CN107941826A - Exposure managing device and irradiation quantity management method - Google Patents
Exposure managing device and irradiation quantity management method Download PDFInfo
- Publication number
- CN107941826A CN107941826A CN201710816155.6A CN201710816155A CN107941826A CN 107941826 A CN107941826 A CN 107941826A CN 201710816155 A CN201710816155 A CN 201710816155A CN 107941826 A CN107941826 A CN 107941826A
- Authority
- CN
- China
- Prior art keywords
- exposure
- ray
- component
- face
- object thing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/06—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption
- G01N23/18—Investigating the presence of flaws defects or foreign matter
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/03—Investigating materials by wave or particle radiation by transmission
- G01N2223/04—Investigating materials by wave or particle radiation by transmission and measuring absorption
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/10—Different kinds of radiation or particles
- G01N2223/101—Different kinds of radiation or particles electromagnetic radiation
- G01N2223/1016—X-ray
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/645—Specific applications or type of materials quality control
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/646—Specific applications or type of materials flaws, defects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/646—Specific applications or type of materials flaws, defects
- G01N2223/6462—Specific applications or type of materials flaws, defects microdefects
Abstract
The present invention provides a kind of technology for being used for the suitably exposure of each component on control inspection object.The exposure managing device of the present invention, the intensity of the position relationship between radiographic source and check object thing in X-ray examination and the X-ray from radiographic source irradiation, be calculated as the exposure in first face in the face of check object thing ray source distribution and as check object thing radiographic source opposite side face the second face exposure distribution, and according to the respective exposure distribution of the first face and the second face and the respective configuration of multiple components, calculate the exposure of each component.
Description
Technical field
The present invention relates to a kind of industrial X-ray check device, especially, is related to the electronics that management carries out X-ray examination
The technology of the exposure of component.
Background technology
Known to have following industrial X-ray check device, it uses its transmission to check object thing X-ray irradiation
The bad or defect of image or CT image detection industrial products.Such X ray checking device has can be with nondestructive side
Formula inspection from state inside the position that appearance is difficult to, object the advantages of, for example, being applied to surface installation base plate
Engage it is undesirable check, components interior crackle or mould it is undesirable check, the various inspections such as the exhaustive test of electronic equipment.
Even industrial products such as electronic equipments, also there is performance degradation when exposure exceedes allowable limit or break down
Possibility.Therefore, for manufacturer, it is desirable to suitably using the dosage of X-ray examination, method, number etc., so that according to
The amount of penetrating is no more than allowable limit.
, it is necessary to pay special attention to electrical/electronic components (hereinafter referred to as " component ") among industrial product.This is because greatly
Inspection that most cases lower component can be Jing Guo component manufacturer, the inspection of equipment manufacturers, inspection of final products manufacturer etc.
Multiple X-ray examination processes, even if the exposure in some manufacturer or process is less than allowable limit, still, if until most
The accumulative exposure of finished product is more, just has the possibility for causing defect.
In addition, check object thing be include multiple components object (for example, surface installation base plate, electronic equipment and its
Module, the component group being mounted on component tray etc.) in the case of, the institute of the exposure of X-ray examination on check object thing
Have in component and be not necessarily the same.In addition, in the case of carrying out multiple x-ray bombardment in primary X-ray inspection, it may also assume that every
A component is subject to the number of x-ray bombardment different with exposure.
Therefore, in the past, it is proposed that by the method for the exposure in each component management X-ray examination.For example, in patent text
A kind of X-ray filming apparatus is proposed in offering 1, its holding member data, radiation data, X-ray of each component in the server
Acceptable dose data, and x-ray bombardment predetermined close is calculated by parts data and radiation data, the X-ray filming apparatus
Have, the function of being alerted in the case where irradiation predetermined close exceedes acceptable dose.In addition, propose in patent document
A kind of x-ray bombardment amount management system, it has adds up to presumption exposure by each component in shooting, and is directed to object base
Plate calculates the function of accumulative exposure.
Patent document 1：Japanese Unexamined Patent Publication 2002-350367 publications
Patent document 2：Japanese Unexamined Patent Publication 2012-163352 publications
Since the transmittance of X-ray is high, the component for being configured at substrate back also illuminated (in the present specification, is
Easy to explanation, the face of the ray source of check object thing is known as " surface " or " the first face ", by radiographic source opposite side
Face be known as " back side " or " the second face ").But in transmissive surface component or printed base plate itself, a part for X-ray
Energy X-ray attenuation by absorption, therefore, the exposure of back part are less than surface elements.Moreover, the attenuation of X-ray according to
Rely the design (for example, configuration of the thickness of printed base plate, material, surface elements etc.) in substrate.However, in the prior art,
Due to the variation of the basic exposure for not considering the back part dependent on substrate design, accordingly, it is difficult to accurately grasp with
Manage the exposure of each component.
The content of the invention
It is of the invention to propose in view of the foregoing, its object is to, there is provided one kind is used for suitably control inspection object
The technology of the exposure of upper each component.
To achieve these goals, the present invention is using the exposure in the face for the ray source for calculating check object thing respectively
The composition of the distribution of the exposure in the face of the opposite side of distribution and radiographic source.
Specifically, the present invention provides a kind of exposure managing device, has：
Exposure calculating part, calculates check object thing by the exposure suffered by X-ray examination,
Information output part, output and the relevant information of exposure of the check object thing, wherein,
The check object thing includes multiple components,
The exposure calculating part is based on the position between the radiographic source in the X-ray examination and the check object thing
The intensity of relation and the X-ray irradiated by the radiographic source, is calculated as the ray source of the check object thing
Face the first face exposure distribution and as the check object thing the radiographic source opposite side face
The distribution of the exposure in two faces,
Distribution and institute of the exposure calculating part based on the respective exposure in first face and second face
The respective configuration of multiple components is stated, calculates the exposure of each component.
According to the structure, the distribution of the exposure in the face (the first face) of the ray source based on check object thing and radiographic source
Opposite side face (the second face) exposure distribution, the exposure of each component is calculated, therefore, it is possible to accurately count
Calculate the exposure of the component of the first surface side and the exposure of the component of the second surface side.It is therefore preferred that the present invention can be applicable in
In the exposure management of double sided mounting substrate, which includes：Printed base plate；It is configured at the institute of the printed base plate
State the component in the first face；It is configured at the component in second face of the printed base plate.
The present invention can be used for the prediction of exposure, it can also be used to the record of exposure.The prediction of exposure refers to, in reality
Before border carries out X-ray examination, processing that the exposure that will be subject in X-ray examination to check object thing is calculated,
The record of exposure refers to, after actually X-ray examination has been carried out, the exposure suffered by check object thing is calculated
Processing.
The exposure calculating part can be contemplated absorption of the printed base plate to X-ray and/or be configured at described first
Absorption of the component in face to X-ray, to calculate the distribution of the exposure in second face.By considering printed base plate, first
Absorption of the component of surface side to X-ray, can accurately calculate i.e. the second face of intensity of the X-ray of the second surface side of transmission
Exposure.
In the case of carrying out multiple x-ray bombardment in primary X-ray inspection, the exposure calculating part can calculate
The exposure of each x-ray bombardment simultaneously carries out accumulative addition, so as to calculate the distribution of the exposure of primary X-ray inspection.Root
According to this composition, for example, even in the feelings for being divided into multiple visual fields to check object thing check etc. the multiple x-ray bombardment of carry out
Under condition, exposure can also be accurately calculated.
The exposure managing device can also have determination unit, which is based on being calculated by the exposure calculating part
Whether the exposure of each component gone out, judge exposure in tolerance for each component.For example, carry out X-ray examination
Exposure is predicted before, if in the case of detecting the component more than tolerance, can take change x-ray bombardment condition
Or stop the measures such as X-ray examination.
The exposure managing device can also have：Check resume storage part, the storage past is to the check object thing
The resume of the X-ray examination of progress；Exposure update section, based on the resume, by the past carry out the exposure of X-ray examination with
The distribution of the exposure calculated by the exposure calculating part and/or the exposure of each component are added up.Thus,
In the case where check object thing receives multiple X-ray examination ,/point of the accumulative exposure of control inspection object will appreciate that
The accumulative exposure of cloth and each component.
Described information output section can will represent that the irradiation spirogram of the distribution of exposure is exported to display device.In addition, institute
Stating information output part can will represent that the information of the exposure of each component is exported to display device.In addition, described information exports
Portion can by the exposure for representing each component whether be tolerance information to display device export.By providing a user this
The information of sample, the grasp and management of the exposure of each component possessed by check object thing become easy.
It should be noted that the present invention can be have the function of said structure or at least one of exposure management
Device.In addition, the present invention can also be the X-ray inspection system for including X ray checking device and exposure managing device.Separately
Outside, the present invention can include at least one of irradiation quantity management method or x-ray inspection method in above-mentioned processing.In addition,
The present invention can also be computer-readable stored record medium, be stored thereon with computer program, and the computer program is used for
Each step of these methods is performed in a computer.As long as said structure and processing do not clash technically, it becomes possible to phase
Mutually combine to form the present invention.
In accordance with the invention it is possible to the suitably exposure of each component on control inspection object.
Brief description of the drawings
Fig. 1 is the figure of the structure for the X-ray inspection system for representing first embodiment.
Fig. 2 is the flow chart of X-ray examination.
Fig. 3 A are the top views of substrate surface, and Fig. 3 B are the top views of substrate back.
Fig. 4 is the figure for an example for representing x-ray bombardment condition.
Fig. 5 A to Fig. 5 C are the figures for the situation for representing the x-ray bombardment according to the progress of the x-ray bombardment condition of Fig. 4.
Fig. 6 is the flow chart of the calculating processing of the exposure of first embodiment.
Fig. 7 is the figure for an example for representing X-ray source information.
Fig. 8 is the figure for an example for representing object information.
Fig. 9 A and Fig. 9 B are the aobvious exemplary figures for representing irradiation spirogram.
Figure 10 is the aobvious exemplary figure for representing component exposure and judgement result in a tabular form.
Figure 11 A and Figure 11 B are the aobvious exemplary figures to configure the exposure of diagram form expressed portion part and judge result.
Figure 12 is the figure of the structure for the X-ray inspection system for representing second embodiment.
Figure 13 is the flow chart of the calculating processing of the exposure of second embodiment.
Reference numeral is described as follows：
1：X-ray inspection system
10：X ray checking device
11：Exposure managing device
12：Check object thing
31~37：Component
100：X-ray source
101：X-ray detector
102：Platform
103：Control unit
104：Inspection portion
105：Storage part
110：Data input part
111：Exposure calculating part
112：Determination unit
113：Information output part
114：Display device
115：Check resume storage part
116：Exposure update section
Embodiment
In the following, while illustrate the preferred embodiment of the present invention referring to the drawings one side.But each structure described below
Illustrate, the structure and various conditions of the device that should be applicable according to invention suitably change, and the scope of the present invention is not limited to
Following record.
<First embodiment>
(X-ray inspection system)
Fig. 1 is the figure of the structure for the X-ray inspection system for schematically showing first embodiment.
X-ray inspection system 1 generally comprises：X ray checking device 10 and exposure managing device 11.X-ray examination fills
It is the device for carrying out nondestructive inspection to check object thing 12 using X-ray to put 10.The X-ray base illustrated in present embodiment
Board checking device, the scolding tin that each component is carried out using the installation base plate for being provided with multiple components as check object thing engage inspection.
Exposure managing device 11 is the device of the exposure suffered by check object thing 12 when managing X-ray examination.X-ray examination fills
Put 10 and exposure managing device 11 may be constructed the device being integrated, device individually can also be configured to.
(X ray checking device)
X ray checking device 10 has：X-ray source 100, X-ray detector 101, platform 102, control unit 103, inspection
Portion 104, storage part 105 etc..X-ray source 100 is for the mechanism to 12 X-ray irradiation of check object thing, for example, by cone-beam type
Or the X-ray maker of fan-beam type is formed.X-ray detector 101 is the X-ray that detection penetrates check object thing 12, and defeated
Go out the photographic unit of the data of X-ray transmission image, for example, being made of scintillator and two-dimentional cmos sensor.Platform 102 is to use
In keeping and carry the mechanism of check object thing 12, to the camera system that is made of x-ray source 100 and X-ray detector 101
Check object region in visual field and check object thing 12 is aligned.It should be noted that in the visual field of follow shot system
When, can with mobile platform 102, can also follow shot system, both platform 102 and camera system can also be moved.
Control unit 103 is action (movement of visual field, the irradiation of X-ray, the X for each several part for controlling X ray checking device 10
The acquisition of radial transmission image, the inspection in inspection portion 104 processing, with the cooperating of external device (ED)/data transfer etc.) unit.Inspection
Look into the list that portion 104 is the inspection that check object thing 12 is carried out using the X-ray transmission image obtained by X ray checking device 10
Member., can be by including CPU (processor) and memory (memory) here, the function in control unit 103 and inspection portion 104
The software processing that computer carries out is realized, can also be realized by circuits such as FPGA, ASIC.
Storage part 105 is to store the setting file of X ray checking device 10, check program, X-ray transmission image, check
The unit of data such as a result.Setting file is to describe the common information independent of check object thing 12 (for example, initial setting
Value, specification of x-ray source 100 and X-ray detector 101 etc.) data.Check that program is for defining the suitable of X-ray examination
The data of sequence, it is pre-created and is saved according to each species of check object thing 12.Checking can include checking in program
The information of object 12 is (for example, the position, size, irradiation on the substrate of the size of substrate, thickness, material, each component are allowed
Amount etc.), x-ray bombardment condition is (for example, irradiation position (field positions), the distance of x-ray source and substrate, tube voltage, pipe are electric
Stream, irradiation time etc.), check logic (for example, by the characteristic quantity of image acquisition, check criterion (threshold value, scope), with
Judge result it is corresponding processing etc.) etc. definition.Storage part 105 is such as the non-volatile memory device as flash memories, hard disk
Form.
(action of X-ray examination)
The flow chart of reference Fig. 2, illustrates an example of the action of the X-ray examination carried out using X ray checking device 10
Son.
First, control unit 103 reads setting file from storage part 105, carries out the initial setting of X ray checking device 10
(step S20).Then, control unit 103 reads the species (for example, numbering of substrate) with check object thing 12 from storage part 105
Corresponding inspection program (step S21).It for the species of check object thing 12, can be inputted, can also passed through by user
Read bar code appended on substrate, Quick Response Code, IC tag or be printed upon the number on substrate to identify, can also be from outer
Part device (for example, Upper system of management production line) receives notice.
Control unit 103 performs the shifting of the visual field of camera system according to the x-ray bombardment condition as defined in inspection program
Dynamic, x-ray bombardment, the acquisition of transmission image (step S22~S24).Multiple x-ray bombardment conditions are set with program when checking
In the case of, change x-ray bombardment condition in order on one side, perform the processing (step S25) of step S22~S24 repeatedly on one side.
An example of the surface installation base plate of check object thing 12 is shown as in Fig. 3 A and Fig. 3 B.Fig. 3 A are substrates
The top view on surface, has five components 31~35 in surface configuration.Fig. 3 B be substrate back top view (from Fig. 3 A phase Tongfangs
To the perspective view of observation), overleaf it is configured with two components 36,37.Fig. 4 is to represent to be set in the inspection program of the substrate
One example of x-ray bombardment condition.Fig. 4 is while changing irradiation position (field positions), x-ray source and the substrate of X-ray
Distance, the tube voltage of x-ray source and the condition of tube current while carrying out the example of x-ray bombardment three times.Need what is illustrated
It is that " μ A " are writing a Chinese character in simplified form for microampere to the unit of tube current.Fig. 5 A~Fig. 5 C are the x-ray bombardment bars schematically shown according to Fig. 4
Part carries out the figure of the situation of x-ray bombardment.It is side view on the left of each figure, right side is top view, and shade is the photograph for representing X-ray
Penetrate scope.By the operation, the X-ray transmission image related with three visual fields of number 1~3 is obtained.
Then, inspection portion 104 is according to the inspection logic defined in program is being checked, from needed for X-ray transmission image zooming-out
Characteristic quantity, and by by the value of this feature amount compared with criterion, judge substrate upper-part scolding tin engagement quality (step
Rapid S26).The inspection result in inspection portion 104 exports (step S27) to display device or external device (ED).
(irradiation on X-ray examination)
As described above, when the exposure of component exceedes allowable limit, it may result in performance degradation or cause failure.Separately
Outside, due to the next a component of most cases can be Jing Guo component manufacturer inspection, equipment manufacturers inspection, final products manufacture
Multiple X-ray examination processes such as the inspection of business, therefore, it is intended that being not only convenient for grasping the exposure in each process, are also convenient for slapping
Hold final accumulative exposure.Then, in the X-ray inspection system 1 of present embodiment, using exposure managing device 11 into
Photograph of the X-ray examination that row is carried out by X ray checking device 10 suffered by and all parts 31~37 on check object thing 12
Prediction, record, the output for the amount of penetrating." prediction " refers to, before X-ray examination is carried out, it is contemplated that suffered by check object thing 12
The processing of exposure.The prediction result for example can be applied to whether verification x-ray bombardment condition is suitable, judges whether to perform inspection
Look into X-ray examination of object 12 etc.." record " refers to, in the case where having carried out X-ray examination, calculates check object thing 12
The exposure being actually subject to, and as the processing that daily record preserves.The daily record data recorded is as proof check object thing
The evidence of 12 exposure, it is open to subsequent handling, the manufacturer of delivery party, retail consumer etc..
Here, for including the check object thing 12 of multiple components as the installation base plate of surface, prediction or record X are penetrated
The exposure of ray examination preferably considers following aspect.
(1) in primary X-ray inspection, x-ray bombardment condition is changed while carrying out the situation of multiple x-ray bombardment
It is more.In this case, different according to component, irradiation number (number for being subject to x-ray bombardment) and exposure can be different.Example
Such as, in the example of Fig. 5 A~Fig. 5 C, the irradiation number of component 31 is once, and the irradiation number of component 34 is twice.Therefore, need
Each component exposure suffered in each x-ray bombardment is calculated, and calculates the total amount.
(2) dosage in range of exposures is not constant.Due to the intensity of X-ray and square being inversely proportional for propagation distance,
For example, if in the case of general cone-beam type x-ray source, the dosage at its range of exposures center is maximum, closer to end
Dosage is then smaller.Dosage distribution in range of exposures, it is only necessary to know that the specification (irradiating angle (extension of light beam of x-ray source 100
Angle) etc.), the geometric position relationship of x-ray source 100 and check object thing 12, the irradiation condition (pipe of x-ray source 100
Voltage, tube current, irradiation time etc.), it becomes possible to calculate.
(3) since the transmittance of X-ray is high, also can illumination configuration in the component (component 36,37 of Fig. 5 A) of substrate back.
But since in the component and printed base plate of transmissive surface, the part energy of X-ray causes X-ray attenuation by absorption,
Therefore, the exposure of back part is less than surface elements.Moreover, the attenuation of X-ray depends on the design of substrate, base is such as printed
The configuration of the thickness, material, surface elements of plate is when (for example, when transmitted thickness is the glass epoxy substrate of 1mm, exposure subtracts
Less about 60%).Therefore, the exposure of back part should be taken into account that printed base plate comes with decay of the surface elements to X-ray in itself
Calculated.
(4) according to the species of component, there is the different possibility of irradiation tolerance.It is therefore preferred that to each component management
Exposure and tolerance.
(exposure managing device)
Reference Fig. 1, illustrates the structure of exposure managing device 11.Exposure managing device 11 is used as its function, has：Number
According to input unit 110, exposure calculating part 111, determination unit 112, information output part 113.Data input part 110 is to obtain exposure
The mechanism of the various data used in calculating.Exposure calculating part 111 is to calculate check object thing to pass through suffered by X-ray examination
Exposure mechanism.Determination unit 112 be to each component judge exposure whether the mechanism in tolerance.Information output part
113 be by the information of the exposure of check object thing to display device 114 or the mechanism of external device (ED) (not shown).
Exposure managing device 11 is such as can be as including CPU (processor), memory, storage device (hard disk), defeated
The all-purpose computer for entering device (keyboard, mouse, touch pad etc.), display device 114, communication I/F etc. is formed.In this case,
Exposure managing device 11 can be formed by a computer, exposure can also be realized by the cooperation of multiple computers
Managing device 11.For example, it is also possible to utilize Distributed Calculation or the technology of cloud computing.The exposure managing device of present embodiment
11 various functions are to perform required program by CPU to realize.But it is also possible to utilize ASIC (Application
Specific Integrated Circuit, application-specific integrated circuit), FPGA (Field-Programmable Gate Array,
Field programmable gate array) etc. circuit form part of functions or repertoire.
(calculating of exposure)
Illustrate an example for calculating processing for the exposure carried out using exposure managing device 11 with reference to the flow chart of Fig. 6
Son.Here, and assume the x-ray bombardment condition pair according to Fig. 4. by the double-sided substrate shown in Fig. 3 A and Fig. 3 B as an example
In the case that the double-sided substrate performs X-ray examination, the exposure suffered by multiple components 31~37 on substrate is predicted.
First, data input part 110 obtains the data (step S60) calculated needed for exposure.Calculate needed for exposure
Data are, for example, x-ray bombardment condition, X-ray source information, object information etc..Irradiation condition is the irradiation for calculating X-ray
Position and the information of intensity, an example as shown in Figure 4, irradiation condition, which can be included in primary X-ray inspection, to be implemented
The irradiation position of each x-ray bombardment, the distance of x-ray source 100, tube voltage, tube current, irradiation time etc..X-ray source information
It is the information for calculating the shape of x-ray bombardment scope, size, intensity distribution.In cone-beam type or the x-ray source of fan-beam type
In the case of 100, an example as shown in Figure 7, as X-ray source information, can obtain beam illumination angle degree (extended corner
Degree).Object information is the information of the check object thing 12 on X-ray examination.Shown and pair shown in Fig. 3 A and Fig. 3 B in Fig. 8
One example of the related object information of face substrate.Here, as the size of the substrate of the information on printed base plate, thickness,
Material etc., or parts number, surface/back side of substrate, the position on substrate, size, photograph as the information on component
Penetrate tolerance etc. and be contained in object information.The x-ray bombardment condition, X-ray source information, object information can be from inspection programs
And/or the setting file acquisition of X ray checking device 10.It should be noted that in Fig. 1, from depositing for X ray checking device 10
Storage portion 105 obtains these information, but can also (Upper system of X ray checking device 10, storage data are deposited from other devices
Store up equipment etc.) obtain information.
Then, exposure calculating part 111 is based on the X-ray source information and x-ray bombardment condition obtained in step S60, meter
Calculate the irradiation spirogram (step S61) in substrate surface (face of radiographic source side).It is to represent each position on substrate to irradiate spirogram
Exposure data, for example, being recorded in the form of two-dimensional image data.The intensity of X-ray with away from x-ray source 100 away from
From square be inversely proportional, it is square directly proportional to tube voltage, it is directly proportional to tube current, it is directly proportional to irradiation time.Therefore, substrate
On the value of exposure of each position can be based on the position relationship between x-ray source 100 and substrate and from x-ray source 100
The intensity of the X-ray of irradiation calculates.At this point it is possible to exposure is calculated merely with theoretical calculation, can also be to regulation
Under the conditions of the measured value of measured in advance implement to calculate exposure corresponding to the amendment of different irradiation conditions.Example as the latter
Son, the following methods can be enumerated：In the case of measured value under known tube current 100uA, counted using following formula
Calculate the exposure under tube current 110uA.
Measured value × correction factor 1.1 under exposure=tube current 100uA under tube current 110uA
In the case of carrying out multiple x-ray bombardment in primary X-ray inspection, i.e. x-ray bombardment condition include with
In the case of the related condition of multiple visual fields, obtain the irradiation spirogram of each x-ray bombardment, and synthesized (accumulative be added) and
As final irradiation spirogram.
Then, exposure calculating part 111 is based on the irradiation spirogram and object information in the surface that step S61 is calculated,
Calculate the irradiation spirogram (step S62) of substrate back (face with radiographic source opposite side).Specifically, exposure calculating part
111 thickness and material based on substrate, calculate the absorbed dose of radiation of substrate, and calculates surface element with regard to the configuration of surface elements
The absorbed dose of radiation of part.Also, exposure calculating part 111 is subtracted by the value of the exposure on the surface calculated by step S61
The absorbed dose of radiation of substrate and the absorbed dose of radiation of surface elements, calculate the value of the exposure of substrate back.
It should be noted that for the absorbed dose of radiation of substrate, can be calculated based on the measured value of measured in advance,
X-ray can be carried out to the position that component is not present on substrate from reality and shoot obtained result reckoning.In addition, with regard to each component
Absorbed dose of radiation for, set value (fixed value) can be used without exception, can also according to component categories, part dimension (height) and
Change (for example, the absorbed dose of radiation of each component categories can be obtained from database), can also be from reality to there are portion on substrate
The position of part carries out X-ray and shoots obtained result reckoning.
Then, all components on substrate are repeated with the processing (step S66) of step S63~S65.In the following, will place
The component for managing object is known as paying close attention to component.
In step S63, exposure calculating part 111 calculates the exposure of concern component.Specifically, exposure calculating part
111, using the irradiation spirogram for paying close attention to the face (surface or the back side) present in component, calculate the irradiation in region shared by concern component
The typical value of amount, and the exposure using the value as concern component.As typical value, aggregate value, average value, maximum can be used
Value, median etc..It should be noted that can also will be above-mentioned in multiple values (for example, average value and maximum etc.) be used as table
Show the index of the exposure of concern component.
In step S64, exposure calculating part 111 obtains the irradiation tolerance of concern component from object information (with reference to figure
8).But irradiate the acquisition methods of tolerance it's not limited to that.For example, can to all components without exception using set value (Gu
Definite value), the irradiation tolerance of each component categories can also be obtained from database, is also based on as object information input
The information such as variety of components, component material, size calculate irradiation tolerance.
In step S65, determination unit 112 by compare step S63 calculated concern component exposure and
The irradiation tolerance of concern component acquired in step S64, to judge whether the exposure for paying close attention to component is being irradiated in tolerance.
In the after treatment (step S66 is yes) of last component, information output part 113 is by substrate surface and the back side
Irradiation spirogram, the exposure of each component and its judgement result etc. export (step S67) to display device 114.
Fig. 9 A are the display examples of the irradiation spirogram of substrate surface, and Fig. 9 B are the display examples of the irradiation spirogram of substrate back.
In this example, the size of exposure is represented with the gray scale of gradual change, represents that exposure is smaller closer to white, represents to shine closer to black
The amount of penetrating is bigger.In addition, rectangle frame represents the component configuration on surface and the back side respectively.Irradiation spirogram in this way, can
Intuitively understand the size of the distribution of the exposure of surface/back side of substrate respectively and the exposure of each component.Especially, lead to
Multiple X-ray irradiation is crossed, the position that exposure adds up also can easily verify that.In addition, as shown in Figure 9 B, by showing to consider
The irradiation spirogram of the absorbed dose of radiation of substrate and surface elements, can also grasp the exposure of the component of substrate back exactly.
It should be noted that it's not limited to that for the graphic technique of irradiation spirogram, any method can also be used.For example, it is also possible to
False colour represents the size of exposure (also referred to as temperature figure), can also be represented with contour chart.Furthermore it is possible to will irradiation
Spirogram (computer graphics) is overlapped in substrate image to represent.
Figure 10 is the exposure for representing each component in a tabular form and the example for judging result.Each component shows part number
Code, surface/back side of substrate, exposure, judgement result.For the amount of being illuminated by exceedes the component of tolerance, such as the institute of parts number 5
Show, can be by carrying out highlighted or flickering etc. to highlight and remind user.
Figure 11 A and Figure 11 B are the examples to configure the exposure of diagram form expressed portion part and judge result.In substrate
The rectangle for representing each component is shown respectively in surface and the back side, and exposure is indicated among the component rectangle.The face of component rectangle
Color (or gray scale) represents the size of exposure.In addition, for the amount of being illuminated by has exceeded the component of tolerance, can be high by carrying out
Bright or flicker etc. is highlighted to remind user.It should be noted that Figure 10 and Figure 11 A and Figure 11 B can be shown, such as
Fruit user specifies the component rectangle of (such as click) Figure 11 A or Figure 11 B, then can show the details of the component, or
The row of the form of Figure 10 can also be highlighted automatically.
(the advantages of present embodiment)
The structure of present embodiment in accordance with the above, due to the surface based on check object thing (radiographic source side
Face) exposure distribution and the exposure distribution in the back side (face with radiographic source opposite side) calculate the irradiation of each component
Amount, therefore, it is possible to accurately calculate the exposure of the component of the exposure of the component of face side and rear side.Moreover, by
In considering absorption and surface elements absorption to X-ray of the printed base plate to X-ray, therefore, it is possible to accurately calculate
It is configured at the exposure of the component at the back side.Therefore, the device of present embodiment is applicable not only to the single side that single side is provided with component
Installation base plate, it is also particularly that the exposure management suitable for the two-sided double sided mounting substrate for being provided with component.
In addition, in the present embodiment, by the irradiation of check object thing surface and each the irradiation spirogram, each component at the back side
Whether amount, the exposure of each component are that judgement result of tolerance etc. is exported to display device.Information as offer is provided
To user, the exposure of each component during easy to grasp and manage X-ray examination.
<Second embodiment>
Illustrate X-ray inspection system second embodiment of the invention with reference to Figure 12 and Figure 13.Figure 12 is to represent
The figure of the structure of the X-ray inspection system of second embodiment, Figure 13 are the calculating processing of the exposure of second embodiment
Flow chart.Relative in the above-described first embodiment calculate primary X-ray inspection exposure, in this second embodiment,
The resume of the X-ray examination carried out by referring to the past to same check object thing, calculate tired in multiple X-ray examination
Count exposure.In the following, only being illustrated to distinctive structure in second embodiment and processing, and omit and the first embodiment party
The identical structure of formula and the explanation of processing.
As shown in figure 12, the exposure managing device 11 of present embodiment is except the functional structure including first embodiment
In addition, further include and check resume storage part 115 and exposure update section 116.Check that resume storage part 115 is to each inspection
Object (being substrate in the present embodiment) storage checks the database of resume.Check that resume are to check object on the past
The information for the X-ray examination resume that thing is carried out.If the information of the accumulative exposure of the check object thing can be calculated, then
Can be any information, for example, past inspection number or suffered exposure in past inspection etc. can be used
Conduct a survey resume.Exposure update section 116 is based on inspection resume, in the exposure calculated by exposure calculating part 111
On, the mechanism of the exposure in the accumulative X-ray examination carried out in the past.
Illustrate that the calculating of the exposure of present embodiment is handled with reference to the flow chart of Figure 13.It should be noted that in Figure 13
Flow chart in, assign identical step number to the processing step identical with first embodiment (Fig. 6), and it is detailed to omit its
Explanation.
First, data input part 110 obtains the data (step S60) calculated needed for exposure.Then, exposure calculating part
111 based on the surface (radiographic source in the X-ray source information and x-ray bombardment condition acquired in step S60, calculating substrate
The face of side) irradiation spirogram (step S61).In addition, exposure calculating part 111 is according in the surface that step S61 is calculated
Spirogram and object information are irradiated, calculates the irradiation spirogram (step S62) at the back side (face with radiographic source opposite side) of substrate.
Processing so far is identical with first embodiment.
Then, exposure update section 116 obtains the ID (step S130) of check object thing via data input part 110.Just
For the ID (identification number) of check object thing, can be inputted by user, can also by read be attached to bar code on substrate,
Quick Response Code, IC tag or the number on substrate is printed upon to identify, can also be from external device (ED) (for example, management production line
Upper system) receive notice.
Then, exposure update section 116 obtains the inspection shoe for the ID for meeting check object thing from inspection resume storage part 115
Go through (step S131).It should be noted that in the present embodiment, obtained from the inspection resume storage part 115 being arranged in device
Inspection resume are taken, but can also check resume from acquisitions such as exterior databases or X ray checking device or Upper system.
Then, inspection resume of the exposure update section 116 based on check object thing, update step S61 and S62 meter respectively
The surface calculated and the exposure (step S132) at the back side.For example, as the feelings for checking the past inspection number of resume acquisition
Under condition, accumulative exposure can utilize this exposure (in the exposure that step S61, S62 calculates) and past inspection
Number, and calculated by following formula.
Accumulative exposure=this exposure × (past inspection number+1)
Alternatively, in the case of as checking that resume obtain past exposure, accumulative exposure can by following formula come
Calculate.
Accumulative exposure=this exposure+past exposure
It should be noted that update method is an example listed herein, can also be obtained using other computational methods
Lei Plot exposures.
Processing more than, obtains the accumulative irradiation spirogram at surface and the back side respectively.Subsequent processing (step S63~
S67 it is identical with first embodiment) in addition to replacing irradiation spirogram using accumulative irradiation spirogram.
(the advantages of present embodiment)
According to the mechanism of above-mentioned present embodiment, not only have the advantages that identical with first embodiment, also have such as
Lower advantage：In the case where check object thing is subject to multiple X-ray examination, the accumulative photograph with control inspection object will appreciate that
The distribution for the amount of penetrating and the accumulative exposure of each component.
<Other embodiment>
The structure of a above embodiment only of the invention specific example.The scope of the present invention is not limited to
The above embodiment, can carry out various modifications in the range of its technological thought.
For example, in the above-described embodiment, double sided mounting substrate is listed as check object thing, but the present invention also can
Suitable for the inspection (pallet inspection) for the component group being stacked on component tray.In addition, in the above-described embodiment, show
Only from the example of X-ray irradiation above, but the present invention is readily applicable to from above and below the inspection of X-ray irradiations.
In this case, carry out above-mentioned exposure calculating processing respectively to situation about being irradiated from above and situation about being irradiated from below, and it is right
It is added up to calculate accumulative exposure.
Claims (13)
1. a kind of exposure managing device, has：
Exposure calculating part, calculates check object thing by the exposure suffered by X-ray examination,
Information output part, output and the relevant information of exposure of the check object thing,
The exposure managing device is characterized in that,
The check object thing includes multiple components,
The exposure calculating part is based on the position relationship between the radiographic source in the X-ray examination and the check object thing
And the intensity for the X-ray irradiated by the radiographic source, it is calculated as the face of the ray source of the check object thing
The first face exposure distribution and as the check object thing the radiographic source opposite side face the second face
Exposure distribution,
Distribution of the exposure calculating part based on the respective exposure in first face and second face and described more
A respective configuration of component, calculates the exposure of each component.
2. exposure managing device according to claim 1, it is characterised in that
The check object thing includes double sided mounting substrate,
The double sided mounting substrate have printed base plate, be configured at the printed base plate first face component, be configured at it is described
The component in second face of printed base plate.
3. exposure managing device according to claim 2, it is characterised in that
The exposure calculating part considers absorption of the printed base plate to X-ray, to calculate the exposure in second face
Distribution.
4. the exposure managing device according to Claims 2 or 3, it is characterised in that
The exposure calculating part considers to be configured at absorption of the component in first face to X-ray, to calculate described second
The distribution of the exposure in face.
5. exposure managing device according to any one of claims 1 to 4, it is characterised in that
In the case of carrying out multiple x-ray bombardment in primary X-ray inspection, the exposure calculating part calculates each X and penetrates
The exposure of line irradiation simultaneously carries out accumulative addition, so as to calculate the distribution of the exposure of primary X-ray inspection.
6. according to exposure managing device according to any one of claims 1 to 5, it is characterised in that
Also there is determination unit, exposure of the determination unit based on each component calculated by the exposure calculating part, for
Whether each component judges exposure in tolerance.
7. according to exposure managing device according to any one of claims 1 to 6, it is characterised in that
Also have：
Inspection resume storage part, the resume for the X-ray examination that the storage past carries out the check object thing,
Exposure update section, based on the resume, the exposure of X-ray examination was carried out and by the exposure calculating part by the past
The distribution of the exposure calculated and/or the exposure of each component are added up.
8. according to exposure managing device according to any one of claims 1 to 7, it is characterised in that
Described information output section will represent that the irradiation spirogram of the distribution of exposure is exported to display device.
9. according to exposure managing device according to any one of claims 1 to 8, it is characterised in that
Described information output section will represent that the information of the exposure of each component is exported to display device.
10. according to exposure managing device according to any one of claims 1 to 9, it is characterised in that
Described information output section by the exposure for representing each component whether be tolerance information to display device export.
11. a kind of X-ray inspection system, has：
X ray checking device, carries out the X-ray examination of check object thing,
Exposure managing device according to any one of claims 1 to 10, the exposure managing device are exported on the inspection
Look into information of the object by the exposure suffered by the X-ray examination.
12. one kind irradiation quantity management method, has：
Exposure calculation procedure, calculates check object thing by the exposure suffered by X-ray examination,
Information exports step, exports the information of the exposure on the check object thing,
It is described irradiation quantity management method be characterized in that,
The check object thing includes multiple components,
The exposure calculation procedure includes：
Based on the position relationship between the radiographic source in the X-ray examination and the check object thing and from the radiographic source
The intensity of the X-ray of irradiation, is calculated as the exposure in first face in the face of the ray source of the check object thing
Distribution and as the check object thing the radiographic source opposite side face the second face exposure distribution
Step,
Based on the distribution and the respective configuration of the multiple component of the respective exposure in first face and second face,
The step of calculating the exposure of each component.
13. a kind of computer-readable stored record medium, is stored thereon with computer program, the computer program is by based on
Each step of irradiation quantity management method in calculation machine described in perform claim requirement 12.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016-201838 | 2016-10-13 | ||
| JP2016201838A JP6468270B2 (en) | 2016-10-13 | 2016-10-13 | Exposure dose management apparatus and exposure dose management method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107941826A true CN107941826A (en) | 2018-04-20 |
| CN107941826B CN107941826B (en) | 2020-06-02 |
Family
ID=61765023
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710816155.6A Active CN107941826B (en) | 2016-10-13 | 2017-09-11 | Irradiation dose management device and irradiation dose management method |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP6468270B2 (en) |
| CN (1) | CN107941826B (en) |
| DE (1) | DE102017216671A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4130726A4 (en) * | 2020-04-02 | 2024-04-10 | Saki Corp | Inspection device |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102020205996A1 (en) * | 2020-05-13 | 2021-11-18 | Friedrich-Alexander-Universität Erlangen-Nürnberg | Dose estimation for the irradiation of an object |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012163352A (en) * | 2011-02-03 | 2012-08-30 | Yamaha Motor Co Ltd | Management system of x-ray exposure amount |
| CN103890570A (en) * | 2011-11-09 | 2014-06-25 | 雅马哈发动机株式会社 | X-ray inspection method and device |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5812629A (en) * | 1997-04-30 | 1998-09-22 | Clauser; John F. | Ultrahigh resolution interferometric x-ray imaging |
| JPH1119082A (en) * | 1997-06-30 | 1999-01-26 | Toshiba Corp | Image reconstructing apparatus |
| US6744848B2 (en) * | 2000-02-11 | 2004-06-01 | Brandeis University | Method and system for low-dose three-dimensional imaging of a scene |
| JP3999176B2 (en) * | 2003-08-20 | 2007-10-31 | ジーイー・メディカル・システムズ・グローバル・テクノロジー・カンパニー・エルエルシー | X-ray CT apparatus, information processing method, storage medium, and program |
| JP4127699B2 (en) * | 2005-04-25 | 2008-07-30 | アンリツ産機システム株式会社 | Density data conversion method and apparatus, and X-ray inspection system |
| JP4127698B2 (en) * | 2005-04-25 | 2008-07-30 | アンリツ産機システム株式会社 | X-ray inspection equipment |
| JP5002251B2 (en) * | 2006-12-06 | 2012-08-15 | 日本電子株式会社 | Sample inspection method and sample inspection apparatus |
| JP2008224606A (en) * | 2007-03-15 | 2008-09-25 | Omron Corp | X-ray inspection device and x-ray inspection method using x-ray inspection device |
| JP2008284294A (en) * | 2007-05-21 | 2008-11-27 | Toshiba Corp | Radiation control device, and medical image diagnosis apparatus with the same |
| US7453980B1 (en) * | 2007-06-25 | 2008-11-18 | Gilevich Alexander I | Apparatus and method for acquiring an image of an object |
| FR2950059B1 (en) * | 2009-09-16 | 2016-09-16 | Jacret | COMPOSITION FOR STRUCTURAL ADHESIVE |
| JP2011179936A (en) * | 2010-03-01 | 2011-09-15 | Shimadzu Corp | X-ray inspection system |
| JP5283718B2 (en) * | 2011-02-09 | 2013-09-04 | 富士フイルム株式会社 | Radiation image detection apparatus and gain setting method used for radiation image detection apparatus |
| JP6305734B2 (en) * | 2012-11-15 | 2018-04-04 | キヤノンメディカルシステムズ株式会社 | Dose management system |
| JP6109650B2 (en) * | 2013-06-06 | 2017-04-05 | 東芝メディカルシステムズ株式会社 | X-ray diagnostic apparatus, exposure management apparatus, scattered radiation dose distribution forming method, and scattered radiation dose distribution forming program |
-
2016
- 2016-10-13 JP JP2016201838A patent/JP6468270B2/en active Active
-
2017
- 2017-09-11 CN CN201710816155.6A patent/CN107941826B/en active Active
- 2017-09-20 DE DE102017216671.1A patent/DE102017216671A1/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012163352A (en) * | 2011-02-03 | 2012-08-30 | Yamaha Motor Co Ltd | Management system of x-ray exposure amount |
| CN103890570A (en) * | 2011-11-09 | 2014-06-25 | 雅马哈发动机株式会社 | X-ray inspection method and device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4130726A4 (en) * | 2020-04-02 | 2024-04-10 | Saki Corp | Inspection device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107941826B (en) | 2020-06-02 |
| JP2018063183A (en) | 2018-04-19 |
| JP6468270B2 (en) | 2019-02-13 |
| DE102017216671A1 (en) | 2018-04-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Vos et al. | Diffuse interstellar bands in Upper Scorpius: probing variations in the DIB spectrum due to changing environmental conditions | |
| JP4317566B2 (en) | X-ray inspection apparatus and method for generating image processing procedure of X-ray inspection apparatus | |
| US9163986B2 (en) | Method and system for enhancing spectrometer function | |
| US20170023697A1 (en) | Methods and devices for estimating weight of an object to be inspected in an inspection system | |
| JP6734352B6 (en) | Substrate inspection device and substrate inspection method | |
| US10672116B2 (en) | Substrate inspection method and system | |
| CN107941826A (en) | Exposure managing device and irradiation quantity management method | |
| JP6920988B2 (en) | Inspection equipment | |
| Saunders Jr et al. | Resolution and noise measurements of five CRT and LCD medical displays | |
| KR20130128147A (en) | A measurement method of gamma-ray total irradiation dose using ccd or cmos camera | |
| JP6286291B2 (en) | Image processing apparatus, image acquisition apparatus, image processing method, and image acquisition method | |
| Wu et al. | CMB-induced radio quenching of high-redshift jetted AGNs with highly magnetic hotspots | |
| JP2002296022A (en) | Mass measuring method by x-ray and x-ray mass measuring instrument | |
| US20210404974A1 (en) | Dynamic imaging quality control device, storage medium, and dynamic imaging quality control method | |
| CN109075094A (en) | System and method for the wafer inspection with noise margin threshold value | |
| Seillé et al. | Spatial disconnection between stellar and dust emissions: The test of the Antennae Galaxies (Arp 244) | |
| US20170344845A1 (en) | Image information processing device, image information processing system, image information processing method, and recording medium storing image information processing program | |
| Hasenberger et al. | Gas absorption and dust extinction towards the Orion Nebula Cluster | |
| Hupe et al. | A novel method of radiochromic film dosimetry using a color scanner | |
| CN115081469A (en) | Article category identification method, device and equipment based on X-ray security inspection equipment | |
| Gopal et al. | Validity of the line‐pair bar‐pattern method in the measurement of the modulation transfer function (MTF) in megavoltage imaging | |
| JP2013190361A (en) | X-ray inspection device and method for controlling the same | |
| Eckel et al. | Radiographic film system classification and noise characterisation by a camera-based digitisation procedure | |
| WO2021129374A1 (en) | Method and device for identifying changes in composition of object | |
| Flaccomio et al. | Results from DROXO-II.[Ne II] and X-ray emission from ρ Ophiuchi young stellar objects |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |