CN107636449A - For with by the light source that spatial selectivity wavelength filter is changed by the system and method for imaging samples - Google Patents
For with by the light source that spatial selectivity wavelength filter is changed by the system and method for imaging samples Download PDFInfo
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- CN107636449A CN107636449A CN201680028562.4A CN201680028562A CN107636449A CN 107636449 A CN107636449 A CN 107636449A CN 201680028562 A CN201680028562 A CN 201680028562A CN 107636449 A CN107636449 A CN 107636449A
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/203—Filters having holographic or diffractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N2021/0106—General arrangement of respective parts
- G01N2021/0112—Apparatus in one mechanical, optical or electronic block
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8845—Multiple wavelengths of illumination or detection
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- Optics & Photonics (AREA)
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- Engineering & Computer Science (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Spectrometry And Color Measurement (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Abstract
The present invention discloses a kind of system for illuminating sample with the light source through spectral filtering, and the system includes the light source for being configured to produce the illuminating bundle with first group of wavelength.In addition, the system includes wavelength filtering subsystem, sample microscope carrier, illumination subsystems, detector, and to focus on the illumination on the surface from one or more samples and object lens by the illumination focus of the aggregation to the detector.In addition, the wavelength filtering subsystem includes：One or more first dispersion elements, the spatial filter element introducing spatial dispersion in the light beam are located to, and is located to remove one or more dispersion elements of spatial dispersion from the light beam.The spatial filter element transmits at least a portion for including second group of wavelength of the light beam through further positioning, wherein second group of wavelength is the subgroup of first group of wavelength.
Description
Technical field
The present invention relates generally to wafer inspection systems, and relates in particular to brilliant with the illumination source lighting through spectral filtering
Piece.
Background technology
By being inversely proportional for inspection or the analysable minimum feature size of optical system of designing for manufacturing and the wavelength of light source.
Therefore need to continually develop with shorter wavelength and the source with higher intensity at these wavelengths.However, increasingly powerful photograph
The exploitation in bright source gives the exploitation for the system and method for being used to utilize (harness) this illumination to bring new challenge.With being designed to pair
A significant challenge for crossing the effective optical system association of the wavelength in ultraviolet is that many materials can highly absorb shortwave
Long illumination.This high-selenium corn does not only result in the reduction of performance, and also becomes the factor of the allowance strength of limitation light source.As reality
Example, because the height of the light of illumination absorbs, being designed to filter many coatings of the spectrum in ultraviolet lighting source can be driven to
High temperature (process for being referred to as heat loading).This heat loading eventually causes component damage or light pollution (photo- in systems
Contamination), therefore, it is necessary to the defects of prior art identified above is eliminated.
The content of the invention
According to the illustrative embodiment of the present invention, a kind of ultraviolet lighting source with wavelength selection control is disclosed.One
In individual illustrative embodiment, ultraviolet lighting source includes light source, and the light source, which is configured to produce, includes first group of wavelength
Illuminating bundle.In another illustrative embodiment, ultraviolet lighting source includes first group of one or more optical element, wherein institute
State first group of one or more optical element and include one or more first dispersions for being located to introduce spatial dispersion in light beam
Element.In another illustrative embodiment, ultraviolet lighting source includes spatial filter element, wherein the spatial filter is first
Part is positioned in the plane being conjugated with light source, and its spatial filter element is configured to transmit at least a portion of light beam,
Second group of wavelength wherein is included from the light beam of spatial filter element guiding, wherein second group of wavelength is first group of ripple
Long subgroup.In another illustrative embodiment, ultraviolet lighting source includes second group of one or more optical element, wherein described
Second group of one or more optical element is located at least a portion for assembling light beam, wherein described second group of one or more optics
Element includes one or more second dispersion elements for being located to that spatial dispersion is removed from light beam.
According to the illustrative embodiment of the present invention, disclose a kind of for being with the illumination source lighting sample through spectral filtering
System.In an illustrative embodiment, system includes light source, and the light source is configured to produce comprising first group of wavelength
Illuminating bundle.In another illustrative embodiment, system includes wavelength filtering subsystem.In another illustrative embodiment, ripple
Long filtering subsystem includes first group of one or more optical element, wherein described first group of one or more optical element are included through fixed
Position is so that spatial dispersion to be incorporated into one or more first dispersion elements in light beam.In another illustrative embodiment, wavelength filter
Subsystem includes spatial filter element, wherein the spatial filter element is positioned in the plane being conjugated with light source,
Its spatial filter element is configured to transmit at least a portion of light beam, wherein the light beam from the guiding of spatial filter element
Comprising second group of wavelength, wherein second group of wavelength is the subgroup of first group of wavelength.In another illustrative embodiment,
Wavelength filtering subsystem includes second group of one or more optical element, wherein described second group of one or more optical element are located
To assemble at least a portion of light beam, it is located to remove sky from light beam wherein described second group of one or more optical element include
Between dispersion one or more second dispersion elements.In another illustrative embodiment, system, which includes, to be used to fix one or more samples
This sample microscope carrier.In another illustrative embodiment, system includes illumination subsystems, the illumination subsystems be configured to through
At least a portion of one or more samples is illuminated with least a portion of second group of wavelength by illumination path.In another illustrative reality
Apply in example, system includes detector.In another illustrative embodiment, system includes object lens, and the object lens are configured to focus on
Surface from one or more samples illumination and via aggregation paths by the illumination focus of aggregation to detector with detector
At least one of image on the upper surface for forming one or more samples.
According to another illustrative embodiment of the present invention, a kind of be used for the illumination source lighting sample through spectral filtering is disclosed
System.In an illustrative embodiment, system includes light source, and the light source, which is configured to produce, includes first group of ripple
Long illuminating bundle.In another illustrative embodiment, system includes wavelength filtering subsystem.In another illustrative embodiment
In, wavelength filtering subsystem includes first group of one or more optical element, wherein described first group one or more optical element bags
Containing one or more first dispersion elements for being located to introduce spatial dispersion in light beam.In another illustrative embodiment,
Wavelength filtering subsystem includes spatial filter element, is put down wherein the spatial filter element is positioned at what light source was conjugated
In face, its spatial filter element transmits at least a portion of light beam with being located to reflectivity, wherein from spatial filter
The light beam of element guiding includes second group of wavelength, wherein second group of wavelength is the subgroup of first group of wavelength, wherein from
The light beam of spatial filter element guiding back propagates across one or more optical elements in mirror paths so that is moved from light beam
Except spatial dispersion.In another illustrative embodiment, system includes the sample microscope carrier for being used for fixing one or more samples.Another
In illustrative embodiment, system includes illumination subsystems, and the illumination subsystems are configured to via illumination path with second group
At least a portion of wavelength illuminates at least a portion of one or more samples.In another illustrative embodiment, system includes inspection
Survey device.In another illustrative embodiment, system includes object lens, and the object lens are configured to focus on from one or more samples
The illumination on surface and via aggregation paths by the illumination focus of aggregation to detector to form one or more samples on the detector
At least one of image on this surface.In another illustrative embodiment, system includes object lens, and the object lens are configured to
Focus on the surface from one or more samples illumination and via aggregation paths by the illumination focus of aggregation to detector with
At least one of image on the surface of one or more samples is formed on detector.
According to the illustrative embodiment of the present invention, a kind of method for being used to filter ultraviolet lighting for imaging samples is disclosed.
In an illustrative embodiment, method includes the illuminating bundle for producing and including first group of wavelength.In another illustrative embodiment
In, method includes and spatial dispersion is incorporated into light beam.In another illustrative embodiment, method includes and directs the light beam into sky
Between on filter element so that second group of wavelength is included from the light beam of spatial filter element guiding, wherein second group of ripple
Length is the subgroup of first group of wavelength.In another illustrative embodiment, method includes aggregation and drawn from spatial filter element
At least a portion for the light beam led.In another illustrative embodiment, method includes from light beam and removes spatial dispersion.
Brief description of the drawings
By reference to accompanying drawing, those skilled in the art is better understood numerous advantages of the present invention, wherein：
Figure 1A is the general of the system according to an embodiment of the invention that sample is imaged with the light source through spectral filtering
Read figure.
Figure 1B is the schematic diagram of wavelength filtering subsystem according to an embodiment of the invention.
Fig. 1 C are the wavelength filterings according to an embodiment of the invention for being configured the illumination path with optical frames picture
The schematic diagram of subsystem.
Fig. 1 D are the illumination path according to an embodiment of the invention being configured with optical frames picture and extension illumination
The schematic diagram of the wavelength filtering subsystem in source.
Fig. 1 E are the concept maps of the traditional triangle shape prism according to an embodiment of the invention as dispersion element.
Fig. 1 F are the concept maps of the prism array according to an embodiment of the invention as dispersion element.
Fig. 2 is the concept map through spatial dispersion image of extension light source according to an embodiment of the invention, described
Extension light source is arranged such that each wavelength is imaged as straight line, wherein the width of the straight line is related to the size of light source.
Fig. 3 is according to an embodiment of the invention is used for the system of the illumination source lighting sample through spectral filtering
Schematic diagram.
Fig. 4 is to describe the side according to an embodiment of the invention for being used to be imaged sample with the light source through spectral filtering
The flow chart of method.
Embodiment
With detailed reference to the disclosed subject matter being illustrated in accompanying drawing.
Although it is stated that the particular embodiment of the present invention, it is understood, however, that those skilled in the art is not taking off
In the case of scope and spirit from foregoing description, various modifications and the embodiment of the present invention can be made.Accordingly, it is of the invention
Scope should be only by the claims for being additional to this to limit.
Generally with reference to Figure 1A to 1F, a kind of system for being used to filter the spectral radiance of light source is described according to the present invention
And method.Embodiments of the invention are related to selects one group to want wavelength from the spectrum of light source.Additional examples of composition is related to right
The illumination optics of imaging system (for example, wafer inspection subsystem, metering storage subsystem and fellow) are answered to couple through light
The wavelength of spectral filter.Some embodiments of the present invention are related to the wavelength selection in high power and extremely short wavelength system.
What Figure 1A illustrated that the part through spectral filtering according to an embodiment of the invention with light source 101 is imaged sample is
System 100.Light source 101 produces the illumination output for defining light beam 104, and the light beam 104 has the light being made up of first group of wavelength
Spectrum.By way of non-limiting example, first group of wavelength can including (but not limited to) the infrared ray of electromagnetic spectrum, visible ray,
Wavelength in ultraviolet (UV), deep UV (DUV), extreme ultraviolet (EUV) and/or vacuum ultraviolet (VUV) region.At some
In embodiment, at least a portion of light beam 104 can be assembled and guided by one or more elements 103.It should be noted that one or more optics
Element 103 can be including (but not limited to) one or more lens, prism, grating, polarization element, wave plate or aperture.Should further it note
Anticipate and arrive, one or more elements can be configured to change the time of light beam 104 or space profiles, and the diverging of control light beam 104
Degree (for example, producing light beam 104 that is collimated, dissipating or amass wealth by heavy taxation).
Generally with reference to Figure 1B, in one embodiment, the channeled wavelength filtering subsystem in system 100 of light beam 104
System 102.In one embodiment, light beam 104 passes through the entrance pupil 116 of wavelength filtering subsystem 102, and is incident on located
Spatial dispersion to be incorporated on the dispersion element 111 (for example, prism) in light beam 104.In this sense, in first group of wavelength
Each wavelength guided with different angle from dispersion element 111.Concentrating element 113 is located to that light beam 104 is assembled and focused on
Onto spatial filter element 112, the spatial filter element 112, which is configured to only to transmit light beam, has second group of wavelength
Part.It may be noted here that second group of wavelength is the subgroup of first group of wavelength.It is attributed to the sky triggered by dispersion element 111
Between dispersion, concentrating element 113 is by the diverse location in each wavelength focus to spatial filter element 112.In one embodiment
In, spatial filter element 112 is the aperture with one or more openings, and the spatial filter element 112 is positioned such that
Only second group of wavelength is open through one or more.In certain embodiments, the second concentrating element 114 is located to assemble and collimated
The light of the selected wavelength transmitted by spatial filter element 112.In certain embodiments, the second dispersion element is (for example, rib
Mirror) 115 it is located to remove spatial dispersion and produces light beam 105.Through the emergent pupil 117 of wavelength filtering subsystem 102
Therefore light beam 105 is through spectral filtering version through the light beam of entrance pupil 116.
It may be noted here that any dispersion element in dispersion element 111 and/or 115 can be included belonging to any number and led
Known dispersive elements and can be including (but not limited to) refracting element (for example, prism) and diffraction element (for example, with reflection in domain
Pattern or the diffraction grating of transmission mode operation).In one embodiment, as shown in Fig. 1 E and 1F, dispersion element 111 includes
Prism array 111b equally includes Fresnel prism 111b.It may be noted here that the prism with drift angle 136 and width 134
Identical dispersion can be incorporated into light beam by array 111b as the conventional prism 111a with same apex angle 136 and width 132
104.In this way, the absorption of light in dispersion element 111 (for example, UV light) can be reduced to the reduction of thickness 134 from thickness 132.
It is further noted that any dispersion element in dispersion element 111 and/or 115 can include times of refracting element and diffraction element
What is combined.By way of non-limiting example, dispersion element 111 and/or 115 can be including (but not limited to) traditional type or phenanthrene
One or more any type of prisms in alunite ear type.As another non-limiting examples, dispersion element 111 can include (but
It is not limited to) diffraction grating, and dispersion element 115 can be including (but not limited to) one or more prisms.Should further it note herein
Anticipate, any lens element (for example, element 103 and 106) in system 100 can include one or more Fresnel lenses.
It is further noted that any dispersion element in dispersion element 111 and/or 115 can be by known in art
Any material for being adapted for introduction into the purpose of dispersion is made.For example, transmission-type dispersion element 111 and/or 115 (for example, prism or
Transmission diffraction grating) can be by such as (but not limited to) MgF2、LiF、CaF2, sapphire, crystal type quartz, molten silicon, suprasil
1st, suprasil 2, suprasil 300, suprasil 310, congratulate Li Shi (HERALUX) PLUS, congratulate Li Shi VUV and similar material
Material is formed.Herein again, it is to be noted that such as (but not limited to) CaF2、MgF2, crystal type is quartzy and sapphire material is by transparency
Short wavelength radiation is provided (for example, λ<190mm).By the dispersive optical elements 111 and/or 115 (for example, prism) based on refraction
The degree for the spatial dispersion being incorporated into light beam 104 depends on material selection and physical Design is considered (for example, light beam 104 is in office
Incidence angle on what surface).It is further noted that the dispersion element 111 and/or 115 (for example, diffraction grating) based on diffraction can
Manufactured using known any manufacturing process in art.Dispersion element 111 and/or 115 based on diffraction can include (but
Be not limited to) full figure grating, ruling grating, balzed grating, Volume Bragg grating (VBG) or use write direct process (for example,
On the surface of material or the intrinsic femtosecond laser of material writes direct) manufactured by grating.
It should be noted that the invention is not restricted to described concentrating element 113 and 114 previously herein, it is only for illustrative
Purpose and provide.In certain embodiments, concentrating element 113 and/or 114 can not by comprising.Concentrating element 113 and/or 114 can
By known any kind of lens forming in art.For example, concentrating element 113 and/or 114 can be including (but not limited to)
One or more spherical lenses or one or more cylindrical lens.It may be noted here that one or more passbands of spatial filter element 112
The shape in region can be defined by the shape of the image of the light source 101 on spatial filter element 112, and the shape is positioned
Any element in the optical path of light beam 104 between light source 101 and spatial filter element 112 influences.By non-
The mode of limitative examples, dispersion element 111 are linear prisms, and it is positioned such that light beam shows the linear sky in a size
Between dispersion, and concentrating element 113 is cylindrical lens, and it is positioned such that each wavelength focus from light source 101 is space
Straight line on filter element 112.In addition, in this configuration, each wavelength line focus to the different spaces on spatial filter
On position.
Fig. 2 illustrates the image of the light source 101 according to an embodiment of the invention on spatial filter element 112
Concept map.In this embodiment, the imaged straight line on spatial filter element 112 of each wavelength of light source 101.Directly
The width of line 118 is related to the spatial dimension of the imaging moiety of light source 101.It is further noted that spatial filter element 112
The contrast that wanted wavelength can optionally be transmitted and block second wave length to be relied on is depended on into spatial filter element 112
The width of the upper straight line 118 corresponding to each wavelength；This line width is smaller, then the space of the wavelength on spatial filter element 112
Overlapping smaller and spatial filter contrast is higher.With reference to the concept map in figure 2, light source 101 can have to be arrived comprising 120nm
The spectrum of wavelength in 200nm wave-length coverage.The imaged straight line on spatial filter element 112 of each wavelength and each
The imaging size of the width means light source 101 of straight line 118.In certain embodiments, system 100 can include such as optics
Or the element 103 (for example, spectrum selective paint or spatial filter) of wave filter, element 103 are configured to limit light source
101 spectral content and/or effective size, such as the remainder finding of system 100.Herein it is further noted that being filtered in space
The form and dimension of the image of light source 101 on ripple device element 112 can itself be engineered so that minimum to spatial filter element
112 manufacture limitation.For example, make it that each wavelength is in rounded shape relative to imaging illumination source 101, imaging illumination source causes each
The linear shape of wavelength (for example, according to Fig. 2) can make the manufacture of spatial filter element 112 easily and/or less expensive.
In one embodiment, illumination 104 is by any group of the optics comprising light source 101 and optical element 103
Close collimation.Then collimated illumination 104 may be directed dispersion element 111, and focus on space filtering by concentrating element 113
On device element 112.Light source 101 and spatial filter element 112 are located in the infinite conjugate on concentrating element 113
In configuration, i.e., the image of light source and spatial filter element 112 are located at the focal length of concentrating element 113.It may be noted here that
The invention is not restricted to this particular configuration, and this configuration is provided merely for illustrative purpose.It should be noted that the present invention may extend into it is any
Arrangement, wherein light source 101 and spatial filter element 112 are positioned in any number finite conjugate position so that space
Filter element 112 is in the plane of delineation of light source 101.
In another embodiment, it can be used spatial dispersion being incorporated into light beam 104 and simultaneously by light beam 104 and focus on sky
Between single physical component (for example, curved diffraction gratings) on filter element 112 realize dispersion element 111 and concentrating element
113 function.Similarly, single physical component can be used to realize the function of dispersion element 115 and concentrating element 114.
It should be noted that spatial filter element 112 can include known any kind of spatial filter in art.
In some embodiments, spatial filter is formed by the aperture being open comprising one or more.In this sense, second group of wavelength
(that is, those wavelength transmitted by spatial filter element 112) may propagate through one or more openings of aperture.In an implementation
In example, spatial filter element 112 is absorbed by the wavelength of spatial filter element rejection.In another embodiment, space filtering
Device element 112 has high reflector surface of the reflection through rejection wavelength.In another embodiment, spatial filter can by with
The spatial light modulator of control unit is formed, and its spatial light modulator contains indivedual addressable regions, or control can be used
Unit is incident on the pixel of the wavelength in each pixel to configure with transmission or rejection.This spatial light modulator can be with following modes
Operation：Transmission mode, wherein the wavelength of selected transmission is guided through spatial light modulator；Or reflective-mode, wherein through choosing
Surely the wavelength transmitted is reflected.In other embodiments, spatial filter includes MEMS (MEMS) device or nanometer machine
Electric system (NEMS) device, the device can be configured to transmit selected wavelength according to position of the wavelength on device.One
In individual embodiment, the spatial filter element 112 based on MEMS can be configured into deformable mirror so that selected wavelength to be passed
The subsequent element (for example, focusing optics 114) being directed into system, while its commplementary wave length is reflected away from space filtering
Device element 112 (for example, reflexing to (such as) light beam stop block or baffle plate).In this sense, the spatial filter element based on MEMS
112 are used for the not selected wavelength through spatial filter element 112 of rejection.
, in certain embodiments, can be by using in space filtering generally with reference to the rough schematic view in Fig. 1 C and 1D
Symmetrically configure to reduce the number of the physical component in system 100 surrounding optical of device element 112.In this sense, space
Filter element 112 is configured and operated in this reflection mode：Second group of selected wavelength reflects from spatial filter element 112,
And propagate across dispersion element 111 along mirror image optimal path so that remove the spatial dispersion in light beam 104.In Fig. 1 C and 1D
The rough schematic view of this embodiment is shown, so as to display lighting source 101, it is configured as point source and extension source respectively.
In one embodiment, light beam 104 is incident on the (example of dispersion element 111 for being located to introduce spatial dispersion in light beam 104
Such as, prism) on.Concentrating element 113 is located to light beam 104 be assembled and focused on the sky for being configured and operating in this reflection mode
Between on filter element 112.Second group of selected wavelength reflects from spatial filter element 112, and second passes through mirror image light
Learn path and pass through element 111 and 113.Output beam 105 may be selected and by known any method in art from defeated
Enter light beam 104 to break up.For example, in non-limiting example, optical element 103 may be configured to include for selecting wavelength
Polarizing beam splitter and quarter-wave plate so that the second group of wavelength transmitted by spatial filter element 112 is second
With being deflected after polarizing beam splitter interaction along the optical path different from inputs light beam 104 in transmission.Gained light
Beam 105 will then be directed into illumination path 121, and be ultimately led into sample 107.
It may be noted here that one of advantage of wavelength filtering subsystem 102 be for short wavelength illumination 104 (for example,
UV, EUV, DUV and/or VUV illuminate) improved performance.Thermal property for the material of making space filter element 112 will
Partly control the peak power limitation of wavelength filtering subsystem 102 because with by 112 rejections of spatial filter element
At least a portion of energy of wavelength association can be absorbed.In a non-limiting examples, spatial filter element 112 is
By can absorb and dissipate (for example, radiator via attachment) by 112 rejections of spatial filter element wavelength absorption
The metal of the heat load triggered is made.In another non-limiting example, spatial filter element 112 is configured to have
High reflector surface so that spatial filter element 112 absorbs the energy of the wavelength by the rejection of spatial filter element 112
Least part；More precisely, this energy is through being reflected away from spatial filter element 112 to the additional element (example in system 100
Such as, light beam stop block or baffle plate), the additional element is designed to absorb and dissipation energy.Although it is further noted that short wavelength
Light source provides advantage in terms of optical property, but short wavelength's light source is returned comprising can be with acceptable absorption loss fully
The design of the system 100 of the finite availability material of transmission or reflection illumination 104 brings unique challenges.In addition, in system 100
The excessive absorption of component can cause the performance or the infringement in life-span and light pollution risk of final reduction system 100.
In one embodiment, light source 101 include continuous laser plasma (LSP) source, the continuous laser etc. from
Daughter source is configured to produce one group of wavelength or wave-length coverage (such as, but not limited to infrared radiation, visible radiation, UV spokes
Penetrate, DUV radiation and/or VUV radiation) illumination 104.In one embodiment, light source 101 is continuous laser plasma
Source, the continuous laser plasma source produce broadband light via the plasma being maintained in plasma lamp.For example, base
Can be including (but not limited to) plasma born of the same parents or plasma lamp bulb in the plasma lamp of LSP light source.In another implementation
In example, light source 101 includes discharge source, such as, but not limited to plasma discharge lamp.By way of non-limiting example, shine
Bright source 101 can be including (but not limited to) deuterium lamp.In another embodiment, light source 101 can include two or more light sources
So as to which the light source 101 that there is more multi-wavelength than single source can be produced.
In Additional examples of composition, light source is made up of one or more narrow-band illumination sources (for example, one or more lasing light emitters).Extensively
In justice, light source 101 can include known any laser system in art.By way of non-limiting example, illuminate
Source 101 can include to be configured to produce one group of wavelength or wave-length coverage (such as, but not limited to infrared ray known in art
Radiation, visible radiation, UV radiation, DUV radiation and/or VUV radiation) any laser system.In one embodiment, illuminate
Source 101 can include the laser system for being configured to launch continuous wave (CW) laser emission.For example, pump source 104 can be included through matching somebody with somebody
Put with one or more CW ultraviolet lasers sources in wafer inspection instrument, wherein with short wavelength source (for example, UV, DUV,
EUV or VUV illuminations) it is desired to realize wanted resolution ratio.It may be noted here that it is configured to produce the light source of CW illuminations
101 be not that known any light source 101 can be implemented in the context of the present invention in restricted and art.Another
In one embodiment, light source can be the pulsed laser source of the pulse length with time scale, and the time scale includes (but not
It is limited to) millisecond, microsecond, nanosecond, psec or femtosecond.In another embodiment, it is defeated to can be configured to generate modulation for light source 101
Go out.For example, can be with acousto-optic or electrooptic modulator modulation light source 101 to produce through time moulding illumination.
In another embodiment, light source 101 can include one or more excimer laser systems.Pass through non-limiting examples
Mode, light source can include PRK, the PRK be configured to use molecular fluorine as applying gas with
Launch 157nm laser.In another embodiment, light source 101 can include one or more diode laser systems.In another implementation
In example, light source can include the diode laser for being configured and launching with 445nm.
In another embodiment, light source 101 can include one or more frequency conversion laser systems.Pass through non-limiting reality
The mode of example, light source 101 can include the nominal center illumination wavelengths with the 458nm coupled with β phases barium borate (BBO) crystal
Gas ion laser to produce the illumination with 229nm centre wavelengths.
In another embodiment, system 100 includes the microscope carrier sub-assembly 108 for being suitable for fixed sample 107.Microscope carrier combines
Part 108 can include known any sample microscope carrier framework in art.For example, microscope carrier sub-assembly 108 can include it is (but unlimited
In) linear stage, rotation microscope carrier or multiaxis microscope carrier any combinations.In addition, sample 107 can include chip, such as, but not limited to
Semiconductor wafer.
In another embodiment, system 100 includes imaging subsystems 121.Imaging subsystems 121 can be including (but not limited to)
Lens 120 and beam splitter 110.In addition, imaging subsystems 121 can including (but not limited to) aperture, wave filter, homogenizer,
Polarizer, beam splitter and/or it is suitable for illumination from wavelength filtering subsystem 102 being sent to one or more samples 107
The moulding element of light beam.It may be noted here that imaging subsystems 121 can be coupled to the illumination output end of wavelength filtering subsystem 102
And imaging subsystems 121 collaboratively operate with object lens 106.In this sense, imaging subsystems 121 are available comes from wavelength filtering
The illumination of subsystem 102 exports (for example, UV, DUV, EUV or VUV light with selected wavelength) to examine or otherwise divide
Analyse one or more samples 107.
In another embodiment, imaging subsystems 122 include object lens 106 and detector 109.In one embodiment, thing
Mirror 106 can illuminate one or more partial dispersions or anti-from one or more samples 107 (or the particle being arranged on sample 107)
Assemble the illumination after penetrating.Object lens can additionally via aggregation paths 123 by the illumination focus of aggregation to detector 109 with shape
Into the image of one or more parts on the surface of one or more samples 107.It may be noted here that object lens 106 can include art
In the known any object lens for being suitable for carrying out examining (for example, dark field is examined or the bright visual field is examined) or optical metrology.Separately
Outside, it may be noted here that detector 109 can include and known in art be suitable for measurement and connect from one or more samples 107
Any fluorescence detector of the illumination of receipts.For example, detector 109 can including (but not limited to) CCD-detector, TDI detectors or
Fellow.
Generally with reference to Fig. 3, in one embodiment, system 100 is configured to short wavelength's illuminated guidance to sample 107
On.Light source 101 includes continuous laser plasma source, and the continuous laser plasma source is produced to have and arrived in 190nm
The illumination of first group of wavelength in 450nm scope.The linear aggregation of mirror 103 of off-axis Throwing things and collimated illumination light beam 104.Light beam
104 after through being further directed to dispersion element 111 (for example, prism), spatial dispersion is incorporated into light by the dispersion element 111
In beam 104.Light beam is then incident on concentrating element 113 (for example, cylindrical lens) and focused on spatial filter element 112,
The spatial filter element 112 is configured to comprising the aperture with one or more openings, its spatial filter element 112
It is located to transmit second group of wavelength.From the light beam 104 that spatial filter element 112 guides by concentrating element 114 (for example, circle
Cylindrical mirror) to assemble and collimate and through being further directed to dispersion element 115 (for example, prism), the dispersion element 115 is from light beam
Spatial dispersion is removed in 104.Light beam 104 is then by the second off-axis Throwing things linear mirror aggregation and channeled to sample 107.
It may be noted here that any element in element in system 100 may be configured to include one or more coatings, it is described
Coating is including (but not limited to) anti-reflective coating or spectrum selective paint.By way of non-limiting example, spectrum selects
Selecting property coating can be placed in dispersion element 111 and/or 115, concentrating element 113 and/or 114 and/or spatial filter element 112
Surface on, so as to the spectral content of further confine optical beam 104 and/or 105.In another embodiment, anti-reflective coating
It can be seated on the non-optical elements of system 100, the non-optical elements, which include, is used for reduction through the veiling glare of system 100
Purpose seals chamber.
It may be noted here that described group of optics of system 100 illustrated as described above and in Figure 1A to 1D
It is restricted through providing and being not necessarily to be construed as merely for illustrative purpose.If anticipate to utilize within the scope of the invention
Dry equivalent or extra optical configuration.By way of non-limiting example, one or more optical filters can be along illumination path
Or aggregation paths positioning enters wavelength filtering subsystem so as to the filtering illumination before light enters wavelength filtering subsystem 102 or in light
The post filtering illumination of system 102.One or more optical filters can be further located at illumination subsystems 122 or aggregation paths 123
In.
Fig. 4 illustrates the flow chart for describing method according to an embodiment of the invention, and methods described is used for with warp
The light source imaging sample of filtering spectrum content.In step 402, comprising first group of wavelength (for example, having one group of wavelength or tool
Have the illumination of the infrared ray in electromagnetic spectrum, visible ray, wave-length coverage in UV, DUV, EUV and/or VUV part) illumination light
Beam 104.In step 404, spatial dispersion is incorporated into light beam 104 using dispersion element 111.In a step 406, there is sky
Between the light beam 104 of dispersion channeled arrive spatial filter element 112 so that the light beam bag guided from spatial filter element 112
Containing second group of wavelength, wherein second group of wavelength is the subgroup of first group of wavelength.In a step 408, assemble from spatial filter member
At least a portion for the light beam 104 that part 112 guides.In step 410, spatial dispersion is removed from light beam 104.In an implementation
In example, the 115 removable spatial dispersion of the second dispersion element.In another embodiment, spatial filter element 112 be configured and with
The selected wavelength of mirror configuration reflection so that spatial dispersion can be removed by the identical dispersion element 111 for initially producing dispersion.In step
In 412, via the illumination path 121 coupled with object lens 106 with least a portion illumination one of second group of selected wavelength or
Multiple samples.In step 414, the illumination from one or more samples 107 is assembled.For example, scattered from one or more samples 107
Or the light of reflection can combining as on detector 109 via object lens 106 and aggregation paths 123.
Target described in text illustrates to be contained in the different components in other components or from the connection of other components often.Ying Li
Solution, the framework so described is only exemplary, and actually can also implement to realize many other frameworks of same functionality.From
Conceptually, realizing that any arrangement of the component of same functionality " effectively associate " causes realization to want feature.Cause
This, it is combined in the text to realize that any two component of particular functionality can be considered as being " associated with " each other so that realizing wanting work(
Energy property, and independent of framework or intermediate module.In the same manner, any two component so associated can also be considered as being " connected " to each other
Or " coupling " wants feature to realize, and any two component that can so associate can also be considered as " can coupling " each other with
Feature is wanted in realization.The particular instance that can be coupled is including (but not limited to) can physically interact and/or physically
The component of interaction and/or the component that wirelessly can be interacted and/or wirelessly interact and/or logically can phase
Interaction and/or the component logically to interact.
It is believed that of the invention and its many added benefits will be understood by being previously described, and it will be apparent that and not depart from
Disclosed target can make various change in the case of not sacrificing its all material advantage to the form of component, construction and arrangement
Become.Described form is only exemplary, and following claims wish to cover and comprising such change.In addition, it should manage
The solution present invention is defined by the following claims.
Claims (37)
1. a kind of ultraviolet lighting source with wavelength selection control, it includes：
Light source, it is configured to produce the illuminating bundle for including first group of wavelength,
First group of one or more optical element, it is located to wherein described first group of one or more optical element include by space color
Dissipate one or more first dispersion elements being incorporated into the light beam；
Spatial filter element, wherein the spatial filter element is positioned in the plane being conjugated with the light source, wherein
The spatial filter element is configured to transmit at least a portion of the light beam, wherein drawing from the spatial filter element
The light beam led includes second group of wavelength, wherein second group of wavelength is the subgroup of first group of wavelength；And
Second group of one or more optical element, wherein described second group of one or more optical element are located to assemble the light beam
At least a portion, wherein described second group of one or more optical element include be located to from the light beam remove space color
The dispersion element of one or more scattered second.
2. system according to claim 1, wherein the spatial filter element includes the light with one or more openings
Circle, and it is positioned such that second group of wavelength through one or more described openings.
3. system according to claim 1, wherein the spatial filter element includes spatial light modulator.
4. system according to claim 3, wherein the spatial light modulator includes deformable mirror.
5. system according to claim 1, wherein the light source includes continuous laser plasma source.
6. system according to claim 1, wherein the light source includes discharge source.
7. system according to claim 1, wherein in first group of optical element or second group of optical element
It is at least one to include cylindrical lens.
8. system according to claim 1, wherein one or more described first dispersion elements or it is described one or more second
At least one in dispersion element includes one or more prisms.
9. system according to claim 8, wherein one or more described prisms include one or more prism arrays.
10. system according to claim 1, wherein one or more described first dispersion elements or it is described one or more second
At least one in dispersion element includes one or more diffraction grating.
11. system according to claim 10, wherein one or more described diffraction grating include plane diffraction grating or song
It is at least one in the diffraction grating of face.
12. a kind of system for illuminating sample with the light source through spectral filtering, it includes：
Light source, it is configured to produce the illuminating bundle for including first group of wavelength；
Wavelength filtering subsystem, it includes：
First group of one or more optical element, it is located to wherein described first group of one or more optical element include by space color
Dissipate one or more first dispersion elements being incorporated into the light beam；
Spatial filter element, wherein the spatial filter element is positioned in the plane being conjugated with the light source, wherein
The spatial filter element is configured to transmit at least a portion of the light beam, wherein drawing from the spatial filter element
The light beam led includes second group of wavelength, wherein second group of wavelength is the subgroup of first group of wavelength；And
Second group of one or more optical element, wherein described second group of one or more optical element are located to assemble the light beam
At least a portion, wherein described second group of one or more optical element include be located to from the light beam remove spatial dispersion
One or more second dispersion elements；
Sample microscope carrier, it is used to fix one or more samples；
Illumination subsystems, it is configured to via illumination path, described to illuminate with least a portion of second group of wavelength
At least a portion of one or more samples；
Detector；And
Object lens, it is configured to focus on the illumination from the surface of one or more samples, and via aggregation paths by institute
The illumination focus of aggregation is stated to the detector, to form the surface of one or more samples on the detector
At least one of image.
13. system according to claim 12, wherein the spatial filter element is included with one or more openings
Aperture, wherein the spatial filter element is positioned such that second group of wavelength through one or more described openings.
14. system according to claim 12, wherein the spatial filter element includes spatial light modulator.
15. system according to claim 14, wherein the spatial light modulator includes deformable mirror.
16. system according to claim 12, wherein the light source includes continuous laser plasma.
17. system according to claim 12, wherein the light source includes discharge source.
18. system according to claim 12, wherein in first group of optical element or second group of optical element
At least one include cylindrical lens.
19. system according to claim 12, wherein one or more described first dispersion elements or it is described one or more
At least one in two dispersion elements includes one or more prisms.
20. system according to claim 19, wherein one or more described prisms include one or more prism arrays.
21. system according to claim 12, wherein one or more described first dispersion elements or one or more described second colors
Dissipate in element and at least one include one or more diffraction grating.
22. system according to claim 21, wherein one or more described diffraction grating include plane diffraction grating or song
It is at least one in the diffraction grating of face.
23. system according to claim 12, wherein the detector is included in CCD-detector or TDI detectors extremely
It is few one.
24. a kind of system for illuminating sample with light source, it includes：
Light source, it is configured to produce the illuminating bundle for including first group of wavelength；
Wavelength filtering subsystem, it includes：
One or more optical elements, wherein one or more described optical elements include be located to spatial dispersion being incorporated into it is described
One or more dispersion elements in light beam；And
Spatial filter element, wherein the spatial filter element is positioned in the plane being conjugated with the light source, wherein
The spatial filter element transmits at least a portion of the light beam with being located to reflectivity, wherein from the space filtering
The light beam of device element guiding includes second group of wavelength, wherein second group of wavelength is the subgroup of first group of wavelength,
Wherein from the spatial filter element guiding the light beam back propagate across in mirror paths described in one or more light
Learn element so that remove spatial dispersion from the light beam；
Sample microscope carrier, it is used to fix one or more samples；
Illumination subsystems, it is configured to via illumination path, with least a portion of the described second selected wavelength to illuminate
State at least a portion of one or more samples；
Detector；And
Object lens, it is configured to focus on the illumination from the surface of one or more samples, and via aggregation paths by institute
The illumination focus of aggregation is stated to the detector, to form the surface of one or more samples on the detector
At least one of image.
25. system according to claim 24, wherein the spatial filter element is included with one or more openings
Aperture, wherein the spatial filter element is positioned such that second group of wavelength through one or more described openings.
26. system according to claim 24, wherein the spatial filter element includes spatial light modulator.
27. system according to claim 26, wherein the spatial light modulator includes deformable mirror.
28. system according to claim 24, wherein the light source includes continuing light plasma.
29. system according to claim 24, wherein the light source includes discharge source.
30. system according to claim 24, wherein in first group of optical element or second group of optical element
At least one include cylindrical lens.
31. system according to claim 24, wherein one or more described first dispersion elements or it is described one or more
At least one in two dispersion elements includes one or more prisms.
32. system according to claim 31, wherein one or more described prisms include one or more prism arrays.
33. system according to claim 24, wherein one or more described first dispersion elements or it is described one or more
At least one in two dispersion elements includes one or more diffraction grating.
34. system according to claim 33, wherein one or more described diffraction grating include plane diffraction grating or song
It is at least one in the diffraction grating of face.
35. system according to claim 24, wherein the detector is included in CCD-detector and TDI detectors extremely
It is few one.
36. a kind of method for being used to prepare ultraviolet lighting for imaging samples, it includes：
Produce the illuminating bundle for including first group of wavelength；
Spatial dispersion is incorporated into the light beam；
The light beam is directed on spatial filter element so that from the light beam bag of spatial filter element guiding
Containing second group of wavelength, wherein second group of wavelength is the subgroup of first group of wavelength；
Assemble at least a portion from spatial filter element guiding of the light beam；And
Spatial dispersion is removed from the light beam.
37. according to the method for claim 36, it further comprises：
At least a portion of one or more samples is illuminated with least a portion comprising second group of wavelength of the light beam；
And
Via aggregation paths, assemble the illumination from one or more samples, to form one or more described samples at least
The image of a part.
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| PCT/US2016/032743 WO2016187139A1 (en) | 2015-05-20 | 2016-05-16 | System and method for imaging a sample with an illumination source modified by a spatial selective wavelength filter |
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Also Published As
| Publication number | Publication date |
|---|---|
| TW201706589A (en) | 2017-02-16 |
| CN115060650A (en) | 2022-09-16 |
| JP7344952B2 (en) | 2023-09-14 |
| WO2016187139A1 (en) | 2016-11-24 |
| JP2022029462A (en) | 2022-02-17 |
| KR20180000734A (en) | 2018-01-03 |
| KR102381155B1 (en) | 2022-03-30 |
| JP2018514788A (en) | 2018-06-07 |
| TWI702387B (en) | 2020-08-21 |
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