CN107475760A - A kind of preparation method of antistatic film material - Google Patents
A kind of preparation method of antistatic film material Download PDFInfo
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- CN107475760A CN107475760A CN201710784636.3A CN201710784636A CN107475760A CN 107475760 A CN107475760 A CN 107475760A CN 201710784636 A CN201710784636 A CN 201710784636A CN 107475760 A CN107475760 A CN 107475760A
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- film material
- antistatic
- preparation
- antistatic film
- alloy
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/54—Electroplating of non-metallic surfaces
- C25D5/56—Electroplating of non-metallic surfaces of plastics
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/10—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by other chemical means
- B05D3/101—Pretreatment of polymeric substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/12—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a coating with specific electrical properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/02—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber
- B05D7/04—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber to surfaces of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- General Chemical & Material Sciences (AREA)
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Abstract
The invention discloses a kind of preparation method of antistatic film material, antistatic agent solution and Mg/Zn alloy-layers are attached to polyethylene film substrate top layer and obtain antistatic film material by the step such as the technology utilization vacuum distillation, airless injection, electrochemical deposition, nitrogen protection cleaning, heating nature annealing.The antistatic film material being prepared, its manufacture craft is simple, antistatic effect is strong, has superior photoelectric properties, has preferable application prospect.
Description
Technical field
The present invention relates to thin-film material technical field, is related specifically to a kind of preparation method of antistatic film material.
Background technology
Functional film is the important kind in packaging material, often indispensable in some particular envelope fields
Material, in plastic package material, there is highly important status.With the fast development of electronics industry, electronic circuit board collection
Into degree more and more higher, the high density of electronic component on motherboard, compact, the even surface-adhered type element of wiring are adopted extensively
With being all easily caused electrostatic damage circuit board.Integrated circuit during mechanism of the U.S. is equipped to certain augmentative communication systems is tested
When, it is found that faulty integrated circuit has 1/3rd is punctured by static discharge.Packing product with antistatic film can
Avoid electrostatic damage integrated circuit.The generation of antistatic film production technology electrostatic has direct related to the insulating properties of object
Relation.The commodity that requirement of the different articles to the antistatic behaviour of packing film also differs do not need only to have in general resist it is quiet
Electrical property and need that there is certain electric conductivity.Therefore the difference according to the resistance of packaging material is needed to antistatic behaviour film
Carry out specification, classification.
The content of the invention
In order to solve the above technical problems, the present invention provides a kind of preparation method of antistatic film material, the technology utilization
The steps such as vacuum distillation, airless injection, electrochemical deposition, nitrogen protection cleaning, heating nature annealing by antistatic agent solution and
Mg/Zn alloy-layers are attached to polyethylene film substrate top layer and obtain antistatic film material.The antistatic film material being prepared
Material, its manufacture craft is simple, antistatic effect is strong, has superior photoelectric properties, has preferable application prospect.
The purpose of the present invention can be achieved through the following technical solutions:
A kind of preparation method of antistatic film material, comprises the following steps:
(1)Under nitrogen protection, polyethylene film substrate is placed in in excessive dimethyl sulfoxide (DMSO) the 8-10h that flows back, reaction finishes,
It is evaporated under reduced pressure and removes excessive dimethyl sulfoxide (DMSO), 65-80 DEG C of vacuum drying 2-4 hour;
(2)Under nitrogen protection, the polyethylene film substrate of above-mentioned processing is placed in vacuum chamber, will be anti-using pressurized jet method
Electrostatic solution is sprayed on top layer;
(3)Using three-electrode electro Chemical system, using by the use of the nickel dam prepared as working electrode, using platinum piece as to electricity
Pole, using Ag/AgCl as reference electrode, Mg/Zn alloy-layers are deposited in the electrolyte prepared, deposition process is at room temperature
Carried out without stirring, deposition is controlled by monitoring deposited charge amount, minute time 45-50, obtains Mg/Zn alloy prefabricated membranes;
(4)Alloy prefabricated membrane is cleaned with deionized water, and is 0.05m with flow3/ h nitrogen is dried 15 minutes;
(5)Then heated 30 minutes under 300-350 DEG C of furnace temperature, naturally cool to room temperature, get product.
Preferably, the step(2)In vacuum pressure be 3*10-2-5*10-2Pa。
Preferably, the step(2)In pressurized jet pressure be 5MPa, injection rate 25cm2/sec。
Preferably, the step(2)In antistatic solution composition for ethoxylated alkyl acid ammonium, glycerine-stearic acid
Ester, the cruel amine of ethyoxyl bay, deionized water quality ratio are 6:7:3:25 mixture solutions.
Compared with prior art, its advantage is the present invention:
(1)The preparation method of the antistatic film material of the present invention utilizes vacuum distillation, airless injection, electrochemical deposition, nitrogen
Antistatic agent solution and Mg/Zn alloy-layers are attached to polyethylene film substrate table by the steps such as protection cleaning, heating nature annealing
Layer obtains antistatic film material.The antistatic film material being prepared, its manufacture craft is simple, antistatic effect is strong, tool
There are superior photoelectric properties, there is preferable application prospect.
(2)The antistatic film material feedstock of the present invention is easy to get, technique is simple, is used suitable for heavy industrialization, practical
Property is strong.
Embodiment
The technical scheme of invention is described in detail with reference to specific embodiment.
Embodiment 1
(1)Under nitrogen protection, polyethylene film substrate is placed in in excessive dimethyl sulfoxide (DMSO) the 8h that flows back, reaction finishes, and subtracts
Excessive dimethyl sulfoxide (DMSO) is distilled off in pressure, and 65 DEG C are dried in vacuo 2 hours;
(2)Under nitrogen protection, the polyethylene film substrate of above-mentioned processing is placed in vacuum chamber, vacuum pressure 3*10-2Pa,
Using pressurized jet method, pressurized jet pressure is 5MPa, injection rate 25cm2/ sec, antistatic solution is sprayed on top layer,
The composition of antistatic solution is ethoxylated alkyl acid ammonium, glycerine-stearate, the cruel amine of ethyoxyl bay, deionized water quality
Than for 6:7:3:25 mixture solutions;
(3)Using three-electrode electro Chemical system, using by the use of the nickel dam prepared as working electrode, using platinum piece as to electricity
Pole, using Ag/AgCl as reference electrode, Mg/Zn alloy-layers are deposited in the electrolyte prepared, deposition process is at room temperature
Carried out without stirring, deposition is controlled by monitoring deposited charge amount, 45 minutes time, obtains Mg/Zn alloy prefabricated membranes;
(4)Alloy prefabricated membrane is cleaned with deionized water, and is 0.05m with flow3/ h nitrogen is dried 15 minutes;
(5)Then heated 30 minutes under 300 DEG C of furnace temperature, naturally cool to room temperature, get product.
The performance test results of obtained antistatic film material are as shown in table 1.
Embodiment 2
(1)Under nitrogen protection, polyethylene film substrate is placed in in excessive dimethyl sulfoxide (DMSO) the 10h that flows back, reaction finishes, and subtracts
Excessive dimethyl sulfoxide (DMSO) is distilled off in pressure, and 80 DEG C are dried in vacuo 4 hours;
(2)Under nitrogen protection, the polyethylene film substrate of above-mentioned processing is placed in vacuum chamber, vacuum pressure 5*10-2Pa,
Using pressurized jet method, pressurized jet pressure is 5MPa, injection rate 25cm2/ sec, antistatic solution is sprayed on top layer,
The composition of antistatic solution is ethoxylated alkyl acid ammonium, glycerine-stearate, the cruel amine of ethyoxyl bay, deionized water quality
Than for 6:7:3:25 mixture solutions;
(3)Using three-electrode electro Chemical system, using by the use of the nickel dam prepared as working electrode, using platinum piece as to electricity
Pole, using Ag/AgCl as reference electrode, Mg/Zn alloy-layers are deposited in the electrolyte prepared, deposition process is at room temperature
Carried out without stirring, deposition is controlled by monitoring deposited charge amount, 50 minutes time, obtains Mg/Zn alloy prefabricated membranes;
(4)Alloy prefabricated membrane is cleaned with deionized water, and is 0.05m with flow3/ h nitrogen is dried 15 minutes;
(5)Then heated 30 minutes under 350 DEG C of furnace temperature, naturally cool to room temperature, get product.
The performance test results of obtained antistatic film material are as shown in table 1.
Comparative example 1
(1)Under nitrogen protection, polyethylene film substrate is placed in in excessive dimethyl sulfoxide (DMSO) the 10h that flows back, reaction finishes, and subtracts
Excessive dimethyl sulfoxide (DMSO) is distilled off in pressure, and 80 DEG C are dried in vacuo 4 hours;
(2)Under nitrogen protection, the polyethylene film substrate of above-mentioned processing is placed in vacuum chamber, vacuum pressure 3*10-22Pa,
Using pressurized jet method, pressurized jet pressure is 5MPa, injection rate 25cm2/ sec, antistatic solution is sprayed on top layer,
The composition of antistatic solution is ethoxylated alkyl acid ammonium, glycerine-stearate, the cruel amine of ethyoxyl bay, deionized water quality
Than for 6:7:3:25 mixture solutions;
(3)With deionized water cleaning step(2)Thin-film material, and be 0.05m with flow3/ h nitrogen is dried 15 minutes;
(4)Then heated 30 minutes under 350 DEG C of furnace temperature, naturally cool to room temperature, get product.
The performance test results of obtained antistatic film material are as shown in table 1.
The obtained antistatic film material and commercially available common similar thin-film material of embodiment 1-2 and comparative example are entered respectively
This several row bulk resistor, the absorption coefficient of light, breakdown strength performance tests.
Table 1
Bulk resistor Ω .cm | Absorption coefficient of light dB/cm | Breakdown strength(Individual layer, V/ μm) | |
Embodiment 1 | 990 | 3.3919 | 380 |
Embodiment 2 | 995 | 3.3384 | 400 |
Comparative example 1 | 1200 | 2.8783 | 195 |
Commercially available film | 1500 | 3.0709 | 170 |
The preparation method of the antistatic film material of the present invention utilizes vacuum distillation, airless injection, electrochemical deposition, nitrogen protection
Antistatic agent solution and Mg/Zn alloy-layers are attached to polyethylene film substrate top layer and obtained by the steps such as cleaning, heating nature annealing
To antistatic film material.The antistatic film material being prepared, its manufacture craft is simple, antistatic effect is strong, it is excellent to have
Photoelectric properties more, there is preferable application prospect.The antistatic film material feedstock of the present invention is easy to get, technique is simple, is suitable to
Heavy industrialization uses, practical.
Embodiments of the invention are the foregoing is only, are not intended to limit the scope of the invention, it is every to utilize this hair
The equivalent structure or equivalent flow conversion that bright description is made, or directly or indirectly it is used in other related technology necks
Domain, it is included within the scope of the present invention.
Claims (4)
1. a kind of preparation method of antistatic film material, it is characterised in that comprise the following steps:
(1)Under nitrogen protection, polyethylene film substrate is placed in in excessive dimethyl sulfoxide (DMSO) the 8-10h that flows back, reaction finishes,
It is evaporated under reduced pressure and removes excessive dimethyl sulfoxide (DMSO), 65-80 DEG C of vacuum drying 2-4 hour;
(2)Under nitrogen protection, the polyethylene film substrate of above-mentioned processing is placed in vacuum chamber, will be anti-using pressurized jet method
Electrostatic solution is sprayed on top layer;
(3)Using three-electrode electro Chemical system, using by the use of the nickel dam prepared as working electrode, using platinum piece as to electricity
Pole, using Ag/AgCl as reference electrode, Mg/Zn alloy-layers are deposited in the electrolyte prepared, deposition process is at room temperature
Carried out without stirring, deposition is controlled by monitoring deposited charge amount, minute time 45-50, obtains Mg/Zn alloy prefabricated membranes;
(4)Alloy prefabricated membrane is cleaned with deionized water, and is 0.05m with flow3/ h nitrogen is dried 15 minutes;
(5)Then heated 30 minutes under 300-350 DEG C of furnace temperature, naturally cool to room temperature, get product.
2. the preparation method of antistatic film material according to claim 1, it is characterised in that the step(2)In
Vacuum pressure is 3*10-2-5*10-2Pa。
3. the preparation method of antistatic film material according to claim 1, it is characterised in that the step(2)In
Pressurized jet pressure is 5MPa, injection rate 25cm2/sec。
4. the preparation method of antistatic film material according to claim 1, it is characterised in that the step(2)In
The composition of antistatic solution is ethoxylated alkyl acid ammonium, glycerine-stearate, the cruel amine of ethyoxyl bay, deionized water quality
Than for 6:7:3:25 mixture solutions.
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CN201710784636.3A CN107475760A (en) | 2017-09-04 | 2017-09-04 | A kind of preparation method of antistatic film material |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102719012A (en) * | 2012-06-28 | 2012-10-10 | 天津市诺德塑胶有限公司 | Anti-static sheet composition and preparation method thereof |
CN102775762A (en) * | 2012-08-22 | 2012-11-14 | 江苏亚宝绝缘材料股份有限公司 | Anti-static resin composition |
CN105040055A (en) * | 2015-09-22 | 2015-11-11 | 太仓市金鹿电镀有限公司 | Zinc-magnesium alloy electroplating technology |
CN105924887A (en) * | 2016-05-16 | 2016-09-07 | 苏州新区华士达工程塑胶有限公司 | Polyformaldehyde-modified anti-static plastic |
CN106146871A (en) * | 2016-08-05 | 2016-11-23 | 广东正业科技股份有限公司 | A kind of anti-static sheet and preparation method thereof |
-
2017
- 2017-09-04 CN CN201710784636.3A patent/CN107475760A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102719012A (en) * | 2012-06-28 | 2012-10-10 | 天津市诺德塑胶有限公司 | Anti-static sheet composition and preparation method thereof |
CN102775762A (en) * | 2012-08-22 | 2012-11-14 | 江苏亚宝绝缘材料股份有限公司 | Anti-static resin composition |
CN105040055A (en) * | 2015-09-22 | 2015-11-11 | 太仓市金鹿电镀有限公司 | Zinc-magnesium alloy electroplating technology |
CN105924887A (en) * | 2016-05-16 | 2016-09-07 | 苏州新区华士达工程塑胶有限公司 | Polyformaldehyde-modified anti-static plastic |
CN106146871A (en) * | 2016-08-05 | 2016-11-23 | 广东正业科技股份有限公司 | A kind of anti-static sheet and preparation method thereof |
Non-Patent Citations (2)
Title |
---|
余赋生: "《烯烃聚合物结构性能与应用问题分析》", 31 August 2012 * |
齐贵亮等: "《塑料成型物料配制工》", 31 January 2012 * |
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