CN107390311A - A kind of photonic crystal nanometer fracture faces plasma resonance grating of multiple periodicity - Google Patents
A kind of photonic crystal nanometer fracture faces plasma resonance grating of multiple periodicity Download PDFInfo
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- CN107390311A CN107390311A CN201710572595.1A CN201710572595A CN107390311A CN 107390311 A CN107390311 A CN 107390311A CN 201710572595 A CN201710572595 A CN 201710572595A CN 107390311 A CN107390311 A CN 107390311A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1809—Diffraction gratings with pitch less than or comparable to the wavelength
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B2005/1804—Transmission gratings
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Abstract
The present invention relates to a kind of photonic crystal nanometer fracture faces plasma resonance grating of multiple periodicity, belong to optical diffraction gratings detection field.The optical grating construction from top to bottom, is made up of golden membranous layer, silicon nitride material and glass negative successively.The grid stroke of etching passes through minor cycle p and large period P periodically regular arrangements.Minor cycle p is the distance between the adjacent spaces grid stroke of small spacing 420nm, is easy to produce surface plasma body resonant vibration；Large period is the distance 2100nm of five grid strokes, removes a wherein minor cycle grid stroke and is formed, and is easy to surface plasma body resonant vibration ripple carrying out diffraction and angle dispersion.Light source produces surface plasma body resonant vibration by glassy layer and silicon nitride layer at golden membranous layer, and the first-order diffraction of its resonance wave is detected by CCD.The present invention will have great effect in the detection fields such as optics, biochemical sensitive, easier to be more comprehensive than traditional spectral method of detection, reduce the cost and instrument size of biology sensor.
Description
Technical field
The present invention relates to a kind of surface plasma body resonant vibration grating, the photonic crystal nanometer of more particularly to a kind of multiple periodicity
Fracture faces plasma resonance grating.
Background technology
1902, R.W.Wood was found that the light and shade band in metallic reflection Diffractive Grating Spectrum, and the phenomenon can not use classics
Optical grating diffraction theory explain, therefore be referred to as Wood anomalies.The phenomenon is that occur in normal diffraction angle distribution spectrum
New diffraction maximum (paddy).By years of researches, nineteen sixty, E.A.Stren and R.A.Farrel have studied such a pattern production
The condition of raw resonance simultaneously proposes surface phasmon (Surface Plasmon, SP) concept first.It is ripe in nanometer technology
Afterwards, surface plasma has been a great deal of attention, and turns into the focus of research from the 1990s.It by
Sensed applied to including biochemistry, integrated opto-electronics device multiple fields.
Surface plasma resonance (surface plasma resonance, referred to as SPR) is a kind of physical optics phenomenon.
Using evanescent wave of the light at glass interface during experiences total internal reflection, the free electron of metal surface can be excited to produce surface etc.
Gas ions.It is the frequency and ripple of surface plasma and evanescent wave under conditions of a certain appropriate value in incidence angle or wavelength
Number is equal, and the two will be resonated, and incident light is absorbed, and energy of reflection light drastically declines, and occurs formant in reflectance spectrum
(i.e. reflected intensity minimum).When abutting against the medium refraction index difference of metal film surfaces, resonant positions are by difference.Should
Physical characteristic can be used for the refractive index of measurement medium, be widely used to chemical, biology, environmental monitoring, gradual shape
The study hotspot new into international sensor field, SPR coherent detections instrument such as SPR index sensors, SPR resonance instrument, SPR
Spectrometer etc. is widely used.The image checking of SPR resonant gratings and CCD, for measure spectrums such as traditional spectrometers
Instrument and method have major improvement, the resonant grating based on SPR methods medium refraction index change in the case of, its resonate
Angle can change, and spectral resonance spike length can be moved, and changed by spr signal and detect that the target adhered on grating is examined
The intensity of the specificity of the intermolecular interaction of survey medium, concentration, compatibility, dynamics and combination.
Grating is also referred to as diffraction grating, is the optics member for making light generation dispersion (being decomposed into spectrum) using more seam diffraction principles
Part.It is one piece of flat glass or sheet metal for being carved with a large amount of parallel wide, equidistant slits (groove).The slot number of grating is very
Greatly, it is general every millimeter tens to thousands of.Interference between diffraction and each seam that monochromatic collimated beam is each stitched by grating, is formed dark
The pattern that striped is very wide, bright fringe is very thin, these are sharp thin and bright striped is referred to as spectral line.The position of spectral line is different with wavelength,
After polychromatic light is by grating, the spectral line of different wave length occurs in different positions and forms spectrum.Light forms light by grating
Spectrum is the common results of single slit diffraction and multislit interference.The appearance of grating so that we can allow light to be presented in the form of spectrum
It is easier to be directly perceived by spectral investigation ripple signal in face of us.
Photonic crystal is only by S.John and E.Yablonovitch difference in 1987 as a kind of new ideas and new material
It is vertical to propose, it is the artificial micro-structure formed by the medium period arrangement of different refractivity.Photonic crystal is forbidden photon band material,
From material structure, photonic crystal is a kind of engineer on optics yardstick with periodic dielectric structures and manufacture
Crystal.Had energy is in the photon in photon band gap, it is impossible into the crystal.Photonic crystal and semiconductor in basic model and
There are many similarities on Research Thinking, people can reach control by designing and manufacturing photonic crystal and its device in principle
The purpose of photon motion processed.The appearance of photonic crystal (also known as forbidden photon band material), makes people manipulate and control the dream of photon
It is possibly realized.The appearance of photon crystal grating so that the mankind have strided forward the step advanced to the ability for manipulating photon.
The content of the invention
The purpose of the present invention is：It is proposed a kind of photonic crystal nanometer fracture faces plasma resonance light of multiple periodicity
Grid；The structure overcomes traditional detection method shortcoming that resonance spectrum can only be detected at zero level transmitted light, possesses higher
Detect the advantages of plasma resonance optical spectrum in rank diffraction (first-order diffraction) place；Simplify transmission spectra detection instrument system size and into
This；It is simple in construction, high sensitivity.
The optical grating construction has multiple periodicity, i.e. two kinds of cycles in the present invention --- large period P and minor cycle p, large period P
Resonance wave caused by metal surface is carried out structure into angle dispersion and diffraction, minor cycle p structure are then easy to light normal incidence to golden membranous layer
Surface plasma body resonant vibration ripple is produced afterwards；When light source normal incidence enters glass negative, light passes through glass negative, through silicon nitride
Material layer, golden membranous layer is arrived at, under certain wavelength, surface plasma body resonant vibration is produced, by optical grating construction by surface plasma
Resonance body ripple signal is diffracted into CCD, and CCD imager shows the spectrogram to be formed.
The technical solution adopted in the present invention is that a kind of photonic crystal nanometer fracture faces plasma of multiple periodicity is total to
Shake grating, it is characterised in that：The grating is made up of three parts, glass negative, silicon nitride material and golden membranous layer；Glass negative is most
Lower floor, silicon nitride material is in intermediate layer, and golden membranous layer is in the superiors；The thickness of glass negative is about 700nm, silicon nitride material thickness
About 175nm, the thickness of golden membranous layer is about 50nm.
Wherein, there are two kinds of cycles in the cycle of the grating, is divided into large period P and minor cycle p；Will with the method for beamwriter lithography
Silicon nitride material and golden membranous layer etched diffraction grating line, the grid stroke are a nanometer crack, width 140nm.
Wherein, the minor cycle p of the grating is 420nm, be two small distances adjacent spaces grid stroke between distance；Should
The large period P of grating is 2100nm, is often carved into three grid strokes, the distance of two grid strokes is moved rearwards, in Article 5 grating
The opening position of line carves Article 4 grid stroke, then this four grid strokes form a large periods, first and Article 4 grid stroke it
Between big distance be 2100nm, therefore large period P is 2100nm；This rule etching is repeated, forms the grid stroke of big minor cycle.
Wherein, during beamwriter lithography, the thick adhesions of 2nm are sprayed on glass negative with magnetic control DC playpipes first
Layer, the thick silicon nitride materials of 175nm are then sprayed on adhesion layer；Then, electricity thick spin coating 200nm in silicon nitride material
Beamlet resist layer ZEP 520A, the pattern in nanometer crack (grid stroke) under being drawn on resist layer, and opened with electron beam is against corrosion
Hair instrument ZED N50 have etched pattern；After the pattern of electron sensitive resist layer etches, reactive ion etching machine device is used
RIE etches into the pattern on electron sensitive resist layer in silicon nitride material by the method for argon ion gas etching；Argon from
After the completion of sub- gas etching, electron sensitive resist layer is removed, then spraying the thick golden membranous layers of 50nm using Denton injectors exists
In silicon nitride material, then prepared by the photonic crystal nanometer fracture faces plasma resonance grating of multiple periodicity completes.
Wherein, the photon crystal structure of the grating is 1-D photon crystal, by silicon nitride material and golden membranous layer through electron beam
Regular periodic arrangement after etching and formed；Photon crystal structure grating presses two kinds of cycles along glass negative surface periodic
Arrangement, large period (P) 2100nm, minor cycle (p) 420nm.
Wherein, incident light source is broadband coherent source, using super continuous wide band laser, its wave-length coverage be 500nm~
2400nm；When light source is from glass negative normal incidence, light source passes through silicon nitride material, and incident light is obtained certain by silicon nitride
Enhancing, enhanced light are incided on golden membranous layer, and minor cycle p optical grating construction produces surface plasma body resonant vibration ripple, surface etc.
Ion resonance body can cause light to obtain further local enhancing at nanometer crack (grid stroke) place, and large period P optical grating constructions will increase
Light after strong carries out angle dispersion and diffraction.The optical grating construction detects plasma resonance at first-order diffraction, not only exists
Detected at zero level transmission, it is only necessary to detected using CCD imager, it may not be necessary to by extra conventional spectrometers detector resonance light
Compose, the one order diffracted spots detected in CCD at first-order diffraction form a miniature spectrum.
Wherein, the first-order diffraction opening position above grating places CCD imager, and CCD uses Sony ICX098BQ, uses
In detection first-order diffraction resonance, and it is allowed to be imaged；The HeNe lasers correction for being 632.8nm with wavelength and adjustment measuring system
Correlation is set；In the case of the first-order diffraction of light normal incidence, the relation between its CCD pixel and wavelength is：
Wherein θ is first-order diffraction angle, and λ is incident wavelength, and P is large period.
The present invention have the advantage that compared with the prior art and effect is：Overcome traditional can only examine at zero level transmitted light
The detection method shortcoming of resonance spectrum signal is measured, possesses and detects plasma resonance light at higher order diffraction (first-order diffraction) place
The advantages of spectrum；Method than the spectral measurement of traditional relevant surface plasma body resonant vibration is more simple and convenient；In traditional biochemistry
Greatly simplified in sensor and spectral instrument manufacture, reduce the cost of biochemical sensor and shorten instrument
Size；With the features such as simple in construction, function is more sound and flexible, high sensitivity, and accuracy is high.In optical detection, photoelectricity
Son is learned and materialogy application, and biochemistry detection etc. has great meaning and effect in field, it will produces preferably economic effect
Benefit and social benefit.
Brief description of the drawings
Fig. 1 is a kind of structure chart of the photonic crystal nanometer fracture faces plasma resonance grating of multiple periodicity；
Fig. 2 is a kind of SEM figures of the photonic crystal nanometer fracture faces plasma resonance grating of multiple periodicity；
Fig. 3 is a kind of first-order diffraction figure of the photonic crystal nanometer fracture faces plasma resonance grating of multiple periodicity；
Fig. 4 is a kind of manufacturing process signal of the photonic crystal nanometer fracture faces plasma resonance grating of multiple periodicity
Figure.
Embodiment
The present invention is further illustrated below in conjunction with the accompanying drawings, but does not therefore limit the scope of the invention.
As shown in figure 1, a kind of photonic crystal nanometer fracture faces plasma resonance grating of multiple periodicity is by three parts
Composition, glass negative, silicon nitride material and golden membranous layer；Glass negative exists in orlop, silicon nitride material in intermediate layer, golden membranous layer
The superiors；The thickness of glass negative is about 700nm, and silicon nitride material thickness is about 175nm, and the thickness of golden membranous layer is about 50nm.
There are two kinds of cycles in the cycle of the grating, is divided into large period P and minor cycle p；With the method for beamwriter lithography by silicon nitride material
With golden membranous layer etching nanometer crack, this nanometer of crack is grid stroke, width 140nm.
Wherein, the minor cycle p of the grating is 420nm, be two small distances adjacent spaces grid stroke between distance；Should
The large period P of grating is 2100nm, is often carved into three grid strokes, the distance of two grid strokes is moved rearwards, in Article 5 grating
The opening position of line carves Article 4 grid stroke, then this four grid strokes form a large periods, first and Article 4 grid stroke it
Between big distance be 2100nm, therefore large period P is 2100nm；This rule etching is repeated, forms the grid stroke of big minor cycle.
Light source passes through silicon nitride material from glass negative normal incidence, light is obtained a certain degree of enhancing, enhanced light
Incide on golden membranous layer, the optical grating construction of minor cycle produces surface plasma body resonant vibration ripple, and surface plasma body resonant vibration can cause
Light obtains further local enhancing at nanometer crack (grid stroke) place, and resonance wave is carried out angle dispersion and spread out by large period optical grating construction
Penetrate.The optical grating construction detects plasma resonance at first-order diffraction, is detected not only at zero level transmission；Above grating
First-order diffraction opening position place CCD imager, for detecting first-order diffraction resonance, and be allowed to light spectrum image-forming, detected in CCD
First-order diffraction at the hot spot that is formed equivalent to miniature spectrum, it may not be necessary to by extra conventional spectrometers detector detection one
Spectrum at order diffraction；Surface plasma body resonant vibration wave dispersion after large period P optical grating diffractions is mapped on CCD imager,
The HeNe lasers for being 632.8nm with wavelength are corrected setting related to adjustment measuring system to CCD, resonance spectrum is existed
It is imaged on CCD.
Specific preparation method is as follows：
During beamwriter lithography, the thick adhesion layers of 2nm are sprayed on glass negative with magnetic control DC playpipes first, so
The thick silicon nitride materials of 175nm are sprayed afterwards on adhesion layer；Then, electron beam thick spin coating 200nm in silicon nitride material
Resist layer ZEP 520A, the pattern in nanometer crack (grid stroke) under being drawn on resist layer, and with electron beam exploitation instrument against corrosion
Device ZED N50 have etched pattern；, will using reactive ion etching machine device RIE after the pattern of electron sensitive resist layer etches
Pattern on electron sensitive resist layer is etched into silicon nitride material by the method for argon ion gas etching；Argon ion gas
After the completion of etching, electron sensitive resist layer is removed, then sprays the thick golden membranous layers of 50nm in silicon nitride using Denton injectors
In material layer, then prepared by the photonic crystal nanometer fracture faces plasma resonance grating of multiple periodicity completes.
As shown in Fig. 2 a kind of SEM figures of the photonic crystal nanometer fracture faces plasma resonance grating of multiple periodicity,
The figure is after optical grating construction is made, and is placed on the pictorial diagram for observing to obtain under electronic scanner microscope.The wherein grating of minor cycle
The grid stroke of line and large period can be clearly apparent in figure.
As shown in figure 3, a kind of one-level of the photonic crystal nanometer fracture faces plasma resonance grating of multiple periodicity is spread out
Penetrate figure.The zero level transmission peaks of nanometer crack enhancing light and first-order diffraction peak caused by surface plasma body resonant vibration in 781nm,
The nanometer crack of another surface plasma body resonant vibration strengthens light zero level transmission peaks at 1156nm in the structure, and its first-order diffraction
Peak produces slight red shift at 1178nm.If the optical grating construction is placed in other media fluids or grating surface applies
Upper testing sample, its diffraction maximum can be moved, and the relevant information for detecting testing sample also can be different.
A kind of as shown in figure 4, making of the photonic crystal nanometer fracture faces plasma resonance grating of multiple periodicity
Journey schematic diagram.
Claims (7)
- A kind of 1. photonic crystal nanometer fracture faces plasma resonance grating of multiple periodicity, it is characterised in that：The grating by Three parts form, glass negative, silicon nitride material and golden membranous layer；Glass negative is in orlop, and silicon nitride material is in intermediate layer, gold Film layer is in the superiors；The thickness of glass negative is about 700nm, and silicon nitride material thickness is about 175nm, and the thickness of golden membranous layer is about 50nm。
- 2. a kind of photonic crystal nanometer fracture faces plasma resonance grating of multiple periodicity according to claim 1, It is characterized in that：(1) there are two kinds of cycles in the cycle of the grating, is divided into large period P and minor cycle p；(2) silicon nitride material and golden membranous layer are etched into nanometer crack with the method for beamwriter lithography, this nanometer of crack is light Grid line, nanometer fracture width are 140nm；The minor cycle p of the grating is 420nm, is the grating of the adjacent spaces of two small distances Distance between line；(3) the large period P of the grating is 2100nm, is often carved into three grid strokes, is moved rearwards the distance of two grid strokes, The opening position of five grid strokes carves Article 4 grid stroke, then this four grid strokes form a large period, first and Article 4 Big distance between grid stroke is 2100nm, therefore large period P is 2100nm；This rule etching is repeated, forms the light of big minor cycle Grid line.
- 3. a kind of photonic crystal nanometer fracture faces plasma resonance grating of multiple periodicity according to claim 1, It is characterized in that：The photon crystal structure of the grating is 1-D photon crystal, is carved by silicon nitride material and golden membranous layer through electron beam Regular periodic arrangement after erosion and formed；Photon crystal structure is arranged by two kinds of cycles along glass negative surface periodic, Large period (P) 2100nm, minor cycle (p) 420nm.
- 4. a kind of photonic crystal nanometer fracture faces plasma resonance grating of multiple periodicity according to claim 1, It is characterized in that：Light source strengthens light by glass negative, positive silicon nitride material of injecting, and then normal incidence to golden membranous layer produces table Surface plasma resonance, light is set to obtain further local enhancing at nanometer crack (grid stroke) place；Minor cycle in optical grating construction For producing surface plasma body resonant vibration ripple, resonance wave is carried out angle dispersion and diffraction by large period.
- A kind of 5. photonic crystal nanometer fracture faces plasma resonance grating of multiple periodicity, it is characterised in that：Incident light source For broadband coherent source, using super continuous wide band laser, its wave-length coverage is 500nm~2400nm；Electronic beam photetching process It is as follows using argon ion vapor etching techniques, its preparation process：(1) during beamwriter lithography, the thick adhesion layers of 2nm are sprayed on glass negative with magnetic control DC playpipes first, Then the thick silicon nitride materials of 175nm are sprayed on adhesion layer；(2) electron sensitive resist layer ZEP 520A thick spin coating 200nm in silicon nitride material, received under being drawn on resist layer The pattern in rice crack (grid stroke), and etched pattern with electron beam exploitation instrument ZED N50 against corrosion；(3) after the pattern of electron sensitive resist layer etches, using reactive ion etching machine device RIE by electron sensitive resist layer On pattern etched into by the method for argon ion gas etching in silicon nitride material；After the completion of argon ion gas etching, remove De-electromation beam resist layer；(4) using golden membranous layer thick Denton injectors injection 50nm in silicon nitride material, the photonic crystal of multiple periodicity Prepared by nanometer fracture faces plasma resonance grating completes.
- A kind of 6. photonic crystal nanometer fracture faces plasma resonance grating of multiple periodicity, it is characterised in that：The grating knot Structure detects plasma resonance at first-order diffraction, is detected not only at zero level transmission, and first-order diffraction resonance is examined with CCD Survey；The hot spot that CCD detections are formed at first-order diffraction, the hot spot form micro spectral, can the direct viewing spectrum, it is not necessary to by Extra conventional spectrometers detector detects its spectrum again.
- A kind of 7. photonic crystal nanometer fracture faces plasma resonance grating of multiple periodicity, it is characterised in that：Above grating First-order diffraction opening position place CCD imager, CCD use Sony ICX098BQ, is resonated for detecting first-order diffraction, and make Imaging；The HeNe lasers correction setting related to adjustment measuring system for being 632.8nm with wavelength；The one of light normal incidence In the case of order diffraction, the relation between its CCD pixel and wavelength is：Wherein θ is first-order diffraction angle, λ be into Ejected wave is grown, and P is large period.
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Cited By (10)
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| CN108549124A (en) * | 2018-04-12 | 2018-09-18 | 中北大学 | A kind of device and method using pulse laser machining holography golden light grid |
| CN109633797A (en) * | 2018-12-25 | 2019-04-16 | 四川大学 | The nanostructure and its manufacturing method of Electromagnetic enhancement are realized by resonance coupling |
| CN109696717A (en) * | 2019-03-07 | 2019-04-30 | 深圳珑璟光电技术有限公司 | A kind of diffraction grating and AR imaging device in more rectangular configuration periods |
| CN109839749A (en) * | 2019-04-02 | 2019-06-04 | 上海理工大学 | Variable period grating photonic crystal super-resolution imaging device |
| CN111398217A (en) * | 2019-06-05 | 2020-07-10 | 江西师范大学 | High-quality plasmon optical sensor and preparation method thereof |
| WO2020219155A1 (en) | 2019-04-26 | 2020-10-29 | Applied Materials, Inc. | Transferring nanostructures from wafers to transparent substrates |
| CN112558215A (en) * | 2020-12-07 | 2021-03-26 | 北京信息科技大学 | Step type equal-grid-pitch grating based on femtosecond laser technology and preparation method thereof |
| CN113031139A (en) * | 2019-12-25 | 2021-06-25 | 南开大学 | Transmission type large-angle deflection double-layer uniform grating for 3D printing |
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| CN108549124A (en) * | 2018-04-12 | 2018-09-18 | 中北大学 | A kind of device and method using pulse laser machining holography golden light grid |
| CN108549124B (en) * | 2018-04-12 | 2020-10-02 | 中北大学 | Device and method for processing holographic gold grating by adopting pulse laser |
| CN109633797A (en) * | 2018-12-25 | 2019-04-16 | 四川大学 | The nanostructure and its manufacturing method of Electromagnetic enhancement are realized by resonance coupling |
| WO2020177224A1 (en) * | 2019-03-07 | 2020-09-10 | 深圳珑璟光电技术有限公司 | Diffraction gratings having multi-rectangular structure period and ar imaging device |
| CN109696717A (en) * | 2019-03-07 | 2019-04-30 | 深圳珑璟光电技术有限公司 | A kind of diffraction grating and AR imaging device in more rectangular configuration periods |
| CN109839749A (en) * | 2019-04-02 | 2019-06-04 | 上海理工大学 | Variable period grating photonic crystal super-resolution imaging device |
| CN109839749B (en) * | 2019-04-02 | 2021-04-20 | 上海理工大学 | Variable period grating photonic crystal super-resolution imaging device |
| WO2020219155A1 (en) | 2019-04-26 | 2020-10-29 | Applied Materials, Inc. | Transferring nanostructures from wafers to transparent substrates |
| EP3959547A4 (en) * | 2019-04-26 | 2023-01-18 | Applied Materials, Inc. | Transferring nanostructures from wafers to transparent substrates |
| CN111398217A (en) * | 2019-06-05 | 2020-07-10 | 江西师范大学 | High-quality plasmon optical sensor and preparation method thereof |
| CN113031139A (en) * | 2019-12-25 | 2021-06-25 | 南开大学 | Transmission type large-angle deflection double-layer uniform grating for 3D printing |
| CN113031139B (en) * | 2019-12-25 | 2022-07-05 | 南开大学 | Transmission type large-angle deflection double-layer uniform grating for 3D printing |
| CN112558215A (en) * | 2020-12-07 | 2021-03-26 | 北京信息科技大学 | Step type equal-grid-pitch grating based on femtosecond laser technology and preparation method thereof |
| CN114910988B (en) * | 2022-05-17 | 2023-10-24 | 扬州大学 | Multiple nanometer square column array broadband perfect absorber |
| CN115047609A (en) * | 2022-07-01 | 2022-09-13 | 中国科学院光电技术研究所 | Super-resolution imaging system and method based on Bloch surface wave structured light illumination |
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