CN108020875A - Resistance to compression reflective membrane resistant to lodging and preparation method thereof - Google Patents
Resistance to compression reflective membrane resistant to lodging and preparation method thereof Download PDFInfo
- Publication number
- CN108020875A CN108020875A CN201711455255.7A CN201711455255A CN108020875A CN 108020875 A CN108020875 A CN 108020875A CN 201711455255 A CN201711455255 A CN 201711455255A CN 108020875 A CN108020875 A CN 108020875A
- Authority
- CN
- China
- Prior art keywords
- resistance
- reflective membrane
- lodging
- layer
- compression
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012528 membrane Substances 0.000 title claims abstract description 39
- 230000006835 compression Effects 0.000 title claims abstract description 25
- 238000007906 compression Methods 0.000 title claims abstract description 25
- 238000002360 preparation method Methods 0.000 title claims abstract description 8
- 239000010410 layer Substances 0.000 claims abstract description 66
- 239000000758 substrate Substances 0.000 claims abstract description 15
- 239000012790 adhesive layer Substances 0.000 claims abstract description 12
- 239000004925 Acrylic resin Substances 0.000 claims description 15
- 229920000178 Acrylic resin Polymers 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 239000011347 resin Substances 0.000 claims description 6
- 229920005989 resin Polymers 0.000 claims description 6
- 238000007747 plating Methods 0.000 claims description 5
- -1 polyethylene Polymers 0.000 claims description 5
- 239000004814 polyurethane Substances 0.000 claims description 5
- 229920002635 polyurethane Polymers 0.000 claims description 5
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 claims description 4
- 239000000853 adhesive Substances 0.000 claims description 4
- 230000001070 adhesive effect Effects 0.000 claims description 4
- 238000001704 evaporation Methods 0.000 claims description 4
- 230000008020 evaporation Effects 0.000 claims description 4
- 238000005507 spraying Methods 0.000 claims description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 3
- 239000004593 Epoxy Substances 0.000 claims description 3
- 239000004952 Polyamide Substances 0.000 claims description 3
- 239000004698 Polyethylene Substances 0.000 claims description 3
- 239000004793 Polystyrene Substances 0.000 claims description 3
- 239000002253 acid Substances 0.000 claims description 3
- 239000004411 aluminium Substances 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- 229920002647 polyamide Polymers 0.000 claims description 3
- 229920000728 polyester Polymers 0.000 claims description 3
- 229920000573 polyethylene Polymers 0.000 claims description 3
- 229920002223 polystyrene Polymers 0.000 claims description 3
- 229920002689 polyvinyl acetate Polymers 0.000 claims description 3
- 239000011118 polyvinyl acetate Substances 0.000 claims description 3
- 150000001336 alkenes Chemical class 0.000 claims description 2
- 150000002148 esters Chemical class 0.000 claims description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims description 2
- 238000003466 welding Methods 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 4
- 239000005038 ethylene vinyl acetate Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000003475 lamination Methods 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 150000001398 aluminium Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- ONIHPYYWNBVMID-UHFFFAOYSA-N diethyl benzene-1,4-dicarboxylate Chemical group CCOC(=O)C1=CC=C(C(=O)OCC)C=C1 ONIHPYYWNBVMID-UHFFFAOYSA-N 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000011514 reflex Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/12—Reflex reflectors
- G02B5/126—Reflex reflectors including curved refracting surface
Abstract
The present invention relates to reflective technical field of membrane, more particularly to a kind of resistance to compression reflective membrane resistant to lodging and preparation method thereof, reflector layer, microstructured layers, substrate layer and the adhesive layer set including layer successively, microstructured layers are formed by multiple waveform prisms in heaving of the sea shape are arranged in parallel.For the resistance to compression reflective membrane resistant to lodging of the present invention while solar energy utilization ratio is improved, resistance to compression, lodging tolerance are strong.
Description
Technical field
The present invention relates to reflective technical field of membrane, and in particular to a kind of resistance to compression reflective membrane resistant to lodging and preparation method thereof.
Background technology
Currently used photovoltaic module needs that cell piece is together in series using welding, forms one completely electrically
Path, luminous energy are converted into electric energy by cell piece, and all cell pieces are formed there through transmission circuit by welding.
Welding surface is smooth tinning layer, and sunlight to welding surface can not continue to utilize after total reflection,
Cause the reduction of sun light utilization efficiency.Its area coverage accounts for 3%~4% or so of whole cell area, whole equivalent to have lost
3%~4% output power of a Solar use.
At present, it is that ordinary resin is made or structure is conventional structure that in the market reflective membrane is most of, and there are following two for it
Defect:
First, in component production technology, reflective membrane must bear the pressure of about 0.1Mpa, ordinary resin resistance to pressure in lamination process
Difference, lacks recovery capacity, easy deformation and lodging;2nd, conventional reflective membrane structure, its compressive property is poor, and it is existing lodging easily occur
As.
The content of the invention
The object of the present invention is to provide a kind of resistance to compression reflective membrane resistant to lodging and preparation method thereof, is improving solar energy utilization ratio
While, resistance to compression, lodging tolerance are strong.
To achieve the above object, the technical solution adopted in the present invention is:A kind of resistance to compression reflective membrane resistant to lodging, including successively
Reflector layer, microstructured layers, substrate layer and the adhesive layer that layer is set, microstructured layers are put down by multiple waveform prisms in heaving of the sea shape
Row rearranges.
Preferably, the cross section of the waveform prism is triangular in shape, and the apex angle of triangle is for arc chord angle or by straight line
Or wave cut-out.
Preferably, when the apex angle of the triangle is arc chord angle, the radius of arc chord angle is R, 0.5 5 μm of < R <;Triangle
Apex angle when being cut off by straight line or wave, section width is L, 0.5 5 μm of < L <.
Preferably, the waveform prism rises and falls according to sine wave or cosine wave curve shape, and fluctuating cycle T is 20-
5000 μm, amplitude A is 0.5-5 μm.
Preferably, the cross section of the prism is in isosceles triangle, and the corner angle of the isosceles triangle is 100-
130 °, a length of 10-200 μm of base.
Preferably, the microstructured layers are formed by curing by acrylic resin or ultraviolet cured adhesive UV.
Preferably, the acrylic resin is selected from epoxy acrylic resin, polyurethane acrylic resin, polyester acrylic tree
One kind in fat, polyoxyalkylene acrylate resin.
Preferably, UV the light waves a length of 10-400nm, energy 200-600mj/cm of microstructured layers are cured for UV2。
Preferably, the reflector layer is aluminium coated or silver coating, and the material of substrate layer is selected from poly terephthalic acid diethyl two
One kind in alcohol ester, polyamide, polystyrene, polyethylene, adhesive layer for polyurethane tack coat, acrylate tack coat or
Polyvinyl acetate tack coat.
A kind of preparation method of resistance to compression reflective membrane resistant to lodging, comprises the following steps:
(I) ultraprecise coating machine is used, the material for making microstructured layers is coated with die surface, is cured by UV by micro-structure
Layer is transferred on substrate layer;
(II) reflector layer is prepared on microstructured layers by the method for evaporation or spraying plating under vacuum condition;
(III) adhesive layer is made by the method for being coated with or being bonded in the bottom of substrate layer.
After adopting the above technical scheme, the present invention has the positive effect that:
(1) by the way that microstructured layers to be designed to the form of waviness prism, and the apex angle of triangular prism is arc chord angle
Or cut off by straight line or waveform, enhance the resistance to compression lodging tolerance of whole reflective membrane;
(2) reflective membrane for preparing of the present invention makes in use, the light source of different direction of illuminations can reflex to cell piece around
General components can be applicable in the area of different direction of illuminations, there is 2.0-2.5% power gains on more conventional component, it is possible to reduce anti-
The light outside photovoltaic glass is penetrated, adds reflective surface area, improves the solar energy utilization ratio under different solar incident angle degree.
Brief description of the drawings
Fig. 1 is resistance to compression reflective membrane structure chart resistant to lodging in embodiment 1;
Fig. 2 is a kind of schematic cross-section of resistance to compression reflective membrane resistant to lodging in embodiment 1;
Fig. 3 is resistance to compression reflective membrane another kind schematic cross-section resistant to lodging in embodiment 1.
Wherein:1st, reflector layer, 2, microstructured layers, 3, substrate layer, 4, adhesive layer.
Embodiment
The present invention is described in further detail with reference to the accompanying drawings and detailed description.
In the present invention, unless otherwise clearly defined and limited, term " installation ", " connected ", " connection ", " fixation " etc.
Term should broadly understood, for example, it may be fixedly connected or be detachably connected, or integrally;Can be that machinery connects
Connect or be electrically connected;It can be directly connected, can also be indirectly connected by intermediary, can be in two elements
The connection in portion or the interaction relationship of two elements.For the ordinary skill in the art, can be according to specific feelings
Condition understands the concrete meaning of above-mentioned term in the present invention.
Embodiment 1
1. as shown in Figs. 1-3, it is the resistance to compression reflective membrane resistant to lodging of the present embodiment, including layer is set successively reflector layer 1, micro- knot
Structure layer 2, substrate layer 3 and adhesive layer 4.
Microstructured layers 2 are formed by multiple waveform prisms in heaving of the sea shape are arranged in parallel.The extending direction of triangular prism
Extending direction angle with substrate layer 1 is α, and 90 ° of 0≤α <, and in the present embodiment, α is 0 °.The horizontal stroke of the waveform prism
Section is in isosceles triangle, and the corner angle of the isosceles triangle is 100-130 °, preferably 120 °, a length of 10- in base
200μm.The apex angle of isosceles triangle can be wedge angle, can also be arc chord angle (as shown in Figure 2), and the radius of arc chord angle is R,
0.5 5 μm of < R <.The apex angle of isosceles triangle can also be L by straight line or wave cut-out (as shown in Figure 3), section width, 0.5
5 μm of < L <.Waveform prism rises and falls according to sine wave or cosine wave curve shape, and fluctuating cycle T is 20-5000 μm, amplitude A
For 0.5-5 μm.
Reflector layer 1 is aluminium coated or silver coating, is obtained by the methods of chemical plating, evaporation, spraying plating.Microstructured layers 2 are by third
Olefin(e) acid resin or ultraviolet cured adhesive UV are formed by curing.The acrylic resin is selected from epoxy acrylic resin, polyurethane propylene
One kind in acid resin, polyester acrylate resin, polyoxyalkylene acrylate resin.The UV light waves for curing microstructured layers 2 for UV are a length of
10-400nm, energy 200-600mj/cm2, it is preferably 300~400mj/cm2.3 material of substrate layer is selected from poly terephthalic acid
One kind in binaryglycol ester, polyamide, polystyrene, polyethylene.The thickness of adhesive layer 4 is 15-50 μm, it is poly- ammonia
Ester tack coat, acrylate tack coat or polyvinyl acetate tack coat.
2. the preparation method of above-mentioned reflective membrane is as follows:
(I) made first by ultraprecise engraving machine with the corresponding ultraprecise mould of microstructured layers, material used in mould
For copper or Ni-based material.With ultraprecise coating machine, in die surface acrylic resins of painting or ultraviolet cured adhesive, cured by UV
Method, microstructured layers 2 are transferred on substrate layer 3, curing obtain microstructured layers 2;
(II) mirror surface i.e. reflector layer is prepared on microstructured layers 2 by the method for evaporation or spraying plating in vacuum environment
1;
(III) adhesive layer 4 is made by the method for being coated with or being bonded in the bottom of substrate layer 3;
(IV) reflective membrane is wound into by spool by winder, reflective membrane is cut into 0.5- with cutting machine during use
The strip of 2.5mm wide uses.
3. the application method of above-mentioned reflective membrane is:By automatic gummer, using the residual temperature after series welding series connection battery
The reflective membrane cut on being pasted on the positive welding of piece, reflective membrane width x length size are consistent with welding.Again in reflective membrane
Upper coating ethylene-vinyl acetate copolymer layer, places photovoltaic glass in ethylene-vinyl acetate copolymer layer.In cell piece
Lower section is coated with ethylene-vinyl acetate copolymer layer, is finally compressed on backboard.The material laid is put into laminating machine and carries out height
Warm vacuum lamination, the EVA unnecessary to edge and backboard carry out chamfered edge after lamination, carried out after part cooling to be laminated aluminium frame and
The volume of data such as the installation of wire box, last detection components power.
During sun light projection, incident ray can be reflected on reflective membrane, since the refractive index of photovoltaic glass is more than
Air refraction, reflection light can be totally reflected in photovoltaic glass and Air Interface, total reflection light finally can again into
Enter cell piece so as to increase transfer efficiency.By a large amount of test data comparative analyses, there is 1.8%~2.5% work(on general components
Rate gain.
Comparative example 1
In this comparative example, reflective membrane includes reflector layer 1, microstructured layers 2, substrate layer 3 and the adhesive layer 4 that layer is set successively.It is micro-
Structure sheaf 2 is formed by contour straight trip triangular prism is arranged in parallel, and the cross section of the triangular prism is in isosceles triangle, the isosceles
The corner angle of triangle is 120 °, a length of 50 μm of base, and microstructured layers 2 are cured by ordinary resin to be formed.
Crush test
Reflective membrane prepared by Example 1 and comparative example 1, carries out pressure test, the results are shown in Table 1 respectively.
1 pressure testing results of table
It will be apparent to those skilled in the art that technical solution that can be as described above and design, make other various
It is corresponding to change and deformation, and all these change and deformation should all belong to application claims protection domain it
It is interior.
Claims (10)
- A kind of 1. resistance to compression reflective membrane resistant to lodging, it is characterised in that:Reflector layer (1), microstructured layers (2), the base set including layer successively Material layer (3) and adhesive layer (4), microstructured layers (2) are formed by multiple waveform prisms in heaving of the sea shape are arranged in parallel.
- 2. resistance to compression reflective membrane resistant to lodging according to claim 1, it is characterised in that:The cross section of the waveform prism is in Triangle, and the apex angle of triangle cuts off for arc chord angle or by straight line or wave.
- 3. resistance to compression reflective membrane resistant to lodging according to claim 2, it is characterised in that:When the apex angle of triangle is arc chord angle, The radius of arc chord angle is R, 0.5 5 μm of < R <;When the apex angle of triangle is cut off by straight line or wave, section width is L, 0.5 < L 5 μm of <.
- 4. resistance to compression reflective membrane resistant to lodging according to claim 1, it is characterised in that:Waveform prism is according to sine wave or remaining String curve wire shaped rises and falls, and fluctuating cycle T is 20-5000 μm, and amplitude A is 0.5-5 μm.
- 5. resistance to compression reflective membrane resistant to lodging according to claim 2, it is characterised in that:The cross section of the prism is in isosceles three Angular, the corner angle of the isosceles triangle is 100-130 °, a length of 10-200 μm of base.
- 6. resistance to compression reflective membrane resistant to lodging according to claim 1, it is characterised in that:Microstructured layers (2) are by acrylic resin Or ultraviolet cured adhesive UV is formed by curing.
- 7. resistance to compression reflective membrane resistant to lodging according to claim 6, it is characterised in that:The acrylic resin is selected from epoxy third One kind in olefin(e) acid resin, polyurethane acrylic resin, polyester acrylate resin, polyoxyalkylene acrylate resin.
- 8. resistance to compression reflective membrane resistant to lodging according to claim 6, it is characterised in that:Cure microstructured layers (2) for UV UV light waves a length of 10-400nm, energy 200-600mj/cm2。
- 9. resistance to compression reflective membrane resistant to lodging according to claim 1, it is characterised in that:Reflector layer (1) is aluminium coated or silver-plated Layer, the material of substrate layer (3) in poly terephthalic acid binaryglycol ester, polyamide, polystyrene, polyethylene one Kind, adhesive layer (4) is polyurethane tack coat, acrylate tack coat or polyvinyl acetate tack coat.
- A kind of 10. preparation method of the resistance to compression reflective membrane resistant to lodging described in claim 1, it is characterised in that:Comprise the following steps:(I) ultraprecise coating machine is used, the material for making microstructured layers (2) is coated with die surface, is cured by UV by micro-structure Layer (2) is transferred on substrate layer (3);(II) reflector layer (1) is prepared on microstructured layers (2) by the method for evaporation or spraying plating under vacuum condition;(III) adhesive layer (4) is made by the method for being coated with or being bonded in the bottom of substrate layer (3).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201711455255.7A CN108020875A (en) | 2017-12-28 | 2017-12-28 | Resistance to compression reflective membrane resistant to lodging and preparation method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN201711455255.7A CN108020875A (en) | 2017-12-28 | 2017-12-28 | Resistance to compression reflective membrane resistant to lodging and preparation method thereof |
Publications (1)
Publication Number | Publication Date |
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CN108020875A true CN108020875A (en) | 2018-05-11 |
Family
ID=62072088
Family Applications (1)
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CN201711455255.7A Pending CN108020875A (en) | 2017-12-28 | 2017-12-28 | Resistance to compression reflective membrane resistant to lodging and preparation method thereof |
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CN (1) | CN108020875A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN110571297A (en) * | 2019-09-26 | 2019-12-13 | 常州斯威克新材料科技有限公司 | Grid high-viscosity photovoltaic light-reflecting adhesive film and manufacturing method thereof |
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CN105359281A (en) * | 2013-07-09 | 2016-02-24 | 3M创新有限公司 | Reflecting films with rounded microstructures for use in solar modules |
CN106772726A (en) * | 2016-12-29 | 2017-05-31 | 中山市光大光学仪器有限公司 | Layers of prisms |
CN208569084U (en) * | 2017-12-28 | 2019-03-01 | 常州华威新材料有限公司 | Resistance to compression reflective membrane resistant to lodging |
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