CN107610813A - A kind of double-sided conductive film and preparation method thereof - Google Patents
A kind of double-sided conductive film and preparation method thereof Download PDFInfo
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- CN107610813A CN107610813A CN201710685064.3A CN201710685064A CN107610813A CN 107610813 A CN107610813 A CN 107610813A CN 201710685064 A CN201710685064 A CN 201710685064A CN 107610813 A CN107610813 A CN 107610813A
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Abstract
The invention discloses a kind of double-sided conductive film and preparation method thereof, the double-sided conductive film includes basement membrane, and the two sides of basement membrane is respectively arranged with uvioresistant glue-line and one side of the uvioresistant glue-line away from basement membrane is provided with nano-silver thread layer.The present invention double-sided conductive film due to being provided with uvioresistant glue-line on the two sides of basement membrane, to nano-silver thread layer progress double-sided laser etching when, laser will not the break-through-etch back side nano-silver thread layer, solve the problems, such as that double-sided laser etches into the back side；The rare metals such as indium oxide are replaced using nano-silver thread layer simultaneously, simplify the preparation method of conducting film, with technique is simple, speed is fast, cost is low, power consumption is low, free of contamination advantage.
Description
Technical field
The invention belongs to touch screen technology field, and in particular to a kind of double-sided conductive film and preparation method thereof.
Background technology
As impedance membrane type touch panel or the electrode base board of capacitive touch panel, typically by macromolecule
The metal oxide such as sputtered indium-tin-oxide (ITO) obtains on film base material.Film forming based on such a method needs hot conditions, makes
The use that the resin basement membrane of heat resistance must be lacked is very limited.Moreover, film forming needs high vacuum atmosphere, therefore, with base
The change of film is greatly, it is necessary to which huge film formation device, causes the increase of film forming cost.Also, because indium (In) etc. is rare element, because
And be difficult to obtain, also make it that cost is higher.
The construction of the current capacitive touch screen of in the market mainly plates the thin-film conductor layers of layer of transparent in glass screen
ITO, then in the very thin hard protective glass (one piece of four layers of compound glass screen) of the additional lastblock of conductor layer, this layer of glass shows
It is so nonconducting, by using high frequency ac signal, the coupling formed by the finger (across thin glass) of people with working face
Electric capacity siphons away an alternating current, and capacitance type touch control screen can simply regard the screen body being made up of four layers of combined screen as：Most
Outer layer is glassivation, and followed by conductive layer, third layer is nonconducting glass screen, the most interior the 4th layer and conductive layer.
According to the market demand, following capacitive touch screen tends to be thinned softness.
In the prior art, projected capacitive touch screen is to etch different ITO on two layers of ITO electro-conductive glass coating to lead
Electrical line modules.The figure etched in two modules is mutually perpendicular to, and they can be regarded as X and Y-direction consecutive variations cunning
Bar.Because X, Y framework are in different surfaces, one capacitive node of its intersection formation.One draw runner can treat as drives line, and in addition one
It is detection lines that individual draw runner, which is treated as,.When electric current passes through a wire in drives line, if the extraneous signal for having capacitance variations, that
The change of capacitive node on another layer conductor will be caused.The change of detecting capacitance can be returned by the electronics being attached thereto
Drive test measures, then switchs to digital signal via A/D controllers and do calculation process acquirement (X, Y) shaft position by computer, and then
With reaching the mesh of positioning.
Two conductive layers are coated on a film by technical requirements at present, embody thin and soft performance.But by two layers
Conductive layer, which is coated on a film, occurs a problem, and laser can penetrate film to another in double-sided laser etching process is carried out
Another side conductive layer is wounded in face, destroys backside conductive layer structure.
The content of the invention
It is an object of the present invention to provide a kind of double-sided conductive film, is led with solving touch-screen in the prior art with two-sided
The problem of another side that electrolemma can penetrate film in double-sided laser etching process wounds another side conductive layer.
To achieve these goals, the invention provides a kind of double-sided conductive film, including basement membrane, the two sides of basement membrane to set respectively
It is equipped with uvioresistant glue-line and one side of the uvioresistant glue-line away from basement membrane is provided with nano-silver thread layer.
Further, basement membrane is polyethylene terephthalate, polypropylene, makrolon, acrylonitrile-butadiene-benzene
One kind in ethylene copolymer, polymethyl methacrylate, cyclic olefin polymer, Triafol T.
Further, ultraviolet-resistant agent is contained in uvioresistant glue-line, the weight content of ultraviolet-resistant agent is 7-8%.
Further, ultraviolet-resistant agent is EVERSORB51, EVERSORB109, EVERSORB477, ZnO, TiO2、
BaSO4、Fe2O3、Al2O3In any one or more.
In addition, to achieve the above object, the invention provides a kind of preparation method of double-sided conductive film, including following step
Suddenly：
1) uvioresistant glue is respectively coated on basement membrane two sides, baking and curing forms uvioresistant glue-line,
2) nano-silver thread coating fluid is coated with surface of the uvioresistant glue-line away from basement membrane, baking and curing forms nano-silver thread
Layer,
3) laser-induced thermal etching formation conducting wire is carried out to the nano-silver thread layer of double-sided conductive film.
Further, ultraviolet-resistant agent is contained in uvioresistant glue, the weight content of ultraviolet-resistant agent is 7-8%.
Further, ultraviolet-resistant agent is EVERSORB51, EVERSORB109, EVERSORB477, ZnO, TiO2、
BaSO4、Fe2O3、Al2O3In any one or more.
Further, be coated with uvioresistant glue mode for intaglio plate coating, roller coat, spin coating, silk-screen printing coating, scrape cutter painting
Cloth or airblade coating.
Further, drying is divided into four-stage, and the drying temperature of first stage is less than the drying temperature of second stage, the
The drying temperature of two-stage is less than the drying temperature of phase III, and the drying temperature of fourth stage is less than the drying temperature of second stage
Degree.
Further, the drying temperature of first stage is 75-85 DEG C, and the drying temperature of second stage is 86-95 DEG C, the 3rd
The drying temperature in stage is 100-110 DEG C, and the drying temperature of fourth stage is 75-85 DEG C.
Compared with prior art, the present invention has the advantages that：
The double-sided conductive film structure of the present invention, due to being provided with uvioresistant glue-line on the two sides of basement membrane, to nano-silver thread
Layer carry out double-sided laser etching when, laser will not the break-through-etch back side nano-silver thread layer, solve double-sided laser and etch into the back of the body
The problem of face；The rare metals such as indium oxide are replaced using nano-silver thread layer simultaneously, the preparation method of conducting film is simplified, there is work
Skill is simple, speed is fast, cost is low, power consumption is low, free of contamination advantage.
Brief description of the drawings
The Figure of description for forming the present invention is used for providing a further understanding of the present invention, schematic implementation of the invention
Example and its illustrate be used for explain the present invention, do not form inappropriate limitation of the present invention.In the accompanying drawings：
Fig. 1 shows the structural representation of double-sided conductive film of the present invention；
Wherein, 1 is basement membrane, and 2 be uvioresistant glue-line, and 3 be nano-silver thread layer.
Embodiment
In order that those skilled in the art more fully understand the present invention program, below in conjunction with the embodiment of the present invention
Accompanying drawing, the technical scheme in the embodiment of the present invention is clearly and completely described, it is clear that described embodiment is only
The embodiment of a part of the invention, rather than whole embodiments.Based on the embodiment in the present invention, ordinary skill people
The every other embodiment that member is obtained under the premise of creative work is not made, it should all belong to the model that the present invention protects
Enclose.
It should be noted that term " first " in description and claims of this specification and above-mentioned accompanying drawing, "
Two ", " on ", " under " etc. is for distinguishing similar object, without for describing specific order or precedence.It should manage
The data that solution so uses can exchange in the appropriate case, so as to embodiments of the invention described herein.In addition, term
" comprising " and " having " and their any deformation, it is intended that cover it is non-exclusive include, for example, containing a series of steps
Rapid or unit process, method, system, product or equipment are not necessarily limited to those steps clearly listed or unit, but can
Including not listing clearly or for the intrinsic other steps of these processes, method, product or equipment or unit.
From background technology, laser can penetrate film when existing touch-screen double-sided conductive film has double-sided laser etching
Another side the problem of wounding another side conductive layer.The present inventor is studied regarding to the issue above, it is proposed that one
Kind double-sided conductive film, including basement membrane, the two sides of basement membrane are respectively arranged with uvioresistant glue-line and in uvioresistant glue-line away from basement membrane
One side be provided with nano-silver thread layer.By that in the two-sided setting uvioresistant glue-line of basement membrane, can prevent laser penetration basement membrane from influenceing
To the nano-silver thread layer at the back side.
Above-mentioned basement membrane can be common plastic sheeting in the art, such as：Polyethylene terephthalate
(PET), polypropylene, makrolon, acrylonitrile-butadiene-styrene, polymethyl methacrylate, cycloolefin gather
Compound (COP) or Triafol T (TAC).
Contain ultraviolet-resistant agent in the uvioresistant glue-line of the present invention, the ultraviolet light that wave band is 300~400nm can be obstructed,
During so as to avoid double-sided conductive film laser-induced thermal etching, laser penetration basement membrane destroys the nano-silver thread layer of another side.Above-mentioned uvioresistant
The weight content of ultraviolet-resistant agent is 7-8% in glue-line, and laser can be preferably obstructed using the ultraviolet-resistant agent of above-mentioned content.
In the preferred embodiment of the present invention, above-mentioned ultraviolet-resistant agent be EVERSORB51, EVERSORB109,
EVERSORB477、ZnO、TiO2、BaSO4、Fe2O3、Al2O3In any one or more.
The uvioresistant glue-line of the present invention also includes resin, can use common heat reactive resin or photocuring in the art
Resin, filming function is mainly played, be formed by curing uvioresistant glue-line.
In addition, present invention also offers a kind of preparation method of double-sided conductive film, comprise the following steps：
1) coating method is used, uvioresistant glue is respectively coated on basement membrane two sides, baking and curing forms uvioresistant glue-line,
2) nano-silver thread coating fluid is coated with surface of the uvioresistant glue-line away from basement membrane, baking and curing forms nano-silver thread
Layer,
3) laser-induced thermal etching formation conducting wire is carried out to the nano-silver thread layer of double-sided conductive film, carried out again after a facet etch is complete
Second facet etch.
Contain ultraviolet-resistant agent in above-mentioned uvioresistant glue, the ultraviolet light that wave band is 300~400nm can be obstructed, from
And when avoiding double-sided conductive film laser-induced thermal etching, laser penetration basement membrane destroys the nano-silver thread layer of another side.Above-mentioned uvioresistant glue
The weight content 7-8% of ultraviolet-resistant agent in water, laser can preferably be obstructed using the ultraviolet-resistant agent of above-mentioned content.
In the present invention, intaglio plate coating, roller coat, spin coating, silk-screen printing coating, scraper for coating or airblade coating etc. can be used
Mode is coated with uvioresistant glue, and coating nano-silver thread layer on basement membrane.Drying course is divided into four-stage, the first stage
Drying temperature is less than the drying temperature of second stage, and the drying temperature of second stage is less than the drying temperature of phase III, and the 4th
The drying temperature in stage is less than the drying temperature of second stage.The drying temperature of first stage is 75-85 DEG C, the baking of second stage
Dry temperature is 86-95 DEG C, and the drying temperature of phase III is 100-110 DEG C, and the drying temperature of fourth stage is 75-85 DEG C.Adopt
With the drying temperature of above-mentioned graded, it is possible to increase drying efficiency.
Below with reference to embodiment and comparative example, beneficial effects of the present invention are further illustrated.Obviously, described implementation
Example only part of the embodiment of the present invention, rather than whole embodiments.It is common based on the embodiment in the present invention, this area
The every other embodiment that technical staff is obtained under the premise of creative work is not made, belong to the model that the present invention protects
Enclose.
Embodiment 1
Double-sided conductive film as shown in Figure 1：Basement membrane is PET, using scraper for coating mode, is respectively coated on PET two sides
Uvioresistant glue, baking and curing form uvioresistant glue-line, wherein, the ultraviolet resistance that weight content is 3% is contained in uvioresistant glue-line
Every agent EVERSORB51 (photochemistry manufactures forever in Taiwan)；Then, applied in surface coating nano-silver thread of the uvioresistant glue-line away from PET
Cloth liquid, baking and curing form nano-silver thread layer, and the drying temperature of wherein four-stage is respectively 75 DEG C, 86 DEG C, 100 DEG C, 75 DEG C.
Laser-induced thermal etching is carried out to the double-sided conductive film nano-silver thread layer of above-mentioned preparation and forms conducting wire, carries out the after a facet etch is complete again
Two facet etches.
Embodiment 2
Uvioresistant glue is respectively coated on basement membrane COP two sides using plate gravure coating method, baking and curing forms uvioresistant
Glue-line, wherein, ultraviolet-resistant agent EVERSORB109 (the Taiwan photochemical lengths of schooling forever that weight content is 7% are contained in uvioresistant glue-line
Make)；Then, nano-silver thread coating fluid being coated with surface of the uvioresistant glue-line away from COP, baking and curing forms nano-silver thread layer,
The drying temperature of wherein four-stage is respectively 85 DEG C, 95 DEG C, 110 DEG C, 85 DEG C.To the double-sided conductive film Nano Silver of above-mentioned preparation
Line layer carries out laser-induced thermal etching and forms conducting wire, carries out the second facet etch after a facet etch is complete again.
Embodiment 3
Uvioresistant glue is respectively coated on basement membrane PET two sides using plate gravure coating method, baking and curing forms uvioresistant
Glue-line, wherein, ultraviolet-resistant agent EVERSORB477 (the Taiwan photochemical lengths of schooling forever that weight content is 8% are contained in uvioresistant glue-line
Make)；Then, nano-silver thread coating fluid being coated with surface of the uvioresistant glue-line away from PET, baking and curing forms nano-silver thread layer,
The drying temperature of wherein four-stage is respectively 80 DEG C, 90 DEG C, 105 DEG C, 80 DEG C.To the double-sided conductive film Nano Silver of above-mentioned preparation
Line layer carries out laser-induced thermal etching and forms conducting wire, carries out the second facet etch after a facet etch is complete again.
Comparative example 1
It is with the difference of embodiment 1：Nano-silver thread layer, uncoated uvioresistant glue-line are respectively coated on the two sides of basement membrane.
Comparative example 2：
It is with the difference of embodiment 1：Sputter ITO conductive layer, uncoated uvioresistant glue-line respectively on the two sides of basement membrane.
The transmitance of double-sided conductive film (T) and mist degree (H) are measured using mist shadow instrument (NDH2000, the electric color of Japan) is transmitted.
The laser penetration rate of double-sided conductive film is determined using spectrophotometer (Shimadzu) U-3100 instruments.Visually observation double-sided conductive film
Whether the back side is damaged during laser-induced thermal etching.
Test result is as shown in the table：
| Embodiment 1 | Embodiment 2 | Embodiment 3 | Comparative example 1 | Comparative example 2 | |
| T/% | 91.1 | 91.1 | 91.1 | 91.5 | 91.6 |
| H/% | 0.3 | 0.3 | 0.3 | 0.2 | 0.2 |
| Laser transmittance (300~400nm)/% | 8 | 5 | 3 | 93 | 90 |
| Two-sided etching condition in damaged | It is undamaged | It is undamaged | It is undamaged | It is impaired serious | It is impaired serious |
From above example and comparative example, double-sided conductive film of the invention is anti-due to being provided with the two sides of basement membrane
Ultraviolet glue-line, to nano-silver thread layer carry out double-sided laser etching when, laser will not the break-through-etch back side nano-silver thread layer, solution
The problem of double-sided laser of having determined etches into the back side；The rare metals such as indium oxide are replaced using nano-silver thread layer simultaneously, simplifies and leads
The preparation method of electrolemma, with technique is simple, speed is fast, cost is low, power consumption is low, free of contamination advantage.
It should be noted that embodiment is only the explanation to technical solution of the present invention, should not be managed
Solve as the restriction to technical solution of the present invention, any only to make what is locally changed using the substantive content of the invention of the present invention, Reng Yingluo
Enter in protection scope of the present invention.
Claims (10)
1. a kind of double-sided conductive film, including basement membrane (1), it is characterised in that：The two sides of the basement membrane (1) is respectively arranged with uvioresistant
Glue-line (2) and the one side of basement membrane is provided with nano-silver thread layer (3) in the uvioresistant glue-line (2).
2. double-sided conductive film according to claim 1, it is characterised in that：The basement membrane (1) is poly terephthalic acid second two
Alcohol ester, polypropylene, makrolon, acrylonitrile-butadiene-styrene, polymethyl methacrylate, cyclic olefin polymerization
One kind in thing, Triafol T.
3. double-sided conductive film according to claim 1, it is characterised in that：Contain ultraviolet resistance in the uvioresistant glue-line (2)
Every agent, the weight content of ultraviolet-resistant agent described in the uvioresistant glue-line is 7-8%.
4. double-sided conductive film according to claim 3, it is characterised in that：The ultraviolet-resistant agent be EVERSORB51,
EVERSORB109、EVERSORB477、ZnO、TiO2、BaSO4、Fe2O3、Al2O3In any one or more.
A kind of 5. preparation method of double-sided conductive film, it is characterised in that：Comprise the following steps：
1) uvioresistant glue is respectively coated on the two sides of basement membrane, baking and curing forms uvioresistant glue-line,
2) nano-silver thread coating fluid being coated with surface of the uvioresistant glue-line away from basement membrane, baking and curing forms nano-silver thread layer,
3) laser-induced thermal etching formation conducting wire is carried out to the nano-silver thread layer of double-sided conductive film.
6. the preparation method of double-sided conductive film according to claim 5, it is characterised in that：Contain in the uvioresistant glue
Ultraviolet-resistant agent, the weight content of ultraviolet-resistant agent described in the uvioresistant glue are 7-8%.
7. the preparation method of double-sided conductive film according to claim 6, it is characterised in that：The ultraviolet-resistant agent is
EVERSORB51、EVERSORB109、EVERSORB477、ZnO、TiO2、BaSO4、Fe2O3、Al2O3In any one or it is more
Kind.
8. the preparation method of double-sided conductive film according to claim 5, it is characterised in that：The coating uvioresistant glue
Mode is intaglio plate coating, roller coat, spin coating, silk-screen printing coating, scraper for coating or airblade coating.
9. the preparation method of double-sided conductive film according to claim 5, it is characterised in that：The drying is divided into four ranks
Section, the drying temperature of first stage are less than the drying temperature of second stage, and the drying temperature of second stage is less than the phase III
Drying temperature, the drying temperature of fourth stage are less than the drying temperature of second stage.
10. the preparation method of double-sided conductive film according to claim 9, it is characterised in that：The drying of the first stage
Temperature is 75-85 DEG C, and the drying temperature of the second stage is 86-95 DEG C, and the drying temperature of the phase III is 100-110
DEG C, the drying temperature of the fourth stage is 75-85 DEG C.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201710685064.3A CN107610813A (en) | 2017-08-11 | 2017-08-11 | A kind of double-sided conductive film and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710685064.3A CN107610813A (en) | 2017-08-11 | 2017-08-11 | A kind of double-sided conductive film and preparation method thereof |
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| CN107610813A true CN107610813A (en) | 2018-01-19 |
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ID=61064932
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| CN201710685064.3A Pending CN107610813A (en) | 2017-08-11 | 2017-08-11 | A kind of double-sided conductive film and preparation method thereof |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109119184A (en) * | 2018-08-09 | 2019-01-01 | 盐城美茵新材料有限公司 | A kind of double spread formula conductive film and preparation method thereof |
| CN111208921A (en) * | 2020-01-02 | 2020-05-29 | 深圳市华科创智技术有限公司 | Ultrathin double-sided nano-silver capacitive screen and preparation method thereof |
| CN113119618A (en) * | 2021-04-21 | 2021-07-16 | 张亚琴 | PVC color film ultraviolet-proof process, PVC color film and outdoor panel |
| CN115340757A (en) * | 2022-08-30 | 2022-11-15 | 乐凯华光印刷科技有限公司 | High-transmittance ultraviolet light blocking base film, double-sided nano silver wire conductive film comprising base film and preparation method of double-sided nano silver wire conductive film |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103135159A (en) * | 2011-11-22 | 2013-06-05 | 惠和株式会社 | Optical sheet, transparent conductive laminate and touch panel |
| CN203465962U (en) * | 2013-07-31 | 2014-03-05 | 南昌欧菲光科技有限公司 | Transparent conductive film |
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2017
- 2017-08-11 CN CN201710685064.3A patent/CN107610813A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103135159A (en) * | 2011-11-22 | 2013-06-05 | 惠和株式会社 | Optical sheet, transparent conductive laminate and touch panel |
| CN203465962U (en) * | 2013-07-31 | 2014-03-05 | 南昌欧菲光科技有限公司 | Transparent conductive film |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109119184A (en) * | 2018-08-09 | 2019-01-01 | 盐城美茵新材料有限公司 | A kind of double spread formula conductive film and preparation method thereof |
| CN111208921A (en) * | 2020-01-02 | 2020-05-29 | 深圳市华科创智技术有限公司 | Ultrathin double-sided nano-silver capacitive screen and preparation method thereof |
| CN113119618A (en) * | 2021-04-21 | 2021-07-16 | 张亚琴 | PVC color film ultraviolet-proof process, PVC color film and outdoor panel |
| CN115340757A (en) * | 2022-08-30 | 2022-11-15 | 乐凯华光印刷科技有限公司 | High-transmittance ultraviolet light blocking base film, double-sided nano silver wire conductive film comprising base film and preparation method of double-sided nano silver wire conductive film |
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Application publication date: 20180119 |