CN107413747A - A kind of cleaning device and clean method - Google Patents
A kind of cleaning device and clean method Download PDFInfo
- Publication number
- CN107413747A CN107413747A CN201710868553.2A CN201710868553A CN107413747A CN 107413747 A CN107413747 A CN 107413747A CN 201710868553 A CN201710868553 A CN 201710868553A CN 107413747 A CN107413747 A CN 107413747A
- Authority
- CN
- China
- Prior art keywords
- cleaning solution
- passage
- photoresist
- cleaning
- export
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
Abstract
A kind of cleaning device, including extend vertically through photoresist nozzle and be symmetricly set on the cleaning solution passage of photoresist discharge passage both sides and be symmetricly set on the cleaning solution traffic organising unit that photoresist jet expansion coordinates with photoresist nozzle；Wherein, the cleaning solution traffic organising unit is internally provided with the cleaning solution export passage connected with cleaning solution passage and is arranged on the scattered groove that cleaning solution export channel exit is used to disperse cleaning solution.Timing can be achieved and quantitatively produce automatic cleaning function, cleaned without manpower, from production and manpower loss caused by cleaning of the manpower for photoresist nozzle outer surface.
Description
Technical field
The present invention is a kind of cleaning device and clean method for glass substrate photoresist coating gluing machine nozzle.
Background technology
Scratch glue spreader to be mainly responsible for carrying out glass substrate photoresist (i.e. photoresistance) coating, coating method is photoresist nozzle
Scratched in discharge photoresist, uniform one layer of photoresist is coated with out on the glass substrate, for works such as follow-up exposure imagings
Sequence etches the pattern of still image.
After current photoresist nozzle is often coated with a number of glass substrate, because photoresistance can be in photoresist jet expansion
Dry chip can be formed after place's cohesion solvent volatilization, causes the generation for scratching the abnormal quality such as wire ripple and condensation product, needs
Photoresist jet expansion position is cleaned manually, it is cumbersome and time consuming, also delay normal production, cause production not
Continuously, and every time also need to reaffirm the unusual conditions such as non-ripple after the completion of cleaning, influence normally to produce.Existing photoresist spray
The clean method in mouth exit is mainly that cleaning solution cleaning photoresist protrusion passage and scraping blade scrape photoresist nozzle exit
Keep photoresist knifing surface uniformity and clean the photoresist that photoresist nozzle exit easily condenses position, by such a method
It is inadequate that the cleaning dynamics at position is easily condensed to photoresist nozzle exit, at regular intervals or after coating certain amount substrate,
Photoresist nozzle exit, which easily condenses position, can condense photoresistance, it is necessary to which manpower is cleaned to complete the cleaning of photoresist nozzle.
And manpower cleaning cleans gimmick to personnel and requires higher, the used time is longer, and the influence such as confirmation after cleaning normally produces.
The content of the invention
The shortcomings that in order to improve above-mentioned technology, from caused by cleaning of the manpower for photoresist nozzle outer surface production and
Manpower loss, there is provided a kind of cleaning device and clean method.
One kind is used for cleaning device, and photoresist nozzle center is provided through the photoresist discharge passage of photoresist nozzle,
Also include extending vertically through photoresist nozzle and being symmetricly set on the cleaning solution passage of photoresist discharge passage both sides and symmetrically set
Put the cleaning solution traffic organising unit coordinated in photoresist jet expansion and photoresist nozzle；
Wherein, the cleaning solution traffic organising unit is internally provided with the cleaning solution export passage connected with cleaning solution passage
And the scattered groove that cleaning solution export channel exit is used to disperse cleaning solution is arranged on, cleaning solution flows through cleaning solution and led to successively
Road, cleaning solution export passage and scattered groove flow to the outlet of photoresist nozzle.
Described cleaning device, wherein, the cleaning solution export passage includes main cleaning solution export passage and sub- cleaning solution
Passage is exported, the main cleaning solution export passage is located along the same line with cleaning solution passage, the sub- cleaning solution export passage
Connected with main cleaning solution export passage and export passage, the outlet of the sub- cleaning solution export passage and institute perpendicular to main cleaning solution
State scattered groove connection.
Described cleaning device, wherein, the scattered groove is located at the 1/2 of the cleaning solution traffic organising cell height
Place.
Described cleaning device, wherein, the scattered groove is provided with for clear close to the side of photoresist jet expansion
The cleaning solution outlet that clean liquid stream goes out.
Described cleaning device, wherein, the cleaning solution outlet is the curved surface around photoresist jet expansion position, described
Curved surface is parallel with the surface of photoresist jet expansion position, and with the surface of photoresist jet expansion position at a distance of 2-3mm.
Described cleaning device, wherein, include protecting the anti-collision beam of photoresist jet expansion, the anti-collision beam is set
Put on cleaning solution traffic organising unit and positioned at the side of photoresist jet expansion.
Described cleaning device, wherein, in addition to for air-drying the air blowing air-dry apparatus of cleaning solution, described blow air-dries dress
Put and connected with cleaning solution feeder connection.
Described cleaning device, wherein, cleaning solution traffic organising unit is bolted on photoresist jet expansion position
Put.
A kind of method for cleaning photoresist nozzle, comprise the following steps：
Step 1：Cleaning solution is poured into cleaning solution feeder connection, the cleaning solution flows through cleaning solution passage, cleaning solution successively
Export passage, scattered groove and cleaning solution outlet；
Step 2：After liquid cleaning to be cleaned, cleaning solution entrance is connected to cleaning solution passage with air blowing air-dry apparatus
Blow, the air-dried gas flows through cleaning solution passage, cleaning solution export passage, scattered groove and cleaning solution outlet successively.
The present invention has advantages below：Cleaning solution traffic organising unit is set in photoresist jet expansion positional symmetry, made
Cleaning solution can be evenly flow to photoresist nozzle exit, fully cleaning condenses in the photoetching of photoresist jet expansion position
Glue.
Blow-dry device is set, carries out outlet drying action, the cleaning solution for remaining in photoresist jet expansion position is remained
Drying.Timing can be achieved and quantitatively produce automatic cleaning function, cleaned without manpower, from manpower for photoresist nozzle appearance
Production and manpower loss caused by the cleaning in face.
Cleaning solution export passage and scattered groove are provided with described cleaning solution cleaning solution traffic organising unit, will be clear
Clean liquid uniformly flows to photoresist jet expansion position after scattered groove, and then flows to photoresist multi-angle is multidirectional
The position of photoresist is condensed at nozzle, completes cleaning.
Clean liquid export passage includes the clean liquid export passage of main clean liquid export passage and son and each serves as shunting action, makes liquid
Uniformly comprehensively flow to the position that photoresist nozzle needs to clean.
Anti-collision beam is set, and during nozzle movement, anti-collision beam is located at the front of jet expansion, and anti-collision beam first passes through
The projection of glass substrate is crossed, the projection on glass substrate is removed, avoids and photoresist nozzle exit is caused to hit, and it is anti-
Hit crossbeam do not influence scraping blade scrape action carry out.
Brief description of the drawings
The invention will be described in more detail below based on embodiments and refering to the accompanying drawings.Wherein：
Fig. 1 is cleaning device positive view of the present invention；
Fig. 2 is cleaning device left view of the present invention；
Fig. 3 is cleaning solution traffic organising unit top view of the present invention.
In the accompanying drawings, identical part uses identical reference.Accompanying drawing is not according to the ratio of reality.
Embodiment
Below in conjunction with accompanying drawing, the invention will be further described.
As shown in figure 1, being the positive view of cleaning device of the present invention, photoresist nozzle 1 is justified for Upper cylindrical shape bottom
Cone-shaped, cylindrical center's line are located along the same line with circular cone center line.Photoresist passage 3 runs through the center of photoresist nozzle 1.
Described cleaning device includes：Extend vertically through photoresist nozzle 1 and be symmetricly set on the cleaning solution of the both sides of photoresist discharge passage 3
Passage 4 and the cleaning solution traffic organising unit 2 for being symmetricly set on the outlet of photoresist nozzle 1 and the cooperation of photoresist nozzle 1；
Wherein, it is logical to be internally provided with the cleaning solution export connected with cleaning solution passage 4 for the cleaning solution traffic organising unit 2
Road 5 and the scattered groove 6 that cleaning solution export passage 5 exit is used to disperse cleaning solution is arranged on, cleaning solution flows through clearly successively
Clean liquid passage 4, cleaning solution export passage 5 and scattered groove 6 flow to the outlet of photoresist nozzle.
The cleaning solution export passage 5 includes main cleaning solution export passage 50 and sub- cleaning solution export passage, and the master is clear
Clean liquid export passage 50 is located along the same line with cleaning solution passage 4, and the sub- cleaning solution export passage exports with main cleaning solution
Passage 50 connects and exports passage, the outlet of the sub- cleaning solution export passage and the scattered groove 6 perpendicular to main cleaning solution
Connection.The sub- cleaning solution export passage is multiple, as shown in figure 3, clear including first the 51, second son of sub- cleaning solution export passage
Clean liquid export passage 52 and the 3rd sub- cleaning solution export passage 53, the 51, second son of the first sub- cleaning solution export passage are clear
The outlet of clean liquid export passage 52 and the 3rd sub- cleaning solution export passage 53 is evenly distributed on the diverse location of scattered groove, with
Cleaning solution is set uniformly to flow out.As shown in Fig. 2 the scattered groove 6 is located at the cleaning solution traffic organising cell height
1/2 at, the scattered groove 6 goes out being provided with the cleaning solution for cleaning solution outflow close to the side of photoresist jet expansion
Mouthful.
As shown in figures 1 and 3, the cleaning solution outlet is to surround the curved surface of photoresist jet expansion position, the curved surface
It is parallel with the surface 72 of photoresist jet expansion position, and with the surface of photoresist jet expansion position at a distance of 2-3mm.
As shown in figure 1, described cleaning device, includes protecting the anti-collision beam 8 of photoresist jet expansion, the anticollision
Crossbeam 8 is arranged on cleaning solution traffic organising unit 2 and positioned at the side of photoresist jet expansion.
Described cleaning device, in addition to the air blowing air-dry apparatus (not drawn out in figure) of cleaning solution is described to be blown for air-drying
Gas air-dry apparatus is conventional blow-dry device, including controls electronic box, and air flow-producing device, cylinder and gas blow pipe etc. are (herein no longer
Repeat).The air blowing air-dry apparatus connects with cleaning solution feeder connection, and Fig. 1 directions of arrow are gas flow direction and cleaning
Liquid circulating direction.
The cleaning solution traffic organising unit 2 is bolted on photoresist jet expansion position.
A kind of method for cleaning photoresist nozzle, it is characterised in that comprise the following steps：
Step 1：Cleaning solution is poured into cleaning solution feeder connection, the cleaning solution flows through cleaning solution passage, cleaning solution successively
Export passage, scattered groove and cleaning solution outlet；
Step 2：After liquid cleaning to be cleaned, cleaning solution entrance is connected to cleaning solution passage with air blowing air-dry apparatus
Blow, the air-dried gas flows through cleaning solution passage, cleaning solution export passage, scattered groove and cleaning solution outlet successively.
The cleaning solution traffic organising unit, convenient dismounting are fixed with bolt.
Cleaning solution traffic organising unit is set in photoresist jet expansion positional symmetry, enables the stream of cleaning solution evenly
To photoresist nozzle exit, fully cleaning condenses in the photoresist of photoresist jet expansion position.
Blow-dry device is set, carries out outlet drying action, the cleaning solution for remaining in photoresist jet expansion position is remained
Drying.Timing can be achieved and quantitatively produce automatic cleaning function, cleaned without manpower, from manpower for photoresist nozzle appearance
Production and manpower loss caused by the cleaning in face.
Cleaning solution export passage and scattered groove are provided with described cleaning solution cleaning solution traffic organising unit, will be clear
Clean liquid uniformly flows to photoresist jet expansion position after scattered groove, and then flows to photoresist multi-angle is multidirectional
The position of photoresist is condensed at nozzle, completes cleaning.
Clean liquid export passage includes the clean liquid export passage of main clean liquid export passage and son and each serves as shunting action, makes liquid
Uniformly comprehensively flow to the position that photoresist nozzle needs to clean.
Anti-collision beam is set, and during nozzle movement, anti-collision beam is located at the front of jet expansion, and anti-collision beam first passes through
The projection of glass substrate is crossed, the projection on glass substrate is removed, avoids and photoresist nozzle exit is caused to hit, and it is anti-
Hit crossbeam do not influence scraping blade scrape action carry out.
Although by reference to preferred embodiment, invention has been described, is not departing from the situation of the scope of the present invention
Under, various improvement can be carried out to it and part therein can be replaced with equivalent.Especially, as long as being rushed in the absence of structure
Prominent, the every technical characteristic being previously mentioned in each embodiment can combine in any way.The invention is not limited in text
Disclosed in specific embodiment, but all technical schemes including falling within the scope of the appended claims.
Claims (9)
1. a kind of cleaning device, for cleaning photoresist nozzle, photoresist nozzle center is provided through the light of photoresist nozzle
Photoresist discharge passage, it is characterised in that the cleaning device includes extending vertically through photoresist nozzle and is symmetricly set on photoresist
The cleaning solution passage of discharge passage both sides and it is symmetricly set on the cleaning solution that photoresist jet expansion and photoresist nozzle coordinate
Traffic organising unit；
Wherein, the cleaning solution traffic organising unit be internally provided with connected with cleaning solution passage cleaning solution export passage and
Be arranged on cleaning solution export channel exit and be used to disperseing the scattered groove of cleaning solution, cleaning solution flow through successively cleaning solution passage,
Cleaning solution exports passage and scattered groove flows to the outlet of photoresist nozzle.
2. cleaning device according to claim 1, it is characterised in that the cleaning solution export passage is led including main cleaning solution
Go out passage and sub- cleaning solution export passage, the main cleaning solution export passage is located along the same line with cleaning solution passage, described
Sub- cleaning solution export passage is connected with main cleaning solution export passage and exports passage perpendicular to main cleaning solution, and the sub- cleaning solution is led
The outlet for going out passage connects with the scattered groove.
3. cleaning device according to claim 1, it is characterised in that the scattered groove is located at cleaning solution flow direction control
At the 1/2 of cell height processed.
4. cleaning device according to claim 2, it is characterised in that the scattered groove is close to photoresist jet expansion
Side be provided with for cleaning solution outflow cleaning solution export.
5. cleaning device according to claim 4, it is characterised in that the cleaning solution outlet is to go out around photoresist nozzle
The curved surface of mouthful position, the curved surface is parallel with the surface of photoresist jet expansion position, and with photoresist jet expansion position
Surface at a distance of 2-3mm.
6. cleaning device according to claim 1, it is characterised in that the anticollision for also including protection photoresist jet expansion is horizontal
Beam, the anti-collision beam are arranged on cleaning solution traffic organising unit and positioned at the side of photoresist jet expansion.
7. cleaning device according to claim 1, it is characterised in that the air blowing for also including being used to air-dry cleaning solution air-dries dress
Put, the air blowing air-dry apparatus connects with cleaning solution feeder connection.
8. cleaning device according to claim 1, it is characterised in that cleaning solution traffic organising unit is bolted on
Photoresist jet expansion position.
A kind of 9. clean method, applied to the cleaning device described in any one of the claims 1 to 8, for cleaning photoresist
Nozzle, it is characterised in that comprise the following steps：
Step 1：Cleaning solution is poured into cleaning solution feeder connection, the cleaning solution flows through cleaning solution passage, cleaning solution export successively
Passage, scattered groove and cleaning solution outlet；
Step 2：After liquid cleaning to be cleaned, cleaning solution entrance is connected with air blowing air-dry apparatus and blown to cleaning solution passage,
The air-dried gas flows through cleaning solution passage, cleaning solution export passage, scattered groove and cleaning solution outlet successively.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710868553.2A CN107413747A (en) | 2017-09-22 | 2017-09-22 | A kind of cleaning device and clean method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710868553.2A CN107413747A (en) | 2017-09-22 | 2017-09-22 | A kind of cleaning device and clean method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107413747A true CN107413747A (en) | 2017-12-01 |
Family
ID=60435765
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710868553.2A Pending CN107413747A (en) | 2017-09-22 | 2017-09-22 | A kind of cleaning device and clean method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107413747A (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1183078A (en) * | 1995-05-09 | 1998-05-27 | 穆尔商用表格有限公司 | Cleaning fluid apparatus and method for continuous printing ink-jet nozzle |
| CN101362123A (en) * | 2007-08-10 | 2009-02-11 | K.C.科技股份有限公司 | Nozzle cleaning device and cleaning method |
| CN201959946U (en) * | 2010-12-24 | 2011-09-07 | 北京京东方光电科技有限公司 | Cleaning device of photoresist nozzle |
| CN202527417U (en) * | 2012-03-22 | 2012-11-14 | 北京京东方光电科技有限公司 | Contactless cleaning device |
| EP1890823B1 (en) * | 2005-05-06 | 2013-08-14 | Dieter Wurz | Spray nozzle, spray device and the operation method thereof |
| CN105344511A (en) * | 2015-12-10 | 2016-02-24 | 北京七星华创电子股份有限公司 | Self-cleaning two-phase flow atomized spray cleaning device and cleaning method |
-
2017
- 2017-09-22 CN CN201710868553.2A patent/CN107413747A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1183078A (en) * | 1995-05-09 | 1998-05-27 | 穆尔商用表格有限公司 | Cleaning fluid apparatus and method for continuous printing ink-jet nozzle |
| EP1890823B1 (en) * | 2005-05-06 | 2013-08-14 | Dieter Wurz | Spray nozzle, spray device and the operation method thereof |
| CN101362123A (en) * | 2007-08-10 | 2009-02-11 | K.C.科技股份有限公司 | Nozzle cleaning device and cleaning method |
| CN201959946U (en) * | 2010-12-24 | 2011-09-07 | 北京京东方光电科技有限公司 | Cleaning device of photoresist nozzle |
| CN202527417U (en) * | 2012-03-22 | 2012-11-14 | 北京京东方光电科技有限公司 | Contactless cleaning device |
| CN105344511A (en) * | 2015-12-10 | 2016-02-24 | 北京七星华创电子股份有限公司 | Self-cleaning two-phase flow atomized spray cleaning device and cleaning method |
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| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20171201 |