CN107329364A - A kind of light shield layer, colored filter and display panel - Google Patents

A kind of light shield layer, colored filter and display panel Download PDF

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Publication number
CN107329364A
CN107329364A CN201710596533.4A CN201710596533A CN107329364A CN 107329364 A CN107329364 A CN 107329364A CN 201710596533 A CN201710596533 A CN 201710596533A CN 107329364 A CN107329364 A CN 107329364A
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CN
China
Prior art keywords
area
shield layer
light shield
light
exposure machine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201710596533.4A
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Chinese (zh)
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CN107329364B (en
Inventor
唐道矜
翁国光
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Wuhan China Star Optoelectronics Technology Co Ltd
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Wuhan China Star Optoelectronics Technology Co Ltd
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Priority to CN201710596533.4A priority Critical patent/CN107329364B/en
Publication of CN107329364A publication Critical patent/CN107329364A/en
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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • G02F1/133516Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Theoretical Computer Science (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)

Abstract

The invention discloses a kind of light shield layer, colored filter and display panel.The exposure machine of the camera lens of multiple splicings is exposed by the light shield layer, the exposure machine includes first area and the second area being arranged alternately, second area corresponds to the stitching portion of multiple camera lenses, when the exposure machine is exposed, luminous intensity of the light by first area produced by the exposure machine is equal with the luminous intensity by second area.In this way, its display effect can be improved while the light transmittance of colored filter and display panel is improved.

Description

A kind of light shield layer, colored filter and display panel
Technical field
The present invention relates to display technology field, more particularly to a kind of light shield layer, colored filter and display panel.
Background technology
In existing display screen technology, to improve the transmitance of backlight, electric energy is saved, generally using reduction colorized optical filtering The size of the black-matrix layer of piece, increases aperture opening ratio to realize.Traditional color film exposure sources, which can not be reduced effectively, to be exposed The size of figure, therefore, increasing producer introduce the equipment that more graph thinning can be achieved, such as Nikon exposure machine, Nikon The mode that exposure machine is spliced using many camera lenses realizes exposure to figure, and the graphic width after exposure is up to several microns of precision.
The present inventor has found in long-term research and development, in currently available technology, optical lens splicing exposure It the factor such as can be lost because of exposure energy in camera lens stitching portion, the dimension of picture and non-camera lens for causing the camera lens stitching portion after exposure are spelled The dimension of picture at the place of connecing has differences, so as to influence the display effect of colored filter and whole display panel.
The content of the invention
The present invention solves the technical problem of a kind of light shield layer, colored filter and display panel is provided, to carry While the light transmittance of high color optical filter and display panel, improve its display effect.
In order to solve the above technical problems, one aspect of the present invention is:A kind of light shield layer is provided, exposure machine leads to Cross the light shield layer to be exposed, the exposure machine includes the camera lens of multiple splicings.The light shield layer includes the be arranged alternately One region and second area, the second area correspond to the stitching portion of the multiple camera lens, are exposed in the exposure machine When, luminous intensity of the light by the first area produced by the exposure machine and the luminous intensity phase by the second area Deng.
In order to solve the above technical problems, another technical solution used in the present invention is:A kind of colored filter is provided.Institute Stating colored filter includes black-matrix layer;The black-matrix layer is by the use of light shield layer as mask, in the exposure of exposure machine It is lower to be formed;The exposure machine includes the camera lens of multiple splicings;The light shield layer includes the first area and the secondth area being arranged alternately Domain, the second area corresponds to the stitching portion of the multiple camera lens, when the exposure machine is exposed, the exposure machine institute The light of generation is equal with the luminous intensity by the second area by the luminous intensity of the first area.
In order to solve the above technical problems, another technical scheme that the present invention is used is:A kind of display panel is provided.It is described Display panel includes above-mentioned colored filter.
The beneficial effect of the embodiment of the present invention is:Prior art is different from, the embodiment of the present invention, which is utilized, includes multiple splicings The exposure machine of camera lens is exposed to light shield layer, wherein, light shield layer includes first area and the second area being arranged alternately, its In, second area corresponds to the stitching portion of multiple camera lenses, when exposure machine is exposed, and makes light produced by exposure machine by the The luminous intensity in one region is equal with by the luminous intensity of second area.The embodiment of the present invention is spliced by many camera lenses to expose, can Increase the aperture opening ratio of colored filter and display panel, improve its light transmittance, and produced by the embodiment of the present invention makes exposure machine Luminous intensity of the light by first area is equal with the luminous intensity by second area, can improve exposure machine and splice place in camera lens The difference in exposure of generation, so as to improve the difference for the figure that exposure is formed, and then improves colored filter and display panel Display effect.
Brief description of the drawings
Fig. 1 is the structural representation of the embodiment of light shield layer one of the present invention;
Fig. 2A is the structural representation of another embodiment of light shield layer of the present invention;
Fig. 2 B are the structural representations being exposed using the light shield layer and exposure machine of Fig. 2A embodiments to black-matrix layer;
Fig. 3 is the structural representation of the part-structure of the embodiment of halftoning film one of light shield layer of the present invention;
Fig. 4 is the structural representation of another embodiment of halftoning film of light shield layer of the present invention;
Fig. 5 is the structural representation of the embodiment of colored filter one of the present invention;
Fig. 6 is the structural representation of the embodiment of display panel one of the present invention.
Embodiment
Referring to Fig. 1, Fig. 1 is the structural representation of the embodiment of light shield layer one of the present invention.The conduct of the present embodiment light shield layer 101 Mask, figure needed for being formed under the exposure of exposure machine 102, wherein, exposure machine 102 has multiple splicing camera lenses 103.This implementation Example light shield layer 101 includes first area 104 and the second area 105 being arranged alternately, and second area 105 corresponds to multiple camera lenses 103 stitching portion, when exposure machine 102 is exposed, the luminous intensity that the light produced by exposure machine 102 passes through first area 104 It is equal with the luminous intensity by second area 105.
It is different by the light intensity of light shield layer 101 when being exposed with light shield layer 101 for mask, the figure obtained after exposure The size of shape is different.Smaller size of figure can be obtained using multiple splicing camera lens exposure machines 102.To make up in camera lens stitching portion Exposure energy loss caused by stitching portion and non-stitching portion expose after dimension of picture difference.The present embodiment is in light shield layer 101 pairs of light intensity are adjusted so that light produced by exposure machine 102 is by the luminous intensity of first area 104 and passes through the secondth area The luminous intensity in domain 105 is equal, so that the size all same of each several part of the figure obtained after being exposed using light shield layer 101.
Dimension of picture in the present invention at least includes the width and thickness of figure.
The first area 104 of the present embodiment and the concrete structure of second area 105 can enter according to required specific figure Row is set.
Prior art is different from, many camera lenses splicing exposure machine 102 of the present embodiment is exposed by filter layer 101, energy Enough the aperture opening ratio of increase colored filter and display panel, improves its light transmittance, and makes light produced by exposure machine 102 by the The luminous intensity in one region 104 is equal with the luminous intensity by second area 105, can improve exposure machine 102 in camera lens stitching portion Produced difference in exposure, so as to improve the difference for the figure that exposure is formed, and then improves colored filter and display surface The display effect of plate.
The present invention further provides the light shield layer of another embodiment, the light shield layer disclosed in the present embodiment is in above-described embodiment Light shield layer on the basis of be described.Also referring to Fig. 2A, Fig. 2 B, Fig. 2A is another embodiment of light shield layer of the present invention Cross section structure schematic diagram;Fig. 2 B are the structures being exposed using the light shield layer and exposure machine of Fig. 2A embodiments to black-matrix layer Schematic diagram.The light shield layer 201 of the present embodiment further comprises mask plate 202, because the stitching portion of camera lens 204 of exposure machine 203 can be deposited The luminous intensity for passing through the mask plate 202 positioned at first area 205 in certain exposure light loss, the light produced by exposure machine 203 More than the luminous intensity by the mask plate 202 positioned at second area 206.To improve the picture size after exposed machine 203 exposes Uniformity, the light shield layer 201 of the present embodiment still further comprises pellicle 207, and pellicle 207 is located at first area 205 Light transmittance is less than the light transmittance that pellicle 207 is located at second area 206, so that making up light passes through covering positioned at first area 205 The problem of luminous intensity of diaphragm plate 202 is more than by luminous intensity positioned at the mask plate 202 of second area 206, makes the institute of exposure machine 203 The light intensity of the luminous intensity for the light shield layer 201 that the light of generation passes through first area 205 and the light shield layer 201 for passing through second area 206 Degree is equal, so that the dimension of picture that exposed machine 203 is formed after exposing is consistent.
Black-matrix layer 208 is the important component of colored filter, and black-matrix layer 208 reticulates structure, netting twine portion Divide 209 line areas for being used to block each color blocking periphery, prevent line areas light leak, mesh-portion 210 is used to form each color blocking.Its In, the first area 205 of the mask plate 202 of the present embodiment and second area 206 include multiple transparent areas 211 and multiple shadings Area 212.Multiple transparent areas 211 are connected, and are spaced multiple shading regions 212.Multiple transparent areas 211 are used to form the network structure Netting twine part 209, multiple shading regions 212 are used for the mesh-portion 210 for forming the network structure.For increase black-matrix layer 208 Light transmittance, the width of the netting twine 209 around the mesh 210 of black-matrix layer 208 need to as far as possible be reduced, the present embodiment is adopted Light shield layer 201 is exposed to form black-matrix layer 208 with exposure machine 203, micron-sized netting twine 209 can not only be realized Width, increases light transmittance, and ensure that the size of each netting twine part 209 of black-matrix layer 208 is consistent, can improve display effect Really.
Certainly, in other embodiments, transparent area and shading region can be exchanged and set, be used to form this using shading region The netting twine part of network structure, transparent area is used for the mesh-portion for forming the network structure.
In another embodiment, pellicle can also be replaced using halftoning film, and halftoning film is located at first area Average transmittance be less than halftoning film be located at second area average transmittance.As shown in figure 3, halftoning film 301 is by multiple Printing opacity sub-district 302 and multiple shading sub-districts 303 are constituted, and multiple printing opacity sub-districts 302 and multiple shading sub-districts 303 are interspersed. Certainly, in other embodiments, as shown in figure 4, multiple shading sub-districts 402 of halftoning film 401 are connected, with the multiple printing opacities in interval Sub-district 403, it is of course also possible to multiple printing opacity sub-districts 403 be connected, with the multiple shading sub-districts 402 in interval.
In the above-described embodiments, can be by adjusting size, the shape of multiple printing opacity sub-districts and/or multiple shading sub-districts Shape, light transmittance etc. come realize pellicle be located at first area light transmittance be less than pellicle be located at second area light transmittance.
The present invention does not limit the shape of multiple printing opacity sub-districts and multiple shading sub-districts, in being circle, polygon etc. It is any one or more.
Certainly, in other embodiments, the pellicle of light shield layer or halftoning film can only cover the mask of first area Plate.And the embodiment of the present invention does not limit pellicle or halftoning film is covered in side or the opposite sides of mask plate.
Referring to Fig. 5, Fig. 5 is the structural representation of the embodiment of colored filter one of the present invention.The present embodiment colorized optical filtering Piece 501 includes black-matrix layer 502.Black-matrix layer 502 is by the use of the light shield layer of above-described embodiment as mask, in above-mentioned reality Formed under the exposure for the exposure machine for applying example.The structure and exposure operation principle of structure, the exposure machine on the light shield layer are Detailed narration has been carried out in the above-described embodiments, has not been repeated here.
Certainly, the present embodiment colored filter 501 still further comprises substrate 503, color blocking layer 504 and conducting film 505 etc.. Wherein, the color blocking that substrate 503 is arranged in the side of black-matrix layer 502, color blocking layer 504 is formed at black-matrix layer 502 In mesh, conducting film 505 is arranged at side of the color blocking layer 504 away from substrate 502.
Prior art is different from, the size of the black-matrix layer 502 of the present embodiment colored filter 501 is small, and each several part The size of structure is consistent, can improve its display effect while the light transmittance of colored filter 501 is improved.
Referring to Fig. 6, Fig. 6 is the structural representation of the embodiment of display panel one of the present invention.The present embodiment display panel 601 Including colored filter 602.Colored filter 602 is the colored filter of above-described embodiment, and its structure and working principle exists Detailed narration has been carried out in above-described embodiment, has not been repeated here.
Certainly, the present embodiment display panel 601 also includes array base palte 603 and liquid crystal layer 604.Liquid crystal layer 604 is in colour The light transmittance of backlight is adjusted under the control of optical filter 602 and array base palte 603.
Prior art is different from, the present embodiment display panel 601 can improve display effect while light transmittance is improved Really.
Embodiments of the present invention are the foregoing is only, are not intended to limit the scope of the invention, it is every to utilize this Equivalent structure or equivalent flow conversion that description of the invention and accompanying drawing content are made, or directly or indirectly it is used in other correlations Technical field, is included within the scope of the present invention.

Claims (10)

1. a kind of light shield layer, exposure machine is exposed by the light shield layer, the exposure machine includes the camera lens of multiple splicings, its It is characterised by, the light shield layer includes first area and the second area being arranged alternately, the second area corresponds to described many The stitching portion of individual camera lens, when the exposure machine is exposed, the light produced by the exposure machine passes through the first area Luminous intensity is equal with the luminous intensity by the second area.
2. light shield layer according to claim 1, it is characterised in that the light shield layer further comprises mask plate, the exposure Light produced by ray machine is more than by positioned at the second area by the luminous intensity of the mask plate positioned at the first area The luminous intensity of mask plate.
3. light shield layer according to claim 2, it is characterised in that the light shield layer further comprises pellicle, is arranged on On the mask plate, the light transmittance that the pellicle is located at the first area is less than the pellicle positioned at the second area Light transmittance.
4. light shield layer according to claim 2, it is characterised in that the light shield layer further comprises halftoning film, described The average transmittance that halftoning film is located at the first area is less than the halftoning film positioned at the average saturating of the second area Light rate.
5. light shield layer according to claim 4, it is characterised in that the halftoning film includes multiple transparent areas and multiple screenings Light area, multiple transparent areas and multiple shading regions are alternately distributed.
6. light shield layer according to claim 5, it is characterised in that the transparent area is shaped as in circular, polygon Any one.
7. a kind of colored filter, it is characterised in that including:
Black-matrix layer;
The black-matrix layer is, by the use of light shield layer as mask, to be formed under the exposure of exposure machine;The exposure machine includes many The camera lens of individual splicing;
The light shield layer includes first area and the second area being arranged alternately, and the second area corresponds to the multiple camera lens Stitching portion, when the exposure machine is exposed, the luminous intensity that the light produced by the exposure machine passes through the first area It is equal with the luminous intensity by the second area.
8. colored filter according to claim 7, it is characterised in that the light shield layer further comprises mask plate, institute Light produced by stating exposure machine is more than by positioned at secondth area by the luminous intensity of the mask plate positioned at the first area The luminous intensity of the mask plate in domain.
9. colored filter according to claim 8, it is characterised in that the light shield layer further comprises pellicle, if Put on the mask plate, the light transmittance that the pellicle is located at the first area is less than the pellicle positioned at described second The light transmittance in region.
10. a kind of display panel, it is characterised in that including the colored filter described in any one of claim 7 to 9.
CN201710596533.4A 2017-07-20 2017-07-20 Light shielding layer, color filter and display panel Active CN107329364B (en)

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Application Number Priority Date Filing Date Title
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CN107329364A true CN107329364A (en) 2017-11-07
CN107329364B CN107329364B (en) 2020-06-05

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114236972A (en) * 2021-12-13 2022-03-25 Tcl华星光电技术有限公司 Display panel, preparation method thereof and display device

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6433347B1 (en) * 1998-06-19 2002-08-13 Nikon Corporation Charged-particle-beam projection-exposure methods and apparatus that selectively expose desired exposure units of a reticle pattern
US20070092844A1 (en) * 2005-10-21 2007-04-26 Macronix International Co., Ltd. Method to form photo patterns
CN101013224A (en) * 2007-02-08 2007-08-08 友达光电股份有限公司 Liquid crystal display panel and array base plate and method for manufacturing same
CN103376667A (en) * 2012-04-20 2013-10-30 上海微电子装备有限公司 Mask stage for exposure device
CN104317094A (en) * 2014-08-28 2015-01-28 京东方科技集团股份有限公司 Black matrix structure, mask plate, color membrane substrate and display device
CN104570611A (en) * 2013-10-21 2015-04-29 合肥京东方光电科技有限公司 Mask plate and method for reducing splicing exposure mula phenomenon
CN105929639A (en) * 2016-06-29 2016-09-07 武汉华星光电技术有限公司 Method for improving lens mura of exposure machine
EP3109699A2 (en) * 2015-06-23 2016-12-28 Samsung Display Co., Ltd. Mask and method of fabricating display device using the mask

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6433347B1 (en) * 1998-06-19 2002-08-13 Nikon Corporation Charged-particle-beam projection-exposure methods and apparatus that selectively expose desired exposure units of a reticle pattern
US20070092844A1 (en) * 2005-10-21 2007-04-26 Macronix International Co., Ltd. Method to form photo patterns
CN101013224A (en) * 2007-02-08 2007-08-08 友达光电股份有限公司 Liquid crystal display panel and array base plate and method for manufacturing same
CN103376667A (en) * 2012-04-20 2013-10-30 上海微电子装备有限公司 Mask stage for exposure device
CN104570611A (en) * 2013-10-21 2015-04-29 合肥京东方光电科技有限公司 Mask plate and method for reducing splicing exposure mula phenomenon
CN104317094A (en) * 2014-08-28 2015-01-28 京东方科技集团股份有限公司 Black matrix structure, mask plate, color membrane substrate and display device
EP3109699A2 (en) * 2015-06-23 2016-12-28 Samsung Display Co., Ltd. Mask and method of fabricating display device using the mask
CN105929639A (en) * 2016-06-29 2016-09-07 武汉华星光电技术有限公司 Method for improving lens mura of exposure machine

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114236972A (en) * 2021-12-13 2022-03-25 Tcl华星光电技术有限公司 Display panel, preparation method thereof and display device
CN114236972B (en) * 2021-12-13 2023-06-27 Tcl华星光电技术有限公司 Display panel, preparation method thereof and display device

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