CN107393805B - Photic isolated device is studied under a kind of low temperature - Google Patents
Photic isolated device is studied under a kind of low temperature Download PDFInfo
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- CN107393805B CN107393805B CN201710683995.XA CN201710683995A CN107393805B CN 107393805 B CN107393805 B CN 107393805B CN 201710683995 A CN201710683995 A CN 201710683995A CN 107393805 B CN107393805 B CN 107393805B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/004—Combinations of spectrometers, tandem spectrometers, e.g. MS/MS, MSn
- H01J49/0045—Combinations of spectrometers, tandem spectrometers, e.g. MS/MS, MSn characterised by the fragmentation or other specific reaction
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/06—Electron- or ion-optical arrangements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/26—Mass spectrometers or separator tubes
- H01J49/34—Dynamic spectrometers
- H01J49/40—Time-of-flight spectrometers
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Abstract
The present invention relates to photoelectron and molecular reaction dynamics fields, photic isolated device is studied under a kind of low temperature, ion source uses the caesium plasma sputter source of low repeatability, focusing electrode group and quality selection electrode group are annular electrode, the hole for only having the center electrode I in focusing electrode group has metal mesh, and the hole of five electrode centers of quality selection electrode group all has metal mesh；Accelerator includes electrode, ion repeller, withdrawal device and grounding electrode etc., and has metal mesh attachment；All there is individual low temperature cold screen outside focusing electrode group and quality selection electrode group；Apply a voltage in quality selection electrode group；It is applied to the ratio of voltage in focusing electrode group and quality selection electrode group by adjusting, Voice segment condition can be reached, improve mass resolution；Laser light incident is orthogonal with ion motion direction, and ion oscillation reaches boundling effect by mass particle selector, and is phase locked a mode-locked laser, can guarantee that ion beam and laser pulse are instantaneously overlapped friendship.
Description
Technical field
The present invention relates to photoelectronic imaging technology and molecular reaction dynamics fields, especially a kind of to carry out electronics simultaneously
With in fragment ion imaging, the ion that can be generated photic separation can be studied under a kind of low temperature that is lower, improving energy accuracy of measurement
Device.
Background technique
Particle rapidity imaging technique is a kind of important means of molecular reaction dynamics research, and most important feature is can
To obtain the velocity magnitude and directional spreding of the full three-dimensional of scattering particles simultaneously in a width image, it can while obtaining particle
Spectral information and angle distributed intelligence.Particle rapidity imaging technique can be applied in photic separation synchronous experiments, stable state
Molecular anion in electronics photic separation generate dissociation it is known it is interior can neutral intermediate product.By collecting dissociation process
All neutral fragments of middle generation and by using the detector of time and position sensing by neutral fragment and isolated electronics
Relevant information is mapped, then the momentum of relevant product and energy can be computed.Since molecular beam was ionizing
Cheng Zhonghui is reintroduced back to interior energy, causes its vibrational degrees of freedom to increase, will cause broadening in the spectrum that detector obtains, and influences experiment essence
Degree, therefore need to cool down ion beam as much as possible in an experiment.
In existing cooling technology, by the way that molecule is embedded in elementide such as helium atom cluster or is delayed using positioned at cooling
The radio frequency ion trap rushed in atmosphere come store ion achieve the purpose that reduce ion in can, still, the above cooling technology
It is not suitable for photic separation synchronous experiments.In addition, photic separation synchronous experiments generally require high duty ratio and low
Events incidence to avoid data confusion, in this way, the technology of some low repeatabilities, needs longer data acquisition time or increasing
Add the difficulty of the counterfeit event of separation, then photic separation synchronous experiments cannot be made to implement in the case where ion is cooling, or
It is that cooling procedure does not have an improvement to experimental result, studying photic isolated device under a kind of low temperature can solve problem.
Summary of the invention
To solve the above-mentioned problems, the present invention in photic separation synchronous experiments use by two arrays of electrodes respectively to preceding
Expel sub- carry out quality selection and effect be focused to fragment ion, enable generate fragment ion reach particle rapidity at
The focused condition of picture.
The technical scheme adopted by the invention is that:
Study photic isolated device under a kind of low temperature mainly and include ion source in ultra-high vacuum environment plus
Fast device, flight time mass spectrum, mass particle selector, magnetic shielding cover, ion beam entrance, by electrode I, electrode II, electrode III,
Electrode IV, electrode V composition focusing electrode group, photoelectricity subexit, by electrode VI, electrode VII, electrode VIII, electrode IX, electrode
Quality selection electrode group, laser entrance, ion outlet, ion detector, the electronic background of X composition reduce plate, reflecting plate, ion
Revision board extracts electrode, beam forming electrode and electron detector, and the focusing electrode group, quality selection electrode group, electronic background subtract
Few plate, reflecting plate and ion revision board are respectively positioned in the magnetic shielding cover, and the magnetic shielding cover has the ion beam entrance, light
Electron exit, laser entrance and ion outlet, the reflecting plate, ion revision board, extraction electrode and beam forming electrode are annular,
The electronic background reduces plate, reflecting plate and ion revision board and is sequentially located in the laser entrance and is located at the focusing
Between electrode group and quality selection electrode group, laser can pass through the electronic background by the laser entrance and reduce plate, simultaneously
The interaction zone of laser and ion, face institute on the outside of the magnetic shielding cover are formed at the ion revision board overcentre
State that ion beam entrance is coaxial to be sequentially installed with the mass particle selector, flight time mass spectrum, accelerator and ion source, it is described
Photoelectricity subexit described in face is coaxial on the outside of magnetic shielding cover is sequentially installed with the extraction electrode, beam forming electrode and electron detection
Device, the ion detector are located on the outside of the magnetic shielding cover at ion outlet described in face.The ion source is low repeatability
Caesium plasma sputter source, the focusing electrode group and the quality selection electrode group be annular electrode, gone here and there between adjacent electrode
It is associated with resistance, the hole at the only center electrode I has metal mesh in the focusing electrode group, and the focusing electrode group is to ion and swashs
The fragment ion generated after light interaction is focused, so that ion meets particle speed before reaching the ion detector
The focused condition of imaging is spent, the hole of five electrode centers of the quality selection electrode group all has metal mesh, will not obvious shadow
The vertical component of ion beam speed is rung, the quality selection electrode group is to the ion for entering magnetic shielding cover from the ion beam entrance
Carry out quality selection；The accelerator includes electrode, ion repeller, withdrawal device and grounding electrode, and has metal mesh attachment,
The metal mesh is contacted with withdrawal device and grounding electrode, meets particle rapidity imaging before electrostatic lenses effect is come to generate
Focused condition；All there is individual low temperature cold screen outside the focusing electrode group and quality selection electrode group, so that storage
Ion the ground state of vibration and rotational energy can be degenerated within the time of musec order；In quality selection electrode group
Apply a voltage, the ion with phase homogenous quantities is enabled to reach some position with the smallest Annual distribution；Pass through adjusting
It is applied to the ratio of voltage in focusing electrode group and quality selection electrode group, Voice segment condition can be reached, and thus improve
Mass spectrographic resolution ratio；Laser light incident direction with ion motion direction be it is orthogonal, ion oscillation is selected by the mass particle
Device reaches boundling effect, and is phase locked a mode-locked laser, can guarantee that ion beam and laser pulse are instantaneously overlapped, only exist
Intersect when ion is moved to focusing electrode group direction with laser.
Electrode I, electrode II, electrode III, electrode IV and electrode V centre bore be that round and radius successively successively decreases, electricity
Pole VI, electrode VII, electrode VIII, electrode IX and electrode X centre bore be that round and radius is incremented by successively.
Electrode I, electrode II, electrode III, electrode IV and electrode V centre bore be square and side length is successively successively decreased,
Electrode VI, electrode VII, electrode VIII, electrode IX and electrode X centre bore be square and side length is incremented by successively.
The method and step studied using photic isolated device is studied under a kind of low temperature are as follows:
One, ion source generates ion, and applying acceleration voltage on accelerator keeps ion accelerated, and ion passes through flight time matter
After spectrum and the selection of the quality of mass particle selector, an ion beam segment is formed, enters magnetic shielding cover from ion beam entrance；
The voltage of focusing electrode group is set as zero by two, and quality selects the voltage for applying single-slope in electrode group, makes electrode
VI, electrode VII, electrode VIII, electrode IX, the voltage on electrode X are incremented by according to same slope and the voltage on electrode X is higher than
Accelerate the acceleration voltage on electrode；
Three, apply impulse electric field in focusing electrode group, make electrode V, electricity after ion beam segment is by focusing electrode group
Pole IV, electrode III, electrode II, voltage is incremented by successively on electrode I, and ion motion is into quality selection electrode group, by reversed electricity
The work of pressure is used as retarded motion and counter motion, so that moving to focusing electrode group；
Quality is selected the voltage in electrode group to be set as zero, then, quilt by four, after ion leaves quality selection electrode group
Forerunner's ion of quality selection electrode group reflection at the ion revision board near interaction zone be irradiated with a laser, ion and
Laser interaction generates fragment ion and photoelectron；
Five, ions and laser interaction and the fragment ion generated flies to focusing electrode group and is reflected, on electrode I
Apply voltage, finally, the fragment ion reflected selects electrode group to fly to ion detector by the quality being grounded；
The photoelectron generated after six, ion beams and laser interaction is projected from photoelectricity subexit, and by extracting electrode
Electron detector is reached after accelerating with beam forming electrode；
The photoelectronic information that the information and electron detector for the fragment ion that seven, reference ion detectors obtain obtain,
For carrying out photic isolated research under low temperature.
The beneficial effects of the present invention are:
The present invention carries out electronics and fragment ion imaging simultaneously, wherein the ion stored can be within the time of musec order
The ground state for degenerating to vibration and rotational energy makes it possible to carry out photodecomposition on cooling anion from experiment, and increases
The energy resolution of the Dissociation of neutral molecule reaction.The ion source is the caesium plasma sputter source of low repeatability, can be produced
Can be lower in raw ion, improving can accuracy of measurement.Ion storage method compared to the prior art, the focusing electrode group and
The cascaded structure of the quality selection electrode group provides high duty ratio, and does not need repeatedly to cool down ion, in addition, its
It is compact-sized simple and conveniently integrated with other Current experiments.
Detailed description of the invention
It is further illustrated below with reference to figure of the invention:
Fig. 1 is schematic structural view of the invention.
In figure, 1. ion sources, 2. accelerators, 3. flight time mass spectrums, 4. mass particle selectors, 5. magnetic shielding covers, 6.
Ion beam entrance, 7. focusing electrode groups, 7-1. electrode I, 7-2. electrode II, 7-3. electrode III, 7-4. electrode IV, 7-5. electrode
V, 8. photoelectricity subexits, 9. mass select electrode group, 9-1. electrode VI, 9-2. electrode VII, 9-3. electrode VIII, 9-4. electrode
IX, 9-5. electrode X, 10. laser entrances, 11. ion outlets, 12. ion detectors, 13. electronic backgrounds reduce plate, 14. reflections
Plate, 15. ion revision boards, 16. extract electrode, 17. beam forming electrodes, 18. electron detectors.
Specific embodiment
Studying photic isolated device mainly if Fig. 1 is schematic structural view of the invention, under a kind of low temperature includes being located at superelevation
Ion source (1), accelerator (2) in vacuum environment, flight time mass spectrum (3), mass particle selector (4), magnetic shielding cover
(5), ion beam entrance (6), by electrode I (7-1), electrode II (7-2), electrode III (7-3), electrode IV (7-4), electrode V (7-
5) form focusing electrode group (7), photoelectricity subexit (8), by electrode VI (9-1), electrode VII (9-2), electrode VIII (9-3),
The quality of electrode IX (9-4), electrode X (9-5) composition selects electrode group (9), laser entrance (10), ion outlet (11), ion
Detector (12), electronic background reduce plate (13), reflecting plate (14), ion revision board (15), extract electrode (16), beam forming electrode
(17) and electron detector (18), the focusing electrode group (7), quality selection electrode group (9), electronic background reduce plate (13),
Reflecting plate (14) and ion revision board (15) are respectively positioned in the magnetic shielding cover (5), and the magnetic shielding cover (5) has the ion
Beam entrance (6), photoelectricity subexit (8), laser entrance (10) and ion outlet (11), the reflecting plate (14), ion revision board
(15), extracting electrode (16) and beam forming electrode (17) is annular, electronic background reduction plate (13), reflecting plate (14) and from
In sub- revision board (15) is sequentially located at the laser entrance (10) and it is located at the focusing electrode group (7) and quality selection electricity
Between pole group (9), laser can by the laser entrance (10) pass through the electronic background reduce plate (13) and in it is described from
The interaction zone of laser and ion, face institute on the outside of the magnetic shielding cover (5) are formed at sub- revision board (15) overcentre
State that ion beam entrance (6) is coaxial to be sequentially installed with the mass particle selector (4), flight time mass spectrum (3), accelerator (2)
With ion source (1), coaxial to be sequentially installed with extractions electric for photoelectricity subexit (8) described in face on the outside of the magnetic shielding cover (5)
Pole (16), beam forming electrode (17) and electron detector (18), the ion detector (12) are located on the outside of the magnetic shielding cover (5)
At ion outlet described in face (11).
The ion source (1) is the caesium plasma sputter source of low repeatability, the focusing electrode group (7) and quality selection
Electrode group (9) is annular electrode, and resistance, only electrode I (7- in the focusing electrode group (7) are in series between adjacent electrode
1) hole at center has a metal mesh, the focusing electrode group (7) to the fragment ion generated after ion and laser interaction into
Line focusing, so that ion meets the focused condition of particle rapidity imaging, the matter before reaching the ion detector (12)
The hole of five electrode centers of amount selection electrode group (9) all has metal mesh, will not significantly affect vertical point of ion beam speed
Amount, quality selection electrode group (9) carry out quality choosing to the ion for entering magnetic shielding cover (5) from the ion beam entrance (6)
It selects；The accelerator (2) includes electrode, ion repeller, withdrawal device and grounding electrode, and has metal mesh attachment, the gold
Belong to net to contact with withdrawal device and grounding electrode, to generate the focusing item for meeting particle rapidity imaging before electrostatic lenses effect is come
Part；It is external all with individual low temperature cold screen in the focusing electrode group (7) and quality selection electrode group (9), so that storage
Ion the ground state of vibration and rotational energy can be degenerated within the time of musec order；Electrode group is selected in the quality
(9) apply a voltage on, the ion with phase homogenous quantities is enabled to reach some position with the smallest Annual distribution；Pass through
Adjusting is applied to the ratio of voltage in focusing electrode group (7) and quality selection electrode group (9), can reach Voice segment condition,
And thus improve mass spectrographic resolution ratio；Laser light incident direction with ion motion direction be it is orthogonal, ion oscillation passes through the grain
Protonatomic mass selector (4) reaches boundling effect, and is phase locked a mode-locked laser, can guarantee ion beam and laser pulse
It is instantaneous to be overlapped, only intersect when ion is moved to focusing electrode group (7) direction with laser.
Electrode I (7-1), electrode II (7-2), electrode III (7-3), the centre bore of electrode IV (7-4) and electrode V (7-5) are equal
For circle, and radius successively successively decreases, electrode VI (9-1), electrode VII (9-2), electrode VIII (9-3), electrode IX (9-4) and electricity
The centre bore of pole X (9-5) is that round and radius is incremented by successively.
Electrode I (7-1), electrode II (7-2), electrode III (7-3), the centre bore of electrode IV (7-4) and electrode V (7-5) are equal
Be square and side length successively successively decreased, electrode VI (9-1), electrode VII (9-2), electrode VIII (9-3), electrode IX (9-4) and
The centre bore of electrode X (9-5) is square and side length is incremented by successively.
The present invention in photic separation synchronous experiments use by two arrays of electrodes respectively to forerunner's ion carry out quality choosing
It selects and effect is focused to fragment ion, the fragment ion generated is enabled to reach the focused condition of particle rapidity imaging, and
Electronics and fragment ion imaging can be carried out simultaneously, in addition, using the caesium plasma sputter source of low repeatability and low temperature cold screen, so that
Reach the requirement of photic separating experiment to the cooling effect of ion, and increases the energy of the Dissociation of neutral molecule reaction
It differentiates.
Claims (3)
1. studying photic isolated device under a kind of low temperature, mainly includes the ion source (1) being located in ultra-high vacuum environment, accelerates
Device (2), flight time mass spectrum (3), mass particle selector (4), magnetic shielding cover (5), ion beam entrance (6), by electrode I (7-
1), electrode II (7-2), electrode III (7-3), electrode IV (7-4), the focusing electrode group (7) of electrode V (7-5) composition, photoelectron
Outlet (8) is made of electrode VI (9-1), electrode VII (9-2), electrode VIII (9-3), electrode IX (9-4), electrode X (9-5)
Quality selects electrode group (9), laser entrance (10), ion outlet (11), ion detector (12), electronic background to reduce plate
(13), reflecting plate (14), ion revision board (15), extraction electrode (16), beam forming electrode (17) and electron detector (18), it is described
Focusing electrode group (7), quality selection electrode group (9), electronic background reduce plate (13), reflecting plate (14) and ion revision board (15)
It is respectively positioned in the magnetic shielding cover (5), the magnetic shielding cover (5) has the ion beam entrance (6), photoelectricity subexit (8), swashs
Light entrance (10) and ion outlet (11), the reflecting plate (14), extract electrode (16) and beam forming electrode at ion revision board (15)
It (17) is annular, electronic background reduction plate (13), reflecting plate (14) and ion revision board (15) are sequentially located at described sharp
In at light entrance (10) and it is located between the focusing electrode group (7) and quality selection electrode group (9), laser can pass through institute
Laser entrance (10) are stated to reduce plate (13) across the electronic background and formed at ion revision board (15) overcentre
The interaction zone of laser and ion, ion beam entrance (6) is coaxial successively installs described in face on the outside of the magnetic shielding cover (5)
There are the mass particle selector (4), flight time mass spectrum (3), accelerator (2) and ion source (1), the magnetic shielding cover (5)
The coaxial extraction electrode (16), beam forming electrode (17) and the electronics of being sequentially installed with of photoelectricity subexit (8) described in the face of outside is visited
It surveys device (18), the ion detector (12) is located on the outside of the magnetic shielding cover (5) at ion outlet (11) described in face,
It is characterized in that: the ion source (1) is the caesium plasma sputter source of low repeatability, the focusing electrode group (7) and the matter
Amount selection electrode group (9) is annular electrode, and resistance is in series between adjacent electrode, only has electricity in the focusing electrode group (7)
The hole at the center pole I (7-1) has metal mesh, and the focusing electrode group (7) is to the ion generated after ion and laser interaction
Fragment is focused, so that ion meets the focused condition of particle rapidity imaging before reaching the ion detector (12),
The hole of five electrode centers of quality selection electrode group (9) all has metal mesh, will not significantly affect ion beam speed
Vertical component, quality selection electrode group (9) carry out the ion for entering magnetic shielding cover (5) from the ion beam entrance (6)
Quality selection；The accelerator (2) includes electrode, ion repeller, withdrawal device and grounding electrode, and has metal mesh attachment,
The metal mesh is contacted with withdrawal device and grounding electrode, meets particle rapidity imaging before electrostatic lenses effect is come to generate
Focused condition；It is external all with individual low temperature cold screen in the focusing electrode group (7) and quality selection electrode group (9), so that
The ion that must be stored can degenerate to the ground state of vibration and rotational energy within the time of musec order；Electricity is selected in the quality
Apply a voltage in pole group (9), the ion with phase homogenous quantities is enabled to reach some position with the smallest Annual distribution；
It is applied to the ratio of voltage in focusing electrode group (7) and quality selection electrode group (9) by adjusting, Voice segment item can be reached
Part, and thus improve mass spectrographic resolution ratio；Laser light incident direction with ion motion direction be it is orthogonal, ion oscillation passes through described
Mass particle selector (4) reaches boundling effect, and is phase locked a mode-locked laser, can guarantee ion beam and laser arteries and veins
Punching is instantaneous to be overlapped, and is only intersected when ion is moved to focusing electrode group (7) direction with laser.
2. photic isolated device is studied under a kind of low temperature according to claim 1, it is characterized in that: electrode I (7-1), electricity
Pole II (7-2), electrode III (7-3), electrode IV (7-4) and electrode V (7-5) centre bore be that round and radius is successively passed
Subtract, electrode VI (9-1), electrode VII (9-2), electrode VIII (9-3), electrode IX (9-4) and electrode X (9-5) centre bore be
Round and radius is incremented by successively.
3. photic isolated device is studied under a kind of low temperature according to claim 1, it is characterized in that: electrode I (7-1), electricity
Pole II (7-2), electrode III (7-3), electrode IV (7-4) and electrode V (7-5) centre bore be square and side length is successively passed
Subtract, electrode VI (9-1), electrode VII (9-2), electrode VIII (9-3), electrode IX (9-4) and electrode X (9-5) centre bore be
Square and side length is incremented by successively.
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| JP2014116294A (en) * | 2012-11-19 | 2014-06-26 | Canon Inc | Ion mass selector, ion irradiator, surface analysis device and ion mass selection method |
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