
108Ω·cm、109Ω·cm、1010Ω cm or 1011Ω cm etc., it is not limited to cited numerical value, the numerical value model
Other the unrequited numerical value included in enclosing are equally applicable.
As currently preferred technical solution, the material of second antistatic backing includes black graphite, acetylene black, section's qin
Any one in black, polyaniline, polypyrrole or polythiophene or at least two combination, the combination typical case but non-limiting examples
Have:Graphite is black and the combination of acetylene black, graphite are black and the combination of Ketjen black, the combination of polyaniline and polypyrrole, polypyrrole and poly-
The combination of thiophene, the combination of polythiophene or acetylene black or graphite is black, the combination of Ketjen black and polyaniline etc., are preferably polythiophene.
Preferably, the thickness of second antistatic backing be 1~10 μm, such as 1 μm, 2 μm, 3 μm, 4 μm, 5 μm, 6 μm, 7 μm,
8 μm, 9 μm or 10 μm etc., it is not limited to cited numerical value, other unrequited numerical value for being included in the numberical range
It is equally applicable, further preferably 3~6 μm.
Preferably, the resistivity of second antistatic backing is 105~1011Ω cm, such as 105Ω·cm、106Ω·cm、
107Ω·cm、108Ω·cm、109Ω·cm、1010Ω cm or 1011Ω cm etc., it is not limited to cited number
It is worth, other the unrequited numerical value included in the numberical range are equally applicable.
As currently preferred technical solution, the material of first antistatic backing includes black graphite, acetylene black, section's qin
Any one in black, polyaniline, polypyrrole or polythiophene or at least two combination, the combination typical case but non-limiting examples
Have:Graphite is black and the combination of acetylene black, graphite are black and the combination of Ketjen black, the combination of polyaniline and polypyrrole, polypyrrole and poly-
The combination of thiophene, the combination of polythiophene or acetylene black or graphite is black, the combination of Ketjen black and polyaniline etc., are preferably polythiophene.
Preferably, the thickness of first antistatic backing be 1~10 μm, such as 1 μm, 2 μm, 3 μm, 4 μm, 5 μm, 6 μm, 7 μm,
8 μm, 9 μm or 10 μm etc., it is not limited to cited numerical value, other unrequited numerical value for being included in the numberical range
It is equally applicable, further preferably 3~6 μm.
Preferably, the resistivity of first antistatic backing is 105~1011Ω cm, such as 105Ω·cm、106Ω·cm、
107Ω·cm、108Ω·cm、109Ω·cm、1010Ω cm or 1011Ω cm etc., it is not limited to cited number
It is worth, other the unrequited numerical value included in the numberical range are equally applicable.
The present invention is using layer and bottom to be provided with substrate layer and antistatic backing, passes through the knot of double-layer antistatic
Structure, reduces the accumulation of antistatic protection film electrostatic during storage, while reduces and tear off voltage, is tearing the mistake of bottom off
Cheng Zhong reduces the generation of electrostatic.
As currently preferred technical solution, the material of the bonding glue-line includes organosilicon, polyacrylic acid or poly- ammonia
In ester it is any or at least two combination, it is described combination typical case but non-limiting examples have:The group of organosilicon and polyacrylic acid
Conjunction, polyacrylic acid and the combination of polyurethane, the combination or organosilicon of organosilicon and polyurethane, the combination of polyacrylic acid and polyurethane
Deng.
As currently preferred technical solution, contain antistatic agent in the bonding glue-line, the antistatic agent includes
Odium stearate, dodecyl sodium sulfate, neopelex, lauryl sulfosuccinic acid monoester disodium or cetyl three
Any one in methyl bromide ammonium or at least two combination, described group typical case but non-limiting examples have:Odium stearate and ten
Combination, neopelex and the moon of dialkyl sulfonates combination, dodecyl sodium sulfate and neopelex
The combination of osmanthus base sulfosuccinic acid monoester disodium, lauryl sulfosuccinic acid monoester disodium and cetyl trimethylammonium bromide
Combination or the combination of dodecyl sodium sulfate, neopelex and lauryl sulfosuccinic acid monoester disodium etc..
Preferably, the thickness of the bonding glue-line is 5~50 μm, such as 5 μm, 10 μm, 15 μm, 20 μm, 25 μm, 30 μm, 35 μ
M, 40 μm, 45 μm or 50 μm etc., it is not limited to cited numerical value, other unrequited numbers for being included in the numberical range
Value is equally applicable, further preferably 15~25 μm.
Preferably, the resistivity of the bonding glue-line is 109~1011Ω cm, such as 109Ω·cm、5×109Ω·cm、8
×109Ω·cm、1×1010Ω·cm、5×1010Ω·cm、8×1010Ω cm or 1011Ω cm etc., it is not limited to
Cited numerical value, other the unrequited numerical value included in the numberical range are equally applicable.
As currently preferred technical solution, the material of the release glue-line includes silicone oil mould release, fluorine silicon mould release
Or any one in non-silicon mould release or at least two combination, the combination typical case but non-limiting examples have:Silicone oil is release
Agent and the combination of fluorine silicon mould release, the combination of fluorine silicon mould release and non-silicon mould release, the group of non-silicon mould release and silicone oil mould release
Conjunction or the combination of silicone oil mould release, fluorine silicon mould release and non-silicon mould release etc..
Preferably, the thickness of the release glue-line be 10~50 μm, such as 10 μm, 15 μm, 20 μm, 25 μm, 30 μm, 35 μm,
40 μm, 45 μm or 50 μm etc., it is not limited to cited numerical value, other unrequited numerical value for being included in the numberical range
It is equally applicable, further preferably 25~35 μm.
Preferably, the resistivity of the release glue-line is 109~1011Ω cm, such as 109Ω·cm、5×109Ω·cm、8
×109Ω·cm、1×1010Ω·cm、5×1010Ω·cm、8×1010Ω cm or 1011Ω cm etc., it is not limited to
Cited numerical value, other the unrequited numerical value included in the numberical range are equally applicable.
The second purpose of the present invention is to provide a kind of purposes of above-mentioned antistatic protection, the antistatic protection film is used for hand
The shipment protection field of machine back-cover and radian screen.
Compared with prior art, the present invention at least has the advantages that:
(1) a kind of antistatic protection film provided by the invention, the antistatic protection film employ double using layer and bottom
Layer permanent antistatic technique:Using the conductivity principle of aqueous polythiophene, and it knits shape network structure with film surface formation, it is ensured that
The long-acting persistence of anti-static effect;
(2) a kind of antistatic protection film provided by the invention, the resistivity of the antistatic protection film is 109The order of magnitude,
The accumulation of electrostatic is not easily caused, and anti-static effect is good;
(3) a kind of antistatic protection film provided by the invention, the antistatic protection film tear off voltage less than 500kV;
(4) a kind of antistatic protection film provided by the invention, the antistatic protection film remain under hot and humid environment
Good anti-static electrification is maintained to use 10 days or so.
Description of the drawings
Fig. 1 is a kind of structure diagram of antistatic protection film provided by the invention;
In figure:1- bottoms, 11- antistatic backings, 12- substrate layers, the release glue-lines of 13-, 2- use layer, 21- antistatic backings,
22- substrate layers, 23- bonding glue-lines.
The present invention is described in more detail below.But following examples is only the simple example of the present invention, not generation
Table or limitation the scope of the present invention, protection scope of the present invention are subject to claims.
Specific embodiment
Technical solution to further illustrate the present invention below with reference to the accompanying drawings and specific embodiments.
Specific embodiment of the invention part provides a kind of antistatic protection film as shown in Figure 1, the antistatic protection film
Including bottom and using layer, the bottom is included by the sequentially connected substrate layer 12 in release 13 one side of glue-line and antistatic backing 11,
It is described to be included using layer by 23 sequentially connected substrate layer 22 of bonding glue-line and antistatic backing 21, the bottom and passed through using layer
The release glue-line 13 is connected with bonding glue-line 23.
For the present invention is better described, technical scheme is readily appreciated, of the invention is typical but non-limiting
Embodiment is as follows:
Embodiment 1
A kind of antistatic protection film, the antistatic protection film include bottom and using layers, and the bottom is included by release
The sequentially connected substrate layer 12 in 13 one side of glue-line and antistatic backing 11, it is described to use layer including sequentially connected by bonding glue-line 23
Substrate layer 22 and antistatic backing 21, the bottom are connected with using layer by the release glue-line 13 with bonding glue-line 23.
Wherein release glue-line 13 has silicone oil mould release to be prepared, and thickness is 10 μm, resistivity 109Ω·cm;Base material
Polythiophene and the mass ratio of PET base material are 0.1 in layer 12:100, thickness is 9 μm, resistivity 1011Ω·cm;Antistatic backing 11
By the black preparation of graphite, thickness is 1 μm, resistivity 105Ω·cm;Bonding glue-line 23 is prepared by organosilicon, and containing hard
Resin acid sodium, thickness are 5 μm, resistivity 109Ω·cm;Polythiophene and the mass ratio of PET base material are 5 in substrate layer 22:100,
Thickness is 50 μm, resistivity 106Ω·cm;Antistatic backing 21 is prepared by acetylene black, and thickness is 10 μm, resistivity 1011
Ω·cm。
Embodiment 2
A kind of antistatic protection film, the antistatic protection film include bottom and using layers, and the bottom is included by release
The sequentially connected substrate layer 12 in 13 one side of glue-line and antistatic backing 11, it is described to use layer including sequentially connected by bonding glue-line 23
Substrate layer 22 and antistatic backing 21, the bottom are connected with using layer by the release glue-line 13 with bonding glue-line 23.
Wherein release glue-line 13 has fluorine silicon mould release to be prepared, and thickness is 50 μm, resistivity 1011Ω·cm;Base material
Polythiophene and the mass ratio of PET base material are 5 in layer 12:100, thickness is 50 μm, resistivity 106Ω·cm;Antistatic backing 11
It is prepared by Ketjen black, thickness is 10 μm, resistivity 1011Ω·cm;Bonding glue-line 23 is prepared by polyacrylic acid, and is contained
Dodecyl sodium sulfate, thickness are 50 μm, resistivity 1011Ω·cm;Polythiophene and the mass ratio of PET base material in substrate layer 22
For 0.5:100, thickness is 9 μm, resistivity 1011Ω·cm;Antistatic backing 21 is prepared by polyaniline, and thickness is 1 μm, resistivity
For 105Ω·cm。
Embodiment 3
A kind of antistatic protection film, the antistatic protection film include bottom and using layers, and the bottom is included by release
The sequentially connected substrate layer 12 in 13 one side of glue-line and antistatic backing 11, it is described to use layer including sequentially connected by bonding glue-line 23
Substrate layer 22 and antistatic backing 21, the bottom are connected with using layer by the release glue-line 13 with bonding glue-line 23.
Wherein release glue-line 13 has non-silicon mould release to be prepared, and thickness is 30 μm, and resistivity is 2 × 109Ω·cm;Base
Polythiophene and the mass ratio of PET base material are 2 in material layer 12:100, thickness is 20 μm, and resistivity is 3 × 106Ω·cm;Antistatic
Layer 11 is prepared by polythiophene, and thickness is 5 μm, and resistivity is 3 × 107Ω·cm;Bonding glue-line 23 is prepared by polyacrylic acid,
And containing neopelex, thickness is 20 μm, and resistivity is 5 × 109Ω·cm;Polythiophene and PET in substrate layer 22
The mass ratio of base material is 2:100, thickness is 20 μm, and resistivity is 3 × 106Ω·cm;Antistatic backing 21 is prepared by polythiophene, thick
It spends for 5 μm, resistivity is 3 × 107Ω·cm。
Embodiment 4
A kind of antistatic protection film, the antistatic protection film include bottom and using layers, and the bottom is included by release
The sequentially connected substrate layer 12 in 13 one side of glue-line and antistatic backing 11, it is described to use layer including sequentially connected by bonding glue-line 23
Substrate layer 22 and antistatic backing 21, the bottom are connected with using layer by the release glue-line 13 with bonding glue-line 23.
Wherein release glue-line 13 has non-silicon mould release to be prepared, and thickness is 25 μm, and resistivity is 4 × 1010Ω·cm;Base
Polythiophene and the mass ratio of PET base material are 1 in material layer 12:100, thickness is 30 μm, and resistivity is 5 × 108Ω·cm;Antistatic
Layer 11 is prepared by polythiophene, and thickness is 3 μm, and resistivity is 7 × 106Ω·cm;Bonding glue-line 23 is prepared by polyurethane, and
Containing lauryl sulfosuccinic acid monoester disodium, thickness is 15 μm, and resistivity is 2 × 109Ω·cm;Polythiophene in substrate layer 22
Mass ratio with PET base material is 3:100, thickness is 20 μm, and resistivity is 1 × 106Ω·cm;Antistatic backing 21 is by polythiophene system
Standby, thickness is 6 μm, and resistivity is 8 × 106Ω·cm。
Embodiment 5
A kind of antistatic protection film, the antistatic protection film include bottom and using layers, and the bottom is included by release
The sequentially connected substrate layer 12 in 13 one side of glue-line and antistatic backing 11, it is described to use layer including sequentially connected by bonding glue-line 23
Substrate layer 22 and antistatic backing 21, the bottom are connected with using layer by the release glue-line 13 with bonding glue-line 23.
Wherein release glue-line 13 has silicone oil mould release to be prepared, and thickness is 35 μm, and resistivity is 8 × 1010Ω·cm;Base
Polythiophene and the mass ratio of PET base material are 3 in material layer 12:100, thickness is 20 μm, and resistivity is 1 × 106Ω·cm;Antistatic
Layer 11 is prepared by polythiophene, and thickness is 6 μm, and resistivity is 8 × 106Ω·cm;Bonding glue-line 23 is prepared by polyurethane, and
Containing cetyl trimethylammonium bromide, thickness is 25 μm, and resistivity is 6 × 109Ω·cm;In substrate layer 22 polythiophene with
The mass ratio of PET base material is 1:100, thickness is 30 μm, and resistivity is 3 × 108Ω·cm;Antistatic backing 21 is by polythiophene system
Standby, thickness is 3 μm, and resistivity is 7 × 106Ω·cm。
Embodiment 6
A kind of antistatic protection film, except antistatic backing 21 is by polypyrrole and polythiophene (mass ratio 1:1) it is prepared by combination,
Other conditions are same as Example 3.
Embodiment 7
A kind of antistatic protection film, except the antistatic agent contained in bonding glue-line 23 is dodecyl sodium sulfate and 12
Sodium alkyl benzene sulfonate (mass ratio 1:1) outside combination, other conditions are same as Example 3.
Embodiment 8
A kind of antistatic protection film, except release glue-line 13 is silicone oil mould release and fluorine silicon mould release (mass ratio 1:1)
Combination is outer, and other conditions are same as Example 3.
Embodiment 9
A kind of antistatic protection film, except antistatic backing 11 is graphite is black and Ketjen black (mass ratio 1:1) outside combination,
His condition is same as Example 3.
Comparative example 1
A kind of antistatic protection film, in addition to not containing polythiophene in substrate layer 22 and substrate layer 12, other conditions with
Embodiment 3 is identical.
Comparative example 2
A kind of antistatic protection film, except polythiophene and the mass ratio of PET base material are in substrate layer 22 and substrate layer 12
0.01:Outside 100, other conditions are same as Example 3.
Comparative example 3
A kind of antistatic protection film, except polythiophene in substrate layer 22 and substrate layer 12 and the mass ratio of PET base material are 10:
Outside 100, other conditions are same as Example 3.
Comparative example 4
A kind of antistatic protection film, in addition to bonding and not containing antistatic agent neopelex in glue-line 23,
His condition is same as Example 3.
Resistivity is carried out to the antistatic protection film of embodiment 1-9 and comparative example 1-4, tears off voltage and in high temperature height
The test of service life memory under wet environment (85 DEG C, 85%RH), the results are shown in Table 1.
Table 1
Resistivity/109Ω·cm | Tear off voltage/kV | Service life/h | |
Embodiment 1 | 5.2 | 492 | 240 |
Embodiment 2 | 4.6 | 406 | 240 |
Embodiment 3 | 3.7 | 223 | 240 |
Embodiment 4 | 6.2 | 369 | 240 |
Embodiment 5 | 10.9 | 371 | 240 |
Embodiment 6 | 8.3 | 306 | 240 |
Embodiment 7 | 9.1 | 345 | 240 |
Embodiment 8 | 7.9 | 364 | 240 |
Embodiment 9 | 8.3 | 355 | 240 |
Comparative example 1 | 102.3 | 975 | 6 |
Comparative example 2 | 97.6 | 963 | 6 |
Comparative example 3 | 0.7 | 251 | 180 |
Comparative example 4 | 43.5 | 601 | 150 |
It can be obtained according to table 1, pet layer addition polythiophene effectively reduces the resistivity of protective film extremely in embodiment 1-9
109Ω cm, while using the double-layer antistatic structure of layer and bottom, reduce the electrostatic protection film tears off voltage, adds
The polythiophene entered also has adjusted the hydrophily and hydrophobicity on PET base material layer surface, improves the high temperature resistant of protective film and resistance to high humidity
Ability, the antistatic protection film provided in embodiment 1-9 can pass through embodiment 3 under 85 DEG C and 85%RH using 10 days
Can be seen that pet layer with comparative example 1-4 and be added without polythiophene can cause the resistivity of protective film to be substantially increased, while tear off electricity
Pressure rise, high temperature resistant and high humidity ability all decline;When the polythiophene amount of addition and the mass ratio of PET base material are less than 0.1:When 100,
Polythiophene can not effectively reduce the resistivity of PET base material, and the resistivity value of substrate layer is still larger, tear off voltage height accordingly,
High-temp resisting high-humidity resisting ability is low;When the polythiophene amount of addition and the mass ratio of PET base material are more than 5:When 100, antistatic protection film
Resistivity and tear off voltage and comparative example 3 is not much different, but the ability of high-temp resisting high-humidity resisting declines.
Applicant states that the present invention illustrates the detailed construction feature of the present invention by above-described embodiment, but the present invention is simultaneously
Above-mentioned detailed construction feature is not limited to, that is, does not mean that the present invention has to rely on above-mentioned detailed construction feature and could implement.Institute
Belong to those skilled in the art it will be clearly understood that any improvement in the present invention, to the equivalence replacement of component selected by the present invention
And the increase of accessory, selection of concrete mode etc., it all falls within protection scope of the present invention and the open scope.
The preferred embodiment of the present invention has been described above in detail, still, during present invention is not limited to the embodiments described above
Detail, within the scope of the technical concept of the present invention, a variety of simple variants can be carried out to technical scheme, this
A little simple variants all belong to the scope of protection of the present invention.
It is further to note that the specific technical features described in the above specific embodiments, in not lance
In the case of shield, can be combined by any suitable means, in order to avoid unnecessary repetition, the present invention to it is various can
The combination of energy no longer separately illustrates.
In addition, various embodiments of the present invention can be combined randomly, as long as it is without prejudice to originally
The thought of invention, it should also be regarded as the disclosure of the present invention.
Claims (10)
1. a kind of antistatic protection film, which is characterized in that the antistatic protection film includes bottom and uses layer, the bottom bag
It includes by the sequentially connected the first base material layer (12) in release glue-line (13) one side and the first antistatic backing (11), it is described to be included using layer
By sequentially connected second substrate layer (22) of bonding glue-line (23) and the second antistatic backing (21), the bottom and passed through using layer
The release glue-line (13) is connected with bonding glue-line (23).
2. antistatic protection film according to claim 1, which is characterized in that second substrate layer (22) and the first base material
Layer (12) is PET base material layer, contains polythiophene in the PET base material layer.
3. antistatic protection film according to claim 1 or 2, which is characterized in that described in second substrate layer (22)
Polythiophene and the mass ratio of PET base material are (0.1~5):100, further preferably (1~3):100;
Preferably, the thickness of second substrate layer (22) is 9~50 μm;
Preferably, the resistivity of second substrate layer (22) is 106~1011Ω·cm。
4. according to the antistatic protection film described in claim 1-3, which is characterized in that gather described in the first base material layer (12)
Thiophene and the mass ratio of PET base material are (0.1~5):100, further preferably (1~3):100;
Preferably, the thickness of the first base material layer (12) is 9~50 μm;
Preferably, the resistivity of the first base material layer (12) is 106~1011Ω·cm。
5. according to claim 1-4 any one of them antistatic protection films, which is characterized in that second antistatic backing (21)
Material include that graphite is black, any one in acetylene black, Ketjen black, polyaniline, polypyrrole or polythiophene or at least two group
It closes, is preferably polythiophene;
Preferably, the thickness of second antistatic backing (21) is 1~10 μm, further preferably 3~6 μm;
Preferably, the resistivity of second antistatic backing (21) is 105~1011Ω·cm。
6. according to claim 1-5 any one of them antistatic protection films, which is characterized in that, first antistatic backing
(11) material includes any one in black graphite, acetylene black, Ketjen black, polyaniline, polypyrrole or polythiophene or at least two
Combination, be preferably polythiophene;
Preferably, the thickness of first antistatic backing (11) is 1~10 μm, further preferably 3~6 μm;
Preferably, the resistivity of first antistatic backing (11) is 105~1011Ω·cm。
7. according to claim 1-6 any one of them antistatic protection films, which is characterized in that the material of the bonding glue-line (23)
Material includes any in organosilicon, polyacrylic acid or polyurethane or at least two combinations.
8. according to claim 1-7 any one of them antistatic protection films, which is characterized in that contain in the bonding glue-line (23)
There is antistatic agent, the antistatic agent includes odium stearate, dodecyl sodium sulfate, neopelex, lauryl sulphur
Change any one in monomester succinate disodium or cetyl trimethylammonium bromide or at least two combination;
Preferably, the thickness of the bonding glue-line (23) is 5~50 μm, further preferably 15~25 μm;
Preferably, the resistivity of the bonding glue-line (23) is 109~1011Ω·cm。
9. according to claim 1-8 any one of them antistatic protection films, which is characterized in that the material of the release glue-line (13)
Material includes any one in silicone oil mould release, fluorine silicon mould release or non-silicon mould release or at least two combination;
Preferably, the thickness of the release glue-line (13) is 10~50 μm, further preferably 25~35 μm;
Preferably, the resistivity of the release glue-line (13) is 109~1011Ω·cm。
A kind of 10. purposes of claim 1-9 any one of them antistatic protections, which is characterized in that the antistatic protection
Film protects field for the shipment of cell phone back cover and radian screen.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810111482.6A CN108081726A (en) | 2018-02-05 | 2018-02-05 | A kind of antistatic protection film and application thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810111482.6A CN108081726A (en) | 2018-02-05 | 2018-02-05 | A kind of antistatic protection film and application thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
CN108081726A true CN108081726A (en) | 2018-05-29 |
Family
ID=62193731
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201810111482.6A Pending CN108081726A (en) | 2018-02-05 | 2018-02-05 | A kind of antistatic protection film and application thereof |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN108081726A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109181564A (en) * | 2018-06-07 | 2019-01-11 | 苏州袭麟光电科技产业有限公司 | A kind of anti-reflection optical grade nanometer AR screen protecting film of substrate recoverable environmental protection type |
CN109291564A (en) * | 2018-09-14 | 2019-02-01 | 无锡市昊恩保护膜有限公司 | A kind of protective film and its preparation method and application |
CN114075389A (en) * | 2020-08-21 | 2022-02-22 | 昆山威斯泰电子技术有限公司 | Antistatic coating, antistatic anti-scratch touch screen PET protective film and manufacturing method thereof |
CN115491145A (en) * | 2022-11-17 | 2022-12-20 | 昆山博益鑫成高分子材料有限公司 | OLED (organic light emitting diode) process protective film and preparation method thereof |
CN116640520A (en) * | 2023-05-08 | 2023-08-25 | 极天羽技术股份有限公司 | PU adhesive protective film with low film tearing voltage and preparation method thereof |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62140313A (en) * | 1985-12-16 | 1987-06-23 | アキレス株式会社 | Manufacture of conductive composite laminate |
KR20050031639A (en) * | 2003-09-30 | 2005-04-06 | 서광석 | Method for preparing conductive polymer by solution gas phase polymerization technique |
CN103264554A (en) * | 2013-05-16 | 2013-08-28 | 苏州金海薄膜科技发展有限公司 | Anti-static PET (Polyethylene Terephthalate) material membrane as well as preparation method and application thereof |
CN203198346U (en) * | 2013-04-07 | 2013-09-18 | 邵敬 | Anti-static film |
CN103614090A (en) * | 2013-12-06 | 2014-03-05 | 苏州贤聚科技有限公司 | Antistatic pressure-sensitive adhesive protective film and preparation method thereof |
CN203513552U (en) * | 2013-09-05 | 2014-04-02 | 上海精涂新材料技术有限公司 | PET (Polyethylene Terephthalate) double-faced antistatic protective film |
JP2016088089A (en) * | 2014-10-31 | 2016-05-23 | 東レ株式会社 | Laminate film |
CN205291799U (en) * | 2015-10-26 | 2016-06-08 | 开平东豪材料科技有限公司 | TV set screen shipment protection is with two -sided anti electrostatic protection membrane |
CN107365562A (en) * | 2017-08-15 | 2017-11-21 | 张家港康得新光电材料有限公司 | A kind of diaphragm |
CN107446517A (en) * | 2017-09-14 | 2017-12-08 | 佛山市南海区昊森机械设备有限公司 | A kind of high impact-resistant antistatic protection film |
CN107487053A (en) * | 2017-09-14 | 2017-12-19 | 佛山市南海区昊森机械设备有限公司 | A kind of strong Antistatic protective film |
CN206768002U (en) * | 2017-05-19 | 2017-12-19 | 深圳市金耀辉科技有限公司 | A kind of double-side antistatic protecting film |
-
2018
- 2018-02-05 CN CN201810111482.6A patent/CN108081726A/en active Pending
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62140313A (en) * | 1985-12-16 | 1987-06-23 | アキレス株式会社 | Manufacture of conductive composite laminate |
KR20050031639A (en) * | 2003-09-30 | 2005-04-06 | 서광석 | Method for preparing conductive polymer by solution gas phase polymerization technique |
CN203198346U (en) * | 2013-04-07 | 2013-09-18 | 邵敬 | Anti-static film |
CN103264554A (en) * | 2013-05-16 | 2013-08-28 | 苏州金海薄膜科技发展有限公司 | Anti-static PET (Polyethylene Terephthalate) material membrane as well as preparation method and application thereof |
CN203513552U (en) * | 2013-09-05 | 2014-04-02 | 上海精涂新材料技术有限公司 | PET (Polyethylene Terephthalate) double-faced antistatic protective film |
CN103614090A (en) * | 2013-12-06 | 2014-03-05 | 苏州贤聚科技有限公司 | Antistatic pressure-sensitive adhesive protective film and preparation method thereof |
JP2016088089A (en) * | 2014-10-31 | 2016-05-23 | 東レ株式会社 | Laminate film |
CN205291799U (en) * | 2015-10-26 | 2016-06-08 | 开平东豪材料科技有限公司 | TV set screen shipment protection is with two -sided anti electrostatic protection membrane |
CN206768002U (en) * | 2017-05-19 | 2017-12-19 | 深圳市金耀辉科技有限公司 | A kind of double-side antistatic protecting film |
CN107365562A (en) * | 2017-08-15 | 2017-11-21 | 张家港康得新光电材料有限公司 | A kind of diaphragm |
CN107446517A (en) * | 2017-09-14 | 2017-12-08 | 佛山市南海区昊森机械设备有限公司 | A kind of high impact-resistant antistatic protection film |
CN107487053A (en) * | 2017-09-14 | 2017-12-19 | 佛山市南海区昊森机械设备有限公司 | A kind of strong Antistatic protective film |
Non-Patent Citations (1)
Title |
---|
王文广, 中国轻工业出版社, pages: 114 * |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109181564A (en) * | 2018-06-07 | 2019-01-11 | 苏州袭麟光电科技产业有限公司 | A kind of anti-reflection optical grade nanometer AR screen protecting film of substrate recoverable environmental protection type |
CN109291564A (en) * | 2018-09-14 | 2019-02-01 | 无锡市昊恩保护膜有限公司 | A kind of protective film and its preparation method and application |
CN114075389A (en) * | 2020-08-21 | 2022-02-22 | 昆山威斯泰电子技术有限公司 | Antistatic coating, antistatic anti-scratch touch screen PET protective film and manufacturing method thereof |
CN115491145A (en) * | 2022-11-17 | 2022-12-20 | 昆山博益鑫成高分子材料有限公司 | OLED (organic light emitting diode) process protective film and preparation method thereof |
CN115491145B (en) * | 2022-11-17 | 2023-03-03 | 昆山博益鑫成高分子材料有限公司 | OLED (organic light emitting diode) process protective film and preparation method thereof |
CN116640520A (en) * | 2023-05-08 | 2023-08-25 | 极天羽技术股份有限公司 | PU adhesive protective film with low film tearing voltage and preparation method thereof |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN108081726A (en) | A kind of antistatic protection film and application thereof | |
Xiong et al. | Wearable all‐fabric‐based triboelectric generator for water energy harvesting | |
JP2012140008A (en) | Release film having excellent static electricity proofness, and method of manufacturing same | |
CN103173108B (en) | A kind of environment-friendlywashing-resistant washing-resistant antistatic coating and preparation method thereof | |
KR102637902B1 (en) | Polarizing plate | |
CN106887537A (en) | A kind of aluminum plastic film composite bed and preparation method thereof and lithium ion battery | |
WO2000036023A1 (en) | Compound for energy conversion | |
CN109628004A (en) | Film, surface protective film and optical component with finishing coat | |
JP7319032B2 (en) | Conductive synthetic leather for vehicle seats | |
KR100803782B1 (en) | Surface protective film | |
CN208791542U (en) | A kind of antistatic acrylic protective film | |
CN107428450B (en) | Electronic parts lid band and electronic component-use package body | |
JP7067832B2 (en) | Conductive coating | |
CN109427751A (en) | Resin sheet and semiconductor device | |
JP5362448B2 (en) | Antistatic laying mat | |
KR101660532B1 (en) | Functional optical film | |
CN213056324U (en) | Antistatic adsorption environment-friendly PE film | |
CN210103819U (en) | Corrosion-resistant protective film for mobile phone screen | |
CN214032324U (en) | Wear-resistant waterproof antistatic adhesive tape | |
CN103496243A (en) | Anti-static waterproof corrosion resistant and wear resistant cloth | |
CN203293658U (en) | Anti-static transfer printing glue head | |
CN221397778U (en) | Antistatic PE protective film | |
CN213649029U (en) | Anti-static coating structure | |
CN216445283U (en) | Double-layer anti-static silica gel protective film | |
CN212532836U (en) | Oily non-silicon release film |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
AD01 | Patent right deemed abandoned |
Effective date of abandoning: 20241025 |