CN107561785A - A kind of optics alignment apparatus and its alignment method - Google Patents
A kind of optics alignment apparatus and its alignment method Download PDFInfo
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- CN107561785A CN107561785A CN201610510780.3A CN201610510780A CN107561785A CN 107561785 A CN107561785 A CN 107561785A CN 201610510780 A CN201610510780 A CN 201610510780A CN 107561785 A CN107561785 A CN 107561785A
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- alignment
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Abstract
The invention provides a kind of optics alignment apparatus and its alignment method, the optics orientation field of LCDs is mainly used in.The device includes：Substrate, motion guide rail, guide rail supporting frame, reflective mirror, at least one substrate station, at least one transmitting device and polarization light generating apparatus etc..Completed to treat the transmission work of alignment substrates by transmitting device, incident light caused by polarization light generating apparatus is reflexed on reflective mirror by being divided microscope group and detection means, treats alignment substrates optics orientation.Present invention also offers the device alignment method, and continuous orientation operation can be realized by the alternating conversion of transmitting device.The present invention makes alignment apparatus more stable by fixed substrate station, the method for mobile reflective mirror, and orientation quality is improved；Reduce the quality of working space and whole device again simultaneously；Under the cooperation of this alignment method, the efficiency of orientation operation is improved.
Description
Technical field
The present invention relates to liquid crystal display optics orientation field, more particularly to a kind of optics alignment apparatus and
Its alignment method.
Background technology
Liquid crystal display has been widely applied in life.LCD alignment control technology is manufacture high quality
One of liquid crystal panel basic fundamental, the quality of orientation effect directly affect the final picture of liquid crystal display
Quality.Alignment technique is broadly divided into two kinds of conventional friction orientation and light orientation at present, and light orientation is relative to rub
Wiping orientation has the characteristics that orientation effect is good, yield is high, gradually substitutes conventional friction orientation.
Usual optics alignment technique is carried out in light orientation equipment.Inventor find in the prior art,
Following technology inferior position be present：Motion guide rail is long, carrying work stage, substrate quality, the factor such as big causes to match somebody with somebody
Shaken into scanning process big；Motion guide rail is influenceed orientation quality by orientation light irradiation；Double needs
Want four substrate spaces, space-consuming is big.
Therefore, exploitation one kind occupies little space, and the high optics orientation equipment of orientation quality is very
It is necessary.
The content of the invention
It is current to solve it is an object of the invention to provide a kind of optics alignment apparatus and its alignment method
The problem of optics alignment apparatus orientation quality is unstable, and orientation efficiency is low.
In order to solve the above technical problems, one aspect of the present invention provides a kind of optics alignment apparatus, including：
Substrate, motion guide rail, guide rail supporting frame, reflective mirror, at least one substrate station, at least one biography
Defeated device and polarization light generating apparatus.
The substrate includes first end and the second end being oppositely arranged with the first end, the substrate
First end is provided with guide rail supporting frame, and the second end is provided with to be filled for producing the polarised light of incident light
Put；The motion guide rail is arranged on guide rail supporting frame, and being provided with the motion guide rail can be along described
The reflective mirror of motion guide rail movement；At least one substrate station is located at below the reflective mirror and solid
Determine on the substrate；At least one transmitting device is located at the side of the substrate station；In light
When learning orientation operation, the transmitting device will treat that alignment substrates are sent on the substrate station, described
Reflective mirror reflexes to the incident light caused by the polarization light generating apparatus on the substrate station,
To treating that alignment substrates carry out optics orientation operation on substrate station.
Optionally, the optics alignment apparatus, in addition to detection means, for detecting the incident light
Optical characteristics；The detection means is positioned at the lower section of the polarization light generating apparatus.
Optionally, the optics alignment apparatus, in addition to light splitting microscope group, the light splitting microscope group and described
Reflective mirror is located at sustained height, and the light splitting microscope group is positioned at the polarization light generating apparatus and the detection
Between device, a part for the incident light reflexes to the reflective mirror, institute by the light splitting microscope group
The remainder for stating incident light reaches detection means by the light splitting microscope group.
Wherein, the reflecting surface of the speculum is parallel to each other with the light splitting microscope group reflecting surface.
Optionally, the detection means includes analyzing detector, light intensity detector and optical detector,
Can also be three or both wherein any combinations.
Optionally, the quantity of the substrate station is two or three；The quantity of the transmitting device is
One or two.
Optionally, the optics alignment apparatus, in addition to temperature control equipment, the temperature control dress
Polarized setting in described on light generating apparatus, for controlling the temperature of the polarization light generating apparatus.
Optionally, the polarization light generating apparatus is laser or mercury lamp.
Wherein, the reflection width of the reflective mirror treats alignment substrates along alignment direction more than or equal to described
Width.
Optionally, the optics alignment apparatus, in addition to beam conditioning arrangement, the light beam regulation dress
Put and be arranged between the reflective mirror and the light splitting microscope group, for adjusting beam characteristicses.
Also include alignment device, the alignment device is located above the substrate station, for detecting
State and treat whether the position of alignment substrates is accurate.
Optionally, on the premise of the reflective mirror movement and transport module work is not influenceed, institute
State polarization light generating apparatus, light splitting microscope group, the detection means and the beam conditioning arrangement are wanted
The edge of the guide rail supporting frame is arranged close to as far as possible.
In order to preferably realize the purpose of the present invention, another aspect of the present invention provides a kind of optics orientation
The alignment method of device, comprises the following steps：
S1：It will treat that alignment substrates are delivered to the substrate station by transmitting device, and wait to match somebody with somebody to described
Pose adjustment is carried out to substrate；
S2：Alignment substrates, which are treated, using reflective mirror carries out optics orientation；
S3：The substrate for completing optics orientation is transmitted from the substrate station by the transmitting device
Get off.
Optionally, the alignment method of the optics alignment apparatus, when the quantity of the substrate station is extremely
When few two, in S2,
Treat that alignment substrates are completed optics and matched somebody with somebody backward described on a substrate station,
Alignment substrates are treated in the mobile reflective mirror to the upper of the substrate station for not carrying out optics orientation
Top, alignment substrates carry out optics orientation respectively to be treated to non-optics orientation.
Optics alignment apparatus and its alignment method provided by the invention, it is mobile by fixed substrate station
Reflective mirror reduces working space to the mode for treating alignment substrates optics orientation of each substrate station,
And overcome the ropy problem of orientation brought by the shake of substrate station.Further, according to optics
Alignment apparatus is the invention provides the alignment method of the optics alignment apparatus, using multistation substep alternating
The mode of operation, improves operating efficiency.
Brief description of the drawings
Fig. 1 is the front view of the optics alignment apparatus of the embodiment of the present invention one；
Fig. 2 is the top view of the optics alignment apparatus of the embodiment of the present invention one；
Fig. 3 is the left view of the optics alignment apparatus of the embodiment of the present invention one；
Fig. 4 is front view of the embodiment of the present invention one without the optics alignment apparatus of dress detection means；
Fig. 5 A, 5B are the schematic diagrames of the transmitting device of the embodiment of the present invention one；
Fig. 5 C are the schematic diagrames of the substrate station of the embodiment of the present invention two increase turntable；
Fig. 6 is the front view of the optics alignment apparatus of the embodiment of the present invention three；
Fig. 7 A, 7B, 7C are the top views of the optics alignment apparatus of the embodiment of the present invention three；
Fig. 8 is the flow chart of the alignment method of the optics alignment apparatus of the embodiment of the present invention four.
In figure：1- polarizes light generating apparatus；2- is divided microscope group；3- detection means；4- guide rail supporting frames；
5- motion guide rails；6- reflective mirrors；7A, 7B, 7C- substrate station；8A, 8B- transmitting device；
9A, 9B- alignment modules；10- substrates；11A- incident lights；11B- analyzing light；11C- reflected lights；
11D- orientation light.
Embodiment
To a kind of optics alignment apparatus proposed by the present invention and its match somebody with somebody below in conjunction with the drawings and specific embodiments
It is described in further detail to method.According to following explanation and claims, advantages of the present invention and
Feature will become apparent from.It should be noted that accompanying drawing is using very simplified form and using non-accurate
Ratio, only for the purpose of facilitating and clarifying the purpose of the embodiments of the invention.
Embodiment one
Shown in Fig. 1~Fig. 3 is the front view of the optics alignment apparatus of the embodiment of the present invention one respectively, bows
View and left view.
Refering to Fig. 1~3, the optics alignment apparatus includes：For producing incident light 11A polarised light
Generating means 1, for incident light 11A to be divided to the light splitting microscope group for analyzing light 11B and reflected light 11C
2, for measuring the detection means 3 of analyzing light 11B optical characteristics, for carrying leading for motion guide rail 5
Rail support frame 4, for the motion guide rail 5 for driving speculum 6 to be moved along alignment direction or opposite direction, use
In adjustment reflected light 11C light beam adjustment unit 12, orientation base is treated for reflected light 11C to be reflexed to
Speculum 6 on plate, substrate station 7A, the substrate station 7B of alignment substrates are treated for carrying, is used for
Transmit substrate to substrate station 7A, substrate station 7B and adjust substrate posture transmitting device 8A, 8B,
For detecting alignment modules 9A, the alignment modules 9B of substrate posture, for carrying the base of whole equipment
Bottom 10 and light beam adjustment unit 12.
Inventor, which studies, to be found according to existing optics alignment technique, incides the orientation light on real estate
11D intensity, polarisation uniformity has a great influence to orientation quality.Polarize caused by light generating apparatus 1
Incident light 11A mass is bad to be incorporated into lower floor layer by layer, it requires that polarization light generating apparatus 1 needs
Can be good in maintenance period internal stability.
Therefore, preferable, polarization light generating apparatus 1 is arranged on stable framework as far as possible, and far
From vibration source, to reduce influence of the vibration to polarization light generating apparatus.
When polarization light generating apparatus selects mercury lamp, it is preferred that increase on polarization light generating apparatus 1
Temperature control equipment, to control the temperature of polarization light generating apparatus 1, prevent because polarised light fills
Put 1 and produce unstable incident light 11A because temperature is too high.
Further, on space scale, the reflective surface width of reflective mirror 6, which is more than or equal to, treats orientation base
The width of plate, it is anti-that reflected light 11C width caused by light velocity adjustment unit 12 is more than or equal to reflective mirror
The width of smooth surface, the width for being divided microscope group are more than or equal to the width of light velocity adjustment unit, polarised light hair
Incident light 11A width caused by generating apparatus is more than or equal to the width of light splitting microscope group.So as to ensure partially
The incident light 11A caused by light generating apparatus 1 that shakes can be covered completely after reflection treats alignment substrates
Alignment direction (i.e. the orientation width for treating alignment substrates can be completely covered in the orientation width of orientation light), from
And orientation light 11D can be realized once with regard to orientation operation can be completed.
In order to facilitate control orientation light 11D intensity, the light splitting He of microscope group 2 is provided with the present embodiment
Detection means 3.Light splitting of the incident light 11A by light splitting microscope group 2 caused by light generating apparatus 1 is polarized,
A part reflects 11B detection lights, and another part reflects reflected light 11C.Wherein detection light 11B
It is irradiated in detection means 3, the energy shone to detection light.To meet that incident light 11A can be divided
Light microscopic group 2 is completely divided into detection light 11B and reflected light 11C, and light splitting microscope group 2 allows for receiving
Whole incident light 11A.Being divided the splitting ratio of microscope group 2 can be incident according to caused by polarization light generating apparatus 1
Light 11A changes, and ensures that it meets the minimum energy that detection means 3 receives.
Detection means 3 include, but are not limited to detection detection light 11B analyzing detector, can also wrap
Containing light intensity detector, optical detector etc..Detection means 3 can be with concrete condition with choosing, to meet not
With the demand of substrate.
Further, if without optics Characteristics Detection demand, detection means 3 and light splitting microscope group 2 can be removed,
Then light splitting microscope group is replaced by a reflective mirror, can specifically refers to Fig. 4.
The light beam adjustment unit 12 being provided with the present embodiment, to strengthen intensity of illumination.So that reflection
Light 11C better meets orientation requirement.
Preferably, on the premise of being independent of each other, polarization light generating apparatus 1, light splitting microscope group 2 and detection
Edge of the device 3 as close as motion guide rail 6.Light path can so be shortened, reduce energy damage
Lose, reduce light beam adjustment unit 12 and require.
In the present embodiment, the supporting surface of guide rail supporting frame 4 is big as far as possible, does not stop transmission in principle
The upper and lower plates of device 8 and reflected light 11 are propagated, so as to so that motion guide rail is more stable, so as to
Reduce the vibrations of motion guide rail 5 and reflective mirror 6.
The speculum 6 and the reflecting surface of light splitting microscope group 2 set in the present embodiment should be parallel, to ensure
Orientation light can be impinged perpendicularly on substrate station 7A and substrate station 7B, so as to reach raising optics
The effect of the quality of orientation.
Transmitting device 8A, transmitting device 8B are set in the present embodiment, for transmitting substrate to substrate work
Position, or the substrate that orientation is completed transmit.Refering to Fig. 5 A and Fig. 5 B, transmitting device can be
Two independent upper and lower plates manipulators or a upper and lower plates machinery be manually placed at one can along with
The motion guide rail moved to direction or opposite direction, the motion of motion guide rail can driving mechanical hand filled in transmission
Put and switch between 8A and transmitting device 8B.
Alignment modules 9A, alignment modules 9B are provided with the present embodiment, for detecting substrate in substrate
Whether the posture on station is accurate.Alignment modules can be two independences or one to quasi-mode
Block is placed on one can be along the motion guide rail that alignment direction or opposite direction are moved, the motion of motion guide rail
Alignment modules can be driven to switch between 7A and alignment modules 7B.
Embodiment two
Fig. 5 C are illustrated that another structure of the transmitting device of the embodiment of the present invention two and substrate station, with
The difference of embodiment one is, increases turntable respectively on substrate station 7A and substrate station 7B
13A and turntable 13B structures.
Specifically, transmitting device 8A is by board transport to substrate station 7A, in the inspection of alignment modules
Alignment substrates are treated by turntable 13A under survey and carry out pose adjustment, until treating that alignment substrates are aligned completely
Untill.
Preferably, pose adjustment can also be completed jointly by transmitting device 8A and turntable 13A, its
Middle transmitting device 8A is just successive step, turntable 13A and does accurate adjustment；Same transmitting device 8B and
Turntable 13B also does corresponding work.
The present embodiment increased turntable 13A and turntable 13B, which can be improved effectively, treats orientation base
The speed of plate pose adjustment, and the requirement to transmitting device 8A and transmitting device 8B is reduced, improve
Service life.
Embodiment three
Shown in Fig. 6 and Fig. 7 A be respectively the optics alignment apparatus of the embodiment of the present invention three front view and
Top view.
Fig. 7 B and 7C are illustrated that to be matched somebody with somebody according to the optics of Fig. 7 A embodiment of the present invention three converted
To the top view of device.
Difference with embodiment one is：Alignment modules are reduced to 1 by two；Substrate station is by two
It is individual to increase to three, respectively substrate station 7A, substrate station 7B, substrate station 7C, and 3
Belt can be can be, but not limited to by transport mechanism unidirectional handover, the form of transport mechanism between station
The forms such as transmission, chain transmission, slide unit transmission.Transmitting device 8A, transmitting device 8B are corresponding to be distributed
In front of substrate station 7A and substrate station 7C.Substrate station 7A is upper plate station, substrate station
7B is orientation station, and substrate station 7C is lower plate station.Wherein, switching passes through transmission between station
Mechanism rolls to substrate station 7C successively from substrate station 7A.
Specifically, being switched to transmitting device 8A, transmitting device 8A will treat that alignment substrates are sent to substrate
On station 7A, and alignment substrates pose adjustment is treated to meeting alignment modules；Further, it is right
Treat that alignment substrates are sent to substrate station 7B by transport mechanism after standard；Further, in substrate station 7B
On treat alignment substrates carry out orientation operation；Further, the post-job substrate of orientation is completed by conveyer
Structure is sent on substrate station 7C；Further, transmitting device 8B by the substrate that orientation is completed from substrate
Transmitted on station 7C.
The present embodiment employs the form for treating alignment substrates continuous productive process, and the position of upper and lower base plate is avoided
Orientation station 7B, from transmitting device, alignment modules and pose adjustment operation is avoided to orientation
Substrate 7B interference, and then improve alignment substrates 7B stability.
Further, because orientation operation is only completed on alignment substrates 7B, so the length of motion guide rail 5
Degree is reduced by half, is also further improved so as to the stability of motion guide rail, improves orientation operation
Quality.
The same with embodiment, the transmitting device in the present embodiment can be two independent upper and lower plates machineries
Hand or a upper and lower plates machinery are manually placed at one and can moved along alignment direction or opposite direction
Motion guide rail, the motion of motion guide rail can driving mechanical hand transmitting device 8A and transmitting device 8B it
Between switch.
Equally, the upper plate station in the present embodiment can also increase turntable, to aid in treating orientation
The pose adjustment of substrate.
Further, on this basis, the position relationship of three substrate stations can become turn to such as Fig. 7 B and
Fig. 7 C form.Specifically, polarization light generating apparatus is arranged in orientation station side.This form
Reach the purpose for shortening light path, and then reduce the requirement to light beam adjustment unit 12.
Example IV
Refering to Fig. 1, Fig. 2 and Fig. 8, a kind of alignment method of optics orientation mechanism is present embodiments provided.
Two substrate stations, including first substrate station and second substrate station are provided with the present embodiment.
It is divided into specifically, producing incident light 11A by polarization light generating apparatus 1 by light splitting microscope group 2
Continue the analyzing light 11B and the reflected light 11C perpendicular to incident direction of propagation along incident direction, wherein
Analyzing light 11B is impinged perpendicularly in the detection means 3 of the optical characteristics such as detectable polarization state, reflected light
11C is propagated on speculum 6 through light beam adjustment unit 12, and through speculum 6, secondary reflection, formation can again
For the orientation light 11D of substrate orientation, speculum 6 is placed on motion guide rail 5, can be led along moving
Rail 5 moves in alignment direction or opposite direction, when the motion guide rail 5 of speculum 6 is by first substrate station
When 7A carries out orientation, on transmitting device 8B carried base board to substrate station 7B, meanwhile, alignment modules
9B carries out attitude detection to substrate station 7B upper substrates, and is adjusted by transmitting device 8B,
After treating substrate station 7A orientations, orientation is carried out to substrate station 7B by mobile mirror 6,
Meanwhile the substrate that transmitting device 8A finishes to orientation on substrate station 7A carries out bottom sheet and uploaded new
Substrate, this reciprocal process, until batch flow terminates.
The optics alignment method that the present embodiment provides takes full advantage of the working time of each mechanism, improves
The efficiency of orientation operation.
Embodiment five
Refering to Fig. 6~Fig. 7 C, a kind of another orientation side of optics alignment apparatus is present embodiments provided
Method.According to embodiment three, the optics alignment method of the present embodiment has also made corresponding change.
Specifically, transmitting device 8A will treat that alignment substrates are sent to substrate station 7A, in alignment device
Inspection under treat alignment substrates pose adjustment, after the completion of pose adjustment, transport mechanism will treat orientation base
Plate is sent to orientation station, and completes orientation operation, and after the completion of orientation, transport mechanism completes orientation
Substrate be sent to lower plate station, transmitting device 8B is by the substrate that orientation is completed under the transmission of lower plate station
Come, complete the orientation operation of a substrate.
Further, upper plate station can also increase turntable mechanism, so as to, pose adjustment mode by
Turntable is completed.
Embodiment adds a substrate station, by upper plate operation, orientation operation and lower plate operation point
End into.The operating type of continuous-flow type makes operation simpler, fills the requirement to transmitting device in a device
Reduce, and simplify alignment modules, so adding the service life of whole device；Simultaneously as
Orientation operation is only completed on substrate station 7B, so the length of motion guide rail reduces, adds orientation
The stability of operation, improve orientation quality.
To sum up, using the optics alignment apparatus and its alignment method of the present invention, optics orientation can be improved
Quality, and improve the efficiency of orientation operation；To a certain extent, alignment apparatus is also reduced
Space-consuming.
What each embodiment stressed is the difference with other embodiment in this specification, respectively
Between individual embodiment identical similar portion mutually referring to.For system disclosed in embodiment,
Due to corresponding to the method disclosed in Example, so description is fairly simple, related part is referring to side
Method part illustrates.
Foregoing description is only the description to present pre-ferred embodiments, not to any of the scope of the invention
Limit, any change, the modification that the those of ordinary skill in field of the present invention does according to the disclosure above content,
Belong to the protection domain of claims.
Claims (14)
- A kind of 1. optics alignment apparatus, it is characterised in that including：Substrate, motion guide rail, guide rail branch Support, reflective mirror, at least one substrate station, at least one transmitting device and polarization light generating apparatus；The guide rail supporting frame, at least one substrate station are provided with the substrate and for producing The polarization light generating apparatus of raw incident light；The motion guide rail is arranged on guide rail supporting frame, the fortune The reflective mirror that can be moved along the motion guide rail is provided with dynamic guide rail；At least one transmitting device Positioned at the side of the substrate station；In optics orientation operation, the transmitting device will treat orientation base Plate is sent on the substrate station, and the reflective mirror will be described caused by the polarization light generating apparatus Incident light is reflexed on the substrate station, to treating that alignment substrates carry out optics orientation on substrate station Operation.
- 2. optics alignment apparatus as claimed in claim 1, it is characterised in that also including detection means, For detecting the optical characteristics of the incident light；The detection means is located at the polarization light generating apparatus Lower section.
- 3. optics alignment apparatus as claimed in claim 2, it is characterised in that also include light splitting microscope group, The light splitting microscope group and the reflective mirror are located at sustained height, and the light splitting microscope group is located at the polarised light Between generating means and the detection means, a part for the incident light is anti-by the light splitting microscope group The reflective mirror is mapped to, the remainder of the incident light reaches detection means by the light splitting microscope group.
- 4. optics alignment apparatus as claimed in claim 3, it is characterised in that the speculum it is anti- Penetrate face and the reflecting surface of the light splitting microscope group is parallel to each other.
- 5. optics alignment apparatus as claimed in claim 2, it is characterised in that the detection means bag Include analyzing detector, light intensity detector and optical detector.
- 6. optics alignment apparatus as claimed in claim 1, it is characterised in that the substrate station Quantity is two or three.
- 7. optics alignment apparatus as claimed in claim 1, it is characterised in that the transmitting device Quantity is one or two.
- 8. optics alignment apparatus as claimed in claim 1, it is characterised in that also including temperature control Device, the temperature control equipment is on the polarization light generating apparatus, for controlling the polarization The temperature of light generating apparatus.
- 9. optics alignment apparatus as claimed in claim 1, it is characterised in that the polarised light occurs Device is laser or mercury lamp.
- 10. optics alignment apparatus as claimed in claim 1, it is characterised in that the reflective mirror Reflection width treats width of the alignment substrates along alignment direction described in being more than or equal to.
- 11. optics alignment apparatus as claimed in claim 3, it is characterised in that also adjusted including light beam Regulating device, the beam conditioning arrangement are arranged between the reflective mirror and the light splitting microscope group, are used for Adjust beam characteristicses.
- 12. optics alignment apparatus as claimed in claim 1, it is characterised in that also include alignment dress Put, the alignment device is located above the substrate station, for detecting the position for treating alignment substrates Whether put accurate.
- 13. a kind of alignment method based on optics alignment apparatus as claimed in claim 1, its feature It is, comprises the following steps：S1：It will treat that alignment substrates are delivered to the substrate station by transmitting device, and wait to match somebody with somebody to described Pose adjustment is carried out to substrate；S2：Alignment substrates, which are treated, using reflective mirror carries out optics orientation；S3：The substrate for completing optics orientation is transmitted from the substrate station by the transmitting device Get off.
- 14. the alignment method of optics alignment apparatus as claimed in claim 13, it is characterised in that when The quantity of the substrate station be at least two, S2 in,Treat that alignment substrates are completed optics and matched somebody with somebody backward described on a substrate station,Alignment substrates are treated in the mobile reflective mirror to the upper of the substrate station for not carrying out optics orientation Top, alignment substrates carry out optics orientation respectively to be treated to non-optics orientation.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610510780.3A CN107561785B (en) | 2016-06-30 | 2016-06-30 | Optical alignment device and alignment method thereof |
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|---|---|---|---|
| CN201610510780.3A CN107561785B (en) | 2016-06-30 | 2016-06-30 | Optical alignment device and alignment method thereof |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108761926A (en) * | 2018-05-09 | 2018-11-06 | 深圳市华星光电技术有限公司 | Orientation microcosmic detection equipment and orientation detection method |
| CN111781773A (en) * | 2019-04-04 | 2020-10-16 | 上海微电子装备（集团）股份有限公司 | Photo-alignment apparatus and photo-alignment method |
| TWI827647B (en) * | 2018-08-28 | 2024-01-01 | 美商艾克塞利斯科技公司 | System and method for aligning light-transmitting birefringent workpieces |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010050740A1 (en) * | 2000-06-06 | 2001-12-13 | Manabu Goto | Polarized light irradiation apparatus |
| KR20110093253A (en) * | 2010-02-12 | 2011-08-18 | (주)엘립소테크놀러지 | Apparatus for measuring of aligning state of alignment layer and method for measuring tht same |
| JP2013160818A (en) * | 2012-02-02 | 2013-08-19 | Ricoh Co Ltd | Alignment film processing apparatus, liquid crystal element, polarization separation device, optical scanner, and image forming apparatus |
| CN103376598A (en) * | 2012-04-25 | 2013-10-30 | 岩崎电气株式会社 | Polarized ultraviolet irradiation device |
| CN203759391U (en) * | 2014-04-17 | 2014-08-06 | 成都京东方光电科技有限公司 | Optical alignment device |
| CN104296874A (en) * | 2013-07-17 | 2015-01-21 | 优志旺电机株式会社 | Polarized light irradiation apparatus and method for photo-alignment |
| CN204406005U (en) * | 2015-02-28 | 2015-06-17 | 成都京东方光电科技有限公司 | Light orientation apparatus |
-
2016
- 2016-06-30 CN CN201610510780.3A patent/CN107561785B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010050740A1 (en) * | 2000-06-06 | 2001-12-13 | Manabu Goto | Polarized light irradiation apparatus |
| KR20110093253A (en) * | 2010-02-12 | 2011-08-18 | (주)엘립소테크놀러지 | Apparatus for measuring of aligning state of alignment layer and method for measuring tht same |
| JP2013160818A (en) * | 2012-02-02 | 2013-08-19 | Ricoh Co Ltd | Alignment film processing apparatus, liquid crystal element, polarization separation device, optical scanner, and image forming apparatus |
| CN103376598A (en) * | 2012-04-25 | 2013-10-30 | 岩崎电气株式会社 | Polarized ultraviolet irradiation device |
| CN104296874A (en) * | 2013-07-17 | 2015-01-21 | 优志旺电机株式会社 | Polarized light irradiation apparatus and method for photo-alignment |
| CN203759391U (en) * | 2014-04-17 | 2014-08-06 | 成都京东方光电科技有限公司 | Optical alignment device |
| CN204406005U (en) * | 2015-02-28 | 2015-06-17 | 成都京东方光电科技有限公司 | Light orientation apparatus |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108761926A (en) * | 2018-05-09 | 2018-11-06 | 深圳市华星光电技术有限公司 | Orientation microcosmic detection equipment and orientation detection method |
| TWI827647B (en) * | 2018-08-28 | 2024-01-01 | 美商艾克塞利斯科技公司 | System and method for aligning light-transmitting birefringent workpieces |
| CN111781773A (en) * | 2019-04-04 | 2020-10-16 | 上海微电子装备（集团）股份有限公司 | Photo-alignment apparatus and photo-alignment method |
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