CN107421638A - A kind of new optical diffraction analogy method and its device - Google Patents
A kind of new optical diffraction analogy method and its device Download PDFInfo
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Abstract
A kind of new optical diffraction analogy method, 1)Laser sends λ0Laser, and illuminate diffraction object;2)Shifting sledge, the diffraction distance z between light intensity detector and diffraction object is adjusted, makes z=λ Z/ λ0;Wherein, λ is the wavelength for treating analog light source, and Z is diffraction distance to be simulated, λ0For the wavelength of laser;3)Record diffraction pattern with light intensity detector, the diffraction pattern can analog light source wavelength be λ, the diffraction pattern of diffraction distance testing sample when being Z.A kind of and new optical diffraction analogue means, laser, collimator and extender device, testing sample, detector axis are to setting gradually, testing sample is arranged on objective table, so that after the collimated beam expander of collimated light beam that laser is sent expands, perpendicular through testing sample, and inject the working face of detector;Detector with graduated slide rail by being arranged on moveable platform.The present invention can still complete diffraction simulation process in the case where diffraction object is unknown.
Description
Technical field
The present invention relates to optical diffraction analogue technique field, and in particular to a kind of new optical diffraction analogy method and its
Device.
Background technology
As the development of computer technology and the birth of fast fourier transform algorithm show, in the feelings of known initial light field
Under condition, people can accurately calculate diffraction pattern of the light of any wavelength at any distance.Well-known phase is extensive
Double calculation method [Opt. Lett. 3,27-29 (1978)], coherent diffraction imaging method [Opt. Express 22,12513-
12523 (2014), Optica 30,9-14 (2016), Nature 467,436-439 (2010)] and digital hologram skill
Art [Opt. Lett. 31,1414-1416, (2006);Opt. Lett. 34,250-252, (2009)] it is all based on spreading out
Penetrate the computer modeling technique of process and grow up.Although however, calculate carry out optical diffraction analogy method have it is huge
Big advantage, but there is also certain huge bottleneck.For example, when initial light field is unknown(Or the transmittance function of object is unknown
In the case of), we just can not appliance computer simulation method obtain object diffraction pattern.
The content of the invention
In order to overcome the above-mentioned deficiency of prior art, it is an object of the invention to provide a kind of new optical diffraction simulation side
Method and its device.Compared with current computer opticses analogy method, advantage is for the invention, without knowing the transmission of object in advance
Rate harmonic function is distributed;It is simple and convenient, detector and CCD distance only need to be adjusted, directly shooting obtains the diffraction pattern of object
Sample.
To achieve these goals, the technical solution adopted in the present invention is:A kind of new optical diffraction analogy method,
With a kind of light of wavelength(Wavelength is λ0)Diffraction process simulate the diffraction process of the light of other any wavelength, entirely simulated
Journey comprises the following steps:
1)It is λ that laser, which sends wavelength,0Laser, and illuminate diffraction object;
2)Shifting sledge, adjust the diffraction distance between light intensity detector and diffraction objectz, makez=λZ/λ0;Wherein, λ andZPoint
The wavelength and diffraction distance corresponding to simulated diffraction process, λ Wei not treated0Employed in new optical diffraction analogy method
Laser wavelength;
3)Record diffraction pattern with light intensity detector, the diffraction pattern be wavelength be λ, diffraction distance beZDiffraction pattern.
The mono-colour laser wavelength X0Can arbitrarily it choose.
The mono-colour laser is selected from He-Ne laser, semiconductor laser or solid state laser.
Diffraction distance regulation is necessarily equal to λ Z/ λ0。
And a kind of new optical diffraction analogue means, including laser and detector, it is characterised in that laser,
Collimator and extender device, testing sample, detector axis are to setting gradually, and testing sample is arranged on objective table so that laser is sent
The collimated beam expander of collimated light beam expand after, perpendicular through testing sample, and inject the working face of detector;Detector passes through
It is arranged on graduated slide rail on moveable platform.
The detector is ccd image sensor.
The moveable platform is one-dimensional moveable platform, and detector is only capable of in the slide rail of moveable platform along incidence
The axial movement of light.
It is of the invention advantages below to be present compared with existing invention:
1)The present invention need not know the transmittance function of object;Computer simulation need to know that the transmittance function of object could be completed
Simulation, thus the present invention can complete the simulation that computer can not be completed.
2)The present invention is simple in construction, and cost is low, it is only necessary to which a kind of LASER Light Source of wavelength can complete various different-wavebands
Computer simulation.
3)Real-time of the present invention is high, it is only necessary to which laser irradiates the diffraction pattern that can obtain object in real time.
Disclosed novel optical analogue means is invented, is applicable to spreading out under object transmittance function unknown situation object
Penetrate simulation.
Brief description of the drawings
Fig. 1 is the schematic diagram of the optical diffraction simulation system of the present invention;
Fig. 2 is the experimentalists and technicians figure of the present invention.
In figure, 1 is laser;2 be collimator and extender device;3 be to treat analog sample;4 be detector;5 be moveable platform.
Embodiment
In order to be better understood from the particular content of the present invention and implementation process, below in conjunction with Figure of description, to implementing
New detailed process of three steps without lens coherent diffraction imaging method is described in detail.
Reference picture 1, a kind of light path system of new diffraction analogue means, 1 is the laser that wavelength is λ;2 are defined DS
Beam device;3 be the unknown object of transmitance;4 be ccd image sensor;5 be one-dimensional moveable platform.Wavelength is used as λ0It is monochromatic
Laser is as lighting source;The unknown object of transmittance function is placed on objective table;CCD is used for the diffraction pattern for recording object
Sample;The distance between CCD and object can be adjusted by one-dimensional movement platform;The diffraction pattern of object is recorded with CCD.Laser produces
After raw laser, after the collimated beam-expanding system of light, impinge perpendicularly on diffraction object.Due to the modulation of the fine structure of object,
Light beam occurs diffraction and is transferred on detector, and detection records the diffraction pattern of object and image is transferred into calculating
Machine.In Fig. 1, the distance between detector and object can be adjusted by adjusting the slide rail with graduated scale.
If with this device come to obtain wavelength be λ1, diffraction is apart from the diffraction pattern distribution for Z.Embodiment is as follows:
The first step:Use λ0Laser lighting object.
Second step:Shifting sledge, the diffraction distance between detector and diffraction object is adjusted, makes it equal to λ1Z/λ0。
3rd:Diffraction pattern is recorded with detectorI 2(x,y).It is theoretical according to fresnel diffraction,I 1(x,y)=I 2(x,y), it is to obtain diffraction pattern distribution.(The diffraction pattern and wavelength to be obtained are λ1, diffraction distance isZDiffraction pattern
Sample distribution is completely the same).So far, simulation process is completed.
The present invention operation principle be:
I 1(x,y)=I 2(x,y) principle prove it is as follows:
The diffraction light of different wave length follows unified fresnel diffraction formula.Basic fresnel diffraction formula from the point of view of us:
HereFT{ } represents Fourier transformation,U 0(x, y) represent object transmittance function,U(x, y) object diffraction pattern
COMPLEX AMPLITUDE,λRepresent wavelength,zRepresent diffraction distance.Consider that wavelength isλ 1, diffraction distance bez 1It is λ with wavelength2, diffraction away from
From for z2Two kinds of diffraction examples, according to equation(1)Shown Fresnel equation, the fresnel diffraction equation under two kinds of diffraction examples
It is expressed as follows:
Ifλ 1z1=λ 2z2, we are readily obtained:
Wavelength isλ 1Light beam corresponding to the intensity distribution of diffraction pattern beI 1(x, y):
Wherein,U 1(x, y) represent that wavelength isλ 1Light beam corresponding to diffraction pattern COMPLEX AMPLITUDE.
Wavelength isλ 2Light beam corresponding to the intensity distribution of diffraction pattern beI 2(x, y):
Wherein,U 1(x, y) represent that wavelength isλ 1Light beam corresponding to diffraction pattern COMPLEX AMPLITUDE.
Thus, wavelength λ1And λ2Corresponding diffraction patternI 1(x,y) andI 1(x,y) equal, i.e.,
So we can be λ using wavelength1Light representations other wavelength light.
Embodiment 1
The experimental result that optical diffraction simulation is carried out using the present apparatus is as shown in Figure 2.In Fig. 2 series of drawing, 2a is diffraction object
Transmitance is distributed, and different gray scales represent different transmitances in 2a, wherein white distribution expression is complete printing opacity herein, black part
Divide and represent herein to be completely light tight.Gray value is lower, represents that light transmittance is poorer herein.Gray value is higher, represents printing opacity herein
Rate is better.
In the present embodiment, using He-Ne laser as lighting source, the wavelength of He-Ne laser is 632.8nm.Fig. 2 b
Be object under green laser 532nm illuminations, diffraction distance is the diffraction pattern corresponding to 356mm.2c is to be carried out with the present apparatus
The diffraction pattern of simulation(He-Ne Lasers illuminates, and diffraction distance is equal to 300mm).Comparison diagram 2d and Fig. 2 e, it can be seen that diffraction
Pattern is highly consistent, and the diffraction pattern of this explanation green glow, we use the present apparatus(Red illumination)It can still obtain.Similarly, scheme
2d objects are in the case where blue laser is 473nm illuminations, diffraction distance is diffraction pattern corresponding to 401mm.Fig. 2 e are with this device
The diffraction pattern simulated(He-Ne Lasers illuminates, and diffraction distance is equal to 300mm).For Fig. 2 d and Fig. 2 e, it can be seen that
Diffraction pattern is highly consistent.The diffraction pattern of blue light, we use the present apparatus(Red illumination)It can still obtain.Experiment effect above
Fruit embodies the good simulation effect of this programme.
Claims (7)
1. a kind of new optical diffraction analogy method, other any wavelength are simulated with a kind of diffraction process of the light of wavelength
The diffraction process of light, it is characterised in that:
1)It is λ that laser, which sends wavelength,0Laser, and illuminate diffraction object;
2)Shifting sledge, adjust the diffraction distance between light intensity detector and diffraction objectz, makez=λZ/λ0;
Wherein, λ andZRespectively treat the wavelength and diffraction distance corresponding to simulated diffraction process, λ0Simulated for new optical diffraction
Laser wavelength employed in method;
3)Record diffraction pattern with light intensity detector, the diffraction pattern as simulate obtained wavelength be λ, diffraction distance beZ
Diffraction pattern.
A kind of 2. new optical diffraction analogy method according to claim 1, it is characterised in that the mono-colour laser
Wavelength X0Can arbitrarily it choose.
A kind of 3. new optical diffraction analogy method according to claim 1, it is characterised in that the mono-colour laser
It may be selected from He-Ne laser, semiconductor laser or solid state laser and cross other any type of lasers.
4. a kind of new optical diffraction analogy method according to claim 1, diffraction distance regulation is equal toλZ/λ0。
A kind of 5. device for being used to realize claim 1 methods described, it is characterised in that laser(1), collimator and extender device(2)、
Testing sample(3), detector(4)Set gradually vertically, testing sample(3)On objective table so that laser(1)Hair
The collimated beam expander of collimated light beam gone out(2)After expansion, perpendicular through testing sample(3), and inject detector(4)Work
Face;Detector(4)By being arranged on moveable platform with graduated slide rail(5)On.
A kind of 6. new optical diffraction analogue means according to claim 5, it is characterised in that the laser(1)
For mono-colour laser.
A kind of 7. new optical diffraction analogue means according to claim 5, it is characterised in that the moveable platform
(5)For one-dimensional moveable platform, detector(4)In moveable platform(5)Slide rail in along incident ray axial movement.
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN108760112A (en) * | 2018-05-25 | 2018-11-06 | 中国科学院上海光学精密机械研究所 | The stress measurement device and method of iterative algorithm are overlapped based on diffraction |
CN114061769A (en) * | 2021-11-19 | 2022-02-18 | 江苏科技大学 | Device and method for measuring laser wavelength based on coaxial holographic self-focusing technology |
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EP2410318A1 (en) * | 2010-07-21 | 2012-01-25 | Consiglio Nazionale Delle Ricerche | Method and system for the acquisition of diffraction patterns |
CN105137609A (en) * | 2015-10-12 | 2015-12-09 | 中国科学院大学 | Lamination imaging technology based on pre-lighting imaging |
WO2016133760A1 (en) * | 2015-02-18 | 2016-08-25 | Becton, Dickinson And Company | Optical detection systems and methods of using the same |
CN106463367A (en) * | 2014-03-03 | 2017-02-22 | 相干激光系统有限公司 | Monitoring method and apparatus for control of excimer laser annealing |
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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EP2410318A1 (en) * | 2010-07-21 | 2012-01-25 | Consiglio Nazionale Delle Ricerche | Method and system for the acquisition of diffraction patterns |
CN106463367A (en) * | 2014-03-03 | 2017-02-22 | 相干激光系统有限公司 | Monitoring method and apparatus for control of excimer laser annealing |
WO2016133760A1 (en) * | 2015-02-18 | 2016-08-25 | Becton, Dickinson And Company | Optical detection systems and methods of using the same |
CN105137609A (en) * | 2015-10-12 | 2015-12-09 | 中国科学院大学 | Lamination imaging technology based on pre-lighting imaging |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN108760112A (en) * | 2018-05-25 | 2018-11-06 | 中国科学院上海光学精密机械研究所 | The stress measurement device and method of iterative algorithm are overlapped based on diffraction |
CN114061769A (en) * | 2021-11-19 | 2022-02-18 | 江苏科技大学 | Device and method for measuring laser wavelength based on coaxial holographic self-focusing technology |
CN114061769B (en) * | 2021-11-19 | 2024-02-27 | 江苏科技大学 | Method for measuring laser wavelength based on coaxial digital holographic self-focusing technology |
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