CN107325237A - A kind of Free radical-Cationic Hybrid photocuring system and its application - Google Patents
A kind of Free radical-Cationic Hybrid photocuring system and its application Download PDFInfo
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- CN107325237A CN107325237A CN201610238062.5A CN201610238062A CN107325237A CN 107325237 A CN107325237 A CN 107325237A CN 201610238062 A CN201610238062 A CN 201610238062A CN 107325237 A CN107325237 A CN 107325237A
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- Prior art keywords
- alkyl
- cycloalkyl
- compound
- photocurable composition
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- 238000000016 photochemical curing Methods 0.000 title claims abstract description 19
- 239000000203 mixture Substances 0.000 claims abstract description 77
- 150000001875 compounds Chemical class 0.000 claims abstract description 63
- 239000000463 material Substances 0.000 claims abstract description 19
- 238000001723 curing Methods 0.000 claims abstract description 15
- 239000004593 Epoxy Substances 0.000 claims abstract description 14
- 239000012952 cationic photoinitiator Substances 0.000 claims abstract description 12
- 150000001454 anthracenes Chemical class 0.000 claims abstract description 9
- 238000007348 radical reaction Methods 0.000 claims abstract description 9
- 238000006757 chemical reactions by type Methods 0.000 claims abstract description 7
- 229920002521 macromolecule Polymers 0.000 claims abstract description 6
- 150000001768 cations Chemical class 0.000 claims abstract description 4
- -1 Hydrogen Chemical class 0.000 claims description 56
- 125000000217 alkyl group Chemical group 0.000 claims description 39
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- 229910052739 hydrogen Inorganic materials 0.000 claims description 28
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- 229910052736 halogen Inorganic materials 0.000 claims description 25
- 150000002367 halogens Chemical class 0.000 claims description 25
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 claims description 24
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 17
- 125000001316 cycloalkyl alkyl group Chemical group 0.000 claims description 16
- 125000005119 alkyl cycloalkyl group Chemical group 0.000 claims description 15
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- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 claims description 3
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- UYCGHYYLNBVUGK-UHFFFAOYSA-N 4-(ethenoxymethyl)-1,3-dioxolan-2-one Chemical class C=COCC1COC(=O)O1 UYCGHYYLNBVUGK-UHFFFAOYSA-N 0.000 claims description 2
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- 125000000882 C2-C6 alkenyl group Chemical group 0.000 claims description 2
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- 125000006736 (C6-C20) aryl group Chemical group 0.000 claims 1
- FWRALSAQPOLUDE-UHFFFAOYSA-N 1-(cyclobuten-1-yloxy)cyclobutene Chemical class C1CC(OC=2CCC=2)=C1 FWRALSAQPOLUDE-UHFFFAOYSA-N 0.000 claims 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims 1
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- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/10—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers containing more than one epoxy radical per molecule
- C08F283/105—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers containing more than one epoxy radical per molecule on to unsaturated polymers containing more than one epoxy radical per molecule
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
- C09D163/10—Epoxy resins modified by unsaturated compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
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- Polymers & Plastics (AREA)
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- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Wood Science & Technology (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Epoxy Resins (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Polymerisation Methods In General (AREA)
Abstract
The present invention discloses a kind of radical cation and mixes type Photocurable composition, comprising：Anthracene esters sensitizer, selected from the compound of structure shown in formula (I) and/or using formula (I) compound as the macromolecular compound of primary structure；Cationoid reaction type compound and radical reaction type compound, including at least one compound containing unsaturated double-bond and at least one contain epoxy compounds；Cationic photoinitiator；Optionally, radical photoinitiator.Said composition can combine the advantage of two kinds of photocuring systems of free radical and cation, have splendid response to the light source in 200 500nm wave-length coverages by constituent optimization, curing rate is fast, and shrinkage factor is small, and developability and pattern integrity are good, and solidification film hardness is high, the adhesive force on base material is strong.
Description
Technical field
The invention belongs to organic curing field, and in particular to a kind of free radical-cationic hybrid
Type Photocurable composition and its application in curing field.
Background technology
UV-curing technology has application widely, root in fields such as electronic material preparations
According to the difference of Initiating polymerization mechanism, free radical type and the major class of cationic two can be divided into.Both are each
There is quality, extensively, formula controllability is high, but cure shrinkage for radical-type polymerization raw material sources
Rate is big, easily causes oxygen inhibition；The problem of shrinkage factor and oxygen inhibition is not present in cationic polymerization,
But curing rate is slow, and cost is higher.Free radical-Cationic Hybrid photocuring system is considered as
It is possible to combine an effective way of both advantages.But practice have shown that, conventional mixing is simultaneously
It can not produce a desired effect, because compatibility is poor between component, the feelings that mixing application effect is deteriorated
Condition happens occasionally.Therefore, preparation is optimized to component, the suitability between raising,
It is a key for mixing the research and development of type photocuring system.
On the other hand, at this stage the initiation light source of photocuring system with high-pressure sodium lamp (wave-length coverage
Usually 200-360nm) based on, but high-pressure sodium lamp high energy consumption, environmental pollution is big, using by
Increasing limitation is arrived.LED/light source (wave-length coverage is usually 320-500nm) is damaged
Small, energy is high, consumption is low, it is considered to be can substitute mercury lamp using as in photocuring system often
Advise the favorable substitutes of light source.However, existing most photocuring systems are to LED light
The absorbability in source is very poor, tends not to solidify or solidifies not exclusively, a small number of applicable systems are then right
The classification limitation of component is more and expensive.
In view of this, current technological development trend and practical application request are complied with, research and development exist
(including mercury lamp and LED/light source) is respectively provided with excellent photocuring in 200-500nm wave-length coverages
The type photocuring system that mixes of performance just seems highly significant.
Summary of the invention
In view of the shortcomings of the prior art, it is an object of the invention to provide a kind of free radical-sun from
Son mixes type Photocurable composition, said composition by constituent optimization, can combine free radical and
The advantage of two kinds of photocuring systems of cation, has to the light source in 200-500nm wave-length coverages
Splendid response, curing rate is fast, and shrinkage factor is small, and developability and pattern integrity are good, and solidification
Film hardness is high, and the adhesive force on base material is strong.
Specifically, Free radical-Cationic Hybrid Photocurable composition of the invention, comprising
Following components：
(A) anthracene esters sensitizer, selected from the compound of structure shown in formula (I) and/or
Using formula (I) compound as the macromolecular compound of primary structure：
R1And R2Hydrogen, nitro, cyano group, halogen, C are represented independently of one another1-C40Straight chain
Or branched alkyl, C1-C40Alkoxy or-O-CO-R groups, and R1And R2In extremely
Few one is-O-CO-R groups, and R represents C3-C20Cycloalkyl, C4-C20Alkyl-cycloalk
Base or cycloalkyl-alkyl, C2-C40Contain ester group, C2-C40Contain cycloalkyl groups, halogen
Element, C3-C20The alkyl being optionally substituted by halogen；
R3、R4、R5、R6、R7、R8、R9、R10Represent independently of one another hydrogen, nitro,
Cyano group, halogen, C1-C40Straight or branched alkyl, C3-C40Cycloalkyl, C4-C40's
Alkyl-cycloalkyl or cycloalkyl-alkyl, C2-C40Alkenyl, C6-C40Aryl, and these
Acyclic-CH in group2- optionally (optionally) by-O- ,-CO- ,-NH- ,-S-
Or 1,4- phenylenes are replaced；
(B) cationoid reaction type compound and radical reaction type compound, including at least one
Plant compound containing unsaturated double-bond and at least one containing epoxy compounds；
(C) cationic photoinitiator；
(D) optionally, radical photoinitiator.
The present invention's mixes type Photocurable composition to the light in 200-500nm wave-length coverages all
There is good response, applicable light source includes but is not limited to mercury lamp, halogen lamp, Non-polarized lamp, LED
Lamp, laser etc..
In view of its excellent performance, Photocurable composition of the invention can be applied in paint, applied
In terms of material, ink and moulding material, it is particularly applicable to make：In plastics, metal, glass
The coating being coated on the base materials such as glass, ceramics, timber, wall, optical fiber；Hard coating agent,
The Protective coatings such as anti-soil film, antireflection film, damping of shocks film；Photocuring binder, stick together
Agent, light breakdown type coating, film, article shaped；The optical recording media of hologram material etc.；
Optical mold resin, for example, 3D printing ink (resin), electronic circuit and semiconductor
With photoresist, the electronic material such as colored filter, black matrix", dry film is used in display for manufacture
Photoresist etc.；Interlayer dielectric, light extraction film, brightness enhancement film, encapsulant；Silk-screen printing,
The printing inks such as offset printing, intaglio printing, inkjet printing light-curable ink；Eyeglass,
The optical components such as lens array, light-guide wave path, light guide plate, light diffusing sheet, diffraction element；Light
Separation material, rib wall, nano impression material；Etc..
Detailed description of the invention
The component for mixing type Photocurable composition of the present invention mainly includes component (A)-(D),
This several component belongs to known class compound of the prior art.Pass through this several component
Use cooperatively, the Photocurable composition is to light source (such as mercury lamp in 200-500nm wave-length coverages
And LED) there is splendid response, curing rate is fast, and developability and pattern integrity are excellent,
Solidify film hardness height, the adhesive force on base material is strong, and cost is relatively low, and application effect is superior.
The Photocurable composition of the present invention mainly includes component (A)-(D), below will be to each
Component is described in more details.
<Component (A) anthracene esters sensitizer>
As the anthracene esters sensitizer of component (A), selected from the change with structure shown in formula (I)
Compound and/or using formula (I) compound as the macromolecular compound of primary structure：
R1And R2Hydrogen, nitro, cyano group, halogen, C are represented independently of one another1-C40Straight chain
Or branched alkyl, C1-C40Alkoxy or-O-CO-R groups, and R1And R2In extremely
Few one is-O-CO-R groups, and R represents C3-C20Cycloalkyl, C4-C20Alkyl-cycloalk
Base or cycloalkyl-alkyl, C2-C40Contain ester group, C2-C40Contain cycloalkyl groups, halogen
Element, C3-C20The alkyl being optionally substituted by halogen；
R3、R4、R5、R6、R7、R8、R9、R10Represent independently of one another hydrogen, nitro,
Cyano group, halogen, C1-C40Straight or branched alkyl, C3-C40Cycloalkyl, C4-C40's
Alkyl-cycloalkyl or cycloalkyl-alkyl, C2-C40Alkenyl, C6-C40Aryl, and these
Acyclic-CH in group2- optionally by-O- ,-CO- ,-NH- ,-S- or 1,4- phenylenes institute
Substitution.
Herein, acyclic-CH2- refer to-CH that is not in cyclic structure2-, that is, exclude ring-type
- CH in structure2-.For example, above-mentioned R3-R10Described in " acyclic-CH2- " include straight chain or branch
- CH in alkyl group2- ,-CH in the alkyl structure of alkyl-cycloalkyl and cycloalkyl-alkyl2-、
- CH in alkenyl and aryl2-。
Preferably, in structure shown in formula (I), R1And R2Represent independently of one another hydrogen,
Nitro, cyano group, halogen, C1-C20Straight or branched alkyl, C1-C20Alkoxy or
- O-CO-R groups, and R1And R2In at least one be-O-CO-R groups, R is represented
C3-C10Cycloalkyl, C4-C14Alkyl-cycloalkyl or cycloalkyl-alkyl, C3-C20Contain ester
Base group, C3-C20Contain cycloalkyl groups, halogen, C3-C20The alkyl being optionally substituted by halogen.
It is described to refer to contain at least one in group containing ester group in R optional group
- CO-O- or-O-CO-, for example, can be containing (methyl) acrylate-based group；It is excellent
Selection of land, in addition to ester group, the other structures part containing ester group belongs to alkyl knot
Structure and/or alkenyl structure.It is described to refer to contain at least one in group containing cycloalkyl groups
Epoxide group；Preferably, in addition to epoxide group, described other knots containing cycloalkyl groups
Structure part belongs to alkyl structure.
It is further preferred that in structure shown in formula (I), R1And R2Represent independently of one another hydrogen,
Nitro, cyano group, halogen, C1-C10Straight or branched alkyl, C1-C10Alkoxy or
- O-CO-R groups, and R1And R2In at least one be-O-CO-R groups, R is selected from down
Row group：
Wherein h=0-3, i=1-4, and as h=0, cycloalkyl
On hydrogen optionally by C1-C4Alkyl is replaced；
-(CH2)j-CO-O-CkH2k+1Or-(CH2)j-O-CO-CkH2k+1, wherein j=1-4, k=1-6；
-(CH2)r- O-CO-CH=CH2, wherein r=1-5；
Wherein m=1-3, n=0-5；
Wherein x=1-3, y=1-2, z=0-3；
Wherein p=1-5, q=0-5；
Cl、F、Br、-(CH2)s(CH2)tCCl、-(CH2)s(CH2)tCF、-
(CH2)s(CH2)tC Br, wherein s=1-6, t=1-6；
And the hydrogen in structure residing for h, j, r, m, x, y, p, s, t is optionally by C1-C4
Alkyl is replaced.In these groups, CkH2k+1、CnH2n+1、CzH2z+1And CqH2q+1Represent
Straight or branched alkyl with corresponding carbon number；The value of carbon number include end value and end value it
Between integer value, such as h=0-3 represents that h can be 0,1,2 or 3；These are for ability
It is very clearly and obvious for field technique personnel.
Preferably, in structure shown in formula (I), R3、R4、R5、R6、R7、R8、
R9、R10Hydrogen, nitro, cyano group, halogen, C are represented independently of one another1-C20Straight chain or branch
Alkyl group, C3-C20Cycloalkyl, C4-C20Alkyl-cycloalkyl or cycloalkyl-alkyl, C2-C10
Alkenyl, C6-C20Aryl, and the acyclic-CH in these groups2- optionally by-O-,
- CO- or 1,4- phenylenes are replaced.
It is further preferred that R3、R4、R5、R6、R7、R8、R9、R10Independently of one another
Represent hydrogen, nitro, cyano group, halogen, C1-C12Straight or branched alkyl, C3-C10Ring
Alkyl, C4-C10Alkyl-cycloalkyl or cycloalkyl-alkyl, C2-C6Alkenyl, C6-C10
Aryl, and the acyclic-CH in these groups2- optionally replaced by-O- or-CO-.
In the present invention, the compound with structure shown in formula (I) can by commercially available or
Easily it is made via existing known method.For example, prepare can refer to CN104991418A,
Method described in CN105001081A, CN105037587A, JP2013107848A,
This introduces its full text to be used as reference.
It is described using formula (I) compound as primary structure as optional anthracene esters sensitizer
Macromolecular compound can be formula (I) compound by polymerize (including homopolymerization and copolymerization),
Macromolecular compound formed by esterification or ester exchange reaction.Corresponding synthetic method can refer to public affairs
The number of opening is interior described in CN104991418A, CN105001081A Chinese patent application
Hold, herein introduce its full text to be used as reference.
Exemplarily, can be shown in having structure as the anthracene esters sensitizer of component (A)
Combination more than one or both of compound：
Mix type Photocurable composition in the present invention, be used as the anthracene esters of component (A) to increase
Sense agent can be the combination of one or more kinds of compounds, and the compound, which is selected from, has formula
(I) compound of structure shown in and/or using formula (I) compound as the macromolecular of primary structure
Compound.By percentage to the quality, the content of component (A) anthracene esters sensitizer in the composition
For 0.001-10%, more preferably preferably 0.01-5%, 0.1-2%.
<Component (B) cationoid reaction type compound and radical reaction type compound>
Component (B) cationoid reaction type compound and radical reaction type chemical combination in the present invention
Thing includes at least one compound containing unsaturated double-bond and at least one containing epoxy compounds.Change
Compound can be the chemical forms such as monomer, prepolymer, oligomer, polymer.
The compound containing unsaturated double-bond be selected from (methyl) acrylic ester compound and/or
Alkenyl ether compound.
(methyl) acrylic ester compound can be selected from：(methyl) alkyl acrylate,
(methyl) crylic acid hydroxy ester, (methyl) acrylate of (poly-) aklylene glycol, three
(methyl) acrylate of first above polyalcohol or secondly carboxyl acid modified thing, epoxy acrylate,
Polyurethane (methyl) acrylate, the polyester acrylate, (first of terminal hydroxyl fluidized polymer
Base) the acrylate, (first of the oligomeric resin such as urethane resin, silicone resin, spirane resin
Base) acrylate.
Effect such as curing efficiency, developability, film hardness, the base material adhesive force etc. used from compatibility
Factor considers that (methyl) acrylic ester compound is preferably (methyl) alkyl acrylate
Ester, (methyl) acrylate of (poly-) aklylene glycol, (first of ternary above polyalcohol
Base) acrylate, epoxy acrylate, one kind in polyurethane (methyl) acrylate or
Two or more combinations.
Without limitation, described (methyl) acrylic ester compound may be selected from following compounds
One or both of more than combination：(methyl) methyl acrylate, (methyl) acrylic acid
Butyl ester, (methyl) isobutyl acrylate, (methyl) tert-butyl acrylate, (methyl) third
Olefin(e) acid cyclohexyl, (methyl) ethylhexyl acrylate, (methyl) n-octyl, (first
Base) Isooctyl acrylate monomer, bisphenol A epoxy acrylate resin, ethylene glycol two (methyl) third
Olefin(e) acid ester, diethylene glycol two (methyl) acrylate, triethylene glycol two (methyl) acrylic acid
Ester, propane diols two (methyl) acrylate, tripropylene glycol two (methyl) acrylate,
1,4- butanediols two (methyl) acrylate, 1,6-HD two (methyl) acrylate, three
Hydroxymethyl ethane three (methyl) acrylate, trimethylolpropane tris (methyl) acrylate,
Pentaerythrite three (methyl) acrylate, pentaerythrite four (methyl) acrylate, two seasons penta 4
Alcohol five (methyl) acrylate, dipentaerythritol six (methyl) acrylate etc..
The alkenyl ether compound may be selected from vinyl ethers, 1- acrylic ethers, 1- fourths
Alkenyl ethers, 1- amylene pyridyl ethers compounds, optimal ethylene pyridyl ethers compound.It is highly preferred that
Vinyl ethers compound may be selected from triethylene glycol divinyl ether, 1,4- cyclohexane dimethanol diethyls
Alkene ether, 4- hydroxy butyl vinyl ethers, glycerol carbonate vinyl ethers, dodecyl vinyl base
Combination more than one or both of ether etc..
Described is selected from glycidyl ether type epoxy resin, ethylene oxidic ester containing epoxy compounds
Based epoxy resin, glycidyl amine epoxy resin, linear aliphatic same clan epoxy resin, fat
Same clan's epoxy resin and oxygen heterocycle butane.
Effect such as curing efficiency, developability, film hardness, the base material adhesive force etc. used from compatibility
Factor considers, above-mentioned to be contracted containing the preferred bisphenol A type epoxy resin of epoxy compounds, aliphatic
The glycidyl ether type epoxy resins such as water glycerine ether resin, aliphatic category epoxy resin and oxa- ring
Butane compounds.
Exemplary type, described can be 3,4- epoxycyclohexyl-methyls containing epoxy compounds
- 3,4- epoxycyclohexyls formic acid esters, ethanedioic acid double (3,4- epoxycyclohexanecarboxylates), three hydroxyl first
Base propane glycidol ether, 1,2- epoxy -4- vinyl cyclohexanes, 2,2'- [(1- methyl ethylidene)
Double (4,1- phenyl ene oxymethylenes)] bisoxirane homopolymer (bisphenol A type epoxy resin), 3-
Oxyranyle 7- oxabicyclos [4,1,0] heptane, ethylene glycol bisglycidyl ether, C12-C14Alkane
Base glycidol ether, 3- methyl -3- ethene hydroxymethyl-oxetane, 3- methyl -3- ethene hydroxyls are more
Double (3- ethyl -3- oxetanylmethoxies) fourths of ethoxylated methyl oxetanes, 1,4-
Alkane, 1,6- double (3- ethyl -3- oxetanylmethoxies) hexane, (the 3- ethyls of pentaerythrite three
- 3- oxetanylmethyls) ether, 3- methyl -3- hydroxymethyl oxetanes, 3- ethyls -3-
Hydroxymethyl oxetane, 3- ethyls -3- (2- Ethylhexoxymethyls) oxetanes, 1,3-
Double (3- ethyls-the 3- of double [(3- ethyl -3- oxetanylmethoxies) methyl] propane, polyethylene glycol
Oxetanylmethyl) ether, isobutoxymethyl (3- ethyl -3- oxetanylmethyls)
Ether, ethylene glycol double (3- ethyl -3- oxetanylmethyls) ether, the methylenes of tristane diyl two
Base (3- ethyl -3- oxetanylmethyls) ether, trimethylolpropane tris (3- ethyl -3- oxa-s
Cyclobutane ylmethyl) in ether, pentaerythrite four (3- ethyl -3- oxetanylmethyls) ether etc.
One or more kinds of combinations.
In addition to mentioned kind, described is also selected from containing epoxy compounds or including tool
There is the compound of following structure：
From the point of view of performance priority, as response type compound, (methyl) acrylate
Class compound is adapted to free radical type photocuring system, is adapted to cationic light containing epoxy compounds
Curing system, then both of which is applicable alkenyl ether compound.Good hybrid systems are except needing
Constituent species are optimized outside configuration, proportioning each other also have to application effect compared with
Big influence.In the present invention, based on component (B) gross mass, described (methyl) propylene
The content of acid esters compound is preferably 20-60%, and described alkenyl ether compound contains
Amount is preferably 0-40%, and the content containing epoxy compounds is preferably 10-50%.
Mix type Photocurable composition in the present invention, by percentage to the quality, component (B)
Content be 10-90%, preferably 40-90%.
<Component (C) cationic photoinitiator>
Component (C) cationic photoinitiator can be aryl diazonium salts, salt compounded of iodine, sulphur
Combination more than one or both of luxuriant molysite of salt, aryl.
In photocuring system, the correspondence of cation/radical reaction type compound and light trigger
Property is very high, and it is poly- to trigger that cationoid reaction type compound generally requires cationic photoinitiator
Close, radical reaction type compound then needs radical photoinitiator, could so obtained
Effect.Mix type Photocurable composition in the present invention, cationic photoinitiator increasing
Feel activity under the sensitization of agent to be greatly improved, can quickly trigger cationoid reaction type compound
Crosslinking curing.And in the process, draw containing salt compounded of iodine and/or sulphur salt type cationic light
The reaction system of hair agent can discharge free radical simultaneously, and then further trigger in component (B)
Radical reaction type compound.That is, when component (C) includes salt compounded of iodine and/or sulphur
During salt photoinitiator, it is while cationic photoinitiator effect is played, it may have
The partial function of free radical type.
Based on composite factors such as cost, for example light-initiated efficiency of the effect used cooperatively, curing rates
Consider, component (C) preferably salt compounded of iodine and/or sulfosalt photoinitiator, particularly preferably tool
There is the compound of structure shown in following formula (II) and/or (III)：
Wherein, R11And R12Hydrogen, C are represented independently of one another1-C20Straight or branched alkyl,
C4-C20Cycloalkyl-alkyl or alkyl-cycloalkyl, and the acyclic-CH in these groups2- can be optional
Ground is replaced by-O- ,-S- or 1,4- phenylenes；
R13And R14Hydrogen, C are represented independently of one another1-C20Straight or branched alkyl, C4-C20
Cycloalkyl-alkyl or alkyl-cycloalkyl, C6-C20Aryl, it is and acyclic in these groups
-CH2- optionally replaced by-O- ,-S- or 1,4- phenylenes；
R15Represent C6-C20Aryl, C1-C20Straight or branched alkyl, C4-C20Cycloalkanes
In base alkyl or alkyl-cycloalkyl, substitution or unsubstituted Phenylsulfanylphenyl, and these groups
Acyclic-CH2- optionally replaced by-O- ,-S- or 1,4- phenylenes；
X-PF is represented independently of one another6 -、SbF6 -、CF3SO3 -、C4F9SO3 -、C8F17SO3 -、
(SO2C4F9)2N-Or B (C6M5)4 -(M represents H, F, Cl, Br).
As preferred structure, in the compound of structure shown in formula (II) and (III)：
R11And R12Hydrogen, C are represented independently of one another1-C12Straight or branched alkyl, C4-C10
Cycloalkyl-alkyl or alkyl-cycloalkyl, and the acyclic-CH in these groups2- optionally by
- O- is replaced；
R13And R14Hydrogen, C are represented independently of one another1-C10Straight or branched alkyl, C4-C10
Cycloalkyl-alkyl or alkyl-cycloalkyl, C6-C12Aryl, it is and acyclic in these groups
-CH2- optionally replaced by-O- ,-S- or 1,4- phenylenes；
R15Represent C6-C10Aryl, substitution or unsubstituted Phenylsulfanylphenyl, and these
Acyclic-CH in group2- optionally replaced by-O- ,-S- or 1,4- phenylenes.
It is further preferred that above-mentioned salt compounded of iodine and sulfosalt photoinitiator can include following knot
Structure：
In the Photocurable composition of the present invention, when from two or more cationic photoinitiators
When, it can be two or more combinations in same class (such as salt compounded of iodine or sulfosalt class), also may be used
To be the combination of different classes of compound.By percentage to the quality, component (C) cationic
The content of light trigger in the composition is 0.001-20%, preferably 0.1-10%.
<Component (D) radical photoinitiator>
Salt compounded of iodine and/or sulfosalt photoinitiator have the reality that free radical triggers in use
Function, now simultaneously non-invention mixes the required of type Photocurable composition to radical photoinitiator
Component.But, suitable radical photoinitiator is added in hybrid systems, passes through two classes
Light trigger is used cooperatively, and is expected to further lift photocuring efficiency.On the other hand, component is worked as
(C) when being aryl diazonium salts and/or aryl cyclopentadienyl molysite, of the invention mixes type photocurable composition
Thing needs to include radical photoinitiator, consolidates in order to the crosslinking of radical reaction type compound
Change, it is ensured that the overall photocuring effect of system.
Common radical photoinitiator has Dialkoxy acetophenones class, alpha-hydroxyalkyl benzophenone
Class, α-amine alkylbenzene ketone, acylphosphine oxide, benzophenone, benzoin class, benzene are even
Acyl class, heterocycle arone class, oxime ester lightlike initiating agent etc..
Based on composite factors such as cost, for example light-initiated efficiency of the effect used cooperatively, curing rates
Consider, as the radical photoinitiator of component (D) be preferably benzophenone, α-
Hydroxyalkyl phenones class and/or α-amine alkylbenzene ketone, benzil class compound.
Exemplarily, it is shown in having structure as the radical photoinitiator of component (D)
Combination more than one or both of compound：
In the Photocurable composition of the present invention, when from two or more radical photoinitiators
When, can be two or more combinations or different classes of chemical combination in same class compound
The combination of thing.By percentage to the quality, component (D) radical photoinitiator is in composition
In content be 0-20%, preferably 0.1-10%.
<Component (E) other components>
In addition to said components (A)-(D), according to products application needs, light of the invention
Solidification composition filling also optionally adds organic and/or inorganic assistant commonly used in the art,
Including but not limited to pigment, levelling agent, dispersant, curing agent, surfactant, solvent etc.,
This will be apparent to those skilled in the art.In addition, not imitated to composition application
On the premise of fruit has a negative impact, it also can add other sensitizers in composition and/or light draws
Agent is sent out with compounding use.
One or more macromoleculars are also optionally added in needs, said composition according to applying
Or high-molecular compound improves the application performance of composition in use, this macromolecular
Or high-molecular compound can be polyalcohol or PEPA；Also it is optionally added and is free of
There is the polymer of reactive functionality, these polymer are typically containing acidity such as phenolic hydroxyl group, carboxyls
The resin of functional group.
<The preparation of Photocurable composition>
The Photocurable composition of the present invention can be obtained by being well mixed after each component is weighed according to quantity.
The commercially available prod of curing field particularly mid- to high-end product is based on import at this stage, this
A little products possess patented technology mostly, and product price is high, and domestic enterprise lack core technology and
Independent intellectual property right, under tight technology barriers, enterprise development so research and development layout all by
Very big limitation.The present invention is by constituent optimization, and gained mixes the photosensitive of type Photocurable composition
Wave-length coverage is big, and photocuring effect is good, can combine free radical type and the class light of cationic two is solid
The advantage of change system, is answered in many-sides such as paint, coating, ink, moulding materials
With with stronger technology and the market competitiveness.
Embodiment
The present invention is described in further detail below with reference to specific embodiment, but should not be by it
It is interpreted as limiting the scope of the invention.
Unless otherwise instructed, number described below is parts by weight.The reference implication respectively abridged
It is as follows：
A1：
A2：
A3：
A4：
B1：Trimethylolpropane trimethacrylate；
B2：Bisphenol A epoxy acrylate resin (SM6105-80)；
B3：4- hydroxy butyl vinyl ethers (HBVE)；
B4：Trimethylolpropane tris (3- ethyl -3- oxetanylmethyls) ether；
B5：3,4- epoxycyclohexyl-methyl -3,4- epoxycyclohexyl formic acid esters；
C1：
C2：
D1:
D2：
1st, Photocurable composition is prepared
Formula prepares Photocurable composition shown according to the form below 1.
Table 1
2nd, performance test
(1) film forming is tested under high-pressure sodium lamp
Photocurable composition is stirred under yellow fluorescent lamp, feeding in roller coating film forming in PET templates,
5min is dried at 90 DEG C and removes solvent, the film of about 2 μm of thickness is formed.Painting will be formed with
The substrate of film is cooled to room temperature, encloses mask plate, with high-pressure sodium lamp (exposure machine model
RW-UV70201, light intensity 50mW/cm2) irradiation film is exposed, the time for exposure
30s.Visually observe to evaluate the film forming situation of exposure area.
Develop with 30s is impregnated in the 1% NaOH aqueous solution at a temperature of 25 DEG C, then use
Milli-Q water, is air-dried；Then the rear baking 30min in 240 DEG C of baking oven, obtains mask
The pattern of plate transfer.With pattern on SEM (SEM) observation substrate, to evaluate
Developability and pattern integrity.
Film forming situation evaluation criterion is as follows：
○：Film surface is smooth；
◎：There is flaw on film surface；
●：Can not film forming.
Developability evaluation criterion is as follows:
○：Residue is not observed in unexposed portion；
◎：In unexposed portion it was observed that a small amount of residue, but residual quantity can receive；
●：In unexposed portion it was observed that obvious residue.
Pattern integrity evaluation criterion is as follows:
○：Pattern defect is not observed；
◎：It was observed that fraction pattern has fewer defects；
●：Substantially it was observed that many pattern defects.
Evaluation result is as shown in table 2.
Table 2
Note："-" be because can not film forming, lead to not evaluate.
(2) film forming is tested under LED/light source
Photocurable composition is stirred under yellow fluorescent lamp, feeding in roller coating film forming in PET templates,
5min is dried at 90 DEG C and removes solvent, the film of about 2 μm of thickness is formed.Painting will be formed with
The substrate of film is cooled to room temperature, encloses mask plate, using wavelength 395nm, light intensity 1500
mW/cm2LED/light source, the substrate of film will be formed with and be maintained at 10cm with fluorescent tube distance,
It is exposed and detects its primary solidification time.
The primary solidification time refers to that in the case where LED/light source irradiates material surface hardness, which reaches, uses 1H
Chinese board advanced drawing pencil portrays the time for occurring without vestige, and the primary solidification time can be used to
Weigh the efficiency of initiation of light trigger.
After primary solidification, with identical in above-mentioned (1) develop and rear baking procedure, and
Its developability and pattern integrity are evaluated using identical standard.
Test result is as shown in table 3 below.
Table 3
(3) cure shrinkage is tested
In the case of without using mask plate, smearing and solidification with reference to described in above-mentioned (2)
Condition, solidifies to embodiment 1-6 Photocurable composition.With reference to international standard ISO3521
Relevant regulations, calculate primary solidification before and after volume differences with solidification front volume ratio, carry out
Shrinkage factor is calculated.
As a result it is as shown in table 4 below.
Table 4
(4) base material adhesive force is tested
Using the Photocurable composition of embodiment 1 as representative, reference《GBT9286-1998 colored paints
With the scratch experiment of varnish paint film》, the skill in using a kitchen knife in cookery is drawn using hundred lattice, using QFH paint film lattice drawing instrument,
Adhesive force of the Photocurable composition on different substrate materials is tested.
Specific method is as follows：
Photocurable composition is uniformly applied on different base materials, respectively in high-pressure sodium lamp and
Solidification (is smeared and condition of cure is as described above described in (1) and (2), no under LED lamp source
Using mask plate, exposed under high-pressure sodium lamp and expose 3s under 30s, LED/light source), solidification is completed
Afterwards room temperature place 24h carry out aging, then using cross-cut tester laterally and longitudinally each stroke of 1 knife with shape
Into 100 tiny grids, then with each brush of hairbrush diagonal five times, with No. 3M600
Adhesive tape is attached on otch and pulled open again, with the situation of amplification sem observation grid area, by evaluation side
The integrated degree of film evaluates film to base material degree of adhesion in lattice.Film is completeer in grid
It is whole, represent that adhesive ability is stronger.
Evaluation criterion is as follows：
A：The edge of otch is completely smooth, and grid edge does not have any peeling；
B：There is actual spoilage≤5% in small pieces peeling, Hua Ge areas in the intersection of otch；
C：There is peeling at the edge and/or intersection of otch, and its area 5%-30% (is free of 5%)；
D：There is part to peel off or whole large stretch of peeling or all peelings, or partitive case along notching edge
Son is peeled off by full wafer.The area of peeling is more than 30%.
Evaluation result is as shown in table 5 below.
Table 5
With reference to table 2-5 test result can be seen that the present invention mix type Photocurable composition
All there is good photocuring effect under mercury lamp and LED/light source, sensitivity is high, solidification speed
Degree is fast, and shrinkage factor is small, and developability and pattern integrity are good, and hardness of film is high, in different bases
Very strong adhesive force is shown on material.
Claims (21)
1. a kind of Free radical-Cationic Hybrid Photocurable composition, includes following components：
(A) anthracene esters sensitizer, selected from the compound of structure shown in formula (I) and/or
Using formula (I) compound as the macromolecular compound of primary structure：
R1And R2Hydrogen, nitro, cyano group, halogen, C are represented independently of one another1-C40Straight chain
Or branched alkyl, C1-C40Alkoxy or-O-CO-R groups, and R1And R2In extremely
Few one is-O-CO-R groups, and R represents C3-C20Cycloalkyl, C4-C20Alkyl-cycloalk
Base or cycloalkyl-alkyl, C2-C40Contain ester group, C2-C40Contain cycloalkyl groups, halogen
Element, C3-C20The alkyl being optionally substituted by halogen；
R3、R4、R5、R6、R7、R8、R9、R10Represent independently of one another hydrogen, nitro,
Cyano group, halogen, C1-C40Straight or branched alkyl, C3-C40Cycloalkyl, C4-C40's
Alkyl-cycloalkyl or cycloalkyl-alkyl, C2-C40Alkenyl, C6-C40Aryl, and these
Acyclic-CH in group2- optionally (optionally) by-O- ,-CO- ,-NH- ,-S-
Or 1,4- phenylenes are replaced；
(B) cationoid reaction type compound and radical reaction type compound, including at least one
Plant compound containing unsaturated double-bond and at least one containing epoxy compounds；
(C) cationic photoinitiator；
(D) optionally, radical photoinitiator.
2. according to claim 1 mix type Photocurable composition, it is characterised in that：
In structure shown in formula (I), R1And R2Represent independently of one another hydrogen, nitro, cyano group, halogen,
C1-C20Straight or branched alkyl, C1-C20Alkoxy or-O-CO-R groups, and R1
And R2In at least one be-O-CO-R groups, R represents C3-C10Cycloalkyl, C4-C14
Alkyl-cycloalkyl or cycloalkyl-alkyl, C3-C20Contain ester group, C3-C20Contain epoxy
Base group, halogen, C3-C20The alkyl being optionally substituted by halogen.
3. according to claim 1 or 2 mix type Photocurable composition, its feature exists
In：In R optional group, it is described containing ester group contain at least one-CO-O- or
- O-CO-, and in addition to ester group, the other structures part containing ester group belongs to alkane
Based structures and/or alkenyl structure.
4. according to claim 1 or 2 mix type Photocurable composition, its feature exists
In：In R optional group, described contains at least one epoxide group containing cycloalkyl groups,
And in addition to epoxide group, the other structures part containing cycloalkyl groups belongs to alkyl
Structure.
5. according to claim 1 or 2 mix type Photocurable composition, its feature exists
In：In structure shown in formula (I), R1And R2Represent independently of one another hydrogen, nitro, cyano group,
Halogen, C1-C10Straight or branched alkyl, C1-C10Alkoxy or-O-CO-R groups,
And R1And R2In at least one be-O-CO-R groups, R is selected from following groups：
Wherein h=0-3, i=1-4, and as h=0, cycloalkyl
On hydrogen optionally by C1-C4Alkyl is replaced；
-(CH2)j-CO-O-CkH2k+1Or-(CH2)j-O-CO-CkH2k+1, wherein j=1-4, k=1-6；
-(CH2)r- O-CO-CH=CH2, wherein r=1-5；
Wherein m=1-3, n=0-5；
Wherein x=1-3, y=1-2, z=0-3；
Wherein p=1-5, q=0-5；
Cl、F、Br、-(CH2)s(CH2)tCCl、-(CH2)s(CH2)tCF、-
(CH2)s(CH2)tC Br, wherein s=1-6, t=1-6；
And the hydrogen in structure residing for h, j, r, m, x, y, p, s, t is optionally by C1-C4
Alkyl is replaced.
6. according to claim 1 mix type Photocurable composition, it is characterised in that：
In structure shown in formula (I), R3、R4、R5、R6、R7、R8、R9、R10Independently of one another
Represent hydrogen, nitro, cyano group, halogen, C1-C20Straight or branched alkyl, C3-C20Ring
Alkyl, C4-C20Alkyl-cycloalkyl or cycloalkyl-alkyl, C2-C10Alkenyl, C6-C20
Aryl, and the acyclic-CH in these groups2- optionally by-O- ,-CO- or the sub- benzene of 1,4-
Base is replaced.
7. mixing type Photocurable composition according to claim 1 or 6, its feature exists
In：In structure shown in formula (I), R3、R4、R5、R6、R7、R8、R9、R10Each solely
On the spot represent hydrogen, nitro, cyano group, halogen, C1-C12Straight or branched alkyl, C3-C10
Cycloalkyl, C4-C10Alkyl-cycloalkyl or cycloalkyl-alkyl, C2-C6Alkenyl, C6-C10
Aryl, and the acyclic-CH in these groups2- optionally replaced by-O- or-CO-.
8. according to claim 1 mix type Photocurable composition, it is characterised in that：Group
Divide in (B), the compound containing unsaturated double-bond is selected from (methyl) esters of acrylic acid chemical combination
Thing and/or alkenyl ether compound.
9. according to claim 8 mix type Photocurable composition, it is characterised in that：Institute
State (methyl) acrylic ester compound and be selected from (methyl) alkyl acrylate, (methyl) third
It is olefin(e) acid hydroxy ester, (methyl) acrylate of (poly-) aklylene glycol, more than ternary polynary
(methyl) acrylate of alcohol or secondly carboxyl acid modified thing, epoxy acrylate, polyurethane (first
Base) acrylate, polyester acrylate, (methyl) acrylic acid of terminal hydroxyl fluidized polymer
(methyl) acrylate of ester, oligomeric resin.
10. according to claim 8 or claim 9 mix type Photocurable composition, it is characterised in that：
(methyl) acrylic ester compound is (methyl) alkyl acrylate, (poly-) alkylene
(methyl) acrylate of base glycol, (methyl) acrylate of ternary above polyalcohol,
Combination more than one or both of epoxy acrylate, polyurethane (methyl) acrylate.
11. according to claim 8 mix type Photocurable composition, it is characterised in that：
The alkenyl ether compound is selected from vinyl ethers, 1- acrylic ethers, 1- cyclobutenyl ethers
Class, 1- amylene pyridyl ethers compounds, optimal ethylene pyridyl ethers compound.
12. according to claim 11 mix type Photocurable composition, it is characterised in that：
Described vinyl ethers compound is selected from triethylene glycol divinyl ether, 1,4- cyclohexane dimethanols
Divinyl ether, 4- hydroxy butyl vinyl ethers, glycerol carbonate vinyl ethers, dodecyl second
Combination more than one or both of alkene ether.
13. according to claim 1 mix type Photocurable composition, it is characterised in that：
In component (B), it is described containing epoxy compounds be selected from glycidyl ether type epoxy resin,
Glycidyl ester epoxy resin, glycidyl amine epoxy resin, linear aliphatic same clan epoxy
Resin, aliphatic category epoxy resin and oxygen heterocycle butane.
14. mixing type Photocurable composition according to claim 1 or 13, its feature exists
In：In component (B), described is selected from glycidyl ether type epoxy tree containing epoxy compounds
Fat, aliphatic category epoxy resin and oxygen heterocycle butane.
15. according to claim 1 mix type Photocurable composition, it is characterised in that：
Component (C) cationic photoinitiator is aryl diazonium salts, salt compounded of iodine, sulfosalt, aryl
Combination more than one or both of luxuriant molysite.
16. according to claim 15 mix type Photocurable composition, it is characterised in that：
Component (C) cationic photoinitiator is salt compounded of iodine and/or sulfosalt photoinitiator.
17. the cation photocuring composition according to claim 15 or 16, its feature
It is：Component (C) cationic photoinitiator, which is selected from, has such as following formula (II) and/or (III)
The compound of shown structure：
Wherein, R11And R12Hydrogen, C are represented independently of one another1-C20Straight or branched alkyl,
C4-C20Cycloalkyl-alkyl or alkyl-cycloalkyl, and the acyclic-CH in these groups2- can be optional
Ground is replaced by-O- ,-S- or 1,4- phenylenes；
R13And R14Hydrogen, C are represented independently of one another1-C20Straight or branched alkyl, C4-C20
Cycloalkyl-alkyl or alkyl-cycloalkyl, C6-C20Aryl, it is and acyclic in these groups
-CH2- optionally replaced by-O- ,-S- or 1,4- phenylenes；
R15Represent C6-C20Aryl, C1-C20Straight or branched alkyl, C4-C20Cycloalkanes
In base alkyl or alkyl-cycloalkyl, substitution or unsubstituted Phenylsulfanylphenyl, and these groups
Acyclic-CH2- optionally replaced by-O- ,-S- or 1,4- phenylenes；
X-PF is represented independently of one another6 -、SbF6 -、CF3SO3 -、C4F9SO3 -、C8F17SO3 -、
(SO2C4F9)2N-Or B (C6M5)4 -(M represents H, F, Cl, Br).
18. according to claim 17 mix type Photocurable composition, it is characterised in that：
R11And R12Hydrogen, C are represented independently of one another1-C12Straight or branched alkyl, C4-C10
Cycloalkyl-alkyl or alkyl-cycloalkyl, and the acyclic-CH in these groups2- optionally by
- O- is replaced；
R13And R14Hydrogen, C are represented independently of one another1-C10Straight or branched alkyl, C4-C10
Cycloalkyl-alkyl or alkyl-cycloalkyl, C6-C12Aryl, it is and acyclic in these groups
-CH2- optionally replaced by-O- ,-S- or 1,4- phenylenes；
R15Represent C6-C10Aryl, substitution or unsubstituted Phenylsulfanylphenyl, and these bases
Acyclic-CH in group2- optionally replaced by-O- ,-S- or 1,4- phenylenes.
19. according to claim 1 mix type Photocurable composition, it is characterised in that：
Component (D) radical photoinitiator be selected from benzophenone, alpha-hydroxyalkyl benzophenone class and/
Or α-amine alkylbenzene ketone, benzil class compound.
20. the type Photocurable composition that mixes any one of claim 1-19 is consolidated in light
Application in change field.
21. application according to claim 20, it is characterised in that：The curing field
Including paint, coating, ink and moulding material.
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| CN107325237B (en) | 2020-04-21 |
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