CN107885031A - The Optimization Design that a kind of mask plate makes - Google Patents
The Optimization Design that a kind of mask plate makes Download PDFInfo
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- CN107885031A CN107885031A CN201711471168.0A CN201711471168A CN107885031A CN 107885031 A CN107885031 A CN 107885031A CN 201711471168 A CN201711471168 A CN 201711471168A CN 107885031 A CN107885031 A CN 107885031A
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- China
- Prior art keywords
- overlapping region
- datagraphic
- mask plate
- exposure
- design
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/76—Patterning of masks by imaging
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
The invention discloses the Optimization Design that a kind of mask plate makes, suitable for mask plate exposure process, exposure sources carry out X/Y direction divisions according to datagraphic, number of beams and light beam sweep length, corresponding exposure bar number is calculated, obtains the datagraphic corresponding to the position and overlapping region of adjacent exposure bar number overlapping region；Datagraphic according to corresponding to overlapping region designs increase data pattern again, is slackened with the increased data pattern of secondary design again or the anti-re-expose energy for mending overlapping region.The present invention for overlapping region datagraphic design data pattern again, the data pattern can slacken or it is counter mend re-expose energy loss to caused by the datagraphic of overlapping region, so as to improve overlapping region lines precision.
Description
Technical field
The present invention relates to mask plate production technical field, particularly relates to the Optimization Design that a kind of mask plate makes.
Background technology
TFT LCD are Thin Film Transistor-LCD English thin film transistor-liquid crystal
The abbreviation of display prefixs.TFT LCD technologies are a kind of technologies of microelectric technique and the ingenious combination of LCD Technology.
People using on SI carry out microelectronics retrofit technology, be transplanted in large-area glass carry out tft array processing,
Again by the array base palte and another substrate with color filter film, using the mature LCD technology of industry, a liquid crystal cell is formed
It is combined, then process such as polaroid such as pastes at the process after passing through, and eventually forms liquid crystal display.
Mask plate is the important composition part in TFT LCD process of producing product, and its precision influences whether TFT LCD products
Precision.Mask plate can be made thoroughly through light, and manufactured mask plate is the high-precision version for being carved with microcircuit to light thoroughly, pure flat simultaneously by surface
Quartz plate or glass plate with one layer of chromium are made, and the residual chromium part after etching is the micro- electrograph designed.In order to obtain
High-precision mask plate is obtained, Fig. 1 discloses one embodiment of mask plate Making programme in the prior art.In the crowd of Making programme
In multiple operation, exposure is a very crucial process, and before being exposed to mask plate, exposure sources can be pressed laser to data
X is carried out according to pattern form, equipment number of beams and width or Y-direction is divided into corresponding exposure bar number, the then meeting in exposure
Scan exposure is completed (by column one by one) one by one line by line according to X or Y-direction.Fig. 2 is one embodiment of datagraphic on mask plate,
As shown in figure 3, exposure sources send laser is scanned exposure to it line by line, along Y-direction, an exposure article number is respectively the N articles, the
N+1 articles, the N+2 articles ..., there are overlapping region, such as two articles of the N articles and the N+1 articles handing-over in adjacent exposure bar number in figure
It is overlapping region between horizontal line, is also overlapping region between the N+1 articles and the N+2 articles two articles of junction horizontal line.In other realities
Apply in example, scan exposure is also likely to be to be carried out from bottom to top along Y-direction, can also be entered along minus half direction of principal axis in X positive axis direction or X
OK.Twice sweep exposure can be passed through in exposure by being in the datagraphic of overlapping region, cause the lines ratio of precision of overlapping region
The lines precision in other regions of mask plate reduces, and causes the lines precision of whole mask plate inconsistent, and then reduce TFT LCD
The quality of product.
In order to meet the needs of TFT LCD products are to high-quality high-precision mask plate, the exposure sources of mask plate are produced
Each company also have developed more high-end exposure sources, before exposure, further to the divided datagraphic for exposing bar number well
Carry out scan position again to set, make by repositioning the energy for exposing every piece of overlapping region for starting scan position in exposure
Amount is consistent.But the overlapping region repartitioned still has twice sweep, the lines precision of overlapping region still has
The phenomenon to diminish.
The content of the invention
The present invention proposes the Optimization Design that a kind of mask plate makes, and solves overlapping region in the prior art and passes through two
The problem of secondary scanning causes mask plate upper part datagraphic lines precision to reduce.
The technical proposal of the invention is realized in this way：
The Optimization Design that a kind of mask plate makes, suitable for mask plate exposure process, specifically includes following steps：
Exposure sources carry out X/Y direction divisions according to datagraphic, number of beams and light beam sweep length, calculate corresponding
Exposure bar number, obtain the datagraphic corresponding to the position and overlapping region of adjacent exposure bar number overlapping region；
Datagraphic according to corresponding to overlapping region designs increase data pattern again, with the increased data of secondary design again
Pattern slackens or the anti-re-expose energy for mending overlapping region.
Further, the re-expose energy for instead mending overlapping region specifically includes following steps：
Stretch out design along the outward flange of the datagraphic corresponding to overlapping region, it is anti-to mend re-expose energy.
Further, the re-expose energy for slackening overlapping region specifically includes following steps：
Before re-expose, using the design again of increase ceramic mosaic graphic pattern to the datagram corresponding to overlapping region
The adjacent edges of shape carry out part overlaid.
Further, the re-expose energy for slackening overlapping region specifically includes following steps：
Before re-expose, using the design again of increase segmented pattern to the datagram corresponding to overlapping region
The adjacent edges of shape carry out part overlaid.
Further, data pattern is by some circles, strip, square, taper, trapezoidal, triangle and/or irregular shape
The unit figure combination of shape is formed.
Further, the dimension of picture of any cell figure is respectively less than the dimension of picture of exposure sources actual fabrication ability.
The beneficial effects of the present invention are：For the datagraphic design data pattern again of overlapping region, the datagram
Case can slacken or it is counter mend overlapping region re-expose energy, so as to improve overlapping region lines precision, make on mask plate
Pattern line precision is consistent, and overall uniformity is relatively good.
Brief description of the drawings
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing
There is the required accompanying drawing used in technology description to be briefly described, it should be apparent that, drawings in the following description are only this
Some embodiments of invention, for those of ordinary skill in the art, without having to pay creative labor, may be used also
To obtain other accompanying drawings according to these accompanying drawings.
Fig. 1 is the flow chart of the embodiment of mask plate Making programme one in the prior art；
Fig. 2 is the part-structure schematic diagram of mask plate datagraphic；
Fig. 3 is the part-structure schematic diagram of the mask plate through the division of overexposure bar number；
Fig. 4 is the flow chart for the Optimization Design that a kind of mask plate of the present invention makes；
Fig. 5 is the schematic diagram of overlapping region initial data figure embodiment one；
Fig. 6 is the anti-datagraphic schematic diagrames mended after design of Fig. 5；
Fig. 7 is the schematic diagram of overlapping region initial data figure embodiment two；
Fig. 8 is that Fig. 7 slackens the datagraphic schematic diagram after design；
Fig. 9 is the schematic diagram of overlapping region initial data figure embodiment three；
Figure 10 is that Fig. 9 slackens the datagraphic schematic diagram after design；
Figure 11 is the flow chart of mask plate Making programme one embodiment after improving.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation describes.Obviously, described embodiment is only part of the embodiment of the present invention, rather than whole embodiments.It is based on
Embodiment in the present invention, those of ordinary skill in the art are obtained every other under the premise of creative work is not made
Embodiment, belong to the scope of protection of the invention.
Before exposure, mask plate is dummy plate, and number is designed using professional software by professional according to required circuit
According to figure, the datagraphic need to be exposed by exposure sources to blank mask plate, by the steps such as development, etching, datagram
Shape can just be shown on mask plate.
As shown in figure 4, the present invention proposes the Optimization Design that a kind of mask plate makes, work is exposed suitable for mask plate
Sequence, specifically include following steps：
Exposure sources carry out X/Y direction divisions according to datagraphic, number of beams and light beam sweep length, calculate corresponding
Exposure bar number, exposure bar number particularly determine that one is set by the size and light beam sweep length size of datagraphic,
What the position of datagraphic was fixed, the position of exposure bar number is fixed, and therefore, it is overlapping that technical staff can obtain adjacent exposure bar number
Datagraphic corresponding to the position and overlapping region in region；
Datagraphic according to corresponding to overlapping region design data pattern again, is slackened with the data pattern of secondary design again
Or the anti-re-expose energy for mending overlapping region.
The key point of the application is that technical staff has carried out Secondary Design, first design data figure according to required circuit
Shape, so that it is determined that overlapping region, secondary design again is carried out to datagraphic corresponding to overlapping region, increase datagraphic, it is increased
Data pattern can slacken or the anti-re-expose energy for mending overlapping region, so as to improve overlapping region lines precision, makes
Pattern line precision is consistent on mask plate, and overall uniformity is relatively good.
Embodiment one
As shown in Figure 5 and Figure 6, in figure between two horizontal lines it is overlapping region, the anti-re-expose energy for mending overlapping region
Specifically include following steps：
Stretch out design along the outward flange of the datagraphic corresponding to overlapping region, it is anti-to mend re-expose energy.
In this embodiment, the datagraphic of the increased data pattern of design that stretches out and script be it is integral, quite
In the dimension of picture of suitably increase original data figure.Ensure the to stretch out part of design will not be shown on mask plate
Come.
Specifically, the width of original datagraphic is 4.5um in such as figure, then the width of the datagraphic of secondary design again
It may be designed as 4.8um.The amount of extension carries out anti-mend according to the value that re-expose loses to datagraphic and designed, the 0.3um of extension
Size quantity compensate exactly for re-expose energy.
Embodiment two
As shown in Figure 7 and Figure 8, it is overlapping region between two horizontal lines in figure, slackens the re-expose energy of overlapping region
Specifically include following steps：
Before re-expose, the side using increase ceramic mosaic graphic pattern design method to the datagraphic corresponding to overlapping region
Edge nearby carries out part overlaid, takes the worn-out mode of screening to be covered when re-expose energy is close to datagraphic fringe region,
Purpose is to slacken the datagraphic re-expose energy in the overlapping region, avoids the pattern line edge in the region two
Precision is damaged during secondary exposure.
Embodiment three
As shown in Figure 9 and Figure 10, it is overlapping region between two horizontal lines in figure, slackens the re-expose energy of overlapping region
Specifically include following steps：
Before re-expose, the side using increase segmented design mode to the datagraphic corresponding to overlapping region
Edge is nearby covered, and can weaken the re-expose energy of legacy data pattern edge.Make the line of overlapping region datagraphic
Other area data pattern line precision of bar precision and mask plate are consistent.The uniformity controlling of justifying lines precision compares
It is good.
In embodiment two and embodiment three, data pattern is by some circles, strip, square, taper, trapezoidal, triangle
The combination of the unit figure of shape and/or irregular shape is formed.The dimension of picture of any cell figure is respectively less than exposure sources reality
The dimension of picture of making ability.It is necessary to ensure that again the increased data pattern of secondary design will not be shown on mask plate.Also
It is to say, if the actual fabrication ability of exposure sources is 1um, the pattern more than or equal to 1un can be produced in exposure and covered
In template.So, the dimension of picture for increasing design again is less than 1um, it is ensured that the data pattern for increasing design again only serves
Exposure energy caused by re-expose is slackened, and its pattern will not be remained on mask plate, cause original datagraphic
Deformation.
In addition, in embodiment two and embodiment three, two data patterns can not link together.Or link together
The dimension of picture of two or several unit figures be less than the dimension of picture of exposure sources actual fabrication ability.
In above three embodiment, the measurement to re-expose energy value, mainly using experiment method, by again
Unit figure size and the arrangement mode adjustment of secondary design data pattern, overlapping region on mask plate is measured after then testing
The value of figure and Non-overlapping Domain figure, is contrasted.Pass through experiment several times, you can find and slacken re-expose energy value
Best mode.
For the datagraphic design data pattern again of overlapping region, the data pattern can slacken or counter mend the present invention
Re-expose is to exposure energy caused by overlapping region, so as to improve overlapping region lines precision.Make overlapping region data
Other regional graphics lines precision of the lines precision and mask plate of figure are consistent, whole mask plate datagraphic uniform precision control
That makes is fine.Progress meets the needs of TFT LCD Products high accuracy high-quality.
Figure 11 discloses the production procedure of the mask plate after the design method improvement using the present invention, and datagraphic refers to
Mask plate semiconductor-on-insulator device pattern；The making parameter of mask plate is set, refers specifically to carry out parameter setting to exposure sources,
So that exposure sources automatically mask plate is exposed, it is possible to increase exposure efficiency；X/Y directions refer to that exposure is set
The scanning direction of standby exposure, different types of exposure sources can be different scanning directions.Some producer's exposure sources are with X side
To scanning, some producer's exposure sources are scanned with Y-direction.It can be set according to specific equipment situation.
Overlap regions are overlapping region of the present invention in Fig. 1 and Figure 11.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the invention, all essences in the present invention
God any modification, equivalent substitution and improvements made etc., should be included in the scope of the protection with principle.
Claims (6)
- A kind of 1. Optimization Design that mask plate makes, suitable for mask plate exposure process, it is characterised in that specifically include with Lower step：Exposure sources carry out X/Y direction divisions according to datagraphic, number of beams and light beam sweep length, calculate corresponding exposure Striation number, obtain the datagraphic corresponding to the position and overlapping region of adjacent exposure bar number overlapping region；Datagraphic according to corresponding to overlapping region designs increase data pattern again, with the increased data pattern of secondary design again Slacken or the anti-re-expose energy for mending overlapping region.
- 2. the Optimization Design that a kind of mask plate according to claim 1 makes, it is characterised in that counter to mend overlapping region Re-expose energy specifically include following steps：Stretch out design along the outward flange of the datagraphic corresponding to overlapping region, it is anti-to mend re-expose energy.
- 3. the Optimization Design that a kind of mask plate according to claim 1 makes, it is characterised in that slacken overlapping region Re-expose energy specifically include following steps：Before re-expose, using the design again of increase ceramic mosaic graphic pattern to the datagraphic corresponding to overlapping region Adjacent edges carry out part masking.
- 4. the Optimization Design that a kind of mask plate according to claim 1 makes, it is characterised in that slacken overlapping region Re-expose energy specifically include following steps：Before re-expose, using the design again of increase segmented pattern to the datagraphic corresponding to overlapping region Adjacent edges carry out part overlaid.
- 5. the Optimization Design that a kind of mask plate according to claim 3 or 4 makes, it is characterised in that data pattern Combined and formed by the unit figure of some circles, strip, square, taper, trapezoidal, triangle and/or irregular shape.
- 6. the Optimization Design that a kind of mask plate according to claim 5 makes, it is characterised in that any cell figure Dimension of picture be respectively less than the dimension of picture of exposure sources actual fabrication ability.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711471168.0A CN107885031A (en) | 2017-12-28 | 2017-12-28 | The Optimization Design that a kind of mask plate makes |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711471168.0A CN107885031A (en) | 2017-12-28 | 2017-12-28 | The Optimization Design that a kind of mask plate makes |
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| Publication Number | Publication Date |
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| CN107885031A true CN107885031A (en) | 2018-04-06 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201711471168.0A Pending CN107885031A (en) | 2017-12-28 | 2017-12-28 | The Optimization Design that a kind of mask plate makes |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114371596A (en) * | 2022-03-22 | 2022-04-19 | 合肥晶合集成电路股份有限公司 | Mask and correction method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102981356A (en) * | 2012-12-14 | 2013-03-20 | 京东方科技集团股份有限公司 | Method for reducing mask board splicing errors |
| CN104570611A (en) * | 2013-10-21 | 2015-04-29 | 合肥京东方光电科技有限公司 | Mask plate and method for reducing splicing exposure mula phenomenon |
| CN106444106A (en) * | 2016-10-24 | 2017-02-22 | 深圳市华星光电技术有限公司 | Mosaic area splicing method and system |
-
2017
- 2017-12-28 CN CN201711471168.0A patent/CN107885031A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102981356A (en) * | 2012-12-14 | 2013-03-20 | 京东方科技集团股份有限公司 | Method for reducing mask board splicing errors |
| CN104570611A (en) * | 2013-10-21 | 2015-04-29 | 合肥京东方光电科技有限公司 | Mask plate and method for reducing splicing exposure mula phenomenon |
| CN106444106A (en) * | 2016-10-24 | 2017-02-22 | 深圳市华星光电技术有限公司 | Mosaic area splicing method and system |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114371596A (en) * | 2022-03-22 | 2022-04-19 | 合肥晶合集成电路股份有限公司 | Mask and correction method thereof |
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Application publication date: 20180406 |
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