CN107974663A - New-energy automobile inverter heat sink PVD coating process - Google Patents
New-energy automobile inverter heat sink PVD coating process Download PDFInfo
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- CN107974663A CN107974663A CN201711188204.2A CN201711188204A CN107974663A CN 107974663 A CN107974663 A CN 107974663A CN 201711188204 A CN201711188204 A CN 201711188204A CN 107974663 A CN107974663 A CN 107974663A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/021—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal alloy layer
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- Chemical Kinetics & Catalysis (AREA)
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- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a kind of new-energy automobile inverter heat sink PVD coating process, its step is followed successively by：Oil removing, hot water wash, drying, sandblasting, washing, be cleaned by ultrasonic with deionized water, hot water wash, air-dry, dehydration, air-dry, mask is shelved, plasma activation handle, plated film, unloads sample.Wherein plated film is that wherein chromium film thickness is 0.04 ~ 0.06 μm, and monel film thickness is 1.5 ~ 2.5 μm, and silverskin is 2.5 ~ 3.5 μm successively in sample surfaces chromium plating film, monel film and silverskin using magnetron sputter.The process greatly reduces harmful substance generation, more environmentally friendly, and has carried out optimization order for inverter heat sink, can obtain more preferable surface treatment effect, it is ensured that the combination power between substrate material surface and PVD film layers, improves end product quality.
Description
Technical field
The present invention relates to a kind of new-energy automobile inverter heat sink PVD coating process.
Background technology
It is well known that inverter is one of the power supply of composition new-energy automobile and the essential arrangement components of control system,
But inverter is usually associated with the generation of huge heat during the work time, so inverter bottom must weld heat sink
Heat dissipation is accelerated to extend its service life.And vehicle-mounted inverter heat sink is used as, there is its heat dissipation performance in whens design and manufacture higher
Requirement, in order to improve the performance of heat sink, the main means taken in industry are exactly to be bonded on a heat sink with inverter
Surface electrodeposited chromium, nickel and silver film successively.
For a long time, the interior coating process for metalwork surfaces such as such as above-mentioned heat sinks of industry is always all using traditional
Water power plates（Chemical plating）Technique, it is highly developed, but influence and harm of traditional water power plating to environment are it is well known that although ring
The consciousness of guarantor is being strengthened, and environmental protection standard is being lifted, and environment treating facility is upgrading, but waste liquid is inevitably generated in electroplating process
And exhaust gas discharge, pollution are weight problem.Therefore the traditional water power plating of environment-protective process substitution（Chemistry）Technique trend of the times, and
A kind of social responsibility as traditional electroplating enterprise.
As the alternative means of water power plating, then usually physical vapour deposition (PVD) (Physical is all used in industry at present
Vapor Deposition, PVD) technique carries out the surface coating of the metalworks such as above-mentioned heat sink.Physical gas phase deposition technology
Mainly include the technologies such as sputter coating, vacuum vapor plating, ion film plating, molecular beam epitaxy.And magnetron sputtering technique
（Magnetron Sputtering technology）It is then more mature in PVD process and with a kind of more technology.
Magnetron sputtering technique is to utilize ionized gas particle, bombards target under the acceleration of electric field, the target particle pounded sinks
Product forms the technology of film on substrate.In general, the particle energy sputtered out is between 5-20 eV, higher energy
Very strong transfer ability is made it have, dense film can be formed in substrate surface, so as to obtain stronger combination power.Relative to
Other physical gas phase deposition technologies, have that speed is high, controllability is good, substrate temperature is low, knot during magnetron sputtering technique deposition film
With joint efforts well, can be achieved large-area coating film the advantages that.Magnetron sputtering apparatus species is many in the prior art, and design is also very perfect.
Be developed so far, magnetron sputtering technique not only can deposited metal film, alloy film, can be with deposited compound, ceramics, half
The films such as conductor.And water power coating technology is that metal ion is reduced to atom in cathode surface by external electrical field, and it is adsorbed in
The technology of cathode surface, for its atomic adsorption in cathode surface since energy is relatively low, migration force is small, so the film formed is more
It is loose, with matrix（Cathode）Combination power it is relatively not high.And water power coating technology is generally used on the surface of metal electron component
Process of tin.Relative to water power coating technology, magnetron sputtering technique is primarily present advantages below：1）Full processing procedure three-waste free pollution；2）Hold
Easily realize and combine power with the strong of substrate；3）Uniformity of film is good when plating planar products；4）Process controllability and stability are good.
It is actual although being coated with many advantages compared to traditional water power using PVD process to carry out plated film operation to heat sink
Still there are the following problems in operation：No matter PVD process or the plating of traditional water power, the pre-treatment for heat sink is all to close very much
The processing step of key.The pre-treatment of heat sink is exactly mainly to be surface-treated, and includes removing greasy dirt, smooth surface processing and deep water
Wash and etc..It is well known that fin surface processing smooth and totally it is beneficial to that it is firm with reference to power between film layer,
Also ensure that film layer in the uniform of heat sink different parts film forming thickness, prevents film layer peeling and bubbling phenomenon so that most with this
Telolemma layer dense non-porous.And the base layer that the film layer of dense non-porous not only contributes to protection fin surface exempts from corrosion and shifts to an earlier date
Scrap, moreover it is possible to the good decorative appearance of film layer is kept in longer time, and can more effectively play film layer and be had
Some various functions.
But the pre-treating technology of existing traditional water power plating is mainly chemically treated and electrochemical process for treating, is directed to
The chemical reaction of chemical solution and substrate material surface, can introduce new pollutant, pollute.And original PVD pre-treatments
Technical process is relatively easy and general, and cleaning and sandblasting therein lack what is done for inverter heat sink surfacing characteristic
Special parameter optimization and regulation and control, can not reliably ensure that and excellent knot is formed between inverter heat sink basis material and metallic diaphragm
With joint efforts, follow-up PVD film qualities therefore cannot also be further improved.Due to the pre-treatment currently for different matrix material
Technique does not have unified method, therefore is difficult to find that from the PVD treatment process of other materials from preceding with the property used for reference enough
Science and engineering skill, and it is applied in the PVD process of inverter heat sink to improve substrate material surface effect, and then improve film layer
Quality.
Therefore it is urgently a kind of more environmentally-friendly in industry at present, perfect, efficient new-energy automobile inverter heat sink PVD platings
Membrane process, can further improve product quality.
The content of the invention
The present invention seeks to：A kind of new-energy automobile inverter heat sink PVD coating process is provided, its technological process is very big
Reduce harmful substance generation, it is more environmentally friendly, and optimization order has been carried out for inverter heat sink, more preferable table can be obtained
Surface treatment effect, greatly reinforces the combination power between substrate material surface and metal object phase depositional coating, improves final products matter
Amount.
The technical scheme is that：A kind of new-energy automobile inverter heat sink PVD coating process, including following processing
Step：
1）Oil removing：Sample is put into 40 ~ 75 DEG C of hot dipping degreasing powder solution, concentration is 30-50 g/l, 3 ~ 7min of soaking time,
The hot dipping degreasing powder is the common environmentally friendly oil removing material in market, and aqueous solution has alkalescent, has preferably except multiclass greasy dirt, is easy to clear
Wash characteristic；
2）Hot water wash：Sample after oil removing is put into 40 ~ 60 DEG C of water, embathes 30 ~ 60s；
3）Drying：Sample is put into and is preheated in 100 ~ 120 DEG C of air dry oven dry 30 ~ 40min；
4）Sandblasting：Sample is put into sand-blasting machine, blasting treatment is carried out to sample surfaces using 260 ~ 400 mesh glass sands；
5）Washing：Sample is put into normal-temperature water, embathes 30 ~ 60s；
6）It is cleaned by ultrasonic with deionized water：Sample is put into ultrasonic cleaner water, a length of 30 ~ 60s, supersonic frequency when ultrasonic
For 20 ~ 35KHz；
7）Hot water wash：Sample is put into 40 ~ 60 DEG C of water, embathes 30 ~ 60s；
8）Air-dry：Sample surfaces moisture is blown away with compressed air, air pressure is 0.2-0.4 Mpa；
9）Dehydration：It is not less than 95% alcohol using concentration, sample is carried out dehydrating；
10）Air-dry：Sample surfaces moisture is blown away with compressed air, air pressure is 0.2-0.4 Mpa；
11）Mask is shelved：It is not required the part of plated film to be blocked in sample using closure gauge, and then installs again to shelf
On；
12）Plasma activation processing：Sample is put into plasma treatment vacuum cavity and carries out plasma activation processing, processing step
It is as follows：
A, the hanger equipped with sample is hung in plasma treatment vacuum cavity；
B, vacuumizing makes vacuum indoor pressure be less than 1Pa；
C, a kind of working gas being filled with into vacuum chamber in argon gas or nitrogen, so that vacuum room pressure maintains 10 ~ 20Pa,
Excitation of plasma power supply is opened to excite plasma, cleaning and activation to sample surfaces are realized, to ensure next procedure thing
The combination power of physical vapor deposition plated film film layer；
13）Plated film
A, the sample after plasma activation is put into the plated film cavity in magnetron sputter, is evacuated to local vacuum 3 × 10-3After Pa, applying argon gas to 0.3 ~ 0.5Pa are simultaneously kept；
B, magnetically controlled sputtering chrome target DC power supply is opened, chromium target sputtering chromium particle deposition is needed the surface of plated film, chromium film in sample
After thickness reaches 0.05 μm, chromium target magnetic control sputtering power supply is closed, monel target magnetic control sputtering power supply is opened, splashes monel target
Monel particle deposition is penetrated on chromium film, until monel film thickness stops sputter coating after reaching 1.5 ~ 2.5 μm, most
Silver-colored target magnetic control sputtering power supply is opened afterwards, silver target sputtering silver particles is deposited on monel film, until silver film thickness reaches 2.5
Stop plated film after ~ 3.5 μm；
14）Unload sample
Sample is unloaded from specimen holder and is disengaged from mask.
Further, heretofore described step 1）Middle that sample is put into 50 ~ 55 DEG C of hot dipping degreasing powder solution, concentration is
40-50 g/l, 5 ~ 6min of soaking time.
Further, heretofore described step 2）With step 7）Middle water temperature is controlled at 50 DEG C.
Further, heretofore described step 6）In, supersonic frequency 25KHz；
Further, heretofore described step 8）With step 10）In air pressure control in 0.3Mpa.
Further, heretofore described step 4）It is middle that sample is put into sand-blasting machine, using 320 mesh glass sands to needing plated film
Specimen material surface carry out blasting treatment.
Further, the step 4）Middle sandblasting parameter is：
A, nozzle to sample distance be 5 ~ 40cm；
B, admission pressure arrives 0.4MPa for 0.3；
C, sandblasting speed is 1 ~ 3cm3/s。
Further, heretofore described step 12）The exciting power of middle excitation of plasma power supply is 0.5w/cm2, activation
Time is 80 ~ 100s.
Further, heretofore described step 13）Single target sputtering power of middle chromium target, monel target and silver-colored target is
12kw, wherein chromium target current 25A, monel target current 29.5A, silver-colored target current are 15A；Sputter rate：Chromium film is 68nm/
min；Monel film is 72nm/min, silverskin 200nm/min, and the mass ratio of nickel and copper is in the monel film
3:7。
Further, heretofore described step 13）Middle applying argon gas are to 0.4Pa and keep.
It is an advantage of the invention that：
1）The technological process of the present invention greatly reduces harmful substance generation, more environmentally friendly, and is carried out for inverter heat sink
Optimization order, can obtain more preferable surface treatment effect, greatly reinforce the combination between substrate material surface and PVD film layers
Power, improves end product quality.
2）Routine PVD pre-treating methods are compared in the present invention, it specifically adds heat step by step again after oil removing ultrasonic cleaning
Washing and flushing two procedures, can preferably remove the cleaning agent and its and rich mixture of remained on surface.Add at the same time
Blasting treatment process, and strictly optimize its technological parameter, divide flushing, hot water wash and deionized water ultrasound clear again after blasting treatment
Three washings are washed to clear up sample surfaces, these steps all substantially increase the smoothness of sample surfaces, are conducive to carry
The combination power of high sample surfaces and metal object phase depositional coating.
3）In the filming process of the present invention, film is ensured by the technological parameter such as optimal control power and target sputter coating speed
Layer and fin surface have stronger combination power, while ensure that the plating film uniformity of fin surface is more preferable；And this case
In fin surface successively electrodeposited chromium film, monel film and silverskin in coating process, its process controllability and stability are more preferable,
It can assign film layer more preferable heat dissipation performance.
Pass through the sample after our magnetron sputtering technique plated film（Heat sink）, peel strength is tested after welding inverter
10 MPa of representative value；Secondary 1 square metre of film thickness uniformity is not more than ± 5% by the gross；370 ± 5 DEG C of -3 seconds -5 times wickings experiments, welding
Face plated film is without coming off.
4）The present invention also introduces dehydration and air drying steps before plasma activation treatment process, and to plasma activation
Procedure parameter optimizes, these are conducive to the lifting of plasma activation quality.
Embodiment
Embodiment 1：The present embodiment to sputter plating successively on new-energy automobile inverter heat sink with magnetron sputtering technique
Exemplified by chromium film, monel film and silverskin, to this new-energy automobile inverter heat sink PVD coating process provided by the invention
It is explained as follows：
Specific processing step is as follows：
1）Oil removing：Sample is put into the hot dipping degreasing powder solution that temperature is 55 DEG C, concentration is 50 g/l, is soaked 5 minutes；
2）Hot water wash：Sample after oil removing is put into 50 DEG C of hot water and embathes 60s；
3）Drying：Sample is put into and is preheated in 120 DEG C of air dry oven dry 40min；
4）Sandblasting：Sample is put into sand-blasting machine, blasting treatment is carried out to sample surfaces using 320 mesh glass sands, sandblasting parameter is：
A, nozzle to sample distance be 20cm；
B, admission pressure is 0.4MPa；
C, sandblasting speed is 3cm3/s；
5）Washing：Sample is put into normal-temperature water, embathes 60s；
6）It is cleaned by ultrasonic with deionized water：Sample is put into ultrasonic cleaner water, a length of 60s, supersonic frequency are when ultrasonic
25KHz；
7）Hot water wash：Sample is put into 50 DEG C of hot water and embathes 60s；
8）Air-dry：Sample surfaces moisture is blown away with compressed air, air pressure is 0.3 Mpa；
9）Dehydration：Sample is carried out dehydrating using alcohol more than 95% concentration；
10）Air-dry：Sample surfaces moisture is blown away with compressed air, air pressure is 0.3 Mpa；
11）Mask is shelved：It is not required the part of plated film to be blocked in sample using closure gauge, and then installs again to shelf
On；
12）Plasma activation processing：Sample is put into plasma treatment vacuum cavity and carries out plasma activation processing, processing step
It is as follows：
A, the hanger equipped with sample is hung in plasma treatment vacuum cavity；
B, vacuumizing makes vacuum indoor pressure be less than 1Pa；
C, working gas that the one or more of mixed gas being filled with into vacuum chamber in oxygen, argon gas and nitrogen are formed so that
Vacuum room pressure maintains 10Pa, opens excitation of plasma power supply to excite plasma, realizes the cleaning to sample surfaces
With activation, to ensure the combination power of next procedure physical vapor deposition coating film film layer；The wherein excitation work(of excitation of plasma power supply
Rate is 0.5w/cm2, soak time 80s.
13）Plated film
A, the sample after plasma activation is put into the plated film cavity in magnetron sputter, is evacuated to local vacuum 3 × 10-3After Pa, applying argon gas to 0.4Pa are simultaneously kept；
B, the magnetron sputtering DC power supply of chromium target is opened, chromium target sputtering chromium particle deposition is needed the surface of plated film, chromium in sample
After thickness reaches 0.05 μm, chromium target magnetic control sputtering power supply is closed, monel target magnetic control sputtering power supply is opened, makes monel target
Monel particle deposition is sputtered on chromium film, until monel film thickness stops sputter coating after reaching 2 μm, is finally beaten
Silver-colored target magnetic control sputtering power supply is opened, silver target sputtering silver particles is deposited on monel film, until silver film thickness stops after reaching 3 μm
Only plated film；Single target sputtering power of wherein chromium target, monel target and silver-colored target is 12kw, and wherein chromium target current 25A, ambrose alloy closes
Gold target electric current 29.5A, silver-colored target current are 15A；Sputter rate：Chromium film is 68nm/min；Ambrose alloy film is 72nm/min, and silverskin is
200nm/min, and the mass ratio of nickel and copper is 3 in the monel film:7.
14）Unload sample
Sample is unloaded from specimen holder and is disengaged from mask.
Embodiment 2：The present embodiment with new-energy automobile inverter heat sink with magnetron sputtering technique successively Sputter Deposition of Chromium film,
Exemplified by monel film and silverskin, this new-energy automobile inverter heat sink PVD coating process provided by the invention is explained
It is as follows：
Specific processing step is as follows：
1）Oil removing：Sample is put into the hot dipping degreasing powder solution that temperature is 50 DEG C, concentration is 40 g/l, is soaked 7 minutes；
2）Hot water wash：Sample after oil removing is put into 60 DEG C of hot water and embathes 35s；
3）Drying：Sample is put into and is preheated in 120 DEG C of air dry oven dry 40min；
4）Sandblasting：Sample is put into sand-blasting machine, blasting treatment is carried out to sample surfaces using 320 mesh glass sands, sandblasting parameter is：
A, nozzle to sample distance be 30cm；
B, admission pressure is 0.4MPa；
C, sandblasting speed is 2cm3/s；
5）Washing：Sample is put into normal-temperature water, embathes 55s；
6）It is cleaned by ultrasonic with deionized water：Sample is put into ultrasonic cleaner water, a length of 60s, supersonic frequency are when ultrasonic
25KHz；
7）Hot water wash：Sample is put into 60 DEG C of hot water and embathes 55s；
8）Air-dry：Sample surfaces moisture, air pressure 0.4Mpa are blown away with compressed air；
9）Dehydration：Sample is carried out dehydrating using alcohol more than 95% concentration；
10）Air-dry：Sample surfaces moisture is blown away with compressed air, air pressure is 0.4 Mpa；
11）Mask is shelved：It is not required the part of plated film to be blocked in sample using closure gauge, and then installs again to shelf
On；
12）Plasma activation processing：Sample is put into plasma treatment vacuum cavity and carries out plasma activation processing, processing step
It is as follows：
A, the hanger equipped with sample is hung in plasma treatment vacuum cavity；
B, vacuumizing makes vacuum indoor pressure be less than 1Pa；
C, working gas that the one or more of mixed gas being filled with into vacuum chamber in oxygen, argon gas and nitrogen are formed so that
Vacuum room pressure maintains 20Pa, opens excitation of plasma power supply to excite plasma, realizes the cleaning to sample surfaces
With activation, to ensure the combination power of next procedure physical vapor deposition coating film film layer；The wherein excitation work(of excitation of plasma power supply
Rate is 0.5w/cm2, soak time 100s.
13）Plated film
A, the sample after plasma activation is put into the plated film cavity in magnetron sputter, is evacuated to local vacuum 3 × 10-3After Pa, applying argon gas to 0.4Pa are simultaneously kept；
B, the magnetron sputtering DC power supply of chromium target is opened, chromium target sputtering chromium particle deposition is needed the surface of plated film, chromium in sample
After thickness reaches 0.05 μm, chromium target magnetic control sputtering power supply is closed, monel target magnetic control sputtering power supply is opened, makes monel target
Monel particle deposition is sputtered on chromium film, until monel film thickness stops sputter coating after reaching 2.5 μm, finally
Silver-colored target magnetic control sputtering power supply is opened, silver target sputtering silver particles is deposited on monel film, until silver film thickness reaches 3.5 μm
After stop plated film；Single target sputtering power of wherein chromium target, monel target and silver-colored target is 12kw, wherein chromium target current 25A, nickel
Copper alloy target current 29.5A, silver-colored target current are 15A；Sputter rate：Chromium film is 68nm/min；Ambrose alloy film is 72nm/min, silverskin
For 200nm/min, and the mass ratio of nickel and copper is 3 in the monel film:7.
14）Unload sample
Sample is unloaded from specimen holder and is disengaged from mask.
Certainly the above embodiments merely illustrate the technical concept and features of the present invention, and its object is to allow be familiar with technique
People can understand present disclosure and implement according to this, it is not intended to limit the scope of the present invention.It is all according to this hair
The modification that the Spirit Essence of bright main technical schemes is done, should be covered by the protection scope of the present invention.
Claims (10)
1. a kind of new-energy automobile inverter heat sink PVD coating process, including following processing step：
Oil removing：Sample is put into 40 ~ 75 DEG C of hot dipping degreasing powder solution, concentration is 30-50 g/l, 3 ~ 7min of soaking time；
2）Hot water wash：Sample after oil removing is put into 40 ~ 60 DEG C of water, embathes 30 ~ 60s；
3）Drying：Sample is put into and is preheated in 100 ~ 120 DEG C of air dry oven dry 30 ~ 40min；
4）Sandblasting：Sample is put into sand-blasting machine, blasting treatment is carried out to sample surfaces using 260 ~ 400 mesh glass sands；
5）Washing：Sample is put into normal-temperature water, embathes 30 ~ 60s；
6）It is cleaned by ultrasonic with deionized water：Sample is put into ultrasonic cleaner water, a length of 30 ~ 60s, supersonic frequency when ultrasonic
For 20 ~ 35KHz；
7）Hot water wash：Sample is put into 40 ~ 60 DEG C of water, embathes 30 ~ 60s；
8）Air-dry：Sample surfaces moisture is blown away with compressed air, air pressure is 0.2-0.4 Mpa；
9）Dehydration：It is not less than 95% alcohol using concentration, sample is carried out dehydrating；
10）Air-dry：Sample surfaces moisture is blown away with compressed air, air pressure is 0.2-0.4 Mpa；
11）Mask is shelved：It is not required the part of plated film to be blocked in sample using closure gauge, and then installs again to shelf
On；
12）Plasma activation processing：Sample is put into plasma treatment vacuum cavity and carries out plasma activation processing, processing step
It is as follows：
Hanger equipped with sample is hung in plasma treatment vacuum cavity；
Vacuumizing makes vacuum indoor pressure be less than 1Pa；
C, a kind of working gas being filled with into vacuum chamber in argon gas or nitrogen, so that vacuum room pressure maintains 10 ~ 20Pa,
Excitation of plasma power supply is opened to excite plasma, cleaning and activation to sample surfaces are realized, to ensure next procedure thing
The combination power of physical vapor deposition plated film film layer；
13）Plated film
A, the sample after plasma activation is put into the plated film cavity in magnetron sputter, is evacuated to local vacuum 3 × 10- 3After Pa, applying argon gas to 0.3 ~ 0.5Pa are simultaneously kept；
B, magnetically controlled sputtering chrome target DC power supply is opened, chromium target sputtering chromium particle deposition is needed the surface of plated film, chromium film in sample
After thickness reaches 0.05 μm, chromium target magnetic control sputtering power supply is closed, monel target magnetic control sputtering power supply is opened, splashes monel target
Monel particle deposition is penetrated on chromium film, until monel film thickness stops sputter coating after reaching 1.5 ~ 2.5 μm, most
Silver-colored target magnetic control sputtering power supply is opened afterwards, silver target sputtering silver particles is deposited on monel film, until silver film thickness reaches 2.5
Stop plated film after ~ 3.5 μm；
14）Unload sample
Sample is unloaded from specimen holder and is disengaged from mask.
2. new-energy automobile inverter heat sink PVD coating process according to claim 1, it is characterised in that the step
1）Middle that sample is put into 50 ~ 55 DEG C of hot dipping degreasing powder solution, concentration is 40-50 g/l, 5 ~ 6min of soaking time.
3. new-energy automobile inverter heat sink PVD coating process according to claim 1, it is characterised in that the step
2）With step 7）Middle water temperature is controlled at 50 DEG C.
4. new-energy automobile inverter heat sink PVD coating process according to claim 1, it is characterised in that the step
6）In, supersonic frequency 25KHz.
5. new-energy automobile inverter heat sink PVD coating process according to claim 1, it is characterised in that the step
8）With step 10）In air pressure control in 0.3Mpa.
6. new-energy automobile inverter heat sink PVD coating process according to claim 1, it is characterised in that the step
4）It is middle that sample is put into sand-blasting machine, blasting treatment is carried out to the specimen material surface for needing plated film using 320 mesh glass sands.
7. new-energy automobile inverter heat sink PVD coating process according to claim 6, it is characterised in that the step
4）Middle sandblasting parameter is：
A, nozzle to sample distance be 5 ~ 40cm；
B, admission pressure is 0.3 ~ 0.4MPa；
C, sandblasting speed is 1 ~ 3cm3/s。
8. new-energy automobile inverter heat sink PVD coating process according to claim 1, it is characterised in that the step
12）The energy of middle excitation of plasma power supply is 0.5w/cm2, soak time is 80 ~ 100s.
9. new-energy automobile inverter heat sink PVD coating process according to claim 1, it is characterised in that the step
13）Single target sputtering power of middle chromium target, monel target and silver-colored target is 12kw, wherein chromium target current 25A, monel target electricity
29.5A is flowed, silver-colored target current is 15A；Sputter rate：Chromium film is 68nm/min；Monel film is 72nm/min, and silverskin is
200nm/min, and the mass ratio of nickel and copper is 3 in the monel film:7.
10. new-energy automobile inverter heat sink PVD coating process according to claim 1, it is characterised in that the step
Rapid 13）Middle applying argon gas are to 0.4Pa and keep.
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| CN105405601A (en) * | 2015-12-16 | 2016-03-16 | 深圳市康磁电子有限公司 | Metallized ferrite magnetic core and preparation method thereof |
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