CN107338479A - A kind of inlet duct and method of vertical diffusion furnace - Google Patents
A kind of inlet duct and method of vertical diffusion furnace Download PDFInfo
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- CN107338479A CN107338479A CN201710773930.4A CN201710773930A CN107338479A CN 107338479 A CN107338479 A CN 107338479A CN 201710773930 A CN201710773930 A CN 201710773930A CN 107338479 A CN107338479 A CN 107338479A
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- inner tube
- stove
- reacting gas
- balance pipe
- stove inner
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
- C30B31/16—Feed and outlet means for the gases; Modifying the flow of the gases
Abstract
The invention discloses a kind of inlet duct and method of vertical diffusion furnace, including：Air inlet pipe, the first balance pipe, first flow valve and second flow valve.The flow velocity of reacting gas in the first balance pipe is controlled by first flow valve, first balance pipe is delivered to the reacting gas of stove inner tube, due to the first balance pipe and the second balance pipe reacting gas spread in stove inner tube it is in opposite direction, first balance pipe is delivered to the reacting gas of stove inner tube, can be with the air pressure at diverse location in equalizing furnace inner tube, so that the air pressure in the pipeline of stove inner tube at diverse location is equal, and then cause stove inner tube on venthole at reacting gas flow velocity it is consistent, reacting gas uniformly diffuses to the crystal column surface of diverse location, the thickness and quality for realizing different crystal column surface film growths are consistent.
Description
Technical field
The present invention relates to semiconductor chip manufacturing field, inlet duct and side more particularly to a kind of vertical diffusion furnace
Method.
Background technology
With developing by leaps and bounds for semiconductor process technique, semiconductor chip is widely used in electronic equipment and (such as calculated
Machine, mobile phone, tablet personal computer etc.) in., it is necessary to carry out film on wafer (i.e. silicon wafer) during semiconductor chip is manufactured
Growth, and conventional film growth apparatus is diffusion furnace.
At present, the film growth apparatus of some main flows is the vertical diffusion furnace based on upright type of design.As shown in figure 1, along
For vertical direction in the vertical diffusion furnace, stack places the wafer of tens of even hundreds of, and by air inlet pipe from vertical
The bottom conveying reacting gas of diffusion furnace.Wherein, air inlet pipe includes stove inner tube and stove outer tube, and stove inner tube is in vertical diffusion furnace
Vertical pipeline, stove outer tube be vertical diffusion furnace outside pipeline.In stove inner tube be provided be uniformly distributed, size identical outlet
Hole, reacting gas pass sequentially through stove outer tube and stove inner tube, enter from venthole in vertical diffusion furnace, are diffused into vertical diffusion furnace
The crystal column surface of placement, so as to which all crystal column surfaces carry out film growth simultaneously., can be largely based on this upright type of design
It is upper to save the floor space of diffusion furnace, and the film growth on considerable wafer surface can be carried out in a vertical diffusion furnace,
It is highly suitable for large-scale semiconductive chip.
But in the production technology of semiconductor, it is desirable to the thickness of all crystal column surface film growths in same diffusion furnace
It is consistent, that is, requires in vertical diffusion furnace as far as possible with quality, the reacting gas for diffusing to each crystal column surface is uniformly distributed.
If place wafer in vertical diffusion furnace it is more when, accordingly, length of the air inlet pipe in vertical diffusion furnace can also increase.When entering
When the vertical pipeline that tracheae is present in vertical diffusion furnace is longer, the reacting gas in air inlet pipe enters vertical from all ventholes
Flow in diffusion furnace is difficult to be consistent, therefore causes the reacting gas point of the crystal column surface of diverse location in vertical diffusion furnace
Cloth is uneven, different so as to the thickness and quality of different crystal column surface films growth.
The content of the invention
Present invention solves the technical problem that it is to provide a kind of inlet duct and method of vertical diffusion furnace, so as to make
It is all equal in vertical diffusion furnace air pressure inside to obtain reacting gas, uniformly diffuses to different crystal column surfaces in the vertical diffusion furnace,
And then the thickness of all crystal column surface film growths and quality are consistent.
Therefore, in a first aspect, this application provides a kind of inlet duct of vertical diffusion furnace, described device includes：
Air inlet pipe, the air inlet pipe include stove inner tube and stove outer tube, and the bottom of the stove inner tube is connected with the stove outer tube
It is logical；
First balance pipe, the first end of first balance pipe are connected with the stove inner tube top, first balance
Second end of pipe is connected with air shooter, and the air shooter is located at outside the vertical diffusion furnace, anti-for conveying
Answer gas；
First flow valve, it is arranged at the first position of first balance pipe, the first position is positioned at described vertical
Outside diffusion furnace, second flow valve, it is arranged on the stove outer tube, the first flow valve controls institute in first balance pipe
Reacting gas flow velocity is stated, the second flow valve control is delivered to the reacting gas stream of the stove inner tube from the stove outer tube
Speed, to cause the pipeline air pressure inside of the stove inner tube all equal.
Optionally, the air shooter and the stove outer tube are same pipes.
Optionally, described device also includes：
Second balance pipe, the first end of second balance pipe are connected with the stove inner tube, second balance pipe
Second end is connected with the air shooter；
3rd flow valve, the second place of second balance pipe is arranged on, the second place is positioned at described vertical
Outside diffusion furnace, for controlling the reacting gas flow velocity being delivered to from second balance pipe in the vertical diffusion furnace.
Optionally, the first end of second balance pipe is located at the stove inner tube middle.
Optionally, the caliber of first balance pipe is less than or equal to air inlet pipe caliber.
Optionally, described device also includes：
Gas pressure sensor, for measuring the gas pressure inside the stove inner tube tip duct, and in the stove
Gas pressure inside ttom of pipe end pipe road.
Optionally, described device also includes：
Air flow rate sensor, reacting gas flow velocity at venthole for measuring the stove inner tube top and described
Reacting gas flow velocity at the venthole of stove inner tube bottom.
Second aspect, present invention also provides a kind of air inlet method of the inlet duct of vertical diffusion furnace, methods described bag
Include：
First flow valve controls reacting gas flow velocity in the first balance pipe；
Second flow valve control stove outer tube is delivered to the reacting gas flow velocity of stove inner tube；
The first flow valve and the second flow valve pass through above-mentioned control so that gas inside the pipeline of the stove inner tube
Pressure is all equal.
Optionally, first flow valve controls reaction gas in the first balance pipe according to the internal pipe pressure of the stove inner tube
Rate of flow of fluid；
Second flow valve controls stove outer tube to be delivered to the described anti-of stove inner tube according to the internal pipe pressure of the stove inner tube
Answer gas flow rate.
Optionally, first flow valve controls the first balance pipe according to the reacting gas flow velocity of the venthole of the stove inner tube
Middle reacting gas flow velocity；
Second flow valve is controlled and is delivered to from stove outer tube in stove according to the reacting gas flow velocity of the venthole of the stove inner tube
The reacting gas flow velocity of pipe.
According to the above-mentioned technical solution, the method have the advantages that：
In the embodiment of the present invention, the inlet duct of vertical diffusion furnace includes：Air inlet pipe, the first balance pipe, first flow valve
And second flow valve.Wherein, air inlet pipe is including the stove outer tube outside vertical diffusion furnace and in vertical diffusion furnace
The stove inner tube in portion, the bottom of the stove inner tube are connected with stove outer tube；The first end of first balance pipe is connected with stove inner tube top,
Second end of the first balance pipe is connected with air shooter, and the air shooter is located at outside vertical diffusion furnace, for conveying
Reacting gas；First flow valve is arranged at the first position of the first balance pipe, and the first position is located at the outer of vertical diffusion furnace
Portion, second flow valve are arranged on stove outer tube, and first flow valve controls the flow velocity of reacting gas in the first balance pipe, second flow
Valve control stove outer tube is delivered to the reacting gas flow velocity of stove inner tube, to cause the pipeline air pressure inside of stove inner tube all equal.It can be seen that
The flow velocity of reacting gas in the first balance pipe is controlled by first flow valve, the first balance pipe is delivered to the reaction gas of stove inner tube
Body, spread from top to bottom in stove inner tube；Second flow valve control stove outer tube is delivered to the reacting gas flow velocity of stove inner tube, by stove
Outer tube is delivered to the reacting gas of stove inner tube, is spread from bottom to top in stove inner tube.Because the first balance pipe is delivered to stove inner tube
The direction spread in stove inner tube of reacting gas, the reacting gas with being delivered to stove inner tube by stove outer tube spreads in stove inner tube
It is in opposite direction, the reacting gas of stove inner tube is delivered to by the first balance pipe, can be with the gas at diverse location in equalizing furnace inner tube
Pressure, so that the air pressure in the pipeline of stove inner tube at diverse location is equal, and then cause at the venthole in stove inner tube
Reacting gas flow velocity is consistent, and reacting gas uniformly diffuses to the crystal column surface of diverse location, realizes different crystal column surface film lifes
Long thickness and quality is consistent.
Brief description of the drawings
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing
There is the required accompanying drawing used in technology description to be briefly described, it should be apparent that, drawings in the following description are only this
Some embodiments of invention, for those of ordinary skill in the art, on the premise of not paying creative work, can be with
Other accompanying drawings are obtained according to these accompanying drawings.
Fig. 1 is the structural representation of vertical diffusion furnace in the prior art；
Fig. 2 is the uneven principle signal of the reacting gas flow velocity of venthole output in vertical diffusion furnace in the prior art
Figure；
Fig. 3 is a kind of structural representation of the inlet duct for vertical diffusion furnace that the embodiment of the present application provides；
Fig. 4 is a kind of structural representation of the inlet duct for vertical diffusion furnace that the embodiment of the present application provides；
Fig. 5 is a kind of structural representation of the inlet duct for vertical diffusion furnace that the embodiment of the present application provides；
Fig. 6 is a kind of flow signal of the air inlet method of the inlet duct for vertical diffusion furnace that the embodiment of the present application provides
Figure.
Embodiment
In order to uniformly reach the implementation of different crystal column surfaces in vertical diffusion furnace to reacting gas of sening as an envoy to, the present invention
Embodiment provides a kind of inlet duct and method of vertical diffusion furnace, below in conjunction with Figure of description to embodiments of the invention
Illustrate, it will be appreciated that embodiment described herein is merely to illustrate and explain the present invention, and is not used to limit this hair
It is bright.And in the case where not conflicting, the feature in embodiment and embodiment in the application can be mutually combined.
Applicant it has been investigated that, in the prior art in vertical diffusion furnace, the placement of stack is more in vertical direction
Individual wafer, and reacting gas is conveyed into vertical diffusion furnace by air inlet pipe, but when the wafer in vertical diffusion furnace is more,
Stove inner tube length of the air inlet pipe in vertical diffusion furnace can also increase.When the stove inner tube that air inlet pipe is present in vertical diffusion furnace compared with
When long, due to gravity, in the stove inner tube easily there is larger barometric gradient in the reacting gas of top and bottom, i.e., in stove
The pressure change of top and bottom is larger in pipe, as shown in Figure 2.Also, for the venthole of stove inner tube diverse location, by
The pressure difference of the air pressure of air pressure and pipeline external inside pipeline is inconsistent so that the venthole output of stove inner tube diverse location
Reacting gas flow velocity is inconsistent, and the gas pressure inside stove inner tube tip duct is relatively small, going out at stove inner tube tip duct
The flow velocity of the reacting gas of stomata output is smaller；Gas pressure inside the pipeline of stove inner tube bottom is relatively large, stove inner tube bottom
The flow velocity of the reacting gas of venthole output at pipeline is larger；So as to cause the crystal column surface of diverse location in vertical diffusion furnace
Reacting gas skewness, and then different crystal column surface films growth thickness and quality it is different.
In order that the reacting gas of the stove inner tube conveying in vertical diffusion furnace, uniformly diffuses to the surfaces of different wafers, this
In the technical scheme for applying for offer, the inlet duct of vertical diffusion furnace includes：Air inlet pipe, the first balance pipe, first flow valve with
And second flow valve.Wherein, air inlet pipe is including the stove outer tube outside vertical diffusion furnace and inside vertical diffusion furnace
Stove inner tube, the bottom of the stove inner tube is connected with stove outer tube；The first end of first balance pipe is connected with stove inner tube top, the
Second end of one balance pipe is connected with air shooter, and the air shooter is located at outside vertical diffusion furnace, anti-for conveying
Answer gas；First flow valve is arranged at the first position of the first balance pipe, and the first position is located at the outside of vertical diffusion furnace,
Second flow valve is arranged on stove outer tube, and first flow valve controls the flow velocity of reacting gas in the first balance pipe, second flow valve
Control is delivered to the reacting gas flow velocity of stove inner tube from stove outer tube, to cause the pipeline air pressure inside of stove inner tube all equal.It is based on
Said apparatus, the flow velocity of reacting gas in the first balance pipe is controlled by first flow valve, and the first balance pipe is delivered to stove inner tube
Reacting gas, spread from top to bottom in stove inner tube, second flow valve control stove outer tube is delivered to the reacting gas of stove inner tube
Flow velocity, the reacting gas of stove inner tube is delivered to by stove outer tube, is spread from bottom to top in stove inner tube.Because the first balance pipe conveys
The direction spread to the reacting gas of stove inner tube in stove inner tube, with being delivered to the reacting gas of stove inner tube by stove outer tube in stove
What is spread in pipe is in opposite direction, and the reacting gas of stove inner tube is delivered to by the first balance pipe, can be with different positions in equalizing furnace inner tube
The air pressure at place is put, so that the air pressure in the pipeline of stove inner tube at diverse location is equal, and then causes going out in stove inner tube
Reacting gas flow velocity at stomata is consistent, and reacting gas uniformly diffuses to the crystal column surface of diverse location, realizes different wafer tables
The thickness and quality of face film growth are consistent.
In order to be better understood from the technical scheme of the application offer, below in conjunction with accompanying drawing, the embodiment of the present application is carried out
It is described in detail.
Please also refer to Fig. 3, Fig. 3 shows a kind of inlet duct of vertical diffusion furnace in the embodiment of the present application, specific bag
Include：
Air inlet pipe 301, including the stove inner tube 3011 in vertical diffusion furnace and the stove outer tube outside vertical diffusion furnace
3012, the bottom of stove inner tube 3011 is connected with stove outer tube 3012.Wherein, be provided with stove inner tube 3011 be uniformly distributed and
Size identical venthole.Reacting gas in stove inner tube 3011, it can only be entered from venthole in vertical diffusion furnace.
First balance pipe 302, its first end are connected with the top of stove inner tube 3011, the reaction gas in the first balance pipe 302
Body enters in stove inner tube 3011 at the first end of the first balance pipe 302；Its second end and the gas outside vertical diffusion furnace
Body delivery pipe is connected, and the reacting gas in air shooter enters the first balance pipe 302 from the second end of the first balance pipe 302
It is interior.Wherein, air shooter is used to convey reacting gas.
In actual applications, in order to save the cost of the first balance pipe 302 and reduce the first balance pipe 302 in vertical expansion
The space-consuming volume in stove is dissipated, the caliber of the first balance pipe 302 can be less than or equal to the caliber 301 of air inlet pipe.Certainly,
The caliber of first balance pipe 302 can also be more than the caliber of air inlet pipe 301.
It should be noted that the stove outer tube 3012 of air shooter and conveying reacting gas can be same pipe, then the
Second end of one balance pipe 302 is connected with stove outer tube 3012, the partial reaction gas in stove outer tube 3012, from the first balance pipe
302 the second end enters the first balance pipe 302.Also, as shown in figure 3, the second end of the first balance pipe 302 is connected with stove outer tube
Logical position, than second flow valve 304 closer to the position of reacting gas air inlet.
In some embodiments, the stove outer tube 3012 of air shooter and conveying reacting gas can not be same
Pipe.As shown in figure 4, reacting gas enters in the first balance pipe 302 from air shooter 401 respectively, enter from stove outer tube 3012
In stove inner tube 3011.
First flow valve 303, it is arranged at the first position of the first balance pipe 302, the first position is positioned at the first balance
Pipe 302 controls the first balance pipe on the pipeline outside vertical diffusion furnace, by the valve port size for adjusting first flow valve 303
Reacting gas flow velocity in 302.
Second flow valve 304, it is arranged on stove outer tube, is controlled by the valve port size for adjusting second flow valve 304 from stove
Outer tube 3012 is delivered to the reacting gas flow velocity of stove inner tube 3011.
It should be noted that in the inlet duct of vertical diffusion furnace as shown in Figure 3, the position of the setting of second flow valve 304
Put, than the second end and the position of the connectivity part of stove outer tube 3012 of the first balance pipe 302, apart from the position of reacting gas air inlet
It is farther.In some embodiments, second flow valve 304 set position, can also than the first balance pipe 302 the second end with
The position of the connectivity part of stove outer tube 3012, apart from the position of reacting gas air inlet closer to.
In the inlet duct of vertical diffusion furnace as shown in Figure 3, by adjusting the size of the valve port of first flow valve 303,
Control the flow velocity of reacting gas in the first balance pipe 302；The valve port size of second flow valve 304 is adjusted, is controlled from stove outer tube
3012 are delivered to the reacting gas flow velocity of stove inner tube 3011.The reacting gas of stove inner tube 3011 is delivered to by stove outer tube 3012,
Spread from bottom to top in stove inner tube 3011, and the reacting gas of stove inner tube 3011 is delivered to by the first balance pipe 302, in stove inner tube
Spread from top to bottom in 3011.Because the first balance pipe 302 is delivered to the reacting gas of stove inner tube 3011 in stove inner tube 3011
The direction of diffusion, the direction phase that the reacting gas with being delivered to stove inner tube 3011 by stove outer tube 3012 spreads in stove inner tube 3011
Instead, the reacting gas of stove inner tube 3011 is delivered to by the first balance pipe 302, can be with diverse location in equalizing furnace inner tube 3011 at
Air pressure, so that the air pressure in the pipeline of stove inner tube 3011 at diverse location is equal, and then cause in stove inner tube 3011
Reacting gas flow velocity at venthole is consistent, and reacting gas uniformly diffuses to the crystal column surface of diverse location, realizes different wafers
The thickness and quality of surface film growth are consistent.
In an example, according to the air pressure size in stove inner tube at diverse location, regulation first flow valve 303 and/or
The valve port size of second flow valve 304.In the valve port size process of regulation first flow valve 303 and/or second flow valve 304
In, in order to monitor reacting gas air pressure size and air pressure change situation at the inside diverse location of stove inner tube 3011, Ke Yi
Gas pressure sensor is placed in the inside of stove inner tube 3011, and the gas pressure sensor is used to measure the gas inside stove inner tube 3011
Pressure, the air pressure inside stove inner tube 3011 obtained according to measurement, progressively adjusts first flow valve 303 and/or second flow valve 304
Valve port size so that the air pressure at the inside diverse location of stove inner tube 3011 is equal.
For example, each respectively inside the tip duct of stove inner tube 3011 and inside the pipeline of bottom it can place a gas pressure
Sensor, the pressure sensor inside tip duct are used to monitor the air pressure inside the tip duct of stove inner tube 3011, bottom pipeline
Internal pressure sensor is used to monitor the air pressure inside the pipeline of bottom.The stove inner tube for monitoring to obtain according to gas pressure sensor
The air pressure inside air pressure and bottom pipeline inside 3011 tip ducts, progressively adjust first flow valve 303 and/or second flow
The valve port size of valve 304.Specifically, the air pressure inside the tip duct of stove inner tube 3011 is less than in the bottom pipeline of stove inner tube 3011
During the air pressure in portion, the valve port size of first flow valve 303 can be increased and/or reduce the valve port size of second flow valve 304, made
The air pressure obtained inside 3011 tip ducts is progressively equal with the air pressure inside 3011 bottom pipelines；When the tip duct of stove inner tube 3011
When internal air pressure is more than the air pressure inside the bottom pipeline of stove inner tube 3011, the valve port size of first flow valve 303 can be reduced
And/or the valve port size of increase second flow valve 304 so that air pressure inside 3011 tip ducts progressively with 3011 bottom pipelines
Internal air pressure is equal.
In practical application, in order to accurate regulating effect, increase and be placed on inside the pipeline of stove inner tube 3011
The quantity of gas pressure sensor, make what it was uniformly distributed to be passed inside the pipeline of stove inner tube 3011, and according to gas pressure
The data regulation first flow valve 303 and the valve port size of second flow valve 304 that sensor measurement obtains, so as to preferably be adjusted
Save effect.
In another example, according in stove inner tube at diverse location the reacting gas gas of stomata flow velocity, regulation the
The valve port size of one flow valve 303 and/or second flow valve 304.In regulation first flow valve 303 and/or second flow valve 304
Valve port size during, reacting gas flow velocity at venthole and the air pressure at the venthole are into positive correlation：At venthole
Air pressure is bigger, then the reacting gas flow velocity at the venthole is bigger；Air pressure at venthole is smaller, then the reaction at the venthole
Gas flow rate is smaller.Therefore, when the reacting gas flow velocity at the stomata of the inside diverse location of stove inner tube 3011 is identical, stove inner tube
Air pressure on 3011 at all ventholes also can be equal.In consideration of it, gas can also be placed around in the venthole of stove inner tube 3011
Rate of flow of fluid sensor, for measuring the reacting gas flow velocity in stove inner tube 3011 at the venthole of diverse location, according to gas stream
Reacting gas flow velocity at the venthole for the diverse location that fast sensor measurement obtains, progressively adjust first flow valve 303 and/or
The valve port size of second flow valve 304 so that the reacting gas flow velocity in stove inner tube 3011 at diverse location venthole is equal, from
And ensure that the air pressure of each opening position of stove inner tube is identical.
For example, can at the top venthole of stove inner tube 3011 near and bottom venthole near place a gas respectively
Rate of flow of fluid sensor, at the venthole of top near air flow rate sensor be used to monitor at the top venthole of stove inner tube 3011
Reacting gas flow velocity, at the venthole of bottom near air flow rate sensor be used to monitor the reacting gas stream at the venthole of bottom
Speed.Reacting gas flow velocity and bottom outlet at the obtained top venthole of stove inner tube 3011 is monitored according to air flow rate sensor
Reacting gas flow velocity at hole, progressively adjust the valve port size of first flow valve 303 and/or second flow valve 304.Specifically,
Reacting gas flow velocity at the top venthole of stove inner tube 3011 is less than the reacting gas stream at the bottom venthole of stove inner tube 3011
When fast, the valve port size of first flow valve 303 can be increased and/or reduce the valve port size of second flow valve 304 so that 3011
Reacting gas flow velocity at the venthole of top is equal with the reacting gas flow velocity at the bottom venthole of stove inner tube 3011；When stove inner tube
, can be with when reacting gas flow velocity at 3011 top ventholes is more than the reacting gas flow velocity at the bottom venthole of stove inner tube 3011
Reduce the valve port size of first flow valve 303 and/or the valve port size of increase second flow valve 304 so that 3011 top outlets
Reacting gas flow velocity at hole is equal with the reacting gas flow velocity at the bottom venthole of stove inner tube 3011.
In practical application, in order to accurate regulating effect, increase, to be placed on venthole in stove inner tube 3011 attached
The quantity of near air flow rate sensor, and the data obtained according to gas pressure sensor measurement adjust first flow valve 303
With the valve port size of second flow valve 304, so as to obtain more preferable regulating effect.
The first balance pipe 302, first flow valve 303 and second flow valve 304 are employed in above-described embodiment, is come balanced
The air pressure of reacting gas inside the tip duct of stove inner tube 3011 and bottom pipeline.In actual applications, two can also be used
Or the reaction that more than two balance pipes and corresponding flow valve come inside equalizing furnace inner tube tip duct and bottom pipeline
Gas atmosphere.Below, by taking two balance pipes being connected with stove inner tube and the corresponding flow valve of setting as an example, the application is stood
The inlet duct of formula diffusion furnace is described in detail.
Please refer to fig. 5, Fig. 5 shows the inlet duct of another vertical diffusion furnace in the embodiment of the present application, specifically
Including：
Air inlet pipe 501, including the stove inner tube 5011 in vertical diffusion furnace and the stove outer tube outside vertical diffusion furnace
5012, the bottom of stove inner tube 5011 is connected with stove outer tube 5012.Wherein, be provided with stove inner tube 5011 be uniformly distributed and
Size identical venthole.Reacting gas in stove inner tube 5011, it can only be entered from venthole in vertical diffusion furnace.
First balance pipe 502, its first end are connected with the top of stove inner tube 5011, the reaction gas in the first balance pipe 502
Body, enter at the first end of the first balance pipe 502 in stove inner tube 5011；Its second end and the gas outside vertical diffusion furnace
Body delivery pipe is connected, the reacting gas in air shooter, enters the first balance pipe from the second end of the first balance pipe 502
In 502.Wherein, air shooter is used to convey reacting gas.
Second balance pipe 503, its first end are connected with stove inner tube 5011, the reacting gas in the second balance pipe 503, from
Enter at the first end of second balance pipe 503 in stove inner tube 5011；Its second end and the gas outside vertical diffusion furnace are defeated
Send pipe to be connected, the reacting gas in air shooter, the second balance pipe 503 is entered at the second end of the second balance pipe 503
It is interior.Wherein, air shooter is used to convey reacting gas.
It is understood that the position that the first end of the second balance pipe 503 is connected with stove inner tube 5011, can be in stove
Other optional positions of the pipeline of inner tube 5011.In actual applications, can be with second at the pipeline middle of stove inner tube 5011
The first end of balance pipe 503 is connected.
It should be noted that the stove outer tube 5012 of air shooter and conveying reacting gas can be same pipe, then the
Second end of one balance pipe 502 is connected with stove outer tube 5012, the partial reaction gas in stove outer tube 5012, from the first balance pipe
Enter the first balance pipe 502 at 502 the second end；Then the second end of the second balance pipe 503 is connected with stove outer tube 5012, outside stove
Partial reaction gas in pipe 5012, the second balance pipe 503 is entered at the second end of the second balance pipe 503.
In some embodiments, the stove outer tube 5012 of air shooter and conveying reacting gas can not be same
Pipe.The mode of communicating of first balance pipe 502 and the second balance pipe 503 and air shooter in the present embodiment, with a upper embodiment
In the first balance pipe 302 it is similar with the connected mode of air shooter, can refer to understanding, repeat no more here.
Further, the air shooter being connected with the first balance pipe 502 and the second balance pipe 503 can be same
Air shooter or different air shooters.
First flow valve 504, it is arranged at the first position of the first balance pipe 502, the first position is positioned at the first balance
Pipe 502 controls the first balance pipe on the pipeline outside vertical diffusion furnace, by the valve port size for adjusting first flow valve 504
Reacting gas flow velocity in 502.
Second flow valve 505, the second place of the second balance pipe 503 is arranged on, the second place is positioned at the second balance
Pipe 503 controls the second balance pipe on the pipeline outside vertical diffusion furnace, by the valve port size for adjusting second flow valve 505
Reacting gas flow velocity in 503.
3rd flow valve 506, it is arranged on stove outer tube, is controlled by the valve port size for adjusting the 3rd flow valve 506 from stove
Outer tube 5012 is delivered to the reacting gas flow velocity of stove inner tube 5011.
It should be noted that in the inlet duct of vertical diffusion furnace as shown in Figure 5, the position of the 3rd flow valve 506 setting
Put, than the position of the connectivity part of the second end and the stove outer tube 5012 of the second balance pipe 503, apart from reacting gas air inlet more
Far.In some embodiments, the position that the 3rd flow valve 506 is set, the second end that can also be than the first balance pipe 502 and stove
The position of the connectivity part of outer tube 5012, air inlet apart from reacting gas is closer to can also be arranged on stove outer tube 5012 and first
On pipeline between second end of balance pipe 502 and the second end of the second balance pipe 503.
In the inlet duct of vertical diffusion furnace as shown in Figure 5, by adjusting the size of the valve port of first flow valve 504,
Control the flow velocity of reacting gas in the first balance pipe 502；The size of the valve port of second flow valve 505 is adjusted, controls the second balance pipe
The flow velocity of reacting gas in 503；And the valve port size of the 3rd flow valve 506 of regulation, control from stove outer tube 5012 and be delivered to stove
The reacting gas flow velocity of inner tube 5011, make it that the air pressure in the pipeline of stove inner tube 5011 at diverse location is equal, so as to solve
Determine inside the top of stove inner tube 5011 and bottom pipeline and the problem of larger barometric gradient be present so that different positions in stove inner tube 5011
Reacting gas flow velocity at the venthole put is consistent, and reacting gas can be uniformly distributed in the crystal column surface of diverse location, and then
The thickness and quality of different crystal column surface film growths are consistent.
It should be noted that regulation first flow valve 504, second flow valve 505, and the valve port of the 3rd flow valve 506
Size, described in examples detailed above, used by the valve port size of regulation first flow valve 303 and/or second flow valve 304
Method is similar, with reference to the description in examples detailed above, repeats no more here.
In addition, present invention also provides a kind of air inlet method of the inlet duct of vertical diffusion furnace, also referring to Fig. 6,
This method includes：
S601：First flow valve controls the flow velocity of reacting gas in the first balance pipe.
S602：Second flow valve controls the reacting gas flow velocity that stove inner tube is delivered to from stove outer tube.
First flow valve and second flow valve pass through above-mentioned control so that the pipeline air pressure inside of stove inner tube is all equal.
In some embodiments, first flow valve can control the first balance according to the internal pipe pressure of stove inner tube
Reacting gas flow velocity in pipe；Second flow valve can control stove outer tube to be delivered in stove according to the internal pipe pressure of stove inner tube
The reacting gas flow velocity of pipe.
In other embodiments, first flow valve can control the according to the gas flow rate of the venthole of stove inner tube
Reacting gas flow velocity in one balance pipe；Second flow valve can be according to the reacting gas flow velocity at the venthole of stove inner tube, control
The reacting gas flow velocity of stove inner tube is delivered to from stove outer tube.
During specific implementation, controller is according to the internal pipe pressure of stove inner tube, or the gas flow rate of venthole, control the
The valve port size of one flow valve, and then realize that first flow valve controls the flow velocity of reacting gas in the first balance pipe；Is controlled again
The valve port size of two flow valves, and then realize that the control of second flow valve is delivered to the reacting gas flow velocity of stove inner tube from stove outer tube.
In addition, this method can also include the flow velocity that the 3rd flow valve controls reacting gas in the 3rd balance pipe, realization side
Method is similar, repeats no more here.
Method shown in Fig. 6, it is the method corresponding to the device described in examples detailed above, specific implementation is similar,
With reference to the description of specific implementation in examples detailed above, repeat no more here.
In the present embodiment, the flow velocity of reacting gas in the first balance pipe, and second flow are controlled by first flow valve
Valve controls the reacting gas flow velocity that stove inner tube is delivered to from stove outer tube, because the first balance pipe and the second balance pipe reacting gas exist
What is spread in stove inner tube is in opposite direction, and the first balance pipe is delivered to the reacting gas of stove inner tube, can be with different in equalizing furnace inner tube
The air pressure of opening position, so that the air pressure in the pipeline of stove inner tube at diverse location is equal, and then cause in stove inner tube
Reacting gas flow velocity at venthole is consistent, and reacting gas uniformly diffuses to the crystal column surface of diverse location, realizes different wafers
The thickness and quality of surface film growth are consistent.
Described above is only the preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
For member, under the premise without departing from the principles of the invention, some improvements and modifications can also be made, these improvements and modifications also should
It is considered as protection scope of the present invention.
Claims (10)
1. a kind of inlet duct of vertical diffusion furnace, it is characterised in that described device includes：
Air inlet pipe, the air inlet pipe include stove inner tube and stove outer tube, and the bottom of the stove inner tube is connected with the stove outer tube；
First balance pipe, the first end of first balance pipe are connected with the stove inner tube top, first balance pipe
Second end is connected with air shooter, and the air shooter is located at outside the vertical diffusion furnace, for conveying reaction gas
Body；
First flow valve, it is arranged at the first position of first balance pipe, the first position is located at the vertical diffusion
Outside stove, second flow valve, it is arranged on the stove outer tube, the first flow valve controls anti-described in first balance pipe
Gas flow rate is answered, the second flow valve control is delivered to the reacting gas flow velocity of the stove inner tube from the stove outer tube,
To cause the pipeline air pressure inside of the stove inner tube all equal.
2. device according to claim 1, it is characterised in that
The air shooter and the stove outer tube are same pipes.
3. device according to claim 1, it is characterised in that described device also includes：
Second balance pipe, the first end of second balance pipe are connected with the stove inner tube, and the second of second balance pipe
End is connected with the air shooter；
3rd flow valve, is arranged on the second place of second balance pipe, and the second place is located at the vertical diffusion
Outside stove, for controlling the reacting gas flow velocity being delivered to from second balance pipe in the vertical diffusion furnace.
4. device according to claim 3, it is characterised in that
The first end of second balance pipe is located at the stove inner tube middle.
5. device according to claim 1, it is characterised in that
The caliber of first balance pipe is less than or equal to air inlet pipe caliber.
6. according to the device described in claim 1-5 any one, it is characterised in that described device also includes：
Gas pressure sensor, for measuring the gas pressure inside the stove inner tube tip duct, and ttom of pipe in the stove
Gas pressure inside end pipe road.
7. according to the device described in claim 1-5 any one, it is characterised in that described device also includes：
Air flow rate sensor, in the reacting gas flow velocity at venthole and the stove for measuring the stove inner tube top
Reacting gas flow velocity at the venthole at ttom of pipe end.
8. a kind of air inlet method of the inlet duct of vertical diffusion furnace, it is characterised in that methods described includes：
First flow valve controls reacting gas flow velocity in the first balance pipe；
Second flow valve control stove outer tube is delivered to the reacting gas flow velocity of stove inner tube；
The first flow valve and the second flow valve pass through above-mentioned control so that the pipeline air pressure inside of the stove inner tube is all
It is equal.
9. according to the method for claim 8, it is characterised in that
First flow valve controls reacting gas flow velocity in the first balance pipe according to the internal pipe pressure of the stove inner tube；
Second flow valve controls stove outer tube to be delivered to the reaction gas of stove inner tube according to the internal pipe pressure of the stove inner tube
Rate of flow of fluid.
10. according to the method for claim 8, it is characterised in that
First flow valve controls reacting gas stream in the first balance pipe according to the reacting gas flow velocity of the venthole of the stove inner tube
Speed；
Second flow valve controls from stove outer tube according to the reacting gas flow velocity of the venthole of the stove inner tube and is delivered to stove inner tube
The reacting gas flow velocity.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113078081A (en) * | 2021-04-21 | 2021-07-06 | 长江存储科技有限责任公司 | Furnace tube machine platform |
| CN113373522A (en) * | 2021-05-31 | 2021-09-10 | 北海惠科半导体科技有限公司 | Diffusion device and diffusion system |
| CN114242839A (en) * | 2021-12-20 | 2022-03-25 | 江西中弘晶能科技有限公司 | Air intake method for improving uniformity of flow field of thermal diffusion furnace for manufacturing PERC battery |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2663439Y (en) * | 2002-08-13 | 2004-12-15 | 台湾积体电路制造股份有限公司 | Furnace tube apparatus capable of improving homogeneity of thin oxide layer |
| CN201522194U (en) * | 2009-10-30 | 2010-07-07 | 中芯国际集成电路制造(上海)有限公司 | Vertical heating furnace with function of balancing internal pressure and external pressure |
| CN102945796A (en) * | 2012-11-29 | 2013-02-27 | 西安电力电子技术研究所 | Diffusion process channel of diffusion type constant-pressure gas carrying impurity source |
| CN104576330A (en) * | 2014-05-12 | 2015-04-29 | 上海华虹宏力半导体制造有限公司 | Method and structure for improving phosphorus concentration uniformity of doped polycrystalline or noncrystalline silicon chips |
| CN105734675A (en) * | 2016-04-19 | 2016-07-06 | 温州巨亮光伏科技有限公司 | High-temperature diffusion furnace tube for wafer oxidization |
| CN105908260A (en) * | 2016-05-18 | 2016-08-31 | 广东爱康太阳能科技有限公司 | Diffusion furnace for crystalline silicon solar cells |
| CN205774933U (en) * | 2016-05-18 | 2016-12-07 | 广东爱康太阳能科技有限公司 | A kind of crystal silicon solar energy battery diffusion furnace |
| CN106435740A (en) * | 2016-11-11 | 2017-02-22 | 桂林电子科技大学 | Vertical solar silicon slice diffusion furnace |
-
2017
- 2017-08-31 CN CN201710773930.4A patent/CN107338479B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2663439Y (en) * | 2002-08-13 | 2004-12-15 | 台湾积体电路制造股份有限公司 | Furnace tube apparatus capable of improving homogeneity of thin oxide layer |
| CN201522194U (en) * | 2009-10-30 | 2010-07-07 | 中芯国际集成电路制造(上海)有限公司 | Vertical heating furnace with function of balancing internal pressure and external pressure |
| CN102945796A (en) * | 2012-11-29 | 2013-02-27 | 西安电力电子技术研究所 | Diffusion process channel of diffusion type constant-pressure gas carrying impurity source |
| CN104576330A (en) * | 2014-05-12 | 2015-04-29 | 上海华虹宏力半导体制造有限公司 | Method and structure for improving phosphorus concentration uniformity of doped polycrystalline or noncrystalline silicon chips |
| CN105734675A (en) * | 2016-04-19 | 2016-07-06 | 温州巨亮光伏科技有限公司 | High-temperature diffusion furnace tube for wafer oxidization |
| CN105908260A (en) * | 2016-05-18 | 2016-08-31 | 广东爱康太阳能科技有限公司 | Diffusion furnace for crystalline silicon solar cells |
| CN205774933U (en) * | 2016-05-18 | 2016-12-07 | 广东爱康太阳能科技有限公司 | A kind of crystal silicon solar energy battery diffusion furnace |
| CN106435740A (en) * | 2016-11-11 | 2017-02-22 | 桂林电子科技大学 | Vertical solar silicon slice diffusion furnace |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113078081A (en) * | 2021-04-21 | 2021-07-06 | 长江存储科技有限责任公司 | Furnace tube machine platform |
| CN113373522A (en) * | 2021-05-31 | 2021-09-10 | 北海惠科半导体科技有限公司 | Diffusion device and diffusion system |
| CN114242839A (en) * | 2021-12-20 | 2022-03-25 | 江西中弘晶能科技有限公司 | Air intake method for improving uniformity of flow field of thermal diffusion furnace for manufacturing PERC battery |
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|---|---|
| CN107338479B (en) | 2018-07-06 |
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