CN107797217A - Projection objective support meanss and photoetching machine equipment - Google Patents
Projection objective support meanss and photoetching machine equipment Download PDFInfo
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- CN107797217A CN107797217A CN201610777156.XA CN201610777156A CN107797217A CN 107797217 A CN107797217 A CN 107797217A CN 201610777156 A CN201610777156 A CN 201610777156A CN 107797217 A CN107797217 A CN 107797217A
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- projection objective
- support
- grid
- hollow out
- flexible support
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The present invention provides a kind of projection objective support meanss and the photoetching machine equipment using this projection objective support meanss, if this projection objective support meanss include the support body of flexible support of the barrel with dried layer hollow out, each layer of hollow out has several grids, the grid mutual dislocation of adjacent two layers hollow out, so so that the support meanss have proper rigidity, the grid of mutual dislocation disperses suffered load, improve bearing capacity, the grid and can of mutual dislocation enough absorbs vibration simultaneously, reduces interference of the vibration to object lens.And the photoetching machine equipment of this projection objective support meanss is used, except the support meanss with above-mentioned vibration damping, shock absorber is equipped with also between main substrate and basic framework, gives photoetching machine equipment double damping, has preferably ensured the working environment of projection objective.
Description
Technical field
The present invention relates to semiconductor applications, more particularly to projection objective support meanss and photoetching machine equipment.
Background technology
Litho machine is mainly that work stage carrying silicon chip or glass substrate etc. keep being synchronized with the movement under object lens with mask platform, and
The equipment for completing accurate exposure work.Photo-etching machine objective lens are installed on main substrate by support meanss, and frame vibration (includes ground
Base vibrates, vibration etc. caused by actuator counter-force) object lens are transferred to by support meanss, cause objective lens arrangement to be vibrated, cause into
The short-term errors of picture, endanger exposure accuracy.
To slow down external vibration by transmission of the main substrate to object lens, flexible supporting device is used between object lens and main substrate
Connection.Flexible mechanical structure occupies little space, and it respectively determines that the level of frame vibration can be slowed down to the size of rigidity；It is simultaneously soft
Property mechanical structure support hundreds of Dao thousands of kilograms object lens quality, maximum stress need to be ensured in material allowable stress safe range,
Therefore structure design has certain challenge.As field of lithography is to high accuracy and the continuous demand of high stability, to various
Flexible mechanical structure has carried out continuous exploration.
United States Patent (USP) US7554105 (B2) proposes a kind of method for avoiding resonating of 30Hz compliant mechanisms, and proposes
A kind of design structure and layout of inverted T shaped compliant mechanism, as shown in figure 1, the patent proposes a kind of system schema of the two poles of the earth vibration isolation,
Wherein the first order uses active damper, and for the low-frequency vibration on all kinds of basic frameworks, the second level is soft using Soft Mount
Property mechanism arrangement 100, for isolating the residual oscillation acceleration on main substrate.
Chinese patent CN104076612A (application number 201310103211.3) it is also proposed a kind of 6 rank characteristic frequencies and be less than
30Hz flexible apparatus, and a kind of design structure of the flexible support combined using multiple flexible hinge structures is proposed,
As shown in Figure 2.More flexible hinges described in the patent combine 200 total length 150mm-250mm (physical length 225mm),
Overall width 20mm-50mm, total height 80mm-150mm, but its flexible hinge structure is more sensitive to the deviation ratio of size, material, system
The rigidity uniformity of product is poor.
The content of the invention
To solve the above problems, the present invention proposes a kind of projection objective support meanss and uses this projection objective branch
The photoetching machine equipment of support arrangement, the major part of support meanss, engraved structure tool are used as using the flexible support with hollow out
There is the grid of mutual dislocation, using the teaching of the invention it is possible to provide proper rigidity.
To reach above-mentioned purpose, the present invention provides a kind of projection objective support meanss, positioned at projection objective and main substrate it
Between, including some groups of flexible support members around projection objective distribution, the figure that all flexible support members are formed
Shape is centrally located on the axis of the projection objective, and every group of flexible support members include a flexible branch being arranged on main substrate
Seat, the flexible support have a support body, and the support body is hollow barrel mast shape, and the barrel of the support body is set
If being equipped with dried layer hollow out, each layer of hollow out has several grids, the grid mutual dislocation of adjacent two layers hollow out.
Preferably, the grid is shaped as round rectangle.
Preferably, the grid number of each layer of hollow out, no more than eight, the barrel height between adjacent two layers grid is not small
In 1mm.
Preferably, the flexible support also includes
The one object lens interface being connected with the projection objective, above the support body；
The one main substrate interface being connected with the main substrate, below the support body.
Preferably, the diameter of the main substrate interface is more than the diameter of the support body.
Preferably, the support body is cylinder column, the external diameter of the support body is 30~50mm, wall thickness
For 3~10mm, the height of the support body is 80~150mm, shares 3~16 layers of hollow out, and each layer of hollow out has 3~8
Grid, the spacing of two neighboring grid is 1~12mm in same layer hollow out, the barrel between adjacent two layers grid highly for 1~
12mm, a diameter of 3~10mm of fillet of the grid.
Preferably, the support body is cylindroid column, the long external diameter and short external diameter all values of the support body
For 30~50mm, wall thickness is 3~10mm, and the height of the support body is 80~150mm, shares 3~16 layers of hollow out, often
One layer of hollow out has 3~8 grids, and the spacing of two neighboring grid is 1~12mm in same layer hollow out, adjacent two layers grid it
Between barrel be highly 1~12mm, a diameter of 3~10mm of fillet of the grid.
Preferably, the material of the support body is any one in 0Cr17Ni7Al, 65Mn, 4Cr13,60Si2MnA
Kind.
Preferably, the flexible support members are three groups, three groups of flexible support members formation isosceles triangles, described etc.
Lumbar triangle shape is centrally located on the axis of the projection objective.
Preferably, the first natural frequency of the flexible support is more than 800Hz.
Preferably, every group of flexible support members also include a spacing bearing, it is arranged on the main substrate, and is located at
Side of the flexible support away from the projection objective.
The present invention also provides a kind of photoetching machine equipment, includes successively from top to bottom
Projection objective, workpiece surface is delivered to for will be patterned into exposure energy；
Projection objective support equipment as described above, its one end contacts with the projection objective, for supporting the projection
Object lens, the other end are fixed on main substrate；
Main substrate, for placing workpiece；
Shock absorber, the vibration being subject to for slowing down photoetching machine equipment；
Basic framework, for supporting the main substrate and the shock absorber；
Ground.
Preferably, the characteristic frequency of the shock absorber is 0.5Hz.
Preferably, every group of flexible support members also include several dampers, be arranged on the projection objective with it is described
Between main substrate.
Preferably, the damper is in side of the flexible support away from the projection objective.
Compared with prior art, the beneficial effects of the invention are as follows：The present invention provide a kind of projection objective support meanss and
Using the photoetching machine equipment of this projection objective support meanss, if this projection objective support meanss include barrel and have dried layer
The support body of the flexible support of hollow out, each layer of hollow out have several grids, the grid mutual dislocation of adjacent two layers hollow out,
So so that the support meanss have proper rigidity, suffered load is disperseed, improves and hold by the grid of mutual dislocation
Loading capability, while the grid and can of mutual dislocation enough absorbs vibration, reduces interference of the vibration to object lens.And use this projection
The photoetching machine equipment of object lens support meanss, except the support meanss with above-mentioned vibration damping, also between main substrate and basic framework
Shock absorber is equipped with, photoetching machine equipment double damping is given, has preferably ensured the working environment of projection objective.
Brief description of the drawings
Fig. 1 is the flexible support structure provided in the prior art；
Fig. 2 is the flexible hinge structure provided in the prior art；
Fig. 3 is litho machine device structure schematic diagram provided by the invention；
Fig. 4 is the flexible support members distribution schematic diagram of the embodiment of the present invention one；
Fig. 5 is the flexible support structural representation of the embodiment of the present invention one；
Fig. 6 is the flexible support front view of the embodiment of the present invention one；
Fig. 7 is the sectional view at A-A in Fig. 6；
Fig. 8 is the flexible support of the embodiment of the present invention one only by deformation simulation figure during Z-direction load；
Fig. 9 is the flexible support of the embodiment of the present invention one only by deformation simulation figure when X and Y-direction load；
Figure 10 a~Figure 10 d are the flexible support members distribution schematic diagram of the embodiment of the present invention two；
Figure 11 is the flexible support structural representation of the embodiment of the present invention two；
Figure 12 is the flexible support front view of the embodiment of the present invention two；
Figure 13 is sectional view at B-B in Figure 12；
In Fig. 1：100-Soft Mount compliant mechanism devices；
In Fig. 2：The more flexible hinge combinations of 200-；
Present invention diagram：1- projection objectives, 2- main substrates, 3- flexible support members, 31- flexible supports, 311- bearing sheets
Body, 3111- grids, 312- object lens interface, 313- main substrates interface, the spacing bearings of 32-, 33- dampers, 4- shock absorbers, 5- bases
Plinth framework, 6- grounds；
t1- wall thickness, t2- grid spacing, t3The spacing of-adjacent two layers grid, D1- support body external diameter, D2- bearing sheet
The long external diameter of body, D3The short external diameter of-support body.
Embodiment
In order to facilitate the understanding of the purposes, features and advantages of the present invention, below in conjunction with the accompanying drawings to the present invention
Embodiment be described in detail.
Embodiment one
Fig. 3 is refer to, the present invention provides a kind of projection objective support meanss, between projection objective 1 and main substrate 2,
For alleviating and absorbing the vibration of main substrate 2, projection objective 1 is avoided to be affected.
The support meanss mainly include some groups of flexible support members 3 on the distribution of the formed symmetrical of projection objective 1, with water
Square to being Z axis for X-axis, vertical direction, it is Y-axis perpendicular to the direction of XZ planes, establishes XYZ three-dimensional system of coordinates.
The flexible support members 3 and R after the assembling of projection objective 1X、RYAnd RZModal frequency value depends not only on flexible support
Three directional stiffness of component 3, the level of position, the center of gravity of projection objective 1 with flexible support members 3 are hung down to position and center of gravity
To highly also close relation.
Fig. 4 is refer to, in the present embodiment, there is provided three groups of flexible support members 3, which form isosceles triangle, and
And in a top view, the center of the isosceles triangle and the center superposition of projection objective 1.It is preferred that three groups of flexible support members 3
Equilateral triangle is preferably formed as, on the axial symmetry of projection objective 1 so that center overlaps with barycenter.
The above-mentioned structure for being provided with three groups of flexible support members 3, its main substrate 2, projection objective 1 and three groups of flexible supports
The vibration shape that component 3 is formed is first three rank mode of translation, and first three rank modal frequency value can be estimated by following formula：
Wherein, knFor three groups of flexible support members 3 in X to, Y-direction or Z-direction global stiffness, fnFor flexible support members 3 complete with
X is to, Y-direction or Z-direction vibration frequency value after the assembling of projection objective 1, and m is the quality of projection objective 1, ωn(it is called for intrinsic frequency
Circular frequency).
Every group of flexible support members 3 mainly include flexible support 31, and flexible support 31 is from top to bottom again including with projecting thing
The main substrate interface 313 that object lens interface 312, support body 311 and the main substrate 2 that mirror 1 is connected are connected, in this reality
Apply in example, the diameter of main substrate interface 313 is maximum, and the diameter of object lens interface 312 is minimum.
Flexible support 31 bears vertical heavy load in Z-direction, up to more than 2000N, is also easy to produce stress concentration, if structure design is not
Rationally, when the stress born is more than material allowable stress, flexible support 31 will produce damaged；Even if stress is less than, material is allowable to answer
Power, larger stress long term also can cause flexible support 31 stress fatigue occur, shorten it and use the longevity in flexible support 31
Life.Therefore in the design of flexible support 31, stress caused by load effect need to be reduced as far as possible.
In the present invention, Fig. 5 to Fig. 7 is refer to, the support body 311 of flexible support 31 is cylinder column structure, internal empty
The heart, in the present embodiment, support body 311 are cylinder column, and the barrel of support body 311 has engraved structure, and barrel is equal
If being divided into dried layer, each layer has an engraved structure, and each layer of engraved structure is several grids 3111, the shape of grid 3111
It may be set to round rectangle.
Fig. 8 and Fig. 9 are refer to, in order to prevent support body 311 from producing stress concentration point during loaded, it is necessary to will
Stress suffered by it disperses, the measure taken of the present invention be by each layer of 3111 interlaced arrangement of grid, it is such a
Structure above and below grid 3111 differs, then raw stress concentration point of relatively having difficult labour.
Even if there is provided the grid 3111 of interlaced arrangement, Fig. 8 is refer to, Z-direction load remains to cause in support body 311
Produce maximum stress is born a little.In the present invention, each layer of series connection of flexible support 31 forms the load close to plane curved bar
Pattern, the greatest flexibility deformation that each layer of flexible support 31
Δ z=F × π × (d-t1/2)3[(1/ (6 × E × I)+1/ (2 × G × Ip)], its rigidity is
K=F/ Δs z=2 × E × G × I × Ip/ [π × ((d-t1/2)3×(3×E×I+G×Ip)]
Wherein：The moment of inertia of I-cross section, I=t3×t1 3/12
Ip=π × [D4-(D-2t1)4]/32
The modulus of elasticity of E-material
The shear modulus of G-material.
It was found from above formula, stress bears a little to be typically distributed at the fillet of each round rectangle of grid 3111, stress intensity
Main determining factor have 3111 numbers of every layer of grid, the spacing t of adjacent two layers grid 31113, two phases in same layer hollow out
The distance of adjacent grid 3111 is grid spacing t2, the radius of corner R of grid 3111 and the drum diameter of support body 311
That is support body outer diameter D1With wall thickness t1, hollow out the number of plies etc..These parameters of support body 311 are interrelated, need close
The rigidity meet demand of support body 311 can just be made and so that stress value is as small as possible at the fillet of grid 3111 by cutting matching, be had
Body is：
The number of grid 3111 can not be excessive on every layer of engraved structure, usually more than 8；
The spacing t of adjacent two layers grid3Can not be too small, typically no less than 1mm, it otherwise will cause the circle of each grid 3111
Stress is excessive at angle；
The radius of the fillet of grid 3111 is bigger, and its stress is smaller；
Support body outer diameter D1Bigger, stress concentration is smaller at the fillet of each grid 3111, and support body 311 is being born
Smaller stress can be produced during vertical load.
In the present embodiment, support body outer diameter D1For 30~50mm, wall thickness t1For 3~10mm, flexible support 31
Highly (the height summation of object lens interface 312, support body 311 and main substrate interface 313) is 80~150mm, support body
311 are provided with 3~16 layers of engraved structure altogether, and each layer has 3~8 grids 3111, two neighboring net in same layer hollow out
The spacing of lattice 3111 is grid spacing t2For 1~12mm, the barrel between adjacent two layers grid 3111 is highly adjacent two layers net
The spacing t of lattice3For 1~12mm, a diameter of 3~10mm of fillet of grid 3111.It is preferred that the diameter of main substrate interface 313 is most
Greatly 75mm, it is highly 10mm.
The fatigue life of flexible support 31 is also relevant with the selection of material, and flexible support 31 generally determines rigidity part, its material
Material is more using yield tensile ratio height, the material of good toughness, is manufactured in of the invention using 0Cr17Ni7Al.Different, the support body depending on purposes
311 can also use high-yield-ratio, the material manufactures of high tenacity such as 65Mn, 4Cr13,60Si2MnA.
In every group of flexible support members 3, to avoid flexible support 31 caused by unknown external force during use destroyed,
Spacing bearing 32 need to be installed around flexible support 31, in every group of flexible support members 3, spacing bearing 32 is located at flexible support
31 sides away from projection objective 1.
Using the flexible support members 3 of said structure, assemble higher or lower than projection objective 1 and flexible support members 3 and
Into the external interference signal of overall intrinsic frequency will be difficult to be delivered on projection objective 1, so as to realize projection objective 1 and main base
Plate 2 assembly, 6 free degree mode are less than 30Hz.
The intrinsic frequency of itself of flexible support 31 is more than 100Hz, for avoid with the intrinsic frequency of flexible support 31 similar in shake
Dynamic frequency causes the resonance of flexible support 31, and vibration isolation is had an impact, it is necessary to provides damper 33, damper for projection objective 1
33 can be provided by every group of flexible support members 3 itself, also can be in the additionally mounted damper 33 of the other positions of projection objective 1.
In the present embodiment, damper 33 is placed between projection objective 1 and main substrate 2, in every group of flexible support members 3, damper
33 are placed between spacing bearing 32 and flexible support 31.Due to litho machine layout requirements, some sensors or other devices can
, towards the side of flexible support members 3, to be supported installed in projection objective 1 by flexible support 31.
The height of flexible support 31 provided by the invention is about 80~150mm, relative to the flexibility provided in the prior art
Structure, its structure is more compact, and highly relatively low then center of gravity is relatively low, improves the stability of correlation.
The present invention also provides a kind of photoetching machine equipment using above-mentioned projection objective support meanss, as shown in figure 3, from up to
Under be followed successively by 1, three group of flexible support members 3 of projection objective, main substrate 2, shock absorber 4, basic framework 5 and ground 6.
For projection objective 1 as most precise part and benchmark in litho machine, the requirement to ambient vibration is very harsh, therefore makes
By the use of three groups of flexible support members 3 as accurate and auxiliarily dampening apparatus, vibration damping is used between main substrate 2 and basic framework 5
Device 4, its characteristic frequency are generally 0.5Hz, for absorbing the low-frequency vibration on basic framework 5, now, the remnants on main substrate 2
Vibration is minimum with 30Hz or so accountings, therefore the characteristic frequency about 30Hz of the flexible support members 3 used, for isolating main substrate
Residual oscillation acceleration on 2, good working environment is created to projection objective 1.
Embodiment two
Figure 11 to Figure 13 is refer to, the present embodiment and the difference of embodiment one are that support body 311 is cylindroid column,
The long outer diameter D of support body2With short outer diameter D3All value is 30~50mm, wall thickness t1For 3~10mm, the height of flexible support 31
It is 80~150mm to spend (the height summation of object lens interface 312, support body 311 and main substrate interface 313), shares 3~16 layers
Hollow out, each layer of hollow out have 3~8 grids 3111, the grid spacing t of two neighboring grid 3111 in same layer hollow out2For 1
~12mm, the barrel between adjacent two layers grid 3111 are highly the spacing t of adjacent two layers grid3For 1~12mm, grid 3111
The a diameter of 3~10mm of fillet.
Refer to Figure 10 a~10d, due in the present embodiment support body 311 use non-cylindrical column shape, therefore its X to,
Y-direction, RXTo, RYUpward flexibility has differences, although therefore three groups of flexible support members 3 are still scattered in isosceles in the present embodiment
Triangle, but such as Figure 10 a, wherein the long external diameter direction of apex support body 311 corresponding to two waists is Y-direction, the branch at the 3rd
Seat body 311 long external diameter direction for X to.Also Figure 10 b~10d are referred to, according to being actually needed, adjust each flexible support
31 angles put, so as to adjust the rigidity of whole flexible support members 3.
The present invention is provided a kind of projection objective support meanss and set using the litho machine of this projection objective support meanss
It is standby, it is each if this projection objective support meanss include the support body 311 of flexible support 31 of the barrel with dried layer hollow out
Layer hollow out has several grids 3111, the mutual dislocation of grid 3111 of adjacent two layers hollow out, so that the support meanss have
There is proper rigidity, the grid of mutual dislocation disperses suffered load, that is, improves bearing capacity, while mutual dislocation
Grid 3111 can absorb vibration, reduce interference of the vibration to projection objective 1.And use this projection objective support meanss
Photoetching machine equipment, except the support meanss with above-mentioned vibration damping, be also equipped with shock absorber between main substrate 2 and basic framework 5
4, photoetching machine equipment double damping is given, has preferably ensured the working environment of projection objective 1.
Above-described embodiment is described the present invention, but the present invention is not limited only to above-described embodiment.Obvious this area
Technical staff can carry out various changes and modification without departing from the spirit and scope of the present invention to invention.So, if this hair
These bright modifications and variations belong within the scope of the claims in the present invention and its equivalent technologies, then the present invention is also intended to include
Including these changes and modification.
Claims (15)
1. a kind of projection objective support meanss, between projection objective and main substrate, it is characterised in that including around the throwing
Some groups of flexible support members of shadow object lens distribution, the figure that all flexible support members are formed are centrally located at the throwing
On the axis of shadow object lens, every group of flexible support members include a flexible support being arranged on main substrate, the flexible support tool
There is a support body, the support body is hollow barrel mast shape, if the barrel of the support body is provided with dried layer hollow out, often
One layer of hollow out has several grids, the grid mutual dislocation of adjacent two layers hollow out.
2. projection objective support meanss as claimed in claim 1, it is characterised in that the grid is shaped as round rectangle.
3. projection objective support meanss as claimed in claim 2, it is characterised in that the grid number of each layer of hollow out is not more than eight
Individual, the barrel between adjacent two layers grid is highly not less than 1mm.
4. projection objective support meanss as claimed in claim 1, it is characterised in that the flexible support also includes
The one object lens interface being connected with the projection objective, above the support body；
The one main substrate interface being connected with the main substrate, below the support body.
5. projection objective support meanss as claimed in claim 4, it is characterised in that the diameter of the main substrate interface is more than institute
State the diameter of support body.
6. projection objective support meanss as claimed in claim 2, it is characterised in that the support body is cylinder column, institute
The external diameter for stating support body is 30~50mm, and wall thickness is 3~10mm, and the height of the support body is 80~150mm, altogether
Have 3~16 layers of hollow out, each layer of hollow out has 3~8 grids, in same layer hollow out the spacing of two neighboring grid for 1~
12mm, the barrel between adjacent two layers grid is highly 1~12mm, a diameter of 3~10mm of fillet of the grid.
7. projection objective support meanss as claimed in claim 2, it is characterised in that the support body is cylindroid column,
The long external diameter and short external diameter all values of the support body are 30~50mm, and wall thickness is 3~10mm, the support body
It is highly 80~150mm, shares 3~16 layers of hollow out, each layer of hollow out has 3~8 grids, two neighboring in same layer hollow out
The spacing of grid is 1~12mm, and the barrel between adjacent two layers grid is highly 1~12mm, the fillet a diameter of 3 of the grid
~10mm.
8. projection objective support meanss as claimed in claim 1, it is characterised in that the material of the support body is
Any one in 0Cr17Ni7Al, 65Mn, 4Cr13,60Si2MnA.
9. projection objective support meanss as claimed in claim 1, it is characterised in that the flexible support members be three groups, three
Group flexible support members form isosceles triangle, and the isosceles triangle is centrally located on the axis of the projection objective.
10. projection objective support meanss as claimed in claim 1, it is characterised in that the intrinsic frequency of single order of the flexible support
Rate is more than 800Hz.
11. projection objective support meanss as claimed in claim 1, it is characterised in that every group of flexible support members also include one
Spacing bearing, it is arranged on the main substrate, and is located at side of the flexible support away from the projection objective.
12. a kind of photoetching machine equipment, it is characterised in that include successively from top to bottom
Projection objective, workpiece surface is delivered to for will be patterned into exposure energy；
Projection objective support equipment as described in claim 1~11, its one end contacts with the projection objective, for supporting
Projection objective is stated, the other end is fixed on main substrate；
Main substrate, for placing workpiece；
Shock absorber, the vibration being subject to for slowing down photoetching machine equipment；
Basic framework, for supporting the main substrate and the shock absorber；
Ground.
13. photoetching machine equipment as claimed in claim 12, it is characterised in that the characteristic frequency of the shock absorber is 0.5Hz.
14. photoetching machine equipment as claimed in claim 12, it is characterised in that every group of flexible support members also include several resistances
Buddhist nun's device, it is arranged between the projection objective and the main substrate.
15. photoetching machine equipment as claimed in claim 14, it is characterised in that the damper is remote in the flexible support
The side of the projection objective.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111853481A (en) * | 2020-08-14 | 2020-10-30 | 西安应用光学研究所 | Multi-degree-of-freedom flexible supporting structure and photoelectric stabilized sighting turret universal frame |
| CN113867106A (en) * | 2021-09-22 | 2021-12-31 | 哈尔滨工业大学 | Mask table vibration isolation device of photoetching machine |
| CN114087460A (en) * | 2020-08-24 | 2022-02-25 | 上海微电子装备（集团）股份有限公司 | Sensor heat insulation structure |
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| CN103867622A (en) * | 2012-12-11 | 2014-06-18 | 上海微电子装备有限公司 | Flexible device for vibration isolation and photo-etching equipment using device |
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| CN111853481B (en) * | 2020-08-14 | 2022-04-05 | 西安应用光学研究所 | Multi-degree-of-freedom flexible supporting structure and photoelectric stabilized sighting turret universal frame |
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