CN107768217A - Self-separating ion source - Google Patents
Self-separating ion source Download PDFInfo
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- CN107768217A CN107768217A CN201610723479.0A CN201610723479A CN107768217A CN 107768217 A CN107768217 A CN 107768217A CN 201610723479 A CN201610723479 A CN 201610723479A CN 107768217 A CN107768217 A CN 107768217A
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- 150000002500 ions Chemical class 0.000 claims abstract description 95
- 238000000926 separation method Methods 0.000 claims abstract description 37
- 150000001875 compounds Chemical class 0.000 claims abstract description 25
- 238000003860 storage Methods 0.000 claims abstract description 24
- 238000010884 ion-beam technique Methods 0.000 claims abstract description 17
- 230000007935 neutral effect Effects 0.000 claims abstract description 16
- 239000002994 raw material Substances 0.000 claims abstract description 7
- 150000001768 cations Chemical class 0.000 claims description 59
- 230000003068 static effect Effects 0.000 claims description 16
- 238000004519 manufacturing process Methods 0.000 claims description 14
- 230000004913 activation Effects 0.000 claims description 10
- 238000005265 energy consumption Methods 0.000 claims description 8
- 238000002955 isolation Methods 0.000 claims description 8
- 230000005611 electricity Effects 0.000 claims description 7
- 230000033001 locomotion Effects 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- 238000007599 discharging Methods 0.000 claims description 5
- 239000008246 gaseous mixture Substances 0.000 claims description 5
- 238000005086 pumping Methods 0.000 claims description 4
- 239000004020 conductor Substances 0.000 claims description 3
- 230000003321 amplification Effects 0.000 claims description 2
- 230000008014 freezing Effects 0.000 claims description 2
- 238000007710 freezing Methods 0.000 claims description 2
- 238000003199 nucleic acid amplification method Methods 0.000 claims description 2
- 125000004122 cyclic group Chemical group 0.000 claims 1
- 238000011084 recovery Methods 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 66
- 230000005684 electric field Effects 0.000 description 35
- 239000000047 product Substances 0.000 description 15
- 239000000463 material Substances 0.000 description 10
- 239000003990 capacitor Substances 0.000 description 8
- 238000005040 ion trap Methods 0.000 description 5
- 239000002699 waste material Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical group [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 230000009514 concussion Effects 0.000 description 2
- 230000006837 decompression Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 239000003574 free electron Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000021715 photosynthesis, light harvesting Effects 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- -1 cation compound Chemical class 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 230000001149 cognitive effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000005381 potential energy Methods 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/022—Details
Abstract
The application relates to a self-separation ion source, in particular to a device capable of producing low-energy positive ion beams at high power. The low-temperature plasma generating system consists of a multi-grid plasma generator, an alternating current power supply and a control system. The low-temperature plasma generation system ionizes the raw materials flowing through the ionization space, and electrons concentrated on the ionization plate automatically flow to the electron storage and the cathode plate through the separating switch. The non-ionized neutral feed gas continues to circulate within the circulation system. After the positive ions are used by the positive ion using device, the positive ions move to the anode and are compounded with electrons, and the compound energy (equal to ionization energy) of the electrons and the positive ions is recovered by the energy recovery system.
Description
Technical field
The present invention relates to a kind of device that can produce high-power low energy positive ion beam at normal temperatures and pressures.
Background technology
Ion gun is to make neutral atom or molecular ionization, and therefrom draws the device of ion beam current.It is various types of
Ion accelerator, mass spectrograph, calutron, ion implantation apparatus, ion beam etching device, ion propeller and by
The indispensable part of the equipment such as the neutral-beam injector in fusion facility is controlled, is the primary study side of current frontier science and technology
To.
At present it is known that ion gun have a variety of, but have the shortcomings that common, mainly 1, the positive ion beam power of production all compares
It is smaller, typically all below 10 amperes of levels.2nd, the positive ion beam of production is energetic ion.Main cause is to draw positive ion beam
When all using DC electric field, it is assumed that it is 10 volts to draw electric field both end voltage, and the single cation for containing a positive charge will draw
Go out in electric field by electric field acceleration, 10ev kinetic energy will be possessed after extraction.3rd, energy consumption wastes serious.Cation needs defeated in production
Enter energy, generally greater than corresponding ionization energy, but it is that cation and the electronics ionized is again not compound after cation application,
Recycled again so as to which ionization energy is changed into electric energy, cause the ionization energy of all positive ions all to waste.In addition, it is assumed that draw
Go out electric field for 10 volts, it is 20ev to draw the energy needed for a cation and an electronics containing single positive charge, this energy
It is not recyclable, it is huge energy dissipation.
The content of the invention
Small-power and high energy consumption ion gun seriously govern the application and application prospect of ion, in order to overcome it is existing from
The shortcomings that component, the present invention provide a kind of ion gun, can be with the high-power production low energy positive ion beam of less energy consumption cost.
This from separation ion gun be made up of 8 systems, be respectively low temperature plasma occur system, ion isolation system,
Energy-recuperation system, feed system, the circulatory system, discharge system, activation system and control system.
The control system is made up of governor circuit, sensor and control original paper, and its function is control other systems
Action sequence and movement range, its control sequential and amplitude are set according to operating mode.Because the mode of realization is more, monolithic can be used
Machine is realized, all can also be realized with hardware circuit, and this specification only illustrates its control sequential and span of control limit of control, and circuit composition saves
Slightly.
It is to produce low temperature plasma under relatively low energy consumption cost that system main function, which occurs, for the low temperature plasma
With neutral atom or molecular mixing gas.It is made up of more grid-type plasma generator, AC power and control systems.More grid-type etc.
Ion generator by multiple (two or more) grid shape separated by a distance or grid-shaped conductive plate (hereinafter referred to as ionization pole
Plate) ranked and stacked pile, ionization polar plate interval parallel connection after both ends concatenate two electric capacity (hereinafter referred to as biasing capacitance) form.More grid-type etc.
Ion generator external AC power supply.Every variable element such as the AC power, its voltage, waveform, frequency is by the control
System controls.
Particularly, ionization pole plate group lamination stack is placed with two ways, plane heap-type and coaxial heap-type.Plane heap-type refers to more
The grid shape pole plate of individual parallel plane separated by a distance carries out longitudinal direction (direction is perpendicular to gate planar) superposition, coaxial heap-type
Refer to that the grid shape pole plate of multiple parallel curved surfaces separated by a distance is overlapped with same axis.
The operation principle in the case where being not connected to the ion isolation system situation that system occurs for the low temperature plasma is：
Two adjacent ionization pole plates and its folded space form an ionization module, and institute's clip space is ionization space, root
According to physical principle, the parallel electrically conductive pole plate full of dielectric forms a capacitor among two, and the capacitor is referred to as ionizing electricity
Hold, it is in parallel that ionization pole plate group is equivalent to multiple ionization capacitors.It is in parallel that more grid-type plasma generators are equivalent to multiple ionization capacitors
Connected afterwards with two biasing capacitances.Boosted with the forward direction of external power, external power charges to ionization capacitor and biasing capacitance, ionization
In space formed uniform electric field (electric field is produced by external power, hereinafter referred to as extra electric field), extra electric field with external power liter
Press and strengthen.When electric field increases to it is sufficiently high when, be ionized free electron in material and be accelerated along electric field line opposite direction, and then hit
Hitting neutral atom or molecule causes its outer-shell electron to be ionized, and the electronics ionized out and original electronics continue by electric field acceleration,
And then other neutral atoms or molecule are hit, electron avalanche is formed, generates plasma.After electron detachment neutral atom or molecule,
Neutral atom or molecule are changed into cation.Cation electronically forms intrinsic electrical field with what is be ionized away, its direction and outer power-up
Field is opposite.Under the collective effect of extra electric field and intrinsic electrical field, free electron and the electronics being ionized out are anti-along extra electric field
Direction is moved toward pole plate direction, and largely reaches pole plate with certain speed.Cation is by being total in external electric field and intrinsic electrical field
Moved under same-action along electric field line direction toward another pole plate, when gas pressure intensity sufficiently high (normal pressure or so), cation is substantially not
It is dynamic.The electronics being ionized out possesses speed and kinetic energy before reaching grid shape pole plate, and few part electronics will hit grid pole plate, and it is dynamic
Heat energy can be converted to, causes pole plate to generate heat, most of electronics will continue to move ahead through grid shape pole plate, into adjacent ionization space
(assuming that electrode thickness is infinitely small, in order to analyze and illustrate, the end product of the pole plate of infinitely small thickness and actual pole plate is basic
It is identical).Because multiple gate spacers are in parallel, the extra electric field direction and this ionization space extra electric field direction of adjacent ionization space
On the contrary, now, identical with adjacent extra electric field direction through the electron motion direction of grid, adjacent reverse extra electric field is to electricity
Sub reversely acting (negative work), the i.e. external power source charges of electronics, cause photoelectrons slow into adjacent ionization space and until be zero,
The kinetic energy that now electronics possesses before pole plate is reached translates into external power energy.Afterwards, reverse adjacent extra electric field will be right
Electronics does positive work, causes electronics to be accelerated in opposite direction, and moves back former pole plate (few department's electronic impact pole plate heating), by
Progressively weakening in electric field strength, now, the kinetic energy that electronics possesses is less than the energy of the external power source charges of original electronics,
During electronics returns to pole plate again through pole plate, the part energy of electronics has been converted into external power energy.Afterwards electronics with
Certain speed enters original ionization space, and now electron motion direction is again identical with extra electric field direction, and electronics is again to dispatch from foreign news agency
Source is charged, and does positive work by former extra electric field again afterwards, is accelerated again and is moved (few department's electronic impact pole plate hair to pole plate
Heat), part energy is again converted to external power energy.Electronics will constantly repeat above procedure after reaching pole plate, be formed with pole
The concussion campaign that amplitude weakens successively centered on plate, until energy is completely converted into external power energy.When external power reaches just
During to crest, ionization stops.As external power is descending from positive crest, under intrinsic electrical field and the collective effect of extra electric field,
The electronics being ionized out moves along dispatch from foreign news agency field direction, and compound successively with cation, generates new neutral atom or molecule.Electronics
With cation it is all compound after, two-plate is equivalent to an ionization capacitor again.After external power is reverse, with the liter of backward voltage
Height, external power are ionized to ionization capacitor and biasing capacitance reverse charging, generate plasma again.Few part electronics
Pole plate heating, most of electronics still damped oscillation centered on pole plate are hit, until itself kinetic energy is converted into external power energy
Amount.When external power reaches reverse crest, ionization stops.As external reference voltages decline from reverse crest, the electricity being ionized out
Son and cation are compound again, generate new neutral atom or molecule.After electronics and cation are all compound, two-plate is again equivalent
For an ionization capacitor.Under the excitation of external ac power source, each ionization module constantly ionizes generation plasma, and constantly
It is compound, generate new neutral atom or molecule.
The main function one of the ion isolation system is to be electrically separated out in plasma, second, ion from
Neutral molecule (atom) and from being separated in molecular gaseous mixture.After ion isolation system, gaseous mixture will be separated into
Pure neutral gas and pure ionized gas.Ion isolation system is by separation cavity, negative electrode, separating switch, electronic storage, sun
Pole, separation power supply, separation anode, separation check valve, control system composition.Separation cavity is divided laterally into two parts, one
It is divided into plasma chamber, a part is ion cavity, and the two is connected by separating check valve or unidirectional valve group.When separation is unidirectional
The powerful conducting of check valve when ion chamber body end pressure of valve plasma chamber side pressure, is otherwise closed.Plasma chamber is provided with air inlet
And gas outlet, gas outlet are placed in check valve one end, and check valve is adjacent, and longitudinal opening, air inlet is arranged at the other end.Air inlet
It can be multiple with gas outlet, preferably be symmetrical arranged.More grid-type plasma generators are positioned among air inlet and gas outlet, grid
Shape pole plate plane tangent direction is laterally.Neutral raw gas enters from air inlet, is discharged from gas outlet, pure ion-gas passes through unidirectional
Valve enters ion chamber.Separation power supply is dc source, and general 10 volts or so, negative pole ground connection, positive pole connects separation anode.Separate anode
In netted, covering gas outlet, to prevent cation from being discharged by gas outlet.Ion chamber one end is check valve, and the other end is provided with out
Material mouth, anode is placed among discharging opening and check valve.Check valve and anode intermediate space placement ion use device, such as from
Sub- accelerator, calutron etc..Chamber outer wall parcel negative electrode is separated, the projection of negative electrode in the horizontal will at least cover
Grid-type plasma generator, gas outlet, separation anode, separation check valve, the projection of ion use device and anode in the horizontal.
Electronic storage is placed in that disengagement chamber is external, by surface area leading much larger than more grid-type plasma generators ionization pole plate group surface area
System is into it is connected by the pole plate group end of two separating switch and two biasing capacitances.When the voltage of place pole plate starts
From above freezing liter when, switch conduction, when the voltage of place pole plate rises to crest, switch close.Electronic storage and negative electrode are straight
Connect connected.The control system is mainly responsible for the precision maneuver on time of separating switch, and it is sampled from AC power, at signal
Separating switch is driven after reason, power amplification.The input negative pole termination electronic storage of energy-recuperation system, input positive pole termination sun
Pole.
Particularly, anode shape can be able to be cellular, latticed, palisade, tabular etc. according to different operating modes with changeable.
Particularly, anode may not only be placed among ion use device and discharging opening, can also be placed in ion use device
In or substituted with the pole plate of ion use device.
Particularly, separating switch can use electronic switch, electromagnetic switch, and mechanical switch etc. can also be used all kinds of controllable
Switch.
The main function of the energy-recuperation system is to reclaim the compound energy of electronics and cation (being equal to ionization energy)
Utilize.It can be all kinds of DC loads or inverter.When for inverter when, before the load of its output end can be
AC power is stated, can be used for other loads.
The main function of the discharge system is that the product of electronics and cation after compound is discharged and kept in ion chamber
Pressure be equal to static pressure in plasma chamber (static pressure is pressure when plasma intracavity gas are static in plasma chamber, when
After the circulatory system starts, gas flows in plasma chamber, and now pressure is dynamic pressure, and static pressure is powerful in dynamic pressure).By
New material can be produced after electronics and cation are compound, it may be possible to gas, it is also possible to it is liquid or solid, discharge system
Flexibly set according to operating mode.For example, if ambient pressure is normal pressure, static pressure is also normal pressure in plasma chamber, and product is gas
State and liquid, then discharge system is only in ion chamber end lowest part opening.If ambient pressure is vacuum, in plasma chamber
Static pressure is normal pressure, and product is gaseous state and liquid, then discharge system need to install liquids and gases safety valve and be used for discharge, or
Pump of the installation with control system and valve discharges with to ensure product and keep in ion chamber pressure equal to static pressure in plasma chamber.
If product contains solid, need to be ensured product discharge simultaneously according to the suitable discharge system of solid matter featured configuration
Pressure in ion chamber is kept to be equal to static pressure in plasma chamber.
The main function of the circulatory system is to maintain plasma intracavity gas and flowed with setting speed.The circulatory system is by following
Ring pump, pipeline, circulation pumping source, control system composition.Circulating pump is connected by pipeline one end with the air inlet of plasma chamber, separately
One end is connected with the gas outlet of plasma chamber.Under control of the control system, the promotion gas of circulating pump with setting speed from etc.
Ion chamber air inlet enters, gone out from gas outlet.
Particularly, the system can be with changeable or even can remove according to operating mode.
The main function of the feed system is to ensure the cation equivalent (body to circulatory system supply and through check valve
Product) unstripped gas.Realize that the mode of this function is more, it can be realized by pump, pumping source and its control system, can also use one
Individual pressure-reducing valve is directly realized by.When being realized with pressure-reducing valve, pressure-reducing valve uses negative-feedback pressure-reducing valve, and gas outlet connects circulating line, air inlet
Mouth connects feed gas source.Its operation principle is：After circulatory system steady operation, gas flow rate will be with setting speed in circulating line
Constant speed flowing is kept, its pressure will keep constant, be decompression valve events pressure by the pressure set, when cation leaves plasma
When chamber enters ion chamber, circulatory system internal pressure good general declines, and decompression valve air gate pressure will be less than setting pressure, cause pressure-reducing valve
Open, supply raw material gas into the circulatory system, and when the volume for the gas that supplies raw material is equal to the volume of the cation of outflow, pressure-reducing valve will
Close.In this way, the unstripped gas of the cation equivalent (volume) to circulatory system supply and through check valve can be ensured.
The major function of the activation system is to ensure that the circulatory system, plasma intracavity gas are pure when ion gun starts
Unstripped gas.According to different operating modes, realize that this function there are many modes, for example at normal temperatures and pressures, a vavuum pump is connected
The circulatory system, gas handling system increase material inlet valve, close material inlet valve after start vavuum pump, you can by the circulatory system and wait from
Daughter intracavitary foreign gas is extracted out, then opens material inlet valve.
Outside condition of work is assumed below to be normal temperature and pressure, set in the circulatory system quiescent operation condition as normal temperature and pressure,
Ion is not placed and uses facility, and feed system uses a negative-feedback pressure-reducing valve, and discharge system is only a gas outlet, plasma chamber
Two gas outlets are symmetrical arranged, the operation principle after 8 system connections of the present invention is as follows：
1st, control system control activation system starts, it is ensured that is full of pure raw material gas in the circulatory system, plasma chamber.
2nd, the control system control circulatory system starts, until unstripped gas keeps stationary flow in the circulatory system, plasma chamber
Speed, unstripped gas possess stable transverse flow speed in more grid-type plasma generators.Now, due in plasma chamber pressure be less than ion
Intracavitary pressure, separate closed check valve.Because pressure-reducing valve outlet side pressure is setting pressure, pressure-reducing valve is closed.
3rd, system occurs for control system control control low temperature plasma, ion isolation system starts.Pure cation stream
Ion chamber will be flowed to by separating check valve, positive ion beam is formed in ion chamber, and eventually arrive at anode and electronics is compound,
Product after compound is discharged by discharge gate, meanwhile, equivalent unstripped gas is supplemented in the circulatory system by feed system, and principle is：
For any ionization module, note two-plate is respectively A and B, is located under AC power excitation, from t0 moment, A plates
Voltage is begun to ramp up from 0, and B plate voltages are started from scratch decline, now, the separating switch conducting connected with A plates, is connected with B plates
Separating switch is closed.As A plates voltage raises, ionization space forms uniform electric field, and B is pointed in direction from A, with the increasing of electric field
By force, gas starts to ionize in ionization space, forms electron avalanche, and a large amount of electronics do range of decrease concussion simultaneously after reaching A plates centered on A plates
Plane where eventually coming to rest at A plates (still assumes that electrode thickness is infinitely small, does not influence end product), and now, A plates are conductors,
Gap of plane turns into conductor because a large amount of electronics assemble where it, and its electron density is more than electronic storage and negative electrode table
Face electron density, possess relative potentials (hereinafter referred to as induced potential), in the presence of induced potential, a large amount of electronics tend to
Surface where electronic storage surface, cathode surface and A plates be evenly distributed (for ease of analysis, it is assumed that electronic storage, negative electrode and
A plate surface curvature is identical everywhere), because electronic storage surface area is much larger than A plates and cathodic surface area, most of electronics will divide
Cloth is on electronic storage surface.If t1Moment, A plates voltage reach crest, and now, the separating switch connected with A plates is closed,
The electronics ionized out largely has been distributed among electronic storage surface, although possessing the potential energy compound with cation, due to
Separating switch is closed, cation still wraps up more grid-type plasma generators and anode, two separation sun in transverse movement, negative electrode
Pole covers two gas outlets, electronics can only redistribute in electronic storage, negative electrode and anode surface, ultimately forms cation and refers to
To the intrinsic electrical field of anode.Because cation possesses lateral velocity and by the active force of intrinsic electrical field, cation before ionization
The repulsion of anode of being separated when moving to plasma chamber exit stops, it is impossible to by gas outlet, in the presence of intrinsic electrical field,
Continue to move to separation check valve, after separation check valve plasma chamber end is moved to, separation check valve will be applied and point to sun
The power of pole, moved eventually through separation check valve to anode, cation stream is formed in ion chamber.When cation moves to anode
When, now, electronic storage, negative electrode, energy-recuperation system, anode and cation form path, the electronics being ionized out be intended to and
Cation is compound, it is necessary to is done work by energy-recuperation system and to the system, so as to realize the recovery of ionizing energy.When A, B plate
After voltage upset, electronic storage will be flowed to by B plates, B plate separating switch by being ionized electronics, and by energy-recuperation system most
It is compound in anode and cation eventually.
According to hydrodynamics, the neutral raw gas not being ionized circulates in the circulatory system, will not be by separating check valve.
It is now original when cation is by separating check valve into ion chamber, causing pressure increase in ion chamber
Product will be discharged by discharge system.
Generally, this from separation ion gun start after, under control of the control system, activation system ensure the circulatory system and
Plasma intracavity gas are pure raw material gas, and the circulatory system ensures plasma intracavity gas with certain speed lateral flow, low temperature
Plasma generating system ionizes to the raw material for flowing through ionization space, and the electronics for focusing on ionization pole plate passes through separating switch
Automatic to flow to electronic storage and cathode plate, cation is separating the collective effect of anode, electronic storage, negative electrode, anode
Ion chamber is flowed into by check valve down, forms cation stream.The neutral raw gas not being ionized continues to circulate in the circulatory system.
When cation stream flows through check valve, the unstripped gas that feed system supplies equivalent to the circulatory system ensures that flow velocity is not in the circulatory system
Become.After cation use device is to cation use, cation moves to anode again and electronics is compound, the thing generated after compound
Matter is discharged through discharge system, and the recombination energy (being equal to ionization energy) of electronics and cation is reclaimed by energy-recuperation system.
The beneficial effects of the invention are as follows：
1st, high-power cation stream can be generated.
Existing ion gun is transmitted after cation body is generated by ion trap or class ion trap to cation, is made
Moved into cation on the center line of ion trap or class ion trap, so as to cause positive ion density huge, its potential is huge,
Before mankind's insulating materials does not have big breakthrough, the power for the cation stream that ion trap can be transmitted is very limited amount of.And present invention electricity
After son is split into electronic storage, cation is freely distributed in three dimensions, in the presence of cation phase repulsive interaction,
Cation is more likely to be evenly distributed in plasma chamber, after entering ion chamber by check valve or unidirectional valve group, its be distributed into
One step is tended to be evenly distributed, and transferable cation stream power can be with huge.In addition, the present invention setting in generation plasma
Apply and employ more grid-type plasma generators, its power is only by AC power power limit, and known AC power is
Can with powerful, so, the present invention can produce and transmit high-power cation stream.
2nd, energy consumption is low.
Existing ion gun serious waste energy in produce plasma process, in separation electronics and cation
During further waste big energy, so when existing ion gun produces an ion only containing positive charge
The energy of waste is at least its first ionization energy+20ev (assuming that separation electric field is 10v), and this is huge energy dissipation.And this
Invention, when producing plasma, it is necessary to energy be only slightly higher than the first ionization energy, when separating electronics with little need for energy
Amount, but the present invention possesses energy-recuperation system, can all reclaim ionization energy, so, energy consumption of the invention is wasted and is greatly reduced.
3rd, it is widely used.
The present invention can not only substitute existing most of ion gun and meet all kinds of scientific researches and industrial needs, in fact big work(
Rate and low energy consumption production cation stream have opened up the new field of human cognitive！For example can easily it be realized using the present invention all kinds of
Chemical reaction, and required equipment is only single or multiple (the sharing ion chamber, negative electrode, anode) in parallel of the present invention！Utilize this
Invention can generate electricity！Ion gun is made using the present invention, ion propeller there will be bigger application space！Due to high-power and low energy
The appearance of ion stream is consumed, the field of human use's ion will be boundless.
Brief description of the drawings：
Fig. 1 is present system connection figure
Fig. 2 is one embodiment of the invention, and its operating mode is：Unstripped gas is gases at high pressure, extraneous low pressure, and the circulatory system is static
For normal temperature and pressure, electronics and the compound rear product of ion are gas.
Fig. 3 is another embodiment of the present invention, and its operating mode is：Unstripped gas is air, extraneous normal temperature and pressure, electronics and ion
Product is ozone and oxynitrides after compound.
Fig. 4 is another embodiment of the present invention, and its operating mode is：Unstripped gas is gases at high pressure, extraneous normal temperature and pressure, electronics and
Product is gas after ion is compound.
In Fig. 1,1 is feed system, and 2 be the circulatory system, and 3 be that system occurs for low temperature plasma, and 4 be piece-rate system, and 5 are
Discharge system, 6 be energy-recuperation system, and 7 be activation system, and 8 be control system.The direction of arrow is gas flow direction, black
Solid wire represents pilot.
Embodiment
The present invention is further illustrated below by the mode of embodiment, but does not therefore limit the present invention to described reality
Apply among a scope.
In Fig. 2, the control system of the present embodiment is not drawn into figure, and ion use device 21 is placed in ion chamber 19.This
Embodiment feed system is made up of pressure-reducing valve 1, and it sets conducting pressure as dynamic pressure in circulating line, when less than the pressure
When, pressure-reducing valve is opened, you can ensures the unstripped gas of supply and the cation equivalent (volume) through check valve into the circulatory system.
The present embodiment circulatory system is made up of major cycle pipeline 2, circulating pump 3, plasma chamber 20, under control of the control system, circulation
Pump keeps setting speed, you can keeps plasma intracavity gas to be flowed with setting speed.In figure, during direction is shown in filled arrows
Property gas flow direction.System occurs for the present embodiment low temperature plasma by AC power 4, biasing capacitance 5, grid shape pole plate group 6
Composition, under control of the control system, can be by setting power generation low temperature plasma.The present embodiment piece-rate system is by disengagement chamber
11 groups body 13, negative electrode 9, separating switch 7, electronic storage 8, anode 12, separation power supply 14, separation anode 10, separation of check valve
Into, under control of the control system, separating switch place pole plate voltage from 0 rise when conducting, to peaking when close, quilt
The electronics ionized out can flow to electronic storage, negative electrode, and return by energy in the presence of induced potential from ionization pole plate
Receipts system eventually arrives at anode and cation is compound；Under the collective effect of each part of piece-rate system, cation is from plasma chamber
Ion chamber is flowed into by separating check valve, and eventually arrives at anode.In figure, hollow arrow direction indication is ion flow direction.
The present embodiment energy-recuperation system is made up of inverter 15, and it inputs negative pole and connects electronic storage and negative electrode, and positive pole connects anode, when
Electronics and cation compound tense, inverter need to be done work, so as to by ionization energy recycling.The present embodiment discharge system is by pacifying
Full valve 16 forms.Because the external world is low pressure, circulatory system static state pressure is normal pressure, ion chamber is normal pressure, safety valve action pressure
It is set as circulatory system static state pressure (normal pressure), when pressure is higher than setting pressure in ion chamber, safety valve is opened, and is otherwise closed
Close, you can the product of electronics and cation after compound is discharged and keeps pressure in ion chamber to be equal to static pressure in plasma chamber
By force.The present embodiment activation system is made up of vavuum pump 17, material inlet valve 18, during startup, under control system control, and material inlet valve
18 close, and vavuum pump 17 starts, you can discharge the circulatory system and plasma intracavity gas, after discharge, close vavuum pump, open
Material inlet valve 18.
It is noted that it is the mistake of chemical reaction in the compound process nature of the electronics and ion of the generation of plate surface
Journey, removes ion use device, and this ion gun is exactly a chemical reaction device, particularly removes two after ion use device
Individual or this ion gun of two or more is (common cathode, ion chamber, anode) in parallel, that is, forms a special chemical reactor.
In Fig. 3 embodiments, control system is not drawn into figure, and ion use device is placed in ion chamber 19, is not drawn into.
Because unstripped gas is air, its circulatory system is substantially made up of pipeline 1, circulating pump 2, outside air, plasma chamber, due to
Unstripped gas (air) is had been filled with the circulatory system, therefore activation system need not be installed.Because external environment is normal temperature and pressure, product
For gas, therefore discharge system only has exhaust outlet 16.
It is noted that after the present embodiment removes ion use device, the gas from exhaust outlet discharge will be that concentration is extra-high
Ozone and nitrogen oxides gaseous mixture, can be used as ozone generator.
Particularly, the circulating line 2 in the present embodiment, circulating pump 3, separation anode 10, separation power supply 14 can also remove,
It is but different to the manufacture material of relevant apparatus after removing and before not going.
In Fig. 4 embodiments, control system is not drawn in figure, eliminates the circulatory system, because external environment is that normal temperature is normal
Pressure, product is gas, therefore discharge system only has exhaust outlet 16.Due to eliminating the circulatory system, therefore no longer need to separate anode
And its power supply.Due to eliminating the circulatory system, therefore the action pressure set for feeding pressure-reducing valve is (normal for static pressure in plasma chamber
Pressure).
Claims (8)
1. a kind of device for producing low energy positive ion beam, it is characterized in that：System, ion point occurs by low temperature plasma in it
Formed from system, energy-recuperation system, feed system, the circulatory system, discharge system, activation system and control system.Wherein, it is low
It is that low temperature plasma and neutral atom are produced under relatively low energy consumption cost or is divided that main function of system, which occurs, for isothermal plasma
Sub- gaseous mixture, the major function one of ion isolation system is to be electrically separated out in plasma, second, ion therefrom
Property molecule (atom) and from being separated in molecular gaseous mixture, the major function of energy-recuperation system be by electronics and just from
The compound energy (being equal to ionization energy) of son recycles, and the major function of discharge system is the production by electronics and cation after compound
Thing discharge and keep in ion chamber pressure to be equal to static pressure in plasma chamber (static pressure is gas in ion chamber in plasma chamber
Pressure when body is static, after the circulatory system starts, gas flows in plasma chamber, and now pressure is dynamic pressure), cyclic system
The major function of system is to maintain plasma intracavity gas and flowed with setting speed, and the major function of feed system is ensured to circulation
System is supplied and the unstripped gas of cation equivalent (volume) through separation check valve, the major function of activation system be to ensure that from
The circulatory system, plasma intracavity gas are pure raw material gas when component starts, the major function of control system be control other be
The action sequence and movement range of system, its control sequential and amplitude are set according to operating mode.
2. the device of production low energy positive ion beam according to claim 1, it is characterized in that：The low temperature plasma hair
Raw system is made up of more grid-type plasma generator, AC power and control systems, and more grid-type plasma generators are by multiple (two
More than individual) conductive plate (hereinafter referred to as ionizing pole plate) ranked and stacked pile of grid shape (or grid-shaped) separated by a distance, ionization
Both ends concatenate two electric capacity (hereinafter referred to as biasing capacitance) and formed after polar plate interval parallel connection.
3. the device of production low energy positive ion beam according to claim 1, it is characterized in that：The ion isolation system by
Separate cavity, negative electrode, separating switch, electronic storage, anode, separation power supply, separation anode, separation check valve, control system
Composition.Separation cavity is divided laterally into two parts, and a part is plasma chamber, and a part is ion cavity, and the two is logical
Cross separation check valve or the connection of unidirectional valve group, when separate check valve plasma chamber side pressure it is powerful in ion chamber body end pressure when it is single
Turn on to valve, otherwise close.Plasma chamber is provided with air inlet and gas outlet, and gas outlet is placed in separation check valve (or unidirectional valve group)
One end, and check valve are adjacent, longitudinal opening, can be symmetrical arranged multiple, and air inlet is arranged at the other end, can be symmetrical arranged multiple.
More grid-type plasma generators are positioned among air inlet and gas outlet, and grid shape pole plate plane tangent direction is laterally.Separation electricity
Source is dc source, general 10 volts or so, and negative pole ground connection, positive pole connects separation anode.It is in netted to separate anode, covers gas outlet,
To prevent cation from being discharged by gas outlet.Ion chamber one end is check valve, and the other end is provided with discharging opening, in discharging opening and unidirectionally
Anode is placed among valve.Check valve and anode intermediate space place ion use device, such as ionAccelerator、Electromagnetic isotope
Separator etc..Chamber outer wall parcel negative electrode is separated, the projection of negative electrode in the horizontal will at least cover grid-type plasma generator, go out
Gas port, separation anode, separation check valve, ion use device and anode.It is external that electronic storage is placed in disengagement chamber, by surface area
Conductor much larger than more grid-type plasma generators ionization pole plate group surface area is made, and it is inclined by two separating switch and two
The pole plate group end of voltage capacitance is connected.When the voltage of place pole plate starts from above freezing liter, switch conduction, when the electricity of place pole plate
When pressure rises to crest, switch is closed.Separating switch can use electronic switch, electromagnetic switch, can also use mechanical switch
Etc. all kinds of gate-controlled switches.Electronic storage and negative electrode are joined directly together.The control system is mainly responsible for the on time accurate of separating switch
Positive motion is made, and it is sampled from AC power, and separating switch is driven after signal transacting, power amplification.The input of energy-recuperation system
Negative pole terminates electronic storage, input positive pole termination anode.Anode shape can be able to be honeycomb according to different operating modes with changeable
Shape, latticed, palisade, tabular etc..Anode may not only be placed among ion use device and discharging opening, and can also be placed in ion makes
Substituted with device or with the pole plate of ion use device.
4. the device of production low energy positive ion beam according to claim 1, it is characterized in that：The energy-recuperation system can
To be all kinds of DC loads or inverter.
5. the device of production low energy positive ion beam according to claim 1, it is characterized in that：The discharge system is according to work
Condition is flexibly set.
6. the device of production low energy positive ion beam according to claim 1, it is characterized in that：The circulatory system is by circulating
Pump, pipeline, circulation pumping source, control system composition.Circulating pump is connected by pipeline one end with the air inlet of plasma chamber, another
End is connected with the gas outlet of plasma chamber, under control of the control system, the promotion gas of circulating pump with setting speed from grade from
Sub- chamber air inlet enters, gone out from gas outlet, and particularly, the system can be with changeable or even can remove according to operating mode.
7. the device of production low energy positive ion beam according to claim 1, it is characterized in that：The feed system is according to work
Condition can flexibly be set, and it can be realized by pump, pumping source and its control system, can also be directly realized by with a pressure-reducing valve.
8. the device of production low energy positive ion beam according to claim 1, it is characterized in that：The activation system is according to work
Condition can flexibly be set.
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| SU1741595A1 (en) * | 1990-05-31 | 1995-08-27 | Институт атомной энергии им.И.В.Курчатова | Ion beam energy recuperator |
| US6489610B1 (en) * | 1998-09-25 | 2002-12-03 | The State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of Oregon State University | Tandem time-of-flight mass spectrometer |
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| CN102291925A (en) * | 2005-03-07 | 2011-12-21 | 加州大学评议会 | Plasma electric generation system |
| CN103826379A (en) * | 2014-03-13 | 2014-05-28 | 华中科技大学 | Non-equilibrium plasma generator and granular powder surface modification treatment system |
| CN104836458A (en) * | 2015-05-15 | 2015-08-12 | 浙江工商大学 | Energy recovery device for gas plasma reactor and high voltage power supply with energy recovery |
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2016
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU1741595A1 (en) * | 1990-05-31 | 1995-08-27 | Институт атомной энергии им.И.В.Курчатова | Ion beam energy recuperator |
| US6489610B1 (en) * | 1998-09-25 | 2002-12-03 | The State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of Oregon State University | Tandem time-of-flight mass spectrometer |
| CN102291925A (en) * | 2005-03-07 | 2011-12-21 | 加州大学评议会 | Plasma electric generation system |
| CN101443853A (en) * | 2006-02-28 | 2009-05-27 | 劳伦斯威尔等离子物理公司 | Method and apparatus for producing X-rays, ion beams and nuclear fusion energy |
| CN103826379A (en) * | 2014-03-13 | 2014-05-28 | 华中科技大学 | Non-equilibrium plasma generator and granular powder surface modification treatment system |
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Application publication date: 20180306 |