CN107394057A - Organic electroluminescence display panel and preparation method thereof - Google Patents
Organic electroluminescence display panel and preparation method thereof Download PDFInfo
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- CN107394057A CN107394057A CN201710631510.2A CN201710631510A CN107394057A CN 107394057 A CN107394057 A CN 107394057A CN 201710631510 A CN201710631510 A CN 201710631510A CN 107394057 A CN107394057 A CN 107394057A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
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- H—ELECTRICITY
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Abstract
This application discloses a kind of organic electroluminescence display panel and preparation method thereof.Organic electroluminescence display panel includes substrate, the organic luminescence function layer and dielectric layer formed on substrate；Wherein：Organic luminescence function layer includes anode layer, luminous material layer and the cathode layer apart from substrate from the close-by examples to those far off；For dielectric layer between negative electrode and substrate, dielectric layer includes multiple medium blocks；Surface of at least one of medium block away from negative electrode forms step, and step makes the side wall of medium block form offset, and offset division cathode layer forms multiple negative electrodes being separated from each other.According to the scheme of the embodiment of the present application, by forming multiple medium blocks on the dielectric layer of organic electroluminescence display panel, and form step on surface of the medium block away from negative electrode, so that the side wall of medium block forms offset, so that the offset can divide cathode layer to form multiple negative electrodes being separated from each other, can avoid whole face negative electrode due to material activity is high and the problem of segmentation can not be etched.
Description
Technical field
The disclosure relates generally to display technology field, more particularly to a kind of organic electroluminescence display panel and preparation method thereof.
Background technology
OLED (Organic Light-Emitting Diode, Organic Light Emitting Diode) display because possess it is frivolous,
The characteristics such as power saving, apply more and more widely in various portable electric appts.
OLED refers to using luminous organic material under electric field driven, passes through carrier injection and the two of composite guide photoluminescence
Pole pipe.Anode and negative electrode one of which using transparency electrode and metal electrode respectively as device, under certain voltage driving,
Electronics and hole are injected into electronics and hole transmission layer by electron injecting layer and hole injection layer respectively from negative electrode and anode, then
Luminescent layer is moved to by electronics and hole transmission layer respectively, and is met in luminescent layer, exciton is formed and makes photon excitation, after
Person sends visible ray by radiative relaxation.
Because the activity of cathode material is very high, existing dry or wet etch technique is difficult to be split.Thus,
In existing OLED, negative electrode is usually whole face metal.
The content of the invention
In view of drawbacks described above of the prior art or deficiency, it is expected to provide a kind of organic electroluminescence display panel and its making side
Method, to solve technical problem present in prior art.
In a first aspect, the embodiment of the present application provides a kind of organic electroluminescence display panel, organic electroluminescence display panel includes
Substrate, the organic luminescence function layer and dielectric layer formed on substrate；Wherein：Organic luminescence function layer include apart from substrate by
Proximal and distal anode layer, luminous material layer and cathode layer；For dielectric layer between negative electrode and substrate, dielectric layer includes multiple media
Block；Surface of at least one of medium block away from negative electrode forms step, and step makes the side wall of medium block form offset, and offset is drawn
Cathode layer is divided to form multiple negative electrodes being separated from each other.
In certain embodiments, in a direction perpendicular to a substrate, the height of offset is more than the thickness of cathode layer.
In certain embodiments, organic electroluminescence display panel also includes：It is set in turn in interlayer insulating film on substrate, flat
Smoothization layer and pixel defining layer；Interlayer insulating film is located at both arbitrary neighborhoods in grid layer, Source and drain metal level and capacitance metal layer
Between；Planarization layer is arranged between Source and drain metal level and anode layer；Pixel defining layer is arranged between anode layer and cathode layer.
In certain embodiments, dielectric layer includes pixel defining layer；Pixel defining layer division organic luminescence function layer is formed
The pixel cell of array arrangement；Pixel defining layer includes the first insulation barricade and the shape formed between adjacent pixel cell row
Into the second insulation barricade between adjacent pixel cell row；Direction and pixel cell row of the step along pixel cell row
Direction extends.
In certain embodiments, dielectric layer includes planarization layer；Pixel defining layer disconnects at the step of planarization layer.
In certain embodiments, dielectric layer includes interlayer insulating film；Pixel defining layer and planarization layer are in interlayer insulating film
Step at disconnect.
In certain embodiments, spacing of the adjacent media block between step is more than the width of negative electrode formed therein.
In certain embodiments, offset division cathode layer forms the cathode array of array arrangement.
In certain embodiments, touch control electrode is done in each negative electrode multiplexing in cathode array.
Second aspect, the embodiment of the present application additionally provide a kind of preparation method of organic electroluminescence display panel, including：In base
The first film layer on plate forms negative electrode separating materials block；Dielectric layer is formed in the first film layer；Medium pattern layers are formed more
Individual medium block, with the portion of upper surface of each negative electrode separating materials block of exposure；Negative electrode separating materials block is etched with remote in medium block
The surface of negative electrode forms step, and step makes the side wall of medium block form offset；Evaporation cathode material, to form multiple be separated from each other
Negative electrode.
In certain embodiments, the spacing between two steps formed by etching same negative electrode separating materials block is more than shape
Into the width of the negative electrode between the two neighboring step.
In certain embodiments, preparation method also includes：Anode layer is formed on substrate, anode layer includes multiple mutual points
From anode；Pixel defining layer is formed, pixel defining layer includes the first insulation stop formed between adjacent pixel cell row
Wall and the second insulation barricade formed between adjacent pixel cell row, in a direction perpendicular to a substrate, negative electrode segmentation material
Expect that block and at least one first insulation barricade and/or at least one second insulation barricade are at least partly overlapping；The shape on each anode
Into luminous organic material；The first film layer on substrate, which forms negative electrode separating materials block, to be included：Negative electrode segmentation is formed in anode layer
Material block；Multiple medium blocks are formed to medium pattern layers, with the portion of upper surface of each negative electrode separating materials block of exposure, including：
Pixel defining layer is etched, with the portion of upper surface of each negative electrode separating materials block of exposure.
In certain embodiments, preparation method also includes：Image element circuit is formed on substrate, it is brilliant that image element circuit includes film
Body pipe and electric capacity, thin film transistor (TFT) include being formed gate metal layer grid and form source electrode in Source and drain metal level and leakage
Pole, electric capacity include forming the pole plate in capacitance metal layer.
In certain embodiments, the first film layer on substrate forms negative electrode separating materials block and included：In Source and drain metal level
Form negative electrode separating materials block；Multiple medium blocks are formed to medium pattern layers, with the part of each negative electrode separating materials block of exposure
Upper surface, including：Pixel defining layer and planarization layer are etched, with the portion of upper surface of each negative electrode separating materials block of exposure.
In certain embodiments, the first film layer on substrate forms negative electrode separating materials block and included：In capacitance metal layer
Form negative electrode separating materials block；Multiple medium blocks are formed to medium pattern layers, with the part of each negative electrode separating materials block of exposure
Upper surface, including：Pixel defining layer, planarization layer and interlayer insulating film are etched, with the portion of each negative electrode separating materials block of exposure
Divide upper surface.
According to the scheme of the embodiment of the present application, by forming multiple media on the dielectric layer of organic electroluminescence display panel
Block, and step is formed on surface of the medium block away from negative electrode, so that the side wall of medium block forms offset, so that the offset can
Multiple negative electrodes being separated from each other are formed so that cathode layer to be divided.So, whole face negative electrode can be avoided due to material activity height
And the problem of segmentation can not be etched.
Brief description of the drawings
By reading the detailed description made to non-limiting example made with reference to the following drawings, the application's is other
Feature, objects and advantages will become more apparent upon：
Figure 1A shows the schematic diagram of one embodiment of the organic electroluminescence display panel of the application；
Figure 1B shown in Figure 1A organic electroluminescence display panel, two neighboring medium block and positioned at the two neighboring medium
The relative position relation of negative electrode between block；
Fig. 2A shows the schematic diagram of another embodiment of the organic electroluminescence display panel of the application；
Fig. 2 B are shown in Fig. 2A, the schematic diagram of pixel defining layer；
Fig. 3 shows the schematic diagram of another embodiment of the organic electroluminescence display panel of the application；
Fig. 4 shows the schematic diagram of the further embodiment of the organic electroluminescence display panel of the application；
Fig. 5 shows the schematic flow of one embodiment of the preparation method of the organic electroluminescence display panel of the application
Figure；
Fig. 6 A~Fig. 6 E are schematically shown makes organic light emitting display face using the preparation method of embodiment illustrated in fig. 5
The processing procedure of plate；
Fig. 7 A~Fig. 7 F schematically show the optional realization side of one kind using the preparation method of embodiment illustrated in fig. 5
Formula makes the processing procedure of organic electroluminescence display panel.
Embodiment
The application is described in further detail with reference to the accompanying drawings and examples.It is understood that this place is retouched
The specific embodiment stated is used only for explaining related invention, rather than the restriction to the invention.It also should be noted that in order to
It is easy to describe, the part related to invention is illustrate only in accompanying drawing.
It should be noted that in the case where not conflicting, the feature in embodiment and embodiment in the application can phase
Mutually combination.Describe the application in detail below with reference to the accompanying drawings and in conjunction with the embodiments.
It is the schematic diagram of one embodiment of the organic electroluminescence display panel of the application referring to shown in Figure 1A.
The organic electroluminescence display panel of the present embodiment includes substrate 110, the organic luminescence function layer 120 formed on substrate
And dielectric layer.Wherein, organic luminescence function layer 120 includes anode layer 121, the luminescent material apart from substrate 110 from the close-by examples to those far off
Layer 122 and cathode layer.Dielectric layer is between cathode layer and substrate 110.Dielectric layer includes multiple medium blocks 130, at least one
The medium block 130 divided forms step on the surface away from cathode layer, and step makes the side wall of medium block 130 form offset, and offset is drawn
Cathode layer is divided to form multiple negative electrodes 123 being separated from each other.
As shown in Figure 1A, because the lower surface (that is, surface away from negative electrode) of medium block 130 is formed with step, in shape
In place of into step, the side wall of medium block 130 inside contracts to form offset, and medium block 130 is in the cross-sectional area parallel to the plane of substrate 110
Also correspondingly die-off.So, when making negative electrode, due to the presence of offset, cathode material will separate to be formed at offset
The negative electrode being separated from each other, so as to reduce whole face making cathode layer, further patterning forms the technique hardly possible of multiple negative electrodes afterwards
Degree, also avoid the deterioration of the additionally negative electrode or other luminescent materials caused by the technique of segmentation negative electrode.In addition, the present embodiment
Organic electroluminescence display panel, multiple negative electrodes being separated from each other are formed by using the existing film layer of organic electroluminescence display panel,
Do not increase film layer additionally, be advantageous to the simplification of manufacture craft and the slimming of organic electroluminescence display panel.
It will be appreciated by those skilled in the art that the organic electroluminescence display panel of the present embodiment also includes other known knots
Structure, for example, hole injection layer, hole transmission layer, electron injecting layer, electron transfer layer etc..For the weight of not fuzzy the application
Point, no longer these known structures will be further described.
Referring to shown in Figure 1B, being in the embodiment shown in Figure 1A, adjacent second medium block 130 and formation are in adjacent two Jie
The relative position relation schematic diagram of negative electrode 123 between mass 130.
It can be seen that from Figure 1B in a direction perpendicular to a substrate, the height h of offset1More than each the moon in cathode layer
The thickness h of pole 1232.So, when making cathode layer, may further ensure that cathode layer medium block 130 offset it
Place disconnects the negative electrode for forming two separation, and multiple negative electrodes are formed so as to realize to make in one of production process.
It is the schematic diagram of another embodiment of the organic electroluminescence display panel of the application referring to shown in Fig. 2A.
Similar with the embodiment shown in Figure 1A, the organic electroluminescence display panel of the present embodiment equally includes substrate 210, formed on substrate
Organic luminescence function layer 220 and dielectric layer.Wherein, organic luminescence function layer 220 is included apart from substrate 210 from the close-by examples to those far off
Anode layer 221, luminous material layer 222 and cathode layer.Dielectric layer is between cathode layer and substrate 210.Dielectric layer includes multiple
Medium block 230, at least one of medium block 230 form step on the surface away from cathode layer, and step makes the side of medium block 230
Wall forms offset, and offset division cathode layer forms multiple negative electrodes 223 being separated from each other.
Unlike the embodiment shown in Figure 1A, the organic electroluminescence display panel of the present embodiment is also included to each pixel
The pixel-driving circuit of data voltage signal is provided.Pixel-driving circuit is generally made up of electric capacity and multiple thin film transistor (TFT)s.Cause
And the organic electroluminescence display panel of the present embodiment still further comprise be set in turn on substrate 210 interlayer insulating film 240,
Planarization layer 250 and pixel defining layer.
Interlayer insulating film 240 is located at grid layer 241, Source and drain metal level 242 and the pixel-driving circuit of thin film transistor (TFT)
Included in electric capacity some pole plate residing for capacitance metal layer (not shown) between.Planarization layer 250 is arranged at
(for example, planarization layer 250 is schematically shown in Fig. 2A is arranged at source between pixel-driving circuit and organic luminescence function layer
Leak between metal level 242 and anode layer 221).Pixel defining layer is arranged between anode layer 221 and cathode layer.
In addition, it can also be seen that in the present embodiment from Fig. 2A, medium block 230 is formed in pixel defining layer.It that is to say
Say, the dielectric layer in the present embodiment includes pixel defining layer.
Referring to shown in Fig. 2 B, be the present embodiment organic electroluminescence display panel in, the schematic diagram of pixel defining layer.
As can be seen that pixel defining layer division organic luminescence function layer forms the pixel cell of array arrangement from Fig. 2 B
261.Pixel defining layer can be typically made by insulating materials, when to a certain pixel cell anode apply data voltage so as to
When making to be formed electric field between the anode and negative electrode, due to the insulating effect of pixel defining layer, electronics and hole can be in the pixels
Migration is without moving in adjacent pixel cell by mistake in unit.
Pixel defining layer includes the first insulation barricade 262 formed between adjacent pixel cell row and formed adjacent
Pixel cell row between second insulation barricade 263.
In addition, in the present embodiment, the step formed on medium block can be along the direction of pixel cell row and pixel list
The direction extension of member row.For example, the direction grooving arranged at least one of first insulation barricade 262 along pixel cell, and
The bottom surface (namely surface away from negative electrode) of first insulation barricade 262 forms the step extended along the direction of pixel cell row.This
Sample one, it is possible to achieve when making cathode layer, just formed along the direction of pixel cell row and extended simultaneously only with one of production process
The multiple negative electrodes arranged along the direction of pixel cell row.Similarly, at least one of second insulation barricade 263 along pixel list
The direction grooving of first row, and formed in the bottom surface (namely surface away from negative electrode) of the second insulation barricade 263 along pixel cell row
Direction extension step.So, it is possible to achieve when making cathode layer, just formed along pixel only with one of production process
The direction extension of cell row and the multiple negative electrodes arranged along the direction of pixel cell row.If it will be understood by those skilled in the art that
While carry out grooving in the insulation barricade 262 of at least a portion first and the insulation barricade 263 of at least a portion second and form difference
The step extended along the direction of pixel cell row and the direction of row, can be when making cathode layer, only with one of production process
Just the negative electrode of array arrangement is formed.
The organic electroluminescence display panel of the present embodiment, platform is formed by the surface of the remote negative electrode 223 in pixel defining layer
Rank, so as to form multiple negative electrodes being separated from each other using the existing film layer of organic electroluminescence display panel, do not increase film additionally
Layer, is advantageous to the simplification of manufacture craft and the slimming of organic electroluminescence display panel.
It is shown in Figure 3, it is the schematic diagram of another embodiment of the organic electroluminescence display panel of the application.
Similar with the embodiment shown in Fig. 2A, the organic electroluminescence display panel of the present embodiment equally includes substrate 310, formed
Organic luminescence function layer 320 and dielectric layer on substrate.Wherein, organic luminescence function layer 320 include apart from substrate 310 by
Proximal and distal anode layer 321, luminous material layer 322 and cathode layer.Dielectric layer is between cathode layer and substrate 310.Dielectric layer
Including multiple medium blocks 330, at least one of medium block 330 forms step on the surface away from cathode layer, and step makes medium
The side wall of block 330 forms offset, and offset division cathode layer forms multiple negative electrodes 323 being separated from each other.In addition, the present embodiment has
Machine light emitting display panel also includes interlayer insulating film 340, planarization layer 350 and the pixel definition being set in turn on substrate 310
Layer.Interlayer insulating film 340 is located between grid layer 341 and the Source and drain metal level 342 of thin film transistor (TFT).Planarization layer 350 is set
Between Source and drain metal level 342 and anode layer 321.Pixel defining layer is arranged between anode layer 321 and cathode layer.
Different from the embodiment shown in Fig. 2A, in the organic electroluminescence display panel of the present embodiment, dielectric layer includes planarization
Layer 350.In other words, the surface of the remote negative electrode 323 of planarization layer 350 forms step, and step makes the side wall shape of medium block 330
Into offset, so that offset division cathode layer forms multiple negative electrodes 323 being separated from each other.Correspondingly, in the present embodiment, pixel
Definition layer also disconnects at the step of planarization layer.So, when making negative electrode, due to the presence of offset, cathode material
Ground is separated to the negative electrode 323 to be formed and be separated from each other at offset, can not be further after whole face makes cathode layer so as to avoid
The problem of patterning forms multiple negative electrodes.In addition, the organic electroluminescence display panel of the present embodiment, by planarization layer 350
Surface away from negative electrode 323 forms step, so as to form multiple mutual points using the existing film layer of organic electroluminescence display panel
From negative electrode, additionally increase film layer, be advantageous to the simplification of manufacture craft and the slimming of organic electroluminescence display panel.
It is shown in Figure 4, it is the schematic diagram of the further embodiment of the organic electroluminescence display panel of the application.
Similar with the embodiment shown in Fig. 2A, the organic electroluminescence display panel of the present embodiment equally includes substrate 410, formed
Organic luminescence function layer 420 and dielectric layer on substrate.Wherein, organic luminescence function layer 420 include apart from substrate 410 by
Proximal and distal anode layer 421, luminous material layer 422 and cathode layer.Dielectric layer is between cathode layer and substrate 410.Dielectric layer
Including multiple medium blocks 430, at least one of medium block 430 forms step on the surface away from cathode layer, and step makes medium
The side wall of block 430 forms offset, and offset division cathode layer forms multiple negative electrodes 423 being separated from each other.In addition, the present embodiment has
Machine light emitting display panel also includes interlayer insulating film 440, planarization layer 450 and the pixel definition being set in turn on substrate 410
Layer.Interlayer insulating film 440 is located between grid layer 441 and the Source and drain metal level 442 of thin film transistor (TFT).Planarization layer 450 is set
Between Source and drain metal level 442 and anode layer 421.Pixel defining layer is arranged between anode layer 421 and cathode layer.
Different from the embodiment shown in Fig. 2A, in the organic electroluminescence display panel of the present embodiment, dielectric layer also includes interlayer
Insulating barrier 440.In other words, the surface of the remote negative electrode 423 of interlayer insulating film 440 forms step, and step makes medium block 430
Side wall forms offset, so that offset division cathode layer forms multiple negative electrodes 423 being separated from each other.Correspondingly, the present embodiment
In, pixel defining layer and planarization layer 450 also disconnect at the step of interlayer insulating film 440.So, negative electrode is being made
When, due to the presence of offset, cathode material separates on ground on the negative electrode 423 to be formed and be separated from each other at offset, whole so as to avoid
Face can not further pattern the problem of forming multiple negative electrodes after making cathode layer.In addition, the organic light emission of the present embodiment shows
Show panel, step is formed by the surface of the remote negative electrode 423 in interlayer insulating film 440, so as to utilize organic light emitting display face
The existing film layer of plate forms multiple negative electrodes being separated from each other, extra increase film layer, is advantageous to the simplification of manufacture craft
With the slimming of organic electroluminescence display panel.
In addition, in the organic electroluminescence display panel of each embodiment of the application, spacing of the adjacent media block between step is big
In the width of negative electrode formed therein.By taking the embodiment shown in Fig. 4 as an example, d1More than the width d of negative electrode formed therein2。
So, it may further ensure that cathode layer disconnects at step, form the negative electrode being separated from each other.
The organic electroluminescence display panel of the application is can be seen that from the description of the various embodiments described above, by existing
The surface of the remote negative electrode of film layer (for example, pixel defining layer, planarization layer or interlayer insulating film) forms step, so as to utilize
The existing film layer of organic electroluminescence display panel forms multiple negative electrodes being separated from each other, extra increase film layer, is advantageous to make
Make the simplification of technique and the slimming of organic electroluminescence display panel.
In addition, in some optional implementations, the organic electroluminescence display panel of each embodiment of the application, by appropriate
Ground sets the position of offset, and cathode layer can be divided into the cathode array of array arrangement.So, in application scenes
In, the negative electrode in cathode array, which can be multiplexed, does touch control electrode.So as to realize the detection of touch location.
It is shown in Figure 5, it is the indicative flowchart of the preparation method of the organic electroluminescence display panel of the application.
The method of the present embodiment includes：
Step 510, the first film layer on substrate forms negative electrode separating materials block.Herein, the first film layer can be existing
Film layer present in some organic electroluminescence display panels, including but not limited to shading metal level, Source and drain metal level, gate metal layer
Or anode metal layer etc..
Step 520, dielectric layer is formed in the first film layer.
Step 530, multiple medium blocks are formed to medium pattern layers, with the part upper table of each negative electrode separating materials block of exposure
Face.
Step 540, negative electrode separating materials block is etched to form step on surface of the medium block away from negative electrode, and step makes medium
The side wall of block forms offset.
Step 550, evaporation cathode material, to form multiple negative electrodes being separated from each other.
The preparation method of the present embodiment, by etch negative electrode separating materials block so that medium block remote negative electrode
Surface forms step, due to the presence of step, can be formed and be separated from each other in the both sides of step in follow-up evaporation cathode material
Negative electrode.
Below, the preparation method of the present embodiment will be further described further combined with Fig. 6 A~Fig. 6 E processing procedure.
First, referring to shown in Fig. 6 A, negative electrode separating materials block 620 is formed in the first film layer of substrate 610.
Then, referring to shown in Fig. 6 B, dielectric layer 630 is formed in the first film layer.
Then, referring to shown in Fig. 6 C, medium pattern layers are formed with multiple medium blocks 631, with each negative electrode segmentation material of exposure
Expect the portion of upper surface of block 620.
Then, referring to shown in Fig. 6 D, etching negative electrode separating materials block is with surface formation platform of the medium block 631 away from negative electrode
Rank, step make the side wall of medium block 631 form offset.
Finally, referring to shown in Fig. 6 E, evaporation cathode material, to form multiple negative electrodes 640 being separated from each other.
The preparation method of the present embodiment, due to forming step in the side wall of medium block 631 and making the side wall shape of medium block 631
, can not evaporation cathode material when carrying out cathode material evaporation, in place of embedded step so that cathode material is in step into offset
Place disconnects, so as to form the negative electrode 640 being separated from each other.
Using the preparation method of the present embodiment, multiple phases can be formed using the existing film layer of organic electroluminescence display panel
The negative electrode mutually separated, additionally increase film layer, be advantageous to manufacture craft simplification and organic electroluminescence display panel it is slim
Change.
In addition, using the present embodiment preparation method make organic electroluminescence display panel in, as illustrated in fig. 6e, by etching
Spacing d between two steps that same negative electrode separating materials block is formed1More than being formed between the two neighboring step
Negative electrode width d2。
In the preparation method of the present embodiment, before evaporation cathode material, in addition on substrate formed anode layer, each
The step of luminous organic material is formed on anode and forms pixel defining layer.Wherein, anode layer includes multiple be separated from each other
Anode, pixel defining layer include the first insulation barricade formed between adjacent pixel cell row and formed in adjacent pixel
The second insulation barricade between cell row, in a direction perpendicular to a substrate, negative electrode separating materials block and at least one first exhausted
Edge barricade and/or at least one second insulation barricade are at least partly overlapping.
In some optional implementations of the present embodiment, the first film layer on substrate of step 510 forms negative electrode
Separating materials block may further include：Negative electrode separating materials block is formed in anode layer.
Correspondingly, step 530 forms multiple medium blocks to medium pattern layers, with each negative electrode separating materials block of exposure
Portion of upper surface may further include：Pixel defining layer is etched, with the portion of upper surface of each negative electrode separating materials block of exposure.
Below, by further combined with Fig. 7 A~Fig. 7 F processing procedure come further describe the present embodiment these optional realize
The preparation method of mode.
First, referring to shown in Fig. 7 A, the anode layer on substrate 710 forms anode 720 and negative electrode separating materials block 730.
Then, referring to shown in Fig. 7 B, pixel defining layer 740 is formed on the anode layer.
Then, referring to the barricade that shown in Fig. 7 C, insulated to pixel definition pattern layers formation the first insulation barricade 741 and second
(not shown), and the portion of upper surface of each negative electrode separating materials block 730 of exposure.Herein, for example, can be exhausted along first
The bearing of trend that pixel cell arranges in edge barricade etches the first insulation barricade, so as to the portion of exposure negative electrode separating materials block 730
Divide upper surface, and/or, second insulation stop can also be etched along the bearing of trend of pixel cell row in the second insulation barricade
Wall, so as to the portion of upper surface of exposure negative electrode separating materials block 730.Herein, in order in exposure negative electrode separating materials block 730
Anode 720 is not exposed while portion of upper surface, when being patterned to pixel defining layer, it is for instance possible to use halftoning
(half-tone) mask plate is patterned.
Then, referring to shown in Fig. 7 D, etching negative electrode separating materials block is with the first insulation barricade and/or the second insulation barricade
Surface away from negative electrode forms step, and step makes the first insulation barricade and/or the second side wall for insulating barricade form offset.Together
When, the pixel defining layer above anode 720 is etched to expose the upper surface of at least part anode 720.
Then, referring to shown in Fig. 7 E, luminous organic material 750 is formed on the anode layer.
Finally, referring to shown in Fig. 7 F, evaporation cathode material, to form multiple negative electrodes 760 being separated from each other.
The preparation method of the present embodiment, due to being insulated barricade and/or the second insulation barricade the first of pixel defining layer
Surface away from negative electrode forms step and the first insulation barricade and/or the second side wall for insulating barricade is formed offset, is carrying out
Can not evaporation cathode material when cathode material is deposited, in place of embedded step so that cathode material disconnects at step, so that shape
Into the negative electrode 760 being separated from each other.
In addition, the preparation method of the present embodiment is additionally may included on substrate the step of forming image element circuit.Image element circuit
Thin film transistor (TFT) and electric capacity can be included, thin film transistor (TFT) includes being formed in the grid of gate metal layer and formation in source and drain gold
Belong to source electrode and the drain electrode of layer, electric capacity includes forming the pole plate in capacitance metal layer.Correspondingly, gate metal layer, Source and drain metal level
There is therebetween interlayer insulating film with the arbitrary neighborhood of capacitance metal layer.Also, in image element circuit and organic luminescence function layer
Between (for example, between Source and drain metal level and anode layer), planarization layer can also be set.
So, in some optional implementations of the present embodiment, the first film layer on substrate of step 510
Negative electrode separating materials block is formed to may further include：Negative electrode separating materials block is formed in Source and drain metal level.
Correspondingly, step 530 forms multiple medium blocks to medium pattern layers, with each negative electrode separating materials block of exposure
Portion of upper surface may further include：Etch pixel defining layer and formed flat between Source and drain metal level and anode layer
Change layer, with the portion of upper surface of each negative electrode separating materials block of exposure.
Or in other optional implementations of the present embodiment, the first film layer shape on substrate of step 510
It may further include into negative electrode separating materials block：Negative electrode separating materials block is formed in capacitance metal layer.
Correspondingly, step 530 forms multiple medium blocks to medium pattern layers, with each negative electrode separating materials block of exposure
Portion of upper surface may further include：Etch pixel defining layer, planarization layer and formed in interlayer insulating film, it is each with exposure
The portion of upper surface of negative electrode separating materials block.
The preparation method of the organic electroluminescence display panel of the present embodiment, pass through the existing film layer in organic electroluminescence display panel
(for example, anode layer, Source and drain metal level or capacitance metal layer) sets negative electrode separating materials block；And to dielectric layer (for example, picture
Plain definition layer and/or planarization layer and/or interlayer insulating film) the part upper table of negative electrode separating materials block is exposed when being patterned
Face；Then negative electrode separating materials block is etched causes surface of the medium block away from negative electrode to form step, and causes medium
The side wall of block forms offset；Finally in evaporation cathode material, due to the presence of offset, phase only can be formed by a procedure
The multiple negative electrodes mutually separated, can avoid whole face negative electrode due to material activity is high and the problem of segmentation can not be etched.
It will be appreciated by those skilled in the art that invention scope involved in the application, however it is not limited to above-mentioned technical characteristic
The technical scheme that forms of particular combination, while should also cover in the case where not departing from the inventive concept, by above-mentioned technology
Other technical schemes that feature or its equivalent feature are combined and formed.Such as features described above with it is disclosed herein
(but not limited to) has the technical scheme that the technical characteristic of similar functions is replaced mutually and formed.
Claims (15)
- A kind of 1. organic electroluminescence display panel, it is characterised in that：The organic electroluminescence display panel includes substrate, the organic luminescence function layer and dielectric layer of formation on the substrate；Wherein：The organic luminescence function layer includes anode layer, luminous material layer and the cathode layer apart from the substrate from the close-by examples to those far off；For the dielectric layer between the negative electrode and the substrate, the dielectric layer includes multiple medium blocks；Surface of at least one of medium block away from the negative electrode forms step, and the step makes the side of the medium block Wall forms offset, and the offset divides the cathode layer and forms multiple negative electrodes being separated from each other.
- 2. organic electroluminescence display panel according to claim 1, it is characterised in that perpendicular to the direction of the substrate On, the height of the offset is more than the thickness of the cathode layer.
- 3. organic electroluminescence display panel according to claim 1, it is characterised in that also include：It is set in turn in the base Interlayer insulating film, planarization layer and pixel defining layer on plate；The interlayer insulating film is located in grid layer, Source and drain metal level and capacitance metal layer arbitrary neighborhood therebetween；The planarization layer is arranged between the Source and drain metal level and the anode layer；The pixel defining layer is arranged between the anode layer and the cathode layer.
- 4. organic electroluminescence display panel according to claim 3, it is characterised in that：The dielectric layer includes the pixel defining layer；The pixel defining layer divides the pixel cell that the organic luminescence function layer forms array arrangement；The pixel defining layer includes the first insulation barricade formed between adjacent pixel cell row and formed adjacent The second insulation barricade between pixel cell row；The direction extension in direction and pixel cell row of the step along the pixel cell row.
- 5. organic electroluminescence display panel according to claim 4, it is characterised in that：The dielectric layer includes the planarization layer；The pixel defining layer disconnects at the step of the planarization layer.
- 6. organic electroluminescence display panel according to claim 3, it is characterised in that：The dielectric layer includes the interlayer insulating film；The pixel defining layer and the planarization layer disconnect at the step of the interlayer insulating film.
- 7. organic electroluminescence display panel according to claim 1, it is characterised in that：Spacing of the adjacent medium block between the step is more than the width of the negative electrode formed therein.
- 8. according to the organic electroluminescence display panel described in claim 1-7 any one, it is characterised in that：The offset divides the cathode array that the cathode layer forms array arrangement.
- 9. organic electroluminescence display panel according to claim 8, it is characterised in that：Touch control electrode is done in each negative electrode multiplexing in the cathode array.
- A kind of 10. preparation method of organic electroluminescence display panel, it is characterised in that including：The first film layer on substrate forms negative electrode separating materials block；Dielectric layer is formed in first film layer；Multiple medium blocks are formed to the medium pattern layers, with the portion of upper surface of each negative electrode separating materials block of exposure；The negative electrode separating materials block is etched to form step on surface of the medium block away from the negative electrode, the step makes The side wall of the medium block forms offset；Evaporation cathode material, to form multiple negative electrodes being separated from each other.
- 11. preparation method according to claim 10, it is characterised in that：Spacing between two steps formed by etching same negative electrode separating materials block is two neighboring more than this is formed at The width of negative electrode between the step.
- 12. the preparation method according to claim 10 or 11, it is characterised in that also include：Anode layer is formed on substrate, the anode layer includes multiple anodes being separated from each other；Pixel defining layer is formed, the pixel defining layer includes being formed the first insulation barricade between adjacent pixel cell row And the second insulation barricade formed between adjacent pixel cell row, on the direction of the substrate, the negative electrode Separating materials block is at least partly handed over at least one first insulation barricade and/or at least one second insulation barricade It is folded；Luminous organic material is formed on each anode；First film layer on substrate, which forms negative electrode separating materials block, to be included：Negative electrode separating materials block is formed in the anode layer；It is described that multiple medium blocks are formed to the medium pattern layers, with the part upper table of each negative electrode separating materials block of exposure Face, including：The pixel defining layer is etched, with the portion of upper surface of each negative electrode separating materials block of exposure.
- 13. the preparation method according to claim 10 or 11, it is characterised in that also include：Image element circuit is formed on substrate, the image element circuit includes thin film transistor (TFT) and electric capacity, and the thin film transistor (TFT) includes Formed gate metal layer grid and form source electrode in Source and drain metal level and drain electrode, the electric capacity includes being formed in electric capacity The pole plate of metal level.
- 14. preparation method according to claim 13, it is characterised in that first film layer on substrate forms negative electrode segmentation Material block includes：Negative electrode separating materials block is formed in the Source and drain metal level；It is described that multiple medium blocks are formed to the medium pattern layers, with the part of each negative electrode separating materials block of exposure Upper surface, including：The pixel defining layer and planarization layer are etched, with the portion of upper surface of each negative electrode separating materials block of exposure.
- 15. preparation method according to claim 13, it is characterised in that first film layer on substrate forms negative electrode Separating materials block includes：Negative electrode separating materials block is formed in the capacitance metal layer；It is described that multiple medium blocks are formed to the medium pattern layers, with the part upper table of each negative electrode separating materials block of exposure Face, including：The pixel defining layer, planarization layer and interlayer insulating film are etched, with the portion of each negative electrode separating materials block of exposure Divide upper surface.
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