CN107976848A - A kind of definite method of liquid crystal display panel and its anti-reflection layer, liquid crystal display - Google Patents
A kind of definite method of liquid crystal display panel and its anti-reflection layer, liquid crystal display Download PDFInfo
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- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 56
- 238000000034 method Methods 0.000 title claims abstract description 35
- 239000000758 substrate Substances 0.000 claims abstract description 27
- 238000002310 reflectometry Methods 0.000 claims abstract description 25
- 238000000985 reflectance spectrum Methods 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 4
- 108010014172 Factor V Proteins 0.000 claims description 2
- 239000011148 porous material Substances 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 8
- 229910001954 samarium oxide Inorganic materials 0.000 description 6
- 229940075630 samarium oxide Drugs 0.000 description 6
- FKTOIHSPIPYAPE-UHFFFAOYSA-N samarium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[Sm+3].[Sm+3] FKTOIHSPIPYAPE-UHFFFAOYSA-N 0.000 description 6
- 239000000377 silicon dioxide Substances 0.000 description 4
- 239000004408 titanium dioxide Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000005070 sampling Methods 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/12—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode
- G02F2201/121—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode common or background
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Geometry (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
Abstract
The invention discloses a kind of definite method of liquid crystal display panel and its anti-reflection layer, liquid crystal display.Liquid crystal display panel includes upper substrate, infrabasal plate and liquid crystal layer, and upper substrate includes underlay substrate, common electrode layer and the photo-alignment layer being cascading, and the upper surface or lower surface of common electrode layer are additionally provided with one layer of anti-reflection layer.This method includes obtaining average reflectance of the common electrode layer in setting wave band；Adjust the thickness and refractive index of anti-reflection layer；The situation of change of acquisition average reflectance caused by with the thickness of anti-reflection layer and the change of refractive index；Thickness and refractive index using the thickness of the corresponding anti-reflection layer of average reflectance minimum value and refractive index as the anti-reflection layer of liquid crystal display panel.By adjusting the thickness and refractive index of anti-reflection layer, common electrode layer reflectivity is reduced, so as to strengthen contrast.
Description
Technical field
The present invention relates to display technology field, more particularly to the definite side of a kind of liquid crystal display panel and its anti-reflection layer
Method, liquid crystal display.
Background technology
With the development of science and technology, requirement of the people to liquid crystal display is higher and higher, and contrast becomes liquid crystal display
One leading indicator of performance improvement.In order to improve contrast of the liquid crystal display under strong ambient light, it is necessary to reduce as far as possible
Its reflectivity to ambient light.
The content of the invention
Present invention mainly solves the problem of be to provide a kind of definite method, the liquid crystal of liquid crystal display panel and its anti-reflection layer
Show device, by adjusting the thickness and refractive index of anti-reflection layer, determine so that the thickness of the anti-reflection layer of common electrode layer reflectivity minimum
And refractive index, so as to reduce common electrode layer reflectivity, improve the contrast under strong ambient light.
Above-mentioned technical problem is solved, the technical solution adopted by the present invention is to provide a kind of liquid crystal display panel and its anti-reflection layer
Definite method, liquid crystal display.Liquid crystal display panel include upper substrate, infrabasal plate and be arranged at upper substrate and infrabasal plate it
Between liquid crystal layer, upper substrate includes the underlay substrate, common electrode layer and the photo-alignment layer that are cascading, common electrode layer
Upper surface or lower surface be additionally provided with one layer of anti-reflection layer.This method includes obtaining common electrode layer in the average anti-of setting wave band
Penetrate rate；Adjust the thickness and refractive index of anti-reflection layer；Acquisition is average anti-caused by with the thickness of anti-reflection layer and the change of refractive index
Penetrate the situation of change of rate；Using the thickness and refractive index of the corresponding anti-reflection layer of average reflectance minimum value as liquid crystal display panel
The thickness and refractive index of anti-reflection layer.
Above-mentioned technical problem is solved, the technical solution adopted by the present invention is to provide a kind of liquid crystal display panel, including upper base
Plate, infrabasal plate and the liquid crystal layer being arranged between upper substrate and infrabasal plate；Upper substrate includes the substrate base being cascading
Plate, common electrode layer and photo-alignment layer, the upper surface or lower surface of common electrode layer are additionally provided with one layer of anti-reflection layer, anti-reflection layer
For reducing the upper surface of common electrode layer or the reflectivity of lower surface；Wherein, the thickness of anti-reflection layer and refractive index are using upper
What the method stated determined.
Above-mentioned technical problem is solved, the technical solution adopted by the present invention is to provide a kind of liquid crystal display, display panel bag
Include backlight and above-mentioned display panel.
Through the above scheme, the beneficial effects of the invention are as follows：By obtaining common electrode layer in the average anti-of setting wave band
Penetrate rate；Adjust the thickness and refractive index of anti-reflection layer；Acquisition is average anti-caused by with the thickness of anti-reflection layer and the change of refractive index
Penetrate the situation of change of rate；Using the thickness and refractive index of the corresponding anti-reflection layer of average reflectance minimum value as liquid crystal display panel
The thickness and refractive index of anti-reflection layer.By adjusting the thickness and refractive index of anti-reflection layer, determine to cause common electrode layer reflectivity most
The thickness and refractive index of small anti-reflection layer, so as to reduce common electrode layer reflectivity, strengthen contrast.
Brief description of the drawings
To describe the technical solutions in the embodiments of the present invention more clearly, make required in being described below to embodiment
Attached drawing is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the present invention, for
For those of ordinary skill in the art, without creative efforts, other can also be obtained according to these attached drawings
Attached drawing.Wherein：
Fig. 1 is the structure diagram of one embodiment of liquid crystal display panel provided by the invention；
Fig. 2 is the flow diagram of one embodiment of definite method of the anti-reflection layer of liquid crystal display panel provided by the invention；
Fig. 3 is the flow signal of another embodiment of definite method of the anti-reflection layer of liquid crystal display panel provided by the invention
Figure；
Fig. 4 be the anti-reflection layer of liquid crystal display panel provided by the invention another embodiment of definite method in human eye depending on seeing letter
Several schematic diagrames；
Fig. 5 is to be not added with anti-reflection in another embodiment of definite method of the anti-reflection layer of liquid crystal display panel provided by the invention
Reflectance spectrum after the reflectance spectrum and the optimal anti-reflection layer of addition of layer；
Fig. 6 is the flow signal of the another embodiment of definite method of the anti-reflection layer of liquid crystal display panel provided by the invention
Figure；
Fig. 7 is the structure diagram of one embodiment of liquid crystal display provided by the invention.
Embodiment
Below in conjunction with the attached drawing in the embodiment of the present invention, the technical solution in the embodiment of the present invention is carried out clear, complete
Site preparation describes, it is clear that described embodiment only part of the embodiment of the present invention, rather than whole embodiments.Based on this
Embodiment in invention, those of ordinary skill in the art are obtained every other under the premise of performing creative labour is not made
Embodiment, belongs to the scope of protection of the invention.
Fig. 1 is the structure diagram of one embodiment of liquid crystal display panel provided by the invention.
The liquid crystal display panel includes upper substrate 11, infrabasal plate 12 and the liquid crystal being arranged between upper substrate and infrabasal plate
Layer 13, upper substrate 11 includes underlay substrate 111, common electrode layer 112 and the photo-alignment layer 113 being cascading, public
The upper surface or lower surface of electrode layer 112 are additionally provided with one layer of anti-reflection layer 114.
Wherein, underlay substrate 111 can use transparent glass substrate or plastic base, and public motor layer 112 can be with
Made of ITO (indium tin oxide).
Wherein, anti-reflection layer 114 is used for the reflectivity for reducing common electrode layer 112, optionally, the material one of anti-reflection layer 114
As using silica, silicon nitride, magnesium fluoride, samarium oxide, alundum (Al2O3), zinc sulphide, titanium dioxide and zirconium oxide etc..
It should be understood that the thickness and refractive index of anti-reflection layer 114 directly affect its performance, cause it to common electrode layer
The influence degree of 112 reflectivity is different, below will be by several embodiments to how to determine that its thickness and refractive index are said
It is bright.
Refering to Fig. 2, Fig. 2 is the flow of one embodiment of definite method of the anti-reflection layer of liquid crystal display panel provided by the invention
Schematic diagram.The definite method of the anti-reflection layer of the liquid crystal display panel includes：
Step 21：Obtain average reflectance of the common electrode layer in setting wave band.
Wherein, obtain common electrode layer setting wave band average reflectance can use test by the way of, for example, using
The light beam for setting wave band irradiates public electric layer, its reflectivity is measured by dedicated measuring instrument.Specifically, can measure its
The corresponding reflectivity of multiple wavelength values in wave band is set, average reflectance is then obtained by way of averaging.
Furthermore it is also possible to simulate to obtain common electrode layer in the anti-of setting wave band by using rigorous couple-wave analysis method
Rate is penetrated, the reflectivity in the wave band is carried out averagely or be weighted averagely to obtain average reflectance.
Such as：Wave band is set as 400nm-500nm, sampling interval 50nm, measurement obtains the reflectivity point in the wave band
It is not：3.6%th, 3.2% and 4.3%, weighting coefficient is：0.3rd, 0.4 and 0.3, then average reflectance be：3.6% × 0.3+
3.2% × 0.4+4.3% × 0.3=3.65%.
Step 22：Adjust the thickness and refractive index of anti-reflection layer.
The thickness of anti-reflection layer is arranged to setting thickness value, adjusts the refractive index of anti-reflection layer；Or the refractive index by anti-reflection layer
Setting refractive index value is arranged to, adjusts the thickness of anti-reflection layer；Or the thickness and refractive index of anti-reflection layer are adjusted at the same time.
Step 23：The situation of change of acquisition average reflectance caused by with the thickness of anti-reflection layer and the change of refractive index.
Under the thickness of different anti-reflection layers and refractive index, put down accordingly using optical simulation software or hand dipping
Equal reflectivity.
Step 24：Using the thickness and refractive index of the corresponding anti-reflection layer of average reflectance minimum value as liquid crystal display panel
The thickness and refractive index of anti-reflection layer.
Specifically, if the thickness range of anti-reflection layer is 100-200nm, ranges of indices of refraction 1.8-1.9, with first by anti-reflection layer
Thickness is arranged to 100nm, then adjusts to 1.9 refractive index successively from 1.8 according to setting compensation, determines the anti-of common electrode layer
Penetrate the corresponding anti-reflection layer thickness of minimum value and refractive index of rate；Then anti-reflection layer is being increased according to setting compensation, such as adjusted
For 120nm, then refractive index is adjusted to 1.9 successively according to setting compensation from 1.8 again, determines the reflectivity of common electrode layer
The corresponding anti-reflection layer thickness of minimum value and refractive index, and so on, no longer illustrate.
For the average reflectance difference under the thickness and refractive index of different anti-reflection layers, obtained, by the average anti-of acquisition
Penetrate the thickness and refractive index of the thickness and refractive index of the corresponding anti-reflection layer of minimum value in rate as the anti-reflection layer of liquid crystal display panel.
It is intelligible, for the common electrode layer of different-thickness and refractive index, the thickness of the anti-reflection layer of average reflectance minimum
Degree and refractive index are also different.
For example, it is assumed that the thickness of common electrode layer is 200nm, refractive index 2.3, the anti-reflection layer of average reflectance minimum
Thickness and refractive index are respectively 85nm and 2.4；If the thickness of common electrode layer is 180nm, refractive index 2.3, average reflection
The thickness and refractive index of the anti-reflection layer of rate minimum are respectively 90nm and 2.1.
The prior art is different from, the definite method of the anti-reflection layer of liquid crystal display panel provided in this embodiment, obtains first
Average reflectance of the common electrode layer in setting wave band；Secondly the thickness and refractive index of anti-reflection layer are adjusted；Then obtain with anti-reflection
Layer thickness and refractive index change and caused by average reflectance situation of change；Finally average reflectance minimum value is corresponded to
Anti-reflection layer thickness and refractive index as the anti-reflection layer of liquid crystal display panel of thickness and refractive index.By adjusting anti-reflection layer
Thickness and refractive index, determine the thickness and refractive index for causing the anti-reflection layer of common electrode layer reflectivity minimum, so as to reduce public
Electrode layer reflectivity, strengthens contrast；And monofilm anti-reflection layer relative to multi-layer film structure when having simple in structure and processing procedure
Between it is short the advantages of, realization is relatively easy to.
Refering to Fig. 3, Fig. 3 is the stream of another embodiment of definite method of the anti-reflection layer of liquid crystal display panel provided by the invention
Journey schematic diagram, this method include：
Step 31：Reflectivity of the common electrode layer in setting wave band is obtained, to obtain reflectance spectrum R (λ).
Average reflectance R is obtained using the following formulaave：
Wherein, average reflectance RaveWeighted factor V (λ) be human eye luminosity function, λ is wavelength.
Under the conditions of identical eye response is caused, if the required optical radiation power of light of a length of λ of light wave is P (λ), and
Light (human eye is most sensitive to the light of this wavelength) required optical radiation power of 555nm a length of to light wave is P (555), then defines V
(λ)=P (555)/P (λ) is the human eye luminosity function of wavelength X.
Human eye luminosity function is as shown in figure 4, wherein V is human eye luminosity function value.Human eye is to the monochromatic light of different wave length, production
Raw identical visual effect, will there is different radiant powers.In the visible spectrum, human eye is most quick to (yellow green) in the middle part of spectrum
Sense, it is more insensitive closer to spectrum both ends.
In practical applications, successive value can be replaced to ask for average reflectance with centrifugal pump.Obtained using the following formula
Average reflectance Rave：
Wherein, M is the minimum value for the wavelength selected, and N is the maximum for the wavelength selected, and t is the sampling interval, 0≤t≤N-
M。
For example, wavelength 400-700nm, sampling interval 20nm, then sampled point has 17, obtains this 17 corresponding ripple of point
Long reflectivity and human eye luminosity function value, using above-mentioned formula, then can obtain average reflectance.
Anti-reflection layer can be more by being formed in the upper surface of common electrode layer or lower surface deposit high refractive index material
Pore structure sputters shape jointly in the upper surface of common electrode layer or lower surface using high index of refraction target and low-refraction target
Into.
Wherein, high index of refraction and low-refraction are opposite in high index of refraction target and low-refraction target, are not determined
Scope limitation.For example, using titanium dioxide and samarium oxide as target, the refractive index of titanium dioxide is 2.3, the folding of samarium oxide
It is 1.8 to penetrate rate, and at this time compared to titanium dioxide, samarium oxide is low-refraction target；If using samarium oxide and silica conduct
Target, the refractive index of silica is 1.45, and at this time compared to silica, samarium oxide is high index of refraction target.
Step 32：The thickness of anti-reflection layer is arranged to setting thickness value, adjusts the refractive index of anti-reflection layer；Or by anti-reflection layer
Refractive index is arranged to setting refractive index value, adjusts the thickness of anti-reflection layer.
Wherein, the maximum for being generally less than 200nm, the thickness of anti-reflection layer being adjusted according to actual needs of the thickness of anti-reflection layer
Value.
For example, it is assumed that the thickness of anti-reflection layer is 100nm, the refractive index of anti-reflection layer is adjusted in the range of 1.7-1.9, obtains this
Mean refractive index under thickness different refractivity；Or keep anti-reflection layer refractive index constant for 1.7, by anti-reflection layer thickness by 80nm
150nm is adjusted to, obtains the mean refractive index under this refractive index different-thickness.
Anti-reflection layer refractive index value is set between the refractive index of common electrode layer and the refractive index of underlay substrate；Or setting
Refractive index value is between the refractive index of common electrode layer and the refractive index of photo-alignment layer.
For example, the refractive index of common electrode layer is 2.4, the refractive index of underlay substrate is 2.1, then anti-reflection layer refractive index exists
In the range of [2.1,2.4], when obtaining average reflectance, anti-reflection layer refractive index can be limited within this range.
Step 33：The change feelings of acquisition average reflectance caused by with the thickness of the anti-reflection layer and the change of refractive index
Condition.
Step 34：Using the thickness and refractive index of the corresponding anti-reflection layer of average reflectance minimum value as liquid crystal display panel
The thickness and refractive index of anti-reflection layer.
In a specific embodiment, simulate to obtain common electrode layer in visible light wave using rigorous couple-wave analysis method
Reflectance spectrum R (λ) in long scope is as shown in solid lines in fig. 5.With the human eye luminosity function V (λ) shown in Fig. 4 for weighted factor,
Calculate average reflectance Rave=39.8%.
One layer of anti-reflection layer is added in common electrode layer upper surface, simulation obtains average reflectance RaveWith the refraction of anti-reflection layer
The regularity of distribution of rate and thickness change.When the refractive index of anti-reflection layer is nAR=1.86, thickness hARDuring=84nm, average reflection
Rate obtains minimum value Rave=10-2.628=0.24%.
When anti-reflection layer when the refractive index of anti-reflection layer is nAR=1.86, thickness hARDuring=84nm, in reflectance spectrum such as Fig. 5
Dotted line shown in.By contrasting solid line and dotted line, it can be found that the subtraction layer by optimization design realizes very good subtract
Minus effect, especially in wavelength between 500-600nm.
The prior art is different from, the definite method of the anti-reflection layer of liquid crystal display panel provided in this embodiment, passes through acquisition
Common electrode layer is setting the reflectivity of wave band, and reflectivity is weighted averagely using human eye luminosity function, is obtained so that public
The thickness and refractive index of the anti-reflection layer of common electrode layer reflectivity minimum, can directly be simulated to obtain optimal anti-reflection layer with software, behaviour
Facilitate, while the reflectivity of anti-reflection layer can be reduced, help to improve the display performance of liquid crystal display, improve in strong ambient light
Under contrast.
Refering to Fig. 6, Fig. 6 is the stream of the another embodiment of definite method of the anti-reflection layer of liquid crystal display panel provided by the invention
Journey schematic diagram.The definite method of the anti-reflection layer of the liquid crystal display panel includes：
Step 61：Obtain average reflectance of the common electrode layer in setting wave band.
Step 62：Adjust the thickness and refractive index of anti-reflection layer.
Step 63：The situation of change of acquisition average reflectance caused by with the thickness of anti-reflection layer and the change of refractive index.
Step 64：Using the thickness of anti-reflection layer as x coordinate, using the refractive index of anti-reflection layer as y-coordinate, using average reflectance as z
Coordinate, establishes three-dimensional system of coordinate, to determine different anti-reflection layer thickness and the corresponding average reflectance of different anti-reflection layer refractive index.
The average reflectance under the thickness of different anti-reflection layers, refractive index is obtained using optical simulation software or hand dipping,
The contact between three is established, determines the corresponding anti-reflection layer thickness of minimum reflectance and anti-reflection layer refractive index.
The distribution rule of the thickness of anti-reflection layer, the refractive index of anti-reflection layer and average reflectance are being obtained using optical simulation software
During rule, average reflectance, component shared by the higher red of average reflectance can be represented with three primary colours (red, blueness and green)
Bigger, component shared by the lower blueness of average reflectance is bigger.
The prior art is different from, the definite method of the anti-reflection layer of liquid crystal display panel provided in this embodiment, establishes anti-reflection
The coordinate system of the thickness of layer, the average reflectance under refractive index, intuitively expresses the contact between three, convenient observation so that
Determine that the corresponding anti-reflection layer thickness of reflectance minimum and anti-reflection layer refractive index are relatively easy to.
Refering to Fig. 7, Fig. 7 is the structure diagram of one embodiment of liquid crystal display provided by the invention.The display panel 70
Including backlight 71 and above-mentioned display panel 72.
In several embodiments provided by the present invention, it should be understood that disclosed method and equipment, Ke Yitong
Other modes are crossed to realize.For example, equipment embodiment described above is only schematical, for example, the module or
The division of unit, is only a kind of division of logic function, can there is other dividing mode, such as multiple units when actually realizing
Or component can combine or be desirably integrated into another system, or some features can be ignored, or not perform.
The unit illustrated as separating component may or may not be physically separate, be shown as unit
The component shown may or may not be physical location, you can with positioned at a place, or can also be distributed to multiple
In network unit.Some or all of unit therein can be selected to realize present embodiment scheme according to the actual needs
Purpose.
In addition, each functional unit in each embodiment of the present invention can be integrated in a processing unit, also may be used
To be that unit is individually physically present, can also two or more units integrate in a unit.It is above-mentioned integrated
Unit can both be realized in the form of hardware, can also be realized in the form of SFU software functional unit.
The foregoing is merely the embodiment of the present invention, is not intended to limit the scope of the invention, every to utilize this hair
The equivalent structure or equivalent flow shift that bright specification and accompanying drawing content are made, is directly or indirectly used in other relevant skills
Art field, is included within the scope of the present invention.
Claims (10)
1. a kind of definite method of the anti-reflection layer of liquid crystal display panel, the liquid crystal display panel include upper substrate, infrabasal plate with
And the liquid crystal layer between the upper substrate and the infrabasal plate is arranged at, the upper substrate includes the substrate base being cascading
Plate, common electrode layer and photo-alignment layer, the upper surface or lower surface of the common electrode layer are additionally provided with one layer of anti-reflection layer, its
It is characterized in that, the described method includes：
Obtain average reflectance of the common electrode layer in setting wave band；
Adjust the thickness and refractive index of the anti-reflection layer；
The situation of change of acquisition average reflectance caused by with the thickness of the anti-reflection layer and the change of refractive index；
Using thickness and refractive index the subtracting as the liquid crystal display panel of the corresponding anti-reflection layer of average reflectance minimum value
The thickness and refractive index of anti-layer.
2. according to the method described in claim 1, it is characterized in that,
It is described to obtain the common electrode layer set the average reflectance of wave band the step of, including：
Reflectivity of the common electrode layer in setting wave band is obtained, to obtain reflectance spectrum R (λ)；
Average reflectance R is obtained using the following formulaave：
<mrow>
<msub>
<mi>R</mi>
<mrow>
<mi>a</mi>
<mi>v</mi>
<mi>e</mi>
</mrow>
</msub>
<mo>=</mo>
<mfrac>
<mrow>
<mo>&Integral;</mo>
<mi>R</mi>
<mrow>
<mo>(</mo>
<mi>&lambda;</mi>
<mo>)</mo>
</mrow>
<mo>&CenterDot;</mo>
<mi>V</mi>
<mrow>
<mo>(</mo>
<mi>&lambda;</mi>
<mo>)</mo>
</mrow>
<mi>d</mi>
<mi>&lambda;</mi>
</mrow>
<mrow>
<mo>&Integral;</mo>
<mi>V</mi>
<mrow>
<mo>(</mo>
<mi>&lambda;</mi>
<mo>)</mo>
</mrow>
<mi>d</mi>
<mi>&lambda;</mi>
</mrow>
</mfrac>
</mrow>
Wherein, average reflectance RaveWeighted factor V (λ) be human eye luminosity function, λ is wavelength.
3. according to the method described in claim 1, it is characterized in that,
The step of thickness and refractive index of the adjusting anti-reflection layer, including：
The thickness of the anti-reflection layer is arranged to setting thickness value, adjusts the refractive index of the anti-reflection layer；Or
The refractive index of the anti-reflection layer is arranged to setting refractive index value, adjusts the thickness of the anti-reflection layer.
4. according to the method described in claim 3, it is characterized in that,
The setting thickness value is less than 200nm.
5. according to the method described in claim 3, it is characterized in that,
The setting refractive index value is between the refractive index of the common electrode layer and the refractive index of the underlay substrate；Or
The setting refractive index value is between the refractive index of the common electrode layer and the refractive index of the photo-alignment layer.
6. according to the method described in claim 1, it is characterized in that,
The anti-reflection layer is more by being formed in the upper surface of the common electrode layer or lower surface deposit high refractive index material
Pore structure.
7. according to the method described in claim 1, it is characterized in that,
The anti-reflection layer is to use high index of refraction target and low-refraction target in the upper surface of the common electrode layer or lower surface
Material sputters formation jointly.
8. according to the method described in claim 1, it is characterized in that,
The step of acquisition situation of change of average reflectance caused by with the thickness of the anti-reflection layer and the change of refractive index
Suddenly, including：
Using the thickness of the anti-reflection layer as x coordinate, using the refractive index of the anti-reflection layer as y-coordinate, using the average reflectance as z
Coordinate, establishes three-dimensional system of coordinate, to determine different anti-reflection layer thickness and the corresponding average reflectance of different anti-reflection layer refractive index.
9. a kind of liquid crystal display panel, it is characterised in that including upper substrate, infrabasal plate and be arranged at the upper substrate and described
Liquid crystal layer between infrabasal plate；
The upper substrate includes underlay substrate, common electrode layer and the photo-alignment layer being cascading, the public electrode
The upper surface or lower surface of layer are additionally provided with one layer of anti-reflection layer, and the anti-reflection layer is used for the upper surface for reducing the common electrode layer
Or the reflectivity of lower surface；
Wherein, the thickness of the anti-reflection layer and refractive index are determined using such as claim 1-8 any one of them method.
10. a kind of liquid crystal display, it is characterised in that the display panel includes backlight and display as claimed in claim 9
Panel.
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| CN1945376A (en) * | 2006-10-25 | 2007-04-11 | 浙江大学 | Film layer design method for clearing double layer film structure coated film glass reflection color |
| CN101299106A (en) * | 2006-12-21 | 2008-11-05 | 三星电子株式会社 | Color filter substrate and liquid crystal display panel containing the same |
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