CN107421638A - A kind of new optical diffraction analogy method and its device - Google Patents

A kind of new optical diffraction analogy method and its device Download PDF

Info

Publication number
CN107421638A
CN107421638A CN201710741785.1A CN201710741785A CN107421638A CN 107421638 A CN107421638 A CN 107421638A CN 201710741785 A CN201710741785 A CN 201710741785A CN 107421638 A CN107421638 A CN 107421638A
Authority
CN
China
Prior art keywords
diffraction
laser
wavelength
detector
new optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201710741785.1A
Other languages
Chinese (zh)
Other versions
CN107421638B (en
Inventor
李拓
周晓华
王娟
刘丹
刘辉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xijing University
Original Assignee
Xijing University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xijing University filed Critical Xijing University
Priority to CN201710741785.1A priority Critical patent/CN107421638B/en
Publication of CN107421638A publication Critical patent/CN107421638A/en
Application granted granted Critical
Publication of CN107421638B publication Critical patent/CN107421638B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

A kind of new optical diffraction analogy method, 1)Laser sends λ0Laser, and illuminate diffraction object;2)Shifting sledge, the diffraction distance z between light intensity detector and diffraction object is adjusted, makes z=λ Z/ λ0;Wherein, λ is the wavelength for treating analog light source, and Z is diffraction distance to be simulated, λ0For the wavelength of laser;3)Record diffraction pattern with light intensity detector, the diffraction pattern can analog light source wavelength be λ, the diffraction pattern of diffraction distance testing sample when being Z.A kind of and new optical diffraction analogue means, laser, collimator and extender device, testing sample, detector axis are to setting gradually, testing sample is arranged on objective table, so that after the collimated beam expander of collimated light beam that laser is sent expands, perpendicular through testing sample, and inject the working face of detector;Detector with graduated slide rail by being arranged on moveable platform.The present invention can still complete diffraction simulation process in the case where diffraction object is unknown.

Description

A kind of new optical diffraction analogy method and its device
Technical field
The present invention relates to optical diffraction analogue technique field, and in particular to a kind of new optical diffraction analogy method and its Device.
Background technology
As the development of computer technology and the birth of fast fourier transform algorithm show, in the feelings of known initial light field Under condition, people can accurately calculate diffraction pattern of the light of any wavelength at any distance.Well-known phase is extensive Double calculation method [Opt. Lett. 3,27-29 (1978)], coherent diffraction imaging method [Opt. Express 22,12513- 12523 (2014), Optica 30,9-14 (2016), Nature 467,436-439 (2010)] and digital hologram skill Art [Opt. Lett. 31,1414-1416, (2006);Opt. Lett. 34,250-252, (2009)] it is all based on spreading out Penetrate the computer modeling technique of process and grow up.Although however, calculate carry out optical diffraction analogy method have it is huge Big advantage, but there is also certain huge bottleneck.For example, when initial light field is unknown(Or the transmittance function of object is unknown In the case of), we just can not appliance computer simulation method obtain object diffraction pattern.
The content of the invention
In order to overcome the above-mentioned deficiency of prior art, it is an object of the invention to provide a kind of new optical diffraction simulation side Method and its device.Compared with current computer opticses analogy method, advantage is for the invention, without knowing the transmission of object in advance Rate harmonic function is distributed;It is simple and convenient, detector and CCD distance only need to be adjusted, directly shooting obtains the diffraction pattern of object Sample.
To achieve these goals, the technical solution adopted in the present invention is:A kind of new optical diffraction analogy method, With a kind of light of wavelength(Wavelength is λ0)Diffraction process simulate the diffraction process of the light of other any wavelength, entirely simulated Journey comprises the following steps:
1)It is λ that laser, which sends wavelength,0Laser, and illuminate diffraction object;
2)Shifting sledge, adjust the diffraction distance between light intensity detector and diffraction objectz, makez=λZ/λ0;Wherein, λ andZPoint The wavelength and diffraction distance corresponding to simulated diffraction process, λ Wei not treated0Employed in new optical diffraction analogy method Laser wavelength;
3)Record diffraction pattern with light intensity detector, the diffraction pattern be wavelength be λ, diffraction distance beZDiffraction pattern.
The mono-colour laser wavelength X0Can arbitrarily it choose.
The mono-colour laser is selected from He-Ne laser, semiconductor laser or solid state laser.
Diffraction distance regulation is necessarily equal to λ Z/ λ0
And a kind of new optical diffraction analogue means, including laser and detector, it is characterised in that laser, Collimator and extender device, testing sample, detector axis are to setting gradually, and testing sample is arranged on objective table so that laser is sent The collimated beam expander of collimated light beam expand after, perpendicular through testing sample, and inject the working face of detector;Detector passes through It is arranged on graduated slide rail on moveable platform.
The detector is ccd image sensor.
The moveable platform is one-dimensional moveable platform, and detector is only capable of in the slide rail of moveable platform along incidence The axial movement of light.
It is of the invention advantages below to be present compared with existing invention:
1)The present invention need not know the transmittance function of object;Computer simulation need to know that the transmittance function of object could be completed Simulation, thus the present invention can complete the simulation that computer can not be completed.
2)The present invention is simple in construction, and cost is low, it is only necessary to which a kind of LASER Light Source of wavelength can complete various different-wavebands Computer simulation.
3)Real-time of the present invention is high, it is only necessary to which laser irradiates the diffraction pattern that can obtain object in real time.
Disclosed novel optical analogue means is invented, is applicable to spreading out under object transmittance function unknown situation object Penetrate simulation.
Brief description of the drawings
Fig. 1 is the schematic diagram of the optical diffraction simulation system of the present invention;
Fig. 2 is the experimentalists and technicians figure of the present invention.
In figure, 1 is laser;2 be collimator and extender device;3 be to treat analog sample;4 be detector;5 be moveable platform.
Embodiment
In order to be better understood from the particular content of the present invention and implementation process, below in conjunction with Figure of description, to implementing New detailed process of three steps without lens coherent diffraction imaging method is described in detail.
Reference picture 1, a kind of light path system of new diffraction analogue means, 1 is the laser that wavelength is λ;2 are defined DS Beam device;3 be the unknown object of transmitance;4 be ccd image sensor;5 be one-dimensional moveable platform.Wavelength is used as λ0It is monochromatic Laser is as lighting source;The unknown object of transmittance function is placed on objective table;CCD is used for the diffraction pattern for recording object Sample;The distance between CCD and object can be adjusted by one-dimensional movement platform;The diffraction pattern of object is recorded with CCD.Laser produces After raw laser, after the collimated beam-expanding system of light, impinge perpendicularly on diffraction object.Due to the modulation of the fine structure of object, Light beam occurs diffraction and is transferred on detector, and detection records the diffraction pattern of object and image is transferred into calculating Machine.In Fig. 1, the distance between detector and object can be adjusted by adjusting the slide rail with graduated scale.
If with this device come to obtain wavelength be λ1, diffraction is apart from the diffraction pattern distribution for Z.Embodiment is as follows:
The first step:Use λ0Laser lighting object.
Second step:Shifting sledge, the diffraction distance between detector and diffraction object is adjusted, makes it equal to λ1Z/λ0
3rd:Diffraction pattern is recorded with detectorI 2(x,y).It is theoretical according to fresnel diffraction,I 1(x,y)=I 2(x,y), it is to obtain diffraction pattern distribution.(The diffraction pattern and wavelength to be obtained are λ1, diffraction distance isZDiffraction pattern Sample distribution is completely the same).So far, simulation process is completed.
The present invention operation principle be:
I 1(x,y)=I 2(x,y) principle prove it is as follows:
The diffraction light of different wave length follows unified fresnel diffraction formula.Basic fresnel diffraction formula from the point of view of us:
HereFT{ } represents Fourier transformation,U 0(x, y) represent object transmittance function,U(x, y) object diffraction pattern COMPLEX AMPLITUDE,λRepresent wavelength,zRepresent diffraction distance.Consider that wavelength isλ 1, diffraction distance bez 1It is λ with wavelength2, diffraction away from From for z2Two kinds of diffraction examples, according to equation(1)Shown Fresnel equation, the fresnel diffraction equation under two kinds of diffraction examples It is expressed as follows:
Ifλ 1z1=λ 2z2, we are readily obtained:
Wavelength isλ 1Light beam corresponding to the intensity distribution of diffraction pattern beI 1(x, y):
Wherein,U 1(x, y) represent that wavelength isλ 1Light beam corresponding to diffraction pattern COMPLEX AMPLITUDE.
Wavelength isλ 2Light beam corresponding to the intensity distribution of diffraction pattern beI 2(x, y):
Wherein,U 1(x, y) represent that wavelength isλ 1Light beam corresponding to diffraction pattern COMPLEX AMPLITUDE.
Thus, wavelength λ1And λ2Corresponding diffraction patternI 1(x,y) andI 1(x,y) equal, i.e.,
So we can be λ using wavelength1Light representations other wavelength light.
Embodiment 1
The experimental result that optical diffraction simulation is carried out using the present apparatus is as shown in Figure 2.In Fig. 2 series of drawing, 2a is diffraction object Transmitance is distributed, and different gray scales represent different transmitances in 2a, wherein white distribution expression is complete printing opacity herein, black part Divide and represent herein to be completely light tight.Gray value is lower, represents that light transmittance is poorer herein.Gray value is higher, represents printing opacity herein Rate is better.
In the present embodiment, using He-Ne laser as lighting source, the wavelength of He-Ne laser is 632.8nm.Fig. 2 b Be object under green laser 532nm illuminations, diffraction distance is the diffraction pattern corresponding to 356mm.2c is to be carried out with the present apparatus The diffraction pattern of simulation(He-Ne Lasers illuminates, and diffraction distance is equal to 300mm).Comparison diagram 2d and Fig. 2 e, it can be seen that diffraction Pattern is highly consistent, and the diffraction pattern of this explanation green glow, we use the present apparatus(Red illumination)It can still obtain.Similarly, scheme 2d objects are in the case where blue laser is 473nm illuminations, diffraction distance is diffraction pattern corresponding to 401mm.Fig. 2 e are with this device The diffraction pattern simulated(He-Ne Lasers illuminates, and diffraction distance is equal to 300mm).For Fig. 2 d and Fig. 2 e, it can be seen that Diffraction pattern is highly consistent.The diffraction pattern of blue light, we use the present apparatus(Red illumination)It can still obtain.Experiment effect above Fruit embodies the good simulation effect of this programme.

Claims (7)

1. a kind of new optical diffraction analogy method, other any wavelength are simulated with a kind of diffraction process of the light of wavelength The diffraction process of light, it is characterised in that:
1)It is λ that laser, which sends wavelength,0Laser, and illuminate diffraction object;
2)Shifting sledge, adjust the diffraction distance between light intensity detector and diffraction objectz, makez=λZ/λ0
Wherein, λ andZRespectively treat the wavelength and diffraction distance corresponding to simulated diffraction process, λ0Simulated for new optical diffraction Laser wavelength employed in method;
3)Record diffraction pattern with light intensity detector, the diffraction pattern as simulate obtained wavelength be λ, diffraction distance beZ Diffraction pattern.
A kind of 2. new optical diffraction analogy method according to claim 1, it is characterised in that the mono-colour laser Wavelength X0Can arbitrarily it choose.
A kind of 3. new optical diffraction analogy method according to claim 1, it is characterised in that the mono-colour laser It may be selected from He-Ne laser, semiconductor laser or solid state laser and cross other any type of lasers.
4. a kind of new optical diffraction analogy method according to claim 1, diffraction distance regulation is equal toλZ0
A kind of 5. device for being used to realize claim 1 methods described, it is characterised in that laser(1), collimator and extender device(2)、 Testing sample(3), detector(4)Set gradually vertically, testing sample(3)On objective table so that laser(1)Hair The collimated beam expander of collimated light beam gone out(2)After expansion, perpendicular through testing sample(3), and inject detector(4)Work Face;Detector(4)By being arranged on moveable platform with graduated slide rail(5)On.
A kind of 6. new optical diffraction analogue means according to claim 5, it is characterised in that the laser(1) For mono-colour laser.
A kind of 7. new optical diffraction analogue means according to claim 5, it is characterised in that the moveable platform (5)For one-dimensional moveable platform, detector(4)In moveable platform(5)Slide rail in along incident ray axial movement.
CN201710741785.1A 2017-08-25 2017-08-25 A kind of optical diffraction analogy method and its device Active CN107421638B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710741785.1A CN107421638B (en) 2017-08-25 2017-08-25 A kind of optical diffraction analogy method and its device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710741785.1A CN107421638B (en) 2017-08-25 2017-08-25 A kind of optical diffraction analogy method and its device

Publications (2)

Publication Number Publication Date
CN107421638A true CN107421638A (en) 2017-12-01
CN107421638B CN107421638B (en) 2019-09-06

Family

ID=60434882

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201710741785.1A Active CN107421638B (en) 2017-08-25 2017-08-25 A kind of optical diffraction analogy method and its device

Country Status (1)

Country Link
CN (1) CN107421638B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108760112A (en) * 2018-05-25 2018-11-06 中国科学院上海光学精密机械研究所 The stress measurement device and method of iterative algorithm are overlapped based on diffraction
CN114061769A (en) * 2021-11-19 2022-02-18 江苏科技大学 Device and method for measuring laser wavelength based on coaxial holographic self-focusing technology

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2410318A1 (en) * 2010-07-21 2012-01-25 Consiglio Nazionale Delle Ricerche Method and system for the acquisition of diffraction patterns
CN105137609A (en) * 2015-10-12 2015-12-09 中国科学院大学 Lamination imaging technology based on pre-lighting imaging
WO2016133760A1 (en) * 2015-02-18 2016-08-25 Becton, Dickinson And Company Optical detection systems and methods of using the same
CN106463367A (en) * 2014-03-03 2017-02-22 相干激光系统有限公司 Monitoring method and apparatus for control of excimer laser annealing

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2410318A1 (en) * 2010-07-21 2012-01-25 Consiglio Nazionale Delle Ricerche Method and system for the acquisition of diffraction patterns
CN106463367A (en) * 2014-03-03 2017-02-22 相干激光系统有限公司 Monitoring method and apparatus for control of excimer laser annealing
WO2016133760A1 (en) * 2015-02-18 2016-08-25 Becton, Dickinson And Company Optical detection systems and methods of using the same
CN105137609A (en) * 2015-10-12 2015-12-09 中国科学院大学 Lamination imaging technology based on pre-lighting imaging

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108760112A (en) * 2018-05-25 2018-11-06 中国科学院上海光学精密机械研究所 The stress measurement device and method of iterative algorithm are overlapped based on diffraction
CN114061769A (en) * 2021-11-19 2022-02-18 江苏科技大学 Device and method for measuring laser wavelength based on coaxial holographic self-focusing technology
CN114061769B (en) * 2021-11-19 2024-02-27 江苏科技大学 Method for measuring laser wavelength based on coaxial digital holographic self-focusing technology

Also Published As

Publication number Publication date
CN107421638B (en) 2019-09-06

Similar Documents

Publication Publication Date Title
JP5249202B2 (en) Phase search and synthesis of phase holograms
CN105445943A (en) Generation device and method of fractional-order perfect vortex beam
CN105467806B (en) Single pixel holography camera
US20210144278A1 (en) Compressed sensing based object imaging system and imaging method therefor
CN104279978A (en) Three-dimensional figure detecting device and measuring method
CN105717774A (en) Real-time recording apparatus and method for colorful digital holographic image
CN107421638A (en) A kind of new optical diffraction analogy method and its device
CN114754891B (en) Combustion flow field optical temperature field measuring device and measuring method
US11300800B2 (en) Pseudo speckle pattern generation device, pseudo speckle pattern generation method, observation device, and observation method
CN110119028A (en) Shaping algorithm and its optical path for the amplitude of arbitrary beam, phase and polarization
CN212933246U (en) Phase accelerated reading device for iteration based on single spectrum dynamic sampling
US7800035B2 (en) Optical wavefront control pattern generating apparatus and optical wavefront control pattern generating method
CN109643029A (en) Data creating device, light control device, data making method and data creating program
CN112666129B (en) Three-wavelength coherent diffraction imaging method considering refractive index difference
US20230101292A1 (en) Pseudo speckle pattern generation device, pseudo speckle pattern generation method, observation device, and observation method
Amaral et al. Tailoring speckles with Weibull intensity statistics
CN114488548B (en) Method and system for generating high-operability optical tweezers
CN114486812A (en) Complex amplitude imaging method and system
Cardoso et al. Simulation of a quantum jump in three-level systems using photonic Gaussian modes
CN105629695A (en) Phase lamination diffraction based holographic imaging method
CN114061769B (en) Method for measuring laser wavelength based on coaxial digital holographic self-focusing technology
WO2024031938A1 (en) Method for inverting concentration of sf6 decomposition component co2 on basis of isfo-vmd-kelm
JP2024047560A (en) Non-interfering, non-iterative complex amplitude readout method and apparatus - Patents.com
Cámara et al. Optical systems and algorithms for phase-space tomography of one-and two-dimensional beams
Pu et al. AI Enhances Femtosecond Spectral Interferometry

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant