CN107678252A - One kind is used for AMOLED negative photo glue developing solutions - Google Patents
One kind is used for AMOLED negative photo glue developing solutions Download PDFInfo
- Publication number
- CN107678252A CN107678252A CN201710851489.7A CN201710851489A CN107678252A CN 107678252 A CN107678252 A CN 107678252A CN 201710851489 A CN201710851489 A CN 201710851489A CN 107678252 A CN107678252 A CN 107678252A
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- CN
- China
- Prior art keywords
- amoled
- ether
- developing solutions
- negative photo
- photo glue
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
Abstract
The invention discloses one kind to be used for AMOLED negative photo glue developing solutions, and it is made up of following composition according to percentage by weight：Water-soluble amide class compound 15 24%, organic base 35 46%, development accelerator 9 16% and surfactant 18 24%.Invention applies the organic alkali developer solution aqueous solution, so that the permeability of photoresist is improved, developing rate increase, cause that the metal ion in developer solution is ppb ranks simultaneously, so as to eliminate adverse effect of the impurity metal ion for AMOLED transistors, the requirement that high-resolution high image quality shows processing procedure is adapted to, invention applies surfactant, it can control to negative photoresist wettability of the surface and permeability, so as to reach the development effect of technological requirement.
Description
Technical field
The present invention relates to AMOLED technical fields, and in particular to one kind is used for AMOLED negative photo glue developing solutions.
Background technology
AMOLED processing procedures can be subdivided into array, color film, into box and module group procedure.In general, first by array plant produced
AMOLED substrates, by color film plant produced color membrane substrates, then through two pieces of substrates are bonded into box factory and inject liquid crystal, most pass through afterwards
Module factory-assembled is into display device.The key of wherein color displays is Cai Mo factories.
The process that Cai Mo factories include includes BM (black matrix), R (red), G (green), B (indigo plant) pixel, PS (pad) shape
Into.AMOLED is turned to by AMOLED antenna array controls liquid crystal, realizes that light passes through in the block of pixels of different colours, color so as to reach
The function that color is shown.
More than formation of different colours color lump etc. 5 procedures include photoresist (predominantly acrylic negative photoetching
Glue) it is coated with, is exposed and developed.Negative photoresist crosslinks by the part of ultraviolet lighting, therefore not by the part of illumination in alkali
It is corroded and dissolves in the presence of property developer solution, so as to forms required colored pixels block.Color film in AMOLED industries at present
Factory, for the more aqueous solution using potassium hydroxide as photoresist developer, typical case is 0.03%~0.10% hydrogen-oxygen
Change the aqueous solution of the potassium plus 0.10%~0.40% interfacial agent.
As Display Technique is showing improvement or progress day by day, along with to the constantly improve of the requirements such as resolution ratio and imaging definition, especially
It is that display device line width will as the popularization of smart mobile phone, tablet personal computer, the display of high-resolution high image quality require rapid growth
Ask increasingly thinner, to requirement on electric performance also more and more higher.In making and the pixel cell line that process stages mean more to become more meticulous
Wide reduction.
Because potassium hydroxide contains substantial amounts of potassium ion and sodium ion, therefore such developer solution metal ion content is big and is not easy
It is cleaned, and then remain in and impurity is formed on color membrane substrates.Remaining metal ions impurity should the wide more dense circuit of more fine rule
With in environment, conductive short circuit will be formed under less quantity, so as to switch production to the transistor controls in AMOLED pixels
Raw adverse effect.
The content of the invention
The present invention is intended to provide a kind of be used for AMOLED negative photo glue developing solutions.
The present invention provides following technical scheme：
One kind is used for AMOLED negative photo glue developing solutions, and it is made up of following composition according to percentage by weight：It is water-soluble
Property amides compound 15-24%, organic base 35-46%, development accelerator 9-16% and surfactant 18-24%.
The water-soluble amide class compound is formamide, isobutyramide, N, N- diethylformamides, N, N- diethyl second
One or more composition in acid amides and N- ethyl pyrrolidones.
The organic base is by TMAH (TMAH), TEAH (tetraethyl ammonium hydroxide) and TMAC (tetramethyl-ammoniums
Carbonic acid (hydrogen) salt) one kind or any two kinds mix.
The surfactant is by alcohol ether carboxylate, alcohol ether sulfonate, phenolic ether sulfuric acid and the phosphatic one kind of alcohol ether
Or several compositions.
The development accelerator is that heterocyclic water-miscible organic solvent, the alcohol ethers such as alcohol ether, sulfoxide and pyrroles have diethylene glycol (DEG)
Single ether, diethylene glycol monobutyl ether, diethylene glycol ether, diethylene glycol dimethyl ether etc., sulfoxide have sulfolane, dimethyl sulfoxide (DMSO), hexichol
Base sulfoxide etc., pyrroles have the mixed of one or two kinds of arbitrary proportions in alpha-pyrrolidone, vinyl pyrrolidone, N- hydroxyethyl piperazines
Compound.
Compared with prior art, the beneficial effects of the invention are as follows：Invention applies the organic alkali developer solution aqueous solution, make
The permeability of photoresist must be improved, developing rate increase, while make it that the metal ion in developer solution is ppb ranks, so as to
Adverse effect of the impurity metal ion for AMOLED transistors is eliminated, high-resolution high image quality is adapted to and shows wanting for processing procedure
Ask, invention applies surfactant, can control to negative photoresist wettability of the surface and permeability, so as to reach technique
It is required that development effect.
Embodiment
Below in conjunction with the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described,
Obviously, described embodiment is only part of the embodiment of the present invention, rather than whole embodiments.Based in the present invention
Embodiment, the every other embodiment that those of ordinary skill in the art are obtained under the premise of creative work is not made, all
Belong to the scope of protection of the invention.
Embodiment 1 is a kind of to be used for AMOLED negative photo glue developing solutions, and it is according to percentage by weight group by following composition
Into：Water-soluble amide class compound 15%, organic base 35%, development accelerator 9% and surfactant 18%.
The water-soluble amide class compound is formamide, isobutyramide, N, N- diethylformamides, N, N- diethyl second
One or more composition in acid amides and N- ethyl pyrrolidones.
The organic base is by TMAH (TMAH), TEAH (tetraethyl ammonium hydroxide) and TMAC (tetramethyl-ammoniums
Carbonic acid (hydrogen) salt) one kind or any two kinds mix.
The surfactant is by alcohol ether carboxylate, alcohol ether sulfonate, phenolic ether sulfuric acid and the phosphatic one kind of alcohol ether
Or several compositions.
The development accelerator is that heterocyclic water-miscible organic solvent, the alcohol ethers such as alcohol ether, sulfoxide and pyrroles have diethylene glycol (DEG)
Single ether, diethylene glycol monobutyl ether, diethylene glycol ether, diethylene glycol dimethyl ether etc., sulfoxide have sulfolane, dimethyl sulfoxide (DMSO), hexichol
Base sulfoxide etc., pyrroles have the mixed of one or two kinds of arbitrary proportions in alpha-pyrrolidone, vinyl pyrrolidone, N- hydroxyethyl piperazines
Compound.
Embodiment 2 is a kind of to be used for AMOLED negative photo glue developing solutions, and it is according to percentage by weight group by following composition
Into：Water-soluble amide class compound 24%, organic base 46%, development accelerator 16% and surfactant 24%.
The water-soluble amide class compound is formamide, isobutyramide, N, N- diethylformamides, N, N- diethyl second
One or more composition in acid amides and N- ethyl pyrrolidones.
The organic base is by TMAH (TMAH), TEAH (tetraethyl ammonium hydroxide) and TMAC (tetramethyl-ammoniums
Carbonic acid (hydrogen) salt) one kind or any two kinds mix.
The surfactant is by alcohol ether carboxylate, alcohol ether sulfonate, phenolic ether sulfuric acid and the phosphatic one kind of alcohol ether
Or several compositions.
The development accelerator is that heterocyclic water-miscible organic solvent, the alcohol ethers such as alcohol ether, sulfoxide and pyrroles have diethylene glycol (DEG)
Single ether, diethylene glycol monobutyl ether, diethylene glycol ether, diethylene glycol dimethyl ether etc., sulfoxide have sulfolane, dimethyl sulfoxide (DMSO), hexichol
Base sulfoxide etc., pyrroles have the mixed of one or two kinds of arbitrary proportions in alpha-pyrrolidone, vinyl pyrrolidone, N- hydroxyethyl piperazines
Compound.
Embodiment 3 is a kind of to be used for AMOLED negative photo glue developing solutions, and it is according to percentage by weight group by following composition
Into：Water-soluble amide class compound 19%, organic base 38%, development accelerator 13% and surfactant 22%.
The water-soluble amide class compound is formamide, isobutyramide, N, N- diethylformamides, N, N- diethyl second
One or more composition in acid amides and N- ethyl pyrrolidones.
The organic base is by TMAH (TMAH), TEAH (tetraethyl ammonium hydroxide) and TMAC (tetramethyl-ammoniums
Carbonic acid (hydrogen) salt) one kind or any two kinds mix.
The surfactant is by alcohol ether carboxylate, alcohol ether sulfonate, phenolic ether sulfuric acid and the phosphatic one kind of alcohol ether
Or several compositions.
The development accelerator is that heterocyclic water-miscible organic solvent, the alcohol ethers such as alcohol ether, sulfoxide and pyrroles have diethylene glycol (DEG)
Single ether, diethylene glycol monobutyl ether, diethylene glycol ether, diethylene glycol dimethyl ether etc., sulfoxide have sulfolane, dimethyl sulfoxide (DMSO), hexichol
Base sulfoxide etc., pyrroles have the mixed of one or two kinds of arbitrary proportions in alpha-pyrrolidone, vinyl pyrrolidone, N- hydroxyethyl piperazines
Compound.
It is obvious to a person skilled in the art that the invention is not restricted to the details of the one exemplary embodiment, Er Qie
In the case of without departing substantially from spirit or essential attributes of the invention, the present invention can be realized in other specific forms.Therefore, no matter
From the point of view of which point, embodiment all should be regarded as exemplary, and be nonrestrictive, the scope of the present invention is by appended power
Profit requires rather than the explanation limits, it is intended that all in the implication and scope of the equivalency of claim by falling
Change is included in the present invention.Moreover, it will be appreciated that although the present specification is described in terms of embodiments, not each
Embodiment only includes an independent technical scheme, and this narrating mode of specification is only this area for clarity
Technical staff should be using specification as an entirety, and the technical solutions in the various embodiments may also be suitably combined, forms this
The other embodiment that art personnel are appreciated that.
Claims (5)
1. one kind is used for AMOLED negative photo glue developing solutions, it is characterised in that it is according to percentage by weight by following composition
Composition：Water-soluble amide class compound 15-24%, organic base 35-46%, development accelerator 9-16% and surfactant 18-
24%.
2. one kind according to claim 1 is used for AMOLED negative photo glue developing solutions, it is characterised in that：The water solubility
Amides compound is formamide, isobutyramide, N, N- diethylformamides, N, N- diethyl acetamides and N- ethyl pyrrolidines
One or more composition in ketone.
3. one kind according to claim 1 is used for AMOLED negative photo glue developing solutions, it is characterised in that：The organic base
By TMAH (TMAH), TEAH (tetraethyl ammonium hydroxide) and TMAC (tetramethyl-ammonium carbonic acid (hydrogen) salt) one kind or
It is any two kinds to mix.
4. one kind according to claim 1 is used for AMOLED negative photo glue developing solutions, it is characterised in that：Live on the surface
Property agent is made up of alcohol ether carboxylate, alcohol ether sulfonate, phenolic ether sulfuric acid and the phosphatic one or more of alcohol ether.
5. one kind according to claim 1 is used for AMOLED negative photo glue developing solutions, it is characterised in that：The development adds
Fast agent is that heterocyclic water-miscible organic solvent, the alcohol ethers such as alcohol ether, sulfoxide and pyrroles have diethylene glycol monoethyl ether, diethylene glycol (DEG) only son
Ether, diethylene glycol ether, diethylene glycol dimethyl ether etc., sulfoxide have sulfolane, dimethyl sulfoxide (DMSO), diphenyl sulfoxide etc., pyrroles have α-
The mixture of one or two kinds of arbitrary proportions in pyrrolidones, vinyl pyrrolidone, N- hydroxyethyl piperazines.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710851489.7A CN107678252A (en) | 2017-09-19 | 2017-09-19 | One kind is used for AMOLED negative photo glue developing solutions |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710851489.7A CN107678252A (en) | 2017-09-19 | 2017-09-19 | One kind is used for AMOLED negative photo glue developing solutions |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107678252A true CN107678252A (en) | 2018-02-09 |
Family
ID=61136395
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710851489.7A Pending CN107678252A (en) | 2017-09-19 | 2017-09-19 | One kind is used for AMOLED negative photo glue developing solutions |
Country Status (1)
| Country | Link |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101364055A (en) * | 2008-09-17 | 2009-02-11 | 电子科技大学 | Neutral developer solution for positive light-sensitive polyimides photo resist |
| CN105589303A (en) * | 2015-12-23 | 2016-05-18 | 苏州瑞红电子化学品有限公司 | High-capacity developing solution composition for thick film photoresists |
| CN106227003A (en) * | 2016-09-29 | 2016-12-14 | 杭州格林达化学有限公司 | A kind of developer composition and preparation method thereof |
-
2017
- 2017-09-19 CN CN201710851489.7A patent/CN107678252A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101364055A (en) * | 2008-09-17 | 2009-02-11 | 电子科技大学 | Neutral developer solution for positive light-sensitive polyimides photo resist |
| CN105589303A (en) * | 2015-12-23 | 2016-05-18 | 苏州瑞红电子化学品有限公司 | High-capacity developing solution composition for thick film photoresists |
| CN106227003A (en) * | 2016-09-29 | 2016-12-14 | 杭州格林达化学有限公司 | A kind of developer composition and preparation method thereof |
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Application publication date: 20180209 |