CN107728245A - Light control film, display device and method for improving light control film - Google Patents
Light control film, display device and method for improving light control film Download PDFInfo
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- CN107728245A CN107728245A CN201711064833.4A CN201711064833A CN107728245A CN 107728245 A CN107728245 A CN 107728245A CN 201711064833 A CN201711064833 A CN 201711064833A CN 107728245 A CN107728245 A CN 107728245A
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- light control
- control film
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- diffraction grating
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- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 125000001204 arachidyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 235000009508 confectionery Nutrition 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- PKTOVQRKCNPVKY-UHFFFAOYSA-N dimethoxy(methyl)silicon Chemical compound CO[Si](C)OC PKTOVQRKCNPVKY-UHFFFAOYSA-N 0.000 description 1
- YQGOWXYZDLJBFL-UHFFFAOYSA-N dimethoxysilane Chemical compound CO[SiH2]OC YQGOWXYZDLJBFL-UHFFFAOYSA-N 0.000 description 1
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 description 1
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 150000002168 ethanoic acid esters Chemical class 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- TZMFJUDUGYTVRY-UHFFFAOYSA-N ethyl methyl diketone Natural products CCC(=O)C(C)=O TZMFJUDUGYTVRY-UHFFFAOYSA-N 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 239000003925 fat Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical group O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N monofluoromethane Natural products FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- JAYXSROKFZAHRQ-UHFFFAOYSA-N n,n-bis(oxiran-2-ylmethyl)aniline Chemical class C1OC1CN(C=1C=CC=CC=1)CC1CO1 JAYXSROKFZAHRQ-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- RFJIPESEZTVQHZ-UHFFFAOYSA-N oxirane;prop-2-enoic acid Chemical compound C1CO1.OC(=O)C=C RFJIPESEZTVQHZ-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 150000004032 porphyrins Chemical class 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 1
- 229960001124 trientine Drugs 0.000 description 1
- IJFSHBYRKXAYFV-UHFFFAOYSA-N triethoxy(3-propoxypropyl)silane Chemical compound CCCOCCC[Si](OCC)(OCC)OCC IJFSHBYRKXAYFV-UHFFFAOYSA-N 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/003—Light absorbing elements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133504—Diffusing, scattering, diffracting elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B2005/1804—Transmission gratings
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Adhesive Tapes (AREA)
- Polarising Elements (AREA)
- Optical Filters (AREA)
Abstract
A light control film includes a substrate, a diffraction grating structure, and a low-reflectivity adhesive structure. The substrate has a lower surface and an upper surface. The diffraction grating structure is arranged on the lower surface of the substrate. The low-reflectivity adhesion structure is arranged on the upper surface of the substrate. The low-reflectivity adhesive structure comprises an adhesive layer and an absorbing material, wherein the absorbing material has a first transmittance T1 at the wavelength of 450nm, a second transmittance T2 in the wavelength range of 570 nm-600 nm, a third transmittance T3 at the wavelength of 650nm, T2 is less than 1/2T1, and T2 is less than 1/2T 3. The invention also discloses a display device applying the light control film and a method for improving the color pattern phenomenon and/or high reflectivity of the light control film.
Description
Technical field
The present invention is on a kind of light control film (light control film) and applies its display device.The present invention
Also on a kind of method for the lathe work phenomenon (mura) and/or high reflectivity for improving light control film.
Background technology
Display device frequently includes the various elements with light adjustment function.By taking liquid crystal display as an example, it includes point
The upper Polarizer of liquid crystal display panel the upper side and lower side and lower Polarizer are not configured at, and upper Polarizer and lower Polarizer have difference
Polarization direction, be imaged whereby.In addition, the problems such as in order to improve visual angle and liquid crystal colour cast, can also additionally use in light emission side
Light control film.Light control film includes the optical grating construction for producing diffraction phenomenon, adjusts the distribution of light whereby.There is light tune for these
The element of whole function can carry out various adjustment, to provide more preferably visual experience.
The content of the invention
In one aspect of the invention, there is provided a kind of light control film.Such a light control film include base material, diffraction grating structure,
With antiradar reflectivity adhesion structure.Base material has lower surface and upper surface.Diffraction grating structure setting is on the lower surface of base material.It is low
Reflectivity adhesion structure is arranged on the upper surface of base material.Antiradar reflectivity adhesion structure includes adhesive layer and absorbing material, should
Absorbing material 450nm wavelength with one first penetrance T1, the wave-length coverage in 570nm~600nm in one second
Penetrance T2, in 650nm wavelength there is one the 3rd penetrance T3, T2<1/2T1, and T2<1/2T3.
In another aspect of this invention, there is provided a kind of display device.Such a display device includes photocontrol as described above
Film or the light control film further adjusted based on it.
In still another aspect of the invention, there is provided a kind of method for the lathe work phenomenon and/or high reflectivity for improving light control film.
Light control film includes base material and the diffraction grating structure being arranged on the lower surface of base material.Such a method is included in the upper table of base material
Being formed on face includes the antiradar reflectivity adhesion structure of adhesive layer and absorbing material, and wavelength of the absorbing material in 450nm has
One first penetrance T1, in 570nm~600nm wave-length coverage with one second penetrance T2,650nm wavelength with
One the 3rd penetrance T3, T2<1/2T1, and T2<1/2T3.
More preferably understand to have to the above-mentioned and other aspect of the present invention, embodiment and embodiment cited below particularly, and
Institute's accompanying drawings are coordinated to describe in detail as follows：
Brief description of the drawings
Fig. 1 illustrates according to embodiments of the present invention one exemplary light control film.
Fig. 2 illustrates according to embodiments of the present invention one exemplary diffraction grating structure.
What Fig. 3 illustrated the embodiment of antiradar reflectivity adhesion structure penetrates frequency spectrum.
Fig. 4 illustrates another exemplary light control film according to embodiments of the present invention.
Fig. 5 illustrates another exemplary light control film according to embodiments of the present invention.
Fig. 6 illustrates another exemplary light control film according to embodiments of the present invention.
Fig. 7 illustrates an illustrative display device according to embodiments of the present invention.
Fig. 8 illustrates the liquid crystal display of the light control film of Application Example and penetrating frequently in general liquid crystal display
Spectrum.
Fig. 9 illustrates the embodiment of light control film and the reflecting spectrum of comparative example.
Wherein, reference：
110：Base material
112：Lower surface
114：Upper surface
120：Diffraction grating structure
122：Diffraction grating area
124：Diffraction grating
130：Reflectivity adhesion structure
132：Adhesive layer
134：Absorbing material
140：Surface treatments
230：Reflectivity adhesion structure
232：Adhesive layer
234：Absorbed layer
240：Surface treatments
242：Protective layer
244：Surface-treated layer
330：Reflectivity adhesion structure
332：Adhesive layer
334：Absorbed layer
450：Display panel
460：Upper Polarizer
470：Lower Polarizer
480：Back light member
C11：Curve
C12：Curve
C13：Curve
C14：Curve
C15：Reference line
C21：Curve
C22：Curve
C31：Curve
C32：Curve
C41：Curve
C42：Curve
Embodiment
It is described in detail below in conjunction with institute's accompanying drawings for the present invention.It is to be appreciated that institute's accompanying drawings and its phase
The explanation of pass is intended only as enumerating explanation purposes, is not intended to limit the present invention.Without departing from the spirit of the present invention, feasible
In the case of, various devices of the invention, element, and/or material selection, ratio etc., it can be adjusted, e.g. make
The substitute known with such as the technical field of the invention, in another example being to increase or decrease some compositions or structure.In addition may be used
To be contemplated that element, condition and the feature in an embodiment or embodiment, can advantageously be included in another embodiment party
In case or embodiment, but this work is not enumerated further.
Fig. 1 is refer to, it illustrates according to embodiments of the present invention one exemplary light control film.Light control film includes base material
110th, diffraction grating structure 120 and antiradar reflectivity adhesion structure 130.Base material 110 has lower surface 112 and upper surface 114.Around
Optical grating construction 120 is penetrated to be arranged on the lower surface 112 of base material 110.Antiradar reflectivity adhesion structure 130 is arranged at the upper of base material 110
On surface 114.Antiradar reflectivity adhesion structure 130 includes adhesive layer 132 and absorbing material 134.Absorbing material 134 is in 450nm
The wavelength of (nm) with one first penetrance T1, in 570nm~600nm wave-length coverage with one second penetrance T2,
There is one the 3rd penetrance T3, T2 in 650nm wavelength<1/2T1, and T2<1/2T3.Second penetrance T2 can be 570nm~
The penetrance of any wavelength in 600nm wave-length coverage.That is, as long as penetrance minimum in this wave-length coverage meets T2<
1/2T1、T2<1/2T3 condition.It is preferred that in 570nm~600nm wave-length coverage, penetrated close to minimum
In one segment limit of the wavelength of rate, such as 580nm~590nm, penetrance all meet T2<1/2T1、T2<1/2T3 condition.More
Goodly, in whole 570nm~600nm wave-length coverage, penetrance all meets T2<1/2T1、T2<1/2T3 condition.It is low anti-
It is, for example, pressure-sensing glue to penetrate rate adhesion structure 130.
Specifically, the material of base material 110 can be polyester based resin, amorphism polyolefin-based resins, cellulose-based tree
Fat, polycarbonate resin, acrylic resin, cyclic olefin resins or its combination, but not limited to this.Wherein, polyester based resin example
The copolymerization that the polymer of PETP, PETP are formed with other dicarboxylic acids or glycol in this way
Thing, PEN.Amorphism polyolefin-based resins are, for example, cyclic olefin monomers (co) polymer (cyclo
Olefin (co) polymers, COC/COP), by opening for ENB, cyclopentadiene, bicyclopentadiene, tetracyclododecane etc.
Cyclopolymer is formed with the copolymer of olefines.Cellulose-based resin refers to the hydroxyl of part in cellulose by acetic acid esters
The resin of change, or a part by acid esterification, a part by other Esterification mixed esters.Cellulose-based resin is preferably fibre
Tie up plain ester system resin, more preferably acetylcellulose system resin, such as tri acetyl cellulose, diacetyl cellulose, fiber
Plain acetate propionate and cellulose acetate butyrate etc., the fiber being fully esterified is called Triafol T usually
(triacetate cellulose,TAC).Polycarbonate resin is, for example, the polyester formed by carbonic acid and glycol or bis-phenol.
Acrylic resin is, for example, by including methyl methacrylate (poly (methyl methacrylate), PMMA) and third
The mono-functional monomers' polymerization or copolymerization of e pioic acid methyl ester form.In some embodiments, base material 110 is by poly terephthalic acid second
Diester (polyethylene terephthalate, PET), polyethylene (polyethylene, PE), polypropylene
(polypropylene, PP), Triafol T (TAC), cyclic olefin polymer (COP), and/or methyl methacrylate
(PMMA) formed.
Diffraction grating structure 120 may include column periodic microstructures, particle periodic microstructures or any other be suitable for
The micro-structural of diffraction is provided, to adjust the distribution of light, and then the problems such as improvement visual angle and liquid crystal colour cast.The cycle of these micro-structurals
Can be μm (micron) grade, between 0.1 μm~50 μm.Fig. 2 is refer to, it is exemplary that it illustrates according to embodiments of the present invention one
Diffraction grating structure 120.As shown in Fig. 2 diffraction grating structure 120 can have one or more diffraction grating areas 122.It is each around
Penetrating grating region 122 includes multiple diffraction gratings 124, and it is for example with fixed cycle and identical direction (azimuth).It is different
Diffraction grating area 122 in diffraction grating 124 can have identical or different direction.Diffraction grating area 122 and diffraction grating
The configurations such as 124 number, structure, direction can carry out any adjustment according to demand.
Adhesive layer 132 can be formed by adhesive composition.Adhesive composition may include host, bridging agent and silane
Coupling agent.Adhesive layer 132 can also further include other additives.Workable host, bridging agent and silane coupling presented below
The specific example of agent.
Host forms the body frame structure of adhesive layer 132 after cured drying.In some embodiments, host may include
At least one acrylate and/or at least one methacrylate.According to some embodiments, used at least one third
Olefin(e) acid ester can be methyl acrylate, ethyl acrylate, propyl acrylate, n-butyl acrylate, n-octyl, acrylic acid ten
One alkyl ester, isobutyl acrylate, 2-EHA, Isooctyl acrylate monomer, acrylic acid 2- methoxy acrylates, acrylic acid second
Epoxide methyl esters, benzyl acrylate, acrylic acid 2- phenoxy ethyls, acrylic acid 2- (2- phenoxy groups) ethyl ester, oxirane
Acrylate, and/or acrylic acid 2- (o- phenylphenoxy) ethyl ester of the nonyl phenol of modification.Used at least one methyl
Acrylate can be methyl methacrylate, EMA, propyl methacrylate, n-BMA, first
Base n-octyl, methacrylic acid hendecane ester, Isobutyl methacrylate, 2-Ethylhexyl Methacrylate, methyl
Isooctyl acrylate monomer, methacrylic acid 2- methoxy acrylates, methacrylic acid ethyoxyl methyl esters, benzyl methacrylate, methyl
The first for the nonyl phenol that acrylic acid 2- phenoxy ethyls, methacrylic acid 2- (2- phenoxy groups) ethyl ester, oxirane modify
Base acrylate, and/or methacrylic acid 2- (o- phenylphenoxy) ethyl ester.For example, in some embodiments, host bag
Include the butyl acrylate (BA) of 40~90 parts by weight, the methyl acrylate (MA) of 10~40 parts by weight, the propylene below 1 parts by weight
Acrylic acid 2- hydroxy methacrylates (HEA) below sour (AA), 5 parts by weight, the acrylic acid 2- methoxy acrylates below 5 parts by weight
(MEA) and 4~10 parts by weight acrylic acid 2- phenoxy ethyls (PEA).In some embodiments, the mean molecule of host
Amount is between 1,200,000 and 1,700,000, and Mw/Mn is between 3.5 and 5.
The intramolecular of bridging agent has at least two functional groups, with help the monomer of host (such as acrylate monomer and/
Or methacrylate monomers) crosslinking, network structure is formed, and then improve the intensity of adhesive layer.In some embodiments,
Compared to the host of 100 parts by weight, bridging agent (total amount) is 0.05~20 parts by weight.According to some embodiments, ring can be used
Oxygen system bridging agent, isocyanates system bridging agent, imines system bridging agent, metal chelating syzygy bridging agent, and/or aziridine system build bridge
Agent.According to some embodiments, used epoxy bridging agent can shrink sweet for epoxy resin, the ethylene glycol two of bisphenol A-type
Oily ether, polyethyleneglycol diglycidylether, glycerin diglycidyl ether, glycerin triglycidyl ether, 1,6-HD two
Glycidol ether, trihydroxymethylpropanyltri diglycidyl ether, N, N- diglycidylanilines, N, N, N ', the glycidols of N '-four
Base-m-xylenedimaine, and/or double (N, the N- diglycidyl aminomethyl) hexamethylenes of 1,3-.According to some embodiment party
Case, used isocyanates system bridging agent can be toluene di-isocyanate(TDI), the methylene ester of two isocyanic acid six, the isocyanide of isophorone two
Acid esters, XDI, hydrogenated xylene diisocyanate, methyl diphenylene diisocyanate, hydrogenated diphenyl first
Alkane diisocyanate, naphthalene diisocyanate, and/or triphenylmethane triisocyanate.It is used according to some embodiments
Isocyanates based compound can be it is foregoing any one dimer, it is foregoing any one trimer, and/or it is foregoing any one with it is more
First alcohol reacts the addition product to be formed.According to some embodiments, used imines system bridging agent can be diethylenetriamine and/or
Triethylene tetramine.According to some embodiments, used metal chelating syzygy bridging agent can be pentanedione or acetyl group second
The compound that the polyvalent metal coordination of acetoacetic ester and aluminium, iron, copper, zinc, tin, titanium, nickel, antimony, magnesium, barium, chromium and zirconium etc. forms.According to
Some embodiments, used aziridine system bridging agent can be diphenyl methane -4,4 '-bis- (1- aziridine formamides), first
Benzene -2,4- double (1- aziridine formamides), three stretch the double -1- (2- methylaziridines) of ethyl melamine, isophthalic diformyl,
Ginseng -1- '-aziridinos phosphine oxide, hexa-methylene -1,6- double (1- aziridine formamide),-β of trimethylolpropane-three-aziridine
Base propionic ester, and/or the-β of tetramethylol methane-three-'-aziridino propionic ester.
In some embodiments, compared to the host of 100 parts by weight, silane coupling agent (total amount) is 0.05~20 weight
Part.According to some embodiments, vinyltrimethoxy silane, VTES, vinyl ginseng (2- first can be used
Epoxide ethyoxyl) silane, 3- metacryloxies propyl trimethoxy silicane, 3- glycidoxypropyltrime,hoxysilanes,
2- (3,4- expoxycyclohexyls) ethyl trimethoxy silane, 3- glycidoxypropyls dimethoxysilane, 3- epoxies
Propoxypropyl triethoxysilane, 3- glycidoxypropyl group ethyoxyls dimethylsilane, 3- aminocarbonyl propyl trimethoxy silicon
Alkane, 3- aminocarbonyl propyl triethoxysilanes, N- (2- amidos ethyl) -3- aminocarbonyl propyl trimethoxy silanes, N- (2- amido second
Base) -3- aminocarbonyl propyls methyl dimethoxysilane, 3- chloropropylmethyldimethoxysilanes, 3- r-chloropropyl trimethoxyl silanes,
3- methacryloxypropyl trimethoxy silanes, and/or 3-mercaptopropyi trimethoxy silane.
According to some embodiments, absorbing material 134 can have the structure as shown in following formula 1：
[formula 1]
Wherein R11~R18It is separately hydrogen atom, halogen atom, cyano group, nitro, substituted or unsubstituted alkyl, takes
It is generation or unsubstituted alkoxy, substituted or unsubstituted aromatic radical, substituted or unsubstituted fragrant epoxide, substituted or unsubstituted
Aralkoxy or substituted or unsubstituted amido, M are two hydrogen atoms, two monovalent metal atoms, divalent metal atom, three
Valency substituted metal atom or oxidized metal atom.Such a absorbing material 134 is tetraazatetradecane porphyrin dyestuff or pigment.In some realities
Apply in scheme, R11、R13、R15、R17For three-level butyl (tert-butyl), R12、R14、R16、R18For 2- fluorophenyls (2-
Fluorophenyl), M is palladium or copper.
According to some embodiments, absorbing material 134 can have the structure as shown in following formula 2：
[formula 2]
Wherein, R21~R24It is separately hydrogen atom, halogen atom, hydroxyl, the phenyl or carbon number 1 can with substituent
~20 univalent saturated hydrocarbon radical, R25~R28It is separately hydrogen atom, hydroxyl, sulfydryl, the alkoxy of carbon number 1~5 or three
Methyl fluoride, R29~R32Separately for hydrogen atom contained therein can by halogen atom, cyano group, amine formyl, sulfamic,
The univalent saturated hydrocarbon radical of the carbon number 1~20 of oxygen atom or sulphur atom is can be inserted between hydroxyl or amido substitution and carbon atom.It is such a
Absorbing material 134 is squarylium cyanine dyes (squarylium dye).According to some embodiments, halogen atom can be fluorine atom, chlorine
Atom, bromine atoms or iodine atom.According to some embodiments, R21~R24、R29~R32Univalent saturated hydrocarbon radical can be carbon number 1~
The ester ring type saturated hydrocarbyl of 20 straight chained alkyl, the branched alkyl groups of carbon number 3~20, and/or carbon number 3~20.Carbon number 1~20 it is straight
Alkyl group can be methyl, ethyl, propyl group, butyl, amyl group, hexyl, heptyl, octyl group, nonyl, decyl, dodecyl, hexadecane
Base, and/or eicosyl.The branched alkyl groups of carbon number 3~20 can be isopropyl, isobutyl group, the second butyl, tributyl, isoamyl
Base, neopentyl, and/or 2- ethylhexyls.The ester ring type saturated hydrocarbyl of carbon number 3~20 can be cyclopropyl, cyclopenta, cyclohexyl,
Suberyl, cyclooctyl, and/or tricyclodecyl.According to some embodiments, R21~R24The phenyl with substituent in
Substituent can be halogen atom, cyano group, hydroxyl, and/or amido.In some embodiments, R21~R24Preferably hydrogen atom,
R25~R28The preferably alkoxy of hydrogen atom, hydroxyl, and/or carbon number 1~5 is more preferably hydrogen atom, hydroxyl, methoxyl group,
And/or ethyoxyl, R29~R32The preferably alkyl of carbon number 1~10, wherein hydrogen atom can have can between hydroxyl, carbon atom
Insert oxygen atom.
In this exemplary light control film, absorbing material 134 is in incorporation adhesive layer 132.According to some embodiment party
Case, absorbing material 134 with 0.1%~5.0% percentage by weight incorporation adhesive layer 132, preferably with 0.1%~
In 1.0% percentage by weight incorporation adhesive layer 132.
Fig. 3 is refer to, it shows that wherein absorbing material is with 0.1%~0.25% percentage by weight incorporation adhesive layer
The embodiment of antiradar reflectivity adhesion structure penetrate frequency spectrum, wherein curve C11 is that incorporation 0.25wt%, curve C12 are incorporations
0.20wt%, curve C13 are that incorporation 0.15wt%, curve C14 are incorporation 0.10wt%, draw reference line C 15 in addition.It can see
Go out, there is the penetrance being less than in 450nm and 650nm wavelength in 570nm~600nm wave-length coverage, be even less than
50%.Light control film is often high reflectivity, therefore, extraneous ambient light is easily reflected when applied to display device, influenceed
Display picture.Again due to the presence of diffraction grating structure, the lathe work phenomenon (mura) for reflexing to human eye is just formed.According to implementation
In the light control film of scheme, knot is sticked together in being additionally formed the antiradar reflectivity that traditional light control film do not have on the upper surface of base material
Structure.Therefore, can be partially absorbed before ambient light enters diffraction grating structure, particularly 570nm~600nm this human eye is most
The light of sensitive wave-length coverage can be weakened, therefore can reduce visual impact caused by high reflectivity and lathe work phenomenon.
That is, a kind of method of the lathe work phenomenon and/or high reflectivity according to embodiments of the present invention for improving light control film, it is included in
Formed on the upper surface of the base material of light control film (it includes base material and the diffraction grating structure being arranged on the lower surface of base material)
Antiradar reflectivity adhesion structure, this antiradar reflectivity adhesion structure include adhesive layer and absorbing material, and the absorbing material is in 450nm
Wavelength with one first penetrance T1, in 570nm~600nm wave-length coverage with one second penetrance T2, in 650nm
Wavelength there is one the 3rd penetrance T3, T2<1/2T1, and T2<1/2T3.
Referring once again to Fig. 1, light control film can further include surface treatments 140.Surface treatments 140 are arranged at low
On reflectivity adhesion structure 130.In some embodiments, as shown in figure 4, an exemplary surface treatments 240 include
Protective layer 242 and surface-treated layer 244.Protective layer 242 is located on (being attached at) antiradar reflectivity adhesion structure 130.Surface treatment
Layer 244 is on protective layer 242.The material of protective layer 242 can be polyester based resin, amorphism polyolefin-based resins, fiber
Prime system resin, polycarbonate resin, acrylic resin, cyclic olefin resins or its combination, but not limited to this.Wherein, Polyester
Resin is, for example, that the polymer of PETP, PETP and other dicarboxylic acids or glycol are formed
Copolymer, PEN.Amorphism polyolefin-based resins are, for example, cyclic olefin monomers (co) polymer (COC/
COP), it is total to by the ring-opening polymerization polymer of ENB, cyclopentadiene, bicyclopentadiene, tetracyclododecane etc. or with olefines
Polymers is formed.Cellulose-based resin refers to resin of the hydroxyl by acid esterification of part in cellulose, or a part by second
It is Esterification, a part of by other Esterification mixed esters.Cellulose-based resin is preferably cellulose esters system resin, more preferably acetyl
Base cellulose-based resin, such as tri acetyl cellulose, diacetyl cellulose, cellulose acetate propionate and cellulose
Acetate butyrate etc., the fiber being fully esterified are called Triafol T (TAC) usually.Polycarbonate resin is, for example, by carbonic acid
The polyester formed with glycol or bis-phenol.Acrylic resin is, for example, by including methyl methacrylate (PMMA) and propylene
The mono-functional monomers' polymerization or copolymerization of sour methyl esters form.In some embodiments, protective layer 242 is by poly terephthalic acid second
Diester (PET), polyethylene (PE), polypropylene (PP), Triafol T (TAC), cyclic olefin polymer (COP), and/or methyl
Methyl acrylate (PMMA) formation.Surface-treated layer 244 is, for example, to be formed at coating method on protective layer 242.Surface treatment
Layer 244 is for example including hard coating layer (hard coat), anti-dazzle (anti-glare, AG) layer, antireflection (low
Reflectance, LR) layer, and/or antireflection anti-dazzle (AGLR) layer etc..
Fig. 5 is refer to, it illustrates another exemplary light control film according to embodiments of the present invention.This is one exemplary light-operated
Film is antiradar reflectivity adhesion structure 230 different from the place of that shown in Figure 1.Foregoing adhesion material and shape can be used
Into the adhesive composition (including host, bridging agent and silane coupling agent etc.) of adhesive layer.It is however, one exemplary herein
In light control film, absorbing material forms the absorbed layer 234 for being attached to adhesive layer 232 with 0.1 μm~25.0 μm of thickness range,
Absorbed layer 234 is preferably formed with 0.1 μm~20.0 μm of thickness range, more preferably with 5 μm~20.0 μm of thickness range shape
Into absorbed layer 234.In this exemplary light control film, absorbed layer 234 is formed in adhesive layer 232.Other details phase
That shown in Figure 1 is same as, will not be repeated here.
Fig. 6 is refer to, it illustrates another exemplary light control film according to embodiments of the present invention.This is one exemplary light-operated
Film is antiradar reflectivity adhesion structure 330 different from the place of that shown in Figure 5.In this exemplary light control film, absorbed layer
334 are formed under adhesive layer 332.Other details are same as that shown in Figure 5, will not be repeated here.
Fig. 7 is refer to, it illustrates an illustrative display device according to embodiments of the present invention.Fig. 7 is set with liquid crystal display
Exemplified by standby, but this needn't be limited to.Display device includes entering one according to foregoing any embodiment or based on foregoing embodiments
The light control film of successive step.According to some embodiments, display device includes display panel 450, e.g. liquid crystal display panel.
In some embodiments, display device further includes Polarizer 460.Upper Polarizer 460 is arranged on display panel 450.Light
Control film is arranged on Polarizer 460 and with Polarizer 460 upwardly of diffraction grating structure 120.Display device can further include
Lower Polarizer 470 and back light member 480.
As it was previously stated, using light control film according to embodiments of the present invention, improving the situation such as visual angle and liquid crystal colour cast
While, the visual problem caused by the lathe work phenomenon and/or high reflectivity of light control film is not had.
In addition, can also have improved colour gamut using the display device of light control film according to embodiments of the present invention
(color gamut).Fig. 8 is refer to, wherein curve C21 represents wearing for the liquid crystal display of the light control film of Application Example
Saturating frequency spectrum, curve C22 expression in general liquid crystal displays penetrate frequency spectrum.In general liquid crystal is can be seen that from curve C22
Show equipment, it is not clearly demarcated enough between feux rouges and green glow.And as shown in curve C21, using according to embodiments of the present invention light-operated
In the case of film, because absorbing material also absorbs the light sent from display panel, therefore filter out part 570nm~
Light in 600nm wave-length coverage so that the boundary between feux rouges and green glow becomes obvious, so as to lift colour gamut.
Specific embodiment presented below and comparative example, to provide the effect for the light control film according to embodiment
There is further understanding.
[preparation of samples]
[embodiment 1]
Using the dyestuff with the structure of formula 1, acryl adhesive composition is mixed with 0.25wt% ratio, be coated to
On optical film material with diffraction grating structure, then at using hard conating (hard coating, HC) thereon.With Konica
SCI reflected value and SCE reflected value of the Molta spectral photometric colour measurings measurement examination in 590nm wavelength.
[embodiment 2]
Using the dyestuff with the structure of formula 1, acryl adhesive composition is mixed with 0.25wt% ratio, be coated to
On optical film material with diffraction grating structure, then at coating antiradar reflectivity layer (low reflectance, LR) thereon.With
SCI reflected value and SCE reflected value of the Konica Molta spectral photometric colour measurings measurement examination in 590nm wavelength.
[comparative example 1]
Using the optical film material with diffraction grating structure, then at using hard conating (HC) thereon.With Konica Molta
SCI reflected value and SCE reflected value of the spectral photometric colour measuring measurement examination in 590nm wavelength.
[comparative example 2]
Using the optical film material with diffraction grating structure, then at thereon using coating antiradar reflectivity layer (LR).With
SCI reflected value and SCE reflected value of the Konica Molta spectral photometric colour measurings measurement examination in 590nm wavelength.
[discussion of results]
Embodiment 1 and the albedo measurement result of comparative example 1 (that is, surface-treated layer is hard conating) are as listed in table 1.It is real
The albedo measurement result (that is, surface-treated layer is anti-reflecting layer) of example 2 and comparative example 2 is applied as shown in Figure 9 and listed by table 2.Can
To be seen clearly that, using the light control film according to embodiment, reflectivity substantially reduces.The reduction of reflectivity related can also improve
Lathe work phenomenon, although not providing further photo evidence herein, naked eyes are observed that the photocontrol according to embodiment
Film does not have obvious lathe work phenomenon, and commercially available light control film then has relatively serious lathe work phenomenon.
Table 1：Hard coating surface processing
Table 2：Anti-reflecting layer is surface-treated
Certainly, the present invention can also have other various embodiments, ripe in the case of without departing substantially from spirit of the invention and its essence
Various corresponding changes and deformation, but these corresponding changes and deformation can be made according to the present invention by knowing those skilled in the art
The protection domain of the claims in the present invention should all be belonged to.
Claims (15)
- A kind of 1. light control film, it is characterised in that including：Base material, there is lower surface and upper surface；Diffraction grating structure, it is arranged on the lower surface of the base material；AndAntiradar reflectivity adhesion structure, it is arranged on the upper surface of the base material, the antiradar reflectivity adhesion structure includes adhesive layer And absorbing material, wavelength of the absorbing material in 450nm have one first penetrance T1, the wave-length coverage in 570nm~600nm In with one second penetrance T2,650nm wavelength with one the 3rd penetrance T3, T2<1/2T1, and T2<1/2T3.
- 2. light control film according to claim 1, it is characterised in that the diffraction grating structure includes columnar microstructure or grain Sub- micro-structural.
- 3. light control film according to claim 2, it is characterised in that the columnar microstructure or particle of the diffraction grating structure The cycle of micro-structural is micron grade, between 0.1 μm~50 μm；And/or the diffraction grating structure has an at least diffraction Grating region, the diffraction grating area include multiple diffraction gratings, and the wherein diffraction grating has fixed cycle and identical direction.
- 4. light control film according to claim 1, it is characterised in that the adhesive layer is formed by adhesive composition, should Adhesive composition includes host, bridging agent and silane coupling agent.
- 5. according to the light control film described in claim the 1, it is characterised in that the absorbing material is with 0.1%~5.0% weight Percentage is mixed in the adhesive layer.
- 6. light control film according to claim 1, it is characterised in that the absorbing material is formed with a thickness range and is attached to The absorbed layer of the adhesive layer, the wherein absorbed layer are formed on the adhesive layer or under the adhesive layer.
- 7. light control film according to claim 6, it is characterised in that the thickness range is 0.1 μm~25.0 μm.
- 8. light control film according to claim 1, it is characterised in that the absorbing material has the knot as shown in following formula 1 Structure：[formula 1]Wherein R11~R18Be separately hydrogen atom, halogen atom, cyano group, nitro, substituted or unsubstituted alkyl, substitution or not Substituted alkoxy, substituted or unsubstituted aromatic radical, substituted or unsubstituted fragrant epoxide, substituted or unsubstituted aralkyl oxygen Base or substituted or unsubstituted amido, M are two hydrogen atoms, two monovalent metal atoms, divalent metal atom, trivalent substitution Metallic atom or oxidized metal atom.
- 9. light control film according to claim 1, it is characterised in that the absorbing material has the knot as shown in following formula 2 Structure：[formula 2]Wherein, R21~R24It is separately hydrogen atom, halogen atom, hydroxyl, the phenyl or carbon number 1~20 can with substituent Univalent saturated hydrocarbon radical, R25~R28It is separately hydrogen atom, hydroxyl, sulfydryl, the alkoxy or fluoroform of carbon number 1~5 Base, R29~R32Separately for hydrogen atom contained therein can by halogen atom, cyano group, amine formyl, sulfamic, hydroxyl, Or the univalent saturated hydrocarbon radical of the carbon number 1~20 of oxygen atom or sulphur atom is can be inserted between amido substitution and carbon atom.
- 10. light control film according to claim 1, it is characterised in that the material of the base material is selected from polyester based resin, non-knot Crystalline substance polyolefin-based resins, cellulose-based resin, polycarbonate resin, acrylic resin, cyclic olefin resins and its combination institute The group of composition.
- 11. light control film according to claim 1, it is characterised in that further include：Surface treatments, it is arranged on the antiradar reflectivity adhesion structure, the surface treatments are included at protective layer and surface Layer is managed, the protective layer is located on the antiradar reflectivity adhesion structure, and the surface-treated layer is located on the protective layer.
- 12. light control film according to claim 11, it is characterised in that the material of the protective layer be selected from polyester based resin, Amorphism polyolefin-based resins, cellulose-based resin, polycarbonate resin, acrylic resin, cyclic olefin resins and its group Close formed group；And/or the surface-treated layer is selected from hard coating layer, anti-dazzle photosphere, anti-reflecting layer and antireflection anti-dazzle The group that layer is formed.
- A kind of 13. display device, it is characterised in that including：Light control film any one of claim 1~12.
- 14. display device according to claim 13, it is characterised in that including：Display panel；Upper Polarizer, it is arranged on the display panel, wherein the light control film is arranged on this on Polarizer and with the diffraction light Grid structure is towards Polarizer on this.
- A kind of 15. method for the lathe work phenomenon and/or high reflectivity for improving light control film, it is characterised in that the light control film bag Base material and the diffraction grating structure being arranged on the lower surface of the base material are included, this method includes：Being formed on the upper surface of the base material includes the antiradar reflectivity adhesion structure of adhesive layer and absorbing material, the absorbing material 450nm wavelength with one first penetrance T1, the wave-length coverage in 570nm~600nm in one second penetrance T2, There is one the 3rd penetrance T3, T2 in 650nm wavelength<1/2T1, and T2<1/2T3.
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| TW106130958 | 2017-09-11 | ||
| TW106130958A TWI642549B (en) | 2017-09-11 | 2017-09-11 | Light control film, dsplay device using the same, and method for mitigate mura effect on and/or high resistivty of a light control film |
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| TWI642549B (en) | 2018-12-01 |
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Application publication date: 20180223 |