CN107506538A - A kind of optics closes on the preprocess method of amendment technique - Google Patents
A kind of optics closes on the preprocess method of amendment technique Download PDFInfo
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- CN107506538A CN107506538A CN201710670732.5A CN201710670732A CN107506538A CN 107506538 A CN107506538 A CN 107506538A CN 201710670732 A CN201710670732 A CN 201710670732A CN 107506538 A CN107506538 A CN 107506538A
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- graph
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F30/00—Computer-aided design [CAD]
- G06F30/30—Circuit design
- G06F30/39—Circuit design at the physical level
- G06F30/392—Floor-planning or layout, e.g. partitioning or placement
Abstract
The present invention provides the preprocess method that a kind of optics closes on amendment technique, belongs to IC design technical field, including：First graph edge is extended into one first pre-determined distance to obtain the first figure of a rhombus towards figure outside；By second graph side towards one second pre-determined distance of extension on the outside of figure to obtain a pretreatment cover graphics, cover graphics will be pre-processed and extend one the 3rd pre-determined distance along the direction parallel with second graph side to obtain the cover graphics of first figure of covering part；" non-" processing of logic is carried out to the first figure and cover graphics to obtain second graph；Logical "or" processing is carried out to figure and second graph to obtain the first object figure with a chamfering breach；Tri filling is carried out to chamfering breach to obtain the second targeted graphical.Beneficial effects of the present invention：Improve the accuracy and uniformity of OPC results.
Description
Technical field
The present invention relates to IC design technical field, more particularly to a kind of optics to close on the pretreatment side of amendment technique
Method.
Background technology
Integrated circuit is published optics and closed in amendment (Optical Proximity Correction, OPC) processing procedure,
The uniformity of domain (layout) result is always one of difficult point, and same or like first object figure is complete by large area
After domain OPC processing, often there are OPC result differences, the reason for causing these differences a lot, the projection (Jog) in graph edge
It is one of them important factor.
In memory body IC products, repeatability unit occupies domain major part region.These repeatability units
With the same design configuration, designer wishes to obtain the same graphic result on silicon chip by mask plate.By domain solution
The influence of the factors such as analysis degree, in product publishes processing procedure, there may be subtle difference, such as graph edge for repeatability unit
Projection, these fine differences OPC processing is produced it is more influence because it changes the segmentation result of graph edge, and shadow
Ring final OPC results.In order to avoid the influence of the figure of these unfavorable OPC results, it is necessary to carrying out being based on model
OPC before processings pre-processed, reduce influence of the graph edge projection to OPC results.
In traditional OPC handling processes, removed using filling graph or figure to eliminate the small projection in figure, Fig. 1-
4 disclose one of processing method, and Fig. 1 is initial first object figure, and graph edge has a raised Jog, utilize
The DRC tool of Mentor companies finds qualified raised Jog first, as shown in Fig. 2 between raised Jog and its adjacent side JA
Into 270 degree of angles, as shown in figure 3, forming the minimum rectangle for including two sides according to raised Jog and graph edge JA distance relation
JF, merge initial first object figure and JF and obtain new first object figure, as a result such as Fig. 4.
It is raised (Jog) when figure on 45 degree of hypotenuses be present, figure projection can not be removed using traditional method, causes OPC
Exist in processing and correct abnormal possibility, or cause domain uniformity variation after OPC processing.It is convex in order to reduce figure on hypotenuse
Play the influence to OPC results, it is necessary to remove figure projection before progress OPC processing amendments, improve the accurate of OPC results
Property and uniformity.
The content of the invention
For problems of the prior art, the invention provides a kind of accuracy that can improve OPC results
The preprocess method of amendment technique is closed on the optics of uniformity.The present invention adopts the following technical scheme that：
A kind of optics closes on the preprocess method of amendment technique, suitable for removing figure using DRC instrument
Graph edge is raised, and the DRC instrument, which provides a grid and a reference axis, the figure, has multiple graph edges, fixed
Adopted one first adjacent graph edge raised with the graph edge and a second graph side, first graph edge and the graph edge
Projection on the inside of the figure into 225 °, the second graph side and the graph edge projection on the inside of the figure into 135 °,
The graph edge is raised to be overlapped with the X-axis of the reference axis or Y-axis, each graph edge and the raised position respectively of the graph edge
In on the grid；Methods described includes：
Step S1, first graph edge is extended into one first pre-determined distance to obtain a rhombus towards figure outside
First figure, first figure have one and the first short side of the raised coincidence of the graph edge, parallel with first short side
The second short side, with first graph edge overlap the first long side and second long side parallel with first long side；
Step S2, the second graph side is extended into one second pre-determined distance to obtain a pretreatment towards figure outside
Cover graphics, by the pretreatment cover graphics along the direction parallel with the second graph side extend one the 3rd pre-determined distance with
Obtain the cover graphics of the first figure described in a covering part；
Step S3, " non-" processing of logic is carried out to first figure and the cover graphics to obtain second graph；
Step S4, logical "or" processing is carried out to the figure and the second graph to obtain with a chamfering breach
First object figure；
Step S5, tri filling is carried out to the chamfering breach to obtain the second targeted graphical.
Preferably, the raised length of the graph edge is less than 5nm.
Preferably, the grid is the grid of the minimum precision with the DRC tool presets.
Preferably, first pre-determined distance is 5mm.
Preferably, second pre-determined distance is 5mm.
Preferably, in the step S3, removed after carrying out " non-" processing of the logic described in the cover graphics and part
First figure obtains the second graph, the second graph have overlapped with first short side the 3rd short side, with it is described
Second short side overlap and fourth short side parallel with the 3rd short side, first long side and with the second graph side abut
And the 3rd parallel long side.
Preferably, in the step S4, after carrying out the logical "or" processing, by the second graph and first mesh
Shape of marking on a map is converted to second targeted graphical after merging.
Beneficial effects of the present invention：By being pre-processed to graph edge projection, do not limited by graph edge projection length,
As long as determine the raised maximum length of graph edge, so that it may remove graph edge projection, graph edge projection can be eliminated to OPC results
Influence, improve the accuracy and uniformity of OPC results.
Brief description of the drawings
Fig. 1-4 is removed small raised one in figure to eliminate using filling graph or figure in the prior art
The schematic diagram of processing method；
Fig. 5 is in a preferred embodiment of the present invention, and a kind of optics closes on the flow of the preprocess method of amendment technique
Figure；
Fig. 6-14 is in a preferred embodiment of the present invention, and a kind of optics closes on showing for the preprocess method of amendment technique
It is intended to；
Figure 15-27 is in another preferred embodiment of the present invention, and a kind of optics closes on the preprocess method of amendment technique
Schematic diagram；
Figure 28 is the schematic diagram of the domain after OPC processing in the prior art；
Figure 29 is the schematic diagram of the domain after OPC processing in a preferred embodiment of the present invention.
Embodiment
It should be noted that in the case where not conflicting, following technical proposals, can be mutually combined between technical characteristic.
The embodiment of the present invention is further described below in conjunction with the accompanying drawings：
As shown in figures 5-13, a kind of optics closes on the preprocess method of amendment technique, suitable for using DRC
Instrument removes the graph edge projection 2 of figure 1, and above-mentioned DRC instrument provides a grid and a reference axis, above-mentioned figure 1
With multiple graph edges, one first graph edge 3 and a second graph side 4 of the definition with the adjoining of above-mentioned graph edge projection 2, above-mentioned the
One graph edge 3 with above-mentioned graph edge projection 2 in the above-mentioned inner side of figure 1 into 225 °, above-mentioned second graph side 4 and above-mentioned graph edge are convex
2 are played in the above-mentioned inner side of figure 1 into 135 °, above-mentioned graph edge projection 2 overlaps with the X-axis or Y-axis of above-mentioned reference axis, each above-mentioned figure
Shape side and above-mentioned graph edge projection 2 are located on above-mentioned grid respectively；The above method includes：
Step S1, above-mentioned first graph edge 3 is extended into one first pre-determined distance to obtain a rhombus towards the above-mentioned outside of figure 1
The first figure 5, above-mentioned first figure 5 have first short side 6 overlapped with above-mentioned graph edge raised 2, with it is above-mentioned first short
The second parallel short side 7 of side 6, the first long side 8 overlapped with above-mentioned first graph edge 3 and parallel with above-mentioned first long side 8 the
Two long sides 9；
Step S2, above-mentioned second graph side 4 is located in advance towards the above-mentioned outside of figure 1 one second pre-determined distance of extension with obtaining one
Manage cover graphics, by above-mentioned pretreatment cover graphics along parallel with above-mentioned second graph side 4 direction extension one the 3rd it is default away from
From to obtain the cover graphics 10 of above-mentioned first figure 5 of a covering part；
Step S3, " non-" processing of logic is carried out to above-mentioned first figure 5 and above-mentioned cover graphics 10 to obtain second graph
11；
Step S4, logical "or" processing is carried out to above-mentioned figure 1 and above-mentioned second graph 11 to obtain that there is a chamfering to lack
The first object figure 15 of mouth 16；
Step S5, tri filling is carried out to above-mentioned chamfering breach 16 to obtain the second targeted graphical 17.
In the present embodiment, by being pre-processed to graph edge projection 2, do not limited by raised 2 length of graph edge, only
Determine the maximum length of graph edge projection 2, so that it may remove graph edge projection 2, the raised 2 pairs of OPC results of graph edge can be eliminated
Influence, improve OPC results accuracy and uniformity.
The length of above-mentioned graph edge projection 2 is less than 5nm.
In preferred embodiment, above-mentioned grid is the net of the minimum precision with above-mentioned DRC tool presets
Lattice.
In preferred embodiment, above-mentioned first pre-determined distance is 5mm.
In preferred embodiment, above-mentioned second pre-determined distance is 5mm.
In preferred embodiment, in above-mentioned steps S3, above-mentioned cover graphics 10 are removed after carrying out " non-" processing of above-mentioned logic
Above-mentioned second graph 11 is obtained with above-mentioned first figure 5 in part, above-mentioned second graph 11 has what is overlapped with above-mentioned first short side 6
3rd short side 12, overlap with above-mentioned second short side 7 and fourth short side 13 parallel with above-mentioned 3rd short side 12, above-mentioned first long side
8 and abutted with above-mentioned second graph side 4 and the 3rd parallel long side 14.
In preferred embodiment, in above-mentioned steps S4, after carrying out above-mentioned logical "or" processing, by above-mentioned second graph 11 with
Above-mentioned first object figure 15 is converted to above-mentioned second targeted graphical 17 after merging.
When being handled using DRC instrument (Design Rule Check, DRC), the quantity of figure 1 can be more
Individual, the graph edge projection 2 on each figure 1 may have one may also have multiple, graph edge a kind of in Fig. 6-13 embodiment
The quantity of projection 2 is one.
In the present embodiment, select graph edge projection 2 to refer to using length in DRC tool selection initial target figure to be less than
5nm graph edge；
It is that rhombus refers to using DRC tool pair and graph edge projection 2 into 225 ° of the first graph edge 3 along reference axis stretching, extension hypotenuse
Stretched, respectively vertically left and right four direction towards being stretched to obtain polygon (the first figure 5) outside figure 1；
The graph edge intersected in selection initial graphics 1 with overlapping graph edge refers in figure 1, intersects with selected coincidence graph edge
And on the second graph side 4 at the outside of figure 1 angle at 45 °；
Extension second graph forms 4 past figures when cover graphics 10 refer to using DRC tool to selected second graph in 4 and extension
The outside of shape 1 extends, and extends to obtain pretreatment cover graphics along the direction of second graph side 4, extended range be graph edge projection 2 most
Long length, development length are the maximum length of 45 ° of hypotenuses.
Embodiment one
As shown in fig. 6, there is a graph edge projection 2 on figure 1, figure 1 has multiple graph edges, one of graph edge with
X-axis is at 45 °, and for graph edge projection 2 on 45 ° of hypotenuses, graph edge projection 2 is parallel with X-axis, and graph edge projection 2 is less than 5nm,
It is respectively the first graph edge 3 and the (general of graph edge projection 2 of second graph side 4 that definition connects two graph edges faced with graph edge projection 2
45 ° of hypotenuses are divided into the first graph edge 3 and second graph side 4), the phase of the first graph edge 3 and graph edge projection 2 on the inside of figure 1
It is 225 ° to angle, the property of second graph side 4 and graph edge projection 2 in the inner side of figure 1 is 135 ° to angle, all graph edges
It is all located at graph edge projection 2 on the figure lattice point of the grid based on minimum precision；
As shown in fig. 7, choosing short side of all length less than 5nm using DRC, these short sides are with X-axis into 0 ° or 90 °；
As shown in figure 8, choosing the first graph edge 3 for connecing and facing with short side using DRC, the stretching, extension (GROW) of DRC tool is utilized
Order, the first graph edge 3 is distinguished into up and down, left and right direction and attempts mobile first pre-determined distance 5nm respectively to form rhombus
The first figure 5, during trial, certain of the first figure 5 for only ultimately forming with short side while overlap then corresponding
The direction is correct moving direction, is that the first graph edge 3 moves right in Fig. 8, and the first figure 5 has what is overlapped with short side
First short side 6, second short side 7 parallel with above-mentioned first short side 6, the first long side 8 overlapped with above-mentioned first graph edge 3 and with
The second parallel long side 9 of above-mentioned first long side 8；
As shown in figure 9, utilize DRC outer distance (EXTERNAL) command selection second graph side 4, second graph side 4
Intersect with the first figure 5 and in the outside shape angle at 45 ° of figure 1, ordered using expansion (EXPAND) toward the outer expandable of figure 1
Second graph side 4 forms pretreatment cover graphics, and extended range is the second pre-determined distance 5nm, and edge is parallel with second graph side 4
Directional Extension pretreatment cover graphics with obtain cover image, first figure of covering part 5 of cover graphics 10；
As shown in Figure 10, " non-" processing of logic is carried out to the first figure 5 and cover graphics 10 to obtain second graph 11, the
Two figure 11=the first figure 5- cover graphics 10, Figure 11 is the partial enlarged drawing of A places hair in Figure 10, from Figure 10-Figure 11,
Second graph 11 has the 3rd short side 12 overlapped with above-mentioned first short side 6, overlapped with above-mentioned second short side 7 and with the above-mentioned 3rd
The 4th parallel short side 13 of short side 12, above-mentioned first long side 8 and abutted with above-mentioned second graph side 4 and the 3rd parallel long side
14。
As shown in figs. 10-12, logical "or" processing is carried out to figure 1 and second graph 11 to obtain that there is a chamfering breach
16 first object figure 15, first object figure 15=figure 1+ second graphs 11；
As illustrated in figs. 13-14, tri filling figure 18 is formed using outer distance (EXTERNAL) order of DRC tool,
The second targeted graphical 17 is obtained after carrying out tri filling to chamfering breach 16.
Embodiment two
As shown in figure 15, there are 2 graph edge projections 2 (short side EJA1 and EJA2 are graph edge projection 2) on figure 1, scheme
Shape 1 has multiple graph edges, and one of graph edge and X-axis are at 45 °, and graph edge projection 2 is on 45 ° of hypotenuses, short side EJA1
Parallel with X-axis, short side EJA2 is vertical with X-axis, before being pre-processed, first determines the maximum length of graph edge projection 2, it is assumed that figure
The maximum length of shape side projection 2 is 2nm, and the maximum length of 45 ° of hypotenuses is 300nm, when there is two graph edge projections on 45 ° of hypotenuses
When 2, then as shown in figure 15.
With continued reference to Figure 15, first with DRC tool select in figure PTA0 short side EJA1 of all length less than 2nm and
EJA2, these short sides and reference axis are into 0 degree or an angle of 90 degrees；
As shown in figure 16, the graph edge ESA adjacent with short side EJA1 and EJA2 is selected, graph edge ESA meets and short side
EJA1 and EJA2 is less than 300nm into 225 degree of angles, this body length of ESA；
As shown in figs. 17-18, ordered using the stretching, extension (GROW) of DRC tool, graph edge ESA difference is upward, under, it is left,
The right 2nm that stretches respectively forms rhombus, according to the order only towards the characteristic stretched outside figure, is formed respectively after stretching, extension polygon
Shape PGA1 and PGA2；
As shown in figure 19, selection has the polygon PGA1 on common side with short side EJA1, and selects to connect with short side EJA1 in PGA1
Tactile graph edge EGA1；
As shown in figure 20, selection has the polygon PGA2 on common side with short side EJA2, and selects to connect with short side EJA2 in PGA2
Tactile graph edge EGA2；
As shown in figure 21, ordered using the outer distance (EXTERNAL) of DRC tool, graph edge is selected in PTA0 kinds
EBA1, EBA1 and EGA1 intersect and the angle at 45 ° outside figure；
As shown in figure 22, PTA0 kinds selection graph edge EBA2, EBA2 and EGA2 intersect and outside figure it is at 45 °
Angle；
As shown in figure 23, (EXPAND) is utilized to order toward expanding EBA1, extended range 2nm outside figure, and along lines
Direction extends 300nm, forms overlay area PBA1；
As shown in figure 24, (EXPAND) is utilized to order toward expanding EBA2, extended range 2nm outside figure, and along lines
Direction extends 300nm, forms overlay area PBA2；
As shown in figure 25, " non-" logical operation is carried out to polygon PGA1 and overlay area PBA1 and obtains polygon PFA1,
PFA1=PGA1-PBA1；
As shown in figure 26, " non-" logical operation is carried out to polygon PGA2 and overlay area PBA2 and obtains polygon PFA2,
PFA2=PGA2-PBA2；
As shown in figure 27, targeted graphical PTA0 and polygon PFA1 and polygon PFA2 is carried out into "or" logical operation to obtain
To polygon PTA1, PTA1=PTA0+PFA1+PFA2.
After above-mentioned processing, new targeted graphical PTA1 graph edges 2 numbers of projection are reduced to 1 by 2.Repeat above-mentioned
Step, it can continue to reduce the graph edge projection 2 on 45 ° of hypotenuses, until eliminating the graph edge projection 2 on 45 ° of hypotenuses.
The graph edge projection 2 on 45 ° of hypotenuses is pre-processed by the present invention, not limited by raised 2 length of graph edge
System, as long as determining the maximum length of graph edge projection 2, it is possible to which the graph edge removed using the inventive method on 45 ° of hypotenuses is convex
Play 2.
Meanwhile if when multiple graph edge projection 2 on 45 ° of hypotenuses be present, repeat the above method, it is possible to progressively remove figure
Shape side projection 2, for the figure 1 with symmetry, or the repeat unit in domain, removing graph edge projection 2 can substantially change
The uniformity of result after kind OPC, so that it is guaranteed that final silicon chip result uniformity.
It is close in targeted graphical and in the case that surrounding environment is consistent when graph edge projection 2 on 45 ° of hypotenuses be present,
There is obvious difference in OPC results, as shown in figure 28, this can cause the inconsistent risk of final silicon chip result.Pass through this method
After being pre-processed to graph edge projection 2, the graph edge projection 2 on hypotenuse is eliminated, OPC is carried out with new targeted graphical
Amendment, the symmetry of OPC results be improved significantly, as shown in figure 29.Therefore, raised 2 energy of graph edge on 45 ° of hypotenuses are removed
Enough improve the uniformity of OPC results.
By explanation and accompanying drawing, the exemplary embodiments of the specific structure of embodiment are given, it is smart based on the present invention
God, it can also make other conversions.Although foregoing invention proposes existing preferred embodiment, however, these contents are not intended as
Limitation.
For a person skilled in the art, after reading described above, various changes and modifications undoubtedly will be evident.
Therefore, appended claims should regard whole variations and modifications of the true intention and scope that cover the present invention as.Weighing
Any and all scope and content of equal value, are all considered as still belonging to the intent and scope of the invention in the range of sharp claim.
Claims (7)
1. a kind of optics closes on the preprocess method of amendment technique, the figure suitable for removing figure using DRC instrument
Shape side is raised, and the DRC instrument, which provides a grid and a reference axis, the figure, has multiple graph edges, defines
One first raised adjacent graph edge and a second graph side with the graph edge, it is characterised in that first graph edge with
The graph edge projection is into 225 ° on the inside of the figure, and the second graph side is with the graph edge projection in the figure
Into 135 °, the graph edge is raised to be overlapped with the X-axis of the reference axis or Y-axis for side, each graph edge and the graph edge
It is raised to be located at respectively on the grid；Methods described includes：
Step S1, by the first graph edge towards one first pre-determined distance of extension on the outside of figure to obtain the first figure of a rhombus, the
One figure has first short side overlapped raised with graph edge, second short side parallel with the first short side and the first graph edge
The first long side and second long side parallel with the first long side overlapped；
Step S2, will by second graph side towards one second pre-determined distance of extension on the outside of figure to obtain a pretreatment cover graphics
Pretreatment cover graphics extend one the 3rd pre-determined distance to obtain a covering part first along the direction parallel with second graph side
The cover graphics of figure；
Step S3, " non-" processing of logic is carried out to the first figure and cover graphics to obtain second graph；
Step S4, logical "or" processing is carried out to figure and second graph to obtain the first object figure with a chamfering breach
Shape；
Step S5, tri filling is carried out to chamfering breach to obtain the second targeted graphical.
2. preprocess method according to claim 1, it is characterised in that the raised length of the graph edge is less than 5nm.
3. preprocess method according to claim 1, it is characterised in that the grid is with the DRC
The grid of the minimum precision of tool presets.
4. preprocess method according to claim 1, it is characterised in that first pre-determined distance is 5mm.
5. preprocess method according to claim 1, it is characterised in that second pre-determined distance is 5mm.
6. preprocess method according to claim 1, it is characterised in that in the step S3, carry out the logic " non-"
The cover graphics and part first figure are removed after processing and obtains the second graph, the second graph has and institute
State the first short side coincidence the 3rd short side, with second short side coincidence and fourth short side parallel with the 3rd short side, institute
State the first long side and threeth long side adjacent and parallel with the second graph side.
7. preprocess method according to claim 1, it is characterised in that in the step S4, carry out the logical "or"
After processing, second targeted graphical is converted to after the second graph is merged with the first object figure.
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| CN201710670732.5A CN107506538B (en) | 2017-08-08 | 2017-08-08 | Pretreatment method of optical proximity correction process |
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| CN109143773A (en) * | 2018-10-16 | 2019-01-04 | 上海华力微电子有限公司 | A kind of optics closes on the preprocess method before amendment |
| CN112051707A (en) * | 2020-09-25 | 2020-12-08 | 泉芯集成电路制造(济南)有限公司 | Optical proximity effect correction method and device |
| CN113495426A (en) * | 2020-04-08 | 2021-10-12 | 长鑫存储技术有限公司 | Optical proximity effect correction method and device |
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| CN109143773A (en) * | 2018-10-16 | 2019-01-04 | 上海华力微电子有限公司 | A kind of optics closes on the preprocess method before amendment |
| CN109143773B (en) * | 2018-10-16 | 2022-05-27 | 上海华力微电子有限公司 | Pretreatment method before optical proximity correction |
| CN113495426A (en) * | 2020-04-08 | 2021-10-12 | 长鑫存储技术有限公司 | Optical proximity effect correction method and device |
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| CN107506538B (en) | 2020-11-03 |
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