CN107603489A - A kind of polishing fluid for AMOLED panel glass substrates - Google Patents
A kind of polishing fluid for AMOLED panel glass substrates Download PDFInfo
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- CN107603489A CN107603489A CN201710827794.2A CN201710827794A CN107603489A CN 107603489 A CN107603489 A CN 107603489A CN 201710827794 A CN201710827794 A CN 201710827794A CN 107603489 A CN107603489 A CN 107603489A
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- polishing fluid
- glass substrates
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- amoled panel
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Abstract
The invention discloses a kind of polishing fluid for AMOLED panel glass substrates, it is made up of the raw material of following parts by weight：60 65 parts of phosphoric acid, 18 20 parts of amine base, 5 11 parts of hexamethylenetetramine, 8 14 parts of abrasive grains, 7 10 parts of pH adjusting agent, 11 14 parts of surfactant, 7 10 parts of chelating agent, 9 15 parts of additive, 35 parts of defoamer, 52 60 parts of deionized water.Polishing fluid utilization rate of the present invention is high, reduces production cost, while reduce pollution of the polishing fluid waste liquid to environment；The material removing rate of polishing fluid polished glass substrate of the present invention is high, glass surface is without obvious cut after polishing, surface roughness before polishing than decreasing, simultaneous reactions device uses transparent nonmetallic materials, the harmful substances such as organic matter, metal ion, bulky grain can be avoided to enter in polishing fluid, so as to reduce the concentration of metal ion, the appearance of Ludox coacervation is avoided.
Description
Technical field
The present invention relates to AMOLED screen technical fields, and in particular to a kind of polishing fluid for AMOLED panel glass substrates.
Background technology
Flat panel Liquid Crystal Display Technique is 21 century to develop one of most swift and violent high-technology field.Glass substrate only accounts for
6% or so of AMOLED cost of raw material proportions, but most important element, it is very huge to the performance impact of display,
The key indexs such as resolution ratio, light transmittance, weight and the visual angle of display are all closely related with glass substrate.Put down using AMOLED
In the consumer IT product of face Display Technique, light, thin is two big essential core element of competitions.In order to reach frivolous demand, generally
Using reduction thickness of glass substrate, to reach the purpose for reducing thickness and weight simultaneously.
The reduction process of AMOLED glass substrates mainly has two kinds at present：One kind is chemical etching, and another kind is that physics is ground
Mill.Chemical etching need to use strong acid, and cost is higher, if being reclaimed without effective and reasonable processing, the harm to environment is very big,
And the more difficult control of thinning metacoxal plate surface quality, still need to follow-up polishing.Due to AMOLED glass baseplate surfaces quality and
Requirement on machining accuracy is high, and heat endurance is high, and chemical resistance is good, and surface and internal flaw are few, suitable thermal coefficient of expansion, gently
Matter high intensity etc., the Ultra-precision Turning to surface propose stern challenge, traditional hard crisp wafer body substrate Ultra-precision Turning
Technique can not meet the large-scale production requirement of AMOLED glass baseplate surfaces.
The content of the invention
The present invention is intended to provide a kind of polishing fluid for AMOLED panel glass substrates.
The present invention provides following technical scheme：
A kind of polishing fluid for AMOLED panel glass substrates, it is characterised in that it is by the raw material of following parts by weight
Composition：Phosphoric acid 60-65 parts, amine base 18-20 parts, hexamethylenetetramine 5-11 parts, abrasive grains 8-14 parts, pH adjusting agent 7-10
Part, surfactant 11-14 parts, chelating agent 7-10 parts, additive 9-15 parts, defoamer 3-5 parts, deionized water 52-60 parts.
The surfactant includes at least one of quaternary ammonium compound and amino acid type amphoteric ionic surface active agent.
The pH adjusting agent includes at least one of ammoniacal liquor, potassium hydroxide, hydroxylamine and TMAH.
The amine base is any of AEEA, triethanolamine, tetramethyl ammonium hydroxide.
The abrasive grains include silica, at least one of zinc oxide or zirconium oxide, and characteristic size is 50 nanometers
To 150 nanometers.
The additive includes at least one of persulfate, periodate, polycarboxylic acids organic multicomponent phosphoric acid.
Compared with prior art, the beneficial effects of the invention are as follows：Polishing fluid utilization rate of the present invention is high, reduces and is produced into
This, while reduce pollution of the polishing fluid waste liquid to environment；The material removing rate of polishing fluid polished glass substrate of the present invention is high, throws
Glass surface is without obvious cut after light, and than being decreased before polishing, simultaneous reactions device uses transparent nonmetallic surface roughness
Material, the harmful substances such as organic matter, metal ion, bulky grain can be avoided to enter in polishing fluid, so as to reduce metal ion
Concentration, avoid the appearance of Ludox coacervation.
Embodiment
Below in conjunction with the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described,
Obviously, described embodiment is only part of the embodiment of the present invention, rather than whole embodiments.Based in the present invention
Embodiment, the every other embodiment that those of ordinary skill in the art are obtained under the premise of creative work is not made, all
Belong to the scope of protection of the invention.
A kind of polishing fluid for AMOLED panel glass substrates of embodiment 1, it is characterised in that it is by following parts by weight
Raw material composition：60 parts of phosphoric acid, 18 parts of amine base, 5 parts of hexamethylenetetramine, 8 parts of abrasive grains, 7 parts of pH adjusting agent, surface-active
11 parts of agent, 7 parts of chelating agent, 9 parts of additive, 3 parts of defoamer, 52 parts of deionized water.
The surfactant includes at least one of quaternary ammonium compound and amino acid type amphoteric ionic surface active agent.
The pH adjusting agent includes at least one of ammoniacal liquor, potassium hydroxide, hydroxylamine and TMAH.
The amine base is any of AEEA, triethanolamine, tetramethyl ammonium hydroxide.
The abrasive grains include silica, at least one of zinc oxide or zirconium oxide, and characteristic size is 50 nanometers
To 150 nanometers.
The additive includes at least one of persulfate, periodate, polycarboxylic acids organic multicomponent phosphoric acid.
A kind of polishing fluid for AMOLED panel glass substrates of embodiment 2, it is characterised in that it is by following parts by weight
Raw material composition：65 parts of phosphoric acid, 20 parts of amine base, 11 parts of hexamethylenetetramine, 14 parts of abrasive grains, 10 parts of pH adjusting agent, surface
14 parts of activating agent, 10 parts of chelating agent, 15 parts of additive, 5 parts of defoamer, 60 parts of deionized water.
The surfactant includes at least one of quaternary ammonium compound and amino acid type amphoteric ionic surface active agent.
The pH adjusting agent includes at least one of ammoniacal liquor, potassium hydroxide, hydroxylamine and TMAH.
The amine base is any of AEEA, triethanolamine, tetramethyl ammonium hydroxide.
The abrasive grains include silica, at least one of zinc oxide or zirconium oxide, and characteristic size is 50 nanometers
To 150 nanometers.
The additive includes at least one of persulfate, periodate, polycarboxylic acids organic multicomponent phosphoric acid.
A kind of polishing fluid for AMOLED panel glass substrates of embodiment 3, it is characterised in that it is by following parts by weight
Raw material composition：63 parts of phosphoric acid, 19 parts of amine base, 8 parts of hexamethylenetetramine, 11 parts of abrasive grains, 8 parts of pH adjusting agent, surface are lived
12 parts of agent of property, 9 parts of chelating agent, 14 parts of additive, 4 parts of defoamer, 56 parts of deionized water.
The surfactant includes at least one of quaternary ammonium compound and amino acid type amphoteric ionic surface active agent.
The pH adjusting agent includes at least one of ammoniacal liquor, potassium hydroxide, hydroxylamine and TMAH.
The amine base is any of AEEA, triethanolamine, tetramethyl ammonium hydroxide.
The abrasive grains include silica, at least one of zinc oxide or zirconium oxide, and characteristic size is 50 nanometers
To 150 nanometers.
The additive includes at least one of persulfate, periodate, polycarboxylic acids organic multicomponent phosphoric acid.
It is obvious to a person skilled in the art that the invention is not restricted to the details of the one exemplary embodiment, Er Qie
In the case of without departing substantially from spirit or essential attributes of the invention, the present invention can be realized in other specific forms.Therefore, no matter
From the point of view of which point, embodiment all should be regarded as exemplary, and be nonrestrictive, the scope of the present invention is by appended power
Profit requires rather than the explanation limits, it is intended that all in the implication and scope of the equivalency of claim by falling
Change is included in the present invention.Moreover, it will be appreciated that although the present specification is described in terms of embodiments, not each
Embodiment only includes an independent technical scheme, and this narrating mode of specification is only this area for clarity
Technical staff should be using specification as an entirety, and the technical solutions in the various embodiments may also be suitably combined, forms this
The other embodiment that art personnel are appreciated that.
Claims (6)
1. a kind of polishing fluid for AMOLED panel glass substrates, it is characterised in that it is the raw material group by following parts by weight
Into：Phosphoric acid 60-65 parts, amine base 18-20 parts, hexamethylenetetramine 5-11 parts, abrasive grains 8-14 parts, pH adjusting agent 7-10 parts,
Surfactant 11-14 parts, chelating agent 7-10 parts, additive 9-15 parts, defoamer 3-5 parts, deionized water 52-60 parts.
A kind of 2. polishing fluid for AMOLED panel glass substrates according to claim 1, it is characterised in that：The surface
Activating agent includes at least one of quaternary ammonium compound and amino acid type amphoteric ionic surface active agent.
A kind of 3. polishing fluid for AMOLED panel glass substrates according to claim 1, it is characterised in that：The pH is adjusted
Saving agent includes at least one of ammoniacal liquor, potassium hydroxide, hydroxylamine and TMAH.
A kind of 4. polishing fluid for AMOLED panel glass substrates according to claim 1, it is characterised in that：The amine base
For any of AEEA, triethanolamine, tetramethyl ammonium hydroxide.
A kind of 5. polishing fluid for AMOLED panel glass substrates according to claim 1, it is characterised in that：The grinding
Particle includes silica, at least one of zinc oxide or zirconium oxide, and characteristic size is 50 nanometers to 150 nanometers.
A kind of 6. polishing fluid for AMOLED panel glass substrates according to claim 1, it is characterised in that：The addition
Agent includes at least one of persulfate, periodate, polycarboxylic acids organic multicomponent phosphoric acid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710827794.2A CN107603489A (en) | 2017-09-14 | 2017-09-14 | A kind of polishing fluid for AMOLED panel glass substrates |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710827794.2A CN107603489A (en) | 2017-09-14 | 2017-09-14 | A kind of polishing fluid for AMOLED panel glass substrates |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107603489A true CN107603489A (en) | 2018-01-19 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710827794.2A Pending CN107603489A (en) | 2017-09-14 | 2017-09-14 | A kind of polishing fluid for AMOLED panel glass substrates |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110158128A (en) * | 2019-05-21 | 2019-08-23 | 邵东县中南锻压工具制造有限公司 | A kind of handware electroplating pretreatment method |
| JP2021535938A (en) * | 2018-03-28 | 2021-12-23 | フジフイルム エレクトロニック マテリアルズ ユー．エス．エー．， インコーポレイテッド | Ruthenium Bulk Chemical Mechanical Polishing Composition |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101463230A (en) * | 2009-01-16 | 2009-06-24 | 清华大学 | Polishing composite for hard disk substrate |
| CN107011806A (en) * | 2017-04-27 | 2017-08-04 | 安徽智诚光学科技有限公司 | A kind of mobile phone liquid crystal touch control screen polishing agent and preparation method thereof |
-
2017
- 2017-09-14 CN CN201710827794.2A patent/CN107603489A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101463230A (en) * | 2009-01-16 | 2009-06-24 | 清华大学 | Polishing composite for hard disk substrate |
| CN107011806A (en) * | 2017-04-27 | 2017-08-04 | 安徽智诚光学科技有限公司 | A kind of mobile phone liquid crystal touch control screen polishing agent and preparation method thereof |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2021535938A (en) * | 2018-03-28 | 2021-12-23 | フジフイルム エレクトロニック マテリアルズ ユー．エス．エー．， インコーポレイテッド | Ruthenium Bulk Chemical Mechanical Polishing Composition |
| JP7351839B2 (en) | 2018-03-28 | 2023-09-27 | フジフイルム エレクトロニック マテリアルズ ユー．エス．エー．， インコーポレイテッド | Ruthenium bulk chemical mechanical polishing composition |
| US11999876B2 (en) | 2018-03-28 | 2024-06-04 | Fujifilm Electronic Materials U.S.A., Inc. | Bulk ruthenium chemical mechanical polishing composition |
| CN110158128A (en) * | 2019-05-21 | 2019-08-23 | 邵东县中南锻压工具制造有限公司 | A kind of handware electroplating pretreatment method |
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| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20180119 |
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| RJ01 | Rejection of invention patent application after publication |