CN108063079A - It can inhibit the counterfeit spark electron beam source of Multiple level of flashing - Google Patents

It can inhibit the counterfeit spark electron beam source of Multiple level of flashing Download PDF

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Publication number
CN108063079A
CN108063079A CN201711282084.2A CN201711282084A CN108063079A CN 108063079 A CN108063079 A CN 108063079A CN 201711282084 A CN201711282084 A CN 201711282084A CN 108063079 A CN108063079 A CN 108063079A
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China
Prior art keywords
electron beam
flashing
beam source
multiple level
insulation
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CN201711282084.2A
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CN108063079B (en
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霍卫杰
胡静
赵万生
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Shanghai Jiaotong University
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Shanghai Jiaotong University
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J17/00Gas-filled discharge tubes with solid cathode
    • H01J17/02Details
    • H01J17/04Electrodes; Screens
    • H01J17/06Cathodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J17/00Gas-filled discharge tubes with solid cathode
    • H01J17/02Details

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  • Electron Sources, Ion Sources (AREA)

Abstract

A kind of counterfeit spark electron beam source of Multiple level that can inhibit flashing, including:The target and intermediate insulation piece being alternately superimposed in sequentially connected blind flange, ceramic separation sleeve and through hole flange, the coreless armature at the symmetrically placed both ends inside ceramic separation sleeve and its insulation sleeve, ceramic separation sleeve, wherein:Positioned at the coreless armature and its insulation sleeve at both ends and positioned at intermediate discharging chamber is formed for Electron Beam Focusing and the target accelerated.The present invention obtains the counterfeit spark electron beam source of multistage that can effectively inhibit flashing, so as to obtain the electron beam of high-energy.The counterfeit spark electron beam source of multistage of the present invention is by using protection metal pole piece edge, cut-out or hinders effectively to inhibit the paradoxical discharge during Pseudo spark along the formation of face flashing, improves the energy of electron beam, improves the stability and reliability of electric discharge.

Description

It can inhibit the counterfeit spark electron beam source of Multiple level of flashing
Technical field
The present invention relates to a kind of technologies in Pseudo spark field, are specifically a kind of Multiple level that can inhibit flashing Counterfeit spark electron beam source.
Background technology
Pseudo spark is the gas low pressure discharge positioned at pa type (Paschen) curve left-half.Electric discharge air pressure one As for tens to hundreds of millitorrs, with the reduction of gas atmosphere, breakdown voltage can quickly rise.
Pseudo spark can generate electron beam there are five the stage since the hollow cathode discharge stage.Pseudo spark produces Raw pulsed electron beam has the characteristics such as beam current density height, energy density height, high brightness, self-focusing.Therefore counterfeit spark electron beam There is good application prospect in material surface modifying, X-ray generation, film preparation, high-frequency microwave generation etc..
Counterfeit spark equipment structure type itself has the performance of discharge breakdown voltage and the pulsed electron beam generated very big It influences.The counterfeit spark structure of multistage with multilayer target, the line that can greatly improve breakdown voltage and electron beam are close Degree.However under high voltage, the distortion electric field at metal pole piece edge, isolated insulation piece easily leads to abnormal breakdown along face flashing etc., And electron beam can not be generated.
The stability and reliability of counterfeit spark electron beam source, limitation electricity have been seriously affected along the paradoxical discharges phenomenon such as face flashing Beamlet performance further improves, but also can reduce the service life of counterfeit spark electron beam source, can even cause to put when serious The damage of electric chamber.
The content of the invention
The present invention proposes a kind of counterfeit spark electricity of Multiple level that can inhibit flashing for deficiencies of the prior art Beamlet source by being embedded in insulator at metal pole piece edge, inhibits distortion electric field and generates;By setting a pair of of counterbore depth as electricity The insulating trip of pole thickness half surrounds metal electrode, and metallic cathode-dielectric-vacuum " three phase point " is made to avoid possible distortion Electric field region;The path of flashing electron cloud movement is cut off simultaneously;Further by the way that insulating trip inner wall bulge-structure is set to hinder inner wall Movement of the face along face flashing electron cloud.Formation along face flashing is hindered by more than approach, effectively inhibits Pseudo spark process In paradoxical discharge, improve the energy of electron beam, improve the stability and reliability of electric discharge.
The present invention is achieved by the following technical solutions:
The present invention includes:It is sequentially connected blind flange, ceramic separation sleeve and through hole flange, symmetrically placed in ceramic separation sleeve The target and intermediate insulation piece being alternately superimposed in the coreless armature and its insulation sleeve at internal both ends, ceramic separation sleeve, wherein: It is put positioned at the coreless armature and its insulation sleeve at both ends and positioned at intermediate for Electron Beam Focusing and the target accelerated composition Electric cavity.
It is equipped with to seal between the blind flange and through hole flange and coreless armature and the metal of discharge cavity positioning is close Seal.
By cathode or anode pole piece edge isolation while the insulation sleeve surrounds coreless armature.
The bottom of the insulation sleeve is equipped with intermediate throughholes as discharging gap, and insulation sleeve is towards the one side of target Equipped with coaxial counterbore.
The counterbore depth dimensions is the half of thickness of electrode, and with negative common difference.
The both sides of the intermediate insulation piece are equipped with symmetrical counterbore, are relatively fixed metal pole piece two-by-two, protect pole piece Non-discharge area.
The intermediate insulation piece is equipped with intermediate throughholes, and both ends are equipped with symmetrical coaxial counterbore, and counterbore depth dimensions is electricity The half of pole thickness, hole depth have negative common difference.
The intermediate throughholes inner wall is equipped with step-like bulge-structure.
The insulation sleeve and intermediate insulation piece is preferably that teflon material is made, and is easily processed into required shape, and has There is certain deformable amount.
Technique effect
After the present invention uses more than structure, by insulating materials guard electrode edge, inhibit distortion electric field at this and generate, turn It moves three phase point position and blocks the flashing path of insulating materials outer wall;The step-like structure of inner wall can then hinder inner wall flashing electric Movement of the sub- cloud to anode, so that being effectively inhibited along paradoxical discharges such as face flashings, electron gun breakdown voltage obtains greatly Ground improves, and obtains high energy electron beam.Whole system is compact-sized simultaneously, and reliability is high.
Description of the drawings
Fig. 1 is appearance diagram of the present invention;
Fig. 2 is schematic structural view of the invention;
In figure:1 through hole flange, 2 ceramic separation sleeves, 3 cathode insulation sets, 4 metal o-rings, 5 blind flanges, 6 hollow cathodes, 7 targets, 8 intermediate insulation pieces, 9 anodized insulation sets, 10 cathodes or anode electrode film, 11 hollow anodes, 12 intermediate throughholes, 13 Counterbore, 14 protrusions.
Fig. 3 is intermediate insulation chip architecture schematic diagram;
Fig. 4 is cathode or anodized insulation nested structure schematic diagram.
Specific embodiment
Embodiment 1
As shown in Fig. 2, the present embodiment includes:Blind flange 5, ceramic separation sleeve 2 and through hole flange 1 is threadedly coupled successively to form External support;It is symmetrically placed in the coreless armature 6,11 at both ends in ceramic separation sleeve 2 and its insulation sleeve 3,9, be alternately arranged in pottery Target 7 and intermediate insulation piece 8 in porcelain separation sleeve 2 form discharging chamber together.Discharging chamber is existed by metal o-ring 4 Axially position is carried out in external support.
Cathode insulation set 3 as shown in Figure 4 surrounds hollow cathode 6, and mode as shown in Figure 2 is mounted on ceramic sleeve In 2.The intermediate throughholes 12 that cathode insulation covers 3 bottoms provide discharging gap.Cathode insulation set 3 as shown in Figure 4 has to be led to centre The coaxial counterbore 13 in hole 12, counterbore depth are thickness of electrode half, and space is provided for the insertion of target 7.
Intermediate insulation piece 8 as shown in Figure 3 has symmetrical counterbore 13, and counterbore depth is the half of thickness of electrode size, Target 7 is embedded in pairs.Target 7 and intermediate insulation piece 8 are alternately arranged to form multilevel hierarchy as shown in Figure 2.
As shown in Figure 3,4, since the depth dimensions of counterbore 13 is negative common difference, it is ensured that electrode is reliable with insulator axial direction Contact.During assembling under the action of sealing force is tightened, insulated part is extruded, and realizes the good isolation of 7 outer rim of target.
As shown in Fig. 2, the counterfeit spark electron beam source of multistage that can effectively inhibit flashing in the present embodiment is pacified by through hole flange 1 In vacuum system.Air pressure in system is dropped to 10-5After torr, flow control valve is used to be passed through argon gas and causes gas in electron gun Pressure reaches the air pressure range of Pseudo spark.Cathode termination negative high voltage afterwards, anode tap ground connection, voltage are adjusted to certain value, occur Pulse type pseudo spark gas discharge.In the hollow cathode discharge regime of Pseudo spark, electron beam is produced in 6 intracavitary of hollow cathode It is raw, target 7 is injected by the through hole on the cathode electrode sheet 10 of 6 bottom of hollow cathode.As Pseudo spark is into one Step carries out, and ambient gas is further ionized in the multistage space that electronics is formed in target 7 and intermediate insulation piece 8, and by not It is disconnected to accelerate, focus on.The Intense Pulsed Relativistic Electron Beam of high density, high-energy, high emissivity is finally formed in 11 exit of hollow anode.
Metal electrode (hollow cathode 6, cathode electrode sheet 10 and the centre electricity of on-load voltage in counterfeit spark gas discharge device Pole 7) edge is also easy to produce distortion electric field due to geometric effect.Curved electric field line at electrode edge causes local field strength reduction, The increase of electron mean free path is resulted in, electronics is easier to obtain enough energy, and ionization by collision ambient gas causes abnormal put Electricity.
When cathode loads negative high voltage, positioned at the three phase point position of metallic cathode-insulator-vacuum of cathode electrode sheet 10 It puts, field strength is high and easily generates electronics.Electronics can hit dielectric surface when being moved along insulator surface and generate two Hereafter secondary electronics further generates electronics three times, and then form electron cloud and Ghandler motion moves on the sunny side.The shock of electronics can also cause original First the gas molecule by dielectric absorption is precipitated, and the positive charge meeting ionized gaseous molecules of accumulation, the electronics of formation is with snowslide Electron cloud shifts to anode.Further accumulation strengthens local field strength to positive charge near cathode, accelerates secondary electron Generate and the ionization of desorbed gases, it is final generate insulator along face flashing
Cathode insulation covers the protection of 3 pairs of hollow cathodes 6 and cathode electrode sheet 10, greatly inhibits flashing phenomenon.Such as Hollow cathode 6 and cathode electrode sheet 10 shown in Fig. 2 to before occurring counterfeit spark-over, carry very high negative electricity from on-load voltage Pressure.To avoid the edge of hollow cathode 6 and cathode electrode sheet 10 in hypobaric discharge environment, bending electric field line is formed And increasing the probability of paradoxical discharge, cathode insulation shown in Fig. 4 covers 3 by 10 surrounded by edges of hollow cathode 6 and cathode electricity grade piece.It is cloudy The intermediate throughholes 12 of 3 bottom of pole insulation sleeve provide discharge air-gap.I.e. in addition to necessary machining area, electrode rest part all by every From.By 10 surrounded by edges of 6 bottom of hollow cathode and cathode electrode sheet, while block and come from cathode electrode sheet-vacuum-insulator Developing along face flashing for electronics is generated at three phase point.After the program, cathode terminal flashing is inhibited well.With no cathode The Pseudo spark device of insulation sleeve protection hollow cathode is compared, and the flashing of insulating trip is damaged and no longer occurred close at cathode.
Isolation of the intermediate insulation piece 8 to 7 edge of target reduces paradoxical discharge, improves discharge stability.Counterfeit spark After the hollow cathode discharge regime of electric discharge occurs, gas breakdown can occur in intergrade order.Among the insertion of 7 edge of target In the counterbore 13 of insulating trip 8, inhibit the appearance of electrode edge bending electric field line.Intermediate insulation piece 8 is opposite two-by-two, by target 7 surround, and the three phase point of original electrode rim is transferred, and the electron cloud motion path that anode is tangentially shifted to along electrode outer wall is cut It is disconnected, so as to avoid paradoxical discharge.Compared with the directly alternately stacked multi-level scheme of insulating trip, target, insulating materials is wanted Decline is asked, uses the requirement that dielectric coefficient is relatively low, lower melting-point Teflon can meet insulation;Paradoxical discharge is inhibited, Multiple discharge under same air pressure, the mean square deviation of breakdown voltage reduce.
The bulge-structure 14 of cathode insulation set 3 and 8 intermediate throughholes of intermediate insulation piece, 12 inner wall further inhibits inner wall and dodges Arc improves breakdown voltage.When discharge voltage reaches certain value, dielectric inner wall can be into along face flashing in discharging gap To restrict the factor that breakdown voltage improves, the raising of beam energy is limited.For this purpose, coreless armature isolation as shown in Figure 4 12 inner wall of intermediate throughholes of insulation sleeve 3 and intermediate insulation piece 8 as shown in Figure 3 is respectively provided with step-like annular protrusion 14.The protrusion Presence, can hinder originating from shifting of the electron cloud generated at insulator endoporus-metal electrode-vacuum three phase point to anode It is dynamic, the distance of " climbing arc " is added, inhibits discharging along face flashing for inner wall.Using the program, can by the barotolerance of system into The raising of one step.
Scheme more than, the high pressure resistant value of device are increased to more than 20kV by 5kV or so, and the stability of device also obtains Very big raising is arrived.By breakdown voltage for exemplified by 7kV, the program is not used, the mean square deviation of 10 discharge breakdown voltages is 30.3%, after the program, mean square deviation is reduced to 4.93%, and the stability of electric discharge improves.
Above-mentioned specific implementation can by those skilled in the art on the premise of without departing substantially from the principle of the invention and objective with difference Mode carry out local directed complete set to it, protection scope of the present invention is subject to claims and not by above-mentioned specific implementation institute Limit, each implementation within its scope is by the constraint of the present invention.

Claims (8)

1. a kind of counterfeit spark electron beam source of Multiple level that can inhibit flashing, which is characterized in that including:Sequentially connected blind Blue, ceramic separation sleeve and through hole flange, the symmetrically placed coreless armature at both ends and its insulation sleeve, ceramics inside ceramic separation sleeve The target and intermediate insulation piece being alternately superimposed in separation sleeve, wherein:Positioned at the coreless armature and its insulation sleeve at both ends and position Discharging chamber is formed for Electron Beam Focusing and the target accelerated in intermediate, insulation sleeve will while surrounding coreless armature Cathode or anode pole piece edge isolation.
2. the Multiple level counterfeit spark electron beam source according to claim 1 that flashing can be inhibited, it is characterized in that, described is blind The metal o-ring for sealing and discharge cavity positions is equipped between flange and through hole flange and coreless armature.
3. the Multiple level counterfeit spark electron beam source according to claim 1 that flashing can be inhibited, it is characterized in that, described is exhausted The bottom of edge set is equipped with the intermediate throughholes as discharging gap, and insulation sleeve is equipped with coaxial counterbore towards the one side of target.
4. the Multiple level counterfeit spark electron beam source according to claim 3 that flashing can be inhibited, it is characterized in that, described is heavy Hole depth size is the half of thickness of electrode, and with negative common difference.
5. the Multiple level counterfeit spark electron beam source according to claim 1 that flashing can be inhibited, it is characterized in that, in described Between insulating trip both sides be equipped with symmetrical counterbore, be relatively fixed metal pole piece two-by-two, protect the non-discharge area of pole piece.
6. the counterfeit spark electron beam source of the Multiple level that flashing can be inhibited according to claim 1 or 5, it is characterized in that, it is described Intermediate insulation piece be equipped with intermediate throughholes, both ends are equipped with symmetrical coaxial counterbore, and counterbore depth dimensions is the half of thickness of electrode, Hole depth has negative common difference.
7. the Multiple level counterfeit spark electron beam source according to claim 6 that flashing can be inhibited, it is characterized in that, in described Between the intermediate throughholes inner wall of insulating trip and insulation sleeve be equipped with step-like bulge-structure.
8. the Multiple level counterfeit spark electron beam source according to claim 1 that flashing can be inhibited, it is characterized in that, described is exhausted Edge covers and intermediate insulation piece is made of teflon material.
CN201711282084.2A 2017-12-07 2017-12-07 It is able to suppress the counterfeit spark electron beam source of Multiple level of flashing Active CN108063079B (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111564353A (en) * 2020-04-10 2020-08-21 西安电子科技大学 High-energy electron beam source control system, method and device and part manufacturing method
CN113433582A (en) * 2021-05-13 2021-09-24 上海交通大学 X-ray bulb tube beam diagnosis method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111564353A (en) * 2020-04-10 2020-08-21 西安电子科技大学 High-energy electron beam source control system, method and device and part manufacturing method
CN113433582A (en) * 2021-05-13 2021-09-24 上海交通大学 X-ray bulb tube beam diagnosis method
CN113433582B (en) * 2021-05-13 2022-08-23 上海交通大学 X-ray bulb tube beam diagnosis method

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