CN108063079A - It can inhibit the counterfeit spark electron beam source of Multiple level of flashing - Google Patents
It can inhibit the counterfeit spark electron beam source of Multiple level of flashing Download PDFInfo
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- CN108063079A CN108063079A CN201711282084.2A CN201711282084A CN108063079A CN 108063079 A CN108063079 A CN 108063079A CN 201711282084 A CN201711282084 A CN 201711282084A CN 108063079 A CN108063079 A CN 108063079A
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- electron beam
- flashing
- beam source
- multiple level
- insulation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J17/00—Gas-filled discharge tubes with solid cathode
- H01J17/02—Details
- H01J17/04—Electrodes; Screens
- H01J17/06—Cathodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J17/00—Gas-filled discharge tubes with solid cathode
- H01J17/02—Details
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Abstract
A kind of counterfeit spark electron beam source of Multiple level that can inhibit flashing, including:The target and intermediate insulation piece being alternately superimposed in sequentially connected blind flange, ceramic separation sleeve and through hole flange, the coreless armature at the symmetrically placed both ends inside ceramic separation sleeve and its insulation sleeve, ceramic separation sleeve, wherein:Positioned at the coreless armature and its insulation sleeve at both ends and positioned at intermediate discharging chamber is formed for Electron Beam Focusing and the target accelerated.The present invention obtains the counterfeit spark electron beam source of multistage that can effectively inhibit flashing, so as to obtain the electron beam of high-energy.The counterfeit spark electron beam source of multistage of the present invention is by using protection metal pole piece edge, cut-out or hinders effectively to inhibit the paradoxical discharge during Pseudo spark along the formation of face flashing, improves the energy of electron beam, improves the stability and reliability of electric discharge.
Description
Technical field
The present invention relates to a kind of technologies in Pseudo spark field, are specifically a kind of Multiple level that can inhibit flashing
Counterfeit spark electron beam source.
Background technology
Pseudo spark is the gas low pressure discharge positioned at pa type (Paschen) curve left-half.Electric discharge air pressure one
As for tens to hundreds of millitorrs, with the reduction of gas atmosphere, breakdown voltage can quickly rise.
Pseudo spark can generate electron beam there are five the stage since the hollow cathode discharge stage.Pseudo spark produces
Raw pulsed electron beam has the characteristics such as beam current density height, energy density height, high brightness, self-focusing.Therefore counterfeit spark electron beam
There is good application prospect in material surface modifying, X-ray generation, film preparation, high-frequency microwave generation etc..
Counterfeit spark equipment structure type itself has the performance of discharge breakdown voltage and the pulsed electron beam generated very big
It influences.The counterfeit spark structure of multistage with multilayer target, the line that can greatly improve breakdown voltage and electron beam are close
Degree.However under high voltage, the distortion electric field at metal pole piece edge, isolated insulation piece easily leads to abnormal breakdown along face flashing etc.,
And electron beam can not be generated.
The stability and reliability of counterfeit spark electron beam source, limitation electricity have been seriously affected along the paradoxical discharges phenomenon such as face flashing
Beamlet performance further improves, but also can reduce the service life of counterfeit spark electron beam source, can even cause to put when serious
The damage of electric chamber.
The content of the invention
The present invention proposes a kind of counterfeit spark electricity of Multiple level that can inhibit flashing for deficiencies of the prior art
Beamlet source by being embedded in insulator at metal pole piece edge, inhibits distortion electric field and generates;By setting a pair of of counterbore depth as electricity
The insulating trip of pole thickness half surrounds metal electrode, and metallic cathode-dielectric-vacuum " three phase point " is made to avoid possible distortion
Electric field region;The path of flashing electron cloud movement is cut off simultaneously;Further by the way that insulating trip inner wall bulge-structure is set to hinder inner wall
Movement of the face along face flashing electron cloud.Formation along face flashing is hindered by more than approach, effectively inhibits Pseudo spark process
In paradoxical discharge, improve the energy of electron beam, improve the stability and reliability of electric discharge.
The present invention is achieved by the following technical solutions:
The present invention includes:It is sequentially connected blind flange, ceramic separation sleeve and through hole flange, symmetrically placed in ceramic separation sleeve
The target and intermediate insulation piece being alternately superimposed in the coreless armature and its insulation sleeve at internal both ends, ceramic separation sleeve, wherein:
It is put positioned at the coreless armature and its insulation sleeve at both ends and positioned at intermediate for Electron Beam Focusing and the target accelerated composition
Electric cavity.
It is equipped with to seal between the blind flange and through hole flange and coreless armature and the metal of discharge cavity positioning is close
Seal.
By cathode or anode pole piece edge isolation while the insulation sleeve surrounds coreless armature.
The bottom of the insulation sleeve is equipped with intermediate throughholes as discharging gap, and insulation sleeve is towards the one side of target
Equipped with coaxial counterbore.
The counterbore depth dimensions is the half of thickness of electrode, and with negative common difference.
The both sides of the intermediate insulation piece are equipped with symmetrical counterbore, are relatively fixed metal pole piece two-by-two, protect pole piece
Non-discharge area.
The intermediate insulation piece is equipped with intermediate throughholes, and both ends are equipped with symmetrical coaxial counterbore, and counterbore depth dimensions is electricity
The half of pole thickness, hole depth have negative common difference.
The intermediate throughholes inner wall is equipped with step-like bulge-structure.
The insulation sleeve and intermediate insulation piece is preferably that teflon material is made, and is easily processed into required shape, and has
There is certain deformable amount.
Technique effect
After the present invention uses more than structure, by insulating materials guard electrode edge, inhibit distortion electric field at this and generate, turn
It moves three phase point position and blocks the flashing path of insulating materials outer wall;The step-like structure of inner wall can then hinder inner wall flashing electric
Movement of the sub- cloud to anode, so that being effectively inhibited along paradoxical discharges such as face flashings, electron gun breakdown voltage obtains greatly
Ground improves, and obtains high energy electron beam.Whole system is compact-sized simultaneously, and reliability is high.
Description of the drawings
Fig. 1 is appearance diagram of the present invention;
Fig. 2 is schematic structural view of the invention;
In figure:1 through hole flange, 2 ceramic separation sleeves, 3 cathode insulation sets, 4 metal o-rings, 5 blind flanges, 6 hollow cathodes,
7 targets, 8 intermediate insulation pieces, 9 anodized insulation sets, 10 cathodes or anode electrode film, 11 hollow anodes, 12 intermediate throughholes, 13
Counterbore, 14 protrusions.
Fig. 3 is intermediate insulation chip architecture schematic diagram;
Fig. 4 is cathode or anodized insulation nested structure schematic diagram.
Specific embodiment
Embodiment 1
As shown in Fig. 2, the present embodiment includes:Blind flange 5, ceramic separation sleeve 2 and through hole flange 1 is threadedly coupled successively to form
External support;It is symmetrically placed in the coreless armature 6,11 at both ends in ceramic separation sleeve 2 and its insulation sleeve 3,9, be alternately arranged in pottery
Target 7 and intermediate insulation piece 8 in porcelain separation sleeve 2 form discharging chamber together.Discharging chamber is existed by metal o-ring 4
Axially position is carried out in external support.
Cathode insulation set 3 as shown in Figure 4 surrounds hollow cathode 6, and mode as shown in Figure 2 is mounted on ceramic sleeve
In 2.The intermediate throughholes 12 that cathode insulation covers 3 bottoms provide discharging gap.Cathode insulation set 3 as shown in Figure 4 has to be led to centre
The coaxial counterbore 13 in hole 12, counterbore depth are thickness of electrode half, and space is provided for the insertion of target 7.
Intermediate insulation piece 8 as shown in Figure 3 has symmetrical counterbore 13, and counterbore depth is the half of thickness of electrode size,
Target 7 is embedded in pairs.Target 7 and intermediate insulation piece 8 are alternately arranged to form multilevel hierarchy as shown in Figure 2.
As shown in Figure 3,4, since the depth dimensions of counterbore 13 is negative common difference, it is ensured that electrode is reliable with insulator axial direction
Contact.During assembling under the action of sealing force is tightened, insulated part is extruded, and realizes the good isolation of 7 outer rim of target.
As shown in Fig. 2, the counterfeit spark electron beam source of multistage that can effectively inhibit flashing in the present embodiment is pacified by through hole flange 1
In vacuum system.Air pressure in system is dropped to 10-5After torr, flow control valve is used to be passed through argon gas and causes gas in electron gun
Pressure reaches the air pressure range of Pseudo spark.Cathode termination negative high voltage afterwards, anode tap ground connection, voltage are adjusted to certain value, occur
Pulse type pseudo spark gas discharge.In the hollow cathode discharge regime of Pseudo spark, electron beam is produced in 6 intracavitary of hollow cathode
It is raw, target 7 is injected by the through hole on the cathode electrode sheet 10 of 6 bottom of hollow cathode.As Pseudo spark is into one
Step carries out, and ambient gas is further ionized in the multistage space that electronics is formed in target 7 and intermediate insulation piece 8, and by not
It is disconnected to accelerate, focus on.The Intense Pulsed Relativistic Electron Beam of high density, high-energy, high emissivity is finally formed in 11 exit of hollow anode.
Metal electrode (hollow cathode 6, cathode electrode sheet 10 and the centre electricity of on-load voltage in counterfeit spark gas discharge device
Pole 7) edge is also easy to produce distortion electric field due to geometric effect.Curved electric field line at electrode edge causes local field strength reduction,
The increase of electron mean free path is resulted in, electronics is easier to obtain enough energy, and ionization by collision ambient gas causes abnormal put
Electricity.
When cathode loads negative high voltage, positioned at the three phase point position of metallic cathode-insulator-vacuum of cathode electrode sheet 10
It puts, field strength is high and easily generates electronics.Electronics can hit dielectric surface when being moved along insulator surface and generate two
Hereafter secondary electronics further generates electronics three times, and then form electron cloud and Ghandler motion moves on the sunny side.The shock of electronics can also cause original
First the gas molecule by dielectric absorption is precipitated, and the positive charge meeting ionized gaseous molecules of accumulation, the electronics of formation is with snowslide
Electron cloud shifts to anode.Further accumulation strengthens local field strength to positive charge near cathode, accelerates secondary electron
Generate and the ionization of desorbed gases, it is final generate insulator along face flashing
Cathode insulation covers the protection of 3 pairs of hollow cathodes 6 and cathode electrode sheet 10, greatly inhibits flashing phenomenon.Such as
Hollow cathode 6 and cathode electrode sheet 10 shown in Fig. 2 to before occurring counterfeit spark-over, carry very high negative electricity from on-load voltage
Pressure.To avoid the edge of hollow cathode 6 and cathode electrode sheet 10 in hypobaric discharge environment, bending electric field line is formed
And increasing the probability of paradoxical discharge, cathode insulation shown in Fig. 4 covers 3 by 10 surrounded by edges of hollow cathode 6 and cathode electricity grade piece.It is cloudy
The intermediate throughholes 12 of 3 bottom of pole insulation sleeve provide discharge air-gap.I.e. in addition to necessary machining area, electrode rest part all by every
From.By 10 surrounded by edges of 6 bottom of hollow cathode and cathode electrode sheet, while block and come from cathode electrode sheet-vacuum-insulator
Developing along face flashing for electronics is generated at three phase point.After the program, cathode terminal flashing is inhibited well.With no cathode
The Pseudo spark device of insulation sleeve protection hollow cathode is compared, and the flashing of insulating trip is damaged and no longer occurred close at cathode.
Isolation of the intermediate insulation piece 8 to 7 edge of target reduces paradoxical discharge, improves discharge stability.Counterfeit spark
After the hollow cathode discharge regime of electric discharge occurs, gas breakdown can occur in intergrade order.Among the insertion of 7 edge of target
In the counterbore 13 of insulating trip 8, inhibit the appearance of electrode edge bending electric field line.Intermediate insulation piece 8 is opposite two-by-two, by target
7 surround, and the three phase point of original electrode rim is transferred, and the electron cloud motion path that anode is tangentially shifted to along electrode outer wall is cut
It is disconnected, so as to avoid paradoxical discharge.Compared with the directly alternately stacked multi-level scheme of insulating trip, target, insulating materials is wanted
Decline is asked, uses the requirement that dielectric coefficient is relatively low, lower melting-point Teflon can meet insulation;Paradoxical discharge is inhibited,
Multiple discharge under same air pressure, the mean square deviation of breakdown voltage reduce.
The bulge-structure 14 of cathode insulation set 3 and 8 intermediate throughholes of intermediate insulation piece, 12 inner wall further inhibits inner wall and dodges
Arc improves breakdown voltage.When discharge voltage reaches certain value, dielectric inner wall can be into along face flashing in discharging gap
To restrict the factor that breakdown voltage improves, the raising of beam energy is limited.For this purpose, coreless armature isolation as shown in Figure 4
12 inner wall of intermediate throughholes of insulation sleeve 3 and intermediate insulation piece 8 as shown in Figure 3 is respectively provided with step-like annular protrusion 14.The protrusion
Presence, can hinder originating from shifting of the electron cloud generated at insulator endoporus-metal electrode-vacuum three phase point to anode
It is dynamic, the distance of " climbing arc " is added, inhibits discharging along face flashing for inner wall.Using the program, can by the barotolerance of system into
The raising of one step.
Scheme more than, the high pressure resistant value of device are increased to more than 20kV by 5kV or so, and the stability of device also obtains
Very big raising is arrived.By breakdown voltage for exemplified by 7kV, the program is not used, the mean square deviation of 10 discharge breakdown voltages is
30.3%, after the program, mean square deviation is reduced to 4.93%, and the stability of electric discharge improves.
Above-mentioned specific implementation can by those skilled in the art on the premise of without departing substantially from the principle of the invention and objective with difference
Mode carry out local directed complete set to it, protection scope of the present invention is subject to claims and not by above-mentioned specific implementation institute
Limit, each implementation within its scope is by the constraint of the present invention.
Claims (8)
1. a kind of counterfeit spark electron beam source of Multiple level that can inhibit flashing, which is characterized in that including:Sequentially connected blind
Blue, ceramic separation sleeve and through hole flange, the symmetrically placed coreless armature at both ends and its insulation sleeve, ceramics inside ceramic separation sleeve
The target and intermediate insulation piece being alternately superimposed in separation sleeve, wherein:Positioned at the coreless armature and its insulation sleeve at both ends and position
Discharging chamber is formed for Electron Beam Focusing and the target accelerated in intermediate, insulation sleeve will while surrounding coreless armature
Cathode or anode pole piece edge isolation.
2. the Multiple level counterfeit spark electron beam source according to claim 1 that flashing can be inhibited, it is characterized in that, described is blind
The metal o-ring for sealing and discharge cavity positions is equipped between flange and through hole flange and coreless armature.
3. the Multiple level counterfeit spark electron beam source according to claim 1 that flashing can be inhibited, it is characterized in that, described is exhausted
The bottom of edge set is equipped with the intermediate throughholes as discharging gap, and insulation sleeve is equipped with coaxial counterbore towards the one side of target.
4. the Multiple level counterfeit spark electron beam source according to claim 3 that flashing can be inhibited, it is characterized in that, described is heavy
Hole depth size is the half of thickness of electrode, and with negative common difference.
5. the Multiple level counterfeit spark electron beam source according to claim 1 that flashing can be inhibited, it is characterized in that, in described
Between insulating trip both sides be equipped with symmetrical counterbore, be relatively fixed metal pole piece two-by-two, protect the non-discharge area of pole piece.
6. the counterfeit spark electron beam source of the Multiple level that flashing can be inhibited according to claim 1 or 5, it is characterized in that, it is described
Intermediate insulation piece be equipped with intermediate throughholes, both ends are equipped with symmetrical coaxial counterbore, and counterbore depth dimensions is the half of thickness of electrode,
Hole depth has negative common difference.
7. the Multiple level counterfeit spark electron beam source according to claim 6 that flashing can be inhibited, it is characterized in that, in described
Between the intermediate throughholes inner wall of insulating trip and insulation sleeve be equipped with step-like bulge-structure.
8. the Multiple level counterfeit spark electron beam source according to claim 1 that flashing can be inhibited, it is characterized in that, described is exhausted
Edge covers and intermediate insulation piece is made of teflon material.
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CN201711282084.2A CN108063079B (en) | 2017-12-07 | 2017-12-07 | It is able to suppress the counterfeit spark electron beam source of Multiple level of flashing |
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CN201711282084.2A CN108063079B (en) | 2017-12-07 | 2017-12-07 | It is able to suppress the counterfeit spark electron beam source of Multiple level of flashing |
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CN108063079A true CN108063079A (en) | 2018-05-22 |
CN108063079B CN108063079B (en) | 2019-09-24 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111564353A (en) * | 2020-04-10 | 2020-08-21 | 西安电子科技大学 | High-energy electron beam source control system, method and device and part manufacturing method |
CN113433582A (en) * | 2021-05-13 | 2021-09-24 | 上海交通大学 | X-ray bulb tube beam diagnosis method |
-
2017
- 2017-12-07 CN CN201711282084.2A patent/CN108063079B/en active Active
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111564353A (en) * | 2020-04-10 | 2020-08-21 | 西安电子科技大学 | High-energy electron beam source control system, method and device and part manufacturing method |
CN113433582A (en) * | 2021-05-13 | 2021-09-24 | 上海交通大学 | X-ray bulb tube beam diagnosis method |
CN113433582B (en) * | 2021-05-13 | 2022-08-23 | 上海交通大学 | X-ray bulb tube beam diagnosis method |
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