CN107578900A - A kind of hollow inductor shield device - Google Patents
A kind of hollow inductor shield device Download PDFInfo
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- CN107578900A CN107578900A CN201710891336.5A CN201710891336A CN107578900A CN 107578900 A CN107578900 A CN 107578900A CN 201710891336 A CN201710891336 A CN 201710891336A CN 107578900 A CN107578900 A CN 107578900A
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- radome
- shield device
- hollow
- inductor shield
- hollow inductor
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Abstract
The present invention relates to a kind of hollow inductor shield device, including upper radome and lower radome, the installation portion for being connected with hollow inductance upper end, lower end is offered on the upper radome, lower radome respectively, cutting gap is offered on the upper radome, lower radome, the upper radome, the outward flange of lower radome are respectively arranged with equal splenium.
Description
Technical field
The present invention relates to gas-insulated metal-enclosed technical field, more particularly, to a kind of hollow inductor shield device.
Background technology
Gas-insulated metal-enclosed technology has been run on all over the world extensively since the 1960s is practical.Gas
Body insulation metal closed technology is not only widely used in high pressure, super-pressure field, and is also used in extra-high voltage field.With
Conventional open style transformer station compares, and is that compact-sized, floor space is small, reliability the advantages of gas-insulated metal-enclosed technology
Height, configure flexible, easy for installation, high safety, strong environmental adaptability, maintenance workload very little, the maintenance of its critical piece
Interval is not less than 20 years.
In view of the influence of electric field, in gas-insulated metal-enclosed device, due to the small volume of equipment, just to inside zero
The electric field of part requires very strict, and many parts need to install radome additional, and hollow inductance wants use in gas-insulated metal
Radome will be added in locking device.
The content of the invention
It is an object of the invention to design a kind of hollow inductor shield device, hollow inductor shield device not only can be uniform
Electric field around hollow inductance, the influence to hollow inductance inductance value can also be reduced, so as to allow hollow inductance in gas-insulated gold
Use in category enclosed environment is possibly realized.
To realize above goal of the invention, the technical scheme of use is：
A kind of hollow inductor shield device, including upper radome and lower radome, on the upper radome, lower radome point
The installation portion for being connected with hollow inductance upper end, lower end is not offered, and cutting is offered on the upper radome, lower radome
Gap, the upper radome, the outward flange of lower radome are respectively arranged with equal splenium.
Compared with prior art, the beneficial effects of the invention are as follows：
Cutting gap is offered on the upper radome of hollow inductor shield device provided by the invention and lower radome, is cut
Gap can reduce the generation of vortex, and then reduce the upper influence of radome, lower radome to hollow inductance value, upper radome,
Be provided with equal splenium on lower radome, equal splenium can uniform hollow inductance electric field, be distributed its electric fields uniform.
Brief description of the drawings
Fig. 1 is the profile of screening arrangement use state.
Fig. 2 is the stereogram of screening arrangement use state.
Fig. 3 is the structural representation of upper radome.
Fig. 4 is the structural representation of lower radome.
Embodiment
Accompanying drawing being given for example only property explanation, it is impossible to be interpreted as the limitation to this patent；
Below in conjunction with drawings and examples, the present invention is further elaborated.
Embodiment 1
As shown in Figure 1,2,3, 4, hollow inductor shield device includes being arranged on the He of upper radome 2 of the top of hollow inductance 1
Lower radome 3 installed in the lower section of hollow inductance 1.The material of upper radome 2 and lower radome 3 is aluminum.Upper radome 2, under
The installation portion for being connected with the upper end of hollow inductance 1, lower end is offered on radome 3 respectively, on upper radome 2, lower radome 3
Cutting gap 4 is offered, upper radome 2, the outward flange of lower radome 3 are respectively arranged with equal splenium 5.Upper 2/ time shielding of radome
Installation portion on cover 3 includes several mounting holes 6 being opened on 2/ time radome of radome 3, and mounting hole 6, which is opened in, to be leaned on
Closely 2/ time radome of upper radome, 3 outer peripheral position, it is uniformly distributed in a circumferential direction.Specifically used when, on
Radome 2, lower radome 3 are fixed on the top and bottom of hollow inductance 1 by mounting hole 6 and screw 8.
When hollow inductance 1 is powered, meeting and upper radome 2 produce mutual inductance, and then vortex is produced inside radome, cutting
Gap 4 can reduce the generation of vortex, and then reduce the influence that upper radome 2 is worth to hollow inductance 1.Meanwhile when upper radome 2
During energization, electrostatic field can be produced around upper radome 2 and the upper end of hollow inductance 1, the equal splenium 5 of upper radome 2 can be equal
The electric field of even upper radome 2 and hollow inductance 1, it is distributed its electric fields uniform.Lower radome 3 is provided with cutting gap 4, works as hollow
Meeting and upper radome 2 produce mutual inductance when inductance 1 is powered, and then vortex is produced inside radome, and cutting gap 4 can reduce whirlpool
The generation of stream, and then reduce the influence that lower radome 3 is worth to hollow inductance 1.Lower radome 3 is provided with equal splenium 5, shields instantly
When cover 3 is powered, electrostatic field can be produced around lower radome 3 and the upper end of hollow inductance 1, the equal splenium 5 of lower radome 3 can be with
The electric field of uniform hollow inductance 1, is distributed its electric fields uniform.
In specific implementation process, the quantity for the mounting hole 6 being opened on 2/ time radome of radome 3 is 8.
The quantity of cutting gap 4 on upper 2/ time radome of radome 3 is multiple, multiple more than 4 radome of cutting gap, 2/ time shielding
The center of cover 3 is uniformly distributed in a circumferential direction for origin.The quantity of cutting gap 4 on wherein upper radome 2 is 4, under
The quantity of cutting gap 4 on radome 3 is 15.
In specific implementation process, the equal splenium 5 on upper 2/ time radome of radome 3 is a grading ring.Upper shielding
Grading ring on 2/ time radome 3 of cover is the solid circle that radius is 25mm.On grading ring on upper 2/ time radome of radome 3
The cutting gap 4 consistent with the quantity of cutting gap 4 on upper 2/ time radome of radome 3 and direction is offered respectively.
After upper radome 2, lower radome 3 connect with the installation of hollow inductance 1, the grading ring of upper radome 2 and lower radome 3
Enamel-cover copper bar of the grading ring in the horizontal plane with hollow inductance 1 do not intersect, so as to reduce upper radome 2 and lower radome
The influence that 3 pairs of hollow inductance 1 are worth.
In specific implementation process, conductive part 7 is offered on lower radome 3.In conductive part 7, contact base, contact are set
Seat, which can provide, to be conductively connected.
Device provided by the invention not only reduces influence of the upper and lower radome 3 to the value of hollow inductance 1, also uniform up and down
Electric Field Distribution around radome 3 and hollow inductance 1 so that what hollow inductance 1 used in gas-insulated metal-enclosed environment
Security, reliability greatly increase.
Obviously, the above embodiment of the present invention is only intended to clearly illustrate example of the present invention, and is not pair
The restriction of embodiments of the present invention.For those of ordinary skill in the field, may be used also on the basis of the above description
To make other changes in different forms.There is no necessity and possibility to exhaust all the enbodiments.It is all this
All any modification, equivalent and improvement made within the spirit and principle of invention etc., should be included in the claims in the present invention
Protection domain within.
Claims (10)
- A kind of 1. hollow inductor shield device, it is characterised in that：Including upper radome and lower radome, the upper radome, under The installation portion for being connected with hollow inductance upper end, lower end is offered on radome respectively, on the upper radome, lower radome Cutting gap is offered, the upper radome, the outward flange of lower radome are respectively arranged with equal splenium.
- 2. hollow inductor shield device according to claim 1, it is characterised in that：On the upper radome/lower radome Installation portion include several mounting holes being opened on radome/lower radome, the mounting hole is opened in close to upper Radome/outer peripheral the position of lower radome, it is uniformly distributed in a circumferential direction.
- 3. hollow inductor shield device according to claim 2, it is characterised in that：It is described to be opened in radome/lower screen The quantity for covering the mounting hole on cover is 8.
- 4. hollow inductor shield device according to claim 1, it is characterised in that：On the upper radome/lower radome Cutting gap quantity to be multiple, the centers of multiple cutting gap above radome/lower radomes is origin in circumferencial direction On be uniformly distributed.
- 5. hollow inductor shield device according to claim 4, it is characterised in that：Cutting gap on the upper radome Quantity be 4, the quantity of the cutting gap on the lower radome is 15.
- 6. hollow inductor shield device according to claim 1, it is characterised in that：On the upper radome/lower radome Equal splenium be a grading ring.
- 7. hollow inductor shield device according to claim 6, it is characterised in that：On the upper radome/lower radome Grading ring be solid circle that radius is 25mm.
- 8. hollow inductor shield device according to claim 6, it is characterised in that：On the upper radome/lower radome Grading ring on offer the cutting gap consistent with the cutting gap quantity on upper radome/lower radome and direction respectively.
- 9. hollow inductor shield device according to claim 1, it is characterised in that：Conduction is offered on the lower radome Portion.
- 10. the hollow inductor shield device according to any one of claim 1~9, it is characterised in that：The upper radome and Lower radome is fabricated using aluminium material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710891336.5A CN107578900A (en) | 2017-09-27 | 2017-09-27 | A kind of hollow inductor shield device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710891336.5A CN107578900A (en) | 2017-09-27 | 2017-09-27 | A kind of hollow inductor shield device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107578900A true CN107578900A (en) | 2018-01-12 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710891336.5A Pending CN107578900A (en) | 2017-09-27 | 2017-09-27 | A kind of hollow inductor shield device |
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| CN (1) | CN107578900A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023200062A1 (en) * | 2022-04-13 | 2023-10-19 | 효성중공업 주식회사 | Sub-module for single packaging type semiconductor transformer with excellent insulation and induction heating prevention performance |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6531030B1 (en) * | 2000-03-31 | 2003-03-11 | Lam Research Corp. | Inductively coupled plasma etching apparatus |
| JP2005277298A (en) * | 2004-03-26 | 2005-10-06 | West Japan Railway Co | Electrostatic shielding structure for stationary induction apparatus |
| CN103545084A (en) * | 2013-11-12 | 2014-01-29 | 安庆市宏海科技有限公司 | I-shaped inductor used for driving power of LED (Light Emitting Diode) energy-saving lamp |
| CN203631293U (en) * | 2013-12-13 | 2014-06-04 | 济源市天坛电器有限公司 | Outer shielding case of voltage transformer |
| CN207572233U (en) * | 2017-09-27 | 2018-07-03 | 广东电网有限责任公司中山供电局 | A kind of hollow inductor shield device |
-
2017
- 2017-09-27 CN CN201710891336.5A patent/CN107578900A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6531030B1 (en) * | 2000-03-31 | 2003-03-11 | Lam Research Corp. | Inductively coupled plasma etching apparatus |
| JP2005277298A (en) * | 2004-03-26 | 2005-10-06 | West Japan Railway Co | Electrostatic shielding structure for stationary induction apparatus |
| CN103545084A (en) * | 2013-11-12 | 2014-01-29 | 安庆市宏海科技有限公司 | I-shaped inductor used for driving power of LED (Light Emitting Diode) energy-saving lamp |
| CN203631293U (en) * | 2013-12-13 | 2014-06-04 | 济源市天坛电器有限公司 | Outer shielding case of voltage transformer |
| CN207572233U (en) * | 2017-09-27 | 2018-07-03 | 广东电网有限责任公司中山供电局 | A kind of hollow inductor shield device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023200062A1 (en) * | 2022-04-13 | 2023-10-19 | 효성중공업 주식회사 | Sub-module for single packaging type semiconductor transformer with excellent insulation and induction heating prevention performance |
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