CN107651782A - A kind of high-purity water treatment system - Google Patents
A kind of high-purity water treatment system Download PDFInfo
- Publication number
- CN107651782A CN107651782A CN201710967037.5A CN201710967037A CN107651782A CN 107651782 A CN107651782 A CN 107651782A CN 201710967037 A CN201710967037 A CN 201710967037A CN 107651782 A CN107651782 A CN 107651782A
- Authority
- CN
- China
- Prior art keywords
- water
- partial circulating
- reflux line
- water treatment
- delivery port
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/008—Control or steering systems not provided for elsewhere in subclass C02F
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/469—Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis
- C02F1/4693—Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis electrodialysis
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/02—Non-contaminated water, e.g. for industrial water supply
- C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water
Abstract
The invention discloses a kind of high-purity water treatment system, including control device, systemic circulation reflux line and the pure water tank being sequentially connected in series, booster pump and water treatment facilities, one end of systemic circulation reflux line is connected by the 6th triple valve with the delivery port of water treatment facilities, the other end of systemic circulation reflux line is connected with the water return outlet of pure water tank, and at least one partial circulating loop is disposed with water treatment facilities.The present invention obtains high purity water by designing water treatment facilities；Systemic circulation reflux line connection end-filtration equipment and pure water tank circular treatment water are designed, when not having to water with water spot, water is transmitted back to pure water tank circular treatment；Partial circulating loop is designed with water treatment facilities, if water quality resistivity is still below standard after being handled in water treatment facilities, can be handled water in water treatment facilities again by partial circulating loop.The present invention can ensure that water quality will not be deteriorated by above-mentioned improvement in course of conveying, can be widely applied to field of water treatment equipment.
Description
Technical field
The present invention relates to field of water treatment equipment, more particularly to a kind of high-purity water treatment system.
Background technology
With advancing by leaps and bounds for science and technology, hi-tech industry increasingly improves to the requirement of high purity water.As the modern times are raw
Requirement of the thing science and technology to high-purity water conductivity is increase gradually to 0.067us/cm from 3us/cm, and electronics, chemical industry, Medical Laboratory
The requirement of high-purity water resistivity is increase gradually to 18.25M Ω cm from 10M Ω cm.This force high purity water reparation technology and
Conveying technique will be updated, and could meet that modern scientific research production proposes higher requirement to high purity water.
The technique of high purity water is mature on the whole at present, and the water quality of production mouth of a river on-line checking is satisfactory, but is conveyed
During to point of use, water degradation does not reach requirement.Specific reparation technology is as follows：Running water → raw water box storage → booster pump
Water is used in → pretreatment → two level RO systems → pure water tank storage → booster pump → EDI devices → high-purity water tank storage → delivery pump →
Point.Process above, the resistivity on-line checking of EDI devices production water can typically reach 16M Ω cm-18M Ω cm, and pass through
When delivery pump reaches point of use, resistivity drops to 2M Ω cm-10M Ω cm, does not reach completely with water requirement.
The content of the invention
The technical problems to be solved by the invention are to provide a kind of high-purity water treatment system, can ensure in course of conveying
In, water quality will not be deteriorated.
Technical scheme used by solve above-mentioned technical problem：
A kind of high-purity water treatment system, including control device, systemic circulation reflux line and the pure water for being sequentially connected in series arrangement
Case, booster pump and water treatment facilities, one end of the systemic circulation reflux line pass through the 6th triple valve and the water treatment facilities
Delivery port be connected, the other end of systemic circulation reflux line is connected with the water return outlet of the pure water tank, in the water treatment facilities
It is disposed with the partial circulating loop of at least one circular treatment water.
Further, EDI pure water equipments, polishing mixed bed and the end-filtration that the water treatment facilities includes being sequentially connected in series are set
Standby, the delivery port of the water treatment facilities is exactly the delivery port of the end-filtration equipment.
Further, the partial circulating loop includes the 5th partial circulating reflux line and the 5th monitoring table, and the described 5th small follows
One end of ring reflux line is connected by the 5th triple valve with the pipeline of the end-filtration equipment delivery port, and the 5th partial circulating returns
The other end in flow tube road is connected with the water return outlet of the end-filtration equipment, and the 5th monitoring table is arranged in the end-filtration
On pipeline between the delivery port of equipment and the 5th triple valve.
Further, the partial circulating loop includes the 4th partial circulating reflux line and the 4th monitoring table, and the described 4th small follows
One end of ring reflux line is connected by the 4th triple valve with the pipeline of the polishing mixed bed delivery port, the 4th partial circulating return duct
The other end in road is connected with the water return outlet of the polishing mixed bed, and the 4th monitoring table is arranged in the delivery port of the polishing mixed bed
On pipeline between the 4th triple valve.
Further, the partial circulating loop includes the 3rd partial circulating reflux line and the 3rd monitoring table, and the described 3rd small follows
One end of ring reflux line is connected by the 3rd triple valve with the pipeline of the EDI pure water equipments delivery port, and the 3rd partial circulating returns
The other end in flow tube road is connected with the water return outlet of the EDI pure water equipments, and the 3rd monitoring table is arranged in the EDI pure water and set
On pipeline between standby delivery port and the 3rd triple valve.
Further, the partial circulating loop includes first partial circulating reflux line and the 5th monitoring table, the first partial circulating
One end of reflux line is connected by the 5th triple valve with the pipeline of the end-filtration equipment delivery port, first partial circulating return duct
The other end in road is connected with the water return outlet of the EDI pure water equipments, and the 5th monitoring table is arranged in the end-filtration equipment
Delivery port and the 5th triple valve between pipeline on.
Further, the partial circulating loop includes second partial circulating reflux line and the 5th monitoring table, the second partial circulating
One end of reflux line is connected by the 5th triple valve with the pipeline of the end-filtration equipment delivery port, second partial circulating return duct
The other end in road is connected with the water return outlet of the polishing mixed bed, and the 5th monitoring table is arranged in going out for the end-filtration equipment
On pipeline between the mouth of a river and the 5th triple valve.
Further, the partial circulating loop includes the third partial circulating reflux line and the 4th monitoring table, and third partial circulating returns
The one end in flow tube road is connected by the 4th triple valve with the pipeline of the polishing mixed bed delivery port, the third partial circulating reflux line it is another
One end is connected with the water return outlet of the EDI pure water equipments, the 4th monitoring table be arranged in the delivery port of the polishing mixed bed with
On pipeline between 4th triple valve.
Further, the 5th triple valve is arranged between the delivery port and the 6th triple valve of the end-filtration equipment
On pipeline.Further, it is disposed with first pressure table on the systemic circulation reflux line.
Beneficial effect：The present invention is by designing the water process with EDI pure water equipments, polishing mixed bed and end-filtration equipment
Device obtains high purity water；Systemic circulation reflux line connection end-filtration equipment and pure water tank are designed, can when not having to water with water spot
Water is transmitted back to pure water tank circular treatment；At least one partial circulating loop is designed in water treatment facilities, if in water treatment facilities
Water quality resistivity is still below standard after middle processing, can convey in backwater treating device water by partial circulating loop and handle again.This
Invention can ensure that water quality will not be deteriorated in course of conveying, can be widely applied to field of water treatment equipment by above-mentioned improvement.
Brief description of the drawings
Fig. 1 is the connection diagram of the embodiment of the present invention.
Reference：1st, pure water tank；2nd, booster pump；3rd, EDI pure water equipments；31st, the 3rd monitoring table；32nd, the 3rd triple valve；
33rd, the 3rd partial circulating reflux line；4th, polishing mixed bed；41st, the 4th monitoring table；42nd, the 4th triple valve；43rd, the 4th partial circulating returns
Flow tube road；5th, end-filtration equipment；51st, the 5th monitoring table；52nd, the 5th triple valve；53rd, the 5th partial circulating reflux line；6th, it is big
Circulating reflux pipeline；62nd, the 6th triple valve.
Embodiment
With reference to Fig. 1, the present invention is described further.
Embodiment one：
A kind of high-purity water treatment system, including systemic circulation reflux line 6 and be sequentially connected in series arrangement be used for store water
Pure water tank 1, booster pump 2 and water treatment facilities, one end of the systemic circulation reflux line 6 pass through the 6th triple valve 62 and the water
The delivery port of processing unit is connected, and the other end of systemic circulation reflux line 6 is connected with the water return outlet of the pure water tank 1.Pass through institute
State systemic circulation reflux line 6 and pure water tank 1, booster pump 2 and water treatment facilities are connected to become systemic circulation loop, do not have to when with water spot
During water, circular treatment can be carried out to water by systemic circulation loop.
Further, it is disposed with first pressure table on the systemic circulation reflux line 6.In circular treatment water, described first
Whether pressure gauge is normal available for the hydraulic pressure monitored in the systemic circulation reflux line 6.
Further, the water treatment facilities include several series connection water treatment facilities, each water treatment facilities according to
Secondary is EDI pure water equipments 3, polishing mixed bed 4 and end-filtration equipment 5, and the delivery port of the water treatment facilities is exactly the end
Hold the delivery port of filter plant 5.
Further, the partial circulating loop of at least one circular treatment water is disposed with the water treatment facilities.The present embodiment
Described in the quantity in partial circulating loop be three, respectively the 3rd partial circulating loop, the 4th partial circulating loop and the 5th small follow
Loop back path.
The 3rd partial circulating loop includes the 3rd partial circulating reflux line 33 and the 3rd monitoring table 31, and the described 3rd small follows
One end of ring reflux line 33 is connected by the 3rd triple valve 32 with the pipeline of the EDI pure water equipments delivery port, and the 3rd small follows
The other end of ring reflux line 33 is connected by the 3rd check valve with the water return outlet of the EDI pure water equipments 3, the 3rd monitoring
Table 31 is arranged on the pipeline between the delivery port and the 3rd triple valve 32 of the EDI pure water equipments.
If if the 3rd monitoring table 31 detection water quality resistivity is not up to 16M Ω cm-18M Ω cm scopes, lead to
The direction that the 3rd triple valve 32 changes conveying water is crossed, water is transmitted back to the EDI pure water equipments 3 through the 3rd partial circulating reflux line 33
Again handle.
The 4th partial circulating loop includes the 4th partial circulating reflux line 43 and the 4th monitoring table 41, and the described 4th small follows
One end of ring reflux line 43 is connected by the 4th triple valve 42 with the pipeline of the delivery port of polishing mixed bed 4, the 4th partial circulating
The other end of reflux line 43 is connected by the 4th check valve with the water return outlet of the polishing mixed bed 4, the 4th monitoring table 41
It is arranged on the pipeline between the delivery port and the 4th triple valve 42 of the polishing mixed bed 4.
If if the 4th monitoring table 41 detection water quality resistivity is not up to 16M Ω cm-18M Ω cm scopes, lead to
The direction that the 4th triple valve 42 changes conveying water is crossed, water is transmitted back to the weight of polishing mixed bed 4 through the 4th partial circulating reflux line 43
New processing.
The 5th partial circulating loop includes the 5th partial circulating reflux line 53 and the 5th monitoring table 51, and the described 5th small follows
One end of ring reflux line 53 is connected by the 5th triple valve 52 with the pipeline of the delivery port of end-filtration equipment 5, and the 5th is small
The other end of circulating reflux pipeline 53 is connected by the 5th check valve with the water return outlet of the end-filtration equipment 5, and the described 5th
Monitoring table 51 is arranged on the pipeline between the delivery port and the 5th triple valve 52 of the end-filtration equipment 5.
If if the 5th monitoring table 51 detection water quality resistivity is not up to 16M Ω cm-18M Ω cm scopes, lead to
The direction that the 5th triple valve 52 changes conveying water is crossed, water is transmitted back to the end-filtration equipment through the 5th partial circulating reflux line 53
5 are handled again.
Further, the 5th triple valve 52 is arranged in the delivery port of the end-filtration equipment 5 and the 6th threeway
On pipeline between valve 62.
Further, it is the hydraulic pressure and water of raising water spot, the lift of the booster pump 2 is set than water process in the market
The lift of standby upper booster pump will increase 15 meters.
Further, second pressure gauge is disposed with the pure water tank 1, available for the hydraulic pressure in monitoring pure water tank 1.
Further, in addition to control device, the control device have following functions：The supercharging pump work is can control,
The position of the inner spool of the 3rd triple valve 32 can be controlled according to the testing result of the 3rd monitoring table 31, can be according to the 4th monitoring table 41
Testing result control the inner spool of the 4th triple valve 42 position, can according to the 5th monitoring table 51 testing result control the 5th
The position of the inner spool of triple valve 32, whether the position of the inner spool of the 6th triple valve 62 can be being controlled with water according to water spot
Put.
Foregoing each partial circulating loop not chiasma interference, same water treatment facilities can only in a partial circulating loop,
I.e. same water treatment facilities can not be connected with multiple partial circulating reflux lines simultaneously.
For example, the end-filtration equipment 5, polishing mixed bed 4 and second partial circulating reflux line composition second partial circulating loop, together
Shi Suoshu end-filtrations equipment 5 and the 5th partial circulating reflux line form the 5th partial circulating loop, and this structure does not allow to occur.
For example, the polishing mixed bed 4, the partial circulating reflux line of EDI pure water equipments 3 and third form the third partial circulating loop, together
Shi Suoshu EDI pure water equipments 3 and the 3rd partial circulating reflux line form the 3rd partial circulating loop, and this structure also does not allow
It is existing.
But the structure in second partial circulating loop and the 3rd partial circulating loop is can be designed as, or the 5th partial circulating loop and third
The structure in partial circulating loop.
Embodiment two：
The present embodiment and the difference of embodiment one are that the quantity in the partial circulating loop is one.The partial circulating returns
Road includes first partial circulating reflux line and the 5th monitoring table 51, and one end of the first partial circulating reflux line passes through the 5th triple valve
52 are connected with the pipeline of the delivery port of end-filtration equipment 5, and the other end of first partial circulating reflux line passes through the 3rd check valve
It is connected with the water return outlet of the EDI pure water equipments 3, the 5th monitoring table 51 is arranged in the water outlet of the end-filtration equipment 5
On pipeline between mouth and the 5th triple valve 52.
Embodiments of the present invention are explained in detail above in association with accompanying drawing, but the invention is not restricted to above-mentioned embodiment party
Formula, can also be before present inventive concept not be departed from the technical field those of ordinary skill possessed knowledge
Put that various changes can be made.
Claims (10)
1. a kind of high-purity water treatment system, including control device, it is characterised in that：Also include systemic circulation reflux line (6) and
The pure water tank (1), booster pump (2) and water treatment facilities of arrangement are sequentially connected in series, one end of the systemic circulation reflux line (6) passes through
6th triple valve (62) is connected with the delivery port of the water treatment facilities, the other end of systemic circulation reflux line (6) with it is described pure
The water return outlet of water tank (1) is connected, and the partial circulating loop for being recycled to water is disposed with the water treatment facilities.
A kind of 2. high-purity water treatment system according to claim 1, it is characterised in that：The water treatment facilities is included successively
EDI pure water equipments (3), polishing mixed bed (4) and the end-filtration equipment (5) of series connection, the delivery port of the water treatment facilities is just
It is the delivery port of the end-filtration equipment (5).
A kind of 3. high-purity water treatment system according to claim 2, it is characterised in that：The partial circulating loop includes the 5th
Partial circulating reflux line (53) and the 5th monitoring table (51), one end of the 5th partial circulating reflux line (53) passes through the five or three
Port valve (52) is connected with the pipeline of end-filtration equipment (5) delivery port, the other end of the 5th partial circulating reflux line (53)
It is connected with the water return outlet of the end-filtration equipment (5), the 5th monitoring table (51) is arranged in the end-filtration equipment (5)
Delivery port and the 5th triple valve (52) between pipeline on.
A kind of 4. high-purity water treatment system according to Claims 2 or 3, it is characterised in that：The partial circulating loop includes
4th partial circulating reflux line (43) and the 4th monitoring table (41), one end of the 4th partial circulating reflux line (43) pass through the
Four triple valves (42) are connected with the pipeline of the polishing mixed bed (4) delivery port, the other end of the 4th partial circulating reflux line (43)
It is connected with the water return outlet of the polishing mixed bed (4), the 4th monitoring table (41) is arranged in the delivery port of the polishing mixed bed (4)
On pipeline between the 4th triple valve (42).
A kind of 5. high-purity water treatment system according to claim 4, it is characterised in that：The partial circulating loop includes the 3rd
Partial circulating reflux line (33) and the 3rd monitoring table (31), one end of the 3rd partial circulating reflux line (33) passes through the three or three
Port valve (32) is connected with the pipeline of the EDI pure water equipments delivery port, the other end of the 3rd partial circulating reflux line (33) and institute
The water return outlet for stating EDI pure water equipments (3) is connected, and the 3rd monitoring table (31) is arranged in the delivery port of the EDI pure water equipments
On pipeline between the 3rd triple valve (32).
A kind of 6. high-purity water treatment system according to claim 2, it is characterised in that：It is small that the partial circulating loop includes first
Circulating reflux pipeline and the 5th monitoring table (51), one end of the first partial circulating reflux line passes through the 5th triple valve (52) and institute
The pipeline for stating end-filtration equipment (5) delivery port is connected, the other end of first partial circulating reflux line and the EDI pure water equipments
(3) water return outlet is connected, and the 5th monitoring table (51) is arranged in delivery port and the 5th threeway of the end-filtration equipment (5)
On pipeline between valve (52).
A kind of 7. high-purity water treatment system according to claim 2, it is characterised in that：It is small that the partial circulating loop includes second
Circulating reflux pipeline and the 5th monitoring table (51), one end of the second partial circulating reflux line passes through the 5th triple valve (52) and institute
The pipeline for stating end-filtration equipment (5) delivery port is connected, the other end and the polishing mixed bed (4) of second partial circulating reflux line
Water return outlet is connected, and the 5th monitoring table (51) is arranged in the delivery port and the 5th triple valve of the end-filtration equipment (5)
(52) on the pipeline between.
A kind of 8. high-purity water treatment system according to Claims 2 or 3, it is characterised in that：The partial circulating loop includes
Third partial circulating reflux line and the 4th monitoring table (41), one end of the third partial circulating reflux line passes through the 4th triple valve (42)
It is connected with the pipeline of the polishing mixed bed (4) delivery port, the other end of the third partial circulating reflux line and the EDI pure water equipments
(3) water return outlet is connected, and the 4th monitoring table (41) is arranged in the delivery port and the 4th triple valve of the polishing mixed bed (4)
(42) on the pipeline between.
A kind of 9. high-purity water treatment system according to claim 3 or 6 or 7, it is characterised in that：5th triple valve
(52) it is arranged on the pipeline between the delivery port of the end-filtration equipment (5) and the 6th triple valve (62).
A kind of 10. high-purity water treatment system according to claim 1, it is characterised in that：The systemic circulation reflux line (6)
On be disposed with first pressure table.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710967037.5A CN107651782A (en) | 2017-10-17 | 2017-10-17 | A kind of high-purity water treatment system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710967037.5A CN107651782A (en) | 2017-10-17 | 2017-10-17 | A kind of high-purity water treatment system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107651782A true CN107651782A (en) | 2018-02-02 |
Family
ID=61118355
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710967037.5A Pending CN107651782A (en) | 2017-10-17 | 2017-10-17 | A kind of high-purity water treatment system |
Country Status (1)
| Country | Link |
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| CN (1) | CN107651782A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11795083B1 (en) * | 2020-03-25 | 2023-10-24 | Vita Technologies, Inc. | Quantum energized water through the selective treatment and conditioning of a base aqueous solution |
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|---|---|---|---|---|
| CN1130896A (en) * | 1994-07-22 | 1996-09-11 | 奥加诺株式会社 | Method and device for producing de-ionized water or ultrapure water |
| CN202988902U (en) * | 2012-12-17 | 2013-06-12 | 万亮 | Ultrapure water circulation water supply system |
| JP2014140826A (en) * | 2013-01-25 | 2014-08-07 | Nomura Micro Sci Co Ltd | Ultrapure water production method |
| CN104176865A (en) * | 2014-08-28 | 2014-12-03 | 宁波泽沃水处理科技有限公司 | Pure water treatment device |
| CN204752439U (en) * | 2015-06-17 | 2015-11-11 | 南京奥特净化工程有限公司 | Ultrapure water system terminal quality of water hoisting device |
| CN206298474U (en) * | 2016-12-16 | 2017-07-04 | 东莞市秦泰盛实业有限公司 | A kind of 12 tons of ultra-pure water mixed-bed systems per hour |
-
2017
- 2017-10-17 CN CN201710967037.5A patent/CN107651782A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1130896A (en) * | 1994-07-22 | 1996-09-11 | 奥加诺株式会社 | Method and device for producing de-ionized water or ultrapure water |
| CN202988902U (en) * | 2012-12-17 | 2013-06-12 | 万亮 | Ultrapure water circulation water supply system |
| JP2014140826A (en) * | 2013-01-25 | 2014-08-07 | Nomura Micro Sci Co Ltd | Ultrapure water production method |
| CN104176865A (en) * | 2014-08-28 | 2014-12-03 | 宁波泽沃水处理科技有限公司 | Pure water treatment device |
| CN204752439U (en) * | 2015-06-17 | 2015-11-11 | 南京奥特净化工程有限公司 | Ultrapure water system terminal quality of water hoisting device |
| CN206298474U (en) * | 2016-12-16 | 2017-07-04 | 东莞市秦泰盛实业有限公司 | A kind of 12 tons of ultra-pure water mixed-bed systems per hour |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11795083B1 (en) * | 2020-03-25 | 2023-10-24 | Vita Technologies, Inc. | Quantum energized water through the selective treatment and conditioning of a base aqueous solution |
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Application publication date: 20180202 |
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