CN107445421A - The processing method of the mud containing vanadium caused by titanium tetrachloride vanadium removal - Google Patents
The processing method of the mud containing vanadium caused by titanium tetrachloride vanadium removal Download PDFInfo
- Publication number
- CN107445421A CN107445421A CN201710640714.2A CN201710640714A CN107445421A CN 107445421 A CN107445421 A CN 107445421A CN 201710640714 A CN201710640714 A CN 201710640714A CN 107445421 A CN107445421 A CN 107445421A
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- CN
- China
- Prior art keywords
- vanadium
- sedimentation
- caused
- titanium tetrachloride
- processing method
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F11/00—Treatment of sludge; Devices therefor
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/02—Halides of titanium
- C01G23/022—Titanium tetrachloride
- C01G23/024—Purification of tetrachloride
Abstract
The invention discloses a kind of processing method of the mud containing vanadium caused by titanium tetrachloride vanadium removal, the processing method of the mud containing vanadium caused by particularly a kind of titanium tetrachloride vanadium removal for being related to metallurgical environmental protection technical field.The processing method of the mud containing vanadium caused by the titanium tetrachloride vanadium removal of the present invention, vanadium slurry will be contained and be sent into from refining system slurry tank in sedimentation vapourizing furnace, carry out standing sedimentation；Standing sedimentation for a period of time after, clear liquid is sent back to again it is refined remove vanadium system, then bottom mud is evaporated, while increase the stirring frequency of agitator；When evaporation is completed, increase the stirring frequency of stirring again, and dry air is continually fed into vapourizing furnace, while open the exhaust gas valve of sedimentation vapourizing furnace, open tail gas elution device.Process simplification can be realized using the method for the present invention, effectively remove most chlorion and most carbon in refined tailings, and it is possible to prevente effectively from due to the difference of slip fluidity containing vanadium and caused by blockage problem.
Description
Technical field
The present invention relates to a kind of processing method of the mud containing vanadium caused by titanium tetrachloride vanadium removal, particularly one kind is related to metallurgy
The processing method of the mud containing vanadium caused by the titanium tetrachloride vanadium removal of environmental technology field.
Background technology
Titanium tetrachloride is a kind of important intermediate for producing titanium sponge and chloride process titanium dioxide.Vanadium is a kind of in titanium tetrachloride
Common foreign pigment element, its presence can have a negative impact to follow-up titanium sponge and chloride process titanium dioxide quality.Except four chlorinations
The method of content of vanadium in titanium, had studied tens of kinds, and pertinent literature and the Patents delivered are also up to hundreds of, but at present, aluminium
Powder removes vanadium and organic matter except vanadium is thick TiCl4Except the prevailing technology of vanadium.
Titanium tetrachloride can produce a large amount of titanium tetrachloride mud containing vanadium in subtractive process, and the final product of the mud containing vanadium refines
Tailings is TiCl4One of typical solid discarded object in production process.Substantial amounts of hydrochloric acid can be discharged in its stacking process, sternly
Heavily contaminated environment, while vanadium content is higher (about 5 ‰ or so) in slag, also result in the wasting of resources.At present, for thick four chlorination
Mud containing vanadium caused by titanium subtractive process, the lime cake that is insoluble in water is made in addition lime mainly after ore pulp evaporates
Method is stacked in slag field or is directly stacked at slag field, and the refined tailings that this mode obtains can not only carry out vanadium recovery, and
And the slag of generation takes large amount of land resources, adverse condition.For organic matter except caused mud containing vanadium during vanadium, due to having
Machine refines mud conditioning technique and there is no practical application, it is also possible to exists because organic residue containing vanadium is more sticky or organic mud containing vanadium
Infall process generates more sticky precipitum, is easily scabbed on equipment pipe and chamber wall, the problem of having a strong impact on heat transfer.
The content of the invention
The invention provides one kind can realize process simplification, effectively remove most chlorion in refined tailings
With most carbon, and it is possible to prevente effectively from due to the difference of slip fluidity containing vanadium and caused by the titanium tetrachloride of blockage problem remove
The processing method of the mud containing vanadium caused by vanadium.
The present invention is the processing method for the mud containing vanadium caused by used titanium tetrachloride vanadium removal that solves the above problems, and will be contained
Vanadium slurry is sent into sedimentation vapourizing furnace from refining system slurry tank, is carried out standing sedimentation, is started scraper plate while standing sedimentation
Device, agitator are stirred；Standing sedimentation for a period of time after, the clear liquid for settling vapourizing furnace middle and upper part is sent back to again and refined removes vanadium
System, then sedimentation evaporation furnace bottom mud is evaporated, while increases the stirring frequency of agitator；When evaporation is completed, then
The stirring frequency of secondary increase stirring, and dry air is continually fed into vapourizing furnace, while open sedimentation and open the useless of vapourizing furnace
Air valve, open tail gas elution device.
It is further that the time range of standing sedimentation is 4h to 6.
It is further that the time that is passed through of dry gas is 1.8h to 2.15h.
It is further that agitator slewing rate is 1r/min during standing sedimentation, stirring frequency is 10r/min during evaporation,
Stirring frequency is 20r/min when evaporation is completed.
It is further that vapourizing furnace temperature control is settled when being evaporated to mud at 300 DEG C to 305 DEG C.
The beneficial effects of the invention are as follows：The application will contain vanadium slurry and be pumped directly into sedimentation vapourizing furnace from refining system slurry tank
In, after sedimentation vapourizing furnace fills slurry containing vanadium, switching is pumped into valve, standing sedimentation, rise sedimentation vapourizing furnace after the completion of sedimentation
Temperature is evaporated directly in stove to bottom mud, is directly passed through dry air after the completion of evaporation into stove again, opens tail
Gas elution device.The sedimentation for needing separately to carry out originally, evaporation and calcining dechlorination etc. are simplified while improving and dechlorinating effect
Technique, avoid due to process procedure excessively and vanadium slip fluidity it is poor and caused by blockage problem.
Embodiment
The processing method of the mud containing vanadium, will contain vanadium slurry from refining system mud caused by the titanium tetrachloride vanadium removal of the present invention
Tank is sent into sedimentation vapourizing furnace, is carried out standing sedimentation, is started scraper plate device while standing sedimentation, agitator is stirred；It is quiet
After putting sedimentation a period of time, the clear liquid for settling vapourizing furnace middle and upper part is sent back to refine again and removes vanadium system, then sedimentation is evaporated
Furnace bottom mud is evaporated, while increases the stirring frequency of agitator；When evaporation is completed, increase the stirring frequency of stirring again
Rate, and dry air is continually fed into vapourizing furnace, while the exhaust gas valve that vapourizing furnace is opened in sedimentation is opened, open tail gas elution dress
Put.The application will contain vanadium slurry and will be pumped directly into from refining system slurry tank in sedimentation vapourizing furnace, when sedimentation vapourizing furnace is filled containing vanadium
After slurry, switching is pumped into valve, and standing sedimentation, rise, which settles, after the completion of sedimentation evaporates furnace temperature directly in stove to bottom mud
It is evaporated, is directly passed through dry air after the completion of evaporation into stove again, opens tail gas elution device.Improving the effect that dechlorinates
While simplify and need the sedimentation that separately carries out originally, the technique such as evaporation and calcining dechlorination, avoid due to process procedure mistake
More and vanadium slip fluidity it is poor and caused by blockage problem.
To make mud containing vanadium fully settle, the time range of its preferable standing sedimentation is 4h to 6h.
In order to improve dechlorination effect, dry gas is passed through time control in 1.8h to 2.15h.Wherein h is that unit is small
When
Agitator slewing rate is 1r/min during standing sedimentation, and stirring frequency is 10r/min during evaporation, and evaporation is stirred when completing
It is 20r/min to mix frequency.In order to ensure effect of settling, the appropriate stirring at low speed in sedimentation, and improve stirring speed in evaporation stage
Degree, can improve evaporation rate and evaporation effect, stirring frequency further be improved when evaporating and completing, after being favorably improved evaporation
Mud mobility.
Vapourizing furnace temperature control is settled when being evaporated to mud at 300 DEG C to 305 DEG C.In order to obtain preferably evaporation effect
Fruit, the temperature control of vapourizing furnace is settled in aforementioned range.
Embodiment：Using organic matter except mud containing vanadium caused by vanadium technique is raw material, specific embodiment is the present embodiment：
Vanadium slurry will be contained to be pumped directly into sedimentation vapourizing furnace from refining system slurry tank, contained when sedimentation vapourizing furnace fills 18t
After vanadium slurry, switching is pumped into valve, standing sedimentation；Start scraper plate device while standing sedimentation, agitator slewing rate is 1r/
Min, standing sedimentation 6h is treated, 12t supernatants are returned to the vanadium system of removing that refines again, rise evaporation furnace temperature is to 300 DEG C to 6t bottoms
Portion's mud is evaporated, while stirring frequency is increased into 10r/min；Using the sampled hole of sampling instrument, until stopping smoldering
When, confirm that slag has been completed to dry, the stirring frequency for increasing agitator again is 20r/min, while is continually fed into vapourizing furnace
Dry air, the exhaust gas valve at the top of vapourizing furnace is opened, open tail gas elution device, collect refined tailings.
Chloride ion content is only 2.15% in refined tailings after this PROCESS FOR TREATMENT, and carbon content is less than 0.05%.Common place
Chloride ion content is 21.8% in the refined tailings obtained under science and engineering skill, carbon content 16.8%.
Claims (5)
1. the processing method of the mud containing vanadium caused by titanium tetrachloride vanadium removal, it is characterised in that：Vanadium slurry will be contained from refining system mud
Starch tank to be sent into sedimentation vapourizing furnace, carry out standing sedimentation, start scraper plate device while standing sedimentation, agitator is stirred；
Standing sedimentation for a period of time after, by the clear liquid for settling vapourizing furnace middle and upper part send back to again it is refined remove vanadium system, then to sedimentation steaming
Hair furnace bottom mud is evaporated, while increases the stirring frequency of agitator；When evaporation is completed, increase the stirring frequency of stirring again
Rate, and dry air is continually fed into vapourizing furnace, while the exhaust gas valve that vapourizing furnace is opened in sedimentation is opened, open tail gas elution dress
Put.
2. the processing method of the mud containing vanadium caused by titanium tetrachloride vanadium removal as claimed in claim 1, it is characterised in that：It is heavy to stand
The time range of drop is 4h to 6h.
3. the processing method of the mud containing vanadium caused by titanium tetrachloride vanadium removal as claimed in claim 1, it is characterised in that：Dry gas
The time that is passed through of body is 1.8h to 2.15h.
4. the processing method of the mud containing vanadium caused by titanium tetrachloride vanadium removal as claimed in claim 1, it is characterised in that：It is heavy to stand
Agitator slewing rate is 1r/min during drop, and stirring frequency is 10r/min during evaporation, and stirring frequency is 20r/ when evaporation is completed
min。
5. the processing method of the mud containing vanadium caused by titanium tetrachloride vanadium removal as claimed in claim 1, it is characterised in that：To mud
Vapourizing furnace temperature control is settled when being evaporated at 300 DEG C to 305 DEG C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710640714.2A CN107445421A (en) | 2017-07-31 | 2017-07-31 | The processing method of the mud containing vanadium caused by titanium tetrachloride vanadium removal |
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| CN201710640714.2A CN107445421A (en) | 2017-07-31 | 2017-07-31 | The processing method of the mud containing vanadium caused by titanium tetrachloride vanadium removal |
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| CN107445421A true CN107445421A (en) | 2017-12-08 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108677035A (en) * | 2018-08-31 | 2018-10-19 | 攀钢集团攀枝花钢铁研究院有限公司 | Rotary kiln continuously roasts the method that titanium tetrachloride refines tailings dechlorination decarburization |
| CN115821067A (en) * | 2022-11-30 | 2023-03-21 | 攀钢集团攀枝花钢铁研究院有限公司 | Method for producing vanadium slag by refining vanadium-removing slurry and ore pulp evaporation furnace |
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| CN102009999A (en) * | 2010-11-23 | 2011-04-13 | 金川集团有限公司 | Method for recovering titanium tetrachloride |
| CN204224272U (en) * | 2014-11-11 | 2015-03-25 | 柳超 | Simple environment protection titanium tetrachloride mud treatment device |
| CN106745215A (en) * | 2016-01-25 | 2017-05-31 | 攀枝花学院 | The recoverying and utilizing method of the subtractive process distillation still raffinate of crude titanic chloride |
| CN106745216A (en) * | 2017-01-06 | 2017-05-31 | 云南冶金新立钛业有限公司 | The system and method for processing crude titanic chloride |
| CN106925009A (en) * | 2017-04-05 | 2017-07-07 | 攀钢集团研究院有限公司 | Organic matter removes vanadium mud equipment for separating liquid from solid and separation method |
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2017
- 2017-07-31 CN CN201710640714.2A patent/CN107445421A/en active Pending
Patent Citations (5)
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| CN102009999A (en) * | 2010-11-23 | 2011-04-13 | 金川集团有限公司 | Method for recovering titanium tetrachloride |
| CN204224272U (en) * | 2014-11-11 | 2015-03-25 | 柳超 | Simple environment protection titanium tetrachloride mud treatment device |
| CN106745215A (en) * | 2016-01-25 | 2017-05-31 | 攀枝花学院 | The recoverying and utilizing method of the subtractive process distillation still raffinate of crude titanic chloride |
| CN106745216A (en) * | 2017-01-06 | 2017-05-31 | 云南冶金新立钛业有限公司 | The system and method for processing crude titanic chloride |
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| 吴忆宁等: "《基础环境化学工程原理》", 30 June 2017, 哈尔滨工业大学出版社 * |
| 姜世光: "《无机盐工业新技术、新设备资料汇编》", 31 October 1983, 化学工业部科学技术情报研究所 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108677035A (en) * | 2018-08-31 | 2018-10-19 | 攀钢集团攀枝花钢铁研究院有限公司 | Rotary kiln continuously roasts the method that titanium tetrachloride refines tailings dechlorination decarburization |
| CN115821067A (en) * | 2022-11-30 | 2023-03-21 | 攀钢集团攀枝花钢铁研究院有限公司 | Method for producing vanadium slag by refining vanadium-removing slurry and ore pulp evaporation furnace |
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Application publication date: 20171208 |
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