CN108017043B

CN108017043B - Impurities removing unit and recyclegas with the impurities removing unit recycle refining system

Info

Publication number: CN108017043B
Application number: CN201711036677.0A
Authority: CN
Inventors: 筿原悠介; 小浦辉政; 野泽史和
Original assignee: LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Current assignee: LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Priority date: 2016-11-04
Filing date: 2017-10-30
Publication date: 2019-03-08
Anticipated expiration: 2037-10-30
Also published as: JP6224859B1; TWI680009B; JP2018079461A; KR20180050212A; CN108017043A; TW201817490A

Abstract

The subject of the invention is to provide a kind of impurities removing units, whether it can be controlled the presence or absence of removing processing based on the impurity concentration in exhaust and outwardly deflated when the exhaust containing the 1st rare gas and neon being discharged by excimer laser apparatus is sent to the process of back segment.For this purpose, improving a kind of impurities removing unit, impurity concentration test section, the impurity concentration in the exhaust for the discharge pipe that measurement exhaust flows through are included；Impurity in exhaust is become other substance by plasma decomposition based on the measurement result of impurity concentration test section by transition；And removing unit, make the substance become by transition and defined reaction reaction, it is removed from exhaust.The discharge line that impurities removing unit can also have measurement result based on impurity concentration test section, outwardly discharge exhaust.

Description

Impurities removing unit and recyclegas with the impurities removing unit recycle purification System

Technical field

The present invention relates to can be from for example having used the excimer laser of the mixed gas containing rare gas and neon to fill Set the impurities removing unit that impurity is removed in exhaust be discharged and the recyclegas recycling purification with the impurities removing unit System.

Background technique

One as the method for removing fluorine compounds from the recycling process for the gas that excimer laser oscillator is discharged A example has patent document 1.

In addition, as the CF made in exhaust₄The method of decomposition, patent document 2 discloses the method using voltolising, non- Patent document 1 discloses the method for corona discharge.

Existing technical literature

Patent document

Patent document 1: Japanese Unexamined Patent Publication 2010-92920 bulletin

Patent document 2: Japanese Unexamined Patent Publication 2006-110461 bulletin

Non-patent literature

Non-patent literature 1:T.IEEE Japan, Vol.117-A, No.10 (1997) " U ロ Na electric discharge To I Ru エキシガス shape impurity is removed and (is removed the gas shape impurity in quasi-molecule gas using corona discharge) in マガス "

Summary of the invention

Subject to be solved by the invention

Have in the impurities removing unit of patent document 1 and contains CF using removings such as zeolites₄Impurity process, but exist Contain high concentration CF importing₄Exhaust when CF₄Clean problem cannot be decomposed.Therefore, if by being produced in excimer laser apparatus Raw CF₄Recycling refining step is repeated, then CF₄Concentration rises at leisure, this becomes laser pulse in excimer laser apparatus What output a problem that capable of reducing occurred will be because.Additionally, there are CF₄New impurity as oxygen is led to the problem of when decomposition.

The CF of patent document 2 decomposed by voltolising in exhaust₄Method, although being capable of resolution process higher concentration CF₄, but deposit and remain a certain amount of CF after disassembly₄The problem of.

The CF of non-patent literature 1 decomposed by corona discharge in exhaust₄Method, there are electrode be easy fluorination deterioration Problem.

The present invention is completed in view of above-mentioned status, and it is an object of the present invention to provide a kind of impurities removing unit, will be by for example quasi- It, can be based in exhaust when the exhaust containing the 1st rare gas and neon of molecular laser device discharge is sent to the process of back segment Impurity (for example, CF₄、N₂, He etc.) concentration control the presence or absence of removing processing and whether outwardly deflate.

Furthermore, and it is an object of the present invention to provide a kind of recyclegas recycles refining system, with above-mentioned impurities removing unit, energy Enough for example, removing impurity from exhaust and staying necessary rare gas, by recyclegas (for example, rare gas and neon Gas) supply manufacture system.

The means to solve the problem

Impurities removing unit of the invention, for it is being discharged from excimer laser apparatus, at least contain neon and the 1st rare Impurity is removed in the exhaust of gas,

It includes

Impurity concentration test section measures the dense of the impurity in the exhaust of the discharge pipe for being vented and flowing through Degree,

Transition is passed through the impurity in the exhaust based on the measurement result of the impurity concentration test section Plasma decomposes and becomes other substance,

Removing unit makes the substance become by the transition and defined reaction reaction, from the exhaust It removes.

Above-mentioned impurities removing unit can also have discharge line and/or by-pass line, and the discharge line is based on described The measurement result of impurity concentration test section outwardly discharges the exhaust, and the by-pass line is examined based on the impurity concentration The exhaust is sent to the recyclegas recycling purification system being connected to the back segment of impurities removing unit by the measurement result in survey portion System.

Above-mentioned impurities removing unit can also have processing selector, the measurement knot based on the impurity concentration test section Fruit from the 1st processing outwardly deflated, implements to remove the 2nd processing of processing and be sent to remove with impurity by the exhaust to fill Any processing is selected in 3rd processing of the recyclegas recycling refining system that the back segment set is connected to.

In the processing selector the described 1st processing of selection, the exhaust is outwardly discharged by the discharge line,

In the processing selector the described 2nd processing of selection, by the way that the transformation removed in processing pipeline is arranged in Portion and the removing unit remove impurity from the exhaust, and the removing processing pipeline is used to for the exhaust being sent to and impurity The recyclegas that the back segment of removing device is connected to recycles refining system,

The processing selector selection the described 3rd processing when, by the by-pass line by it is described exhaust be sent to it is miscellaneous The recyclegas that the back segment of matter removing device is connected to recycles refining system.

Above-mentioned impurities removing unit can have control valve opening and closing valve control unit, the valve control unit can control valve at: The exhaust is discharged to the discharge line when selecting the described 1st processing, removes place to go to described when selecting the described 2nd processing It manages pipeline and conveys the exhaust, convey the exhaust to the by-pass line when selecting the described 3rd processing.

In foregoing invention, impurity concentration test section can be only fitted in the piping of discharge pipe, can be only fitted to can be into The position of row concentration mensuration also can be only fitted on the surge tank being arranged on discharge pipe.

In foregoing invention, discharge line can have for example, being piped, the tapping equipment, automatic shutter of outwardly deflation Valve etc..

In foregoing invention, the preferred voltolising device of transition.

In foregoing invention, defined reactant be such as metal system reactant or gas absorption be reactant.As gold Category system reactant, can enumerate the reactant of such as Ag system, Cu system.It is reactant, example can be enumerated as gas absorption Such as sour gas absorbing reaction agent, can enumerate for example, using the oxygenate using soda lime as representative as reactant.

It is can have in foregoing invention, in removing processing pipeline for example, being piped, automatic on/off valve, voltolising device, taking off Mechanism of qi structure (removing device) etc..

In foregoing invention, by-pass line can have piping and automatic on/off valve.

In foregoing invention, recyclegas be for example, principal component be neon and containing the 1st rare gas (for example, Ar, Kr principal component) is the gas etc. of neon.

With this solution, the impurity from the exhaust that excimer laser apparatus is sent out can be measured (for example, CF₄) concentration, And 3 kinds of processing are correspondingly selectively carried out to exhaust according to measurement result.The implementation of the present invention property of can choose outwardly is put 1st processing of gas, implementation impurity remove the 2nd processing of processing and are sent to exhaust and be connected to the back segment of impurities removing unit Recyclegas recycling refining system the 3rd processing.For example, can impurity concentration be above normal concentration range (such as 10ppm~120ppm) high concentration when to outwardly release exhaust, impurity concentration be normal concentration range (for example, 10ppm ~120ppm) when remove impurity, when impurity concentration is less than normal concentration range (for example, 10ppm~120ppm), will exhaust it is straight Connect the recyclegas recycling refining system for importing back segment.

I.e. it is capable to only convey the row of the impurity containing normal concentration to the recyclegas of back segment recycling refining system Gas, so can effectively make to carry out impurity removing in recyclegas recycling refining system.Furthermore it is possible to which impurity is inhibited to remove dress The early stage property performance degradation phenomena for the impurity removing unit in removing unit or recyclegas recycling refining system set, reduces maintenance Number.

Moreover, leading in the circular treatment for the exhaust being discharged from semiconductor manufacturing apparatus (such as excimer laser apparatus) Setting impurities removing unit and recyclegas recycling refining system are crossed, the recyclegas semiconductor supply of impurity can will be eliminated Manufacturing device (such as excimer laser apparatus).

In foregoing invention, can have for measure imported into it is described remove processing pipeline the exhaust flow stream Measure determination part.The institute in the side farther downstream of locating than the impurity concentration test section can be set in the flow measurement portion It states in discharge pipe L2 or described removing processing pipeline.

Can also have replacement period judging part, can measured value based on the flow measurement portion and the impurity it is dense Spend the measured value of test section and calculate the amount of the impurity, find out the removing unit it is described as defined in reactant replacement when Phase.

According to the program, can be obtained according to from the impurity concentration in the extraction flow and exhaust that excimer laser apparatus is discharged To import impurity removing unit in impurity level, so can according to the amount for the defined reactant being filled into the removing unit and Find out corresponding replacement period.In this way, the object that can become in the metal system reactant beyond the removing transition The replacement for implementing metal system reactant before the ability of matter, inhibits without except clean substance remains in the processed gas of recycling The phenomenon that.

In foregoing invention, the valve can be by the valve control unit control automatic on/off valve.It, can be with as the valve It is for example, cubic valve, cubic switching valve.The valve can be respectively in the discharge line, the removing processing pipeline and institute State the switching valve being arranged on by-pass line.

It with this solution, can be according to the control of the valve control unit, by the exhaust being discharged from excimer laser apparatus point It is fitted in discharge line, removing processing pipeline or by-pass line and exports.

In foregoing invention, the impurity contains such as CF₄、N₂、He、CH₄In it is any one or more.1st rare gas and neon Gas is not just impurity as long as no impurity is particularly recorded into.

In foregoing invention, the CF in the exhaust is measured in the impurity concentration test section₄When concentration,

Work as CF₄When concentration is the 1st threshold value or more, processing selector selection the 1st processing,

Work as CF₄When concentration is than being less than the 2nd threshold value of the 1st threshold value greatly and being less than 1 threshold value, the processing choosing Portion's selection the 2nd processing is selected,

Work as CF₄When concentration is less than 2 threshold value, processing selector selection the 3rd processing.

In foregoing invention, " the 1st threshold value " be any number between such as 80ppm~110ppm, preferably 90ppm~ Any number between 100ppm, more preferably 100ppm.

In foregoing invention, " the 2nd threshold value " be any number for example, between 5ppm~15ppm, preferably 8ppm~ Any number between 12ppm, more preferably 10ppm.

In the present invention, other than the case where being explicitly shown is quality or weight, concentration just refers to volumetric concentration.

The principal component of the exhaust is neon, and the 1st rare gas is 1~10%, preferably 1~8% relative to total amount.Make Such as CF can be enumerated for the impurity in exhaust₄、N₂、He、CH₄.CF in exhaust₄Concentration is imagined 1ppm~500ppm's Range.

In CF₄Concentration the 1st processing of processing selector selection when being the 1st threshold value (such as 100ppm) or more.Described 1st Processing is will to be vented to be discharged to outside system by the discharge line.

The CF more than a certain amount of if (such as 100ppm)₄Transition is imported, then the CF contained in exhaust₄A part not Transformation, becomes unable to completely remove CF₄, but such structure is used, by would be possible to CF₄It is preparatory to remove insufficient exhaust It is discharged to outside system, is able to carry out completeness removing.

In addition, if the CF of high concentration₄Impurities removing unit is imported, then the amount for the other substance being discharged from the transition Increase, it is specified that the replacement frequency of reactant (such as metal system reactant, gas absorb be reactant) get higher, can generate and match The problem of saprophage, occurs for pipe, valve etc., therefore, makes the CF of the 1st threshold value of concentration or more₄Impurities removing unit is not imported, to reduce These problems.The value of 1st threshold value can accordingly be set according to the ability of transition.

In CF₄Concentration is bigger than the 2nd threshold value (such as 10ppm) less than the 1st threshold value and when being less than 1 threshold value, choosing Select the 2nd processing.Exhaust is oriented to the transition by the removing processing pipeline by the 2nd processing.The CF in transition₄It is logical Plasma is crossed to decompose and be changed into other substance (F₂, other fluorine compounds), other substance can by with regulation Reactant (such as metal system reactant, gas absorption be reactant) react and be removed.

In CF₄The 3rd processing is selected when concentration is less than 2 threshold value, the transition is skipped in the 3rd processing, and exhaust is straight Connect the recyclegas recycling refining system for importing and being connected to the back segment of the impurities removing unit.This is because, if CF₄'s Concentration then can recycle purification system by the way that the recyclegas of the impurities removing unit back segment is arranged in less than the 2nd threshold value Impurity removing unit in system removes CF₄Reason.

As CF₄Plasma decomposition, preferably voltolising.In addition, by as CF₄Isolation is using noiseless Electric discharge compared with the corona discharge of fluorination deterioration for having electrode there is maintenance to be easy, being capable of constantly steady running for a long time Advantage.

The substance generated, the removing method of such as fluorine system impurity are decomposed as by plasma, is used in the present invention Defined reactant (such as the absorption of metal system reactant, gas is reactant).It is reactant phase with gas absorption in the present invention Than, more preferable metal system reactant.When using gas absorption is reactant, it is possible to anti-between fluorine system impurity by it It answers and generates oxygen (or oxide), in such a situation it is preferred to be arranged in recyclegas recycling refining system for removing The removing unit (deoxidation removing device) of oxygen (or oxide).Contain a large amount of oxygen usually as the impurity in exhaust, so oxygen Removing unit is usually just to be provided with, so the case where thus resetting is seldom.

The impurity concentration test section is measuring the CF in the exhaust₄、N₂When with the concentration of He,

(a) processing selector selection the 1st processing when He concentration is the 3rd threshold value or more.

(b) in CF₄Or N₂Any one of for the 1st threshold value it is (such as any number between 80ppm~110ppm, excellent Select 90ppm~100ppm) more than when select it is described 1st processing.

(c) in He concentration less than the 3rd threshold value, CF₄Or N₂Any one of for the 2nd threshold value (for example, 5ppm~15ppm Between any number, preferably 8ppm~12ppm) more than and less than the 1st threshold value, and the size relation of concentration meets N₂ > (1/2) × CF₄When, processing selector selection the 1st processing.

(d) in He concentration less than the 3rd threshold value, N₂Or CF₄Concentration be the 2nd threshold value more than and less than the 1st threshold Value, and the size relation of concentration meets N₂< (1/2) × CF₄When, processing selector selection the 2nd processing.

(e) in He concentration less than the 3rd threshold value, N₂Or CF₄Concentration be less than 2 threshold value when, can control the processing Selector selection the 3rd processing.

In foregoing invention, " the 3rd threshold value " be arbitrary value between such as 0.5%~1.5%, preferably 0.8%~1.2% Between arbitrary value, more preferably 1.0%.

As the impurity in the exhaust, CF can be measured₄、N₂With the concentration of He.CF in the exhaust₄And N₂Concentration Range, He concentration of the imagination in 1ppm~500ppm imagine the range 0.01~5.0%.

In CF₄Or N₂When concentration is such as 100ppm or more or He concentration is such as 1% or more, laser intensity dies down, institute In CF₄Or N₂When concentration is the 1st threshold value (such as 100ppm) or more or when He concentration is the 3rd threshold value (such as 1%) or more, institute The 1st processing of processing selector selection is stated, exhaust is discharged to outside system by the 1st processing by the discharge line.

Even in He concentration less than the 3rd threshold value, CF₄And N₂Concentration be than less than the 1st threshold value the 2nd threshold value (such as It is 10ppm) big and when being less than 1 threshold value, work as N₂Concentration is CF₄When the 2 times or more of concentration, the plasma of the transition The ionic weight that body generates during discharging, Nitrogen ion amount become advantageous relative to carbon ion amount.In such case, at described turn The Nitrogen ion transited out of in change portion more preferably reacts with the oxygen or oxonium ion contained in exhaust than carbon ion, and generates nitrogen Oxide.Therefore, in N₂Concentration is CF₄When the 2 times or more of concentration, the 1st processing of processing selector selection, the 1st processing Exhaust is discharged to outside system by the discharge line.

On the other hand, in He concentration less than the 3rd threshold value, CF₄And N₂Concentration be the 2nd threshold value more than and less than the 1st threshold value, simultaneously And N₂Concentration is less than CF₄At 2 times of concentration, it can be changed by plasma discharge.As passing through nitrogen obtained by the transformation Oxide yield is also few, so exhaust is oriented to institute by the removing processing pipeline by selection the 2nd processing, the 2nd processing State transition.

In He concentration less than the 3rd threshold value, CF₄And N₂The 3rd processing is selected when concentration is less than 2 threshold value, the 3rd processing makes The transition is skipped in exhaust, and exhaust is importing directly into the recyclegas being connected to the back segment of the impurities removing unit and is returned Receive refining system.This is because, if CF₄、N₂Concentration less than the 2nd threshold value, then can by setting the impurity remove fill Impurity removing unit in the recyclegas recycling refining system for the back segment set removes CF₄、N₂Reason.

Be set to the back segment of above-mentioned impurities removing unit recyclegas recycling refining system, from be discharged by manufacture system, And recycling refines recyclegas in the exhaust sent out by above-mentioned impurities removing unit.The manufacture system includes will at least The supply pipeline that mixing rare gas containing neon and the 1st rare gas is supplied with the 1st pressure, it is rare using the mixing The excimer laser apparatus of gas, and the discharge pipe discharged being at least discharged from the excimer laser apparatus.

As excimer laser apparatus, can enumerate for example ArF excimer laser apparatus, KrF excimer laser apparatus, XeF excimer laser apparatus.Transition and removing unit in impurities removing unit are correspondingly set according to excimer laser apparatus Pattern and its performance, and then set recyclegas recycling refining system in impurity removing unit pattern and its performance.

The recyclegas of 1st invention recycles refining system, for the recycling purification circulation from the exhaust that manufacture system is discharged Gas (such as the 1st rare gas and neon), the manufacture system includes will be at least mixed containing neon and the 1st rare gas The supply pipeline that rare gas is supplied with the 1st pressure is closed, using the excimer laser apparatus of the mixing rare gas, and extremely The discharge pipe discharged that major general is discharged from the excimer laser apparatus,

The recyclegas recycling refining system at least includes the 1st impurity removing that the 1st impurity is removed from the exhaust Portion, and exhaust that exhaust path downstream side configures, after removing the 1st impurity is more leaned on than the 1st impurity removing unit Middle the 2nd impurity removing unit for removing the 2nd impurity.

The discharge pipe is also possible to will be at least by the exhaust of excimer laser apparatus discharge with more than atmospheric pressure and institute The discharge pipe that the 1st pressure the 2nd pressure venting below is gone is stated,

Above-mentioned recyclegas recycling refining system has above-mentioned impurities removing unit, and the impurities removing unit can have 1 in multiple components or 2 or more below:

For measuring the impurity of the concentration of the impurity in the exhaust for being vented the discharge pipe flowed through Concentration,

Based on the measurement result of the impurity concentration test section, from the 1st processing outwardly deflated, implement to remove processing 2nd handles and described be vented is sent to the 3rd of the recyclegas recycling refining system being connected to the back segment of impurities removing unit The processing selector of any processing is selected in processing,

In the processing selector the described 1st processing of selection, the discharge line of the exhaust is outwardly discharged,

In the processing selector the described 2nd processing of selection, impurity is removed from the exhaust, and the exhaust is sent The removing processing pipeline for the recyclegas recycling refining system being connected to the back segment with impurities removing unit, setting are removed described It goes to be changed into other object fundamental change in processing pipeline and by the impurity in the exhaust by plasma decomposition Portion, be arranged in it is in the removing processing pipeline, make the substance become by the transition and defined reactant (such as gold It is reactant that category system reactant or gas, which absorb) react and the removing unit that removes them from the exhaust,

In the processing selector the described 3rd processing of selection, the exhaust is sent to the back segment with impurities removing unit The by-pass line for the recyclegas recycling refining system being connected to,

Control valve opening and closing valve control unit, can control valve make: select the described 1st processing when to the release pipe Line discharges the exhaust, and the exhaust is sent to the removing processing pipeline when selecting the described 2nd processing, is selecting described the The exhaust is sent to the by-pass line when 3 processing.

Above-mentioned recyclegas recycling refining system also can have described in returnable and ratio for storing the exhaust The compressor that returnable more leans on exhaust path downstream side to configure, returnable configuration from above-mentioned impurities removing unit Removing processing pipeline and the by-pass line above-mentioned discharge pipe (the also referred to as described removing processing pipeline and the bypass that are connected to Discharge pipe behind pipeline interflow) it branches out on the exhaust pathway (L3) of extension, the compressor from the recycling for that will hold The pressure for the exhaust that device is sent out boosts to the 3rd pressure.

Above-mentioned recyclegas recycling refining system also can have more leans on exhaust path downstream side to configure than the compressor , the extraction flow adjustment section of flow for adjusting the exhaust being sent to exhaust path downstream, having been boosted by compressor Or the exhaust flow-meter of the flow for measuring the exhaust.

Above-mentioned recyclegas recycling refining system also can have boosting container, more lean on than the 2nd impurity removing unit Processed gas path downstream side configuration, for storing the removing processing for having been carried out the 1st impurity and the 2nd impurity Remove the processed gas of processing.

Above-mentioned recyclegas recycling refining system also can have processed gas pressure adjustment unit, than the boosting container It is more configured by processed gas path downstream side, for the pressure for the processed gas sent out from the boosting container to be adjusted to 1st pressure (same pressure, substantially identical pressure or higher pressure).In addition, in no boosting container, The essence can also be configured in the processed gas path that the processed gas that removes that treated for implementing the 2nd impurity is flowed through Gas pressure adjustment section processed.

Above-mentioned recyclegas recycling refining system is flowed through in the processed gas for the removing processing for implementing the 2nd impurity Processed gas path in, it is possible to have measure the pressure gauge of the pressure of processed gas, it is possible to have management established practice level pressure The pressure-regulating valve of power.

Above-mentioned recyclegas recycling refining system also can have than the processed gas pressure adjustment unit or the pressure It is that adjustment valve more leans on that processed gas path downstream side or processed gas path upstream side configure, for adjusting to the manufacture system The supply pipeline supply the processed gas flow processed gas flow adjustment portion or measure processed gas stream The flowmeter of amount.

Above-mentioned recyclegas recycling refining system can also be in the processed gas for the removing processing for implementing the 2nd impurity There is the processed gas flow adjustment portion or survey for adjusting the flow of the processed gas in the processed gas path flowed through Determine the flowmeter of the flow of processed gas.

Preferred embodiment through the above scheme can store exhaust and with returnable, in the row of storage Exhaust is boosted to the certain pressure of the 1st pressure or more by gas by compressor after reaching a certain amount of, and is adjusted by extraction flow The exhaust of certain flow is continually fed into the 1st impurity removing unit, the 2nd impurity removing unit of back segment by portion, so can ensure 1, the removing process performance of the 2nd impurity obtains the processed gas (also referred to as " circulating air of the 1st rare gas and neon well Body ").

Moreover, processed gas pressure adjustment unit can will be passed through when the container storage processed gas that boosts reaches a certain amount of (or pressure-regulating valve) is adjusted to the fine gas of the 1st pressure (same pressure, substantially identical pressure or higher pressure) Body and/or the processed gas feeding supply pipeline that certain flow is adjusted to by processed gas flow adjustment portion, so being capable of essence The mixing of degree control mixing rare gas and processed gas.It therefore, can be than previous simpler structure and semiconductors manufacture The manufacture system of device etc. connects, the 1st, the 2nd impurity of separation from exhaust, recycling recyclegas (such as the 1st rare gas and neon Gas), manufacture system is supplied again.

The recyclegas recycling refining system of 2nd invention is the recycling purification recyclegas from the exhaust that manufacture system is discharged The system of (such as the 1st rare gas and neon), the manufacture system include

The supply pipeline that mixing rare gas at least containing neon and the 1st rare gas is supplied with the 1st pressure utilizes The excimer laser apparatus of the mixing rare gas, and the row discharged being at least discharged from the excimer laser apparatus Pipeline out,

The recyclegas recycling refining system at least includes

The 1st impurity removing unit of the 1st impurity is removed from the exhaust, and

It is more leaning on that exhaust path downstream side configures than the 1st impurity removing unit, for after removing the 1st impurity The 2nd impurity removing unit of the 2nd impurity is removed in exhaust.

The discharge pipe can be at least by the exhaust being discharged by excimer laser apparatus with more than atmospheric pressure and described The discharge pipe that 1st pressure the 2nd pressure venting below is gone.

Based on the measurement result of the impurity concentration test section, from the 1st processing outwardly deflated, implement to remove processing 2nd handles and is sent to the exhaust recyclegas recycling refining system being connected to the back segment of impurities removing unit The processing selector of any one is selected in 3rd processing,

When the processing selector selects the described 1st processing for being vented the discharge line outwardly discharged for described,

In the processing selector the described 2nd processing of selection for from exhaust removing impurity and by the row The removing processing pipeline for the recyclegas recycling refining system that pneumatic transmission is connected to the back segment with impurities removing unit, is arranged in institute It states to remove in processing pipeline and decompose the impurity in the exhaust by plasma and is transformed into turning for other substance Change portion is arranged in the removing processing pipeline, makes the substance become by the transition and defined reactant (such as gold It is reactant that category system reactant or gas, which absorb) it reacts to remove the removing unit of the exhaust,

The exhaust is sent to when the processing selector selects the described 3rd processing and is connected with the back segment of impurities removing unit Then the by-pass line of recyclegas recycling refining system,

The valve control unit of the opening and closing of control valve, the valve control unit control valve at: select the described 1st processing when Xiang Suoshu Discharge line discharges the exhaust, and the exhaust is sent to the removing processing pipeline when selecting the described 2nd processing, is being selected The exhaust is sent to the by-pass line when the described 3rd processing.

Above-mentioned recyclegas recycling refining system also can have:

Store the returnable of the exhaust, the returnable configuration is removing place to go from above-mentioned impurities removing unit The discharge pipe that reason pipeline is connected with by-pass line is (after the referred to as described removing processing pipeline and by-pass line interflow Discharge pipe) it branches out, on the exhaust pathway (L3) that extends, and

Than the compressor that the returnable more leans on exhaust path downstream side to configure, it is used to send from the returnable The pressure of the exhaust out boosts to the 3rd pressure.

Above-mentioned recyclegas recycling refining system also can have:

It is more leaning on that exhaust path downstream side configures than the compressor, for described in storing and having been boosted by the compressor The boosting container of exhaust,

Than it is described boosting container more lean on exhaust path downstream side configure, for adjust be sent to described in exhaust path downstream The exhaust flow-meter of the flow of the extraction flow adjustment section or measurement exhaust of the flow of exhaust.

Above-mentioned recyclegas recycling refining system also can have processed gas pressure adjustment unit, than the 2nd impurity Removing unit more leans on processed gas path downstream side to configure, the pressure of the processed gas for will send out from the 2nd impurity removing unit Power is adjusted to the 1st pressure (same pressure, substantially identical pressure or higher pressure).

Above-mentioned recyclegas recycling refining system can also be in the processed gas for the removing processing for implementing the 2nd impurity In the processed gas path flowed through, the pressure gauge with the pressure for measuring processed gas, it is possible to have for managing The pressure-regulating valve of established practice level pressure.

Above-mentioned recyclegas recycling refining system also can have than the processed gas pressure adjustment unit or the pressure It is that adjustment valve more leans on that processed gas path downstream side or processed gas path upstream side configure, for modulating to the manufacture system The supply pipeline supply the processed gas flow processed gas flow adjustment portion or measure processed gas stream The flowmeter of amount.

The preferred embodiment of above scheme can store exhaust and with returnable, reach in the exhaust of storage To it is a certain amount of when boost to by compressor the certain pressure of the 1st pressure or more, be then store in boosting container, pass through exhaust stream The exhaust of certain flow is continually fed into the 1st impurity removing unit, the 2nd impurity removing unit of back segment by amount adjustment section, so can Ensure the removing process performance of the 1st, the 2nd impurity, the processed gas of the 1st rare gas and neon can be obtained well (also referred to as Make " recyclegas ").

Further, it is possible to by by the processed gas pressure adjustment unit of the back segment that configured in the 2nd impurity removing unit, (or pressure is adjusted Valve) it is adjusted to the processed gas of the 1st pressure (same pressure, substantially identical pressure or higher pressure) and/or by refining The processed gas that gas flow adjustment section is modulated to certain flow is sent into supply pipeline, so being capable of the rare gas of precision controlling mixing The mixing of body and processed gas.Therefore, can connect than the manufacture system of previous simpler structure and semiconductor manufacturing apparatus etc. It connects, the 1st, the 2nd impurity is separated from exhaust, recycle recyclegas (such as the 1st rare gas and neon), again supply manufacture system System.

In the recyclegas recycling refining system of above-mentioned 2nd invention, the preferably described boosting container configuration is in the compressor Exhaust pathway side immediately downstream." tight " refer to for example, the length of piping that compressor and boosting container are connected 50m with Within interior, preferably 30m, more preferably within 20m.

It above-mentioned 1st,, can be with as the processed gas pressure adjustment unit in the recyclegas recycling refining system of 2 inventions It enumerates for example, pressure reducing valve, counterbalance valve.

Above-mentioned 1st, the recyclegas of 2 inventions recycles refining system, can enumerate constituent element below.

The principal component of the mixing rare gas is neon, the 1st rare gas relative to total amount be 1~10%, preferably 1~ 8%.Impurity can be contained in mixing rare gas.As mixing rare gas in impurity, can enumerate for example, nitrogen, Oxygen, carbon monoxide, carbon dioxide, water etc..

As the 1st rare gas, contain for example, argon (Ar), xenon (Xe), appointing one or more in krypton (Kr).

Contain principal component neon and the 1st rare gas in recyclegas.If the 1st rare gas is without specified otherwise, just It removes essentially without from exhaust, is recovered directly as a part of processed gas (recyclegas).

The match ratio of 1st rare gas can enumerate for example, relative to mixing rare gas total amount, and argon is 1~5%, Relative to mixing rare gas total amount, xenon is 1~15%, xenon is 1ppm~100ppm.

The manufacture system can enumerate semiconductor manufacturing apparatus, Precision Machining for example, semiconductor plate exposure apparatus etc. Device, medical device of surgery etc..

The laser aid can enumerate for example, device with krypton fluorine (KrF) excimer laser oscillator, having argon The device of fluorine (ArF) excimer laser oscillator.

On the exhaust pathway, switching valve is configured preferably before and after the counterbalance valve.Control unit can control back pressure Valve.

1st pressure is accordingly set, pressure usually higher than atmospheric pressure according to the pattern of manufacture system, can example Show for example, counting and shows the range for being pressed in 300KPa~700KPa, preferably in the range of 400KPa~700KPa, more preferably in 500KPa The range of~700KPa.

2nd pressure is that atmospheric pressure or more and the 1st pressure hereinafter, can enumerate for example, counting and showing are pressed in 50KPa The range of~200KPa.

3rd pressure is greater than the value of the 1st pressure, is pressed in for example, the meter of the difference of the 1st pressure and the 3rd pressure shows The range of 50KPa~150KPa.

The compressor is preferably based on measured value of the configuration in the pressure gauge of its exhaust path downstream side to control exhaust Pressure.Compressor can also be controlled with control unit.

The extraction flow adjustment section preferably has gas flowmeter and gas flow rate regulating valve, according to gas flowmeter Measured value come correspondingly adjust valve, control gas flow.Extraction flow adjustment section can also be controlled with control unit.

1st impurity is the impurity that content is most in exhaust gas composition, can enumerate such as oxygen.

The 1st impurity removing unit, is device for deoxidizing when the 1st impurity is oxygen, may be exemplified out, and filling manganese oxide is anti- Answer the construction of agent, copper oxide reactant.As manganese oxide reactant, the reactants such as manganese monoxide MnO, titanium dioxide can be enumerated Manganese MnO₂Reactant, using adsorbent as the manganese oxide reactant of matrix.As copper oxide reactant, can enumerate for example, oxygen Change the reactants such as copper CuO, using adsorbent as the copper oxide reactant of matrix.

2nd impurity is the ingredient in exhaust gas composition other than the most impurity of content, can enumerate such as nitrogen Gas, carbon monoxide, carbon dioxide, water, CF₄、CH₄, He etc..

The 2nd impurity removing unit, the 2nd impurity be other than oxygen ingredient (nitrogen, carbon monoxide, carbon dioxide, Water, CF₄、CH₄, He) when, can enumerate filling chemosorbent deaerating mechanism (getter).

1st, the configuration of the 2nd impurity removing unit is accordingly configured with exhaust content (or the removable amount of removing unit), excellent Be selected in leading portion be configured to remove content more than impurity removing unit.

The pressure reducing valve is preferably based on the measured value in the pressure gauge of its processed gas path downstream side configuration to control essence The pressure of gas processed.The control unit that refining system has can also be recycled with recyclegas to control pressure reducing valve.

The processed gas flow adjustment portion has gas flowmeter and gas flow rate regulating valve, is preferably based on gas flow The measured value of meter controls gas flow correspondingly to adjust valve.The control unit that refining system has can also be recycled with recyclegas To control processed gas flow adjustment portion.

The exhaust pathway refers to from the position that the discharge pipe or discharge pipe branch out to the impurity removing unit Between exhaust circulation path (piping).

The processed gas path refers to from the position that the impurity removing unit is collaborated to the supply pipeline The circulation path (piping) of processed gas.

The supply pipeline can also have halogen (F₂) the halogen supply pipeline that is supplied with the 1st pressure of gas.

One embodiment of the recyclegas recycling refining system as the above-mentioned 1st, the 2nd invention can also have discharge road Diameter is the path being discharged to the processed gas sent out from the 2nd impurity removing unit in atmosphere.Emission path is from processed gas Path branches go out and are arranged, and automatic transfer valve or manual switching valve are configured on emission path.In 1st invention, for example big When the memory capacity of the boosting container, automatic transfer valve or manual switching valve can be opened, processed gas is discharged to atmosphere And it adjusts.Configured with the test section for detecting memory capacity in boosting container, control unit can be based on the detection of test section To control the switch of automatic transfer valve.

One embodiment of the recyclegas recycling refining system as the above-mentioned 1st, the 2nd invention, in the 1st rare gas When body is krypton (Kr), mixing rare gas contains krypton and neon, and recyclegas (processed gas) also contains krypton and neon.

An embodiment of refining system is recycled as the recyclegas of the above-mentioned 1st, the 2nd invention, is contained in the exhaust As the argon gas (Ar) of the 1st rare gas, as the xenon (Xe) of the 2nd rare gas, in the 1st impurity removing unit and Also there is xenon removing unit for removing the xenon and by the rare gas of the auxiliary of neon and xenon between the 2nd impurity removing unit Auxiliary of the body in the position supply processed gas path for more leaning on processed gas path downstream than the processed gas flow adjustment portion Rare gas feed path.

One embodiment of the recyclegas recycling refining system as the above-mentioned 1st, the 2nd invention, diluter than the auxiliary The position for having gas supplying path to collaborate with the processed gas path can have in the processed gas path farther downstream There is recyclegas tank, the supply pipeline will be sent to, followed by what processed gas and auxiliary rare gas were constituted by being used to store Ring gas.By temporarily storing in recyclegas tank, gas concentration can be made certain, can control loop gas import Amount.

The recyclegas tank entrance and exit be arranged control valve (automatic shutter switching valve), when to recyclegas into When row storage processing and importing processing, the opening and closing of control valve is controlled by control unit.

The structure can also configure xenon removing unit when mixing rare gas contains xenon in turn.The 1st impurity be oxygen, When remaining impurity is 2 impurity, xenon content in exhaust is fewer than oxygen, it is likely that higher than the content of the 2nd impurity, so It is preferred that configuring xenon removing unit between the 1st impurity removing unit and the 2nd impurity removing unit.Xenon removing unit can enumerate example Such as, the structure of activated carbon, zeolite system adsorbent is filled.

One embodiment of the recyclegas recycling refining system as the above-mentioned 1st, the 2nd invention, also includes

It configures and holds in the auxiliary rare gas feed path, for storing the auxiliary for assisting rare gas of neon and xenon Device,

Configuration is in auxiliary the rare gas feed path, the auxiliary rare gas for will send from the additional reservoir The auxiliary rare gas pressure adjustment unit that is adjusted to the 1st pressure of pressure, and

It configures dilute in the auxiliary rare gas feed path, the auxiliary for adjusting the flow for assisting rare gas There is gas flow adjustment section.

In the program, assisting the principal component of rare gas is neon, and xenon content is centainly than (such as 10%) relative to total amount. But trace impurity can also be contained in auxiliary rare gas.In this way, the auxiliary rare gas more than xenon content can be mixed It closes in the processed gas (the principal component neon that the 1st rare gas contains) for eliminating xenon, adjustment becomes the mixed of supply pipeline side Close the xenon content in rare gas.

The auxiliary rare gas pressure adjustment unit (such as auxiliary rare gas pressure reducing valve) be preferably based on more leaned on than it is auxiliary The measured value for the pressure gauge for helping rare gas feed path downstream side to configure assists the pressure of rare gas to control.It can also use Recyclegas recycling refining system have control unit control auxiliary rare gas pressure adjustment unit (such as auxiliary rare gas subtract Pressure valve).

The auxiliary rare gas flow adjustment portion has gas flowmeter and gas flow rate regulating valve, preferably according to gas The measured value of flowmeter and correspondingly adjust valve, adjustment gas flow.It can also recycle what refining system had with recyclegas Control unit control auxiliary rare gas flow adjustment portion.

Configuration at least contains oxygen from the manufacture system with the 2nd pressure venting in the discharge pipe, for storing Exhaust buffer container, and

Pre- emission path is that path to atmosphere will be arranged from the exhaust that the buffer container is sent out.Pre- discharge road Diameter branches out from discharge pipe and is arranged, and automatic transfer valve or manual switching valve are configured on pre- emission path.In this way, example Such as automatic transfer valve or manual switching valve can be opened when the returnable exceeds memory capacity and exhaust is discharged to atmosphere In, to be adjusted.The test section of detection memory capacity is configured in returnable, control unit can be based on test section Detection control the opening and closing of automatic transfer valve.Or the case where counterbalance valve is not turned on, when buffer container is more than memory capacity When, open automatic transfer valve or manual switching valve, be vented and be adjusted into atmosphere.Configuration detection storage is held in buffer container The test section of amount, control unit can control the opening and closing of automatic transfer valve based on the detection of test section.

One embodiment of the recyclegas recycling refining system as the above-mentioned 1st, the 2nd invention, comprising:

It configures in the supply pipeline, the supply container for storing the mixing rare gas,

Configure the supply pipeline, by the pressure for mixing rare gas sent out from the supply container to described The mixing rare gas decompressing unit of 1st pressure,

Configure the supply amount of the mixing rare gas sent out from the supply container in the supply pipeline, control Mix rare gas flow adjustment portion.

It is preferred that configuring the rare gas of mixing between the supply container and the mixing rare gas flow adjustment portion Body decompressing unit.

The mixing rare gas decompressing unit is preferably based on the pressure gauge for more leaning on supply pipeline downstream side to configure than it Measured value mixes the pressure of rare gas to control.The control that control unit or recyclegas the recycling refining system of manufacture system have Portion processed can control mixing rare gas decompressing unit.

As the mixing rare gas decompressing unit, such as pressure reducing valve can be enumerated.

The mixing rare gas flow adjustment portion preferably has gas flowmeter and gas flow rate regulating valve, according to gas The measured value of flowmeter and correspondingly adjust valve, adjustment gas flow.

The processed gas path is preferably connected to more lean under supply pipeline than the mixing rare gas flow adjustment portion Swim side.

One embodiment of the recyclegas recycling refining system as the above-mentioned 1st, the 2nd invention, can enumerate following Scheme.

It can have the 1st by-pass line for the 1st impurity removing unit.

It can have the 2nd by-pass line for the 2nd impurity removing unit.

It can have the 3rd by-pass line for the xenon removing unit.

Switching valve is respectively configured on the 1st~the 3rd by-pass line.Switching valve is opened when bypassing processing.

The 1st impurity removing unit can at least have switching valve at upstream side.

The 2nd impurity removing unit can at least have switching valve at upstream side.

The xenon removing unit can at least have switching valve at upstream side.

One embodiment of the recyclegas recycling refining system as the above-mentioned 1st, the 2nd invention, can be by supply gas Manufacture system is supplied simultaneously with processed gas, can also only be supplied processed gas.

One embodiment of the recyclegas recycling refining system as the above-mentioned 1st, the 2nd invention, can also be based on coming from The command signal of the control unit of manufacture system controls each element by the control unit of recyclegas recycling refining system.

One embodiment of the recyclegas recycling refining system as the above-mentioned 1st, the 2nd invention, xenon removing unit can also be with Configuration 2 side by side, one of to carry out adsorption treatment, another carries out regeneration treatment.

One embodiment of the recyclegas recycling refining system as the above-mentioned 1st, the 2nd invention, can also be than described Extraction flow adjustment section more leans on exhaust path upstream side or exhaust path downstream side with the temperature for adjusting the exhaust Temperature adjustment section.As temperature adjustment section, such as heat exchanger can be enumerated.

As an embodiment of above-mentioned 1st invention, the configuration of temperature adjustment section is more leaning on exhaust pathway than the compressor Downstream side is preferably configured between the compressor and the extraction flow adjustment section.

As an embodiment of above-mentioned 2nd invention, the configuration of temperature adjustment section is more leaning on exhaust line than the boosting container Diameter downstream side is preferably configured between the boosting container and the extraction flow adjustment section.

With this configuration, delivery temperature can be adjusted to predetermined temperature.For example, while capable of being boosted by compressor The delivery temperature (for example, 60~80 DEG C) to have heated up is adjusted to predetermined temperature (such as 15~35 DEG C).In addition it is also possible to will exhaust Temperature is adjusted to be suitble to the temperature range of removing effect in the various removing units of back segment.

Recyclegas recycling refining methd as the 3rd invention is the recycling purification circulation from the exhaust that manufacture system is discharged The recyclegas of gas recycles refining methd, and the manufacture system includes

The supply pipeline that mixing rare gas at least containing neon and the 1st rare gas is supplied with the 1st pressure utilizes The laser aid of the mixing rare gas, and the discharge pipe at least discharging the discharge gas being discharged from the laser aid Line.

The discharge pipe, which can be, makes to be discharged gas with more than atmospheric pressure and the 1st pressure the 2nd pressure venting below is gone Discharge pipe.

Above-mentioned recyclegas recycling refining methd may include 1 or 2 or more process in multiple processes below:

Measure the impurity concentration detection of the concentration of the impurity in the exhaust of the discharge pipe for being vented and flowing through Process,

Based on the measurement result of impurity concentration detection process, from the 1st processing outwardly deflated, implement removing processing The 2nd processing and the exhaust is sent to the recyclegas recycling refining system being connected to the back segment of impurities removing unit The processing of any one is selected to select process in 3rd processing,

The valve of control valve opening and closing controls process, which makes when selecting the described 1st processing to discharge line The exhaust is discharged, when selecting the described 2nd processing to the processing pipeline conveying exhaust is removed, is selecting the 3rd processing When to by-pass line convey the exhaust,

The 1st impurity removal step of the 1st impurity is removed from the exhaust,

The 2nd impurity that exhaust after removing the 1st impurity in the 1st impurity removal step removes the 2nd impurity removes Go process.

Above-mentioned recyclegas recycles refining methd

By exhaust storage to configuration from the returnable on the exhaust pathway that the discharge pipe branches out extension In the 1st recovery process,

The pressure for the exhaust sent out from the returnable is boosted to the boosting process of the 3rd pressure, and

Adjustment adjusts process by the extraction flow of the flow for the exhaust that the boosting process has been boosted.

Above-mentioned recyclegas recycling refining methd also may include that will implement the 1st impurity removal step and the 2nd miscellaneous Matter removal step respectively handle after processed gas be stored in boosting container in the 2nd recovery process.

Above-mentioned recyclegas recycles refining methd, also may include the processed gas that will be sent out from the boosting container Pressure be adjusted to the processed gas pressure of the 1st pressure (same pressure, substantially identical pressure or higher pressure) Adjust process.In addition, can also be sent out containing measurement from the boosting container before the processed gas pressure adjusts process The processed gas flow processed gas flow measurement process or the adjustment processed gas flow processed gas Flow adjusts process.

Above-mentioned recyclegas recycling refining methd also may include: to have adjusted to through processed gas pressure adjustment process The processed gas that is adjusted of flow of pressure, the processed gas being supplied in the supply pipeline of the manufacture system Flow adjusts the processed gas flow measurement process of the flow of process or the measurement processed gas.

The program can store exhaust and with returnable, when the exhaust of storage reaches a certain amount of, make its liter It is pressed onto a level pressure of the 1st pressure or more (preferably greater than the 1st pressure), and process is adjusted for certain flow by extraction flow Exhaust is continuously handled in the 1st impurity removal step of back segment, the 2nd impurity removal step, so can ensure the 1st, the 2nd The removing process performance of impurity obtains the processed gas (recyclegas) of the 1st rare gas and neon well.

And when the container storage processed gas that boosts reaches a certain amount of, process is adjusted by processed gas pressure and is adjusted to 1st pressure (same pressure, substantially identical pressure or higher pressure), and process is adjusted by processed gas flow The processed gas of certain flow is given to supply pipeline, so capableing of the mixed of precision controlling mixing rare gas and processed gas It closes.It therefore, can be with than previous simpler structure, from the exhaust separation the 1st of the manufacture system of semiconductor manufacturing apparatus etc., the 2 impurity recycle recyclegas (such as the 1st rare gas and neon), supply manufacture system again.

The recyclegas recycling refining methd of 4th invention is the recycling purification recyclegas from the exhaust that manufacture system is discharged Recyclegas recycle refining methd, the manufacture system includes the mixing at least containing neon and the 1st rare gas is rare The supply pipeline that gas is supplied with the 1st pressure is arranged the laser aid using the laser aid of the mixing rare gas, and at least The discharge pipe that discharge gas out discharges.

The discharge pipe can be will discharge gas with more than atmospheric pressure and the 1st pressure the 2nd pressure venting below is gone Discharge pipe.

Above-mentioned recyclegas recycling refining methd may include 1 or 2 or more process in following multiple processes:

The valve of the opening and closing of control valve controls process, which to manage when selecting the described 1st processing to release Line discharges the exhaust, the exhaust is sent to removing processing pipeline when selecting the described 2nd processing, at selection the described 3rd The exhaust is sent to by-pass line when reason,

The 1st impurity removal step of the 1st impurity is removed from the exhaust,

From by the 1st impurity removal step by the exhaust after in addition to the 1st impurity remove the 2nd impurity it is the 2nd miscellaneous Matter removal step.

Above-mentioned recyclegas recycles refining methd

The 1st recovery process that is stored in returnable is vented by described, and the returnable configuration is from the discharge Line branches go out the exhaust pathway extended, and

The pressure for the exhaust sent out from the returnable is boosted to the boosting process of the 3rd pressure.

Above-mentioned recyclegas recycles refining methd

Will through it is described boosting process boosted the exhaust storage to boosting container the 2nd recovery process, and adjustment from The extraction flow of the flow for the exhaust that the boosting container is sent out adjusts process.

Above-mentioned recyclegas recycling refining methd also may include: that will implement the processing of the 2nd impurity removal step The pressure of processed gas be adjusted to the essence of the 1st pressure (same pressure, substantially identical pressure or higher pressure) Gas pressure processed adjusts process.In addition, can also include measuring from the liter before the processed gas pressure adjusts process The processed gas flow measurement process of the flow for the processed gas that pressure vessel is sent out or the flow of the adjustment processed gas Processed gas flow adjust process.

Above-mentioned recyclegas recycling refining methd may include: that will be pressed through processed gas pressure adjustment process The fine gas that the flow of the processed gas of the supply pipeline that power adjusts, being supplied to the manufacture system is adjusted Body flow adjusts the processed gas flow measurement process of the flow of process or the measurement processed gas.

The program can store exhaust and with returnable, and pressure is utilized when the exhaust of storage reaches a certain amount of Contracting machine boosts to a level pressure of the 1st pressure or more (preferably greater than the 1st pressure), is then store in boosting container, passes through exhaust Flow adjusts process and carries out the 1st impurity removal step of the continuous supply back segment of the exhaust of certain flow, the 2nd impurity removal step Processing, so can ensure the removing process performance of the 1st, the 2nd impurity, obtains the purification of the 1st rare gas and neon well Gas (recyclegas).

Moreover, it is (same pressure, substantially identical to be adjusted to the 1st pressure in the back segment of the 2nd impurity removal step Pressure or higher pressure), and process is adjusted by processed gas flow, the processed gas of certain flow is sent into supply pipe Line, so capableing of the mixing of precision controlling mixing rare gas and processed gas.It therefore, can be than previous simpler structure It is connect with the manufacture system of semiconductor manufacturing apparatus etc., from exhaust separation the 1st, the 2nd impurity, recycling recyclegas, (such as the 1st is dilute Have gas and neon), manufacture system is supplied again.

In the recyclegas recycling refining methd of above-mentioned 4th invention, the 2nd recovery process is preferably in the boosting process Boosting processing after, and then will be boosted exhaust storage into the container that boosts.It is boosted being vented to of having handled Time before storing boosting container is within 5 minutes, preferably within 3 minutes, more preferably within 1 minute.

One embodiment of the recyclegas recycling refining methd as the above-mentioned 3rd, the 4th invention, further includes that will have passed through The processed gas of the 2nd impurity removal step is discharged to the discharge process in atmosphere by emission path.

One embodiment of the recyclegas recycling refining methd as the above-mentioned 3rd, the 4th invention, the 1st rare gas It is argon (Ar), and then contains xenon (Xe) as the 2nd rare gas,

Between the 1st impurity removal step and the 2nd impurity removal step further include:

The xenon removal step that the xenon is removed, and

The auxiliary rare gas of processed gas path supply neon from process to the processed gas flow and xenon after adjusting Assist rare gas supply step.

One embodiment of the recyclegas recycling refining methd as the above-mentioned 3rd, the 4th invention further include: neon will be contained The pressure of gas and the auxiliary rare gas of xenon be adjusted to the 1st pressure (same pressure, substantially identical pressure or Higher pressure) auxiliary rare gas pressure adjust process, and

Control the auxiliary rare gas flow adjustment process of the supply amount of the auxiliary rare gas.

One embodiment of the recyclegas recycling refining methd as the above-mentioned 3rd, the 4th invention, in the boosting process It further include the heat exchange process for reducing the temperature of the exhaust between the extraction flow adjustment process.

Detailed description of the invention

Fig. 1 is the figure of the manufacture system for showing embodiment 1 and the structural example of recyclegas recycling refining system.

Fig. 2 is the figure of the manufacture system for showing embodiment 2 and the structural example of recyclegas recycling refining system.

Accompanying drawings symbol description

1 semi-conductor manufacturing system

2 recyclegas recycle refining system

10 supply containers

14 buffer containers

21 counterbalance valves

22 returnable

23 compressors

24 extraction flow adjustment sections

25 boosting containers

26 processed gas flow adjustment portions

61 oxygen removing units

62 xenon removing units

63 impurity removing units

200 impurities removing units

210 surge tanks

211 impurity concentration test sections

L1 supply pipeline

L2 discharge pipe

L3, L4 exhaust pathway

L5 processed gas path

L20 discharge line

L30 removes processing pipeline

L40 by-pass line

Specific embodiment

(recyclegas recycling refining system)

It is explained using recyclegas recycling refining system 2 of the Fig. 1 to embodiment 1.Recyclegas recycling purification system System 2 has impurities removing unit 200, which configures the back segment in manufacture system 1.In present embodiment, make System 1 is made with excimer laser oscillator, using containing xenon, argon gas, neon mixing rare gas.Present embodiment In, as mixing rare gas, be for example, neon is main component, relative to total amount, xenon is 5~50ppm, argon be 3.0~ 4.0% (sometimes with impurity).What it is in present embodiment, as recyclegas recycling is the principal component containing the 1st rare gas Neon.

Mixing rare gas is fed into the half of manufacture system 1 by supply pipeline L1 from supply container 10 with the 1st pressure Conductor manufacturing device.It is dilute that supply valve 11, switching valve 11a (can have, can also without), mixing are configured in order on supply pipeline L1 There are gas flow adjustment section 12, supply switching valve 13.

Mixing rare gas flow adjustment portion 12 has gas flowmeter and gas flow rate regulating valve, according to gas flowmeter Measured value come correspondingly adjust valve, control gas flow.The control unit of manufacture system side is for example, to semiconductor manufacturing apparatus When being only supplied aftermentioned processed gas (recyclegas), control is closed at by supply valve 11 and/or supply switching valve 11a.1st Pressure is correspondingly set according to the pattern of manufacture system 1, in such as 500KPa~700KPa.Aftermentioned processed gas path L5 It is connected to than mixing rare gas flow adjustment portion 12 and supply switching valve 13 more by supply pipeline upstream side, for example, is mixing Rare gas flow adjustment portion 12 and supply are between switching valve 11a.

In addition, the halogen supply pipeline (do not illustrate and) for supplying halogen connect with supply pipeline L1 and is arranged. In addition, when the pressure of the mixing rare gas in supply container 10 is greater than 1 pressure, using than mixing rare gas flow tune The mixing rare gas pressure reducing valve (do not illustrate and) of whole 12 upstream side configuration subtracts the pressure for mixing rare gas It is pressed into the 1st pressure.

From semiconductor manufacturing apparatus be discharged exhaust with it is more than atmospheric pressure, above-mentioned 1st pressure the 2nd pressure venting below. 2nd pressure is also correspondingly set according to the pattern of manufacture system.It is such as 50~100KPa as the 2nd pressure.Discharge Impurity is mixed in exhaust.As impurity, can enumerate for example, nitrogen, oxygen, carbon monoxide, carbon dioxide, water, CF₄、He、 CH₄Deng.

Exhaust is discharged via the discharge pipe L2 being connected to semiconductor manufacturing apparatus.It is configured on discharge pipe L2 miscellaneous Matter removing device 200 and buffer container 14, storage exhaust makes exhaust be a certain amount of in buffer container 14.By the way that buffer container is arranged 14, the exhaust of specified volume can be continually fed into the returnable 22 of back segment.

(impurities removing unit)

Impurities removing unit 200 is explained.

Surge tank 210 is configured on discharge pipe L2, and impurity concentration test section 211 is set on surge tank 210.Exhaust flows into should Surge tank 210, by the concentration of the impurity in the measurement exhaust of impurity concentration test section 211.Exhaust is contained using neon as principal component Argon, krypton contain 5% helium below, CF as impurity sometimes₄、N₂, other impurity.It, can as impurity concentration test section 211 To use such as gas-chromatography, thermal conductivity concentration sensor, semiconductor-type concentration sensor.

It is outwardly discharged from surge tank 210 in order to be vented and discharge line L20 is set.Discharge line L20 from piping, to Tapping equipment, the automatic on/off valve 221 of extraneous deflation are constituted.

In addition, discharge pipe L2, which is branched off into, removes processing pipeline L30 and by-pass line L40 in the downstream of surge tank 210. Removing processing pipeline L30 is impurity to be removed from exhaust, and the recyclegas being connected to the back segment with impurities removing unit returns Receive the pipeline that refining system 2 conveys the exhaust.

Processing pipeline L30 is removed to be transformed into not by automatic on/off valve 231, by the impurity in exhaust by plasma decomposition Substance voltolising device 232, make through substance and metal system reaction reaction that voltolising device 232 becomes and The deaerating mechanism 233 and piping removed from exhaust is constituted.

Voltolising device 232 is by the CF in exhaust₄Resolve into F₂, other fluorine compounds.And these substances are imported into Deaerating mechanism 233, be filled in deaerating mechanism 233 metal system reaction reaction, absorption and be removed.It is not degassed machine The partial impurities that structure 233 is adsorbed and removed are removed in the impurity removing unit in recyclegas recycling refining system 2.As another A embodiment, can be used gas absorption be reactant to replace metal system reactant.

By-pass line L40 is for making to be vented without removing processing, just be delivered directly to and impurities removing unit 200 The pipeline for the recyclegas recycling refining system 2 that back segment is connected to.By-pass line L40 is made of automatic on/off valve 241 and piping.

Measurement result of the selector 250 based on impurity concentration test section 211 is handled, from the 1st processing outwardly deflated, in fact It applies the 2nd processing of removing processing, exhaust is sent to the recyclegas recycling purification being connected to the back segment of impurities removing unit 200 Any processing is selected in 3rd processing of system 2.

Valve control unit 251, when the judgement through handling selector 250 selects the 1st processing, control will be at will be other automatic Open and close valve 231,241 is closed, and opens automatic on/off valve 221, is discharged and is vented to discharge line L20.Through handling selector 250 Judgement and select the 2nd processing when, valve control unit 251 control at by other automatic on/off valves 221,241 close, and open from Dynamic open and close valve 231 is vented to processing pipeline L30 conveying is removed.When the judgement through handling selector 250 selects the 3rd processing, The control of valve control unit 251 is closed at by automatic on/off valve 221,231, and opens automatic on/off valve 241, defeated to by-pass line L40 Send exhaust.In Fig. 1, processing selector 250 and valve control unit 251 constitute a part of impurities removing unit 200, but and be limited to In this way, being also configured to a part of main control unit 60.

It removes and is provided with flow measurement portion 212 on processing pipeline L30.As flow measurement portion 212, quality stream can be used Meter.The measured value of measured value and impurity concentration test section 211 of the replacement period judging part 252 based on flow measurement portion 212 and The amount for calculating impurity finds out the replacement period of the metal system reactant of deaerating mechanism 233.The replacement period found out can be defeated Enter to arrive I/O Interface etc., notifies operator.

It (and can also be ratio in the discharge pipe L2 in the downstream of surge tank 210 in addition, as another embodiment Remove processing pipeline L30 and by-pass line L40 branch point upstream discharge pipe L2) on be arranged flow measurement portion 212. It can be measured respectively to the flow for removing the exhaust in processing pipeline L30 and by-pass line L40 is flowed at this time.

The deterministic process that selection is handled in present embodiment is as follows.

CF in the measurement exhaust of impurity concentration test section 211₄Concentration.In such case, in CF₄Concentration be the 1st threshold value When more than (such as 100ppm), the 1st processing of the selection of selector 250 is handled, in CF₄Concentration be greater than 2nd threshold smaller than the 1st threshold value It is worth (such as 10ppm) and the 2nd processing of processing selector 250 selection when less than 1 threshold value, in CF₄Concentration less than the 2nd threshold The 3rd processing of the selection of selector 250 is handled when value.

In addition, as the CF in other embodiment, the measurement exhaust of impurity concentration test section 211₄、N₂With the concentration of He. In such case,

(a) the 1st processing of processing selector 250 selection when He concentration is the 3rd threshold value (such as 1.0%) or more,

(b) in CF₄Or N₂Any one of to be more than 1st threshold value (such as 100ppm) when processing selector 250 select 1st processing,

(c) in He concentration less than the 3rd threshold value and CF₄Or N₂Any one of to be more than 2nd threshold value (such as 10ppm) And less than the 1st threshold value, and the size relation of concentration meets N₂> (1/2) × CF₄When, the 1st processing of processing selector 250 selection,

(d) in He concentration less than the 3rd threshold value and N₂Or CF₄Concentration be the 2nd threshold value more than and less than the 1st threshold The size relation of value and concentration is N₂< (1/2) × CF₄When, the 2nd processing of processing selector 250 selection,

(e) in He concentration less than the 3rd threshold value and N₂Or CF₄Concentration be less than 2 threshold value when, handle selector 250 Select the 3rd processing.

Furthermore it is not limited to above-mentioned metal system reactant, metal system reactant can be substituted for gas and absorb system's reaction Agent.

Handling selector 250, valve control unit 251, replacement period judging part 252 has the hardware of CPU (or MPU) etc., electricity Road, firmware, the memory for storing software program etc., they cooperate with software and are operated.

Return to the explanation to recyclegas recycling refining system 2.

When conveying not from the buffer container 14 of discharge pipe L2 to the returnable 22 of back segment, the 1st can be closed in advance Switching valve 30 opens pre- drain valve 15 of the configuration on pre- emission path L21, exhaust is discharged into the atmosphere.Manufacture system side Control unit 141, pre- discharge is controlled in detection of buffer container 14, test section for detecting memory capacity based on configuration The switch of valve 15.

Exhaust pathway L3 is branched out in the upstream side of pre- drain valve 15 from discharge pipe L2.It is configured in order on exhaust pathway L3 The 1st switching valve 30, counterbalance valve (back pressure regulator) the 21, the 2nd switching valve 31, returnable 22.In advance will Pre- drain valve 15 is closed, and the 1st switching valve 30, counterbalance valve (back pressure regulator) the 21, the 2nd switching valve 31 are opened, Returnable 22 is arrived into exhaust storage.Valve control unit 61 controls the 1st switching valve 30, counterbalance valve (back pressure Regulator) the valve opening and closing of the 21 and the 2nd switching valve 31.

Configured in order on the exhaust pathway L3 of side farther downstream than returnable 22 compressor 23, heat exchanger 50, 3rd switching valve 32, extraction flow adjustment section 24.Safety valve 51 can also be set than 23 upstream side of compressor.Furthermore The gas flowmeter for measuring extraction flow can be set and replace extraction flow adjustment section 24.

The pressure for the exhaust sent out from returnable 22 is boosted to the 3rd pressure by compressor 23.3rd pressure is for example than The pressure of the high 50KPa~150KPa of 1 pressure.Pressure control portion 62 based on group enters pressure gauge in compressor 23 or than compressor 23 The measured value of the pressure gauge configured farther downstream controls pressure at expulsion.

Heat exchanger 50 makes the temperature of exhaust be reduced to predetermined temperature.While it can make to be boosted by compressor 23 The delivery temperature (for example, 60~80 DEG C) to have heated up is reduced to predetermined temperature (such as 15~35 DEG C), for example, delivery temperature is dropped As low as the temperature range for the removing effect being suitble in the various removing units of back segment.Gas temperature control unit 63 is based on group and enters to heat The measurement of gas temperature analyzer in exchanger 50 or configuration in the gas temperature analyzer than heat exchanger 50 farther downstream Value controls the temperature of exhaust.Valve control unit 61 controls the valve opening and closing of the 3rd switching valve 32.

Extraction flow adjustment section 24 adjusts the flow for being sent to the exhaust of oxygen removing unit 81 of back segment.Extraction flow adjustment section 24 have gas flowmeter and gas flow rate regulating valve, and extraction flow control unit 64 is corresponding according to the measured value of gas flowmeter Ground adjusts the flow of gas flow adjustment valve, control exhaust.

Exhaust pathway L4 in side farther downstream than extraction flow adjustment section 24 configures in order oxygen removing unit 81, xenon removes Portion 82, impurity removing unit 83.Extraction flow adjustment section 24 can also only play the function of the flowmeter of measurement extraction flow.

Oxygen removing unit 81 is for removing oxygen from exhaust, being filled with the device for deoxidizing of manganese oxide reactant.As oxygen Change manganese reactant, the reactants such as manganese monoxide MnO, manganese dioxide MnO can be enumerated₂Reactant.In the upper of oxygen removing unit 81 Trip side and downstream side are respectively provided with inlet valve 33, outlet valve 34, branch out the 1st by-pass line from the upstream side of inlet valve 33 B1 collaborates in the downstream side of outlet valve 34 and exhaust pathway L4.The 1st bypass valve 35 is configured on 1st by-pass line B1.Not Using inlet valve 33 and outlet valve 34 is closed when oxygen removing unit 81, the 1st by-pass line B1 is opened.Valve control unit 61 controls entrance The valve opening and closing of valve 33, outlet valve 34, the 1st bypass valve 35.

Xenon removing unit 82 is for removing xenon, being filled with the de- xenon device of activated carbon.In the upstream side of xenon removing unit 82 Inlet valve 36, outlet valve 37 is respectively configured with downstream side, branches out the 2nd by-pass line B2 from the upstream side of inlet valve 36, Collaborate in the downstream side of outlet valve 37 and exhaust pathway L4.The 2nd bypass valve 38 is configured on 2nd by-pass line B2.It is not using When xenon removing unit 82, inlet valve 36 and outlet valve 37 are closed, opens the 2nd by-pass line B2.Valve control unit 61 controls inlet valve 36, the valve opening and closing of outlet valve 37, the 2nd bypass valve 38.

Impurity removing unit 83 is for removing the impurity other than oxygen, xenon (for example, nitrogen, carbon monoxide, titanium dioxide Carbon, water, CF₄、CH₄), the deaerating mechanism that is filled with chemosorbent.Distinguish in the upstream side of impurity removing unit 83 and downstream side Inlet valve 39, outlet valve 40 are configured, the 3rd by-pass line B3 is branched out from the upstream side of inlet valve 39, in outlet valve 40 Downstream side and processed gas path L5 collaborate.The 3rd bypass valve 41 is configured on 3rd by-pass line B3.It is removed without using impurity Inlet valve 39 and outlet valve 40 are closed when portion 83, open the 3rd by-pass line B3.Valve control unit 61 controls inlet valve 39, outlet The valve opening and closing of valve 40, the 3rd bypass valve 41.

The gas passed through from impurity removing unit 83 is processed gas (the 1st rare gas for being removed oxygen, xenon and impurity The principal component neon that body contains).Processed gas is supplied to supply pipeline L1 via processed gas path L5.Not to aftermentioned liter When pressure vessel 25 conveys, the 4th switching valve 42 can be closed, opens drain valve 43 of the configuration on processed gas emission path L51, Processed gas is discharged to atmosphere.For example, valve control unit 61, based on configuration on boosting container 25, for detecting memory capacity Test section detection come close the 4th switching valve 42, open drain valve 43, controlled.

The 4th switching valve 42, boosting container 25, the 5th switching valve 44, pressure reducing valve 52 are configured in order on the L5 of processed gas path (being equivalent to processed gas pressure adjustment unit), processed gas flow adjustment portion 26, the 6th switching valve 45, the 7th switching valve 46, circulation Gas tank 28, the 9th switching valve 48.

Processed gas is stored in boosting container 25.Specified amount can be stored in advance in processed gas by it, by the essence of specified amount Gas processed is sent to supply pipeline L1 together.

Pressure gauge or group of the pressure control portion 65 based on configuration in the downstream side of processed gas path L5 enter to pressure reducing valve 52 In the measured value of pressure gauge control pressure reducing valve 52, control the pressure of processed gas.Due to the processed gas for the container 25 that boosts It is the gas of the 3rd pressure, so needing to be depressurized to pressure (the 1st pressure) identical with the supply gas of supply pipeline L1.

Processed gas flow adjustment portion 26 have gas flowmeter and gas flow rate regulating valve, processed gas control unit 66 The flow for correspondingly adjusting gas flow adjustment valve according to the measured value of gas flowmeter, controlling processed gas.In this way, energy The supply amount of enough processed gas that will be sent to supply pipeline L1 is controlled at certain.Processed gas flow adjustment portion 26 can be played only The function of gas flowmeter.

The auxiliary rare gas feed path at the interflow processed gas path L5 provided with the downstream side with the 6th switching valve 45 L6.The additional reservoir for filling the auxiliary rare gas of neon and xenon is configured in order on auxiliary rare gas feed path L6 71, supply valve 53, auxiliary rare gas pressure reducing valve (being equivalent to auxiliary rare gas pressure adjustment unit) 54, auxiliary rare gas stream Measure adjustment section 72, the 8th switching valve 47.

The principal component of auxiliary rare gas is neon, and xenon content is centainly than (such as 10%) relative to total amount.But auxiliary Micro impurity can also be contained by helping in rare gas.

Pressure gauge or group of the pressure control portion 65 based on configuration in the downstream side of auxiliary rare gas feed path L6 enter to subtract The measured value of pressure gauge in pressure valve 54 assists the pressure of rare gas pressure reducing valve 54, control auxiliary rare gas to control.? The pressure of auxiliary rare gas in additional reservoir 71 is depressurized into the 1st pressure when being greater than 1 pressure.

The auxiliary rare gas flow adjustment portion 72 has gas flowmeter and gas flow rate regulating valve, processed gas control Portion 66 processed correspondingly adjusts the stream of gas flow adjustment valve, control auxiliary rare gas according to the measured value of gas flowmeter Amount.Processed gas control unit 66 control auxiliary rare gas flow and processed gas flow so that become with mix it is rare The gas of xenon of the gas (argon gas, xenon, neon) containing identical use level (principal component is neon).

It is arranged in present embodiment, on the L5 of processed gas path for storing by processed gas and auxiliary rare gas structure At recyclegas recyclegas tank 28, in the 7th switching valve 46 of 28 entrance side of recyclegas tank and in recyclegas tank 28 9th switching valve 48 of outlet side.Processed gas and auxiliary rare gas mix in recyclegas tank 28, keep a certain concentration. When importing recyclegas to supply pipeline L1, by storing in tank in advance, import volume can be controlled.Valve control unit 61 controls The opening and closing of the 7th switching valve 46 and the 9th switching valve 48 etc. (other valves can also be contained as needed) valve.

Furthermore as another embodiment, processed gas and auxiliary rare gas can also be in processed gas path L5 Piping in mixing after be sent to supply pipeline L1.Valve control unit 61 controls the valve opening and closing of supply valve 53, the 8th switching valve 47.

In addition it is also possible to save recyclegas tank 28.

Control unit 60 can have hardware, circuit, firmware, the memory for storing software program of CPU (or MPU) etc. Deng, by with software cooperate and operated.Control unit 60 has the function of each control unit of symbol 61~66.

(embodiment 2)

It is explained referring to recyclegas recycling refining system of the Fig. 2 to embodiment 2.

Symbol same as embodiment 1 has identical function, but the configuration of container 22 of boosting in embodiment 2 is in compressor 23 back segment.The impurities removing unit 200 of embodiment 2 has similarly to be constructed with embodiment 1.

The configuration of container 25 boost in the exhaust pathway side immediately downstream of compressor 23, has been boosted for storing by compressor 23 Exhaust.The configuration of extraction flow adjustment section 24 is more leaning on exhaust path downstream side than boosting container 25, is sent to exhaust line for adjusting The flow of the exhaust in diameter downstream.Pressure reducing valve 52 is more configured by processed gas path downstream side than impurity removing unit 83, for will be from The pressure for the processed gas that impurity removing unit 83 is sent out is to the 1st pressure.

(another embodiment)

The mixing rare gas containing xenon in embodiment 1,2 is illustrated, but is not limited in this way, being free of xenon The exhaust situation for mixing rare gas (such as ArNe gas, KrNe gas) does not need xenon removing unit 82, the rare gas of auxiliary Body path L6, additional reservoir 71, supply valve 53, auxiliary rare gas pressure reducing valve 54, auxiliary 72 and of rare gas flow adjustment portion 8th switching valve 47 can close the 8th switching valve 47 etc. by using the 2nd by-pass line B2, make they in refinement treatment not It plays a role.

Xenon removing unit 82 is one in embodiment 1,2, but can have 2 xenon removing units, they are configured side by side, one Carry out removing processing, another carry out regeneration treatment.

There is heat exchanger 50, however, you can also not with heat exchanger 50 in embodiment 1,2.

In embodiment 1,2, mixing rare gas flow adjustment portion 12, the supply switching valve in supply pipeline L1 are configured 13 may be constructed a part of the 1st rare gas and neon recycling refining system 2.In such case, the control mixing of control unit 60 is dilute There are gas flow adjustment section 12 and supply switching valve 13.

In embodiment 1,2, configuration in the buffer container 14 of discharge pipe L2, pre- drain valve 15 constitute recyclegas recycling A part of refining system 2.In this case, control unit 60 controls buffer container 14 and pre- drain valve 15.

In embodiment 1,2, pressure reducing valve 52 can be replaced and pressure gauge is used only.

In embodiment 1,2, processed gas flow adjustment portion 26 can be gas flowmeter.Pressure reducing valve 52 can be than purification Gas flow adjustment section 26 or gas flowmeter more lean on the downstream side in processed gas path to be arranged.

(recyclegas recycling refining methd)

Present embodiment is the recyclegas of the 1st rare gas and neon of recycling purification from the exhaust that manufacture system is discharged Refining methd is recycled, the manufacture system has the mixing with the supply of the 1st pressure at least containing neon and the 1st rare gas rare The supply pipeline of gas, the laser aid using the mixing rare gas and at least discharge that will be discharged from the laser aid Gas is with more than atmospheric pressure and discharge pipe that the 1st pressure the 2nd pressure venting below is gone.

It includes following process that 1st recyclegas, which recycles refining methd:

Based on the measurement result of impurity concentration detection process, from the 1st processing outwardly deflated, implement removing processing The 2nd processing and the exhaust is sent to the recyclegas recycling refining system being connected to the back segment of impurities removing unit The processing of any processing is selected to select process in 3rd processing,

The valve of the opening and closing of control valve controls process, which is made when selecting the described 1st to handle by control valve to releasing It puts pipeline and discharges the exhaust, convey the exhaust to removing processing pipeline when selecting the described 2nd processing, selecting described the The exhaust is conveyed to by-pass line when 3 processing,

The 1st impurity removal step of the 1st impurity is removed from the exhaust, and

The 2nd that the 2nd impurity is removed from the exhaust after the 1st impurity removal step is removed the 1st impurity is miscellaneous Matter removal step.

Above-mentioned recyclegas recycles refining methd

By exhaust storage to being arranged in from the returnable on the exhaust pathway that the discharge pipe branches out extension In the 1st recovery process,

The extraction flow of the flow for the exhaust that adjustment has been boosted through the boosting process adjusts process.

Above-mentioned recyclegas recycling refining methd can also include: that will experienced the 1st impurity removal step and the 2nd miscellaneous The processed gas managed everywhere in matter removal step is stored to the 2nd recovery process in boosting container.

Above-mentioned recyclegas recycling refining methd can also include: the processed gas that will be sent out from the boosting container Pressure be adjusted to the processed gas pressure of the 1st pressure (same pressure, substantially identical pressure or higher pressure) Adjust process.In addition, can also include: that measurement is sent out from the boosting container before the processed gas pressure adjusts process The processed gas flow processed gas flow measurement process or the adjustment processed gas flow processed gas Flow adjusts process.

Above-mentioned recyclegas recycling refining methd also may include: to have adjusted to through processed gas pressure adjustment process The processed gas that the flow of pressure, the supply pipeline that is supplied to the manufacture system processed gas is adjusted Flow adjusts the processed gas flow measurement process of the flow of process or the measurement processed gas.

2nd recyclegas recycles refining methd

Based on the measurement result of impurity concentration detection process, from the 1st processing outwardly deflated, implement removing processing The 2nd processing, the exhaust is sent to the 3rd of the recyclegas recycling refining system being connected to the back segment of impurities removing unit The processing of any processing is selected to select process in processing,

The valve of control valve opening and closing controls process, which is made when selecting the described 1st processing by control valve to release Pipeline discharges the exhaust, when selecting the described 2nd processing to the processing pipeline conveying exhaust is removed, in selection the described 3rd The exhaust is conveyed to by-pass line when processing,

The 2nd impurity of the 2nd impurity is removed from the exhaust after the 1st impurity removal step removes the 1st impurity Removal step.

Above-mentioned recyclegas recycling refining methd can also include: to divide exhaust storage to from the discharge pipe It pays the 1st recovery process on the exhaust pathway extended in the returnable that configures, and will be sent out from the returnable The pressure of the exhaust boosts to the boosting process of the 3rd pressure.

Above-mentioned recyclegas recycling refining methd can also include: to deposit the exhaust boosted through the boosting process It stores up the 2nd recovery process in boosting container and the flow for the exhaust sent out from the boosting container is adjusted Extraction flow adjust process.

Above-mentioned recyclegas recycling refining methd can also include: the processing through experienced the 2nd impurity removal step The pressure of processed gas be adjusted to the essence of the 1st pressure (same pressure, substantially identical pressure or higher pressure) Gas pressure processed adjusts process.In addition, may include measuring from the boosting before the processed gas pressure adjusts process The flow of the processed gas flow measurement process or adjustment processed gas of the flow for the processed gas that container is sent out Processed gas flow adjusts process.

Above-mentioned recyclegas recycling refining methd also may include: to be adjusted to through processed gas pressure adjustment process The fine gas that the flow of the processed gas of pressure, Xiang Suoshu manufacture system supply pipeline supply is adjusted Body flow adjusts the processed gas flow measurement process of the flow of process or the measurement processed gas.

As above embodiment, can also adjust between process in the boosting process and the extraction flow including drop The heat exchange process of the temperature of the low exhaust.

It can also include that will experienced the processed gas of the 2nd impurity removal step from row as above embodiment Put the discharge process that path is discharged in atmosphere.

As above embodiment, the 1st rare gas is argon gas (Ar) and then contains xenon as the 2nd rare gas Gas (Xe) can also include: to remove the xenon between the 1st impurity removal step and the 2nd impurity removal step Xenon removal step and to the processed gas flow adjust process after processed gas path supply neon and xenon auxiliary The auxiliary rare gas supply step of rare gas.

As above embodiment, can also include: will be aerobic at least containing for the 2nd pressure venting from the manufacture system Buffering process of the exhaust storage of gas to configuration in the buffer container on the discharge pipe, and will be from the buffer container The exhaust sent out is discharged to the pre- discharge process in atmosphere from pre- emission path.

It can also include: that the mixing rare gas is stored in configuration in the supply pipeline as above embodiment On supply container storage process, the rare gas of mixing that will be sent out from the supply container of the configuration on the supply pipeline The pressure of body to the 1st pressure decompression process, and to from configuration the supply pipeline the supply container The mixing rare gas flow adjustment process that the flow for the mixing rare gas sent out is adjusted.

Claims

1. a kind of impurities removing unit, for it is being discharged from excimer laser apparatus, at least containing neon and the 1st rare gas Impurity is removed in exhaust,

It includes

Impurity concentration test section measures the concentration of the impurity in the exhaust of the discharge pipe for being vented and flowing through,

Transition, based on the measurement result of the impurity concentration test section, by the impurity in the exhaust by it is equal from Daughter decomposes and becomes other substance,

Removing unit makes the substance become by the transition and defined reaction reaction, removes from the exhaust,

Discharge line and/or by-pass line, measurement result of the discharge line based on the impurity concentration test section will be described Exhaust outwardly discharge, measurement result of the by-pass line based on the impurity concentration test section, by it is described exhaust be sent to The recyclegas that the back segment of impurities removing unit is connected to recycles refining system, and

Selector is handled, based on the measurement result of the impurity concentration test section, from the 1st processing outwardly deflated, is implemented It removes the 2nd processing of processing and the exhaust is sent to the recyclegas being connected to the back segment of impurities removing unit and recycle Any processing is selected in 3rd processing of refining system,

The processing selector selection the described 2nd processing when, by be arranged in remove processing pipeline on the transition and The removing unit removes impurity from the exhaust, and the removing processing pipeline is used to for the exhaust being sent to and impurity removes The recyclegas that the back segment of device is connected to recycles refining system,

In the processing selector the described 3rd processing of selection, the exhaust is sent to by the by-pass line and is removed with impurity The recyclegas recycling refining system for going the back segment of device to be connected to.

2. impurities removing unit as described in claim 1, also includes

Flow measurement portion measures the flow of the exhaust, and

Replacement period judging part, the measured value of measured value and the impurity concentration test section based on the flow measurement portion come The amount for calculating the impurity finds out the replacement period of the defined reactant of the removing unit.

3. impurities removing unit as described in claim 1 measures the CF in the exhaust in the impurity concentration test section₄It is dense When spending,

Work as CF₄When concentration is than being less than the 2nd threshold value of the 1st threshold value greatly and being less than 1 threshold value, the processing selector choosing The 2nd processing is selected,

4. impurities removing unit as described in claim 1 measures the CF in the exhaust in the impurity concentration test section₄、N₂ When with the concentration of He,

(a) processing selector selection the 1st processing when He concentration is the 3rd threshold value or more,

(b) work as CF₄Or N₂Any one of when being the 1st threshold value or more, processing selector selection the 1st processing,

(c) when He concentration is less than the 3rd threshold value, CF₄Or N₂Any one of for the 2nd threshold value more than and less than the 1st threshold Value, and the size relation of concentration meets N₂> (1/2) × CF₄When, processing selector selection the 1st processing,

(d) when He concentration is less than the 3rd threshold value, N₂Or CF₄Concentration be the 2nd threshold value more than and less than the 1st threshold value, and And the size relation of concentration meets N₂< (1/2) × CF₄When, processing selector selection the 2nd processing,

(e) when He concentration is less than the 3rd threshold value, N₂Or CF₄Concentration when being less than 2 threshold value, processing selector selection institute State the 3rd processing.

5. a kind of recyclegas recycles refining system, for recycling purification recyclegas, institute from the exhaust that manufacture system is discharged It states manufacture system and includes the supply pipe for supplying the mixing rare gas at least containing neon and the 1st rare gas with the 1st pressure Line, using the excimer laser apparatus of the mixing rare gas, and the exhaust being at least discharged from the excimer laser apparatus The discharge pipe discharged,

The recyclegas recycling refining system includes

Impurities removing unit described in any one of Claims 1 to 4,

It more leans in exhaust that exhaust path downstream side configures, after removing the 1st impurity and removes than the 1st impurity removing unit Go the 2nd impurity removing unit of the 2nd impurity.