CN108081726A - A kind of antistatic protection film and application thereof - Google Patents

A kind of antistatic protection film and application thereof Download PDF

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Publication number
CN108081726A
CN108081726A CN201810111482.6A CN201810111482A CN108081726A CN 108081726 A CN108081726 A CN 108081726A CN 201810111482 A CN201810111482 A CN 201810111482A CN 108081726 A CN108081726 A CN 108081726A
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China
Prior art keywords
antistatic
layer
line
base material
resistivity
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金国华
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Zhejiang Xin Linxin Materials Technology Co Ltd
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Zhejiang Xin Linxin Materials Technology Co Ltd
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Priority to CN201810111482.6A priority Critical patent/CN108081726A/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/36Layered products comprising a layer of synthetic resin comprising polyesters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/28Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • B32B27/308Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising acrylic (co)polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/40Layered products comprising a layer of synthetic resin comprising polyurethanes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B33/00Layered products characterised by particular properties or particular surface features, e.g. particular surface coatings; Layered products designed for particular purposes not covered by another single class
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/06Interconnection of layers permitting easy separation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/10Interconnection of layers at least one layer having inter-reactive properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B32B9/005Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising one layer of ceramic material, e.g. porcelain, ceramic tile
    • B32B9/007Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising one layer of ceramic material, e.g. porcelain, ceramic tile comprising carbon, e.g. graphite, composite carbon
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B32B9/04Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B9/045Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/20Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/21Anti-static
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2553/00Packaging equipment or accessories not otherwise provided for

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  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Laminated Bodies (AREA)

Abstract

The present invention relates to a kind of antistatic protection films; the antistatic protection film includes bottom and uses layer; the bottom is included by the sequentially connected the first base material layer (12) in release glue-line (13) one side and the first antistatic backing (11); it is described to include by the release glue-line (13) with bonding glue-line (23) being connected by sequentially connected second substrate layer (22) of bonding glue-line (23) and the second antistatic backing (21), the bottom and using layer using layer;The resistivity of the antistatic protection film is low, and it is small to tear off voltage, while high-temp resisting high-humidity resisting performance is good.

Description

A kind of antistatic protection film and application thereof
Technical field
The invention belongs to field of membrane science, are related to a kind of protective film more particularly to a kind of antistatic protection film.
Background technology
At present, the glass substrate surface of some electronic products during carrying and use, is easily subject to some chemicals The polishing scratch of the contact staining or nail of matter etc. scratches, it usually needs protective film is attached on its surface to be allowed to from damage and dirt Dye.
Protective film of the prior art generally uses PET (polyethylene terephthalate) material as base material, then applies It is prepared by upper coating material.Since the resistivity of PET material is up to 1010-1020Ω cm, easily put aside electrostatic.When this kind of protection Film in use, easy absorption dust and impurity, while also holds and easy to produce static electricity electronic part material is caused on electronic product Damage, and it is unfavorable for health.
203198346 U of CN disclose a kind of electrostatic prevention film, and the electrostatic prevention film includes surface layer and internal layer, the surface layer Basosexine, interlayer and interior base are additionally provided between internal layer, it is characterized in that the internal layer is polythiophene dispersions layer or carbon Nanotube disperses liquid layer.The thickness of the polythiophene dispersions layer or carbon nano tube dispersion liquid layer be U, 0 μm<U<μm.It is described outer Base is PET, and the thickness of the PET is W, 12 μm<W<30μm.The interior base be PE, CPP or CPE, the thickness of the interior base It spends for M, 20 μm<M.The interlayer is Al layers, and the thickness in the interlayer is N, N>40 angstroms.The utility model provides anti-quiet Electrolemma internal layer is polythiophene dispersions layer or carbon nano tube dispersion liquid, is directly connect with protected electronic component or collector surface It touches, polythiophene dispersions layer or carbon nano tube dispersion liquid can not first bonded on the surface, although while polythiophene point Dispersion liquid layer or carbon nano tube dispersion liquid are conductive, can disperse electrostatic, but still be rested in scattered electrostatic implementation Electronic component or collector surface, and since most inside, the electrostatic that this layer is in electrostatic prevention film can not dissipate, it substantially will not be quiet Electrodispersion, in electrostatic accumulation to a certain extent or when electrostatic charge is excessive can not play the role of permanent antistatic.
104419337 A of CN disclose two-sided antistatic protection films of a kind of PET and preparation method thereof, the PET antistatics Protective film is made of PET base material, pressure-sensitive adhesive layer, release film and antistatic backing, and the one side of PET base material is antistatic process layer, separately It is fitted on one side with release film by pressure-sensitive adhesive layer, antistatic particle is contained in the pressure-sensitive adhesive layer.The invention bilayer prevent it is quiet The principle of electricity is base material one side antistatic backing, and antistatic particle is added in another layer of pressure sensitive adhesive to resist electrostatic, substantially The protective film includes antistatic backing, substrate layer and pressure-sensitive adhesive layer using layer, and it is still release layer to use layer and the isolation in the external world, Due to the high resistance of release layer, pressure-sensitive adhesive layer surface can be made to continue electrostatic, even if wherein containing antistatic particle, due to its both sides For high-resistance release layer and substrate layer, electrostatic can not dissipate, and electrostatic savings problem is not well solved still.
Therefore, it is high for prior art protection film resistivity, easily put aside electrostatic, while the antistatic efficiency of electrostatic prevention film Low, the problem of service life is short, it is particularly significant to study a kind of new antistatic protection film.
The content of the invention
It is high for protection film resistivity in the prior art, easily put aside electrostatic, while the antistatic effect of electrostatic prevention film The problem of rate is low, and service life is short, the present invention provide a kind of antistatic protection film, and the antistatic protection film anti-static effect is bright Aobvious, antistatic long lifespan, it is small to tear off voltage, and anti-static effect influences from environment temperature and humidity.
For this purpose, the present invention uses following technical scheme:
It is an object of the present invention to provide a kind of antistatic protection film, the antistatic protection film includes bottom and use Layer, the bottom is included by the sequentially connected substrate layer in release glue-line one side and antistatic backing, described to be included using layer by bonding The sequentially connected substrate layer of glue-line and antistatic backing, the bottom are connected with using layer by the release glue-line with bonding glue-line It connects.
As currently preferred technical solution, second substrate layer and the first base material layer are PET base material layer, institute It states and contains polythiophene in PET base material layer.
As currently preferred technical solution, polythiophene and the mass ratio of PET base material described in second substrate layer For (0.1~5):100, such as 0.1:100、0.2:100、0.5:100、1:100、2:100、3:100、4:100 or 5:100 etc., but It is not limited in cited numerical value, other the unrequited numerical value included in the numberical range are equally applicable, further excellent It elects as (1~3):100.
Polythiophene is adulterated in PET base material, since the thiophene polymeric that polythiophene is armaticity obtains, and is also contained in PET Phenyl ring, therefore the two has good compatibility.And after adding in conducting polymer polythiophene, one side polythiophene can be led in itself Electricity, while the activity of electronics in PET molecules is improved by conjugation, reduce the resistivity of PET base material;On the other hand, In the presence of having electrostatic in PET base material layer, polythiophene can avoid the accumulation because of electrostatic in time by electrostatic dispersion, and make portion Subregion overtension and the problem of damage electronic component.
Meanwhile when the addition of polythiophene and the mass ratio of PET base material are less than 0.1:When 100, polythiophene content is too low, no The resistivity that PET base material layer can effectively be reduced transfers electrostatic simultaneously;And when the addition of polythiophene and the mass ratio of PET base material are big In 5:When 100, since polythiophene has water solubility in itself, although the addition of increase polythiophene can further reduce PET bases The resistivity of material layer, but the hydrophilic nmature on pet layer surface can increase, service life in wet condition declines.
Preferably, the thickness of second substrate layer be 9~50 μm, such as 9 μm, 10 μm, 12 μm, 15 μm, 20 μm, 25 μm, 30 μm, 35 μm, 40 μm, 45 μm or 50 μm etc., it is not limited to cited numerical value, included in the numberical range other not The numerical value enumerated is equally applicable.
Preferably, the resistivity of second substrate layer is 106~1011Ω cm, such as 106Ω·cm、107Ω·cm、 108Ω·cm、109Ω·cm、1010Ω cm or 1011Ω cm etc., it is not limited to cited numerical value, the numerical value model Other the unrequited numerical value included in enclosing are equally applicable.
As currently preferred technical solution, polythiophene and the mass ratio of PET base material described in the first base material layer For (0.1~5):100, such as 0.1:100、0.2:100、0.5:100、1:100、2:100、3:100、4:100 or 5:100 etc., but It is not limited in cited numerical value, other the unrequited numerical value included in the numberical range are equally applicable, further excellent It elects as (1~3):100.
Preferably, the thickness of the first base material layer be 9~50 μm, such as 9 μm, 10 μm, 12 μm, 15 μm, 20 μm, 25 μm, 30 μm, 35 μm, 40 μm, 45 μm or 50 μm etc., it is not limited to cited numerical value, included in the numberical range other not The numerical value enumerated is equally applicable.
Preferably, the resistivity of the first base material layer is 106~1011Ω cm, such as 106Ω·cm、107Ω·cm、 108Ω·cm、109Ω·cm、1010Ω cm or 1011Ω cm etc., it is not limited to cited numerical value, the numerical value model Other the unrequited numerical value included in enclosing are equally applicable.
As currently preferred technical solution, the material of second antistatic backing includes black graphite, acetylene black, section's qin Any one in black, polyaniline, polypyrrole or polythiophene or at least two combination, the combination typical case but non-limiting examples Have:Graphite is black and the combination of acetylene black, graphite are black and the combination of Ketjen black, the combination of polyaniline and polypyrrole, polypyrrole and poly- The combination of thiophene, the combination of polythiophene or acetylene black or graphite is black, the combination of Ketjen black and polyaniline etc., are preferably polythiophene.
Preferably, the thickness of second antistatic backing be 1~10 μm, such as 1 μm, 2 μm, 3 μm, 4 μm, 5 μm, 6 μm, 7 μm, 8 μm, 9 μm or 10 μm etc., it is not limited to cited numerical value, other unrequited numerical value for being included in the numberical range It is equally applicable, further preferably 3~6 μm.
Preferably, the resistivity of second antistatic backing is 105~1011Ω cm, such as 105Ω·cm、106Ω·cm、 107Ω·cm、108Ω·cm、109Ω·cm、1010Ω cm or 1011Ω cm etc., it is not limited to cited number It is worth, other the unrequited numerical value included in the numberical range are equally applicable.
As currently preferred technical solution, the material of first antistatic backing includes black graphite, acetylene black, section's qin Any one in black, polyaniline, polypyrrole or polythiophene or at least two combination, the combination typical case but non-limiting examples Have:Graphite is black and the combination of acetylene black, graphite are black and the combination of Ketjen black, the combination of polyaniline and polypyrrole, polypyrrole and poly- The combination of thiophene, the combination of polythiophene or acetylene black or graphite is black, the combination of Ketjen black and polyaniline etc., are preferably polythiophene.
Preferably, the thickness of first antistatic backing be 1~10 μm, such as 1 μm, 2 μm, 3 μm, 4 μm, 5 μm, 6 μm, 7 μm, 8 μm, 9 μm or 10 μm etc., it is not limited to cited numerical value, other unrequited numerical value for being included in the numberical range It is equally applicable, further preferably 3~6 μm.
Preferably, the resistivity of first antistatic backing is 105~1011Ω cm, such as 105Ω·cm、106Ω·cm、 107Ω·cm、108Ω·cm、109Ω·cm、1010Ω cm or 1011Ω cm etc., it is not limited to cited number It is worth, other the unrequited numerical value included in the numberical range are equally applicable.
The present invention is using layer and bottom to be provided with substrate layer and antistatic backing, passes through the knot of double-layer antistatic Structure, reduces the accumulation of antistatic protection film electrostatic during storage, while reduces and tear off voltage, is tearing the mistake of bottom off Cheng Zhong reduces the generation of electrostatic.
As currently preferred technical solution, the material of the bonding glue-line includes organosilicon, polyacrylic acid or poly- ammonia In ester it is any or at least two combination, it is described combination typical case but non-limiting examples have:The group of organosilicon and polyacrylic acid Conjunction, polyacrylic acid and the combination of polyurethane, the combination or organosilicon of organosilicon and polyurethane, the combination of polyacrylic acid and polyurethane Deng.
As currently preferred technical solution, contain antistatic agent in the bonding glue-line, the antistatic agent includes Odium stearate, dodecyl sodium sulfate, neopelex, lauryl sulfosuccinic acid monoester disodium or cetyl three Any one in methyl bromide ammonium or at least two combination, described group typical case but non-limiting examples have:Odium stearate and ten Combination, neopelex and the moon of dialkyl sulfonates combination, dodecyl sodium sulfate and neopelex The combination of osmanthus base sulfosuccinic acid monoester disodium, lauryl sulfosuccinic acid monoester disodium and cetyl trimethylammonium bromide Combination or the combination of dodecyl sodium sulfate, neopelex and lauryl sulfosuccinic acid monoester disodium etc..
Preferably, the thickness of the bonding glue-line is 5~50 μm, such as 5 μm, 10 μm, 15 μm, 20 μm, 25 μm, 30 μm, 35 μ M, 40 μm, 45 μm or 50 μm etc., it is not limited to cited numerical value, other unrequited numbers for being included in the numberical range Value is equally applicable, further preferably 15~25 μm.
Preferably, the resistivity of the bonding glue-line is 109~1011Ω cm, such as 109Ω·cm、5×109Ω·cm、8 ×109Ω·cm、1×1010Ω·cm、5×1010Ω·cm、8×1010Ω cm or 1011Ω cm etc., it is not limited to Cited numerical value, other the unrequited numerical value included in the numberical range are equally applicable.
As currently preferred technical solution, the material of the release glue-line includes silicone oil mould release, fluorine silicon mould release Or any one in non-silicon mould release or at least two combination, the combination typical case but non-limiting examples have:Silicone oil is release Agent and the combination of fluorine silicon mould release, the combination of fluorine silicon mould release and non-silicon mould release, the group of non-silicon mould release and silicone oil mould release Conjunction or the combination of silicone oil mould release, fluorine silicon mould release and non-silicon mould release etc..
Preferably, the thickness of the release glue-line be 10~50 μm, such as 10 μm, 15 μm, 20 μm, 25 μm, 30 μm, 35 μm, 40 μm, 45 μm or 50 μm etc., it is not limited to cited numerical value, other unrequited numerical value for being included in the numberical range It is equally applicable, further preferably 25~35 μm.
Preferably, the resistivity of the release glue-line is 109~1011Ω cm, such as 109Ω·cm、5×109Ω·cm、8 ×109Ω·cm、1×1010Ω·cm、5×1010Ω·cm、8×1010Ω cm or 1011Ω cm etc., it is not limited to Cited numerical value, other the unrequited numerical value included in the numberical range are equally applicable.
The second purpose of the present invention is to provide a kind of purposes of above-mentioned antistatic protection, the antistatic protection film is used for hand The shipment protection field of machine back-cover and radian screen.
Compared with prior art, the present invention at least has the advantages that:
(1) a kind of antistatic protection film provided by the invention, the antistatic protection film employ double using layer and bottom Layer permanent antistatic technique:Using the conductivity principle of aqueous polythiophene, and it knits shape network structure with film surface formation, it is ensured that The long-acting persistence of anti-static effect;
(2) a kind of antistatic protection film provided by the invention, the resistivity of the antistatic protection film is 109The order of magnitude, The accumulation of electrostatic is not easily caused, and anti-static effect is good;
(3) a kind of antistatic protection film provided by the invention, the antistatic protection film tear off voltage less than 500kV;
(4) a kind of antistatic protection film provided by the invention, the antistatic protection film remain under hot and humid environment Good anti-static electrification is maintained to use 10 days or so.
Description of the drawings
Fig. 1 is a kind of structure diagram of antistatic protection film provided by the invention;
In figure:1- bottoms, 11- antistatic backings, 12- substrate layers, the release glue-lines of 13-, 2- use layer, 21- antistatic backings, 22- substrate layers, 23- bonding glue-lines.
The present invention is described in more detail below.But following examples is only the simple example of the present invention, not generation Table or limitation the scope of the present invention, protection scope of the present invention are subject to claims.
Specific embodiment
Technical solution to further illustrate the present invention below with reference to the accompanying drawings and specific embodiments.
Specific embodiment of the invention part provides a kind of antistatic protection film as shown in Figure 1, the antistatic protection film Including bottom and using layer, the bottom is included by the sequentially connected substrate layer 12 in release 13 one side of glue-line and antistatic backing 11, It is described to be included using layer by 23 sequentially connected substrate layer 22 of bonding glue-line and antistatic backing 21, the bottom and passed through using layer The release glue-line 13 is connected with bonding glue-line 23.
For the present invention is better described, technical scheme is readily appreciated, of the invention is typical but non-limiting Embodiment is as follows:
Embodiment 1
A kind of antistatic protection film, the antistatic protection film include bottom and using layers, and the bottom is included by release The sequentially connected substrate layer 12 in 13 one side of glue-line and antistatic backing 11, it is described to use layer including sequentially connected by bonding glue-line 23 Substrate layer 22 and antistatic backing 21, the bottom are connected with using layer by the release glue-line 13 with bonding glue-line 23.
Wherein release glue-line 13 has silicone oil mould release to be prepared, and thickness is 10 μm, resistivity 109Ω·cm;Base material Polythiophene and the mass ratio of PET base material are 0.1 in layer 12:100, thickness is 9 μm, resistivity 1011Ω·cm;Antistatic backing 11 By the black preparation of graphite, thickness is 1 μm, resistivity 105Ω·cm;Bonding glue-line 23 is prepared by organosilicon, and containing hard Resin acid sodium, thickness are 5 μm, resistivity 109Ω·cm;Polythiophene and the mass ratio of PET base material are 5 in substrate layer 22:100, Thickness is 50 μm, resistivity 106Ω·cm;Antistatic backing 21 is prepared by acetylene black, and thickness is 10 μm, resistivity 1011 Ω·cm。
Embodiment 2
A kind of antistatic protection film, the antistatic protection film include bottom and using layers, and the bottom is included by release The sequentially connected substrate layer 12 in 13 one side of glue-line and antistatic backing 11, it is described to use layer including sequentially connected by bonding glue-line 23 Substrate layer 22 and antistatic backing 21, the bottom are connected with using layer by the release glue-line 13 with bonding glue-line 23.
Wherein release glue-line 13 has fluorine silicon mould release to be prepared, and thickness is 50 μm, resistivity 1011Ω·cm;Base material Polythiophene and the mass ratio of PET base material are 5 in layer 12:100, thickness is 50 μm, resistivity 106Ω·cm;Antistatic backing 11 It is prepared by Ketjen black, thickness is 10 μm, resistivity 1011Ω·cm;Bonding glue-line 23 is prepared by polyacrylic acid, and is contained Dodecyl sodium sulfate, thickness are 50 μm, resistivity 1011Ω·cm;Polythiophene and the mass ratio of PET base material in substrate layer 22 For 0.5:100, thickness is 9 μm, resistivity 1011Ω·cm;Antistatic backing 21 is prepared by polyaniline, and thickness is 1 μm, resistivity For 105Ω·cm。
Embodiment 3
A kind of antistatic protection film, the antistatic protection film include bottom and using layers, and the bottom is included by release The sequentially connected substrate layer 12 in 13 one side of glue-line and antistatic backing 11, it is described to use layer including sequentially connected by bonding glue-line 23 Substrate layer 22 and antistatic backing 21, the bottom are connected with using layer by the release glue-line 13 with bonding glue-line 23.
Wherein release glue-line 13 has non-silicon mould release to be prepared, and thickness is 30 μm, and resistivity is 2 × 109Ω·cm;Base Polythiophene and the mass ratio of PET base material are 2 in material layer 12:100, thickness is 20 μm, and resistivity is 3 × 106Ω·cm;Antistatic Layer 11 is prepared by polythiophene, and thickness is 5 μm, and resistivity is 3 × 107Ω·cm;Bonding glue-line 23 is prepared by polyacrylic acid, And containing neopelex, thickness is 20 μm, and resistivity is 5 × 109Ω·cm;Polythiophene and PET in substrate layer 22 The mass ratio of base material is 2:100, thickness is 20 μm, and resistivity is 3 × 106Ω·cm;Antistatic backing 21 is prepared by polythiophene, thick It spends for 5 μm, resistivity is 3 × 107Ω·cm。
Embodiment 4
A kind of antistatic protection film, the antistatic protection film include bottom and using layers, and the bottom is included by release The sequentially connected substrate layer 12 in 13 one side of glue-line and antistatic backing 11, it is described to use layer including sequentially connected by bonding glue-line 23 Substrate layer 22 and antistatic backing 21, the bottom are connected with using layer by the release glue-line 13 with bonding glue-line 23.
Wherein release glue-line 13 has non-silicon mould release to be prepared, and thickness is 25 μm, and resistivity is 4 × 1010Ω·cm;Base Polythiophene and the mass ratio of PET base material are 1 in material layer 12:100, thickness is 30 μm, and resistivity is 5 × 108Ω·cm;Antistatic Layer 11 is prepared by polythiophene, and thickness is 3 μm, and resistivity is 7 × 106Ω·cm;Bonding glue-line 23 is prepared by polyurethane, and Containing lauryl sulfosuccinic acid monoester disodium, thickness is 15 μm, and resistivity is 2 × 109Ω·cm;Polythiophene in substrate layer 22 Mass ratio with PET base material is 3:100, thickness is 20 μm, and resistivity is 1 × 106Ω·cm;Antistatic backing 21 is by polythiophene system Standby, thickness is 6 μm, and resistivity is 8 × 106Ω·cm。
Embodiment 5
A kind of antistatic protection film, the antistatic protection film include bottom and using layers, and the bottom is included by release The sequentially connected substrate layer 12 in 13 one side of glue-line and antistatic backing 11, it is described to use layer including sequentially connected by bonding glue-line 23 Substrate layer 22 and antistatic backing 21, the bottom are connected with using layer by the release glue-line 13 with bonding glue-line 23.
Wherein release glue-line 13 has silicone oil mould release to be prepared, and thickness is 35 μm, and resistivity is 8 × 1010Ω·cm;Base Polythiophene and the mass ratio of PET base material are 3 in material layer 12:100, thickness is 20 μm, and resistivity is 1 × 106Ω·cm;Antistatic Layer 11 is prepared by polythiophene, and thickness is 6 μm, and resistivity is 8 × 106Ω·cm;Bonding glue-line 23 is prepared by polyurethane, and Containing cetyl trimethylammonium bromide, thickness is 25 μm, and resistivity is 6 × 109Ω·cm;In substrate layer 22 polythiophene with The mass ratio of PET base material is 1:100, thickness is 30 μm, and resistivity is 3 × 108Ω·cm;Antistatic backing 21 is by polythiophene system Standby, thickness is 3 μm, and resistivity is 7 × 106Ω·cm。
Embodiment 6
A kind of antistatic protection film, except antistatic backing 21 is by polypyrrole and polythiophene (mass ratio 1:1) it is prepared by combination, Other conditions are same as Example 3.
Embodiment 7
A kind of antistatic protection film, except the antistatic agent contained in bonding glue-line 23 is dodecyl sodium sulfate and 12 Sodium alkyl benzene sulfonate (mass ratio 1:1) outside combination, other conditions are same as Example 3.
Embodiment 8
A kind of antistatic protection film, except release glue-line 13 is silicone oil mould release and fluorine silicon mould release (mass ratio 1:1) Combination is outer, and other conditions are same as Example 3.
Embodiment 9
A kind of antistatic protection film, except antistatic backing 11 is graphite is black and Ketjen black (mass ratio 1:1) outside combination, His condition is same as Example 3.
Comparative example 1
A kind of antistatic protection film, in addition to not containing polythiophene in substrate layer 22 and substrate layer 12, other conditions with Embodiment 3 is identical.
Comparative example 2
A kind of antistatic protection film, except polythiophene and the mass ratio of PET base material are in substrate layer 22 and substrate layer 12 0.01:Outside 100, other conditions are same as Example 3.
Comparative example 3
A kind of antistatic protection film, except polythiophene in substrate layer 22 and substrate layer 12 and the mass ratio of PET base material are 10: Outside 100, other conditions are same as Example 3.
Comparative example 4
A kind of antistatic protection film, in addition to bonding and not containing antistatic agent neopelex in glue-line 23, His condition is same as Example 3.
Resistivity is carried out to the antistatic protection film of embodiment 1-9 and comparative example 1-4, tears off voltage and in high temperature height The test of service life memory under wet environment (85 DEG C, 85%RH), the results are shown in Table 1.
Table 1
Resistivity/109Ω·cm Tear off voltage/kV Service life/h
Embodiment 1 5.2 492 240
Embodiment 2 4.6 406 240
Embodiment 3 3.7 223 240
Embodiment 4 6.2 369 240
Embodiment 5 10.9 371 240
Embodiment 6 8.3 306 240
Embodiment 7 9.1 345 240
Embodiment 8 7.9 364 240
Embodiment 9 8.3 355 240
Comparative example 1 102.3 975 6
Comparative example 2 97.6 963 6
Comparative example 3 0.7 251 180
Comparative example 4 43.5 601 150
It can be obtained according to table 1, pet layer addition polythiophene effectively reduces the resistivity of protective film extremely in embodiment 1-9 109Ω cm, while using the double-layer antistatic structure of layer and bottom, reduce the electrostatic protection film tears off voltage, adds The polythiophene entered also has adjusted the hydrophily and hydrophobicity on PET base material layer surface, improves the high temperature resistant of protective film and resistance to high humidity Ability, the antistatic protection film provided in embodiment 1-9 can pass through embodiment 3 under 85 DEG C and 85%RH using 10 days Can be seen that pet layer with comparative example 1-4 and be added without polythiophene can cause the resistivity of protective film to be substantially increased, while tear off electricity Pressure rise, high temperature resistant and high humidity ability all decline;When the polythiophene amount of addition and the mass ratio of PET base material are less than 0.1:When 100, Polythiophene can not effectively reduce the resistivity of PET base material, and the resistivity value of substrate layer is still larger, tear off voltage height accordingly, High-temp resisting high-humidity resisting ability is low;When the polythiophene amount of addition and the mass ratio of PET base material are more than 5:When 100, antistatic protection film Resistivity and tear off voltage and comparative example 3 is not much different, but the ability of high-temp resisting high-humidity resisting declines.
Applicant states that the present invention illustrates the detailed construction feature of the present invention by above-described embodiment, but the present invention is simultaneously Above-mentioned detailed construction feature is not limited to, that is, does not mean that the present invention has to rely on above-mentioned detailed construction feature and could implement.Institute Belong to those skilled in the art it will be clearly understood that any improvement in the present invention, to the equivalence replacement of component selected by the present invention And the increase of accessory, selection of concrete mode etc., it all falls within protection scope of the present invention and the open scope.
The preferred embodiment of the present invention has been described above in detail, still, during present invention is not limited to the embodiments described above Detail, within the scope of the technical concept of the present invention, a variety of simple variants can be carried out to technical scheme, this A little simple variants all belong to the scope of protection of the present invention.
It is further to note that the specific technical features described in the above specific embodiments, in not lance In the case of shield, can be combined by any suitable means, in order to avoid unnecessary repetition, the present invention to it is various can The combination of energy no longer separately illustrates.
In addition, various embodiments of the present invention can be combined randomly, as long as it is without prejudice to originally The thought of invention, it should also be regarded as the disclosure of the present invention.

Claims (10)

1. a kind of antistatic protection film, which is characterized in that the antistatic protection film includes bottom and uses layer, the bottom bag It includes by the sequentially connected the first base material layer (12) in release glue-line (13) one side and the first antistatic backing (11), it is described to be included using layer By sequentially connected second substrate layer (22) of bonding glue-line (23) and the second antistatic backing (21), the bottom and passed through using layer The release glue-line (13) is connected with bonding glue-line (23).
2. antistatic protection film according to claim 1, which is characterized in that second substrate layer (22) and the first base material Layer (12) is PET base material layer, contains polythiophene in the PET base material layer.
3. antistatic protection film according to claim 1 or 2, which is characterized in that described in second substrate layer (22) Polythiophene and the mass ratio of PET base material are (0.1~5):100, further preferably (1~3):100;
Preferably, the thickness of second substrate layer (22) is 9~50 μm;
Preferably, the resistivity of second substrate layer (22) is 106~1011Ω·cm。
4. according to the antistatic protection film described in claim 1-3, which is characterized in that gather described in the first base material layer (12) Thiophene and the mass ratio of PET base material are (0.1~5):100, further preferably (1~3):100;
Preferably, the thickness of the first base material layer (12) is 9~50 μm;
Preferably, the resistivity of the first base material layer (12) is 106~1011Ω·cm。
5. according to claim 1-4 any one of them antistatic protection films, which is characterized in that second antistatic backing (21) Material include that graphite is black, any one in acetylene black, Ketjen black, polyaniline, polypyrrole or polythiophene or at least two group It closes, is preferably polythiophene;
Preferably, the thickness of second antistatic backing (21) is 1~10 μm, further preferably 3~6 μm;
Preferably, the resistivity of second antistatic backing (21) is 105~1011Ω·cm。
6. according to claim 1-5 any one of them antistatic protection films, which is characterized in that, first antistatic backing (11) material includes any one in black graphite, acetylene black, Ketjen black, polyaniline, polypyrrole or polythiophene or at least two Combination, be preferably polythiophene;
Preferably, the thickness of first antistatic backing (11) is 1~10 μm, further preferably 3~6 μm;
Preferably, the resistivity of first antistatic backing (11) is 105~1011Ω·cm。
7. according to claim 1-6 any one of them antistatic protection films, which is characterized in that the material of the bonding glue-line (23) Material includes any in organosilicon, polyacrylic acid or polyurethane or at least two combinations.
8. according to claim 1-7 any one of them antistatic protection films, which is characterized in that contain in the bonding glue-line (23) There is antistatic agent, the antistatic agent includes odium stearate, dodecyl sodium sulfate, neopelex, lauryl sulphur Change any one in monomester succinate disodium or cetyl trimethylammonium bromide or at least two combination;
Preferably, the thickness of the bonding glue-line (23) is 5~50 μm, further preferably 15~25 μm;
Preferably, the resistivity of the bonding glue-line (23) is 109~1011Ω·cm。
9. according to claim 1-8 any one of them antistatic protection films, which is characterized in that the material of the release glue-line (13) Material includes any one in silicone oil mould release, fluorine silicon mould release or non-silicon mould release or at least two combination;
Preferably, the thickness of the release glue-line (13) is 10~50 μm, further preferably 25~35 μm;
Preferably, the resistivity of the release glue-line (13) is 109~1011Ω·cm。
A kind of 10. purposes of claim 1-9 any one of them antistatic protections, which is characterized in that the antistatic protection Film protects field for the shipment of cell phone back cover and radian screen.
CN201810111482.6A 2018-02-05 2018-02-05 A kind of antistatic protection film and application thereof Pending CN108081726A (en)

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CN109181564A (en) * 2018-06-07 2019-01-11 苏州袭麟光电科技产业有限公司 A kind of anti-reflection optical grade nanometer AR screen protecting film of substrate recoverable environmental protection type
CN109291564A (en) * 2018-09-14 2019-02-01 无锡市昊恩保护膜有限公司 A kind of protective film and its preparation method and application
CN114075389A (en) * 2020-08-21 2022-02-22 昆山威斯泰电子技术有限公司 Antistatic coating, antistatic anti-scratch touch screen PET protective film and manufacturing method thereof
CN115491145A (en) * 2022-11-17 2022-12-20 昆山博益鑫成高分子材料有限公司 OLED (organic light emitting diode) process protective film and preparation method thereof
CN116640520A (en) * 2023-05-08 2023-08-25 极天羽技术股份有限公司 PU adhesive protective film with low film tearing voltage and preparation method thereof

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CN109181564A (en) * 2018-06-07 2019-01-11 苏州袭麟光电科技产业有限公司 A kind of anti-reflection optical grade nanometer AR screen protecting film of substrate recoverable environmental protection type
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CN114075389A (en) * 2020-08-21 2022-02-22 昆山威斯泰电子技术有限公司 Antistatic coating, antistatic anti-scratch touch screen PET protective film and manufacturing method thereof
CN115491145A (en) * 2022-11-17 2022-12-20 昆山博益鑫成高分子材料有限公司 OLED (organic light emitting diode) process protective film and preparation method thereof
CN115491145B (en) * 2022-11-17 2023-03-03 昆山博益鑫成高分子材料有限公司 OLED (organic light emitting diode) process protective film and preparation method thereof
CN116640520A (en) * 2023-05-08 2023-08-25 极天羽技术股份有限公司 PU adhesive protective film with low film tearing voltage and preparation method thereof

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