CN107924143A - Control the method and beam guide device of beam guide device - Google Patents

Control the method and beam guide device of beam guide device Download PDF

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Publication number
CN107924143A
CN107924143A CN201680051162.5A CN201680051162A CN107924143A CN 107924143 A CN107924143 A CN 107924143A CN 201680051162 A CN201680051162 A CN 201680051162A CN 107924143 A CN107924143 A CN 107924143A
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China
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radiation
lighting
scanner
fel
induction element
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CN201680051162.5A
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CN107924143B (en
Inventor
M.帕特拉
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

Abstract

Can will be by different radiation sources (4 by beam guide device (28)i) transmitting lighting radiation (5) towards different scanning instrument (3i) guiding.

Description

Control the method and beam guide device of beam guide device
The priority of patent application claims German patent application DE 10 2,015 212 878.4, its content pass through reference It is incorporated herein.
The device in the beam path radiated the present invention relates to the method and guiding illumination of control beam guide device, particularly guides The device in the beam path of the lighting radiation in the lighting system of projection exposure system.Moreover, the present invention relates to beam induction element. The invention further relates to the lighting system of the projection exposure system with this beam guide device.Moreover, the present invention relates to pair Answer the maintenance of the projection exposure system of lighting system, the method for this projection exposure system of operation and this projection exposure system Method.Finally, micro-structure or the method for nanostructured components are manufactured the present invention relates to a kind of, further relates to what is manufactured according to this method Component.
Free electron laser (FEL) can serve as the radiation source of projection exposure system.Relative to free electron laser The total radiant power sent, the more big then more cost efficient of free electron laser.Therefore, using single FEL as multiple The radiation source of scanner is desired.If the FEL breaks down, anyway, then the FEL influences multiple scanners.
Such as set from the EUV lithography that there is free electron laser and multiple scanners known to 102013211830 A1 of DE It is standby.
The object of the present invention is to provide the method and apparatus of control beam guide device, and projection exposure is improved by the device System, the behaviour of the projection exposure system particularly with least two radiation sources (particularly form is FEL) and multiple scanners Make.
These purposes pass through the method advocated in such as claim 1 and the beam by advocating in such as claim 3 respectively Guide device is realized.
Essence of the invention is that in the method for control beam guide device, in operator scheme, there is provided beam guide device Input at least one output for being input to beam guide device distribution cyclically-varying, the cycle of the wherein change fits Length of exposure assigned in naked core.The ratio of the cycle of change and the length of exposure of naked core especially 1.2 to 2.1 scope In, especially in 0.9 to 1.1 scope.Particularly, the cycle can correspond exactly to the illumination duration of naked core.
Preferably, one in the input of radiation appliance be input to the change of distribution of its output can be by beam induction element Rotation realize.Especially it is to provide the Rotating with Uniform of beam induction element.It can thus be avoided the angle of beam induction element accelerates.
According to other aspects of the invention, bundle device has other operator schemes, and wherein beam guide device is input to beam The constant distribution of the output of guide device limits in advance.
Particularly can the manual switching between two operator schemes.
Therefore, this method is especially suitable for operating multiple scanners with single radiation source and operating with multiple radiation Both scanners in source.Particularly,, can be in two operator schemes once radiation source breaks down such as maintenance purpose Between switch.
Other essence of the present invention are the device for providing the beam path of guiding illumination radiation, by the device, from extremely The lighting radiation of a few radiation source (particularly FEL) can be distributed among the different subsets of scanner.The device is included extremely A few beam induction element and at least one input of lighting radiation and at least two outputs, the beam induction element is at least two It is movable between a displaced position, can be by lighting radiation from least one wherein according to the displaced position of beam induction element Input is directed to the different outputs among at least two outputs.
This beam guide device to shine to multiple scanners (especially at least two groups of scanners) supply using single FEL Bright radiation is possible.Particularly compartment of terrain, particularly sequentially give scanner supply lighting radiation.Astoundingly, This recognized is possible in the case of the loss not manufactured largely.
According to other aspects of the invention, the device include lighting radiation at least two input and lighting radiation at least Two outputs and at least two beam induction elements respectively movable between at least two displaced positions, wherein according to first The displaced position of beam induction element, can by lighting radiation from first input be directed at least two output among it is different defeated Go out, wherein according to the displaced position of the second beam induction element, lighting radiation can be directed to from the second input defeated at least two Different outputs among going out.
It has appreciated that this beam guide device make it that distribution comes from least two among the different subsets of scanner The lighting radiation of a separated radiation source (particularly two FEL) is possible.Especially it is possible to by two FEL to multiple Scanner supplies lighting radiation, any one FEL in two of which FEL, the out of order feelings of another FEL in two FEL Under condition, lighting radiation can also be supplied to scanner, which supplies illumination spoke under basic status by another described FEL Penetrate.Particularly, during service intervals (wherein, a FEL in two FEL is closed), can be by another FEL to projection Whole scanners supply lighting radiation of exposure system.It is desirable that the loss that will not be manufactured in this case.Safeguarding The loss manufactured in interval in particular up to 25%, in particular up to 20%, in particular up to 15%, in particular up to 10%, In particular up to 5%.
Particularly, beam guide device is configured so that the displaced position according to beam induction element, by the illumination spoke from FEL Penetrate and be directed to different outputs, i.e., to different scanning instrument.
Beam guide device is provided to the illumination system with least two free electron lasers (FEL) and multiple scanners System uses.
Beam induction element particularly mirror unit or mirror elements.
According to other aspects of the invention, at least one beam induction element be with control mode by control device can Displacement.
Especially.The time series of the change of distribution can be accurately controlled by control device.Control device can be soft What part was supported.Especially, therefore lighting radiation arrives among different outputs and the distribution of different scanning instrument by means of control dress It is optimizable to put.Especially, the distribution that can will enter into output adapts to the length of exposure of naked core.Particularly, one A radiation source in denier radiation source breaks down, and as a result can be minimized for the loss of handling capacity.
Control device especially has operator scheme, wherein one in realizing the input of radiation appliance is input to radiation dress The cyclically-varying distribution for the output put, wherein corresponds to the duration of the exposure of naked core Cycle accurate.
In addition, control device can preferably have other operator schemes, wherein limiting being input to for radiation appliance in advance Its constant distribution exported.
According to an aspect of the present invention, beam induction element is respectively arranged in the first displacement outside the beam path of lighting radiation In position.Beam induction element is especially arranged so that in the first displaced position no one of they cause the inclined of beam path Turn.
Therefore, beam induction element places also referred to as basic status in their the first displaced position.In basic status Under, what a the proper output in the output of beam guide device is distributed in each input in the input of beam guide device.
According to other aspects of the invention, when in the first displaced position that all beam induction elements are arranged in them, shine Bright radiation can be irradiated in all outputs of beam guide device at the same time.
Particularly, under basic status, the first FEL in the FEL can give the first subset supply illumination of scanner Radiation, at the same the 2nd FEL in the FEL can give scanner yield in the second subset supply lighting radiation, the yield in the second subset with First subset is non-intersect.
According to an aspect of the present invention, the distribution of at least one input being output in input in output, i.e. At least one scanner in scanner is drawn to the distribution of a FEL in the FEL by a beam in beam induction element Guiding element is displaced in the second displacement position in the beam path of lighting radiation to change.
According to an aspect of the present invention, can be displaced to especially by a beam induction element in beam induction element Second displacement position come change input in one be input to output in one output distribution.Clearly, it means that, lead to In beam induction element a displacement of the beam induction element between two displaced position is crossed, will can be come from two FEL The lighting radiation of single FEL toggled between two disjoint subsets of scanner.
, particularly can be specific when a beam induction element in beam induction element is arranged in its second displacement position Time point is exported by the only one in lighting radiation irradiation output.It means that in all cases, it is same in given point in time When can give scanner only one subset supply lighting radiation.However, following article will also be explained, particularly alternatively, lead to Cross the control for having target of the displacement of corresponding beam induction element, it is possible to achieve sequentially supply illumination spoke to different scanning instrument Penetrate.In this case, by the suitable control of the displacement of corresponding beam induction element, manufacture can the loss of energy can reduce, Particularly minimize, be preferably avoided.
According to an aspect of the present invention, at least two beam induction elements in beam induction element are with least frequency of 1Hz It is movable between the first displaced position and second displacement position.This makes it possible to sufficiently rapidly switch from input The beam path of one lighting radiation for being input at least two different outputs.Beam induction element be it is movable with certain frequency, The frequency can be with especially at least 2Hz, especially at least 3Hz, especially at least 5Hz, especially at least 10Hz.
Beam guide device can also include other beam induction elements with relatively low displacement frequency.This beam induction element can To be favourable, in order to realize that the lighting radiation from different FEL at identical output there is equidirectional (to be particularly identical Directional spreding) effect.Particularly during whole service intervals, the slower beam induction element in beam induction element can be kept In its second displacement position.If according to the present invention it has appreciated that corresponding beam induction element be only it is quasi-static can Mobile, therefore be enough.
According to an aspect of the present invention, beam induction element respectively includes at least one rotatably mounted mirror unit. Mirror unit can especially include multiple mirror surfaces.Mirror unit can especially include multiple radiation transmission regions. Mirror unit especially has controllable speed.Preferably, except controllable frequency, mirror unit also have constant Angular speed.Therefore can be to avoid acceleration and moderating process.
It has appreciated that for displacement for beam induction element, if reflection of the beam induction element along them The tangential displacement on surface, then be favourable.In the case of plane mirror, this corresponds to the straight line parallel to mirror surface Displacement.In the case of curved reflector, particularly in the case of the speculum with constant curvature radius, this can pass through circle Morpheme is moved (being pivoted) and is realized.
Other objects of the present invention are to improve this beam induction element.
According to an aspect of the present invention, beam induction element includes the multiple reflecting surfaces implemented in a curved fashion, it is bent Rate radius corresponds exactly to its distance with rotation axis.It is thereby achieved that lighting radiation passes through beam induction element Deflection even when beam induction element rotates the special time cycle also to be constant.Due to the rotation of beam induction element, if Lighting radiation is not again incident on identical reflecting surface, then deflection standard is instantaneously switched.
The quantity of the reflecting surface of beam induction element especially at least 2.The quantity can also be 3,4,5,6 or more than 6.
According to other aspects of the invention, near reflection surface is spaced apart from each other in all cases by intermediate region. Intermediate region, which is particularly, may be embodied as transmissive radiation.In this case, if lighting radiation does not expose to reflection table A reflecting surface in face, lighting radiation can be to pass through beam induction element and from the influences of beam induction element.Therefore, Shu Yin Guiding element make it that it is possible to guide lighting radiation periodically on the direction that difference limits in advance.This especially causes at two not Equidirectional upper alternately guide lighting radiation is possible.
When beam induction element Rotating with Uniform, guide the duration of lighting radiation can be by by reflecting in particular directions The angular range of surface and/or the covering of the intermediate region of transmitted radiation influences.Angular range can be identical in all cases 's.They can also be different.
Other objects of the present invention are to improve the lighting system of projection exposure system and this projection exposure system.
These purposes pass through including being realized according to the lighting system of above-described beam guide device.Advantage sees beam guiding Device has the advantage that.
Particularly, the radiation source of lighting system is free electron laser (FEL).
Particularly, by means of beam guide device, single radiation source or two or more radiation sources will can be come from (especially That form is free electron laser (FEL)) lighting radiation divided among multiple scanners so that in basic status Under, disjoint subset supply lighting radiations of each FEL to scanner in the FEL, but one in the FEL In the case that FEL breaks down, another FEL supplies lighting radiation to two subsets of scanner, particularly gives projection exposure Whole scanners supply lighting radiation of system.
According to the present invention, by lighting system, especially by beam guide device, it is possible to reduce (particularly avoiding) is special It is the loss that can be manufactured caused by the failure (especially because maintenance work) of FEL.
According to an aspect of the present invention, beam guide device is respectively arranged in the beam of the lighting radiation in output coupling unit downstream In path.Therefore lighting radiation is neatly toggled between the scanner that can be mutually distributed in couples in different subsets.
In this case, output coupling unit is used to produce the multiple independent output bundles for carrying out self aggregation output bundle.Individually Output bundle is respectively used to supply lighting radiation to independent scanner.Assembling output bundle can be by beam shaping optical unit from by radiating The original beam shaping that source is sent.
According to an aspect of the present invention, each radiation source being arranged into two radiation sources distributes N number of sweep respectively The group of instrument is retouched, and to distribute the specific scanner in another group to each scanner in one group, wherein according to such as above The beam guide device of description is provided to the scanner of different groups of corresponding two mutual phase partitionings.
Particularly, the scanner in different groups mutually distributes in couples.By beam guide device, scanner can be directed to It is to guide the lighting radiation from radiation source to which scanner per a pair of control, or especially control at what point in time will Which scanner lighting radiation from radiation source is guided to.Especially it is possible to come between two scanners mutually distributed Switchback brings the lighting radiation from a radiation source in the radiation source, and therefore do not influence for projection exposure system other Scanner supplies lighting radiation.
Thus it is improved to the flexibility of independent scanner supply lighting radiation.Therefore, the loss of manufacture can also be further Reduce, particularly minimize, be particularly avoided by completely.The details of this respect in the method being more expressly recited from will hereafter become Obviously.
According to other aspects of the invention, beam guide device is arranged in the Shu Lu of the lighting radiation of output coupling unit upstream In footpath.
This is with following advantage：The Shu Lu of the lighting radiation of multiple scanners can be simultaneously influenced by beam guide device Footpath.
In the modification, extra optical component (such as optical component of beam shaping) and/or output coupling optical unit Component can also be incorporated into beam guide device.
In principle, single Optical devices are may be embodied as beam guide device and output coupling optical unit, particularly Single optical module.Particularly, beam guide device can be incorporated into output coupling optical unit.Can also be by output coupling light Unit is learned to be incorporated into arrangement for deflecting.
According to an aspect of the present invention, by each radiation source of two radiation sources be respectively allocated to one group of scanner and According to above-described beam guide device, scanner in one of which scanner a to radiation source in two radiation sources Distribution can be changed by means of beam guide device.
This makes it possible to change distribution of the scanner to radiation source in a particularly simple way.
From the advantage in lighting system, the advantage for projecting exposure system is obvious.
According to the present invention, by lighting system, especially by beam guide device, it is possible to reduce (particularly fully keep away Exempt from) loss of manufacture when a FEL breaks down.
According to the present invention, by beam guide device, the radiation usually from single FEL especially can be efficiently distributed in Between two groups of scanners.This particularly results in the raising of efficiency, particularly the increase of handling capacity.
Other objects of the present invention are the method for improving operation projection exposure system.
The purpose is realized by the following method：Different scanning instrument wherein to projection exposure system, which is supplied from form, is The lighting radiation of the single radiation source of FEL, wherein by according to above-described beam guide device by the illumination from the FEL Deflection of radiation is to the different scanning instrument in scanner spaced apart.In such case, it is contemplated that the possible different sizes of naked core, Naked core can be assigned to different scanning instrument.
According to an aspect of the present invention, distribution of the naked core to scanner is limited so that caused by the failure of a FEL The loss of manufacture be reduced, particularly minimize, be particularly avoided by completely.In other words, determine naked core to scanner Distribution so that the efficiency for projecting exposure system improves, and particularly maximizes.Particularly, in this case, the dead time (is wherein Offer lighting radiation is provided, the exposure of naked core does not occur yet) it can be reduced, particularly minimize, be particularly avoided by completely.
According to an aspect of the present invention, can be classified according to the size of naked core to be exposed, naked core to be exposed, it is special It is not to classify again.So, the naked core particularly can be divided into two groups so that first group of all naked cores are more than or equal to The size of second group of all naked core.So, naked core is assigned to scanner so that and the scanner of one group of naked core is synchronously exposed, The scanner of another group of naked core is exposed at the same time at the same time.
According to other aspects of the invention, it is arranged to determine the naked core for the maximum that the size difference of naked core limits in advance It is right, then corresponding scanner is mutually distributed in couples, and the naked core of the predetermined naked core pair of rapid alternation, wherein for Naked core described in rapid alternation, a beam induction element in beam induction element respectively carry out return between two displaced position Move.
Thus the loss of manufacture can be reduced, particularly minimize, especially for good.
Maximum difference in particular up to 25%, in particular up to 10% in size between two paired naked cores, especially It is at most 5%, in particular up to 3%, in particular up to 1%.
According to other aspects of the invention, in order to determine the set of N number of naked core to be exposed in the definite time cycle, N number of naked core is selected from whole naked cores so that between the minimum naked core in maximum naked core and the naked core in the naked core The full-size that size difference is less than all naked cores is poor.
Other objects of the present invention are to improve the method for safeguarding projection exposure system.
The present invention realizes by the following method：During the maintenance time cycle of a FEL, all of exposure system are projected Scanner supplies lighting radiation by another FEL.In this case, especially it is arranged to the illumination of the FEL from activity Radiation is directed to scanner different scanning instrument spaced intermediate.In such case, it is contemplated that the possible different size of naked core, naked Core can be assigned to different scanning instrument.
Other objects of the present invention are to improve manufacture micro-structure or the method for nanostructured components.
The purpose is realized by providing exposure system according to the present invention.
This method particularly results in the loss of reduced manufacture and therefore causes to improve manufacture rate.Particularly result in raising The time averagely manufacture rate of independent scanner.
From the description of the exemplary embodiment of refer to the attached drawing, further advantage, details and feature of the invention are aobvious and easy See.In attached drawing：
Fig. 1 shows the schematic diagram of the component parts of the projection exposure system including multiple scanners；
Fig. 2 shows the schematic diagram of the projection exposure system that there is the beam changed to guide according to Fig. 1；
Fig. 3 shows the schematic diagram of the first modification of movable beam induction element；
Fig. 4 shows the schematic diagram of other modifications of movable beam induction element；
Fig. 5 shows the schematic diagram of other modifications of movable beam induction element；
Fig. 6 shows the schematic diagram of other modifications of movable beam induction element；
Fig. 7 shows the schematic diagram of other modifications of movable beam induction element；
Fig. 8 shows the schematic diagram of other modifications of movable beam induction element；
Fig. 9 shows the schematic diagram of the time series for the operator scheme for illustrating the projection exposure system according to Fig. 1；
Figure 10 shows the schematic diagram of the operator scheme of the projection exposure system according to Fig. 2 according to Fig. 9；
Figure 11 shows the schematic diagram of other modifications of the projection exposure system according to Fig. 1；
Figure 12 shows the schematic diagram of the modification on the operator scheme according to Figure 10；
Figure 13 shows the schematic diagram corresponding to Figure 12, wherein illustrating the order of scanner with mode classification again；
Figure 14 and 15 shows the schematic diagram of other modifications of the operator scheme of projection exposure system；
Figure 16 shows the schematic diagram of other modifications of projection exposure system；
Figure 17 shows the schematic diagram according to Figure 10 of alternative, wherein the naked core on scanner 1 to 3 and scanner 4 Naked core length on to 6 is identical or longer than the naked core on scanner 4 to 6.
Figure 18 A to 18D show the local schematic diagram of the alternate embodiment of the projection exposure system according to Fig. 1, it has There are the different displaced positions of beam induction element；And
Figure 19 shows the schematic diagram of the alternate embodiment of the projection exposure system according to Fig. 1.
First, the main composition part of projection exposure system 1 is described hereinafter with reference to Fig. 1.
Hereafter carry out will projection exposure system 1 be subdivided into subsystem be initially used for its concept description.Subsystem can be with shape Component is from structure sub-systems.However, being divided into subsystem not have to be reflected in structuring description.
Projection exposure system 1 includes two radiation source modules 2 and multiple scanners 3i.The component parts of radiation source module 2 It can be combined with into single radiation source module 2.
Radiation source module 2 respectively includes the radiation source 4 for producing lighting radiation 5.
Particularly, radiation source 4 is free electron laser (FEL).It can also include and produce the phase with very high briliancy The sychrotron radiation source of dry radiation or the radiation source based on synchrotron light.For example, on this radiation Source, with reference to 103 58 225 B3 of US 2007/0152171 A1 and DE.
Radiation source 4 has the mean power that such as scope is 1kW to 25kW.It has the arteries and veins that scope is 10MHz to 10GHz Rush frequency.For example, each, individually pulses of radiation can be equivalent to the energy of 83 μ J.Given pulses of radiation width is 100fs, it It is 833MW corresponding to pulses of radiation power.
Radiation source 4 can also have the repetitive rate of kilohertz range (such as 100kHz), or in low section of megahertz range (example Such as 3MHz), in stage casing megahertz range (such as 30MHz), in high section megahertz range (such as 300Mhz), or even thousand Megahertz range (such as 1.3GHz).
Particularly, radiation source 4 is EUV radiation source.Radiation source 4 is particularly launched for example between 2nm and 30nm, particularly The EUV radiation source in wave-length coverage between 2nm and 15nm.
Radiation source 4 launches the lighting radiation 5 that form is original bunch 6.Original bunch 6 has the divergence of very little.Original bunch 6 Divergence can be less than 10mrad, especially less than 1mrad, especially less than 100 μ rad, especially less than 10 μ rad.In order to Easy to the description of position relationship, underneath with Cartesian xyz coordinate system.X coordinate regularly crosses over lighting radiation together with y-coordinate 5 beam cross-section.Regularly advance in the radiation direction of lighting radiation 5 in z directions.In the region of object plane 21 and image plane In 24 region, y-axis is advanced parallel to scanning direction.X-axis is advanced perpendicular to scanning direction.By radiation source 4 in specific direction Upper transmitting original bunch 6.The direction is hereinafter also referred to as being directed toward P.
Original bunch 6 can have the etendue less than 0.1mm2, especially less than 0.01mm2.Etendue is Refer to the minimum volume of phase space, which includes the 90% of the energy for the lighting radiation 5 launched by radiation source 2.Such as The definition of corresponding etendue can be found in 6 198 793 B1 of EP 1 072 957 A2 and US.
Radiation source module 2 also respectively includes the beam shaping optical unit 7 for being arranged in the downstream of radiation source 4.Beam shaping optics list Member 7 is used to produce aggregation output bundle 8 from original bunch 6.Aggregation output bundle 8 has very small divergence.Assemble output bundle 8 Divergence can be less than 10mrad, especially less than 1mrad, especially less than 100 μ rad, especially less than 10 μ rad.
Particularly, original bunch 6 or aggregation output bundle 8 diameter can be influenced by beam shaping optical unit 7.Especially It is that the extension of original bunch 6 can be realized by beam shaping optical unit 7.Original bunch 6 can be extended by beam shaping optical unit 7, Particularly spreading factor is at least 1.5, is especially at least 2, is especially at least 3, is especially at least 5, especially at least For 10.Spreading factor is especially less than 1000.Original bunch 6 can also be extended in various degree in different directions.Particularly, Can be more wider than being extended on y direction in the x direction.In this case, in object field 11iRegion in y directions pair Should be in scanning direction.The hair of divergence, especially less than original bunch 6 of original bunch 6 can be less than by assembling the divergence of output bundle 8 The half of divergence.
Alternatively, original bunch 6 can be more wider than expanding in the x direction in y-direction.Spreading factor difference can be special The independent output bundle 10 produced afterwards is not approximately equal toiSum.
For the further detail below of beam shaping optical unit, referring to DE 10 2,013 223 935.1, it is hereby incorporated into In the application.In all cases, beam shaping optical unit 7 can include one or two particularly respectively with two speculums A beam shaping speculum group.Particularly, beam shaping speculum group is for being mutually perpendicular to plane, (it to be parallel to aggregation output bundle 8 The direction of propagation) in aggregation output bundle 8 beam shaping.
Beam shaping optical unit 7 can also include other beam shaping speculums.
Beam shaping optical unit 7 can include particularly column speculum, in particular at least one convex surface and at least one Concave surface column speculum.Beam shaping optical unit can also include the speculum with free form profile.This speculum exists Have in the case of various and do not appear as coniform height profile.
In addition, by beam shaping optical unit 7, the intensity distribution of original bunch 6 can be influenced.
Moreover, radiation source module 2 can respectively include the output coupling optical unit for being arranged in 7 downstream of beam shaping optical unit 9.Output coupling optical unit 9 is used to produce multiple (i.e. n) individually output bundle 10 from aggregation output bundle 8i(i=1 to n).It is single Only output bundle 10iEach self-forming lighting field 11iBeam.Independent output bundle 10iIt is individually assigned to scanner 3iIn one sweep Retouch instrument.Independent output bundle 10iBeam can each include multiple separated part beams 12i。
Particularly, radiation source module 2 is respectively arranged in the shell of vacuum-pumping.
Scanner 3iRespectively include beam guiding optical unit 13iWith projection optical unit 14i。
Scanner 3iBeam guiding optical unit 13iFor (lighting radiation 5 to be particularly corresponding individually output bundle 10i) It is directed to single scanner 3iObject field 11i。
Projection optical unit 14iRespectively it is used to that object field 11 will be arranged iniOne of in reticle 22iIt is imaged onto image field 23i On, in particular to it is arranged in image field 23iIn chip 25iOn.
Beam guides optical unit 13iOrder according to the beam path of lighting radiation 5 respectively includes：Deflectiometry unit 15i, it is defeated Enter coupling optical unit 16i(particularly form is focusing sub-assembly) and illumination optics unit 17i.Input coupling optical unit 16i Wolter type III optical collectors can also be especially embodied as.
Deflectiometry unit 15iIt can also be merged into output coupling optical unit 9.Output coupling optical unit 9 can be with It is especially done so as to by independent output bundle 10iDeflect to desired orientation.According to a modification, deflectiometry may be omitted with Unit 15iIt is overall.In general, output coupling optical unit 9 and deflectiometry unit 15iOutput coupling arrangement for deflecting can be formed.Root According to other modifications, output coupling optical unit 9 can also respectively be arranged in deflectiometry unit 15iIn the beam path in downstream.These Different modifications are related to all exemplary embodiments described below.
On deflectiometry unit 15iDifferent modifications, should refer to such as DE 10 2,013 223 935.1, it is thus A part as the application is incorporated into the application.
Input coupling optical unit 16iThe lighting radiation 5 for being particularly used to be produced by output coupling optical unit 9 is (special It is not independent output bundle 10iIn one) be coupled to illumination optics unit 17iIn corresponding one in.
In all cases, beam guiding optical unit 13iWith beam shaping optical unit 7 and output coupling optical unit 9 one Act the component parts for forming lighting device 18.
Lighting device 18 (as radiation source 4) is the component of lighting system 19 in all cases.
Illumination optics unit 17iIn each distribute projection optical unit 14 respectivelyiIn one.The photograph distributed each other Bright optical unit 17iWith projection optical unit 14iOptical system 20 is also known as togetheri。
Illumination optics unit 17iRespectively it is used to lighting radiation 5 being transferred to be arranged in object plane 21iIn object field 11iIn cover Mould mother matrix 22i.Projection optical unit 14iFor by reticle 22i(particularly in reticle 22iOn imaging arrangement) into As to the image field 23 being arranged in image plane 24iOn chip 25iOn.
Projecting exposure system 1 includes especially at least two, especially at least three, especially at least four, is particularly At least fiveth, especially at least six, especially at least seven, especially at least eight, especially at least nine, particularly extremely Few ten scanners 3i.20 or more scanners 3 can also be included by projecting exposure system 1i.According to radiation source module 2 Embodiment, in particular according to the quantity of radiation source 4, projection exposure system 1 can for example further include up to 100 scanners 3i。
By sharing radiation source module 2 scanner 3 is given (particularly by radiation source 4)iLighting radiation 5 is provided.
Projection exposure system 1 is used to manufacture micro-structure or nanostructured components, particularly electronic semiconductor component.
Input coupling optical unit 16iIt is arranged in radiation source module 2 (the particularly output coupling optical unit 9) and shines Bright optical unit 17iIn corresponding one between beam path in.Particularly, input coupling optical unit is embodied as focusing on combination Part.Input coupling optical unit is used for independent output bundle 10iIn corresponding one be transferred in intermediate focal plane 27 Between focus 26i.Intermediate focus 26iScanner 3 can be arranged iniOr optical system 20iShell port region in. Particularly, shell is vacuum-pumping.
Illumination optics unit 17iRespectively include the first facet speculum and the second facet speculum, its function respectively correspond to from The function of facet speculum well known in the prior art.Especially, the first facet speculum can be field facet mirror.Especially Ground, the second facet speculum can be pupil facet speculums.However, the second facet speculum can also be arranged in away from illumination light Learn unit 17iPupil facet a distance at.The normal conditions are also referred to as specular reflector.
In all cases, facet speculum includes multiple first and second facets respectively.In the behaviour of projection exposure system 1 During work, each in the first facet distributes one in the second facet respectively.In all cases, the facet distributed each other Formed with specific illumination angle illumination object field 11iLighting radiation 5 illumination passage.
According to desired illumination, the illumination setting particularly limited in advance, carries out the second facet to the first facet by logical Road distributes.The facet of first facet speculum may be embodied as so that they are movable, particularly tiltable, particularly Respectively there are two inclined frees degree.The facet of first facet speculum is particularly changeable between the different positions. In different switching positions, they are assigned to the second different facets in the second facet.Can also be set in all cases At least one switching position of one facet, wherein the lighting radiation 5 being radiated in the first facet does not contribute to object field 11iPhotograph It is bright.The facet of first facet speculum may be embodied as virtual facet.This should be understood to the meaning for they pass through it is multiple individually The variable combination of speculum (particularly multiple micro-reflectors) and formed.On details, it should with reference to WO 2009/100856 A1, during it is incorporated herein as the part of the application.
The facet of second facet speculum can accordingly be embodied as virtual facet.They can also accordingly be embodied as making They be it is movable, it is particularly tiltable.
Via the second facet speculum, and if any via the biography in the downstream for example including three EUV mirrors Defeated optical unit (not shown in FIG.), the object field 11 in reticle or object plane 21 is imaged onto by the first facetiIn.
Individually illumination passage causes with specific illumination angle illumination object field 11i.Therefore illumination optics unit 17 is passed throughi, illumination Passage integrally causes object field 11iIllumination light angle distribution.Light angle distribution also referred to as illumination setting.
In illumination optics unit 17iOther embodiment in, particularly given projection optical unit 14iEntrance pupil it is suitable Position, may be omitted with object field 11iThe speculum of the transmission optical unit of upstream, causes the corresponding biography added using radiation beam It is defeated.
The reticle 22 of structure with indirect illumination radiation 5iArrange object field 11iRegion in object plane 21 in.Cover Mould mother matrix 22iCarried by reticle clamper.Reticle clamper can the displacement by way of gearshift driving.
Projection optical unit 14iIn all cases by object field 11iThe image field 23 being imaged onto in image plane 24iIn.Projection exposes Between photophase, chip 25iArrange in the image plane 24.Chip 25iWith by project exposure system 1 project expose during expose The light sensitive layer of light.Chip 25iCarried by wafer holder.Chip mother matrix clamper can be by way of gearshift control Displacement.
The gearshift of reticle clamper signal can connect each other with the gearshift of wafer holder.Especially It is that they are synchronous.Reticle 22iWith chip 25iParticularly with movable on mode synchronized with each other.
Structure is installed on reticle 22iOn.The surface region of mounting structure is hereinafter also referred to as naked core thereon.It is naked Core is typically larger than object field 11i, for this reason, being imaged onto chip 25iOn need reticle 22iWith chip 25iSynchronous scanning fortune It is dynamic.During the time cycle of scanning process, if only part object field 11iCovered by naked core, then object field 11iRemaining area Domain can cover diaphragm by moveable reticle and cover.
As scanning with exposure technology as a result, in chip 25iLight sensitive layer on there is the first approximate representation size and subtract The structure of the picture of small naked core.Chip 25iOn the picture of this naked core generally comprise one or more micro-lithography or nanometer light Carve all structures of component (such as semiconductor chip).Therefore, naked core particularly can include structure, which is more than belonging to Complete the chip 25 of processingiSingle semiconductor chip after being cut.
Each reticle 22iWhat a proper naked core generally comprised.Reticle 22iFull-size be normally limited, And therefore the full-size of naked core is also restrained.However, naked core can be less than the full-size.
It is respectively allocated to scanner 3iDifferent reticles 22iIt can bear same or different naked core.Reticle 22iIt is typically interchangeable in an automated way, and be interchangeable between different scanning instrument.It is logical to project exposure system 1 It can make particular mask mother matrix 22 often with havingiIt is introduced in specific scanner 3kIn system so that one or more chips 25kThen exposed by corresponding naked core by the scanner.On the contrary, this means the exposure for specific naked core, it is corresponding to cover Mould mother matrix 25iHave to be introduced in scanner 3kIn.
One advantageous embodiment of lighting system 19 is described below.
It has appreciated that free electron laser (FEL) or radiation source based on synchrotron can be advantageously As radiation source 4.FEL sizes are very good, you can particularly economically to operate, particularly if design is sufficiently large to multiple Scanner 3iLighting radiation 5 is provided.In all cases, FEL can be particularly to eight, ten, 12 or even 20 A scanner supplies lighting radiation 5.
If one of FEL breaks down, such as is closed because must not be not related to due to maintenance work, then this has and is directed to Corresponding multiple scanners 3iResult.In the case of no appropriate compensation measure, carried by the FEL under basic status For the scanner 3 of lighting radiation 5iIt can then leave unused.For efficiency reasons, this is undesirable.
According to the invention it has been recognized that be can by means of including at least two FELs as radiation source 4iProjection Exposure system 1 solves the problems, such as this.Term radiation source 4iHereinafter alternately used with FEL.
, if necessary can be neatly by the lighting radiation from two FEL in different scanning by beam guide device 28 Instrument 3iIn divided.In this case, it is arranged to the first FEL particularly under basic status and provides radiation illumination to sweeping Retouch the first subset 3 in instrument1To 3N, while the 2nd FEL under basic status provides lighting radiation 5 to second in scanner Subset 3N+1To 32N.If one in the FEL is broken down, such as is closed because must not be not related to for maintenance work, then Another in the FEL can give all scanners 3iLighting radiation 5 is provided.It is described in more detail below.Beam guiding dress The component parts of radiation source module 2 can be formed by putting 28.It especially forms the component parts of lighting system 19.
Two subsets can also include the scanner 3 of varying numberi。
Below based on two radiation sources 41, 42Projection exposure system 1 describe the present invention central scope.This should not This is understood to restricted.Principle according to the present invention can extend to greater amount of radiation source 4 without any queryi Situation.Projection exposure system 1 can also particularly include three, four, five, six or more radiation sources 4i(especially It is that form is FEL).
According to the invention it has been recognized that in chip 25iExposure during, existence time interval, during it, Scanner 3iIn at least some scanners need not to be supplied lighting radiation 5, or do not supply the maximum of lighting radiation 5 at least Intensity.This is for example, if the situation of so-called reticle masking diaphragm part (particularly complete) closure.This can be special It is the situation in the time cycle between exposing two continuous naked cores.Especially, this can be if chip 25iDisplacement, together When relevant reticle 22iFixed situation.
According to the invention it has been recognized that scanner 3iIn give a scanner need to be supplied illumination spoke 5 are penetrated, is generally only at most the 70% of the time, particularly only at most 60%, in particular up to about 55%.According to the present invention, also It has appreciated that the fact can be utilized so that need not be to scanner 3iIn a specific scanner supply shine In the time interval of bright radiation 5, there is provided the lighting radiation 5 to the scanner is directed into scanner 3iIn another scanning Instrument.
Describe below beam guide device 28 various embodiments and provided by guiding illumination radiation 5 method it is a variety of Embodiment.
The first exemplary embodiment according to Fig. 1 and 2, beam guide device 28 include first for each FEL Speculum 291、292With the second speculum 301、302。
Speculum 29i、30iIt is usually formed beam induction element.Speculum 29i、30iIt is movable, particularly with actuatable Mode it is movable.
First speculum 29iRespectively there is reflecting surface 33.
Under the basic status illustrated in by Fig. 1, all speculums 29 of beam guide device 28i、30iArrangement Outside the beam path of lighting radiation 5.The speculum 29 of beam guide device 28i、30iTherefore it is useless under basic status.
Speculum 29i、30iBetween two displaced positions it is respectively particularly movable.Here, the first displaced position makes Obtain speculum 29i、30iIt is arranged in outside the beam path of lighting radiation 5.Speculum 29i、30iSecond displacement position be chosen to or Accurately it is set to so that by speculum 292、302In the case of being positioned in its second displacement position, by the beam of lighting radiation 5 Path is from the second radiation source 42It is directed to the first subset 3 of scanner1To 3N(see Fig. 2).Therefore, will be in its second displacement position Speculum 291、301Lighting radiation 5 from the first radiation source 41The yield in the second subset 3 being directed in scannerN+1To 32N。
Particularly, speculum 29i、30iIt is done so as in corresponding speculum 29i、30iIt is arranged in its second displacement position In in the case of, two radiation sources 4 will be come fromiIn the lighting radiation 5 of one output coupling optics list is directed to incidence angle Member 9j, particularly it is directed to corresponding scanner 3jInput, the incidence angle correspond precisely under basic status from other radiation Source 4jLighting radiation 5 incidence angle.On scanner 3i, on lighting radiation 5 incidence angle difference therefore do not result from From speculum 29i、30iDisplacement.
In general, by beam guide device 28, especially by speculum 29i、30iDisplacement, can control beam guide fill Put the lighting radiation 5 between 28 at least two inputs and its at least two outputsiGuiding.Here, it is arranged to radiation source 4i FEL be separately dispensed into one of input of beam guide device 28.Scanner 3iSubset be separately dispensed into beam guide device 28 One of output (see the schematic diagram in attached drawing).
Ordinary circumstance is not only restricted to, in order to which the conception of the present invention is explained below, it is assumed that such as radiation source 41It is intended that Maintenance purpose and stop (see Fig. 2).In this case, it is arranged to the second speculum 302It is displaced to its second displacement position In.Second speculum 302It can be maintained at during whole maintenance process in second displacement position.If the second speculum 30i Be slowly, quasi-static ground it is moveable, then be enough.
First speculum 292The displacement back and forth between its first and second displaced positions, in order in the first radiation source 41's During maintenance process, the first subset 3 in scanner1To 3NWith the yield in the second subset 3 in scannerN+1To 32NBetween switch shine The purpose of bright radiation 5.In fig. 2, from the first speculum 292Different displaced positions produce lighting radiation 5 two Shu Lu Footpath, such as by corresponding to the speculum 29 in different displaced positions2The dashed line form of dashed line form illustrate.
First speculum 29iBetween the first and second displaced positions can displacement back and forth, preferably frequency for extremely Few 1Hz, especially at least especially at least 2Hz, especially at least 3Hz, especially at least 5Hz, 10Hz.
Setting is used for displacement-reflection mirror 29i、30iActuator meet projection exposure system 1 (particularly EUV projection exposure System 1) normal condition.
Actuator is suitable for vacuum or causes them to be suitable for the encapsulation of vacuum.They to hydrogen atom, particularly also to from The hydrogen of sonization is insensitive.They do not include the material of possible gas leakage, may particularly cause the speculum of EUV projection exposure systems Pollution material or by they encapsulate so that prevent these materials occur.
Actuator advantageously without abrasion, i.e., when actuating member moves, does not then discharge particle, or encapsulation actuator causes Particle is prevented to occur.
Actuator is low-maintenance amount, preferably without maintenance.
Control device 35 sets speculum 29 in order to controli、30iDisplacement.Control device 35 can include computing unit.
First speculum 29 is described below with reference to Fig. 3 to 8iDisplacement a variety of options.
In Fig. 3 to 8, the first speculum 29iMoving direction schematically said by four-headed arrow 32 in all cases It is bright.
As schematically illustrated in figure 3, the first speculum 29iCan install so that its in a manner of activatable on rotation Axis 31 can be pivoted.
Alternatively, as in Fig. 4 for example, the first speculum 29iIt can be particularly perpendicular to lighting radiation 5 Direction on be linearly displaceable.
Suitable actuator particularly lorentz actuator, it especially has coil magnet arrangement.This actuator can To realize movement that is rotating or being pivoted and also translational motion.
It can also use pneumatic and/or hydrodynamic(al) actuator.In principle, the other types of actuator are can also use, Such as such as piezo-activator, bimetallic actuator or the actuator based on marmem.
Bearing may be embodied as bending part.Bending part is advantageously implemented as friction free and/or without abrasion.Bearing It can also be embodied as magnetic bearing.Especially, magnetic bearing can be non-contacting.
In addition, bearing may be embodied as rolling bearing, ball bearing is particularly.It can be provided suitable for the lubricant of vacuum For lubricating bearing.It can also use sliding bearing.Sliding bearing advantageously friction free or is encapsulated as so that lost material Bearing can not be left.
According to the invention it has been recognized that in order to by speculum 29iIt is accurately located in displaced position, if institute Tangential displacement of the speculum along its reflecting surface is stated, then is favourable.Schematically show in figs. 5 and 6 to strain type. According in the modification of Fig. 5, speculum 29iReflecting surface implement in curved manner.Here, its radius of curvature is especially accurate Corresponding to the distance with rotation axis 31.
In speculum 29iCurved embodiment in the case of, be preferably set to also implement second in curved manner Speculum 30i, second speculum followed by first speculum in the beam path of lighting radiation 5.With the first reflection Mirror 29iRelevant second speculum 30iParticularly it is done so as to by the first speculum 29iCurvature caused by primary beam fan Go out again by the second speculum 30iSuitable curvature and compensate.
In speculum 29iReflecting surface plane embodiment in the case of, along reflecting surface tangent line displacement essence Really correspond to the linear displacement of reflecting surface plane.The alternative schematically illustrates in figure 6.
According to the first speculum 29 of Fig. 5 or Fig. 6iDisplaceability and embodiment in the case of, on direction of displacement Accurate realize of displaced position is not especially important.As long as lighting radiation 5 exposes to speculum 29iOn, independently of the reflection The definite displaced position of mirror, then transmits the lighting radiation.Therefore, the first speculum 29iDisplacement, particularly its quick Displacement, is greatly simplified.
Fig. 7 and 8 illustrates the first speculum 29iEmbodiment and its arrangement in the beam path of lighting radiation 5 its His two alternatives.In these alternatives, the first speculum 29iIt is embodied as rotatably mounted mirror unit.In Fig. 7 and In 8 example, the first speculum 29iRespectively there are four reflecting surfaces 33.
Speculum 29iThere can also be the reflecting surface 33 of varying number.It has in particular at least one, particularly extremely It is two few, especially at least three, especially at least four, especially at least five, especially at least six reflecting surfaces 33.
The embodiment of reflecting surface 33 respectively corresponds to exemplary embodiment illustrated in fig. 5.
Particularly, the first speculum 29iIt is rotatably mounted on rotation axis 31.It can have constant rotary frequency Rate.Speed can be controllable.
In the case of Rotating with Uniform, the lighting radiation 5 in swing circle is incident on a reflection in reflecting surface 33 Ratio on surface is regularly limited in advance.Speculum 29iWhole reflecting surface 33 is particularly done so as to accurately to form First speculum 29iCircumferential area half.It is constant it is rotating in the case of, this cause duty cycle be 1:1, i.e. lighting radiation Time span of 5 average incidents on one in reflecting surface 33 is incident on two reflecting surfaces 33 with the lighting radiation 5 Between time span on one in the intermediate region 34 that provides it is just identical.
The duty cycle of replacement is equally possible.The latter is particularly 45:55 and 55:Between 45.
In the case of the embodiment being illustrated in Figure 8, intermediate region 34 is embodied as radiation transmission formula.
Speed is particularly adapted in chip 25iThe size of upper naked core to be exposed.If naked core is limited in advance Size, once speed has been set appropriately, then speed can be kept constant.Particularly, in the practical operation phase Between (i.e. during the exposure of naked core), it is not necessary to any angle accelerates.
Speed can be set, in particular so that speculum 29iReflecting surface 33 in a reflecting surface be located at When the duration of time cycle in the beam path of lighting radiation corresponds precisely to the classification duration of a naked core in naked core Between.Therefore, the duration of one that lighting radiation is incident in the intermediate region 34 between two in reflecting surface 33 can To correspond precisely to the duration of the exposure of naked core.
Preferably balance speculum 29i.This can be for example by the appropriate shaping of mirror frame and realization, the speculum Frame can be arranged in before the plane of the attached drawing in such as Fig. 7 and 8 and/or below.
Under basic status, i.e., when all radiation sources 4iWhen launching lighting radiation 5, the first speculum 29iEspecially it is arranged as making Obtaining it does not cause the deflection of lighting radiation 5.For this purpose, except its rotatability, the first speculum 29iCan also be can Linear displacement, you can mobile.Speculum 29 can be particularly installediSo that its rotation axis 31 is linearly displacement, It is i.e. moveable.
In the exemplary embodiment equally described below, the first speculum 29iCan be according to describing with reference to figure 3 to 8 One in alternative is arbitrarily implemented.
The method of the method, particularly its maintenance of operation projection exposure system 1 is described below.Also referred to as normal Under the basic status of operator scheme, two radiation sources 4iWork.
First FEL is to scanner 31To 3NLighting radiation 5 without interruption.The pulse structure of FEL should be ignored herein, in view of It is unrelated with the application.2nd FEL similarly gives scanner 3N+1To 32NSupply lighting radiation 5.In Fig. 9 citing for N=3 come Illustrate that the time series of formula is touched in the operation.Correspond to per a line and lighting radiation 5 is supplied to one of scanner 3i.Hacures Illustrate from which of FEL to respective scanned instrument 3iSupply lighting radiation 5.Ordinary circumstance is not only restricted to, from the first FEL's Lighting radiation 5 is identified by vertical shading line, and the lighting radiation 5 for being simultaneously from the 2nd FEL is identified by horizontal shading line.It is continuous cloudy Hachure mark time cycle be：In the time cycle, radiation illumination 5 is set to can be used for scanner 3iIn specific one sweep Instrument is retouched, and is also actually used by the scanner.The time cycle illustrated by disconnection hacures is：In the time cycle In, radiation illumination 5 is can be used for scanner 3iIn specific one scanner, but do not used completely by corresponding scanner Or not exclusively used by corresponding scanner, such as since reticle covers diaphragm partly or completely complete closure.
These time cycles can be directed to different scanning instrument 3iWith different durations.This is attributed to such as following facts：Throw The maximum length and width of the structural specifications naked core of exposure system 1 is penetrated, but does not provide its minimum length and width.If Naked core is less than maximum possible size, then the duration of exposure corresponds to shorter.The various durations of time cycle can be with Attribution on the fact that：For example, for specific naked core, scanning process has to carry out in a delayed fashion, because should for this For, in chip 25iLight sensitive layer on the dose of radiation of higher be necessary.This may be considered effectively prolonging for naked core It is long, the length of term naked core should be understood in this way.
Figure 10 is had been illustrated under service mode, i.e., when only one FEL (being in this case the first FEL) is feasible When projection exposure system 1 operation.In this case, it is arranged to the lighting radiation 5 from the first FEL being alternately distributed In scanner 31To 3NIn and in scanner 3N+1To 32NAmong.
It is shown there is no a hacures time cycle be：During the time cycle, not to corresponding scanner 3iSupply Lighting radiation 5.
In interval IiDuration, lighting radiation 5 is respectively directed to scanner 3iSubset.It is spaced IiAll with phase Same length T.In other words, two subsets (particularly two disjoint subsets) 3 to scanner1To 3NWith 3N+1To 32N Alternate supplies lighting radiation 5.Duty cycle is 1:1.
Duty cycle can also be slightly offset from 1:1, although other all even time intervals are with identical in this case Length, I0=I2=I4=..., and all odd time intervals have same time length, I1=I3=I5=....This can be with It is used advantageously, particularly if to be imaged in chip 25iOn multiple naked cores will not be randomly distributed in scanner 3iIt In, but in scanner 31To 3NOn all naked cores length with scanner 3N+1To 32NOn naked core length it is identical or It is longer than its.This is advantageously applicable to scenario described below：Scanner 31To 3NOn all naked cores length and scanner 3N+1 To 32NOn naked core length it is identical or more shorter than its.This can for example be realized by center manufacturing planning and control.Figure 17 show the schematic diagram for being analogous to Figure 10 for scenario described below：In scanner 31To 3NOn all naked cores length with sweeping Retouch instrument 3N+1To 32NOn naked core length it is identical or longer than its.
Accord with the present invention it has been found that in naked core size of all naked cores with identical size and with maximum possible In the case of, the time needed for the exposure of all naked cores in the maintenance mode increase only about compared with normal manipulation mode 10%.Therefore, manufacture rate reduces about 10%.The loss manufactured as caused by the failure of a FEL in the FEL is therefore Only about 10%.
Beam guide device 28 can be combined advantageously with other functions.Figure 18 A to 18D show showing with deflection Example property combination.The deflection can be identical with the deflection part of deflection group 15, but also be embodied as other deflections Function.In the configuration illustrated in Figure 18 A, displacement-reflection mirror 291With 302So that lighting radiation 5 is directed to deflecting reflection by them On mirror 36.Displacement-reflection mirror 292With 301So that they do not influence lighting radiation 5.In the configuration illustrated in Figure 18 D, displacement is anti- Penetrate mirror 292With 301So that lighting radiation 5 is directed on the deflection mirror 36 of other distribution, simultaneous displacement speculum 291With 302So that they do not influence lighting radiation 5.
According to the configuration of Figure 18 A and both configurations according to Figure 18 D, radiation source 4 will be come from1、42Both lighting radiations 51、52It is directed to scanner 3iOn.For simplicity, only two illumination optics units are illustrated in the accompanying drawings each 171、172.This is not construed as restricted.In this exemplary embodiment, can also be with multiple optical systems 20i Multiple scanners 3iAmong lighting radiation 5 is divided.In terms of this, retouching according to the embodiment of Fig. 1 should refer to State.
Figure 18 B and 18C diagrammatically illustrate the configuration of beam guide device 28, which is arranged to radiation source 41With 42In The situation that one radiation source breaks down respectively, this can be necessary for example because of maintenance work.
In the case of the configuration illustrated in Figure 18 B, radiation source 41To scanner 3iExclusively supply lighting radiation 5.At this In the case of kind, speculum 301It is displaced to by the first radiation source 41In the beam path of the lighting radiation 5 of transmitting.It can rest on this Position.Scanner 3 is given in order to becomeiWhich of supply lighting radiation 5, as described above, speculum 291Can be at two Displacement between displaced position.For details, it should referring again to described above.
Therefore, in the case of the configuration illustrated in Figure 18 C, speculum 291With 301It is arranged in the Shu Lu of lighting radiation 5 Outside footpath.Speculum 302It can be arranged in a position-stable manner in the beam path of lighting radiation 5.In order to which lighting radiation 5 is directed to Scanner 3iDifferent subsets purpose, speculum 292It is movable between two displaced positions.
In the case of the alternative, speculum 302It can arrange in a fixed manner.Speculum 302It can be formed especially It is the reference point of the arrangement of beam guide device 28.
In the case of according to the modification of Figure 18 A to 18D, in beam shaping optical unit 7iWith illumination optics unit 17iBetween The number of the reflection of lighting radiation 5 in beam path is independently of beam guide device 28.This can be favourable.Therefore, especially, Expose to reticle 22iThe dosage of lighting radiation 5 can be kept constant independently of the configuration of beam guide device 28.Separately Outside, in beam shaping optical unit 7iWith illumination optics unit 17iBetween beam path in the number of reflection of lighting radiation 5 can It is identical with the number reflected necessary to the pure deflection as caused by deflection mirror 36.The function of displacement for beam path and Speech, extra reflection is then unnecessary.
In the case of the alternative, speculum 29i、30iDeflectiometry unit 15 can be formediComponent parts.
According to the invention it has been recognized that under given conditions, it can further reduce the failure of a FEL The loss of caused manufacture.For this purpose, it is arranged to scanner 3iMutually distribution in couples respectively.Particularly, it is arranged to In all cases by scanner 31To 3NIn one and scanner 3N+1To 32NIn one mutually distribution.For example, sweep Retouch instrument 3kWith 32N+1-k(k=1 ... N) can be distributed mutually respectively.This is for example bright by Figure 11.
According to alternative illustrated in fig. 11, there are the first and second speculums 29i、30iBeam guide device 28 be arranged to For in the scanner that mutually distributes per a pair of of scanner 3k、32N+1-k.Therefore, lighting radiation 5 can be in scanner 3kWith 32N+1-kBetween respectively redistributed in a manner of having target.This causes flexibility stronger.If various sizes of naked core is directed at crystalline substance Piece 25iUpper exposure, then the present invention be arranged to the naked core of Similar size being respectively exposed on the scanner 3 of a pair of mutually phase partitioningk、32N+1-k On.This is achievable, especially by all scanners 3 of projection exposure system 1iCenter manufacturing planning and control.With The exemplary embodiment being described above is compared, if the naked core with approximately the same size therefore is enough to that can be found 's.So, these can be respectively in two scanners 3 being coupled to each otherk、32N+1-kUpper manufacture.All naked cores no longer need to have Approximately uniform size, to obtain efficient operator scheme.Corresponding operator scheme illustrates in fig. 12.This In the case of, although individually naked core has different sizes, the loss of manufacture can be reduced to zero.This is attributable to following facts： The naked core pair of identical size can be found respectively.
Figure 13 illustrates the situation identical with Figure 12, and the order of scanner is according to the embodiment illustrated in Figure 11 with again The mode of classification illustrates.In the case of the exemplified exemplary embodiment, by lighting radiation 5 in scanner 3kWith 32N+1-kIn two between the interval I that each togglesiWith equal length.However, scanner 3k、32N+1-kIt is specific right Interval IiIndependently of the interval of another pair.
If the naked core with similar size (preferably identical size) can be found in couples respectively, can lead to Cross pairing packet to improve efficiency, particularly maximize.
Especially it is possible to be arranged to, it is to be exposed for the maintenance time cycle selection of a scanner in scanner Naked core so that can find naked core pair respectively, its size at most differs the maximum limited in advance.Two in a pair of of naked core The full-size difference of naked core can be with particular up to 25%, in particular up to 10%, in particular up to 5%, in particular up to 3%, in particular up to 1%.In such a case, it is possible to especially in large quantities, particularly fully avoid the loss of manufacture.
Illustrate other examples in Figure 14 by way of example.In this exemplary embodiment, naked core is to very different Size.For example, in scanner 32With 35The naked core of upper exposure only has in scanner 31With 36The ruler of the naked core of upper exposure Very little approximate half.Therefore, in scanner to 32、35In the case of, the length for switching the cycle T of lighting radiation 5 is only to sweep Instrument is retouched to 31、36In the case of length approximate half.
If it were not for scanner 3iSituation about not being grouped in pairs according to the size of naked core, in Figure 15 illustrations and Figure 14 Identical situation.It can such as be learned from Figure 15, in this case, the dead time 35 occurs, wherein scanner 3iIn one sweep Instrument is retouched, in another scanner 3 accordingly distributedjBefore needing lighting radiation again, complete to expose.
According to other embodiments of the invention, it can further increase and multiple scanners 3 are directed to from FELiLight beam Flexibility.In principle, it is possible to N number of scanner 3iThe beam guide device 21 for being up to N (N-1) is provided.In this case, may be used With in scanner 3iBetween in couples arbitrarily redistribution lighting radiation 5.In other words, each scanner 3 of a FELiCan To be connected to each scanner 3 of another FELj.For simplicity, the option is not illustrated in figure.
It is illustrated in Figure 19 equivalent substitute example.Two beam shaping optical units 7iIn each produce discrete number list Only output bundle 10iTo replace the aggregation output bundle 8 with illumination light 5.In the speculum 29 of the first displaced positioni,kBeam is guided To scanner 3k.The displaced position is illustrated in figure with solid line.In second displacement position, speculum 29i,kBeam 10 is not influencedi. The speculum of this second displacement position is described in figure with dotted line.If above by beam 10iSupply the scanner 3 of illumination light 5k Illumination light 5 is no longer needed, then beam 10iThe scanner 3 of illumination light is not received before can be used for illuminationk’.For the switching, only instead Penetrate mirror 29i,kWith 29i,k’Necessary displacement, while every other speculum 29 can remain unchanged.Two speculums 29i,kWith 29i,k’ In only one speculum must quickly move, the particularly front mirror in beam path.
In all these alternatives, when a FEL breaks down, the efficiency of transmission exposure system 1 can be maximized. The loss of manufacture can be reduced in a manner of most preferably possibility, i.e., can particularly minimize.In order in single scanner 3iAmong Lighting radiation 5 is divided, especially for the speculum 29 of control beam guide device 28iDisplacement, it is special in this case It is not to provide control device 35.
Particularly in different scanners 3iAmong the distribution of lighting radiation 5 can be optimized by control device 35.
Other alternatives are described below with reference to Figure 16.In the embodiment according to Figure 16, the first speculum 29iFormation is used for Carry out the independent output bundle 10 of self aggregation output bundle 8iOutput coupling output coupling speculum.It can save in this case point From output coupling optical unit 9.But except the first speculum 29i, the output with other component parts can also be provided Coupling optical unit 9.
In the exemplary embodiment, scanner 3iIn each distribute two output coupling speculums 29 respectivelyi.By In output coupling speculum 29i, can will come from two FEL 41、42In the lighting radiation 5 of each guide to scanner 3i In a specific scanner.
In this exemplary embodiment, N number of scanner 3iOnly need 2N actuator.But reflection in this case Mirror 29iWith more than two displaced position.Speculum 29iThe quantity of displaced position be particularly corresponding to scanner 3iNumber Amount.Advantageously, in this exemplary embodiment, speculum 29iCan continuous dislocation.
In addition, control device 35 is more complicated in this exemplary embodiment.This is attributable to following facts：When in specific bar By lighting radiation 5 in two specific scanners 3 under parti、3jBetween when switching, be not distributed directly to the two scanners 3i、3jIn A scanner speculum 29kMust also displacement.
Other aspects of various embodiments are described with summary below.
In order to evaluate the different options of service mode, it is necessary to consider that projection exposure system 1 is controlled by Central places.If , in the embodiment in accordance with fig. 1 can be with it is contemplated that for example in order to which the purpose of maintenance, a FEL must stop, that is, must shut off Attempt manufacturing process of classifying again so that in the maintenance time cycle, as far as possible in all scanners 3iOn always expose identical ruler Very little naked core.Due to replacing reticle 22iIt is significant action, and due to the corresponding number of naked core with identical size Chip 25iMay be completely without if appropriate, which can only realize in a limited manner.According to Fig. 1's In exemplary embodiment, the loss inevitably manufactured occurs in this case.However, the loss of the manufacture is less than when one There is no the loss of the manufacture occurred in the case of beam guide device 28 when FEL breaks down.
With in different FEL and scanner 3iBetween lighting radiation 5 redistribution flexibility higher, can be more Ground reduces the loss of the manufacture when one of FEL breaks down.Particularly, (do not exist with a beam guide devices 28 of N (N-1) Shown in figure) exemplary embodiment in, or in exemplary embodiment according to Figure 16, or even there is no center manufacturing planning In the case of, it can always be worked with maximal efficiency, the minimization of loss for the caused manufacture that will be broken down by one of FEL.
In the exemplary embodiment according to Figure 11, although always can not possibly realize maximal efficiency, but by one of FEL's The loss of manufacture is often greatly reduced caused by failure.Particularly, set the size difference of different naked cores not too large and/or such as Fruit can be found that the naked core pair of at least Similar size, projection exposure system 1 at least almost maximal efficiency or maximal efficiency can be with By being realized according to the embodiment of Figure 11.The embodiment also has the advantage of the mechanical realization of significantly less complexity.
In the embodiment according to Figure 11, the efficiency of projection exposure system 1 can increase especially by center manufacturing planning Add.In order to increase efficiency, especially for the loss of the manufacture during reducing the maintenance time cycle, the present invention is arranged to be particularly The set of naked core to be exposed is selected in a manner of having target within the maintenance time cycle.Particularly, it is arranged in maintenance time The set of the naked core of cycle selection Similar size so that naked core to be exposed has and differed at most in quantity on different scanning instrument The size of the maximum limited in advance.Full-size difference between maximum and minimum naked core to be exposed is in particular up to 25%, in particular up to 20%, in particular up to 15%, in particular up to 10%, in particular up to 5%, in particular up to 3%, in particular up to 2%, in particular up to 1%.Preferably, all naked cores to be exposed have identical size.
In the case of according to the embodiment of Figure 11, if the naked core of identical size or at least Similar size to that can distinguish It is found, then is enough.In this case, particularly if for the maintenance time cycle, it can be found that naked core to be exposed, So that it is only at most maximum above-mentioned that the size of two naked cores differs in all cases, then it is enough.
Other aspects of the present invention are described below.
When switching in normal operating (basic status) between attended operation, in scanner 3iInput illumination will Usually change a little.Therefore, some components (such as homogeneity correction diaphragm) of lighting system 19 must be recalibrated.Naked core allusion quotation It is not used in single wafer 25 typeiExposure, but for multiple chips exposure, this is referred to as batch processing.Batch processing Generally comprise about 25 chips 25i.The exposure of general this batch processing is set as high as ten minutes.Lighting system 19iOne The calibration of a little components can also occur between batch processing.The present invention provide continuous batch processing exposure between (without It is during the exposure of batch processing) switching between normal operating and attended operation.Therefore extra calibration branch is avoided Go out.
Have also recognised that, by single FEL to scanner 3iIn at least two groups of supplies according to the present invention Device and the method according to the invention can also be conducive to project exposure system 1 general operation.Particularly, according to the present invention Device 28 allow to the lighting radiation 5 from single FEL 4 being distributed in scanner 3iTwo or more groups between, and It will not cause a large amount of reductions of handling capacity.Particularly, device 28 allows to subsequent compartment of terrain to scanner 3iIn two groups or More multigroup lighting radiation 5 of the supply from single FEL 4.
In this case, it is enough if device 28 has the single input of lighting radiation 5.
Self-evidently, all exemplary embodiments described above can also only use single FEL, as described above Situation under maintenance state.

Claims (21)

1. the method for one kind control beam guide device (28), illumination of the beam guide means guide in projection exposure system (1) The beam path of lighting radiation (5) in system (19), the projection exposure system (1) have at least one radiation source (4i) and it is more A scanner (3i), the beam guide device (28) includes at least one input of lighting radiation (5), lighting radiation (5) extremely Few two outputs and at least one beam induction element (29i, 30i), at least one beam induction element (29i, 30i) respectively pass through Control device (35) is movable between at least two displaced positions, wherein according to the first beam induction element (29i) Displaced position, the lighting radiation (5) can from it is described it is at least one input be directed to it is described at least two output among Difference output, it is characterised in that in the operator scheme of the control device (35), the beam guide device is realized with a cycle (28) the rule change of the distribution of at least one output for being input to the beam guide device (28), wherein beam guiding dress Put the cycle of change and the exposure of naked core of the distribution of at least one output for being input to the beam guide device (28) of (28) The ratio of duration is in 1: 2 to 2: 1 scope.
2. according to the method described in claim 1, it is characterized in that, the control device (35) has other operator schemes, its Described in the constant distribution of multiple input to the output of the beam guide device (28) of beam guide device (28) be to limit in advance 's.
3. a kind of device (28), lighting radiation (5) of the described device guiding in the lighting system (19) of projection exposure system (1) Beam path, it is described projection exposure system (1) there is at least one radiation source (4i) and multiple scanners (3i), described device (28) include：
3.1. at least one input of lighting radiation (5)；
3.2. at least two outputs of lighting radiation (5)；And
3.3. at least one beam induction element (29i, 30i), at least one beam induction element (29i, 30i) respectively at least two It is movable between displaced position；
3.4. wherein according to the first beam induction element (29i) displaced position, the lighting radiation (5) can be from described at least one A input is directed to the different outputs among at least two output.
4. device (28) according to claim 3, it is characterised in that described device includes at least the two of lighting radiation (5) A input and at least two beam induction elements (29i, 30i), the beam induction element (29i, 30i) respectively at least two bit shifts It is movable between putting, wherein according to the second beam induction element (29i) displaced position, the lighting radiation (5) can be from Second input is directed to the different outputs among at least two output.
5. the device (28) according to claim 3 or 4, it is characterised in that at least one beam induction element (29i) logical It is movable in a controlled fashion to cross control device (35).
6. the device (28) according to the present invention described in any one of 3 to 5, it is characterised in that the beam induction element (29i, 30i) respectively it is arranged in the first displaced position outside the beam path of the lighting radiation (5).
7. any one of claim 4 to 6 described device (28) according to the present invention, it is characterised in that when all beams draw Guiding element (29i, 30i) when being arranged in their the first displaced position, lighting radiation (5) can simultaneously be radiated at all described In output.
8. the device (28) according to any one of claim 3 to 7, it is characterised in that the beam induction element (29i, 30i) between their displaced position with least frequency of 1Hz it is movable.
9. the device (28) according to any one of claim 3 to 8, it is characterised in that the beam induction element (29i) Respectively include at least one rotatably mounted mirror unit.
10. beam induction element (29i), the variable guiding of space-time for lighting radiation (5), the beam induction element (29i) tool Have：
A. more a reflecting surfaces (33), the multiple reflecting surface are embodied as the curve form with radius of curvature；
B. wherein described beam induction element (29i) be rotatably mounted on rotation axis (31)；And
C. the radius of curvature of wherein described reflecting surface (33) respectively corresponds precisely to the reflecting surface and the rotation axis (31) Distance.
11. the lighting system (19) of one kind projection exposure system (1), the projection exposure system has multiple scanners (3i), institute Stating lighting system (19) includes：
11.1. at least one radiation source (4i)；And
11.2. at least one device (18) according to any one of claim 3 to 9.
12. lighting system (19) according to claim 11, for two groups of N number of scanners (3iTo 3N, 3N+1To 32N), it is special Sign is, by each scanner (3 in one groupi...3N) distribution another group in specific scanner (32N+1...32N), wherein Device (28) as described in any one of claim 3 to 9 is respectively supplied to different groups of two scanners mutually distributed (3k, 32N+1-k；K=1...N).
13. the lighting system (19) according to claim 11 or 12, it is characterised in that described device (28) is respectively arranged in defeated Go out in the beam path of the lighting radiation (5) in coupling optical unit (9) downstream.
14. lighting system (19) according to claim 11, it is characterised in that described device (28) is arranged in output coupling In the beam path of the lighting radiation (5) of optical unit (9) upstream.
15. the lighting system (19) according to claim 11 or 14, the lighting system (19) has two radiation sources (4i), it is characterised in that by described two radiation sources (4i) in each radiation source distribute scanner (3 respectivelyi) group and such as Device (28) any one of claim 3 to 9, the scanner (3 wherein in groupi) arrive described two radiation sources (4i) in the distribution of a radiation source can be changed by means of described device (28).
16. a kind of microlithography projection exposure system (1), including：
16.1. the lighting system according to any one of claim 11 to 15 (19)；And
16.2. projection optical unit (14), it will be arranged in object field (11i) in reticle (22i) project and be arranged in image field (23i) in chip (25i) on.
17. the method for one kind operation projection exposure system (1) according to claim 16, the described method includes following step Suddenly：
17.1. the time cycle of the exposure of naked core is determined；
17.2. the set of naked core to be exposed in the definite time cycle is determined；
17.3. consider the different size of the possibility of the naked core, determine different naked cores to be exposed to different scanning instrument (3i) point Match somebody with somebody；
17.5. all scanners (3 to the projection exposure system (1)i) provide from form be FEL (4i) it is single The lighting radiation (5) of radiation source；
17.6. the FEL (4 is wherein come fromi) lighting radiation (5) described sweep is deflected to by least one device (28) Retouch instrument (3i) in interval different scanning instrument (3i)。
18. according to the method for claim 17, it is characterised in that following steps：
18.1. determine that size at most differs the naked core pair of the maximum limited in advance；
18.2. in couples by the scanner (3i) distribute to each other, to expose the chip with previously determined naked core pair (25i)；
18.3. by the previously determined naked core to rapid alternation；
18.4. wherein, for naked core described in rapid alternation, in all cases, the beam induction element (29i) in a beam Induction element displacement back and forth between described two displaced positions.
19. according to the method for claim 17, it is characterised in that to be exposed within the definite time cycle in order to determine The set of N number of naked core, selects N number of naked core from whole naked cores so that in the maximum naked core and the naked core in the naked core Minimum naked core between size difference be less than all naked cores full-size it is poor.
20. one kind projection exposure system (1) maintaining method, the described method includes institute with good grounds claim 17 to 19 in times Step described in one,
20.1. it is characterized in that, the projection exposure system (1) including form is FELs (4i) at least two radiation sources；
20.2. it is characterized in that, the definite time cycle is the FEL (4i) in a FEL the maintenance time cycle；And
20.4. it is characterized in that, during the maintenance time cycle, the FEL (4 is closedi) in a FEL be used for safeguard, All scanners (3 wherein to the projection exposure system (1)i) provide come from the FEL (4i) in another FEL Lighting radiation (5), and come from the FEL (4i) in the lighting radiation (5) of another FEL pass through at least one dress Put (28) and deflect to the scanner (3i) in interval different scanning instrument (3i)。
21. a kind of manufacture micro-structure or the method for nanostructured components, comprise the following steps：
21.1., projection exposure system (1) according to claim 16 is provided；
21.2., at least one reticle (22 is providedi)；
21.3., at least one chip (25 is providedi), the chip (25i) with the coating to the lighting radiation (5) sensitivity；
21.4. by means of the projection exposure system (1), by least one reticle (22i) at least one portion throw It is mapped at least one chip (25i) on；
21.5. by the chip (25i) on exposed by the lighting radiation (5) photosensitive layer development.
CN201680051162.5A 2015-07-09 2016-07-08 Method for controlling a beam guide and beam guide Active CN107924143B (en)

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