CN107522633B - Fluorenoxime ester photoinitiator - Google Patents

Fluorenoxime ester photoinitiator Download PDF

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Publication number
CN107522633B
CN107522633B CN201610449965.8A CN201610449965A CN107522633B CN 107522633 B CN107522633 B CN 107522633B CN 201610449965 A CN201610449965 A CN 201610449965A CN 107522633 B CN107522633 B CN 107522633B
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nitrite
group
ester
fluorenyloxime
cycloalkylalkyl
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CN107522633A (en
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钱晓春
胡春青
于培培
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Changzhou Tronly New Electronic Materials Co Ltd
Changzhou Tronly Advanced Electronic Materials Co Ltd
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Changzhou Tronly New Electronic Materials Co Ltd
Changzhou Tronly Advanced Electronic Materials Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C249/00—Preparation of compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C249/04—Preparation of compounds containing nitrogen atoms doubly-bound to a carbon skeleton of oximes
    • C07C249/12—Preparation of compounds containing nitrogen atoms doubly-bound to a carbon skeleton of oximes by reactions not involving the formation of oxyimino groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/45—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation
    • C07C45/46—Friedel-Crafts reactions
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
    • C07D333/22—Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials

Abstract

the invention discloses a fluorene-containing oxime ester photoinitiator shown in the following formula (I), which has excellent film forming property when being applied to a photocuring composition, has good surface curing effect and is not easy to yellow, and has good compound use effect with other conventional photoinitiators.

Description

Fluorenoxime ester photoinitiator
Technical Field
The invention belongs to the field of organic chemistry, and particularly relates to a fluorene-containing oxime ester photoinitiator, and synthesis and application thereof in the field of photocuring.
Background
Oxime ester compounds are well known to those skilled in the art as photoinitiators, and have outstanding activity and are widely used in high-end photoresists such as color filter films (RGB), Black Matrixes (BM), photo-spacers (photo-spacers), rib gratings (rib) and the like. The common oxime ester photoinitiator takes carbazole or diphenyl sulfide group as a main group, so that the cost is high, and the solubility with matrix resin is often insufficient, so that the development of the photoinitiator with lower cost and good solubility is a pursued target on the premise that the sensitivity is not influenced. Therefore, the existing fluorene oxime ester photoinitiator is developed to solve the problems to a certain extent, however, in practical application, the fluorene oxime ester photoinitiator often has the defects of poor surface dryness and easy yellowing, and the application of the fluorene oxime ester photoinitiator is limited to a certain extent.
Disclosure of Invention
Aiming at the defects of the prior art, the invention aims to provide a fluorene-containing oxime ester photoinitiator. By introducing aryl, heteroaryl, heterocycle or symmetrical oxime ester groups into the site para to the oxime ester group in the main structure of fluorene, the obtained novel oxime ester photoinitiator containing fluorene has the characteristics of good surface curing effect and difficult yellowing under the condition of keeping good film-forming performance, and has good compound use effect with other conventional photoinitiators.
The oxime ester photoinitiator containing fluorene has a structure shown as the following formula (I):
（I）
Wherein the content of the first and second substances,
R1Each independently represents hydrogen, halogen, C1-C20Straight or branched alkyl of (2), C4-C20Cycloalkylalkyl of (C)2-C20Alkenyl of (2), the-CH of these groups2-optionally (optinally) substituted by-O-, R1Can form a ring between the two;
R2Represents C3-C20cycloalkyl of, C4-C20And H on the cycloalkyl group in the cycloalkylalkyl group may be optionally substituted by C1-C4Alkyl substitution of (a);
R3Represents C1-C20Straight or branched alkyl of (2), C3-C20Cycloalkyl radical, C4-C20Alkylcycloalkyl or cycloalkylalkyl, C6-C30Aryl or substituted aryl of, C7-C30aralkyl of (2), C2-C20Alkenyl of (a);
X represents a void or a carbonyl group;
A represents C6-C30Aryl of (C)6-C30Heteroaryl of (A), C3-C20Heterocyclic ring or C (R)2)=N-O-CO-R3a group, and C6-C30Aryl of (C)6-C30Heteroaryl and C3-C20the hydrogen atom in the heterocycle mayOptionally is covered with C1-C20Alkyl of (C)6-C30Aryl, heteroaryl, aryl ketone, heteroaryl ketone, C3-C10Heterocyclic, heterocyclic ketone;
Y represents a null or a carbonyl group; with the proviso that when A represents C (R)2)=N-O-CO-R3When, Y = X; when A represents C (R)2)=N-O-CO-R3When other groups are used, Y represents a carbonyl group.
As a preferable technical scheme, in the fluorene oxime ester photoinitiator shown in the formula (I), R1Each independently represents hydrogen, C1-C10Straight or branched alkyl of (2), C4-C15Cycloalkylalkyl of (C)2-C10alkenyl of (2), the-CH of these groups2-is optionally substituted by-O-. More preferably, R1Each independently represents hydrogen, C1-C6Straight or branched alkyl of, or C4-C10Cycloalkylalkyl groups of (a).
Preferably, R2Represents C3-C15Cycloalkyl of, C4-C15And H on the cycloalkyl group in the cycloalkylalkyl group may be optionally substituted by C1-C4Alkyl substitution of (2). Further preferably, R2Represents C3-C6Cycloalkyl of, C4-C10And H on the cycloalkyl group in the cycloalkylalkyl group may be optionally substituted by C1-C4Alkyl substitution of (2).
Preferably, R3Represents C1-C10Straight or branched alkyl of (2), C3-C10Cycloalkyl radical, C4-C10Alkylcycloalkyl or cycloalkylalkyl, C6-C10Aryl of (C)7-C12an aralkyl group of (2). Further preferably, R3Represents C1-C6Straight or branched alkyl of (2), C3-C6Cycloalkyl radical, C4-C10An alkylcycloalkyl or a cycloalkylalkyl group.
As a preferred embodiment, the above formula (I)) In the fluorene oxime ester photoinitiator, when A represents C (R)2)=N-O-CO-R3When other groups are used, C is preferred6-C10Aryl of (C)6-C10heteroaryl of (A), C3-C10Heterocyclic ring, and in which the hydrogen atoms may optionally be replaced by C1-C6alkyl of (C)6-C10Aryl, heteroaryl, aryl ketone, heteroaryl ketone, C3-C10heterocyclic ring, heterocyclic ketone. Further preferably, when a is not ═ C (R)2)=N-O-CO-R3When selected, the group is selected from the following groups:
。
The invention also relates to a preparation method of the fluorene-containing oxime ester photoinitiator with the structure shown in the formula (I), and the specific steps are different according to the difference of A groups.
when A represents C6-C30Aryl of (C)6-C30Heteroaryl or C of3-C20Heterocyclic ring, or hydrogen atoms thereof optionally substituted by C1-C20Alkyl of (C)6-C30Aryl, heteroaryl, aryl ketone, heteroaryl ketone, C3-C10When the heterocyclic ring and the heterocyclic ketone are substituted, the preparation method comprises the following steps:
(1) Synthesis of intermediate a
The raw material a, the raw material b and the raw material c sequentially undergo a Friedel-crafts acylation reaction in an organic solvent under the catalytic action of aluminum trichloride or zinc chloride to obtain an intermediate a;
the starting material b is R2In' -CO-Cl, R2' represents R2Or R2-CH2-, in particular, when X in formula (I) is null, then R2' represents R2When X is carbonyl, then R2' represents R2-CH2-；
(2) Synthesis of intermediate b
When X is empty, the intermediate a is subjected to oximation reaction under the action of hydroxylamine hydrochloride and sodium acetate to generate an intermediate b;
When X is carbonyl, under the existence of organic solvent and concentrated hydrochloric acid, the intermediate a and nitrite are subjected to oximation reaction at normal temperature to generate an intermediate b;
(3) Synthesis of Compounds of formula (I)
Intermediate b with acid anhydride (R)3-CO)2O or acyl chloride compounds R3carrying out esterification reaction on-CO-Cl to obtain a target product;
。
When A represents C (R)2)=N-O-CO-R3The preparation method comprises the following steps:
(1) Synthesis of intermediate a
Under the catalytic action of aluminum trichloride or zinc chloride, the raw material a and the raw material b generate Friedel-crafts acylation reaction in an organic solvent to obtain an intermediate a';
The starting material b is R2In' -CO-Cl, R2' represents R2Or R2-CH2-, in particular, when X in formula (I) is null, then R2' represents R2when X is carbonyl, then R2' represents R2-CH2-；
(2) synthesis of intermediate b
When X is empty, the intermediate a 'is subjected to oximation reaction under the action of hydroxylamine hydrochloride and sodium acetate to generate an intermediate b';
When X is carbonyl, under the existence of organic solvent and concentrated hydrochloric acid, the intermediate a 'and nitrite are subjected to oximation reaction at normal temperature to generate an intermediate b';
(3) Synthesis of Compounds of formula (I)
Intermediate b' with acid anhydride (R)3-CO)2O or acyl chloride compounds R3carrying out esterification reaction on-CO-Cl to obtain a target product;
。
The fluorene-containing oxime ester photoinitiator is a further improvement on the structure of the similar photoinitiator described in the patent application (application numbers: 201510646816.6 and 201510645925.6) previously applied by the applicant. Both of these prior applications are incorporated herein by reference in their entirety.
The reactions involved in steps (1) to (3) of the above two preparation methods are conventional in the art for the synthesis of analogous compounds. Specific reaction conditions are readily determined by those skilled in the art, given the synthetic concepts disclosed herein.
Preferably, in the Friedel-crafts reaction of step (1), the reaction temperature is generally between-10 and 30 ℃. The organic solvent to be used is not particularly limited as long as it can dissolve the raw materials and does not adversely affect the reaction, and examples thereof include methylene chloride, dichloroethane, benzene, toluene, xylene, and the like.
The oximation reaction in step (2) is carried out in a solvent system, and the solvent used is not particularly limited as long as it can dissolve the starting materials and does not adversely affect the reaction.
When X is empty, the solvent used may be a mixed solvent of alcohol and water, preferably a mixed solvent of ethanol and water. The reaction was carried out under heating under reflux.
When X is carbonyl, the organic solvent used may be dichloromethane, benzene, toluene, tetrahydrofuran, etc., the nitrite used may be selected from ethyl nitrite, isoamyl nitrite, isooctyl nitrite, etc., and the nitrite used may be selected from sodium nitrite, potassium nitrite, etc.
The esterification reaction in the step (3) is carried out in an organic solvent, and the kind of the solvent is not particularly limited as long as the raw material can be dissolved and the reaction is not adversely affected, and examples thereof include dichloromethane, dichloroethane, benzene, toluene, xylene, and the like.
in the present invention, the fluorene oxime ester containing compound represented by the above formula (I) may be further represented by R1(one or two), R2Or R3Are polymerized in conjunction with each other to form a dimer. These dimerization products are considered to exhibit application properties similar to those of the fluorene-containing oxime ester photoinitiator represented by formula (I).
The invention also aims to provide application of the fluorene oxime ester containing photoinitiator shown in the formula (I) in a photocuring composition (namely a photosensitive composition). Without limitation, the photoinitiator may be applied to color Resists (RGB), Black Matrixes (BM), photo-spacers (photo-spacers), rib grids (rib), dry films, semiconductor photoresists, inks, and the like. The photoinitiator has excellent solubility, good storage stability and low exposure demand (namely high sensitivity), shows good developability and pattern integrity, has good surface curing effect, is not easy to yellow, and has good compound use effect with other conventional photoinitiators.
Detailed Description
the present invention will be described in further detail with reference to specific examples, which should not be construed as limiting the scope of the present invention.
Preparation examples
Example 1
(1) Preparation of intermediate 1a
Adding 83g of raw material 1a, 134g of aluminum trichloride and 100mL of dichloromethane into a 1000mL four-neck flask, cooling to 0 ℃ in an ice water bath, dropwise adding a mixed solution of 73g of raw material 1b and 50mL of dichloromethane, controlling the temperature to be below 10 ℃, continuously stirring for 2h after dropwise adding, continuously dropwise adding a mixed solution of 122g of raw material 1c and 100mL of dichloromethane, continuously stirring to room temperature after dropwise adding, and tracking and reacting a liquid phase to be complete. Then slowly pouring the materials into dilute hydrochloric acid prepared by 800g of ice water and 200mL of concentrated hydrochloric acid (37%), stirring while adding, then pouring into a separating funnel, separating a lower dichloromethane layer, continuously washing a water layer by using 50mL of dichloromethane, combining the dichloromethane layers, washing the dichloromethane layer by using 5% sodium bicarbonate aqueous solution (300 mL each time, 3 times in total), then washing the dichloromethane layer until the pH value is neutral, drying the dichloromethane layer by using 150g of anhydrous magnesium sulfate, filtering, then performing rotary evaporation on dichloromethane product solution, recrystallizing methanol, drying in an oven at 70 ℃ for 2 hours to obtain 200g of an intermediate 1a, wherein the yield is 83%, the purity is 98%, and MS (M/z):485(M +1)+ 。
(2) Preparation of intermediate 1b
Into a 500mL four-necked flask97g of intermediate 1a, 20g of 37% hydrochloric acid, 23g of isoamyl nitrite and 100mL of tetrahydrofuran were added thereto, and the mixture was stirred at room temperature for 5 hours to stop the reaction. The material was poured into a 2000mL beaker, 1000mL of water was added, stirring was carried out, 200mL of methylene chloride was used for extraction, and 50g of anhydrous MgSO was added to the extract4Drying, vacuum filtering, rotary evaporating the filtrate under reduced pressure to remove solvent, rotating the bottle to obtain oily viscous substance, pouring the viscous substance into 150mL petroleum ether, stirring, vacuum filtering to obtain white powdery solid, oven drying at 60 deg.C for 5 hr to obtain intermediate 1b 82g, yield 80%, purity 98%, MS (M/z):514(M +1)+。
(3) Synthesis of Compound 1
Adding 51g of intermediate 1b and 100mL of dichloromethane into a 250mL four-neck flask, stirring at room temperature for 5min, then dropwise adding 10g of propionyl chloride, continuing stirring for 2h after about 30min of dropwise addition is finished, and then adding 5% NaHCO3Adjusting pH of the aqueous solution to neutral, separating organic layer with separating funnel, washing with 200mL water for 2 times, 50g anhydrous MgSO4Drying, filtering, evaporating the solvent to obtain a viscous liquid, recrystallizing with methanol to obtain white solid powder, and filtering to obtain 49g of product with yield of 87% and purity of 99%.
The structure of the product was confirmed by hydrogen nuclear magnetic resonance spectroscopy and mass spectrometry.
1H-NMR（CDCl3，500MHz）：1.0267-1.0944（3H,t），1.5057-1.5151(5H，m），1. 6787-1.6999（4H，m），2.2006-2.3143（2H，d），3.8774（2H，s）7.1154-8.1367(15H，m）。
MS（m/z）:570(M+1)+ 。
Example 2
(1) Preparation of intermediate 1a
97g of raw material 2a, 134g of aluminum trichloride and 200mL of dichloromethane are added into a 1000mL four-neck flask, the temperature is reduced to 0 ℃ in an ice water bath, a mixed solution of 160g of raw material 2b and 100mL of dichloromethane is dropwise added, the temperature is controlled to be below 10 ℃, the dropwise addition is finished within about 2 hours, the stirring is continued for 2 hours after the dropwise addition is finished, and the liquid phase tracking reaction is carried out until the completion. Followed bySlowly pouring the mixture into dilute hydrochloric acid prepared from 800g of ice water and 300mL of concentrated hydrochloric acid (37%), stirring while adding, pouring into a separating funnel, separating a lower dichloromethane layer, continuously washing an aqueous layer with 50mL of dichloromethane, combining the dichloromethane layers, washing the dichloromethane layer with 5% aqueous solution of sodium bicarbonate (300 mL each time for 3 times), washing the dichloromethane layer with water until the pH value is neutral, drying the dichloromethane layer with 150g of anhydrous magnesium sulfate, filtering, rotary-steaming the dichloromethane product solution, recrystallizing with methanol, drying in an oven at 70 ℃ for 2h to obtain 232g of an intermediate 1 a', the yield is 85%, the purity is 98%, and MS (M/z):547(M +1)+ 。
(2) Preparation of intermediate 1b
A500 mL four-necked flask was charged with 109g of intermediate 1 a', 28g of hydroxylamine hydrochloride, 32g of sodium acetate, 150mL of ethanol, and 50mL of water, heated at 85 ℃ under reflux and stirred for 5 hours, and then the reaction was stopped. The material was poured into a 2000mL beaker, 1000mL of water was added, stirring was carried out, 200mL of methylene chloride was used for extraction, and 50g of anhydrous MgSO was added to the extract4Drying, vacuum filtering, rotary evaporating the filtrate under reduced pressure to remove solvent, rotating the bottle to obtain oily viscous substance, pouring the viscous substance into 150mL petroleum ether, stirring for precipitation, vacuum filtering to obtain white powdery solid, oven drying at 60 deg.C for 5 hr to obtain intermediate 1 b' 95g, yield 76%, purity 98%, MS (M/z):473(M +1)+。
(3) Synthesis of Compound 2
47g of intermediate 1 b' and 100mL of dichloromethane are added into a 250mL four-neck flask, stirred at room temperature for 5min, 22g of acetic anhydride is added dropwise, stirring is continued for 2h after about 30min of dropwise addition is finished, and then 5% NaHCO is added3Adjusting pH of the aqueous solution to neutral, separating organic layer with separating funnel, washing with 200mL water for 2 times, 50g anhydrous MgSO4Drying, filtering, evaporating the solvent to obtain a viscous liquid, recrystallizing with methanol to obtain white solid powder, and filtering to obtain 46g of product with yield of 84% and purity of 99%.
The structure of the product was confirmed by hydrogen nuclear magnetic resonance spectroscopy and mass spectrometry.
1H-NMR（CDCl3，500MHz）：1.0241-1.0811（6H,d），1.4002-1.4412(10H，m），1. 6098-1.6792（16H，m），2.0902 (6H，s），7. 2077-8.0423(6H，m）。
MS（m/z）:557(M+1)+ 。
Example 3
Compounds 3 to 18 shown in table 1 below were synthesized using the corresponding starting materials by the methods of examples 1 and 2.
TABLE 1
Evaluation of Performance
1. dissolution Performance test
The solubility of the photoinitiator in PGMEA is one of the parameters that represent its solubility and measure the performance of the photoinitiator. The solubility of the compound of formula (I) of the present invention in PGMEA at 25 ℃ was tested using the present invention and the prior art fluorenyloxime ester-containing photoinitiators as a comparison, and the results are shown in Table 2.
TABLE 2
From the above table, it can be seen that the solubility of the compound of the present invention and the comparative compounds a and B in PGMEA meet the requirement of greater than 8% by weight solubility for commercial applications, but the solubility of the compound of the present invention is relatively higher, essentially exceeding 20% (the solubility of compound 4 is close to 20%).
2. Film forming property, surface drying property and yellowing property test
The film-forming properties, the surface-drying properties and the yellowing properties of the photoinitiators of the formula (I) according to the invention were evaluated by formulating exemplary photocurable compositions.
(1) A photocurable composition was prepared as follows
200 parts by mass of an acrylic ester copolymer
[ benzyl methacrylate/methacrylic acid/hydroxyethyl methacrylate (molar ratio 70/10/20) copolymer (Mv: 10000) ]
100 parts by mass of dipentaerythritol hexaacrylate
0-5 parts by mass of conventional compound photoinitiator
0-2 parts of fluorene oxime ester photoinitiator
Butanone (solvent) 900 parts by mass
In the composition, the fluorene-containing oxime ester photoinitiator is a fluorene-containing oxime ester compound shown in formula (I) disclosed by the invention or a known fluorene-containing oxime ester photoinitiator in the prior art (used as a contrast); the conventional photoinitiator for compounding is a common commercial photoinitiator in the market, such as photoinitiators 184, 907, 1173, KIP150 and the like.
(2) film forming property
The exemplary photocurable composition having the above composition was stirred under a yellow light, taken out of a PET stencil and applied to a film by roll coating, and dried at 90 ℃ for 2min to give a coating film having a dry film thickness of 2 μm. The substrate on which the coating film was formed was cooled to room temperature, a mask plate was attached, and long-wavelength radiation was realized with a FWHM filter using a high-pressure mercury lamp 1PCS light source. Exposing the coating film by ultraviolet rays with the wavelength of 370-420nm through the gaps of the mask plate, and setting the exposure dose to be 60 mJ/cm2Subsequently, the resultant was immersed in a 2.5% sodium carbonate solution at 25 ℃ for 20 seconds for development, washed with ultrapure water, air-dried, hard-baked at 220 ℃ for 30 minutes to fix the pattern, and the obtained cured film was evaluated.
Light sensitivity
At the time of exposure, the minimum exposure amount at which the residual film ratio after development of the light-irradiated region in the exposure step is 90% or more is evaluated as the exposure demand. A smaller exposure requirement indicates a higher sensitivity.
Developability and pattern integrity
the substrate pattern was observed with a Scanning Electron Microscope (SEM) to evaluate developability and pattern integrity.
The developability was evaluated according to the following criteria:
O: no residue was observed in the unexposed parts;
Very good: a small amount of residue was observed in the unexposed parts, but the residue was acceptable;
●: a clear residue was observed in the unexposed parts.
pattern integrity was evaluated according to the following criteria:
O: no pattern defects were observed;
□: a small part of the pattern was observed to have some defects;
Solid content: many pattern defects were clearly observed.
(3) Yellowing property
An RW-UV.2BP ultraviolet aging test box is adopted to carry out an aging test, a light source is a high-pressure mercury lamp (dominant wavelength is 365nm, the power of the whole machine is about 2.2 KW), the finally obtained curing film is continuously irradiated for 6 hours, and the yellowing condition of the curing film is observed:
o: the coating is colorless and transparent, and the surface is smooth;
□: yellowish or sticky surface;
Solid content: yellowing of the surface or an increase in viscosity.
(4) Surface drying property
the exemplary photocurable composition having the above composition was stirred under a yellow light, taken out of a PET stencil and applied to a film by roll coating, and dried at 90 ℃ for 2min to give a coating film having a dry film thickness of 2 μm. The substrate on which the coating film was formed was cooled to room temperature, a mask plate was attached, and long-wavelength radiation was realized with a FWHM filter using a high-pressure mercury lamp 1PCS light source. Exposing the coating film by ultraviolet rays with the wavelength of 370-420nm through the gaps of the mask plate, and setting the exposure dose to be 60 mJ/cm2The surface of the cured film after exposure was evaluated by the finger-pressure method, and the surface of the cured film was observed by the finger-touch method, referring to GB 1728-79 surface drying time measurement method, and evaluated as follows:
A: the surface is smooth;
B: the surface is slightly sticky;
C: the surface was very sticky.
The evaluation results are shown in table 3.
TABLE 3
Examples/comparative examples Compounding conventional photoinitiator in parts by mass Containing fluorene oxime ester photoinitiator, mass portion Surface drying property developability Integrity of pattern Yellowing property
Example 10 184，3 Compounds 1, 2 A ○ ◇ ◇
Example 11 KIP150，3 Compounds 2, 2 A ○ ◇ ◇
Example 12 907，3 Compounds 4, 2 A ○ ◇ ◇
Example 13 907，3 compound 6, 2 A ○ ◇ ◇
Example 14 1173，3 Compounds 7, 2 A ○ ◇ ◇
Example 15 1173，3 Compound 9, 2 A ○ ◇ ◇
Example 16 184，3 Compound 9, 2 A ○ ◇ ◇
Example 17 compounds 1, 5 A ○ ◇ ◇
Example 18 Compounds 2, 5 A ○ ◇ ◇
example 19 Compound 6, 2 A ○ ◇ ◇
example 20 Compounds 7, 2 A ○ ◇ ◇
Example 21 Compounds 10, 5 A ○ ◇ ◇
Example 22 Compounds 12, 5 A ○ ◇ ◇
Example 23 Compound 15, 5 A ○ ◇ ◇
example 24 Compounds 18, 5 A ○ ◇ ◇
Comparative example 3 184，5 B ◎ □ □
Comparative example 4 907，5 B ◎ □ □
Comparative example 5 1173，3 Compound A, 2 B ◎ □ □
Comparative example 6 184，3 compounds B, 2 B ◎ □ □
Comparative example 7 Compound A, 5 B ○ ◇ □
Comparative example 8 Compounds B, 5 B ○ ◇ □
As can be seen from Table 3, when the fluorene-containing oxime ester photoinitiator is used in a photocuring composition, the photoinitiator has the characteristics of good developing effect and pattern integrity under the same exposure requirement no matter used alone or compounded with other conventional photoinitiators, and has excellent surface drying performance, yellowing resistance after film formation and obviously better overall application performance than the existing fluorene-containing oxime ester photoinitiators and commercially available conventional photoinitiators.
In conclusion, the fluorene-containing oxime ester photoinitiator shown in the formula (I) disclosed by the invention has excellent application performance, low cost of raw materials and preparation and good application prospect.

Claims (9)

1. A fluorene-containing oxime ester photoinitiator has a structure shown as the following formula (I):
wherein the content of the first and second substances,
R1Each independently represents hydrogen, C1-C10Straight or branched alkyl of (2), C4-C15Cycloalkylalkyl of (C)2-C10Chain of (2)Alkenyl, and-CH in these radicals2-is optionally substituted by-O-;
R2Represents C3-C15Cycloalkyl of, C4-C15And H on the cycloalkyl group in the cycloalkylalkyl group may be optionally substituted by C1-C4alkyl substitution of (a);
R3Represents C1-C10Straight or branched alkyl of (2), C3-C10Cycloalkyl radical, C4-C10Alkylcycloalkyl or cycloalkylalkyl, C6-C10Aryl of (C)7-C12Aralkyl group of (1);
X represents a void or a carbonyl group;
a represents C (R)2)＝N-O-CO-R3A group;
Y＝X。
2. The fluorenyloxime ester-containing photoinitiator according to claim 1, wherein: r1Each independently represents hydrogen, C1-C6Straight or branched alkyl of, or C4-C10Cycloalkylalkyl groups of (a).
3. The fluorenyloxime ester-containing photoinitiator according to claim 1, wherein: r2Represents C3-C6Cycloalkyl of, C4-C10And H on the cycloalkyl group in the cycloalkylalkyl group may be optionally substituted by C1-C4Alkyl substitution of (2).
4. The fluorenyloxime ester-containing photoinitiator according to claim 1, wherein: r3represents C1-C6Straight or branched alkyl of (2), C3-C6Cycloalkyl radical, C4-C10An alkylcycloalkyl or a cycloalkylalkyl group.
5. A method for preparing a fluorenyloxime ester photoinitiator according to any one of claims 1 to 4 comprising the steps of:
(1) Synthesis of intermediate a
Under the catalytic action of aluminum trichloride or zinc chloride, the raw material a and the raw material b generate Friedel-crafts acylation reaction in an organic solvent to obtain an intermediate a';
The starting material b is R2In' -CO-Cl, R2' represents R2or R2-CH2-, in particular, when X in formula (I) is null, then R2' represents R2When X is carbonyl, then R2' represents R2-CH2-；
(2) Synthesis of intermediate b
when X is empty, the intermediate a 'is subjected to oximation reaction under the action of hydroxylamine hydrochloride and sodium acetate to generate an intermediate b';
When X is carbonyl, under the existence of organic solvent and concentrated hydrochloric acid, the intermediate a 'and nitrite are subjected to oximation reaction at normal temperature to generate an intermediate b';
(3) Synthesis of Compounds of formula (I)
Intermediate b' with acid anhydride (R)3-CO)2O or acyl chloride compounds R3Carrying out esterification reaction on-CO-Cl to obtain a target product;
6. The method of claim 5, wherein: when X is empty, the oximation reaction of step (2) is carried out in a mixed solvent system of alcohol and water.
7. The method of claim 5, wherein: the nitrite is selected from ethyl nitrite, isoamyl nitrite and isooctyl nitrite, and the nitrite is selected from sodium nitrite and potassium nitrite.
8. Use of a fluorenyloxime ester containing photoinitiator according to any one of claims 1 to 4 in a photocurable composition.
9. Use of the fluorenyloxime ester photoinitiator according to any one of claims 1 to 4 in the production of color resists, black matrices, photo spacers, ribs, dry films, semiconductor photoresists and inks.
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WO2019120081A1 (en) * 2017-12-22 2019-06-27 常州强力先端电子材料有限公司 Photoinitiator containing fluorine fluorene oxime esters, photocurable composition comprising same, and application of photoinitiator
CN110066225B (en) * 2018-01-23 2022-06-03 常州强力先端电子材料有限公司 Dioxime ester photoinitiator, preparation method, photosensitive resin composition and application
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CN112010788B (en) * 2019-05-31 2022-10-21 常州强力先端电子材料有限公司 Non-ionic oxime ester photo-acid generator
CN112341359B (en) * 2019-08-07 2022-05-06 常州强力电子新材料股份有限公司 Fluorenoxime ester compound, preparation method and application thereof
CN110407716B (en) * 2019-08-16 2022-04-29 山东省化工研究院 Method for inhibiting nitroalkane in oximation process
CN110668971A (en) * 2019-10-24 2020-01-10 重庆沃肯精细化工有限公司 Asymmetric fluorene oxime ester compound, preparation method thereof and photosensitive composition
CN112851547A (en) * 2019-11-12 2021-05-28 常州强力先端电子材料有限公司 Fluorenoxime ester compound, preparation method thereof and photosensitive resin composition

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